KR0136644B1 - Prewetting method and apparatus of filter having teflon membrane placed on high purity chemical line in semiconductor manufacturing process - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for prewetting a filter having a Teflon filtration membrane which is installed in a high purity chemical transport path of a semiconductor manufacturing process. Numerous particles can penetrate the vessel or the IPA inside the container and contaminate the filter membrane of the filter.In addition, since the IPA is put into use without sufficient ultrapure water cleaning, it increases the defective rate of the product and the risk of fire caused by the IPA. Not only can it be excluded, but the wetting work is cumbersome and unclean, and the work method is primitive, so there is a big problem of incomplete wetting due to IPA inflow path and poor posture during wetting.

The present invention has been researched and developed in order to solve and improve all the problems caused by the conventional wetting method as described above, the process of wetting the IPA to the filtration membrane, the process of inspecting this wetting state, and the replacement wet at the same time as the cleaning with ultrapure water Wetting method and device of filter that allow the process to be completed completely in one system in order to prevent fundamental contamination, increase work efficiency, and provide good wetting and mounting position of filter It is characterized by that it can improve the.

Description

Prewetting method and apparatus for a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process

(A) (b) (c) of FIG. 1 is a schematic cross-sectional view for explaining the form (posture) of wetting to a conventional chemical filter provided with a Teflon filtration membrane therein.

2 is a schematic diagram illustrating a wetting method and apparatus of the present invention.

3 is a schematic diagram showing a wettable state by eliminating and modifying a part of the present invention.

4 is a preferred perspective view showing the appearance of a wetting device which is an example of the present invention.

5 is a front cross-sectional view of FIG.

6 is a side cross-sectional view of FIG.

7 is a perspective view showing a part of the apparatus of the present invention

* Description of the symbols for the main parts of the drawings *

1: main body, 2: upper body,

3: valve box, 4: dilution tank,

5: filter mounting plate, 6: filter,

6 ′: filtration membrane 31,32,42,54,56,57 hose,

41: level gauge, 43: discharge pipe,

51: fixed block, 52: fixed band,

53: guide rail, 61: inlet,

62: outlet, 63: air outlet

The present invention is installed in a delivery path (supply path) of a high-purity chemical used in a semiconductor manufacturing process or a liquid crystal display device manufacturing process (hereinafter referred to as a semiconductor manufacturing process, etc.). When replacing a filter that filters solid particles such as dust generated in the device, the filter has a Teflon filtration membrane having all water-soluble liquids and micropores with low affinity with chemicals. The present invention relates to a prewetting method and apparatus thereof.

Semiconductor grade chemical filter commonly used in semiconductor manufacturing process is composed of filter housing and filter element (hereinafter referred to as filtration membrane). This filtration membrane is made of Teflon material which is a stable material with excellent chemical resistance. In most cases, microporous filtration membranes have very high absorbency, which is one of the unique characteristics of Teflon, that is, it has no hydrophilicity. Therefore, before using it, it is very similar to IPA (ISOPROPYIALCHOL which usually uses 60% diluted alcohol). Filtering, which is the original purpose of the filter, can be expected only through a wetting process that starts with a liquid having low surface tension characteristics and substitutes and purifies with ultrapure water. If the filter is put into use without proper wetting, the wetting is never improved during use, and the area not wetted during the life of the filter does not contribute to the filtration, as well as the flow rate of the chemical system. May cause shortage and seriously affect the manufacturing process. Therefore, as described above, the filter must be wetted before the filter is put into use, which is well known in the art, and has been used before the filter has been wetted in the prior art.

In general, since there is no separate wetting device in the prior art, IPA is filled in a container or packaging plastic bag of a certain size, and the filter body is charged into a container or plastic bag filled with IPA, and the washing water is filled after a certain time. It is an example of taking a method of transferring it to another container, and then taking it out and putting it into use. Also, the funnel is placed in a filter, and the IPA is poured into the filter, and the liquid level of the IPA is maintained at the outlet side for a predetermined time. There is a method of continuously injecting and removing water and injecting the washing water again, but in this case, since the work is performed in the state of being exposed to the atmosphere, that is, the source of pollution, many particles contained in the atmosphere are stored in the container or the inside of the container. It can penetrate and contaminate the IPA, and it is cleaned with ultrapure water It is not necessary to exclude the risk of fire due to the careless handling of IPA, which is a flammable substance, and to avoid the troublesome and clean work of the wet work, and the method of work is very primitive. Subsequently, there is a big problem of incomplete wettability due to poor filter posture during IPA inflow path and wetting. In addition, there is a method of forcibly injecting the IPA into the filter by the pump, but this has the disadvantage that the pollution through the pumping system and the consumption of the IPA are large and the maintenance of the pump must be followed.

In addition, various wetting methods have been tried, but they have not been satisfactory. As a result, 100% wetting of the filtration membranes is always possible, prevents contamination, and reduces the risk of fire caused by highly flammable IPA. There is an urgent need for a method and apparatus for wetting filters.

The present invention has been researched and developed in order to solve and improve various problems caused by the conventional wetting method as described above.

The main object of the present invention is to manufacture a semiconductor in which the process of wetting the IPA on the filtration membrane of the filter body, the process of inspecting this wetting state, and the process of simultaneously replacing and replacing the wet with the ultrapure water can be performed sequentially in one system. An object of the present invention is to provide a prewetting method for a filter having a Teflon filtration membrane installed in a high purity chemical delivery path of a process, and an apparatus thereof. It is another object of the present invention to provide a method and apparatus for wetting the filter so that IPA and pressurized pure water and ultrapure water are not exposed to the air to prevent the underlying contamination and to perform the operation cleanly and safely. I want to. Another object of the present invention is to increase the efficiency of the work by being able to wet a plurality of filters at the same time. Another object of the present invention is to provide a good mounting and wetting posture of the filter by rotating the filter mounting plate. It is another object of the present invention to improve the working environment and thereby increase workability by allowing the wetting operation to be performed only by a valve operation having different functions. Another object of the present invention is to facilitate the automatic maintenance of the IPA level and level monitoring to perform accurate wetting operations.

On the other hand, the wetting method of the filter is divided into three types. First, as shown in (a) of FIG. 1 of the accompanying drawings, the inlet 61 and the outlet 62 of the filter 6 are horizontally positioned so that they are located in the same line. Horizontal injection method to keep the IPA inflow to the inlet 61 side, and second vertical injection IPA top injection method to direct the inlet 61 to the top and the outlet 62 to the bottom as shown in (b) Third, the vertical inlet IPA lower injection method is used to direct the inlet 61 downward and the outlet 62 upward.

According to the experimental results of the present applicant, first, the horizontal injection method, even if the air is discharged through the air outlet (63) of the filter housing, the air on the upper side of the inner filtration membrane (6 ') around the inlet (61) and the outlet (62). Is trapped and there is a high likelihood of incomplete wetting. In addition, the vertical inlet upper injection method has an outlet 62 facing downward and an air outlet 63 formed at one side of a vent, that is, an outlet 62 to discharge the air therein, is also directed downward. Air is trapped inside the filtration membrane 6 'on the 61) side, which is much more likely to be incomplete wetting than the above-described horizontal injection method, thereby reducing the area contributing to the filtration and causing shortening of the life of the filter and shortage of flow rate. On the other hand, in the vertical inlet bottom injection method, since the inlet 61 is directed downward and the outlet 62 is directed upward, the IPA is gradually increased and injected as the inlet 61 is lowered and the air is discharged as the IPA is injected. Air leakage inside the filter body 6 through the ball 63 is desired, and as the wetting of the filtration membrane 6 'proceeds, the IPA penetrates into the filtration membrane 6' and the level gradually rises, naturally. Wetting is done to achieve perfect wetting throughout the filtration membrane. As a result, the IPA inflow method (wetting posture) of the filter 6 was found to be the most suitable and preferred vertical inlet bottom injection method.

The present invention proposes a prewetting method of the filter based on the attached drawings 2 and 3 in order to achieve the object as described above.

In the prewetting method of a semiconductor grade filter having a Teflon filtration membrane, the inflow of the filter vertically installed so that the inflow side is downwardly directed to the mounting means which is diluted to a predetermined ratio and filled with the IPA filled in the bottle through the connecting means. While the injected IPA is injected into the side and the air of the filter housing is discharged, and the filter membrane is wetted from the bottom, the injected IPA rises through the outlet side while discharging the air inside the filter membrane, and is displayed on the detection means such as the level gauge while maintaining the state. The filtration membrane is immersed in the IPA having a predetermined level or more and wetted. The pressurizing means of the present invention includes a filtration means (F) and an opening / closing means (V ₂ )) on one side of the ship provided with a flow control means (RO ₁ )) ( V ₄ ) and the connecting means is divided in the titration part and one end is connected to the other side of the dip tube 101 'on the upper part of the IPA bottle 100, and the other end is the dilution tank (4). When combined with the lower portion of the) to open the opening and closing means (V ₂ )) (V ₄ ), the IPA of the bottle 100 is dispersed and introduced into the filter body 6 along the connecting means 31, 51, respectively. When the nitrogen gas pressure flowing into the dilution tank (4) is greater than the dilution water pressure in the dilution tank (4) maintaining a constant water level (a), the gas pressure in the connecting means is always discharged to the surface of the water. It is equal to the water pressure of the dilution water and overpressure is prevented to provide a safe pressing means for the resin bottle. When this pressure acts on the upper surface of the IPA and the height between the liquid level of the IPA and the top of the connecting hose 31, which is the connecting means thereof, is smaller than the dilution water pressure, the IPA can pass through it and enter the filter 6. When the valve V ₃ is opened, nitrogen gas is released freely, and atmospheric pressure acts on the upper surface of the IPA bottle liquid, and naturally flows from the bottle 100 to the inside of the filter 6 by the siphon effect. As the wetting progresses by a good IPA, the IPA level rises and the filtration membrane is immersed in a deep enough IPA solution, resulting in efficient wetting. In addition, as shown in FIG. 3, the IPA bottle 100 is connected to the other side of the dip tube 101 'on the upper portion of the IPA bottle 100 by a manual operation such as a pump 200 and manually injects air. The air pressure acts on the liquid level to allow the IPA to flow through the top of the connection hose 31 and flow into the filter 6, and the inflow is naturally possible due to the cyphon effect. In this state, if wetting is sufficiently done on the filtration membrane after a certain period of time, the injection IPA is shut off, and then the level of the dilution tank is increased, and pure compressed gas such as nitrogen gas at a constant pressure is injected to keep the water in the dilution tank. Observe the amount of bubbles at the end of the discharge means and check the degree of wetting to re-test the wetting or to judge the progress to the next process.When wetting is performed on the entire filtration area, lower the level of the dilution tank and block the compression gas. After cleaning and opening the pure water, the washing water pushes the IPA wetted to the filtration membrane into the dilution tank and washes it. The wet washing is replaced with the filtration membrane. The filter of the filter which has a Teflon filtration membrane provided in the high purity chemical conveyance path of this sequential semiconductor manufacturing process. It suggests how to reset.

Based on the wetting method of the present invention, it will become more apparent if the device of the present invention, which is a preferred example thereof, will be described in detail according to the accompanying drawings. That is, the device of the present invention, as shown in Figure 4 to 7 of the accompanying drawings, the valve box 3 and the dilution tank 4 is integrally installed on the upper part of the main body 1 and is installed to extend in one side. An upper body (2) having a nitrogen gas pressure regulating valve (PCV ₁ ) connected to the valve box (3) and the lower portion of the dilution tank (4) is installed, and the valve box (3) has a front face. Multiple on / off valves (V ₂ ) (V ₃ ) (V ₄ ) (V ₅ ) (V ₆ ) and washing water flow meter (F ₁ ) with different functions are installed on the upper surface of the dilution water supply valve (V ₁₎ ) And a plurality of connecting hoses 31 installed at the end thereof and protruding upward, are connected to the IPA bottle 100, and the dilution tank 4 has a plurality of level gauges 41 at the front. It is fixed to each other while being connected to the outlet side connection hose 42 inside and bent at the upper side end of the level gauge 41 to the intermediate side inside the dilution tank (4). A plurality of discharge pipes 43 having one end fixed to each other are fixedly installed, and one side lower portion of the dilution tank 4 communicates the dilution tank 4 and the collection chamber 11 inside the body 1. The overflow drain valve (V ₇ ) is installed, the filter mounting plate (5) rotatable in the middle portion is made inside the main body (1) is made, the filter mounting band (5) in front of the filter fixing band A plurality of fixing blocks 51 having a plurality of fixing blocks 51 are fixedly installed at regular intervals, and a plurality of guide rails 53 are fitted to be interchangeable or flowable according to the size and shape of the mounting filter. A plurality of (54) is installed with the air opening and closing valve (V ₉ ) in the middle portion of the other end is extended to the rear and the branched 55, which is coupled to the plurality of inlet connection hoses 56 at one side It is formed with fixed inclination angle and fixedly installed. One side of the branch pipe 55 is made of the discharge on-off valve (V _8), the connecting pipes 57 coupled to and associated with the other valve top of the lower box 3 side is installed. At this time, the inlet-side connection lake 56 coupled to the branch pipe 55 and the connection hose 54 for air discharge, the connection hose 57 and the outlet-side connection hose connected to the valve box 3 located at the upper portion (42) preferably employs a flexible hose free of flow for its flow distance and ease of coupling. 5a is a shaft on both sides of the filter mounting plate, 58 is a lock device of the filter mounting plate 5, 59 is installed in the middle of the filter mounting plate 5, and the inflow side connection which is not put into use is not provided. By selecting and coupling the hose 56, the plug stopper for blocking the IPA flowing into the inlet-side connecting hose 56, the nitrogen gas washing water, 33 is formed on the valve box 3 to be inserted into the bottle 100 Plug stopper for coupling and disconnecting unused connection hoses 31 and 32, 101 is a dip tube lid, 101 'is a dip tube, 300 is a spray gun for cleaning, 301 is a spray gun 300 on / off valve, 302 Indicates each of the discharge opening and closing valves installed in the collection chamber 11 of the main body 1 to discharge the collected discharge to the outside, and in the description of the symbols, V ₂ is a nitrogen gas on-off valve, V ₄ is an IPA inlet opening and closing valve, V ₅ Drain gas inlet / opening valve, V ₆ Rinsing water inlet / opening valve, V ₈ Liquid drain valve, V ₉ denotes an air discharge opening / closing valve, respectively, a and b denote the water level of the dilution tank, and C denotes the water level indicated on the level gauge 41, respectively.

Referring to the action and effect on the present invention made of the above structure in detail according to the operating sequence as follows. First, the filter mounting plate 5 rotatably installed inside the main body 1 is rotated to a horizontal position to fix the lock mounting device 58, and then the fixed block 51 flows according to the length or size of the filter 6. After adjusting the length, the filter 6 to be wetted is placed on the arc surface of the fixed block 51 so that the fluid inlet 61 faces downward and the outlet 62 faces upward. Then, the inlet connecting hose 56 coupled to the branch pipe 55 is fitted into the inlet 61 of the filter 6, respectively, and the lock device 58 is released to mount the filter in the horizontal position. The plate 5 is reduced and locked to a vertical position, and then the fluid outlet port 61 and the gas outlet port 63 of the filter 6 are connected to the outlet side connecting hose 42 and the filter mounting plate 5 for gas discharge. By fitting and coupling the installed coupling lakes 54, the filter mounting operation is completed. In this state, one or two bottles of IPA-filled dilution-filled IPA are placed on a flat workbench located at the front of the upper body 2, and the lid of the bottle 100 is moved to the dip tube lid 101. By replacing and mounting the connection hose 31 and the IPA pressure gas connection hose 32 for supplying the IPA, respectively, to the dip tube lid 101, the preparation work for the wetting is completed. At this time, if the dilution water supply valve (V ₁ ) of the upper part of the valve box (3) is opened, the dilution water (clean water) is supplied to the dilution tank (4) from a separately provided dilution water supply source (not shown). (4) the number of dilution by giving the opening up the overflow drain valve (V ₇₎ in one side so as to maintain the water level (a) which is located at the lower side of the diluting number of tank 4 always passes through the overflow drain valve (V ₇₎ It is made to overflow by a predetermined amount to the collection chamber 11 provided inside the main body. In this state, the opening / closing valve (V ₉ ) of the filter mounting plate (5) connected to the air outlet (63) of the filter body (6) is opened, and the IPA inlet opening / closing valve (V ₄ ) of the front of the valve box (3) is opened. At the same time, when the nitrogen gas open / close valve (V ₂ ) is opened, the IPA of the bottle 100 is dispersed and introduced into the filter body 6 along the hose 31, which is introduced into the dilution tank 4. If the pressure is greater than the dilution water pressure inside the dilution tank 4 maintaining a constant water level (a), the gas is discharged to the surface in a bubble state. The internal gas pressure is always diluted with the connecting hoses 32 and 32a connecting the same. When the water pressure is equal to the water pressure and this pressure acts on the upper portion of the IPA liquid level inside the bottle 10, and the height between the IPA liquid surface and the top of the outflow connecting hose 31 fitted with the bottle is smaller than the applied hydraulic pressure, the bottle 100 The IPA inlet / opening valve (V ₄ ) opened inside the top of the connecting hose 31. Along with the inlet connection hose 56 and the inside of the filter (6) is to be introduced. At this time, when the IPA injected into the filter element 6 flows from each end of the air discharge connection hose 54 installed in the filter mounting plate 5 for air discharge, the filter element 6 is interposed between the inside of the filter element 6 and the filtration membrane 6 '. Since the air in the space is completely discharged, each air open / close valve (V ₉ ) is closed. At this time, when the IPA inside the bottle 100 passes through the top of the connection hose 31 and flows into the filter body 6, and then opens the nitrogen gas discharge valve V ₃ , the IPA acts on the siphon effect. By the flow of water from the bottle 100 naturally flows into the filter body 6 continues, and as time passes, the filter membrane 6 'inside the filter body 6 is gradually wetted and the IPA is filtered. It completely penetrates into the inside and passes through the outlet 62 of the upper part, and is displayed on the level gauge 41 made of a transparent body so that the level of the IPA can be visually checked and detected. As described above, the bottle 100 is carried out by the cyphon effect. The filtration membrane 6 'from which the IPA is supplied and the wetting proceeds is sufficiently immersed in the IPA having a predetermined level C, which is displayed on the level gauge 41. Next, after a predetermined time elapses, the completeness check of the pre-filtration membrane 6 'wetting is performed. This closes the IPA inlet opening / closing valve V ₄ and lowers the nitrogen gas pressure regulating valve PCV ₁ . After adjusting by checking the pressure gauge (PG ₁ ) (PG ₂ ) to be such that, the end of the discharge pipe 43 located on the upper side of the dilution tank 4 is refractory coupled to the upper portion of the level gauge 41 is diluted water When the overflow drain valve (V07) is shut off so that the water can be locked in the water, the dilution water drained through the overflow drain valve (V07) is shut off, and the dilution water supply valve (V01) is continuously supplied with a predetermined amount of dilution water level (a R) rises and maintains a constant height (b) while the tip of the discharge pipe 43 is immersed in dilution water and the dilution water unnecessary for detection that can be oversupplied flows. In such a state, the nitrogen gas inlet opening / closing valve (V05) is opened, and the above-mentioned nitrogen gas pressure regulating valve (PCV01) is adjusted to display the pressure at the filtration membrane (6 ′) Wetting Check Pressure (Etegrity test pressure, presented by each filter manufacturer). The nitrogen gas pressurizes the IPA, so that the IPA between the inside of the filter body 6 and the filtration membrane 6 'is pushed into the filtration membrane 6' and flows out to the end of the outlet 43 so that the filter body 6 And the filtration membrane 6 'are exposed to nitrogen gas and the nitrogen gas is pressurized from the outside to the inside of the filtration membrane 6', when the filtration membrane 6 'is wetted to IPA (when wet). Even if a pressure below a certain pressure is applied, the IPA wetted in the micropores of the filtration membrane 6 'blocks the nitrogen gas from passing through it, so that the end of the discharge pipe 43 submerged in the dilution water of the dilution tank 4 To observe the amount of air bubbles To determine the full extent of wetting. At this time, observe the amount of bubbles generated at the end of the discharge pipe 43 immersed in dilution water to determine the completeness of the wetting. At this time, if the amount of bubbles generated at the end of the discharge pipe 43 immersed in the dilution water exceeds the set reference value is determined to be defective and re-wetting, if the reference value is less than the next process.

After checking the filtration membrane wetting, open the overflow drain valve (V07) that was closed in the dilution tank (4) to lower the water level (b), shut off the nitrogen gas inlet / opening valve (V05), and then wash water inlet / opening valve. (V06) is opened to flush the washing water to the filter body (6) while opening the air discharge opening and closing valve (V09) of the filter mounting plate (5) to discharge the nitrogen gas filled in the filter body (6) After confirming that the washing water is discharged from the end of the discharge pipe 54, the air discharge opening / closing valve V09 is closed and the washing water is discharged through the outlet 62 through the filtration membrane 6 ′ inside the filter body 6. At the end, it falls on the surface of the water. Of course, at this time, the IPA wetted to the filtration membrane 6 'is pushed out to the washing water supplied to the dilution tank 4, and the washing water to the filtration membrane 6' is naturally replaced and wetted. At this time, the flow rate of the supplied washing water is also compared with the relative discharge at the end of the discharge pipe 43 connected to each filter element 6 while strongly and weakly adjusting the washing water inlet / opening valve V06 while checking the flow meter F01. The amount of washing water recommended for each filter is flowed out and then washed, and then the washing water inlet opening and closing valve (V06) is shut off, and the air discharge opening and closing valve (V09) and the liquid discharge valve (V08) of the branch pipe (55). Simultaneously by opening the filter 6 and the liquid (clean water) in the pipe to the collection chamber 11 to exclude the liquid inside the filter 6 to complete the wetting operation. After separating from the filter mounting plate (5) it can be installed in the device and equipment for use. When the filter mounting plate (5) is in a vertical position, it is suitable for the wetting posture, and the filter (6) is mounted, or When it is separated, it is convenient to be located in the horizontal position, so that it can be easily installed and locked so that the position can be easily changed according to the working order or the working condition. In addition, Figure 3 is installed on the other side of the dip tube (101 ') of the upper portion of the IPA bottle 100 by hand manual pump 200 to deliver the pressure of the manual pump 200 to the liquid level of the IPA, If the pressing force is greater than the height between the top of the connection hose 31 shows an example that may be allowed to flow into the interior of the filter body 6 over the top of the connection hose (31).

According to the present invention as described above, the process of wetting the IPA to the filtration membrane of the filter body, the process of inspecting this wetting state and the cleaning of the replacement with the IPA at the same time as the cleaning with ultrapure water is completely completed in one system Providing a wetting method and device that can be used to prevent water from being exposed to the air and contaminated by pure water introduction and cleaning water using safe pressurization means that can be applied to IPA and resin bottles. It is possible to perform multiple filters at the same time and wetting can improve the work efficiency and workability. In particular, the filter mounting plate can be rotated to provide good mounting and wetting posture of the filter. Not only has the working environment been improved, but also the automatic maintenance of the level. To be a very useful invention, which is easy to check geodulsu multiple beneficial effects such as to prevent the execution and IPA and cleaning water waste of the exact same time wetting operation is obvious.

Claims (7)

In the prewetting method of a semiconductor grade filter having a Teflon filtration membrane, when the IPA filled in the bottle is injected into the inlet side of the filter mounted on the mounting means by the pressurizing means through the connecting means, the IPA fills up and discharges the air inside. Ascending through and displayed on the detection means such as the level gauge, while maintaining the state, the filtration membrane is immersed in the IPA having a certain level or more, and wetted. After a certain period of time, the IPA is blocked, and then the level of the dilution tank is raised. Inject compressed gas to observe the amount of bubbles at the end of the discharge means submerged in the surface of the dilution tank, and check the degree of wetting. When wetting by IPA is performed on the entire filtration area, lower the level of the dilution tank and After blocking, open and inject pure water, and wash water by pushing the IPA wetted to the filtration membrane into the dilution tank and washing at the same time. And pre-wetting the filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process, characterized in that a series of processes are performed sequentially so that the remaining washing water after wetting is discharged to a collecting means. The method of claim 1, wherein when the IPA filled in the bottle is injected into the inlet side of the filter mounted on the mounting means by the pressurizing means through the connecting means, the IPA rises through the outflow side while discharging the air inside, such as a level gauge. The filter membrane is immersed in the IPA having a certain level and wetted while being displayed on the detection means, and then wetted. After a certain time, the IPA is blocked, and then the pure water is opened and injected to wash the water. Teflon is installed in the high-purity chemical transfer path of the semiconductor manufacturing process, characterized in that the washing is pushed out to the dilution tank and washed at the same time, the replacement and wetting and the remaining washing water after the wetting is discharged to the collecting means. A prewetting method of a filter having a filtration membrane. The filter according to any one of claims 1 to 4, wherein the filter is vertically erected to the rotatable mounting means such that the inflow side faces downward, so that the filter is variable horizontally or vertically according to the mounting and wetting of the filter. A prewetting method of a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process. The pressure tube according to any one of claims 1 to 3, wherein the pressurizing means has a filtering means and an opening / closing means on one side of the ship provided with the flow control means, and the connecting means is divided in the titration part so that one end of the dip tube is located at the top of the IPA bottle. It is connected to the other side and the other end is connected to the lower portion of the dilution tank to open and close the opening means, if the gas pressure flowing into the lower portion of the dilution tank is greater than the water pressure of the dilution water having a certain level is discharged to the water surface in the bubble state The internal gas pressure is always equal to the dilution water pressure, and this pressure acts on the upper surface of the IPA so that when the height between the liquid level of the IPA and the top of the IPA outlet connection means is small, the IPA flows into the filter through it. A method of prewetting a filter having a Teflon filtration membrane provided in a high purity chemical transport path of a semiconductor manufacturing process, which is enabled. The method according to any one of claims 1 to 4, wherein a manual pressure means for manual operation by hand is connected to the other side of the dip tube on the upper part of the IPA bottle, and the pressing force is transmitted to the IPA liquid level so that the IPA can be introduced into the filter. A method of prewetting a filter having a Teflon filtration membrane, which is installed in a high purity chemical transport path of a semiconductor manufacturing process. In the upper part of the body 1, the valve box 3 and the dilution tank 4 are integrally installed and extended in one side, so that nitrogen is branched and connected to the lower part of the valve box 3 and the dilution tank 4. doedoe upper body (2) has been installed, the gas pressure control valve (PCV ₁₎ is installed, wherein the valve box 3 is provided with a plurality of on-off valve (V ₂₎ each having a different function to the front (V ₃₎ (V ₄₎ ( V ₅ ) (V ₆ ) and the washing water flow meter (F ₁ ) is installed, the upper surface of the dilution water supply valve (V ₁ ) and a plurality of installed inside and connected to the IPA bottle 100 protruding upwards Connection hose 31 is installed, the end of the dilution tank (4) in front of the plurality of level gauges 41 are fixedly installed in connection with the outlet side connection hoses 42 inside the level gauge ( 41, the other end of the plurality of discharge pipes 43, each of which is bent and fixed at one end to an intermediate side inside the dilution tank, is bent and installed at the upper end of the dilution tank. Has one lower portion of the tank 4, the body of the dilution tank (4) (1) the overflow drain valve (V ₇₎ communicating opening and closing the collecting chamber (11) inside is installed is made, the main body (1), A prewetting device for a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process, wherein a rotatable filter mounting plate (5) is formed in an intermediate portion. According to claim 6, The filter mounting plate (5) is fixed to a plurality of guide rails (53) in which a plurality of fixed blocks 51 having a filter fixing band (52) on the front side of the flow or replaceable is fixed at regular intervals Installed therebetween, a plurality of connecting hoses 54 for air discharge with air opening and closing valve (V ₉ ) in the middle, and the other end is installed extending to the rear and a plurality of inlet connection hoses at the bottom ( 56 is coupled to the branch pipe 55 is formed to have a fixed inclination angle to one side is fixedly installed, the discharge opening and closing valve (V ₈ ) is coupled to one side of the branch pipe (55) and the upper valve on the other side Pre-wetting device for a filter having a Teflon filtration membrane is installed in the high purity chemical transport path of the semiconductor manufacturing process, characterized in that the connection hose 57 is connected to the bottom of the box (3).