CN110161742B - Black matrix, preparation method thereof and display panel - Google Patents
Black matrix, preparation method thereof and display panel Download PDFInfo
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- CN110161742B CN110161742B CN201910404619.1A CN201910404619A CN110161742B CN 110161742 B CN110161742 B CN 110161742B CN 201910404619 A CN201910404619 A CN 201910404619A CN 110161742 B CN110161742 B CN 110161742B
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- black matrix
- resin composition
- spiropyran derivative
- mass
- auxiliary agent
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- 239000011159 matrix material Substances 0.000 title claims abstract description 53
- 238000002360 preparation method Methods 0.000 title abstract description 9
- 239000011342 resin composition Substances 0.000 claims abstract description 49
- 239000002904 solvent Substances 0.000 claims abstract description 33
- 239000012752 auxiliary agent Substances 0.000 claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims abstract description 27
- 239000000178 monomer Substances 0.000 claims abstract description 27
- 239000004840 adhesive resin Substances 0.000 claims abstract description 18
- 229920006223 adhesive resin Polymers 0.000 claims abstract description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 14
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- 239000011230 binding agent Substances 0.000 claims description 12
- 239000004925 Acrylic resin Substances 0.000 claims description 10
- 229920000178 Acrylic resin Polymers 0.000 claims description 10
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 8
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 claims description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 4
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 4
- MHMSVORGFNCDAE-UHFFFAOYSA-N CCCCOCCOCCOC(=O)C.COCCO Chemical compound CCCCOCCOCCOC(=O)C.COCCO MHMSVORGFNCDAE-UHFFFAOYSA-N 0.000 claims description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 4
- 125000000524 functional group Chemical group 0.000 claims description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- 244000028419 Styrax benzoin Species 0.000 claims description 3
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 3
- 229960002130 benzoin Drugs 0.000 claims description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 3
- 239000012965 benzophenone Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 235000019382 gum benzoic Nutrition 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims 2
- 239000003999 initiator Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 5
- 230000008707 rearrangement Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 13
- -1 2-methacryloyloxyethyl Chemical group 0.000 description 10
- 239000010408 film Substances 0.000 description 10
- 239000000049 pigment Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 150000008062 acetophenones Chemical class 0.000 description 5
- 150000008366 benzophenones Chemical class 0.000 description 5
- 150000002460 imidazoles Chemical class 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 2
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 2
- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- BEUGBYXJXMVRFO-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=CC=C1 BEUGBYXJXMVRFO-UHFFFAOYSA-N 0.000 description 2
- RDKXOOCTKMIEGS-UHFFFAOYSA-N [SiH4].NC(O)=O Chemical compound [SiH4].NC(O)=O RDKXOOCTKMIEGS-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- MZRQZJOUYWKDNH-UHFFFAOYSA-N diphenylphosphoryl-(2,3,4-trimethylphenyl)methanone Chemical compound CC1=C(C)C(C)=CC=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MZRQZJOUYWKDNH-UHFFFAOYSA-N 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000005375 organosiloxane group Chemical group 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 2
- WPSPGZNUOYUBLZ-UHFFFAOYSA-N phenyl-(2,3,4,5-tetraphenylphenyl)methanone Chemical compound C1(=CC=CC=C1)C=1C(=C(C(=C(C(=O)C2=CC=CC=C2)C1)C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 WPSPGZNUOYUBLZ-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- RQAGEUFKLGHJPA-UHFFFAOYSA-N prop-2-enoylsilicon Chemical compound [Si]C(=O)C=C RQAGEUFKLGHJPA-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
The invention provides a black matrix, a preparation method thereof and a display panel, wherein the black matrix is prepared from a resin composition, and the resin composition comprises the following components: the spiropyran derivative comprises a spiropyran derivative, adhesive resin, a photoinitiator, a polymerizable monomer, a shading material, an auxiliary agent and a solvent, wherein the molecular structural formula of the spiropyran derivative is as follows:wherein R is: -CnH2n+1、‑CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3. According to the scheme, the spiropyran derivative can drive rearrangement of a polymer chain and doped molecules after structural isomerism occurs, so that a gap between a black matrix and a substrate is eliminated, and the yield of a display panel is improved.
Description
Technical Field
The invention relates to the technical field of display, in particular to a black matrix, a preparation method thereof and a display panel.
Background
Currently, a Color Filter (CF) substrate in a thin film transistor liquid crystal display panel is provided with a Black Matrix (BM) for preventing Color mixing between pixels or light leakage at the edge of the CF substrate. With the demand of the market for high performance of products, the BM line width is narrower and narrower, and the optical density of the BM is required to be higher and higher, and the optical density of the BM is generally increased by increasing the content of carbon in the BM.
However, the reduction of the BM line width and the increase of the carbon content in the BM may cause the adhesion between the BM and the substrate and the sealant in the tft liquid crystal display panel to be reduced, and further cause bubbles to enter the panel, resulting in poor panel quality.
In summary, it is necessary to provide a high quality black matrix, a method for manufacturing the same, and a display panel.
Disclosure of Invention
The invention aims to provide a black matrix, a preparation method thereof and a display panel.
The embodiment of the invention provides a black matrix, wherein the black matrix is prepared from a resin composition, the resin composition comprises a spiropyran derivative, and the molecular structural formula of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
In one embodiment, the resin composition further comprises: 5-15% of adhesive resin in the resin composition by mass; a photoinitiator, wherein the mass percent of the photoinitiator in the resin composition is 0.01-2%; the mass percentage of the polymerizable monomer in the resin composition is 0.01-1%; a light shielding material, wherein the weight percentage of the light shielding material in the resin composition is 5-12%; the auxiliary agent accounts for 0-0.5% of the resin composition by mass; a solvent, wherein the mass percent of the solvent in the resin composition is 70-85%; wherein the weight percentage of the spiropyran derivative in the resin composition is 1-5%.
In one embodiment, the binder resin includes a multifunctional acrylic resin, and the functional group includes at least one of an unsaturated double bond, an epoxy group, a hydroxyl group, and a carboxyl group.
In one embodiment, the photoinitiator includes at least one of acetophenone compounds, imidazole compounds, benzophenone compounds, benzoin compounds, and acylphosphine oxide derivatives.
In one embodiment, the polymerizable monomer includes styrene, acrylate or methacrylate having an unsaturated double bond structure.
In one embodiment, the additives include an adhesion additive and a leveling additive, the adhesion additive including a silane coupling agent.
In one embodiment, the solvent comprises at least one of tetrahydrofuran, cyclohexanone, propylene glycol methyl ether acetate, ethyl acetate, butyl acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, propylene glycol monomethyl ethyl acetate, acetone, ethylene glycol dimethyl ether, diethylene glycol butyl ether acetate ethylene glycol monomethyl ether, propylene glycol monomethyl ether, 1, 4-dioxane, methyl ethyl ketone, methyl isobutyl ketone, methanol, ethanol, propanol, n-butanol, toluene, xylene, ethylbenzene, dimethyl sulfoxide, and dimethylacetamide.
In one embodiment, the composition material of the black matrix includes structural isomers of a spiropyran derivative, and the molecular structure of the structural isomers of the spiropyran derivative is:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
The embodiment of the invention also provides a preparation method of the black matrix, which comprises the following steps:
providing adhesive resin, a photoinitiator, a polymerizable monomer, a shading material, a spiropyran derivative, an auxiliary agent and a solvent;
mixing the adhesive resin, the photoinitiator, the polymerizable monomer, the light-shielding material, the spiropyran derivative and the auxiliary agent with the solvent to form a solution;
coating the solution on the surface of a substrate to form a layer of film;
etching the film to form a black matrix, wherein the black matrix comprises structural isomers of a spiropyran derivative, and the molecular structure of the structural isomers of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
The embodiment of the invention also provides a display panel, which comprises a first substrate, a second substrate arranged opposite to the first substrate and a black matrix arranged on the second substrate and close to the first substrate;
the black matrix comprises a structural isomer of a spiropyran derivative, and the molecular structure of the structural isomer of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
The invention provides a black matrix, a preparation method thereof and a display panel, wherein the resin composition comprises a molecular structural formula
Wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3. According to the invention, the structural isomers of the spiropyran derivative generated after the spiropyran derivative is structurally isomerized can drive the rearrangement of a polymer chain and doped molecules, so that the gap between a black matrix and a substrate is eliminated, and the yield of a display panel is improved.
Drawings
The invention is further illustrated by the following figures. It should be noted that the drawings in the following description are only for illustrating some embodiments of the invention, and that other drawings may be derived from those drawings by a person skilled in the art without inventive effort.
Fig. 1 is a flowchart of a method for manufacturing a black matrix according to an embodiment of the present invention.
Fig. 2 is a flowchart of another method for manufacturing a black matrix according to an embodiment of the present invention.
Fig. 3 is a flowchart of a method for manufacturing a black matrix according to another embodiment of the present invention.
Fig. 4 is a flowchart of a method for manufacturing a black matrix according to another embodiment of the present invention.
Fig. 5 is a schematic diagram of a cross-sectional structure of a display panel according to an embodiment of the present invention.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "close" and the like indicate the orientation or positional relationship based on the drawings, wherein "upper" simply means that the surface is above the object, specifically refers to the right above, obliquely above, upper surface, as long as it is above the object level, and "close" means that the side is closer to the target distance in comparison, and the above orientation or positional relationship is only for convenience of describing the present invention and simplifying the description, and does not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and operate, and thus, should not be construed as limiting the present invention.
It should be noted that the drawings only provide the structures and/or steps which are relatively closely related to the present invention, and some details which are not related to the present invention are omitted, so as to simplify the drawings and make the present invention clear, but not to show that the actual devices and/or methods are the same as the drawings and are not limitations of the actual devices and/or methods.
The present invention provides a black matrix including a resin composition.
The resin composition provided by the invention comprises a spiropyran derivative, adhesive resin, a photoinitiator, a polymerizable monomer, a light-shielding material, an auxiliary agent and a solvent.
The light-shielding material comprises, by mass, 5-15% of the binder resin, 0.01-2% of the photoinitiator, 0.01-1% of the polymerizable monomer, 5-12% of the light-shielding material, 1-5% of the spiropyran derivative, 0-0.5% of the auxiliary agent and 70-85% of the solvent, wherein the binder resin is in the resin composition, the photoinitiator is in the resin composition, the light-shielding material is in the resin composition, the spiropyran derivative is in the resin composition, the auxiliary agent is in the resin composition, and the solvent is in the resin composition.
In particular, the molecular structural formula of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3; the spiropyran derivative can generate structural isomerism under the condition of illumination, and the molecular structural formula of the structural isomer of the generated spiropyran derivative is as follows:wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
Wherein the adhesive resin comprises a multifunctional acrylic resin, and the functional group comprises at least one of unsaturated double bonds, epoxy groups, hydroxyl groups and carboxyl groups. Further, the essential component of the binder resin is a carboxyl group-containing acrylic resin, such as 2-methacryloyloxyethyl, phthalic acid, etc., which can make the alkali-soluble resin react with the alkali developer to be dissolved and washed away in the developing stage, thereby forming a corresponding pattern. Generally, the adhesive resin also contains epoxy acrylic resin, and the epoxy acrylic resin can generate hydroxyl or further generate crosslinking reaction with other epoxy acrylate after ring opening in the baking stage, so that the compactness of the resin composition is improved.
The photoinitiator comprises at least one of acetophenone compounds, imidazole compounds, benzophenone compounds, benzoin compounds and acyl phosphine oxide derivatives. In particular, the photoinitiator can absorb the energy of light with the wavelength ranging from 270nm to 400nm to generate free radicals or cations, thereby initiating the polymerization, crosslinking and curing of the monomers. Specifically, the photoinitiator may include acetophenone compounds such as diethoxyacetophenone, 2-dibutoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-dimethoxy-2-phenylacetophenone and the like; imidazole compounds such as 2-methylimidazole, 4-methylimidazole, 1, 2-dimethylimidazole and benzimidazole; benzophenone compounds such as benzophenone, tetraphenylbenzophenone, hydroxybenzophenone, 4-dimethylaminobenzophenone and the like; benzoin compounds such as benzoin compounds including benzoin and 1- (2-methylphenyl) -2-acetophenone; acylphosphine oxide derivatives such as trimethylbenzoyl-diphenylphosphine oxide. Commercially available, the photoinitiator may be irgacure369, OXE-01, OXE-02, and the like.
Wherein the polymerizable monomer comprises styrene, acrylate or methacrylate with an unsaturated double bond structure. As an example, the polymerizable monomer may be dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate.
Wherein the light-shielding material comprises at least one of carbon black, an organic black pigment, and an inorganic black pigment. As examples, the carbon black may be c.i. pigment black7, MA100, #1000, #2650 manufactured by mitsubishi chemical; the organic black pigment can be perylene black, aniline black and cyanine black; the inorganic black pigment may be titanium oxide, chromium oxide, iron oxide or graphite.
The auxiliary agent comprises an adhesion auxiliary agent and a leveling auxiliary agent, wherein the adhesion auxiliary agent comprises a silane coupling agent. The leveling assistant can enable the surface of the film to be more flat and uniform after the photoresist is formed into the film and cured. Specifically, the adhesion promoter includes carbamic acid silane, vinyl silane, isocyanic silane, epoxy silane, (meth) acryl silane, aldimino silane, and the like, and also includes the above-mentioned alkane oligomer-form substances; the leveling auxiliary agent comprises at least one of an acrylic leveling agent, an organosiloxane wetting agent and a fluorocarbon modified acrylate leveling agent.
Wherein the solvent comprises at least one of tetrahydrofuran, cyclohexanone, propylene glycol methyl ether acetate, ethyl acetate, butyl acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, propylene glycol monomethyl ethyl acetate, acetone, ethylene glycol dimethyl ether, diethylene glycol butyl ether acetate ethylene glycol monomethyl ether, propylene glycol monomethyl ether, 1, 4-dioxane, methyl ethyl ketone, methyl isobutyl ketone, methanol, ethanol, propanol, n-butanol, toluene, xylene, ethylbenzene, dimethyl sulfoxide and dimethylacetamide.
The invention also provides a preparation method of the black matrix, as shown in fig. 1, comprising the following steps:
s101: a binder resin, a photoinitiator, a polymerizable monomer, a light-shielding material, a spiropyran derivative, an auxiliary agent and a solvent are provided.
The light-shielding material comprises, by mass, 5-15% of the binder resin, 0.01-2% of the photoinitiator, 0.01-1% of the polymerizable monomer, 5-12% of the light-shielding material, 1-5% of the spiropyran derivative, 0-0.5% of the auxiliary agent and 70-85% of the solvent, wherein the binder resin is in the resin composition, the photoinitiator is in the resin composition, the light-shielding material is in the resin composition, the spiropyran derivative is in the resin composition, the auxiliary agent is in the resin composition, and the solvent is in the resin composition.
In particular, the molecular structural formula of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3; the spiropyran derivative can generate structural isomerism under the condition of illumination, and the molecular structural formula of the structural isomer of the generated spiropyran derivative is as follows:wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
Wherein the adhesive resin comprises a multifunctional acrylic resin, and the functional group comprises at least one of unsaturated double bonds, epoxy groups, hydroxyl groups and carboxyl groups. Further, the essential component of the binder resin is a carboxyl group-containing acrylic resin, such as 2-methacryloyloxyethyl, phthalic acid, etc., which can make the alkali-soluble resin react with the alkali developer to be dissolved and washed away in the developing stage, thereby forming a corresponding pattern. Generally, the adhesive resin also contains epoxy acrylic resin, and the epoxy acrylic resin can generate hydroxyl or further generate crosslinking reaction with other epoxy acrylate after ring opening in the baking stage, so that the compactness of the resin composition is improved.
The photoinitiator comprises at least one of acetophenone compounds, imidazole compounds, benzophenone compounds, benzoin compounds and acyl phosphine oxide derivatives. In particular, the photoinitiator can absorb the energy of light with the wavelength ranging from 270nm to 400nm to generate free radicals or cations, thereby initiating the polymerization, crosslinking and curing of the monomers. Specifically, the photoinitiator may include acetophenone compounds such as diethoxyacetophenone, 2-dibutoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-dimethoxy-2-phenylacetophenone and the like; imidazole compounds such as 2-methylimidazole, 4-methylimidazole, 1, 2-dimethylimidazole and benzimidazole; benzophenone compounds such as benzophenone, tetraphenylbenzophenone, hydroxybenzophenone, 4-dimethylaminobenzophenone and the like; benzoin compounds such as benzoin compounds including benzoin and 1- (2-methylphenyl) -2-acetophenone; acylphosphine oxide derivatives such as trimethylbenzoyl-diphenylphosphine oxide. Commercially available, the photoinitiator may be irgacure369, OXE-01, OXE-02, and the like.
Wherein the polymerizable monomer comprises styrene, acrylate or methacrylate with an unsaturated double bond structure. As an example, the polymerizable monomer may be dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate.
Wherein the light-shielding material comprises at least one of carbon black, an organic black pigment, and an inorganic black pigment. As examples, the carbon black may be c.i. pigment black7, MA100, #1000, #2650 manufactured by mitsubishi chemical; the organic black pigment can be perylene black, aniline black and cyanine black; the inorganic black pigment may be titanium oxide, chromium oxide, iron oxide or graphite.
The auxiliary agent comprises an adhesion auxiliary agent and a leveling auxiliary agent, wherein the adhesion auxiliary agent comprises a silane coupling agent. The leveling assistant can enable the surface of the film to be more flat and uniform after the photoresist is formed into the film and cured. Specifically, the adhesion promoter includes carbamic acid silane, vinyl silane, isocyanic silane, epoxy silane, (meth) acryl silane, aldimino silane, and the like, and also includes the above-mentioned alkane oligomer-form substances; the leveling auxiliary agent comprises at least one of an acrylic leveling agent, an organosiloxane wetting agent and a fluorocarbon modified acrylate leveling agent.
Wherein the solvent comprises at least one of tetrahydrofuran, cyclohexanone, propylene glycol methyl ether acetate, ethyl acetate, butyl acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, propylene glycol monomethyl ethyl acetate, acetone, ethylene glycol dimethyl ether, diethylene glycol butyl ether acetate ethylene glycol monomethyl ether, propylene glycol monomethyl ether, 1, 4-dioxane, methyl ethyl ketone, methyl isobutyl ketone, methanol, ethanol, propanol, n-butanol, toluene, xylene, ethylbenzene, dimethyl sulfoxide and dimethylacetamide.
S102: and mixing the adhesive resin, the photoinitiator, the polymerizable monomer, the light-shielding material, the spiropyran derivative and the auxiliary agent with the solvent to form a solution.
In an embodiment, as shown in fig. 2, the step S102 may specifically include the following steps:
s10211: the binder resin and solvent are divided into first and second portions, respectively.
S10212 mixing the light-shielding material with the first part of the binder resin and the first part of the solvent to form a first solution.
Wherein, the adhesive resin and the solvent can be divided into a first part and a second part with the same mass respectively, and the mixture can be continuously stirred in the mixing process, so that the light-shading material can be uniformly dispersed in the adhesive resin and the solvent.
S10213: and mixing the first solution with the photoinitiator, the polymerizable monomer, the spiropyran derivative, the auxiliary agent, the second part of adhesive resin and the second part of solvent to form a solution.
Wherein the mixture can be continuously stirred in the mixing process, so that the mixture can be uniformly mixed.
In an embodiment, as shown in fig. 3, the step S102 may specifically include the following steps.
S10221: the solvent is divided into a first portion and a second portion.
S10222: the first portion of solvent was added to a vessel, nitrogen was bubbled through the vessel and the solvent was stirred and heated to 100 ℃ to form a second solution.
The solvent may be selectively divided into a first part and a second part having the same mass, and the solvent may be heated while stirring the solvent, so that the solvent can be sufficiently homogenized.
S10223: adding the binder resin, the photoinitiator, the polymerizable monomer, the light-screening material, the spiropyran derivative, and the auxiliary agent to the container, and stirring the mixture to form a third solution.
The polymerizable monomer, the adhesive resin, the light-shielding material, the spiropyran derivative, the auxiliary agent and the photoinitiator can be sequentially added into the container, and the stirring time is 4-10 hours, so that the mixture can be fully homogenized.
S10224: adding the second portion of solvent to the vessel and cooling the mixture to 50-80 ℃.
S10225: the nitrogen gas was stopped from being introduced into the vessel, and the mixture in the vessel was stirred in the air to form a solution.
Wherein the stirring time is 4-6 hours.
S103: and coating the solution on the surface of a substrate to form a layer of film.
S104: etching the film to form a black matrix, wherein the black matrix comprises structural isomers of a spiropyran derivative, and the molecular structure of the structural isomers of the spiropyran derivative is as follows:
in an embodiment, as shown in fig. 4, the step S104 may specifically include the following steps:
s1041: and exposing the film to generate the structural isomer of the spiropyran derivative.
Wherein, a high-pressure mercury lamp can be used as the exposure light source, the main wavelength of the light emitted by the high-pressure mercury lamp is 365nm, the exposure can be 1 minute, and the spiropyran derivative can be structurally isomerized into the structural isomer of the spiropyran derivative in the exposure process.
S1042: and developing, hard baking, etching and peeling the exposed film to form the black matrix.
In particular, the structural isomers of the spiropyran derivative can drive the polymer chains and the doping molecules in the solution to be rearranged in the subsequent annealing process, so that cavities and gaps between the thin film and the substrate are eliminated, and the adhesiveness of the interface between the thin film and the substrate can be improved.
As shown in fig. 5, the display panel 700 includes a first substrate 701, a thin film transistor layer 702 disposed on the first substrate, a passivation layer 703 disposed on the thin film transistor layer, a pixel electrode 704 and a spacer 705 disposed on the passivation layer, a second substrate 706 disposed opposite to the first substrate 701, and a black matrix 707 disposed on the second substrate 706 and close to the first substrate 701.
The black matrix 707 is made of the resin composition, and the constituent material of the black matrix 707 includes structural isomers of a spiropyran derivative, and the molecular structure of the structural isomers of the spiropyran derivative is:wherein R is: -CnH2n +1, -CnH2nOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
In particular, the structural isomers of the spiropyran derivative can drive the polymer chains and the doping molecules to rearrange in the subsequent annealing process, so that the cavities and gaps between the black matrix and the substrate are eliminated, and the adhesiveness of the interface between the black matrix and the substrate can be improved.
The invention provides a resin composition, a black matrix and a preparation method thereof, and a display panel, wherein the resin composition comprises: the spiropyran derivative comprises a spiropyran derivative, adhesive resin, a photoinitiator, a polymerizable monomer, a shading material, an auxiliary agent and a solvent, wherein the molecular structural formula of the spiropyran derivative is as follows:
wherein R is: -CnH2n +1, -CnH2nOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3. According to the scheme, the spiropyran derivative can drive rearrangement of a polymer chain and doped molecules after structural isomerism occurs, so that a gap between a black matrix and a substrate is eliminated, and the yield of a display panel is improved.
The above detailed description is provided for a resin composition, a black matrix, a method for manufacturing the black matrix, and a display panel according to embodiments of the present invention, and a specific example is applied in the present disclosure to explain the principle and the implementation of the present invention, and the description of the above embodiments is only used to help understanding the technical solution and the core concept of the present invention; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. A black matrix, the said black matrix is made of a kind of resin composition, characterized by, the said resin composition includes spiropyran derivative and polymerisable monomer;
the molecular structural formula of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, m is 1-3, the spiropyran derivative is in1-5% by mass of the resin composition;
the mass percentage of the polymerizable monomer in the resin composition is 0.01-1%.
2. The black matrix of claim 1, wherein the resin composition further comprises: 5-15% of adhesive resin in the resin composition by mass; a photoinitiator, wherein the mass percent of the photoinitiator in the resin composition is 0.01-2%; a light shielding material, wherein the weight percentage of the light shielding material in the resin composition is 5-12%; the auxiliary agent accounts for 0-0.5% of the resin composition by mass; and the solvent accounts for 70-85% of the resin composition by mass.
3. The black matrix of claim 2, wherein the binder resin comprises a multifunctional acrylic resin, and the functional group comprises at least one of an unsaturated double bond, an epoxy group, a hydroxyl group, and a carboxyl group.
4. The black matrix of claim 2, wherein the photo-initiator comprises at least one of acetophenone, imidazole, benzophenone, benzoin, and acylphosphine oxide derivatives.
5. The black matrix of claim 2, wherein the polymerizable monomer comprises styrene, acrylate or methacrylate having an unsaturated double bond structure.
6. The black matrix of claim 2, wherein the auxiliary agent comprises an adhesion auxiliary agent and a leveling auxiliary agent, the adhesion auxiliary agent comprising a silane coupling agent.
7. The black matrix of claim 2, wherein the solvent comprises at least one of tetrahydrofuran, cyclohexanone, propylene glycol methyl ether acetate, ethyl acetate, butyl acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, propylene glycol monomethyl ethyl acetate, acetone, ethylene glycol dimethyl ether, diethylene glycol butyl ether acetate ethylene glycol monomethyl ether, propylene glycol monomethyl ether, 1, 4-dioxane, methyl ethyl ketone, methyl isobutyl ketone, methanol, ethanol, propanol, n-butanol, toluene, xylene, ethylbenzene, dimethyl sulfoxide, and dimethylacetamide.
9. A method of making a black matrix, comprising:
providing adhesive resin, a photoinitiator, a polymerizable monomer, a light shielding material, a spiropyran derivative, an auxiliary agent and a solvent as a resin composition, wherein the spiropyran derivative accounts for 1-5% of the resin composition by mass, and the polymerizable monomer accounts for 0.01-1% of the resin composition by mass;
mixing the adhesive resin, the photoinitiator, the polymerizable monomer, the light-shielding material, the spiropyran derivative and the auxiliary agent with the solvent to form a solution;
coating the solution on the surface of a substrate to form a layer of film;
etching the film to form a black matrix, wherein the black matrix comprises structural isomers of a spiropyran derivative, and the molecular structure of the structural isomers of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
10. A display panel is characterized by comprising a first substrate, a second substrate arranged opposite to the first substrate and a black matrix arranged on the second substrate and close to the first substrate;
the black matrix is made of a resin composition, the resin composition comprises 1-5% by mass of a spiropyran derivative and 0.01-1% by mass of a polymerizable monomer in the resin composition;
the composition material of the black matrix comprises structural isomers of a spiropyran derivative, and the molecular structure of the structural isomers of the spiropyran derivative is as follows:
wherein R is: -CnH2n+1、-CmH2mOH, -Ar or-Ar-CHO, n is 1-20, and m is 1-3.
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