CN110197801A - A kind of storage device and substrate equipment for after-treatment of processing substrate liquid - Google Patents
A kind of storage device and substrate equipment for after-treatment of processing substrate liquid Download PDFInfo
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- CN110197801A CN110197801A CN201910399296.1A CN201910399296A CN110197801A CN 110197801 A CN110197801 A CN 110197801A CN 201910399296 A CN201910399296 A CN 201910399296A CN 110197801 A CN110197801 A CN 110197801A
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- 238000003860 storage Methods 0.000 title claims abstract description 151
- 239000007788 liquid Substances 0.000 title claims abstract description 50
- 239000000758 substrate Substances 0.000 title claims abstract description 45
- 238000011282 treatment Methods 0.000 title claims abstract description 36
- 238000012545 processing Methods 0.000 title claims abstract description 13
- 239000012530 fluid Substances 0.000 claims abstract description 28
- 238000004140 cleaning Methods 0.000 claims abstract description 16
- 238000001035 drying Methods 0.000 claims abstract description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 73
- 239000006200 vaporizer Substances 0.000 claims description 9
- 238000005498 polishing Methods 0.000 abstract description 7
- 238000005516 engineering process Methods 0.000 abstract description 6
- 238000012805 post-processing Methods 0.000 abstract description 4
- 229960004592 isopropanol Drugs 0.000 description 33
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 32
- 239000007789 gas Substances 0.000 description 20
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 238000000034 method Methods 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 101100023111 Schizosaccharomyces pombe (strain 972 / ATCC 24843) mfc1 gene Proteins 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- GTMKMPPCXPEXLP-UHFFFAOYSA-N [N].CC(C)O Chemical compound [N].CC(C)O GTMKMPPCXPEXLP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000037396 body weight Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 235000011194 food seasoning agent Nutrition 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The present invention relates to chemically mechanical polishing post-processing technology fields, disclose the storage device and substrate equipment for after-treatment of a kind of processing substrate liquid.Substrate equipment for after-treatment includes base-plate cleaning module and drying substrates module, and drying substrates module includes storage device.Storage device includes storage main body, the first pipeline, the second pipeline and third pipeline, and storage main body has the first connector, the second connector and the third connector being tightly connected respectively with pipeline；First pipeline is used to be passed through gas into storage main body to increase the main intracorporal pressure of storage；Second pipeline is tightly connected in pressure detecting portion；Third pipeline, which is tightly connected, is respectively arranged with independent switch block in treatment fluid supply pipe and discharge pipe, supply pipe and discharge pipe, allows to that treatment fluid is added into storage main body by third pipeline or treatment fluid is discharged from storage main body.
Description
Technical field
The present invention relates to chemically mechanical polishing post-processing technology field more particularly to a kind of storage devices of processing substrate liquid
With substrate equipment for after-treatment.
Background technique
Chemically-mechanicapolish polishing (Chemical Mechanical Planarization, CMP) is obtained in IC manufacturing
Obtain a kind of ultra-precision surface processing technology of global planarizartion.Due to the chemical reagent largely used in chemically mechanical polishing and grind
Grinding agent will cause the pollution of substrate surface, so needing to introduce pollution of the aftertreatment technology to remove substrate surface after polishing
Object, aftertreatment technology are generally formed by cleaning and drying, to provide the substrate surface of smooth pieces.
The purpose cleaned after polishing is removal substrate surface particle and various chemical substances, and is avoided in the process of cleaning pair
The corrosion and destruction of Surface and internal structure, cleaning is divided into wet process and dry method after polishing, and wet-cleaning is exactly in solution environmental
Lower cleaning, such as cleaning agent immersion, mechanical scrub, wet-chemical cleaning etc..
For substrate after over cleaning, substrate surface can retain the residue of many water or cleaning solution.Due to these water or cleaning
Dissolved with impurity in the residue of liquid, if allowing these residual liquids voluntarily evaporation drying, these impurity will be bonded to base again
It on the surface of plate, pollutes, or even destroys the structure of chip.For this reason, it may be necessary to substrate surface be dried, to remove
These residual liquids.
Such as patent CN104956467B discloses a kind of substrate cleaning apparatus for chemical-mechanical planarization, wherein clearly
Washing part includes several cleaning modules and drying module arranged side by side so that substrate passes sequentially through, and substrate is put into cleaning module vertically
It is scrubbed in chamber, drying module is re-fed into after scrub and is dried.
Last one technique of the drying substrates as post-processing, to guarantee substrate surface quality and machining yield play to
Close important role.The dry technology generally used in the industry is isopropanol (IPA, Iso-Propyl Alcohol) vapour seasoning,
Its surface tension gradient for utilizing methanol vapor to generate water induces strong marangoni effect, to promote substrate table
The moisture film removing of face absorption.
When using IPA equipment, need that isopropanol liquid is added from supply source to IPA fluid reservoir, since isopropanol has
High volatile is easy vaporization, keeps its storage state unstable, and air pressure is unstable in tank or even acute variation, there are security risk,
It may also happen that the safety accidents such as explosion.Therefore, how to utilize and store safely and efficiently isopropanol becomes urgently to be resolved
Problem.
Summary of the invention
The embodiment of the invention provides a kind of storage device of processing substrate liquid and substrate equipment for after-treatments, it is intended at least solve
Certainly one of the technical problems existing in the prior art.
The first aspect of the embodiment of the present invention provides a kind of storage device of processing substrate liquid, including storage main body, the
There is the first connector being tightly connected respectively with pipeline, second to connect for one pipeline, the second pipeline and third pipeline, storage main body
Mouth and third connector；First pipeline is used to be passed through gas into storage main body to increase the main intracorporal pressure of storage；Second pipe
Road is tightly connected in pressure detecting portion；Third pipeline is tightly connected in treatment fluid supply pipe and discharge pipe, supply pipe and discharge pipe
It is respectively arranged with independent switch block, allow to that treatment fluid is added into storage main body by third pipeline or is led from storage
Treatment fluid is discharged in body.
In one embodiment, the first pipeline is tightly connected in forcing pipe and relief tube, and forcing pipe is used for storage main body
It is inside passed through gas, relief tube is used to that gas to be discharged out of storage main body.
In one embodiment, forcing pipe connects isocon, and isocon and discharge pipe be connected to vaporizer altogether, by gas and
Treatment fluid mixes and vaporizes discharge.
In one embodiment, third pipeline has an extension for being located at storage body interior, and the bottom end of extension is away from depositing
The distance for storing up main body inner bottom surface is less than preset value.
In one embodiment, third connector is located at the lower part of storage main body wall.
It in one embodiment, include check valve set on the switch block of supply pipe, so that treatment fluid passes through the supply pipe
It is only capable of flowing into storage main body.
In one embodiment, storage device further includes the 4th pipeline, and one end of the 4th pipeline is tightly connected leads in storage
The other end of 4th connector of body, the 4th pipeline is tightly connected in level sensing portion.
In one embodiment, storage main body includes lid, storage unit and the stage portion for connecting lid and storage unit,
Treatment fluid to be stored in storage unit.
In one embodiment, storage unit be upper end opening cylindrical hollow cylinder, stage portion be ring-type, stage portion it is interior
The lower end of ring and lid is tightly connected, and the outer ring of stage portion and the upper end of storage unit are tightly connected.
In one embodiment, treatment fluid is isopropanol liquid.
The second aspect of the embodiment of the present invention provides a kind of substrate equipment for after-treatment, including base-plate cleaning module and substrate
Irradiation modules, drying substrates module include storage device as described above.
The beneficial effect comprise that realizing safety and efficiently utilizing and store isopropanol.
Detailed description of the invention
It will be apparent and be easier to understand by made detailed description, advantages of the present invention in conjunction with the following drawings,
But these attached drawings are only schematical, are not intended to limit protection scope of the present invention, in which:
Fig. 1 is the principle assumption diagram for the storage device that one embodiment of the present of invention provides；
Fig. 2 be another embodiment of the present invention provides storage device principle assumption diagram；
Fig. 3 is the appearance diagram for the storage device that one embodiment of the present of invention provides；
Fig. 4 is the principle assumption diagram for the storage device that another embodiment of the invention provides；
Fig. 5 is the appearance diagram for the storage device that another embodiment of the invention provides；
Description of symbols:
10, main body is stored；101, lid；102, storage unit；103, stage portion；11, the first connector；12, the second connection
Mouthful；13, third connector；14, the 4th connector；
20, the first pipeline；21, forcing pipe；PV1, the first control valve；CV1, the first check valve；22, relief tube；PV4,
Four control valves；23, isocon；PV5, the 5th control valve；MFC1, the first mass flow controller；
30, the second pipeline；31, pressure detecting portion；
40, third pipeline；41, supply pipe；PV2, the second control valve；CV2, second one-way valve；42, discharge pipe；PV3,
Three control valves；MFC2, the second mass flow controller；43, extension；
50, the 4th pipeline；51, level sensing portion.
Specific embodiment
Combined with specific embodiments below and its attached drawing, technical solution of the present invention is described in detail.It records herein
Embodiment be specific specific embodiment of the invention, for illustrating design of the invention；These explanations are explanatory
With it is illustrative, should not be construed as the limitation to embodiment of the present invention and the scope of the present invention.Except the implementation recorded herein
Exception, those skilled in the art can also be based on the claim of this application books and its specification disclosure of that using aobvious and easy
The other technical solutions seen, these technical solutions include any obviously replacing using to making for the embodiment recorded herein
The technical solution changed and modified.It should be understood that except being non-specifically explained, in order to make it easy to understand, having below to the present invention
What the description of body embodiment was all built upon that relevant device, device, component etc. be in original static stationary does not give extraneous control letter
Number and driving force under natural conditions describe.
The storage device of a kind of processing substrate liquid provided in an embodiment of the present invention, applied to the back tender in substrate post-processing
Skill, the substrate as dry object include semiconductor wafer, photomask glass substrate, Glass for Liquid Crystal Display substrate, etc. from
Son display glass substrate, light base-board for plate etc..
As shown in Figure 1, one embodiment of the invention provides a kind of storage device of processing substrate liquid, including storage main body
10, the first pipeline 20, the second pipeline 30 and third pipeline 40, storage main body 10 have be tightly connected respectively with pipeline first to connect
Interface 11, the second connector 12 and third connector 13；First pipeline 20 is used to be passed through gas into storage main body 10 to increase
Store the pressure in main body 10；Second pipeline 30 is tightly connected in pressure detecting portion 31；Third pipeline 40 is tightly connected in processing
Liquid supply pipe 41 and discharge pipe 42, supply pipe 41 and discharge pipe 42 are respectively arranged with independent switch block, allow to pass through
Treatment fluid is added into storage main body 10 or treatment fluid is discharged from storage main body 10 for third pipeline 40.
In the present embodiment, the treatment fluid stored in storage main body 10 is isopropanol liquid.
The gas that first pipeline 20 is passed through into storage main body 10 is inert gas, such as nitrogen.The bottom of first pipeline 20
End is higher than the interface of liquid in storage main body 10.It is added via the first connector 11 into storage main body 10 in the first pipeline 20
When nitrogen, the air pressure stored in main body 10 is increased, and isopropanol liquid is discharged thereby executing drying substrates technique.
Second pipeline 30 will be connected to inside pressure detecting portion 31 and storage main body 10, to realize that pressure detecting portion 31 is surveyed in real time
Air pressure in amount storage main body 10, and barometric information is delivered to control system and is shown, so that operator be facilitated to monitor
The internal state and operating condition of storage device, and failure is checked in time in pressure anomaly.Pressure detecting portion 31 can be pressure
Power table.
The part that third pipeline 40 is located at 10 outside of storage main body has two-way branch, i.e. supply pipe 41 and discharge pipe 42.
Supply pipe 41 is used to that isopropanol liquid to be added into storage main body 10 by third pipeline 40.The inlet connection of supply pipe 41 is managed
Liquid supply source.Discharge pipe 42 is used to that isopropanol liquid to be discharged out of storage main body 10 by third pipeline 40.Supply pipe 41 and row
Independent switch block is respectively arranged in outlet pipe 42, to control its respective make-and-break time.
The embodiment of the present invention is passed through gas into storage main body 10 to increase in storage main body 10 by the first pipeline 20
Pressure, is discharged treatment fluid from storage main body 10 by discharge pipe 42, treatment fluid is added to storage main body 10 by supply pipe 41, together
When be equipped with pressure detecting portion 31 with real-time monitoring store 10 internal pressure of main body, pressure anomaly can be prevented, realize safety simultaneously
Efficiently utilize and store treatment fluid.
As shown in Figure 1, in one embodiment, storage device further includes the 4th pipeline 50, one end gas of the 4th pipeline 50
The other end of close the 4th connector 14 for being connected to storage main body 10, the 4th pipeline 50 is tightly connected in level sensing portion 51.Liquid
Position test section 51 may include the optoelectronic switch sensor being arranged in storage main body 10, to judge the height of liquid level.In liquid level
Test section 51, which detects, sends alarm signal when the liquid level in storage main body 10 is higher or lower than predeterminated position to control system, with
Control system is set to execute corresponding processing routine.Processing routine can be opened for the switch block of control discharge pipe 42 so that liquid
It is discharged or operator is notified to handle.
It is understood that the switch block of pressure detecting portion 31, level sensing portion 51 and each pipeline is and control system
Connection.
In one embodiment of the invention, as shown in Figure 1, the first connector 11, the second connector 12, third connector
13 and the 4th connector 14 be set to storage 10 top of main body.Third pipeline 40 has the extension being located inside storage main body 10
43, the bottom end of extension 43 is less than preset value away from the distance of storage 10 inner bottom surface of main body.Preset value can be 0.1cm to 10cm,
Preferably 0.5cm.In normal state, interface of the bottom end of extension 43 lower than liquid in storage main body 10.
As shown in Figure 1, the bottom surface of storage main body 10 and horizontal plane have certain angle, angle is less than 5 degree.Bottom surface is according to height
Degree tilts extension from edge to the mode reduced with 43 corresponding position of extension, to be formed with 43 corresponding position of extension
One recess portion, in order to which extension 43 protrudes into the recess portion, so as to the isopropyl alcohol liquid in more thoroughly emptying storage main body 10
Body.Storage 10 bottom end of main body is additionally provided with support portion, so that storage main body 10 is horizontal positioned.
As an embodiment, as shown in Figure 1, the first pipeline 20 includes forcing pipe 21, forcing pipe 21 is used for depositing
Gas, such as nitrogen are passed through in storage main body 10.The entrance of forcing pipe 21 connects gas supply source.
Forcing pipe 21 is provided with first switch component to realize the on-off control of forcing pipe 21.First switch component includes string
The the first control valve PV1 and the first check valve CV1 of connection, when the first control valve PV1 is opened, nitrogen passes through the first check valve CV1
Into storage main body 10 and the first check valve CV1 can prevent nitrogen from reversely flowing out.The import of first check valve CV1 is close to pressurization
The entrance side of pipe 21 is exported close to storage 10 side of main body.
As shown in Figure 1, the supply pipe 41 of third pipeline 40 is provided with second switch component, second switch component includes series connection
The second control valve PV2 and second one-way valve CV2, the second control valve PV2 open when, isopropanol liquid pass through second one-way valve
CV2 enters storage main body 10 and second one-way valve CV2 can prevent isopropanol liquid from reversely flowing out.Second one-way valve CV2 into
Mouth is exported close to the entrance side of supply pipe 41 close to storage 10 side of main body, so that treatment fluid passes through the supply pipe 41 and is only capable of
Flow into storage main body 10.
As shown in Figure 1, the discharge pipe 42 of third pipeline 40 is provided with third switch block, including third control valve PV3,
When third control valve PV3 is opened, isopropanol liquid is discharged out of storage main body 10.
In one embodiment, the third switch block of discharge pipe 42 can also include check valve, so that treatment fluid passes through
The discharge pipe 42 is only capable of being discharged from storage main body 10.
As shown in Figure 1, the course of work for the storage device that one embodiment of the invention provides are as follows: open the first control valve PV1
With third control valve PV3, nitrogen is passed through storage main body 10, and isopropanol liquid is discharged.It is deposited when level sensing portion 51 detects
When liquid level in storage main body 10 is too low, the first control valve PV1 and third control valve PV3 is closed, the second control valve PV2 is opened, makes
Isopropanol liquid is added in storage main body 10.Period, pressure detecting portion 31 persistently detect air pressure inside.
As another embodiment, as shown in Fig. 2, the first pipeline 20 is tightly connected in forcing pipe 21 and relief tube
22.Forcing pipe 21 is used to be passed through gas into storage main body 10, to increase pressure in main body, so that isopropanol liquid is passed through row
Outlet pipe 42 extrudes.Relief tube 22 is used to that gas to be discharged out of storage main body 10, to reduce pressure in main body, to make isopropyl alcohol liquid
Body is added in storage main body 10 by supply pipe 41.
Relief tube 22 is provided with the 4th switch block, including the 4th control valve PV4, when the 4th control valve PV4 is opened, deposits
Gas in storage main body 10 is discharged by relief tube 22.
As shown in Fig. 2, forcing pipe 21 is also connected with isocon 23, isocon 23 and discharge pipe 42 are connected to vaporizer altogether, will
Gas and treatment fluid mix and vaporize discharge, that is, nitrogen and isopropanol liquid are mixed and vaporize to obtain isopropanol and nitrogen
Mixed gas is exported.Isocon 23 is equipped with the 5th control valve PV5 and the first mass flow controller MFC1, and nitrogen is passed through point
Enter vaporizer through the 5th control valve PV5 and the first mass flow controller MFC1 after flow tube 23, isopropanol liquid is passed through discharge
Enter vaporizer through third control valve PV3 and the second mass flow controller MFC2 after pipe 42, vaporizer is by isopropanol liquid vapour
Change and mixes with nitrogen isopropanol and nitrogen mixed gas is discharged.
Mass flow controller (MFC, Mass Flow Controller) has flow stabilizing function, can control and wherein passes through
Gas or liquid flow, to control the mixed proportion of nitrogen and isopropanol.Mass flow controller is connect with control system,
User can carry out flow set as needed, and mass flow controller can be automatically constant in setting value by flow, even if ring
Border pressure has fluctuation or environment temperature to change, and flow will not be made to deviate setting value.
As shown in Fig. 2, the bottom surface of storage main body 10 and horizontal plane have certain angle, angle is less than 5 degree.Bottom surface is according to height
Degree tilts extension from edge to the mode reduced with 43 corresponding position of extension, to be formed with 43 corresponding position of extension
One recess portion, in order to which extension 43 protrudes into the recess portion, so as to the isopropyl alcohol liquid in more thoroughly emptying storage main body 10
Body.Storage 10 bottom end of main body is additionally provided with support portion, so that storage main body 10 is horizontal positioned.
As shown in Fig. 2, another embodiment of the present invention provides storage device the course of work are as follows: in IPA output state,
One control valve PV1, the 5th control valve PV5 and third control valve PV3 are opened, and the second control valve PV2 and the 4th control valve PV4 are equal
It closes, the pressurized pipe 21 of nitrogen that nitrogen supply source provides is passed through in storage main body 10 to pressurize isopropanol liquid through discharge pipe
42 discharges, while the first mass flow controller MFC1 that isocon 23 is equipped with makes the nitrogen of certain flow flow into vaporizer, row
The second mass flow controller MFC2 that outlet pipe 42 is equipped with makes the isopropanol liquid of certain flow flow into vaporizer, to will fix
Isopropanol and nitrogen mixed gas is discharged after mixing in vaporizer in the nitrogen and isopropanol of ratio.
In IPA input state, the first control valve PV1, the 5th control valve PV5 and third control valve PV3 are turned off, the second control
Valve PV2 and the 4th control valve PV4 processed are opened, and the isopropanol liquid that isopropanol supply source provides enters storage master through supply pipe 41
It in body 10, while storing the gas in main body 10 and being discharged through relief tube 22, to guarantee stable gas pressure.
As shown in figure 3, storage main body 10 is including lid 101, storage unit 102 and is used for connection cover as one embodiment
The stage portion 103 of body 101 and storage unit 102, treatment fluid is stored in storage unit 102.
As shown in figure 3, lid 101 is column, it is preferably cylindric.Storage unit 102 is the cylindrical hollow cylinder of upper end opening
Body, it is preferably cylindric.Stage portion 103 is ring-type, preferably circular, and stage portion 103 includes having centainly with plane
The inclined surface of angle.
The diameter of lid 101 is less than the diameter of storage unit 102, the inner ring of stage portion 103 and the airtight company in lower end of lid 101
It connects, the outer ring of stage portion 103 and the upper end of storage unit 102 are tightly connected.
Alternatively, the diameter of lid 101 is greater than the diameter of storage unit 102, the outer ring and lid of stage portion 103
The lower end of body 101 is tightly connected, and the inner ring of stage portion 103 and the upper end of storage unit 102 are tightly connected.
In one embodiment, storage main body 10 further includes the support portion 104 positioned at 102 bottom end of storage unit, and support portion is
Cyclic annular cylinder, the upper end of support portion are connect with the side wall bottom end of storage unit 102, and the diameter of support portion is greater than the straight of storage unit 102
Diameter avoids toppling over to keep storage main body 10 more stable when placing.
In Fig. 3, it is respectively used to the first of the first pipeline 20 of connection, the second pipeline 30, third pipeline 40 and the 4th pipeline 50
Connector 11, the second connector 12, third connector 13 and 14 (not shown) of the 4th connector are set to storage 10 top of main body,
Preferably, it is arranged in stage portion 103.Wherein, third pipeline 40 has the extension 43 being located inside storage main body 10, extension
43 bottom end is lower than the liquid level in storage main body 10.
As shown in figure 4, third connector 13 is located under storage 10 side wall of main body as another embodiment of the invention
Portion, close to the position of storage 10 bottom surface of main body, distance of the third connector 13 away from storage 10 bottom surface of main body can be for 1cm extremely
10cm, preferably 2cm.
To which third pipeline 40 is stretched out from the lower part of storage 10 side wall of main body, it is not necessarily to storage 10 internal stretch of main body
Realize its bottom end lower than the liquid level in storage main body 10.
The composed structure and connection relationship of each pipeline are identical as in the embodiment shown in figures 1 and 2, no longer superfluous herein
It states.
Correspondingly, as shown in figure 5, being respectively used to the first of the first pipeline 20 of connection, the second pipeline 30 and the 4th pipeline 50
Connector 11, the second connector 12 and 14 (not shown) of the 4th connector are set to storage 10 top of main body；For connecting third
13 (not shown) of third connector of pipeline 40 is set to the lower part of storage 10 side wall of main body.
In order to make it easy to understand, being illustrated by taking a concrete application scene as an example to the operating procedure of storage device.
It is normal that methanol vapor is discharged if 1, being in IPA output state.
2, when being in non-IPA output state, judge to store whether remaining isopropyl alcohol liquid body weight in main body is lower than 60%,
It can be judged according to liquid level.
If 3, being not less than 60%, waits and export IPA next time；
If 4, being lower than 60%, PV3 is closed.
5, PV4 is opened, 2s is postponed, makes to store main body pressure release；
6, PV2 is opened, filling isopropanol liquid is started.
If 7, receiving output IPA signal during auto-filling, PV2 and PV4 is closed in filling interruption, and transfers to start
Execute process 1-6；
If 8, filling signal triggering, PV2 and PV4 are closed, then executes process 1-7.
It is above a kind of optional embodiment, it is clear that skilled person will appreciate that under different actual demands,
It can be executed according to different operation orders.
The embodiment of the invention also provides a kind of substrate equipment for after-treatments, including base-plate cleaning module and drying substrates mould
Block, drying substrates module include storage device as described above.
The attached drawing of this specification is schematic diagram, aids in illustrating design of the invention, it is schematically indicated the shape of each section
And its correlation.It should be understood that for the ease of clearly showing the structure of each component of the embodiment of the present invention, it is each attached
It is not drawn according to identical ratio between figure, identical reference marker is for indicating identical part in attached drawing.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " illustrative examples ",
The description of " example ", " specific example " or " some examples " etc. means specific features described in conjunction with this embodiment or example, knot
Structure, material or feature are included at least one embodiment or example of the invention.In the present specification, to above-mentioned term
Schematic representation may not refer to the same embodiment or example.Moreover, specific features, structure, material or the spy of description
Point can be combined in any suitable manner in any one or more of the embodiments or examples.
Although an embodiment of the present invention has been shown and described, it will be understood by those skilled in the art that: not
A variety of change, modification, replacement and modification can be carried out to these embodiments in the case where being detached from the principle of the present invention and objective, this
The range of invention is defined by the claims and their equivalents.
Claims (11)
1. a kind of storage device of processing substrate liquid, including storage main body, the first pipeline, the second pipeline and third pipeline, described
Storing main body has the first connector, the second connector and the third connector being tightly connected respectively with the pipeline；Described
One pipeline is used to be passed through gas into the storage main body to increase the main intracorporal pressure of the storage；Second pipeline is airtight
It is connected to pressure detecting portion；The third pipeline is tightly connected in treatment fluid supply pipe and discharge pipe, the supply pipe and discharge
Pipe is respectively arranged with independent switch block, allows to that treatment fluid is added into the storage main body by the third pipeline
Or treatment fluid is discharged from the storage main body.
2. storage device as described in claim 1, which is characterized in that first pipeline is tightly connected in forcing pipe and pressure release
Pipe, the forcing pipe is for being passed through gas into the storage main body, and the relief tube out of described storage main body for being discharged
Gas.
3. storage device as claimed in claim 2, which is characterized in that the forcing pipe connects isocon, the isocon and
The discharge pipe is connected to vaporizer altogether, and the gas and the treatment fluid are mixed and vaporize discharge.
4. storage device as described in any one of claims 1 to 3, which is characterized in that the third pipeline has positioned at described
The extension of body interior is stored, the bottom end of the extension is less than preset value away from the distance of the storage main body inner bottom surface.
5. storage device as described in any one of claims 1 to 3, which is characterized in that the third connector is located at described deposit
Store up the lower part of main body wall.
6. storage device as described in claim 1, which is characterized in that the switch block set on the supply pipe includes unidirectional
Valve, so that treatment fluid is only capable of flowing into the storage main body by the supply pipe.
7. storage device as described in claim 1, which is characterized in that it further include the 4th pipeline, one end of the 4th pipeline
It is tightly connected in the 4th connector of the storage main body, the other end of the 4th pipeline is tightly connected in level sensing portion.
8. storage device as described in claim 1, which is characterized in that the storage main body includes lid, storage unit and is used for
The stage portion for connecting the lid and the storage unit, treatment fluid is stored in the storage unit.
9. storage device as described in claim 1, which is characterized in that the storage unit is the cylindrical hollow cylinder of upper end opening
Body, the stage portion are ring-type, the lower end air-tight connection of the inner ring of the stage portion and the lid, the outer ring of the stage portion
It is tightly connected with the upper end of the storage unit.
10. storage device as described in claim 1, which is characterized in that the treatment fluid is isopropanol liquid.
11. a kind of substrate equipment for after-treatment, including base-plate cleaning module and drying substrates module, the drying substrates module include
Storage device as described in any one of claim 1 to 10.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910399296.1A CN110197801A (en) | 2019-05-14 | 2019-05-14 | A kind of storage device and substrate equipment for after-treatment of processing substrate liquid |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910399296.1A CN110197801A (en) | 2019-05-14 | 2019-05-14 | A kind of storage device and substrate equipment for after-treatment of processing substrate liquid |
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Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008071807A (en) * | 2006-09-12 | 2008-03-27 | Dainippon Screen Mfg Co Ltd | Substrate processing equipment |
| KR20090006269A (en) * | 2007-07-11 | 2009-01-15 | 세메스 주식회사 | Chemical supply apparatus and method |
| CN101465281A (en) * | 2007-12-20 | 2009-06-24 | 大日本网屏制造株式会社 | Substrate treating apparatus and substrate treating method |
| US20160002789A1 (en) * | 2013-03-28 | 2016-01-07 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium |
| CN105413247A (en) * | 2012-02-27 | 2016-03-23 | 东京毅力科创株式会社 | Solution Treatment Apparatus And Solution Treatment Method |
| CN105771395A (en) * | 2015-01-09 | 2016-07-20 | 东京毅力科创株式会社 | Process liquor filtration apparatus, liquor supply apparatus and process liquid filtration method |
| TW201638542A (en) * | 2015-02-23 | 2016-11-01 | 思可林集團股份有限公司 | Vapor supplying apparatus, vapor drying apparatus, vapor supplying method, and vapor drying method |
| CN104956467B (en) * | 2013-01-31 | 2018-02-16 | 应用材料公司 | Method and apparatus for the base-plate cleaning after chemical-mechanical planarization |
| CN108025335A (en) * | 2015-09-28 | 2018-05-11 | 株式会社斯库林集团 | Handle liquid supplying device, base plate processing system and treatment fluid supply method |
| CN210535627U (en) * | 2019-05-14 | 2020-05-15 | 清华大学 | Storage device of substrate treatment liquid and substrate post-treatment equipment |
-
2019
- 2019-05-14 CN CN201910399296.1A patent/CN110197801A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008071807A (en) * | 2006-09-12 | 2008-03-27 | Dainippon Screen Mfg Co Ltd | Substrate processing equipment |
| KR20090006269A (en) * | 2007-07-11 | 2009-01-15 | 세메스 주식회사 | Chemical supply apparatus and method |
| CN101465281A (en) * | 2007-12-20 | 2009-06-24 | 大日本网屏制造株式会社 | Substrate treating apparatus and substrate treating method |
| CN105413247A (en) * | 2012-02-27 | 2016-03-23 | 东京毅力科创株式会社 | Solution Treatment Apparatus And Solution Treatment Method |
| CN104956467B (en) * | 2013-01-31 | 2018-02-16 | 应用材料公司 | Method and apparatus for the base-plate cleaning after chemical-mechanical planarization |
| US20160002789A1 (en) * | 2013-03-28 | 2016-01-07 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium |
| CN105771395A (en) * | 2015-01-09 | 2016-07-20 | 东京毅力科创株式会社 | Process liquor filtration apparatus, liquor supply apparatus and process liquid filtration method |
| TW201638542A (en) * | 2015-02-23 | 2016-11-01 | 思可林集團股份有限公司 | Vapor supplying apparatus, vapor drying apparatus, vapor supplying method, and vapor drying method |
| CN108025335A (en) * | 2015-09-28 | 2018-05-11 | 株式会社斯库林集团 | Handle liquid supplying device, base plate processing system and treatment fluid supply method |
| CN210535627U (en) * | 2019-05-14 | 2020-05-15 | 清华大学 | Storage device of substrate treatment liquid and substrate post-treatment equipment |
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