CN110244394A - A kind of diffraction optical element manufacture craft - Google Patents
A kind of diffraction optical element manufacture craft Download PDFInfo
- Publication number
- CN110244394A CN110244394A CN201910539655.9A CN201910539655A CN110244394A CN 110244394 A CN110244394 A CN 110244394A CN 201910539655 A CN201910539655 A CN 201910539655A CN 110244394 A CN110244394 A CN 110244394A
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- Prior art keywords
- glass
- optical element
- grooves
- diffraction optical
- etching
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The present invention relates to a kind of diffraction optical element manufacture crafts, belong to optical element technology field, including using cutting, grinding, cleaning, it is dry, plated film, gluing, photoetching, plasma etching, impression block is made in electroforming, then photoresist layer B is formed in substrate surface spin coating photoresist, impression block is pressed in photoresist layer B surface, make to form embossed grooves on photoresist layer B by the way of pressurization, make photoetching adhesive curing with ultraviolet light, remove template, remove the photoresist of embossed grooves bottom, expose substrate surface, it etches to form diffractive grooves in the substrate surface being located at below embossed grooves with etching agent, remove whole photoresists of substrate surface, obtain diffraction optical element.The beneficial effects of the present invention are: improving the etching efficiency to the diffractive grooves closely arranged, and the diffractive grooves to be formed are etched in substrate surface using etching agent, so that being smoothly connected between the side and ground of diffractive grooves.
Description
Technical field
The present invention relates to optical element field more particularly to a kind of diffraction optical element manufacture crafts.
Background technique
After diffraction optical element refers to that light wave passes through optical element, amplitude is unchanged but mutually there is periodic change in position,
To change the optical device of the diffraction of light.At present production diffraction optical element method, technique it is very much, main method be
Photoetching offset plate figure is made on quartz substrate, using photoresist as masking, then reaches one using plasma dry etch quartz
Fixed depth plays the role of Spatial transmission.Although this method is simple, the etching work to the diffractive grooves closely arranged
Forming angle in the presence of etching inefficiency, between the side and ground of diffractive grooves cannot be smoothly connected.
Summary of the invention
It is an object of the invention to overcome problem above of the existing technology, a kind of diffraction optical element production work is provided
Skill, solves method, the technique of existing production diffraction optical element, there is etching to the etching work for the diffractive grooves closely arranged
Inefficiency forms the problem of angle cannot be smoothly connected between the side and ground of diffractive grooves.
To realize above-mentioned technical purpose and the technique effect, the invention is realized by the following technical scheme:
A kind of diffraction optical element manufacture craft, includes the following steps:
Step 1: with glass cutter by glass plate scribing at sheet glass；
Step 2: sheet glass being ground with double-faced grinding and polishing machine, sheet glass is made to form super-smooth surface；
Step 3: the sheet glass for being formed with super-smooth surface being cleaned using supersonic wave cleaning machine, removal glass surface bonding
Dust, and keep glass sheet surface dry；
Step 4: the sheet glass after surface clean, drying being put into the surface in vacuum coating equipment in sheet glass and is deposited to form metal
Film；
Step 5: with equal glue machine, spin coating photoresist forms photoresist layer A on metallic film, using electron beam lithography in gold
Belong to etching on film and forms mask graph；
Step 6: being performed etching with the sheet glass that plasma etching machine is formed with mask graph to surface, make glass sheet surface shape
At plate groove；
Step 7: there is the electroplating surface of plate groove to form electroplated layer on the glass sheet using electrocasting, and by electroplated layer and glass
The isolated impression block of the metallic film of glass on piece；
Step 8: forming photoresist layer B with equal glue machine spin coating photoresist on the surface of substrate, impression block is pressed in photoresist layer B
Surface is made to form embossed grooves on photoresist layer B by the way of pressurization, makes photoetching adhesive curing with ultraviolet light, remove template, go
Except the photoresist of embossed grooves bottom, expose substrate surface；
Step 9: etching to form diffractive grooves in the substrate surface being located at below embossed grooves with etching agent, remove substrate surface
Whole photoresists, obtain diffraction optical element.
Preferably, the glass plate is quartz glass plate.
Preferably, the material of the metallic film is gold, with a thickness of 50 ~ 100nm.
Preferably, the electron beam lithography is direct electronic beam writing technology.
Preferably, the angle between the side and bottom surface of the plate groove is right angle.
Preferably, the material of the electroplated layer is chromium, with a thickness of 501 ~ 800nm.
Preferably, the cross section of the diffractive grooves is circle, and the bottom surface of the diffractive grooves is curved surface, and the diffraction is recessed
It is seamlessly transitted between the bottom surface and side of slot.
Preferably, the cross section of the diffractive grooves is square, and the bottom surface of the diffractive grooves is curved surface, the diffraction
It is seamlessly transitted between the bottom surface and side of groove.
The beneficial effects of the present invention are: using cutting, grinding, cleaning, drying, plated film, gluing, photoetching, plasma etching, electricity
It casts and impression block is made, then form photoresist layer B in substrate surface spin coating photoresist, impression block is pressed in photoresist layer B
Surface is made to form embossed grooves on photoresist layer B by the way of pressurization, makes photoetching adhesive curing with ultraviolet light, remove template, go
Except the photoresist of embossed grooves bottom, expose substrate surface, is etched with etching agent in the substrate surface being located at below embossed grooves
Diffractive grooves are formed, whole photoresists of substrate surface is removed, obtains diffraction optical element, improve to the diffraction closely arranged
The etching efficiency of groove, and the diffractive grooves to be formed are etched in substrate surface using etching agent, so that the side of diffractive grooves
It is smoothly connected between ground.
Detailed description of the invention
The drawings described herein are used to provide a further understanding of the present invention, constitutes part of this application, this hair
Bright illustrative embodiments and their description are used to explain the present invention, and are not constituted improper limitations of the present invention.In the accompanying drawings:
Fig. 1 is flow chart of the invention；
Fig. 2 is the cross-sectional view of the diffraction optical element in the embodiment of the present invention one；
Fig. 3 is the cross-sectional view of the diffraction optical element in the embodiment of the present invention two.
Specific embodiment
Below in conjunction with embodiment, next the present invention will be described in detail.
A kind of embodiment one as shown in Figure 1 and Figure 2, diffraction optical element manufacture craft, includes the following steps:
Step 1: with glass cutter by glass plate scribing at sheet glass；
Step 2: sheet glass being ground with double-faced grinding and polishing machine, sheet glass is made to form super-smooth surface；
Step 3: the sheet glass for being formed with super-smooth surface being cleaned using supersonic wave cleaning machine, removal glass surface bonding
Dust, and keep glass sheet surface dry；
Step 4: the sheet glass after surface clean, drying being put into the surface in vacuum coating equipment in sheet glass and is deposited to form metal
The material of film, metallic film is gold, with a thickness of 100nm；
Step 5: with equal glue machine, spin coating photoresist forms photoresist layer A on metallic film, using electron beam lithography in gold
Belong to etching on film and forms mask graph；
Step 6: being performed etching with the sheet glass that plasma etching machine is formed with mask graph to surface, make glass sheet surface shape
At plate groove, the angle between the side and bottom surface of plate groove is right angle；
Step 7: there is the electroplating surface of plate groove to form electroplated layer on the glass sheet using electrocasting, and by electroplated layer and glass
The material of the isolated impression block of the metallic film of glass on piece, electroplated layer helps to improve coining for chromium with a thickness of 800nm
The intensity of template improves the bearing capacity of impression block；
Step 8: forming photoresist layer B with equal glue machine spin coating photoresist on the surface of substrate, impression block is pressed in photoresist layer B
Surface is made to form embossed grooves on photoresist layer B by the way of pressurization, makes photoetching adhesive curing with ultraviolet light, remove template, go
Except the photoresist of embossed grooves bottom, expose substrate surface；
Step 9: etching to form diffractive grooves 2 in the substrate surface being located at below embossed grooves with etching agent, remove substrate surface
Whole photoresists, obtain diffraction optical element 1.
Glass plate is quartz glass plate.
The electron beam lithography is direct electronic beam writing technology.
The cross section of the diffractive grooves 2 is circle, and the bottom surface of the diffractive grooves 2 is curved surface, the diffractive grooves 2
It is seamlessly transitted between bottom surface and side.
A kind of embodiment two as shown in Figure 1, Figure 3, diffraction optical element manufacture craft, includes the following steps:
Step 1: with glass cutter by glass plate scribing at sheet glass；
Step 2: sheet glass being ground with double-faced grinding and polishing machine, sheet glass is made to form super-smooth surface；
Step 3: the sheet glass for being formed with super-smooth surface being cleaned using supersonic wave cleaning machine, removal glass surface bonding
Dust, and keep glass sheet surface dry；
Step 4: the sheet glass after surface clean, drying being put into the surface in vacuum coating equipment in sheet glass and is deposited to form metal
The material of film, metallic film is gold, with a thickness of 50nm；
Step 5: with equal glue machine, spin coating photoresist forms photoresist layer A on metallic film, using electron beam lithography in gold
Belong to etching on film and forms mask graph；
Step 6: being performed etching with the sheet glass that plasma etching machine is formed with mask graph to surface, make glass sheet surface shape
At plate groove, the angle between the side and bottom surface of plate groove is right angle；
Step 7: there is the electroplating surface of plate groove to form electroplated layer on the glass sheet using electrocasting, and by electroplated layer and glass
The material of the isolated impression block of the metallic film of glass on piece, electroplated layer is chromium, with a thickness of 501nm；
Step 8: forming photoresist layer B with equal glue machine spin coating photoresist on the surface of substrate, impression block is pressed in photoresist layer B
Surface is made to form embossed grooves on photoresist layer B by the way of pressurization, makes photoetching adhesive curing with ultraviolet light, remove template, go
Except the photoresist of embossed grooves bottom, expose substrate surface；
Step 9: etching to form diffractive grooves 3 in the substrate surface being located at below embossed grooves with etching agent, remove substrate surface
Whole photoresists, obtain diffraction optical element 1.
Glass plate is quartz glass plate.
The electron beam lithography is direct electronic beam writing technology.
The cross section of the diffractive grooves 3 is square, and the bottom surface of the diffractive grooves 3 is curved surface, the diffractive grooves 3
Bottom surface and side between seamlessly transit.
A kind of embodiment three as shown in Figure 1, diffraction optical element manufacture craft, includes the following steps:
Step 1: with glass cutter by glass plate scribing at sheet glass；
Step 2: sheet glass being ground with double-faced grinding and polishing machine, sheet glass is made to form super-smooth surface；
Step 3: the sheet glass for being formed with super-smooth surface being cleaned using supersonic wave cleaning machine, removal glass surface bonding
Dust, and keep glass sheet surface dry；
Step 4: the sheet glass after surface clean, drying being put into the surface in vacuum coating equipment in sheet glass and is deposited to form metal
The material of film, metallic film is gold, with a thickness of 80nm；
Step 5: with equal glue machine, spin coating photoresist forms photoresist layer A on metallic film, using electron beam lithography in gold
Belong to etching on film and forms mask graph；
Step 6: being performed etching with the sheet glass that plasma etching machine is formed with mask graph to surface, make glass sheet surface shape
At plate groove, the angle between the side and bottom surface of plate groove is right angle；
Step 7: there is the electroplating surface of plate groove to form electroplated layer on the glass sheet using electrocasting, and by electroplated layer and glass
The material of the isolated impression block of the metallic film of glass on piece, electroplated layer helps to improve coining for chromium with a thickness of 650nm
The intensity of template improves the bearing capacity of impression block；
Step 8: forming photoresist layer B with equal glue machine spin coating photoresist on the surface of substrate, impression block is pressed in photoresist layer B
Surface is made to form embossed grooves on photoresist layer B by the way of pressurization, makes photoetching adhesive curing with ultraviolet light, remove template, go
Except the photoresist of embossed grooves bottom, expose substrate surface；
Step 9: etching to form diffractive grooves in the substrate surface being located at below embossed grooves with etching agent, remove substrate surface
Whole photoresists, obtain diffraction optical element.
Glass plate is quartz glass plate.
The electron beam lithography is direct electronic beam writing technology.
The cross section of the diffractive grooves is circle, and the bottom surface of the diffractive grooves is curved surface, the bottom of the diffractive grooves
It is seamlessly transitted between face and side.
Impression block is made using cutting, grinding, cleaning, drying, plated film, gluing, photoetching, plasma etching, electroforming,
Then photoresist layer B is formed in substrate surface spin coating photoresist, impression block is pressed in photoresist layer B surface, using pressurization
Mode makes to form embossed grooves on photoresist layer B, makes photoetching adhesive curing with ultraviolet light, removes template, removes embossed grooves bottom
Photoresist, expose substrate surface, with etching agent be located at embossed grooves below substrate surface etch to form diffractive grooves, go
Except whole photoresists of substrate surface, diffraction optical element is obtained；The etching efficiency to the diffractive grooves closely arranged is improved,
And the diffractive grooves to be formed are etched in substrate surface using etching agent, so that smoothly connecting between the side and ground of diffractive grooves
It connects.
The basic principles, main features and advantages of the present invention have been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the above embodiments and description only describe this
The principle of invention, without departing from the spirit and scope of the present invention, various changes and improvements may be made to the invention, these changes
Change and improvement all fall within the protetion scope of the claimed invention.
Claims (8)
1. a kind of diffraction optical element manufacture craft, which comprises the steps of:
Step 1: with glass cutter by glass plate scribing at sheet glass；
Step 2: sheet glass being ground with double-faced grinding and polishing machine, sheet glass is made to form super-smooth surface；
Step 3: the sheet glass for being formed with super-smooth surface being cleaned using supersonic wave cleaning machine, removal glass surface bonding
Dust, and keep glass sheet surface dry；
Step 4: the sheet glass after surface clean, drying being put into the surface in vacuum coating equipment in sheet glass and is deposited to form metal
Film；
Step 5: with equal glue machine, spin coating photoresist forms photoresist layer A on metallic film, using electron beam lithography in gold
Belong to etching on film and forms mask graph；
Step 6: being performed etching with the sheet glass that plasma etching machine is formed with mask graph to surface, make glass sheet surface shape
At plate groove；
Step 7: there is the electroplating surface of plate groove to form electroplated layer on the glass sheet using electrocasting, and by electroplated layer and glass
The isolated impression block of the metallic film of glass on piece；
Step 8: forming photoresist layer B with equal glue machine spin coating photoresist on the surface of substrate, impression block is pressed in photoresist layer B
Surface is made to form embossed grooves on photoresist layer B by the way of pressurization, makes photoetching adhesive curing with ultraviolet light, remove template, go
Except the photoresist of embossed grooves bottom, expose substrate surface；
Step 9: etching to form diffractive grooves in the substrate surface being located at below embossed grooves with etching agent, remove substrate surface
Whole photoresists, obtain diffraction optical element.
2. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the glass plate is quartz glass
Plate.
3. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the material of the metallic film is
Gold, with a thickness of 50 ~ 100nm.
4. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the electron beam lithography is
Direct electronic beam writing technology.
5. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the side of the plate groove with
Angle between bottom surface is right angle.
6. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the material of the electroplated layer is
Chromium, with a thickness of 501 ~ 800nm.
7. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the cross section of the diffractive grooves
Bottom surface for circle, the diffractive grooves is curved surface, is seamlessly transitted between the bottom surface and side of the diffractive grooves.
8. diffraction optical element manufacture craft according to claim 1, it is characterised in that: the cross section of the diffractive grooves
It is square, the bottom surface of the diffractive grooves is curved surface, is seamlessly transitted between the bottom surface and side of the diffractive grooves.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910539655.9A CN110244394A (en) | 2019-06-21 | 2019-06-21 | A kind of diffraction optical element manufacture craft |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910539655.9A CN110244394A (en) | 2019-06-21 | 2019-06-21 | A kind of diffraction optical element manufacture craft |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110244394A true CN110244394A (en) | 2019-09-17 |
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ID=67888525
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910539655.9A Pending CN110244394A (en) | 2019-06-21 | 2019-06-21 | A kind of diffraction optical element manufacture craft |
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| Country | Link |
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| CN (1) | CN110244394A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116224476A (en) * | 2023-03-22 | 2023-06-06 | 苏州汉骅半导体有限公司 | Microlens array and method for manufacturing same |
-
2019
- 2019-06-21 CN CN201910539655.9A patent/CN110244394A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116224476A (en) * | 2023-03-22 | 2023-06-06 | 苏州汉骅半导体有限公司 | Microlens array and method for manufacturing same |
| CN116224476B (en) * | 2023-03-22 | 2024-03-08 | 苏州汉骅半导体有限公司 | Microlens array and method for manufacturing same |
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| PB01 | Publication | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190917 |