KR960010056A - Prewetting method and apparatus for a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process - Google Patents

Prewetting method and apparatus for a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process Download PDF

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KR960010056A
KR960010056A KR1019940022538A KR19940022538A KR960010056A KR 960010056 A KR960010056 A KR 960010056A KR 1019940022538 A KR1019940022538 A KR 1019940022538A KR 19940022538 A KR19940022538 A KR 19940022538A KR 960010056 A KR960010056 A KR 960010056A
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filter
ipa
wetting
filtration membrane
dilution tank
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KR1019940022538A
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KR0136644B1 (en
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공희택
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공희택
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/30—Polyalkenyl halides
    • B01D71/32—Polyalkenyl halides containing fluorine atoms
    • B01D71/36—Polytetrafluoroethene

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅방법 및 장치에 관한 것으로, 종래에는 대기 즉 오염원에 그대로 노출된 상태로 그 작업을 수행하기 때문에 대기중에 포함된 수많은 파티클이 용기 혹은 용기내부의 IPA에 스며들어 필터의 여과막을 오염시킬수 있으며 또한 IPA가 충분한 초순수에 의한 세정이 이루어지지 않은 상태에서 사용에 투입되기 때문에 제품의 불량율을 증가시키며 IPA에 의한 화재의 위험성 역시 배제할 수 없을 뿐아니라 그 웨팅작업이 번거롭고 청결하지 못하며 그 작업 방식이 원시적 이어서 IPA유입경로 및 웨팅시의 자세불량으로 인한 불완전 웨팅가능성이 큰 문제가 있었다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for prewetting a filter having a Teflon filtration membrane which is installed in a high purity chemical transport path of a semiconductor manufacturing process. Numerous particles can penetrate the vessel or the IPA inside the container and contaminate the filter membrane of the filter.In addition, since the IPA is put into use without sufficient ultrapure water cleaning, it increases the defective rate of the product and the risk of fire caused by the IPA. Not only can it be excluded, but the wetting work is cumbersome and unclean, and the work method is primitive, so there is a big problem of incomplete wetting due to IPA inflow path and poor posture during wetting.

본 발명은 상기한 바와같은 종래 웨팅방식에서 야기되는 제반 문제점을 해소하고 개선하기 위하여 연구 개발된 것으로 여과막에 IPA를 웨팅시키는 과정과 이 웨팅상태를 검사하는 과정 및 초순수 세정수로의 세정과 동시에 교체 웨팅되는 과정이 하나의 시스템내에서 순차적으로 완벽하게 이루어질수 있도록한 필터의 웨팅방법 및 장치를 제공하여 근원적인 오염을 방지하고 작업의 효율성을 증대시키며 필터의 좋은 웨팅 및 장착자세를 제공하여 이에 따른 작업성을 향상시킬 수 있도록 한 것을 그 특징으로 한다.The present invention has been researched and developed in order to solve and improve all the problems caused by the conventional wetting method as described above, the process of wetting the IPA to the filtration membrane, the process of inspecting this wetting state, and the replacement wet at the same time as the cleaning with ultrapure water Wetting method and device of filter that allow the process to be completed completely in one system in order to prevent fundamental contamination, increase work efficiency, and provide good wetting and mounting position of filter It is characterized by that it can improve the.

Description

반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅 방법 및 장치Prewetting method and apparatus for a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (7)

테프론 여과막을 갖는 반도체급 필터의 프리웨팅방법에 있어서, 보틀에 충진된 IPA를 연결수단을 통해 가압수단으로 장착수단에 장착된 필터의 유입측에 주입시키면 IPA가 차올라 내부의 에어를 배출시키면서 유출측은 통해 상승하여 레벨게이지와 같은 검출수단에 표시됨과 동시에 그 상태를 유지하여 여과막이 일정이상의 수위를 갖는 IPA에 잠기게 되어 웨팅되고, 일정시간 경과후 IPA를 차단한 다음 희석탱크의 수위를 올리고, 순수압축 개스를 주입시켜 희석탱크의 수면에 잠겨있는 배출수단 끝에서의 기포량을 관찰, 웨팅의 정도를 확인하여 전여과면적에 IPA에 의한 웨팅이 이루어졌을 경우 희석탱크의 수위를 낮추고, 압축개스를 차단한후 순수세정수를 개방, 주입시켜 세정수가 여과막에 웨팅된 IPA를 희석탱크로 밀어내 세척함과 동시에 교체웨팅되면 웨팅후 잔여 세정수는 수집수단에 배출시킬 수 있도록 한 일련의 과정이 순차적으로 이루어지는 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅방법.In the prewetting method of a semiconductor grade filter having a Teflon filtration membrane, when the IPA filled in the bottle is injected into the inlet side of the filter mounted on the mounting means by the pressurizing means through the connecting means, the IPA fills up and discharges the air inside. Ascending through and displayed on the detection means such as the level gauge, while maintaining the state, the filtration membrane is immersed in the IPA having a certain level or more, and wetted. After a certain period of time, the IPA is blocked, and then the level of the dilution tank is raised. Inject compressed gas to observe the amount of bubbles at the end of the discharge means submerged in the surface of the dilution tank, and check the degree of wetting. When wetting by IPA is performed on the entire filtration area, lower the level of the dilution tank and After blocking, open and inject pure water, and wash water by pushing the IPA wetted to the filtration membrane into the dilution tank and washing at the same time. And pre-wetting the filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process, characterized in that a series of processes are performed sequentially so that the remaining washing water after wetting is discharged to a collecting means. 제1항에 있어서, 보틀에 충진된 IPA를 연결수단을 통해 가압수단으로 장착수단에 장착된 필터의 유입측에 주입시키면 IPA가 차올라 내부의 에어를 배출시키면서 유출측을 통해 상승하여 레벨게이지와 같은 검출수단에 표시됨과 동시에 그 상태를 유지하여 여과막이 일정이상의 수위를 갖는 IPA에 잠기게 되어 웨팅되고, 일정시간 경과후 IPA를 차단한 다음 순수세정수를 개방, 주입시켜 세정수가 여과막에 웨팅된 IPA를 희석탱크로 밀어내 세척함과 동시에 교체웨팅되며 웨팅후 잔여 세정수는 수집수단에 배출시킬 수 있도록 한 일련의 과정이 순차적으로 이루어지는 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅방법.The method of claim 1, wherein when the IPA filled in the bottle is injected into the inlet side of the filter mounted on the mounting means by the pressurizing means through the connecting means, the IPA rises through the outflow side while discharging the air inside, such as a level gauge. The filter membrane is immersed in the IPA having a certain level and wetted while being displayed on the detection means, and then wetted. After a certain time, the IPA is blocked, and then the pure water is opened and injected to wash the water. Teflon is installed in the high-purity chemical transfer path of the semiconductor manufacturing process, characterized in that the washing is pushed out to the dilution tank and washed at the same time, the replacement and wetting and the remaining washing water after the wetting is discharged to the collecting means. A prewetting method of a filter having a filtration membrane. 제1항 또는 제2항중 어느한항에 있어서, 상기 필터를 회전가능한 장착수단에 유입측이 하부로 향하도록 수직입설시켜 필터의 장착 및 웨팅에 따라 수평 또는 수직으로 가변가능하게 한 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅방법.The filter according to any one of claims 1 to 4, wherein the filter is vertically erected to the rotatable mounting means such that the inflow side faces downward, so that the filter is variable horizontally or vertically according to the mounting and wetting of the filter. A prewetting method of a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process. 제1항 또는 제2항중 어느한항에 있어서, 상기 가압수단은 흐름제어수단이 제공된 선상일측에 여과수단과 개폐수단을 갖고 있고 그 연결수단이 적정부에서 분할되어 한단은 IPA 보틀 상부의 딥튜브타측과 연결되고 타단은 희석탱크의 하부와 연결되어 개폐수단을 개방하여 이루되, 희석탱크 하부에 유입되는 개스압력이 일정수위를 갖는 희석수의 수압보다 크면 기포상태로 수면위로 배출되게 되어 연결수단내부의 개스압력이 항상 희석수의 수압과 같게 되고, 이압력이 IPA의 액면상부에 작용하여 IPA의 액면과 IPA유출측 연결수단의 최상부사이의 높이가 작을 경우 IPA가 이를 통하여 필터의 내부로 유입가능하게 한 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅방법.The pressure tube according to any one of claims 1 to 3, wherein the pressurizing means has a filtering means and an opening / closing means on one side of the ship provided with the flow control means, and the connecting means is divided in the titration part so that one end of the dip tube is located at the top of the IPA bottle. It is connected to the other side and the other end is connected to the lower portion of the dilution tank to open and close the opening means, if the gas pressure flowing into the lower portion of the dilution tank is greater than the water pressure of the dilution water having a certain level is discharged to the water surface in the bubble state The internal gas pressure is always equal to the dilution water pressure, and this pressure acts on the upper surface of the IPA so that when the height between the liquid level of the IPA and the top of the IPA outlet connection means is small, the IPA flows into the filter through it. A method of prewetting a filter having a Teflon filtration membrane provided in a high purity chemical transport path of a semiconductor manufacturing process, which is enabled. 제1항 또는 제2항중 어느한항에 있어서, IPA보틀 상부의 딥튜브 타측에 손으로 수동조작하는 수동가압수단을 연결하여 그 가압력이 IPA액면에 전달되어 IPA가 필터내부로 유입가능하게 한 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅방법.The method according to any one of claims 1 to 4, wherein a manual pressure means for manual operation by hand is connected to the other side of the dip tube on the upper part of the IPA bottle, and the pressing force is transmitted to the IPA liquid level so that the IPA can be introduced into the filter. A method of prewetting a filter having a Teflon filtration membrane, which is installed in a high purity chemical transport path of a semiconductor manufacturing process. 본체(1)의 상부에서 밸브박스(3)와 희석탱크(4)가 일체로 되고 일측에 내부로 연장설치되어 상기 밸브박스(3)와 상기 희석탱크(4)의 하부에 분기되어 연결되는 질소개스 압력조절밸브(PCV1)가 설치된 상부체(2)가 설치되되, 상기 밸브박스(3)에는 전면에 각각 다른 기능을 갖는 다수의 개폐밸브(V2)(V3)(V4)(V5)(V6)와 세정수유량계(F1)가 설치되고, 그 상부면에는 희석수공급밸브(V1)와 내부에 설치되어 상부로 돌출된 IPA보틀(100)과 연결되는 다수의 연결호스(31)가 설치되어지며, 그 끝단이 상기 희석탱크(4)에는 전면에 다수의 레벨게이지(41)가 내부의 유출측 연결호스(42)와 연결된채로 각각 고정설치되고 상기 레벨게이지(41)의 상부측 끝단에는 절곡되어 희석탱크 내부 중간측에 한단이 고정된 다수의 배출관(43) 타단이 각각 고정설치되어 지며, 상기 희석탱크(4)의 일측하부에는 상기 희석탱크(4)의 본체(1) 내부의 수집실(11)을 연통개폐시키는 넘침배수밸브(V7)가 설치되어 이루어지고, 본체(1)의 내부에는 중간부에 회동가능한 필터 장착판(5)이 축설되어 이루어 진 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅 장치.In the upper part of the body 1, the valve box 3 and the dilution tank 4 are integrally installed and extended in one side, so that nitrogen is branched and connected to the lower part of the valve box 3 and the dilution tank 4. doedoe upper body (2) has been installed, the gas pressure control valve (PCV 1) is installed, wherein the valve box 3 is provided with a plurality of on-off valve (V 2) each having a different function to the front (V 3) (V 4) ( V 5 ) (V 6 ) and the washing water flow meter (F 1 ) is installed, the upper surface of the dilution water supply valve (V 1 ) and a plurality of installed inside and connected to the IPA bottle 100 protruding upwards Connection hose 31 is installed, the end of the dilution tank (4) in front of the plurality of level gauges 41 are fixedly installed in connection with the outlet side connection hoses 42 inside the level gauge ( 41, the other end of the plurality of discharge pipes 43, each of which is bent and fixed at one end to an intermediate side inside the dilution tank, is bent and installed at the upper end of the dilution tank. Has one lower portion of the tank 4, the body of the dilution tank (4) (1) the overflow drain valve (V 7) communicating opening and closing the collecting chamber (11) inside is installed is made, the main body (1), A prewetting device for a filter having a Teflon filtration membrane installed in a high purity chemical transport path of a semiconductor manufacturing process, wherein a rotatable filter mounting plate (5) is formed in an intermediate portion. 제6항에 있어서, 상기 필터장착판(5)은 전면에 필터고정밴드(52)를 갖는 복수의 고정블럭(51)이 유동 또는 교체가능하게 끼워진 안내레일(53)이 일정간격으로 다수개 고정설치되고, 그 사이에는 에어배출을 위한 연결호스(54)가 중간부에 에어개폐밸브(V9)를 갖는채로 다수게 설치되어 그 타단이 후면으로 연장설치되며 하부에는 다수의 유입측 연결호스(56)가 결합된 분기관(55)이 일측으로 일정경사각도를 갖는채로 형성되어 고정설치되어지되, 상기 분기관(55)의 일측에는 배출개폐밸브(V8)가 결합되고 타측에는 상부의 밸브박스(3)하부와 연결되는 연결호스(57)가 설치되어 이루어진 것을 특징으로 하는 반도체 제조공정의 고순도 케미칼 이송로에 설치되는 테프론 여과막을 갖는 필터의 프리웨팅 장치.According to claim 6, The filter mounting plate (5) is fixed to a plurality of guide rails (53) in which a plurality of fixed blocks 51 having a filter fixing band (52) on the front side of the flow or replaceable is fixed at regular intervals Installed therebetween, a plurality of connecting hoses 54 for air discharge with air opening and closing valve (V 9 ) in the middle, and the other end is installed extending to the rear and a plurality of inlet connection hoses at the bottom ( 56 is coupled to the branch pipe 55 is formed to have a fixed inclination angle to one side is fixedly installed, the discharge opening and closing valve (V 8 ) is coupled to one side of the branch pipe (55) and the upper valve on the other side Pre-wetting device for a filter having a Teflon filtration membrane is installed in the high purity chemical transport path of the semiconductor manufacturing process, characterized in that the connection hose 57 is connected to the bottom of the box (3). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940022538A 1994-09-07 1994-09-07 Prewetting method and apparatus of filter having teflon membrane placed on high purity chemical line in semiconductor manufacturing process KR0136644B1 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100465854B1 (en) * 1997-12-27 2005-05-20 주식회사 하이닉스반도체 A method of forming the lower electrode barrier film of a high dielectric capacitor
KR100571626B1 (en) * 1999-07-27 2006-04-17 주식회사 하이닉스반도체 Method for forming metal wire using zirconiumdiboride layer as diffusion barrier
KR100555452B1 (en) * 1998-10-19 2006-04-21 삼성전자주식회사 Manufacturing method of semiconductor device which can reduce contact resistance
KR100752209B1 (en) * 2000-12-27 2007-08-28 엘지.필립스 엘시디 주식회사 Liquid Crystal Display Device

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MY169584A (en) 2005-04-25 2019-04-22 Entegris Inc Liner-based liquid storage and dispensing system with empty detection capability
EP1896359B1 (en) 2005-06-06 2017-01-11 Advanced Technology Materials, Inc. Fluid storage and dispensing systems and processes

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100465854B1 (en) * 1997-12-27 2005-05-20 주식회사 하이닉스반도체 A method of forming the lower electrode barrier film of a high dielectric capacitor
KR100555452B1 (en) * 1998-10-19 2006-04-21 삼성전자주식회사 Manufacturing method of semiconductor device which can reduce contact resistance
KR100571626B1 (en) * 1999-07-27 2006-04-17 주식회사 하이닉스반도체 Method for forming metal wire using zirconiumdiboride layer as diffusion barrier
KR100752209B1 (en) * 2000-12-27 2007-08-28 엘지.필립스 엘시디 주식회사 Liquid Crystal Display Device

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