CN110237709A - Silicon chip surface based on solar cell manufacture process inhibits method for oxidation - Google Patents
Silicon chip surface based on solar cell manufacture process inhibits method for oxidation Download PDFInfo
- Publication number
- CN110237709A CN110237709A CN201910621992.2A CN201910621992A CN110237709A CN 110237709 A CN110237709 A CN 110237709A CN 201910621992 A CN201910621992 A CN 201910621992A CN 110237709 A CN110237709 A CN 110237709A
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- Prior art keywords
- filter
- drying
- air
- ozone
- high efficiency
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 44
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 44
- 239000010703 silicon Substances 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims abstract description 42
- 230000003647 oxidation Effects 0.000 title claims abstract description 24
- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000001035 drying Methods 0.000 claims abstract description 87
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 62
- 238000004378 air conditioning Methods 0.000 claims abstract description 16
- 238000009423 ventilation Methods 0.000 claims abstract description 9
- 230000005540 biological transmission Effects 0.000 claims abstract description 4
- 238000012545 processing Methods 0.000 claims abstract description 4
- 238000012360 testing method Methods 0.000 claims abstract description 4
- 238000004140 cleaning Methods 0.000 claims description 12
- 235000008216 herbs Nutrition 0.000 claims description 11
- 210000002268 wool Anatomy 0.000 claims description 11
- 238000003466 welding Methods 0.000 claims description 9
- 238000001914 filtration Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 230000006641 stabilisation Effects 0.000 abstract description 4
- 238000011105 stabilization Methods 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000001590 oxidative effect Effects 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 230000000881 depressing effect Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8671—Removing components of defined structure not provided for in B01D53/8603 - B01D53/8668
- B01D53/8675—Ozone
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/003—Supply-air or gas filters
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses the silicon chip surfaces based on solar cell manufacture process to inhibit method for oxidation, the following steps are included: S1 device is chosen, the processing of S2 device, the connection of S3 drying tank, S4 ventilation test, the beneficial effects of the present invention are: fully ensuring that silicon chip surface not by ozone oxidation by ozone filter；It is connected by multiple gas transmission pipe ends with workshop, while ozone filter is set, improves ozone removal efficiency；By air-conditioning system, the stabilization of temperature in workshop is realized.
Description
Technical field
The present invention relates to the anti-oxidation fields of ozone, and the silicon chip surface specifically based on solar cell manufacture process inhibits oxidation
Method.
Background technique
In solar cell manufacturing process, silicon wafer after making herbs into wool is cleaned is entering next step chemical vapor deposition
(CVD) it before technique, is usually saved in air environment, the oxygen and ozone in air can aoxidize silicon chip surface, be formed
Layer of oxide layer.Ozone concentration changes, the various electrical equipments in workshop with the variation of Ozone in Atmosphere concentration in workshop
Ozone may also be generated, causes the ozone concentration in workshop to fluctuate very big.Since the oxidability of ozone is eager to excel much than oxygen,
The degree of oxidation that the fluctuation of ozone concentration directly results in silicon chip surface generates fluctuation, and when carrying out CVD technique, silicon chip surface is aoxidized
The thickness and consistency of layer change with the variation of ozone concentration, therefore between the amorphous silicon of CVD deposition and silicon wafer crystalline silicon
Interface state be not able to maintain stabilization, final battery efficiency can generate larger fluctuation.
Existing solar cell workshop does not control the concentration of ozone in workshop condition, cleaned silicon wafer
In air, the ozone concentration variation in the length and air of exposure duration can all lead to silicon for exposure before entering CVD equipment
The degree of oxidation of piece is non-constant.In addition, silicon chip drying equipment is usually using the air or compressed air in workshop, by heating
Hot-air recycles in drying tank afterwards, and the silicon wafer after cleaning is dried, the change for the ozone concentration that this process silicon wafer touches
Change but also the degree of oxidation of silicon wafer changes.Lack in prior art to ozone concentration in workshop and silicon chip drying equipment
Control, increases the fluctuation range of battery efficiency, influences the stability of product quality.
Summary of the invention
It is an object of the invention to overcome the deficiencies of the prior art and provide the silicon chip surfaces based on solar cell manufacture process
Inhibit method for oxidation, to steady removal ozone, control drying tank ozone concentration.
The purpose of the present invention is achieved through the following technical solutions: the silicon chip surface based on solar cell manufacture process
Inhibit method for oxidation, comprising the following steps:
S1 device is chosen: selecting and is successively arranged primary filter, air-conditioning system, medium effeciency filter along air delivery direction
Fresh air system selects end to have the appendix of high efficiency particulate air filter, sets CVD chamber and making herbs into wool cleaning equipment in selection
The ozone filter of solid Ozone Absorption agent or ozone catalyst is selected in the workshop of equipment；
The processing of S2 device: welding fresh air system and appendix along air delivery direction, the appendix end with high efficiency particulate air filter
End is welded on workshop top, and workshop two sides are welded with vent, at the same by ozone filter be fixed on medium effeciency filter with
Between high efficiency particulate air filter and abut high efficiency particulate air filter.
The connection of S3 drying tank: exhaust outlet will be dried in the welding of drying tank side in making herbs into wool cleaning equipment, while dries exhaust
Blower is dried in the welding of mouth end；It is welded with drying air inlet below drying blower, top is welded with drying appendix, dries simultaneously
Dry appendix end bend setting, and be equipped with drying high efficiency particulate air filter, the drying appendix pass through drying high efficiency particulate air filter and
It is communicated at the top of drying tank.
S4 ventilation test: air is passed through before fresh air system, air ozone content in sequentially determining workshop, drying tank.
Preferably, the ozone filter is before the also optional primary filter in air delivery direction, primarily efficient filter
Between device and medium effeciency filter, between high efficiency particulate air filter and workshop in one or more in three positions, and then can sufficiently go
Except the ozone in air used.
Preferably, it is additionally provided with drying ozone filter between the drying high efficiency particulate air filter and drying appendix, it is described
Drying ozone filter may be also secured between drying tank high efficiency particulate air filter and drying tank, and then guarantee drying silicon chip surface
Ozone content is low in air.
Preferably, the fresh air system is provided with several ventilation holes along conveying direction, and then it is same to improve air flow rate
When sufficiently allow air to come into full contact with primary filter, medium effeciency filter, remove air in impurity.
Preferably, the appendix is connected by multiple ends equipped with high efficiency particulate air filter with workshop, and then is improved empty
The removal efficiency of ozone in gas.
Preferably, the air-conditioning system is equipped with heating plate, air-conditioning draught fan, cold plate along air delivery direction, passes through sky
Adjust blower that air circulation, heating plate or cold plate is accelerated to need to heat air or freezed for different.
Preferably, the drying tank air inlet pipe is equipped with drying layer along air delivery direction front end, and then prevents drying tank
Influence of the moisture in air used to silicon chip surface oxidizing and depressing.
Preferably, the primary filter uses aperture for 5-10 μm of strainer；The medium effeciency filter use aperture for
1-5 μm of strainer；The high efficiency particulate air filter uses aperture for 0.1-0.5 μm of strainer.
The beneficial effects of the present invention are:
1. by installing ozone filtering in the drying tank of making herbs into wool cleaning equipment, the fresh air system equipped with multiple ventilation holes
Device fully ensures that after silicon chip surface cleans in workshop not by ozone oxidation, while improving the transfer efficiency of air.
2. being connected by multiple gas transmission pipe ends equipped with high efficiency particulate air filter with workshop, workshop air intake efficiency is improved,
Ozone filter is set between high efficiency particulate air filter and medium effeciency filter simultaneously, and then improves the removal efficiency of ozone in air.
3. utilizing air-conditioning draught fan by being equipped with heating plate, the air-conditioning system of air-conditioning draught fan, cold plate along air delivery direction
Accelerate air circulation, heating plate or cold plate to need to heat air or freezed for different, and then realizes temperature in workshop
The stabilization of degree, while also can guarantee the constant of air velocity.
4. drying layer is equipped with along air delivery direction front end by drying tank air inlet pipe, the dry air for entering drying tank
And then prevent influence of the moisture in air used in drying tank to silicon chip surface oxidizing and depressing.
5. by using the graphene primary filter of plate-type filtering mode, the nylon medium air filtration of modular filter mode
The ultra-fine fibre glass paper high efficiency particulate air filter of device, plate-type filtering mode, and then filter impurity in air sufficiently, while using and dividing
Grade filter type improves device and crosses air filtering efficiency.
Detailed description of the invention
Fig. 1 is the schematic device that silicon chip surface oxidizing and depressing method of the invention is chosen；
Fig. 2 is the air-conditioning system schematic diagram of silicon chip surface oxidizing and depressing method of the present invention；
Fig. 3 is the drying tank air inlet pipe schematic diagram of silicon chip surface oxidizing and depressing method of the present invention；
Fig. 4 is the fresh air system schematic diagram of silicon chip surface oxidizing and depressing method of the present invention.
Specific embodiment
Technical solution of the present invention is described in further detail with reference to the accompanying drawing, but protection scope of the present invention is not limited to
It is as described below.
As shown in Figure 1, the silicon chip surface based on solar cell manufacture process inhibits method for oxidation, comprising the following steps:
S1 device is chosen: selecting and is successively arranged primary filter 2, air-conditioning system 4, medium effeciency filter along air delivery direction
3 fresh air system 1 selects end to have the appendix 5 of high efficiency particulate air filter 6, sets CVD chamber 10 and making herbs into wool in selection
The ozone filter 7 of solid Ozone Absorption agent or ozone catalyst is selected in the workshop 8 of cleaning equipment equipment 9；
S2 device processing: along air delivery direction welding fresh air system 1 and appendix 5, with the multiple defeated of high efficiency particulate air filter 6
5 end of tracheae is welded on 8 top of workshop, and 8 two sides of workshop are welded with the exhaust of exhaust outlet 12, while ozone filter 7 being fixed on
Between medium effeciency filter 3 and high efficiency particulate air filter 6 and high efficiency particulate air filter 6 is abutted, and then sufficiently reduces ozone content in workshop 8.
The connection of S3 drying tank: exhaust outlet 93 will be dried in the welding of 91 side of drying tank in making herbs into wool cleaning equipment 9, dried simultaneously
Blower 95 is dried in the welding of 93 end of exhaust outlet；Drying air inlet 94 is welded with below drying blower 95, top is welded with drying
Appendix 92, while the setting of 92 end bend of appendix is dried, and be equipped with drying high efficiency particulate air filter 96, the drying appendix 92
It is communicated at the top of drying high efficiency particulate air filter 96 and drying tank 91, and then realizes " returning " shape structure of 91 gas transmission route of drying tank,
Simultaneously dry ozone filter 97 be fixed on drying appendix 92 and drying tank high efficiency particulate air filter 96 between, and then fully absorb into
Enter the air of drying tank.
S4 ventilation test: air, air ozone content in sequentially determining workshop 8, drying tank 9 are passed through before fresh air system 1.
As shown in Fig. 2, the air-conditioning system 4 is equipped with heating plate 41, air-conditioning draught fan 42, cold plate along air delivery direction
43, accelerate air circulation, heating plate or cold plate to need to heat air or freezed for different using air-conditioning draught fan, into
And realize the stabilization of temperature in workshop, while also can guarantee the constant of air velocity.
As shown in figure 3, the drying air inlet pipe 94 of the drying tank 91 is equipped with drying layer along air delivery direction front end
941, and then prevent influence of the moisture in air used in drying tank to silicon chip surface oxidizing and depressing.
As shown in figure 4, the fresh air system is equipped with several ventilation holes 11, by the ventilation hole 11 of setting, cooperate air-conditioning
Blower 42, accelerating air velocity contacts air sufficiently with primary filter 2, medium effeciency filter 3 simultaneously.
Further, the primary filter 2 uses aperture for 5 μm of strainer；The medium effeciency filter 3 uses hole
The strainer that diameter is 1 μm；The high efficiency particulate air filter 4 uses aperture sufficiently to filter off for 0.5 μm of strainer by filters at different levels
Except impurity in air, while classified filtering mode is used, improves device filter efficiency.
Embodiment 1
Silicon chip surface through the invention inhibits method for oxidation, does not use the ozone filter 7 in S1 and S2, together
When S3 in also do not use drying ozone filter 97, measure respectively in workshop 8 in making herbs into wool cleaning equipment 9 in drying tank 91
Ozone concentration when 16:00 is 10ppb, 8ppb.
Embodiment 2
Silicon chip surface through the invention inhibits oxidative system, does not use the ozone filter 7 in S1 and S2, but
Drying ozone filter 97 described in S3 selects between drying appendix 92 and drying tank high efficiency particulate air filter 96 and abuts drying tank
High efficiency particulate air filter 96 measures in workshop 8 respectively and divides with the ozone concentration in drying tank 91 in making herbs into wool cleaning equipment 9 in 16:00
It Wei not 2ppb, 4ppb.
Embodiment 3
Silicon chip surface through the invention inhibits oxidative system, and the ozone filter 7 described in S1 and S2 is defeated along air
Direction is sent to select between medium effeciency filter 3 and high efficiency particulate air filter 6 and against high efficiency particulate air filter 6, while the drying described in S3 is smelly
Drying tank high efficiency particulate air filter 96 is selected between drying appendix 92 and drying tank high efficiency particulate air filter 96 and abutted to oxygen filter 97, point
It Ce Ding not be respectively 2ppb, 1ppb with the ozone concentration in drying tank 91 in making herbs into wool cleaning equipment 9 in 16:00 in workshop 8.
By embodiment 1,2,3 it is found that inhibiting method for oxidation that can effectively drop by using silicon chip surface of the invention
Ozone concentration in the gas of low latitude, while being set between the medium effeciency filter in workshop 83 and high efficiency particulate air filter 6 and against high efficiency particulate air filter 6
It sets between the drying appendix 92 and drying tank high efficiency particulate air filter 96 of ozone filter 7, drying tank 91 and efficient against drying tank
The setting drying ozone filter 97 of filter 96 can effectively reduce the ozone content during silicon wafer surface cleaning, and then reach
Silicon chip surface inhibits the purpose of oxidation.
The above is only a preferred embodiment of the present invention, it should be understood that the present invention is not limited to described herein
Form should not be regarded as an exclusion of other examples, and can be used for other combinations, modifications, and environments, and can be at this
In the text contemplated scope, modifications can be made through the above teachings or related fields of technology or knowledge.And those skilled in the art institute into
Capable modifications and changes do not depart from the spirit and scope of the present invention, then all should be in the protection scope of appended claims of the present invention
It is interior.
Claims (9)
1. the silicon chip surface based on solar cell manufacture process inhibits method for oxidation, it is characterised in that: the following steps are included:
S1 device is chosen: selecting the fresh air that primary filter, air-conditioning system, medium effeciency filter are successively arranged along air delivery direction
System selects end to have the appendix of high efficiency particulate air filter, sets CVD chamber and making herbs into wool cleaning equipment equipment in selection
Workshop, select the ozone filter of solid Ozone Absorption agent or ozone catalyst；
The processing of S2 device: welding fresh air system and appendix along air delivery direction, the gas transmission pipe end weldering with high efficiency particulate air filter
It connects in workshop top, workshop two sides are welded with vent, while ozone filter is fixed on medium effeciency filter and efficiently
Between filter and abut high efficiency particulate air filter；
The connection of S3 drying tank: exhaust outlet will be dried in the welding of drying tank side in making herbs into wool cleaning equipment, while dries exhaust outlet end
Blower is dried in the welding of end；It is welded with drying air inlet below drying blower, top is welded with drying appendix, while drying defeated
The setting of tracheae end bend, and it is equipped with drying high efficiency particulate air filter, the drying appendix passes through drying high efficiency particulate air filter and drying
Groove top portion communicates；
S4 ventilation test: air is passed through before fresh air system, air ozone content in sequentially determining workshop, drying tank.
2. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
Before primary filter also can be selected along air delivery direction in: the ozone filter, primary filter and medium air filtration
Between device, between high efficiency particulate air filter and workshop in one or more in three positions.
3. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
In: drying ozone filter, the drying ozone filtering are additionally provided between the drying high efficiency particulate air filter and drying appendix
Device is against drying high efficiency particulate air filter.
4. the silicon chip surface according to claim 3 based on solar cell manufacture process inhibits method for oxidation, feature exists
In: the drying ozone filter may be also secured between drying tank high efficiency particulate air filter and drying tank.
5. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
In: the fresh air system is provided with several ventilation holes along conveying direction.
6. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
In: the appendix is communicated by multiple ends equipped with high efficiency particulate air filter with workshop.
7. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
In: the air-conditioning system is equipped with heating plate, air-conditioning draught fan, cold plate along air delivery direction.
8. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
In: the drying tank air inlet pipe is equipped with drying layer along air delivery direction front end.
9. the silicon chip surface according to claim 1 based on solar cell manufacture process inhibits method for oxidation, feature exists
Use aperture for 5-10 μm of strainer in: the primary filter；The medium effeciency filter uses aperture for 1-5 μm of filter
Net；The high efficiency particulate air filter uses aperture for 0.1-0.5 μm of strainer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910621992.2A CN110237709A (en) | 2019-07-10 | 2019-07-10 | Silicon chip surface based on solar cell manufacture process inhibits method for oxidation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910621992.2A CN110237709A (en) | 2019-07-10 | 2019-07-10 | Silicon chip surface based on solar cell manufacture process inhibits method for oxidation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110237709A true CN110237709A (en) | 2019-09-17 |
Family
ID=67891728
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910621992.2A Pending CN110237709A (en) | 2019-07-10 | 2019-07-10 | Silicon chip surface based on solar cell manufacture process inhibits method for oxidation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110237709A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114993028A (en) * | 2022-06-17 | 2022-09-02 | 广东高景太阳能科技有限公司 | Silicon wafer drying treatment method and system |
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| CN114993028A (en) * | 2022-06-17 | 2022-09-02 | 广东高景太阳能科技有限公司 | Silicon wafer drying treatment method and system |
| CN114993028B (en) * | 2022-06-17 | 2023-05-30 | 高景太阳能股份有限公司 | Silicon wafer drying treatment method and system |
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