CN110205585B - 一种镜筒一体黑镀膜及其制作工艺 - Google Patents

一种镜筒一体黑镀膜及其制作工艺 Download PDF

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CN110205585B
CN110205585B CN201910480933.8A CN201910480933A CN110205585B CN 110205585 B CN110205585 B CN 110205585B CN 201910480933 A CN201910480933 A CN 201910480933A CN 110205585 B CN110205585 B CN 110205585B
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李顶雄
许远飞
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Xuzhou Kaicheng Technology Co ltd
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Abstract

本发明公开了一种镜筒一体黑镀膜,镜筒一体黑镀膜包覆于镜筒的表面,包括三层膜系结构,依次为BlackA膜层、Al2O3膜层和SiO2膜层;BlackA膜层与镜筒相接触;BlackA膜层的厚度为70~100nm;Al2O3膜层的厚度为30~60nm;SiO2膜层的厚度为50~90nm。本发明的镜筒一体黑镀膜可以使镜头和镜筒组装后颜色基本一致,不产生偏色,大大提升了美感和使用感受,同时本发明的镜筒一体黑镀膜的制作工艺简单,易于推广使用。

Description

一种镜筒一体黑镀膜及其制作工艺
技术领域
本发明涉及光学通讯领域,特别涉及一种镜筒一体黑镀膜及其制作工艺。
背景技术
目前智能手机已经成了人类的必需品,其市场规模相当庞大,人们在使用手机的同时,也对手机的要求也越来越高,不仅仅要求性能体验良好,同时对于手机的外观要求也在提升。众所周知,所有的手机后置摄像头的镜片连其镜筒是裸露在外部的,而镜筒是灰黑色塑料材料制作,与镜头贴合组装后会有明显的色差,影响手机美感。
为了解决此问题,目前行业内的做法是使用常规镀膜材料通过真空蒸发镀膜的方式在塑料或者玻璃基板上镀一层薄膜,但是无法达到完全黑色效果,部分反射光有偏色问题。
亟需一种可以使镜头和镜筒组装后颜色基本一致,不产生偏色问题的镜筒一体黑镀膜及其制作工艺来解决上述技术问题。
发明内容
为了解决上述技术问题,本发明提供了一种镜筒一体黑镀膜及其制作工艺,本发明的镜筒一体黑镀膜可以使镜头和镜筒组装后颜色基本一致,不产生偏色,大大提升了美感和使用感受,同时本发明的镜筒一体黑镀膜的制作工艺简单,易于推广使用。
本发明是通过如下技术方案解决上述技术问题的:
本发明提供了一种镜筒一体黑镀膜,所述镜筒一体黑镀膜包覆于镜筒的表面,包括三层膜系结构,依次为BlackA膜层、Al2O3膜层和SiO2膜层;所述BlackA膜层与镜筒相接触;所述BlackA膜层的材质为BlackA,所述BlackA购于德国默克公司;所述Al2O3膜层的材质为Al2O3;所述SiO2膜层的材质为SiO2;所述BlackA膜层的厚度为70~100nm;所述Al2O3膜层的厚度为30~60nm;所述SiO2膜层的厚度为50~90nm。
本发明中,所述镜筒一体黑镀膜蒸发镀膜于镜筒的表面,本发明通过特定的膜系结构设置使得镜筒与镜头组装后颜色基本一致,提升了手机美感。
本发明中,所述BlackA购于德国默克公司,其成分包括SiO、Cr、SiO2和Ti;所述BlackA为银灰色粉末。
本发明中,所述SiO2为本领域常规使用的SiO2,所述SiO2市售可得。
本发明中,所述Al2O3为本领域常规使用的Al2O3,所述Al2O3市售可得。
本发明中,所述BlackA膜层的厚度为70~100nm;
较佳地,所述BlackA膜层的厚度为80~90nm。
本发明中,所述Al2O3膜层的厚度为30~60nm;
较佳地,所述Al2O3膜层的厚度为40~50nm。
本发明中,所述SiO2膜层的厚度为50~90nm;
较佳地,所述SiO2膜层的厚度为60~70nm。
本发明中,通过采用BlackA膜层、Al2O3膜层和SiO2膜层三层复合膜系结构,再通过各膜层的厚度配合,最终使产品能够达到一体黑效果,镜头和镜筒组装后颜色基本一致。
本发明还提供了一种上述镜筒一体黑镀膜的制作工艺,包括如下步骤:
S1、将BlackA添加至钼舟中,在真空镀膜机中抽气,设定真空度;
S2、钼舟预热加温,熔融BlackA,同时向钼舟腔体中充入氩气,升高电流使熔融BlackA达到蒸发状态;
S3、打开钼舟遮板开始蒸发,通过晶振片检查实际膜厚到达设定值后停止BlackA膜层镀膜;
S4、采用电子枪镀膜蒸发Al2O3材料达到设定厚度后停止;
S5、采用电子枪镀膜蒸发SiO2材料达到设定厚度后停止,即可。
本发明中,所述S1中,所设定的真空度为本领域常规;
较佳地,所述真空度为2~3Pa。
本发明中,所述S2中,熔融BlackA的电流和时间为本领域常规;
较佳地,熔融BlackA的电流为205A,熔融BlackA的时间为120~150s。
本发明中,所述S2中,向钼舟充入氩气的气流量为本领域常规;
较佳地,向钼舟充入氩气的气流量为30~40sccm。
本发明中,所述S2中,达到蒸发状态时的电流为本领域常规;
较佳地,当电流升高至245A时,BlackA达到蒸发状态。
本发明中,所述S3中,BlackA膜层镀膜的时间为本领域常规;
较佳地,当所述BlackA膜层的镀膜厚度设定为70~100nm时,镀膜时间为5~10min。
本发明中,所述S4中,Al2O3膜层镀膜的时间为本领域常规;
较佳地,当所述Al2O3膜层的镀膜厚度设定为30~60nm时,镀膜时间为3~6min。
本发明中,所述S5中,SiO2膜层镀膜的时间为本领域常规;
较佳地,当所述SiO2膜层的镀膜厚度设定为50~90nm时,镀膜时间为4~8min。
本发明中,所述镜筒一体黑镀膜的制作工艺中,通过三层膜系设计、根据每层材料薄膜的不同厚度搭配、每种材料在设备中的蒸发工艺参数调整,最终薄膜沉积在塑胶镜头上面呈现一体黑效果,避免了在镀膜蒸发过程中工艺可能会出现的不稳定因素,通过本发明的特殊工艺调试使得产品最终呈现一体黑效果,且产品效果稳定。
本发明中,所述的其他原料均市售可得。
本发明的积极进步效果:
本发明提供了一种镜筒一体黑镀膜及其制作工艺,本发明的镜筒一体黑镀膜可以使镜头和镜筒组装后颜色基本一致,不产生偏色,大大提升了美感和使用感受;本发明的镜筒一体黑镀膜的制作工艺避免了在镀膜蒸发过程中工艺可能会出现的不稳定因素,通过本发明的特殊工艺调试使得产品最终呈现一体黑效果,且产品效果稳定。
具体实施方式
下面结合实施例,对本发明的具体实施方式作进一步描述。以下实施例仅用于更加清楚地说明本发明的技术方案,而不能以此来限制本发明的保护范围。
实施例1
本实施例提供了一种镜筒一体黑镀膜,镜筒一体黑镀膜包覆于镜筒的表面,包括三层膜系结构,依次为BlackA膜层、Al2O3膜层和SiO2膜层;BlackA膜层与镜筒相接触;BlackA膜层的材质为BlackA,BlackA购于德国默克公司;Al2O3膜层的材质为Al2O3;SiO2膜层的材质为SiO2;BlackA膜层的厚度为70~100nm;Al2O3膜层的厚度为30~60nm;SiO2膜层的厚度为50~90nm。
本实施例中,镜筒一体黑镀膜蒸发镀膜于镜筒的表面,本实施例通过特定的膜系结构设置使得镜筒与镜头组装后颜色基本一致,提升了手机美感。
本实施例中,BlackA购于德国默克公司,其成分包括SiO、Cr、SiO2和Ti。
本实施例中,通过采用BlackA膜层、Al2O3膜层和SiO2膜层三层复合膜系结构,再通过各膜层的厚度配合,最终使产品能够达到一体黑效果,镜头和镜筒组装后颜色基本一致。
本实施例还提供了上述镜筒一体黑镀膜的制作工艺,包括如下步骤:
S1、将BlackA添加至钼舟中,在真空镀膜机中抽气,设定真空度;
S2、钼舟预热加温,熔融BlackA,同时向钼舟腔体中充入氩气,升高电流使熔融BlackA达到蒸发状态;
S3、打开钼舟遮板开始蒸发,通过晶振片检查实际膜厚到达设定值后停止BlackA膜层镀膜;
S4、采用电子枪镀膜蒸发Al2O3材料达到设定厚度后停止;
S5、采用电子枪镀膜蒸发SiO2材料达到设定厚度后停止,即可。
其中,S1中,所设定的真空度为2~3Pa。
其中,S2中,熔融BlackA的电流为205A,熔融BlackA的时间为120~150s。
其中,S2中,向钼舟充入氩气的气流量为30~40sccm。
其中,S2中,当电流升高至245A时,BlackA达到蒸发状态。
其中,S3中当BlackA膜层的镀膜厚度设定为70~100nm时,镀膜时间为5~10min。
其中,S4中,当Al2O3膜层的镀膜厚度设定为30~60nm时,镀膜时间为3~6min。
其中,S5中,当SiO2膜层的镀膜厚度设定为50~90nm时,镀膜时间为4~8min。
本实施例中,镜筒一体黑镀膜的制作工艺中,通过三层膜系设计、根据每层材料薄膜的不同厚度搭配、每种材料在设备中的蒸发工艺参数调整,最终薄膜沉积在塑胶镜头上面呈现一体黑效果,避免了在镀膜蒸发过程中工艺可能会出现的不稳定因素,通过本实施例的特殊工艺调试使得产品最终呈现一体黑效果,且产品效果稳定。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (9)

1.一种镜筒一体黑镀膜,所述镜筒一体黑镀膜包覆于镜筒的表面,其特征在于,所述镜筒一体黑镀膜包括三层膜系结构,依次为BlackA膜层、Al2O3膜层和SiO2膜层;所述BlackA膜层与镜筒相接触;所述BlackA膜层的材质为BlackA,所述BlackA购于德国默克公司,其成分包括SiO、Cr、SiO2和Ti;所述BlackA为银灰色粉末;所述Al2O3膜层的材质为Al2O3;所述SiO2膜层的材质为SiO2;所述BlackA膜层的厚度为70~100nm;所述Al2O3膜层的厚度为30~60nm;所述SiO2膜层的厚度为50~90nm;所述镜筒一体黑镀膜采用如下制作工艺制得:
S1、将BlackA添加至钼舟中,在真空镀膜机中抽气,设定真空度;
S2、钼舟预热加温,熔融BlackA,同时向钼舟腔体中充入氩气,升高电流使熔融BlackA达到蒸发状态;
S3、打开钼舟遮板开始蒸发,通过晶振片检查实际膜厚到达设定值后停止BlackA膜层镀膜;
S4、采用电子枪镀膜蒸发Al2O3材料达到设定厚度后停止;
S5、采用电子枪镀膜蒸发SiO2材料达到设定厚度后停止,即可。
2.如权利要求1所述的镜筒一体黑镀膜,其特征在于,所述BlackA膜层的厚度为80~90nm。。
3.如权利要求1所述的镜筒一体黑镀膜,其特征在于,所述Al2O3膜层的厚度为40~50nm。
4.如权利要求1所述的镜筒一体黑镀膜,其特征在于,所述SiO2膜层的厚度为60~70nm。
5.如权利要求1所述的镜筒一体黑镀膜,其特征在于,所述S1中,所述真空度为2~3Pa。
6.如权利要求1所述的镜筒一体黑镀膜,其特征在于,所述S2中,熔融BlackA的电流为205A,熔融BlackA的时间为120~150s;向钼舟充入氩气的气流量为30~40sccm;当电流升高至245A时,BlackA达到蒸发状态。
7.如权利要求1所述的镜筒一体黑镀膜,其特征在于,当所述BlackA膜层的镀膜厚度设定为70~100nm时,镀膜时间为5~10min。
8.如权利要求1所述的镜筒一体黑镀膜,其特征在于,当所述Al2O3膜层的镀膜厚度设定为30~60nm时,镀膜时间为3~6min。
9.如权利要求1所述的镜筒一体黑镀膜,其特征在于,当所述SiO2膜层的镀膜厚度设定为50~90nm时,镀膜时间为4~8min。
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