CN110241403A - A kind of heater and preparation method thereof reducing the temperature difference and application - Google Patents
A kind of heater and preparation method thereof reducing the temperature difference and application Download PDFInfo
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- CN110241403A CN110241403A CN201910666047.4A CN201910666047A CN110241403A CN 110241403 A CN110241403 A CN 110241403A CN 201910666047 A CN201910666047 A CN 201910666047A CN 110241403 A CN110241403 A CN 110241403A
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- 238000002360 preparation method Methods 0.000 title abstract description 5
- 238000010438 heat treatment Methods 0.000 claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000009826 distribution Methods 0.000 claims abstract description 11
- 238000005452 bending Methods 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 230000004083 survival effect Effects 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 4
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- 238000003466 welding Methods 0.000 claims description 4
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- 239000004744 fabric Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 206010037660 Pyrexia Diseases 0.000 description 7
- 230000000873 masking effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000000306 component Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000002146 bilateral effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000027950 fever generation Effects 0.000 description 1
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- 230000001788 irregular Effects 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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Abstract
The invention discloses a kind of heaters and its preparation method and application for reducing the temperature difference, heater includes heater plates, heating unit is equipped in heater plates, heating unit includes exterior loop and interior loop, heater plates are divided into symmetrical above and below and symmetrical route distributed areas by the interior loop, and the line with heating function in route distributed areas forms the mode of the route shape of multiple bending inside heater plates to external corner region.The present invention has certain spacing, the entire result that is routed can reduce each region temperature difference of heater substrate at 7 DEG C or less by being not connected between the line with heating function of corresponding region by the hot line distribution mode of innovative change heater.
Description
Technical field
The invention belongs to CVD correlative technology fields, and in particular to a kind of heater and preparation method thereof for reducing the temperature difference and
Using.
Background technique
In flat-panel monitor (FPD), liquid crystal display (LCD) and Organic Light Emitting Diode (OLED)) etc. display apparatus
Manufacturing process in, panel/substrate is needed through PECVD (plasma enhanced chemical vapor deposition) technique system first
Make function film layer (hereinafter referred to as CVD).At high temperature, when cavity being evacuated to vacuum state (1torr), it is passed through process gas,
High frequency electric source is added in electric pole plate and forms electric field, forms plasma (whole is in electroneutral), by adsorbing combination,
Film, mainly Gate insulating film, a-si semiconductor film, Passivation passivating film are formed on glass substrate.Film quality is technique
The project of emphasis control, influence factor is in the majority, and the compactness of major concern film and the parameter of component are substrate temperatures.The temperature of substrate
Degree is provided by the heater of bearing substrate, heater pedestal also known as Susceptor, is the core component of CVD technique.It is flat
Plate display (FPD) substrate procedure is increasingly developed, and large flat process needs one to add with what temperature uniformity was promoted
Heat resource equipment including hot device.With the development of technology, the heating uniformity of heat source needed for process becomes decision qualification rate
Key factor.
Conventional heater includes the heater plates in top installation base plate；Heating unit is housed inside heater plates.It is above-mentioned
Heating unit extends from the center of heater plates toward outside direction, forms certain shape, constitutes mode.At this moment, traditional four
The shape of the heating unit mode formed on the heater plates of angle, as shown in Figure 1, probably shape of the display as trident, line
Interval between road and route is 300mm to 400mm.The shape of above-mentioned heating unit mode, the interval between route and route
Width when heating the substrate of heater plates and side mounted thereto, occurs to heat non-uniform problem.And along heater plates
Exterior angle prolonged heating unit outside line and inside route on its inside between space it is larger, can generate in mould
The problems such as space temperature is uneven between formula.
There are a variety of wire laying modes at present, by line spacing 600~700mm, the 300~400mm of early stage, gradually to
300mm, 200mm, 100mm, 50mm etc. are constantly adjusted, and the quantity of temperature monitoring point is also increasing.It is interior and in conventional processes
External schema causes space temperature otherness, and heating unit is heated with coil shape, since the interval between coil is irregular, together
Sample can cause the temperature difference.
How to improve heater, reduce that the plated film as caused by temperature difference in production is bad and film quality existing for potential wind
Danger, is technical problem in the urgent need to address.
Summary of the invention
Present invention seek to address that the technical problems existing in the prior art.For this purpose, the present invention provides and a kind of reduces the temperature difference
Heater and preparation method thereof and application, it is therefore an objective to reduce the temperature difference in each region of heater.
To achieve the goals above, the technical scheme adopted by the invention is as follows:
A kind of heater reducing the temperature difference, including heater plates, heater plates are interior to be equipped with heating unit, and heating unit includes
Heater plates are divided into symmetrical above and below and symmetrical route distributed areas, and line by exterior loop and interior loop, the interior loop
Line with heating function in the distributed areas of road forms the mode of the route shape of multiple bending inside heater plates to external corner region.
Each route distributed areas of the interior loop are between the middle part line with heating function of heater plates longitudinal direction middle separated time side
It is not connected to.
Each route distributed areas close to heater plates longitudinal direction middle separated time side middle part line with heating function towards heater
The central point bending of plate, and be centrosymmetric distribution with the central point of heater plates.
The line with heating function of the exterior loop is symmetrically distributed in the two sides of heater plates transverse direction middle separated time, and horizontal close to heater plates
The inside bending in exterior loop line with heating function edge to middle separated time, and be not connected between exterior loop line with heating function edge.
The exterior loop line with heating function edge of the heater plates transverse direction middle separated time two sides is opposite with heater plates longitudinal direction middle separated time
Claim setting.
The exterior loop be one circle, the interior loop be six circle, between the line with heating function and line with heating function of the interior loop between
Away from for 101mm, the spacing of external coil and Inside coil is 134mm.
The section of the exterior loop and interior loop is rectilinear form.
The production method of the heater for reducing the temperature difference is first divide as center symmetry axis using the center of substrate adding
Each wiring area of hot cell, digs wiring groove on substrate later, and the pre-buried line shell for installing line with heating function in wiring groove, then
By in the line shell of line with heating function and temperature measuring wire buried wiring slot, finally obtained with after substrate welding.
The application of film quality uniformity and corner survival rate using the heater of the reduction temperature difference in raising deposition film.
Beneficial effects of the present invention: the present invention is by the innovative hot line distribution mode for changing heater, by phase
It answers and is not connected between the line with heating function in region, there is certain spacing, the entire result that is routed can reduce each area of heater substrate
The domain temperature difference is at 7 DEG C or less.For the product of a-si material, the film deposited using heater in the prior art, film quality is uniform
Property be only 7%, and use the improved heater of the present invention, the uniform performance of film quality is very high to 13%；Production for IGZO material
Product, very low in corner survival rate using the film quality of prior art is only a few percent, can using the improved heater of the present invention
Corner survival rate is increased by 20%.
Detailed description of the invention
This specification includes the following drawings, and shown content is respectively:
Fig. 1 is the top view of conventional heater；
Fig. 2 is the top view of the first heater of the invention；
Fig. 3 is the top view of second of heater of the invention；
Fig. 4 is the cross section structure schematic diagram of heating unit；
Fig. 5 is the partial structural diagram of setting masking guiding parts at the pilot hole of heater pedestal.
In the figure, it is marked as
1, heater plates, 2, exterior loop, 3, interior loop, 4, longitudinal middle separated time, the 5, first middle part generate heat line end, and 6, in transverse direction
Separated time, the 7, second middle part fever line end, 8, frame, 9, pilot hole, 10, masking guiding parts.
Specific embodiment
Below against attached drawing, by the description of the embodiment, making to a specific embodiment of the invention further details of
Explanation, it is therefore an objective to those skilled in the art be helped to have more complete, accurate and deep reason to design of the invention, technical solution
Solution, and facilitate its implementation.It should be noted that term " on ", "lower", "front", "rear", "left", "right", "vertical", "inner",
The orientation or positional relationship of the instructions such as "outside" is to be based on the orientation or positional relationship shown in the drawings, and is merely for convenience of describing this hair
Bright and simplified description, rather than the device or element of indication or suggestion meaning must have a particular orientation, with specific orientation
Construction and operation, therefore should not be understood as the limitation to invention.
As shown in Figures 2 to 4, the present invention provides a kind of heater for reducing the temperature difference, including heater plates 1, in heater plates
Equipped with heating unit, heating unit includes exterior loop 2 and interior loop 3, and heater plates are divided into symmetrical above and below and left and right by interior loop
Symmetrical route distributed areas, and the line with heating function in route distributed areas forms multiple folding to external corner region inside heater plates
The mode of curved route shape.The section of exterior loop and interior loop is rectilinear form, has heating unit and uses curve-like,
It can cause local pyrexia away from abnormal, and use the heating unit of rectilinear form, can be avoided and this problem occur, generate heat relatively equal
It is even.
Fig. 2 is the first heater structure provided by the invention, and heater plates are divided into four route distributed areas by interior loop
Domain, four route distributed areas, which are centrosymmetric using the central point of heater plates as symmetry axis, to be distributed on heater plates, outside line
Circle is distributed around the circumferential avris of heater plates, and interior loop is located inside exterior loop, the wire laying mode of such heating unit, so that
Temperature Distribution is comprehensively uniform.Parameter: the length of heating unit is arranged: inner ring is always about 25m, and outer ring is always about 4m.Arrange hot line
When, heater medium density, interval is relatively minimized, so that heater plates are thermally conductive uniformly.
Frame using the CVD lower electrode structure of above-mentioned heater, including heater substrate, on heater substrate
8 and glass, setting is bonded with frame at the pilot hole 9 of heater substrate contacts and can be to the lifting part gone up and down along pilot hole
The masking guiding parts 10 (as shown in Figure 5) being oriented to, glass are set on frame and masking guiding parts.Pilot hole is nearby set
It sets and is bonded the masking guiding parts contacted with frame, glass cover can play the role of masking and guiding after above, in addition,
Also play the role of certain carrying to glass.Matrix is aluminum heating pedestal, and material Al6061 covers guiding parts and lifting
Component is all made of ceramic aluminum oxide production.Compared with glass edge is covered by frame in the prior art, such structure setting
In, glass is located on heating pedestal and frame, and no overlay area deposits glass completely.By by the above technology
Schemes synthesis, i.e. FDST (full deposition Susceptor) combine MDST (minimum deviation
Susceptor a kind of new technology, abbreviation FMST) are obtained.Glass edge can be efficiently used, while realizing deposition and temperature completely
Minimum deflection function.Guarantee that discharge off phenomenon generates, improve surface temperature uniformity, improves deposit uniformity, tradition can be improved
The partially thick problem in quadrangle.Spare unit (Ceramic Guide, Rest Button) FMST of equally applicable FDST can be standby with FDST
Product are mixed, without increasing.Need not adjustment equipment other, can directly use on the machine,
Verifying and volume production effect are good.
Thermometric experiment: the heating temperature of interior loop is set as 340 DEG C, the heating temperature of exterior loop is 350 DEG C, and cavity is evacuated to
Vacuum state (1torr), is passed through N2, Temperature Distribution in use, detects 143 points, each test point altogether using the above structure
Temperature (DEG C) data such as the following table 1:
From table 1 it follows that the minimum temperature value of detection is 328 DEG C, maximum temperature values are 334 DEG C, calculate average value
It is 331.6 DEG C, temperature difference fluctuation range is within 7.0 DEG C.Pass through the heater of application above temperature difference transformation, the heterogeneity of film quality
3~4% are reduced to by the 7~8% of genuine；Corner survival rate is promoted by 75% to 95%.
It as shown in Figure 3 and Figure 4, is second of heater structure provided by the invention, each route distributed areas of interior loop 3
It is not connected between the middle part line with heating function of 4 side of heater plates longitudinal direction middle separated time.Definition herein middle part fever thread end be
The first middle part fever line end 5 of line, the first middle part line with heating function are not located at respective lines distributed areas close to longitudinal middle separated time 4 one
The middle part of side, positioned at longitudinal middle separated time two sides first middle part fever line end 5 using longitudinal middle separated time as symmetry axis, herein middle part phase
Line with heating function is not connected between neighbouring region, there is spacing, can reduce each space temperature variation of substrate.In order to further increase Temperature Distribution
Uniformity, preferably reduces the temperature difference, and middle part line with heating function of each route distributed areas close to heater plates longitudinal direction middle separated time side is equal
It is centrosymmetric distribution towards the central point bending of heater plates, and with the central point of heater plates.Specifically, interior loop will
Heater plates are divided into four route distributed areas, and the first middle part fever line end 5 in four route distributed areas is with heater plates
Central point be centrosymmetric distribution.
Further, the line with heating function of exterior loop 2 is symmetrically distributed in the two sides of heater plates transverse direction middle separated time 6, and close to plus
The inside bending in exterior loop line with heating function edge of hot device plate transverse direction middle separated time, and be not connected between exterior loop line with heating function edge.In order to
The temperature difference is further decreased, the exterior loop line with heating function edge of heater plates transverse direction middle separated time two sides is with heater plates longitudinal direction middle separated time phase
It is symmetrical arranged.Furthermore coil heating line edge is located at the middle side edge of heater plates, and furthermore coil heating line edge is for definition
Generate heat line ends 7 in the middle part of in the of two, is not connected between adjacent second middle part fever line end, has spacing, cooperate with above-mentioned first middle part line with heating function
The use at end enables entire wiring result to reduce the heater temperature difference of each region temperature difference of substrate at 7 DEG C or less.
The production method of the heater of the above-mentioned reduction temperature difference is first divide as center symmetry axis using the center of substrate adding
Each wiring area of hot cell, digs wiring groove on substrate later, and the pre-buried line shell for installing line with heating function in wiring groove, then
By in the line shell of line with heating function and temperature measuring wire buried wiring slot, finally obtained with after substrate welding.When specific operation, coil uses
The mode of straight line is to Al6060 matrix first according to drawing size, and grooving, the base position of wiring is matrix center, whole
It is centrosymmetric.The shell sunken cord after grooving in internal installation, then heating wires and temperature measuring wire are embedded in it according to wires design
In, same aluminum substrate welding is finally carried out, an entirety is formed.
It is illustrated by taking the matched heater of G8.5 liquid crystal display panel as an example, heating unit wire laying mode is divided into inside and outside
Two major classes, exterior loop are a circle, and interior loop is six circles, are divided into symmetrical four part, symmetrical above and below, bilateral symmetry, with first
It is divided into example and illustrates size, lead enters first segment circular arc, start point distance middle line 37mm, and circular arc horizontal vertical projection size is
36mm, next knee, long 100mm, wide 2mm, R60；The spacing of turning radius R61, inner wire and line is 101mm；Outside
Portion's coil, circular arc radius are R60, and horizontal vertical projection is respectively 154mm, and 5mm, external coil is away from Inside coil 134mm.
It is 340 DEG C that G8.5 heater, which actually uses temperature, and setting maximum temperature is 360 DEG C；
When measuring temperature is 180 DEG C, 179.2 DEG C of min (Avg), 181.4 DEG C of max (Avg), temperature difference section are 2.20 DEG C；
When measuring temperature is 225 DEG C, 224.1 DEG C of min (Avg), 227.8 DEG C of max (Avg), temperature difference section are 3.7 DEG C；When measurement temperature
When degree is 270 DEG C, 267.64 DEG C of min (Avg), 271.26 DEG C of max (Avg), temperature difference section are 3.62 DEG C when measuring temperature is 333
DEG C when, 332.0 DEG C of min (Avg), 335.3 DEG C of max (Avg), temperature difference section be 3.3 DEG C.
Thermometric experiment:
One, 333 DEG C of set temperature, cavity are evacuated to vacuum state (1torr), are passed through N2, using the above structure in use
Temperature Distribution, altogether detect 143 points, temperature (DEG C) data such as the following table 2 of each test point:
From Table 2, it can be seen that the minimum temperature value of detection is 328 DEG C, maximum temperature values are 335 DEG C, calculate average value
It is 331.6 DEG C, temperature difference fluctuation range is within 7.0 DEG C.Temperature difference uniformity u%=(max-min)/(max+min)=7/663=
1.06%.
Two, 280 DEG C of set temperature, cavity are evacuated to vacuum state (1torr), are passed through N2, using the above structure in use
Temperature Distribution, altogether detect 143 points, temperature (DEG C) data such as the following table 3 of each test point:
| 281 | 280 | 280 | 278 | 277 | 277 | 279 | 277 | 279 | 280 | 280 |
| 281 | 281 | 280 | 279 | 278 | 277 | 278 | 279 | 280 | 280 | 281 |
| 281 | 282 | 280 | 280 | 278 | 277 | 279 | 279 | 280 | 280 | 280 |
| 281 | 281 | 280 | 279 | 278 | 277 | 279 | 280 | 280 | 281 | 281 |
| 280 | 281 | 282 | 279 | 278 | 278 | 278 | 279 | 280 | 279 | 280 |
| 281 | 281 | 281 | 280 | 278 | 278 | 279 | 279 | 280 | 280 | 281 |
| 280 | 281 | 281 | 280 | 278 | 278 | 279 | 279 | 280 | 280 | 281 |
| 281 | 281 | 280 | 279 | 279 | 278 | 279 | 279 | 280 | 280 | 280 |
| 280 | 281 | 281 | 281 | 279 | 279 | 279 | 279 | 281 | 281 | 281 |
| 280 | 280 | 280 | 280 | 279 | 279 | 279 | 279 | 281 | 280 | 280 |
| 280 | 279 | 278 | 281 | 279 | 279 | 279 | 280 | 281 | 280 | 280 |
| 279 | 279 | 280 | 279 | 279 | 277 | 279 | 281 | 280 | 280 | 279 |
| 278 | 280 | 280 | 280 | 280 | 278 | 279 | 280 | 280 | 279 | 278 |
From table 3 it is observed that the minimum temperature value of detection is 277 DEG C, maximum temperature values are 282 DEG C, calculate average value
It is 279.5 DEG C, temperature difference fluctuation range is within 5.0 DEG C.Temperature difference uniformity u%=(max-min)/(max+min)=5/559=
0.89%.
G8.5 display panel master material to be applied has, a-si, IGZO, LTPS, OLED；For the product of a-si material,
The film deposited using heater in the prior art, film quality uniformity is only 7%, and uses the improved heating of the present invention
Device, the uniform performance of film quality are very high to 13%；For the product of IGZO material, using prior art film quality corner survival rate very
Low is only a few percent, using the improved heater of the present invention, corner survival rate can be increased by 20%.
The present invention is exemplarily described in conjunction with attached drawing above.Obviously, present invention specific implementation is not by above-mentioned side
The limitation of formula.As long as using the improvement for the various unsubstantialities that the inventive concept and technical scheme of the present invention carry out；Or not
It is improved, above-mentioned conception and technical scheme of the invention are directly applied into other occasions, in protection scope of the present invention
Within.
Claims (9)
1. a kind of heater for reducing the temperature difference, including heater plates, heater plates are interior to be equipped with heating unit, and heating unit includes outer
Coil and interior loop, which is characterized in that heater plates are divided into symmetrical above and below and symmetrical route and are distributed by the interior loop
Region, and the line with heating function in route distributed areas forms the route shape of multiple bending inside heater plates to external corner region
Mode.
2. reducing the heater of the temperature difference according to claim 1, which is characterized in that each route distributed areas of the interior loop
It is not connected between the middle part line with heating function of heater plates longitudinal direction middle separated time side.
3. reducing the heater of the temperature difference according to claim 2, which is characterized in that each route distributed areas are close to heating
The middle part line with heating function of device plate longitudinal direction middle separated time side is towards the central point bending of heater plates, and with the central point of heater plates
Be centrosymmetric distribution.
4. reducing the heater of the temperature difference according to claim 1, which is characterized in that the line with heating function of the exterior loop is symmetrical
In the two sides of heater plates transverse direction middle separated time, and close to the exterior loop line with heating function edge of heater plates transverse direction middle separated time to infolding
It is curved, and be not connected between exterior loop line with heating function edge.
5. reducing the heater of the temperature difference according to claim 4, which is characterized in that the heater plates transverse direction middle separated time two sides
Exterior loop line with heating function edge with the symmetrical setting of heater plates longitudinal direction middle separated time.
6. reducing the heater of the temperature difference according to claim 4, which is characterized in that the exterior loop is a circle, the interior lines
Circle is six circles, and the spacing between the line with heating function and line with heating function of the interior loop is 101mm, the spacing of external coil and Inside coil
For 134mm.
7. reducing the heater of the temperature difference according to claim 1, which is characterized in that the section of the exterior loop and interior loop is equal
For rectilinear form.
8. the production method of any one of -7 heaters for reducing the temperature difference according to claim 1, which is characterized in that the production
Method is first divide using the center of substrate as center symmetry axis each wiring area of heating unit, digs cloth on substrate later
Wire casing, and the pre-buried line shell for installing line with heating function in wiring groove, then by the line shell of line with heating function and temperature measuring wire buried wiring slot
It is interior, finally obtained with after substrate welding.
9. using any one of the claim 1-7 heater for reducing the temperature difference on film quality uniformity and the side for improving deposition film
The application of angle survival rate.
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| CN201910666047.4A CN110241403B (en) | 2019-07-23 | 2019-07-23 | Heater capable of reducing temperature difference and manufacturing method and application thereof |
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| CN201910666047.4A CN110241403B (en) | 2019-07-23 | 2019-07-23 | Heater capable of reducing temperature difference and manufacturing method and application thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113025999A (en) * | 2019-12-24 | 2021-06-25 | 上海思擎企业管理合伙企业(有限合伙) | Heating device |
Citations (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN110241403B (en) | 2024-09-06 |
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