KR20150037075A - Heater - Google Patents
Heater Download PDFInfo
- Publication number
- KR20150037075A KR20150037075A KR20130116298A KR20130116298A KR20150037075A KR 20150037075 A KR20150037075 A KR 20150037075A KR 20130116298 A KR20130116298 A KR 20130116298A KR 20130116298 A KR20130116298 A KR 20130116298A KR 20150037075 A KR20150037075 A KR 20150037075A
- Authority
- KR
- South Korea
- Prior art keywords
- heater plate
- heating element
- heater
- pattern
- substrate
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/54—Heating elements having the shape of rods or tubes flexible
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Resistance Heating (AREA)
Abstract
Description
The present invention relates to a heater, and more particularly, to a heater having improved temperature uniformity.
As technology develops in flat panel display (FPD) substrate processing, a heater having excellent temperature uniformity is required for a heat source device required for a large panel process. As technology develops, the temperature uniformity of the heat source required for the process is an important determinant of yield.
A typical heater for heating a substrate includes a heater plate on which a substrate is placed and a heating element disposed in the heater plate, the heating element extending outward from the center of the heater plate, as disclosed in Korean Patent No. 10-0726931 So as to form a predetermined shape. At this time, the shape of the heating element pattern formed on the conventional rectangular heater plate is approximately triangular shape as shown in FIGS. 3 and 5, and the distance between the lines and the lines is 300 mm to 400 mm. In the case of such a shape of the heating element pattern, the distance between the line and the line is widened, and the heater plate and the substrate mounted on the heater plate are heated unevenly. In addition, there is a problem that the spacing distance between the outer line of the heating element extending along the outer periphery of the heater plate and the inner line located inside thereof is large, and the temperature uniformity in the space between the patterns is poor.
As shown in FIG. 5, a heating element is heated in a coil shape. In the case of such a heating element, a gap between the coils is not constant, which causes a temperature difference in the heater plate.
The present invention provides a heater with improved temperature uniformity.
Further, the present invention provides a substrate processing apparatus including a heater having improved temperature uniformity.
A heater according to the present invention is a heater plate on which a substrate is placed. And a heating element inserted in the heater plate and heating the heater plate; The heating element extends from the heater plate to an outer peripheral region, and forms a line-shaped pattern that is bent a plurality of times.
Wherein the pattern of the heating element is an outer pattern formed along the outer periphery of the center of the heater plate; And an inner pattern located in an inner region of the outer pattern and extending outward from a center of the heater plate.
According to the embodiment of the present invention, the substrate can be uniformly heated.
1 is a top view illustrating a heater according to an embodiment of the present invention.
2 is a cross-sectional view showing a cross-sectional view according to an embodiment of the present invention
3 and 4 are top views showing a conventional heater.
5 is a cross-sectional view showing a conventional heating element
Hereinafter, embodiments of the present invention will be described in detail. It should be understood, however, that the invention is not limited to the disclosed embodiments, but is capable of other various forms of implementation, and that these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know completely.
Referring to FIG. 1, a heater according to an embodiment of the present invention includes a heater plate on which a substrate is placed, and a heater that is installed in the heater plate and heats the heater plate. Here, the heating element extends from the heater plate to the outer peripheral region, and forms a line-shaped pattern bent several times. The pattern of the heating element includes an outer pattern formed along the outer periphery from the center of the heater plate and an inner pattern located in the inner region of the outer pattern and formed to extend outward from the center of the heater plate.
The heating zone for heating the substrate in the heater plate is composed of, for example, two inner patterns located inside and two outer patterns located at the outer area, It takes up more than 70% of the plate and generates heat. In addition, the outer zone is responsible for a heating area of 30% or less, so that the edge area is heated to minimize temperature uniformity.
At this time, the distance between the line and the line that makes the heat is 150 mm or less, more preferably 100 mm or less, and the interval between the lines and the lines may be formed to have a uniform interval or a different interval for each zone.
The shape of the heating element pattern is the same as that of the outer shape of the product. Since the outer shape of the product is quadrilateral, the pattern also has a quadrangular shape. In the case of the inner pattern, it starts from the center of the product and diverges to the left and right. Then, it branches off from the center of the 1/4 point again and forms a quadrangle like the outer shape of the product, pattern. In the case of the outer pattern, the outermost part of the product is turned to a quadrangle and is located at the center.
In the case of the inner pattern, it may be constituted by 6 turns with an interval of 150 mm or less. In the case of the outer pattern, the outer shape may be composed of 1 turn.
In the present invention, a coil-shaped heating element is not used for the internal heating element, and a heating element made of a linear heating element is used. The reason is that the coil-shaped heating element has a constant gap between the coils, which causes local temperature difference in the heating element tube, which causes the temperature difference of the product. However, a linear heating element, which is not a coil, does not generate localized heat and generates heat at a constant temperature, which greatly affects the temperature uniformity of the product.
100: heater
Claims (2)
A heating element installed in the heater plate to heat the heater plate;
;
Wherein the heating element extends from the heater plate to an outer peripheral region and forms a line-shaped pattern bent a plurality of times.
Wherein the pattern of the heating element is an outer pattern formed along the outer periphery of the center of the heater plate; And
An inner pattern located in an inner region of the outer pattern and extending outward from a center of the heater plate;
.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20130116298A KR20150037075A (en) | 2013-09-30 | 2013-09-30 | Heater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20130116298A KR20150037075A (en) | 2013-09-30 | 2013-09-30 | Heater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20150037075A true KR20150037075A (en) | 2015-04-08 |
Family
ID=53033118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR20130116298A KR20150037075A (en) | 2013-09-30 | 2013-09-30 | Heater |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20150037075A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160132174A (en) * | 2015-05-06 | 2016-11-17 | (주)티티에스 | Heater |
| KR20180024178A (en) * | 2016-08-29 | 2018-03-08 | 주성엔지니어링(주) | Susceptor and substrate disposition apparatus including the same |
| WO2018070765A1 (en) * | 2016-10-12 | 2018-04-19 | 주성엔지니어링(주) | Substrate placing part that is arranged in substrate processing apparatus |
| CN110241403A (en) * | 2019-07-23 | 2019-09-17 | 芜湖通潮精密机械股份有限公司 | A kind of heater and preparation method thereof reducing the temperature difference and application |
-
2013
- 2013-09-30 KR KR20130116298A patent/KR20150037075A/en not_active Application Discontinuation
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160132174A (en) * | 2015-05-06 | 2016-11-17 | (주)티티에스 | Heater |
| KR20180024178A (en) * | 2016-08-29 | 2018-03-08 | 주성엔지니어링(주) | Susceptor and substrate disposition apparatus including the same |
| WO2018070765A1 (en) * | 2016-10-12 | 2018-04-19 | 주성엔지니어링(주) | Substrate placing part that is arranged in substrate processing apparatus |
| US11469135B2 (en) | 2016-10-12 | 2022-10-11 | Jusung Engineering Co., Ltd. | Substrate placing part that is arranged in substrate processing apparatus |
| CN110241403A (en) * | 2019-07-23 | 2019-09-17 | 芜湖通潮精密机械股份有限公司 | A kind of heater and preparation method thereof reducing the temperature difference and application |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |