CN110156317B - 一种紫外、可见及近红外光吸收玻璃及其制备方法和应用 - Google Patents
一种紫外、可见及近红外光吸收玻璃及其制备方法和应用 Download PDFInfo
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- CN110156317B CN110156317B CN201910444001.8A CN201910444001A CN110156317B CN 110156317 B CN110156317 B CN 110156317B CN 201910444001 A CN201910444001 A CN 201910444001A CN 110156317 B CN110156317 B CN 110156317B
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- 239000011521 glass Substances 0.000 title claims abstract description 112
- 238000002360 preparation method Methods 0.000 title abstract description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 20
- 239000010941 cobalt Substances 0.000 claims abstract description 20
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 20
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000002834 transmittance Methods 0.000 claims abstract description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 15
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052802 copper Inorganic materials 0.000 claims abstract description 15
- 239000010949 copper Substances 0.000 claims abstract description 15
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims description 13
- 230000003595 spectral effect Effects 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 229910052783 alkali metal Inorganic materials 0.000 claims description 10
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 239000000835 fiber Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 238000010309 melting process Methods 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 239000011733 molybdenum Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 150000001340 alkali metals Chemical class 0.000 claims description 6
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 6
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- 229910002651 NO3 Inorganic materials 0.000 claims description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004031 devitrification Methods 0.000 claims description 4
- 230000009477 glass transition Effects 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- 239000005385 borate glass Substances 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 239000005365 phosphate glass Substances 0.000 claims description 3
- 239000005368 silicate glass Substances 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 239000006004 Quartz sand Substances 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 2
- 239000004327 boric acid Substances 0.000 claims description 2
- 229910052792 caesium Inorganic materials 0.000 claims description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- 238000005352 clarification Methods 0.000 claims description 2
- 239000004927 clay Substances 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- 150000004820 halides Chemical class 0.000 claims description 2
- 238000000265 homogenisation Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 229910052701 rubidium Inorganic materials 0.000 claims description 2
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 2
- 238000005303 weighing Methods 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000031700 light absorption Effects 0.000 abstract description 17
- 239000013307 optical fiber Substances 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 11
- 238000003384 imaging method Methods 0.000 abstract description 8
- 238000002425 crystallisation Methods 0.000 abstract description 7
- 230000008025 crystallization Effects 0.000 abstract description 7
- 230000007547 defect Effects 0.000 abstract description 3
- 238000010521 absorption reaction Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- FAWGZAFXDJGWBB-UHFFFAOYSA-N antimony(3+) Chemical compound [Sb+3] FAWGZAFXDJGWBB-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- UPWOEMHINGJHOB-UHFFFAOYSA-N cobalt(III) oxide Inorganic materials O=[Co]O[Co]=O UPWOEMHINGJHOB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000012681 fiber drawing Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- GNMQOUGYKPVJRR-UHFFFAOYSA-N nickel(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Ni+3].[Ni+3] GNMQOUGYKPVJRR-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/21—Silica-free oxide glass compositions containing phosphorus containing titanium, zirconium, vanadium, tungsten or molybdenum
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
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- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
- C03C4/082—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths for infrared absorbing glass
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- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
- C03C4/085—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths for ultraviolet absorbing glass
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
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Abstract
本发明提供了一种紫外、可见及近红外光吸收玻璃,按摩尔百分比计含有以下元素:铁元素0‑10%;钒元素0‑5%;镍元素0‑5%;钴元素0‑5%;铜元素0‑3%;钼元素0‑0.5%。本发明还提供了上述可见光吸收玻璃的制备方法和应用。本发明所述的方法制备的紫外、可见及近红外光吸收玻璃,在200‑2500nm范围内具有较高的光吸收效果,且该紫外、可见及近红外光吸收玻璃在0.20mm厚度下,透过率≤0.1%。同时该紫外、可见及近红外光吸收玻璃熔制成型容易,无气泡、结石、条纹等内部缺陷,玻璃抗析晶性能、耐潮稳定性、成分稳定性好,热学性能满足光纤成像元件制备工艺要求。
Description
技术领域
本发明涉及光学玻璃技术领域,具体涉及一种紫外、可见及近红外光吸收玻璃及其制备方法和应用。
背景技术
光吸收玻璃是一类重要的光学玻璃,主要实现对干扰杂光的吸收效果,提升光学元件的清晰度、对比度等性能。最典型的应用为光学纤维面板、光纤倒像器、纤维光锥以及光纤微透镜阵列等光纤成像元件中的杂散光吸收。随着应用领域的扩展,近年对超薄、高清晰度、高对比度的要求越来越高,因此要求光吸收玻璃的光吸收效果更好,对杂散光的吸收更彻底,而且要覆盖紫外、可见到近红外的波段。
普通光吸收玻璃在1mm厚度下可见光范围内透过率仍较高(≥10%)。针对光纤成像元件开发的光吸收玻璃,目前只能在400-1100nm的可见光波段具有一定的光吸收效果。其中公开号为CN102603185A的中国专利申请公布了一种含有三氧化二铁60-100份、三氧化二估10-15份、黑色氧化镍 5-10份、二氧化锰10-15份、二氧化铈5-10份的光吸收玻璃,该玻璃在0.40 ±0.01mm厚度下,在430-900nm波长范围内的光谱透过率≤5%。公开号为CN106772791A的中国专利申请也公开了一种含有重量百分比0-15%的 Fe2O3、0-5%的Co2O3、0-5%的Ni2O3、0-5%的MnO2的光吸收玻璃,该玻璃在0.3mm厚度下,对400-1000nm光线的光透过率≤5%。
可见,现有技术中光吸收玻璃对于可见光波段的光吸收效果有限,无法满足更高吸收效果的光吸收玻璃应用需求,而且对于紫外、近红外波段的吸收效果没有提及。
同时,对于用于制备光学纤维面板、光纤微透镜阵列的光吸收玻璃而言,还应满足如下基本要求:
(1)耐潮稳定性好,防止玻璃材料及光纤成像元件受潮湿大气环境长期腐蚀而影响成像品质;
(2)优异的抗析晶性能,在光纤成像元件多次热加工过程中,玻璃材料不发生析晶和分相;
(3)成分稳定性,光吸收玻璃中通常含有较多着色离子,一旦在热加工过程中向光纤内部扩散,将极大增加光纤损耗,影响成像品质。
然而,现有技术中所述的光吸收玻璃材料并不能满足上述要求。
发明内容
针对上述问题,本发明的目的是提供一种紫外、可见及近红外光吸收玻璃及其制备方法和应用。
为实现上述目的,本发明所采用的技术方案是:
一种紫外、可见及近红外光吸收玻璃,按摩尔百分比计含有以下元素:铁元素0-10%;钒元素0-5%;镍元素0-5%;钴元素0-5%;铜元素0-3%;钼元素0-0.5%,其中铁元素、钒元素、钴元素的摩尔百分比之和大于8%。
进一步地,其中所述紫外、可见及近红外光吸收玻璃包含玻璃基底,所述铁、钒、镍、钴、铜、钼元素以其离子或氧化物形式存在于玻璃基底中。
进一步地,其中所述玻璃基底选自硅酸盐玻璃、硼酸盐玻璃或者磷酸盐玻璃中的一种。
进一步地,其中当所述玻璃基底选自硅酸盐玻璃或硼酸盐玻璃时,所述紫外、可见及近红外光吸收玻璃中,除铁、钒、镍、钴、铜、钼元素之外,按摩尔百分比还含有以下元素:硅元素15-25%;硼元素0-10%;铝元素0-5%;碱金属元素5-10%;碱土金属元素0-10%;氧元素50-60%;其它元素0-0.5%。
进一步地,其中当所述玻璃基底选自磷酸盐玻璃时,所述紫外、可见及近红外光吸收玻璃中,除铁、钒、镍、钴、铜、钼元素之外,按摩尔百分比计还含有以下元素:磷元素15-25%;硼元素5-15%;铝元素0-5%;碱金属元素5-15%;碱土金属元素0-10%;氧元素40-50%;其它元素0-0.5%。
所述其它元素包括硫元素、砷元素、锑元素、铅元素、氟元素或碳元素中的至少一种,其摩尔百分比含量小于0.5%。
进一步地,其中所述碱金属元素选自锂、钠、钾、铷或铯中的至少一种;所述碱土金属元素选自镁、钙、锶或钡中的至少一种。
进一步地,其中所述玻璃中按摩尔百分比计还含有总量低于1%的锑或卤族元素中的至少一种,主要作为澄清剂形式引入,有助于玻璃熔制过程中的气泡排出。
进一步地,其中所述紫外、可见及近红外光吸收玻璃具有以下性能,光谱透过率:厚度0.20mm的玻璃片,在200-2500nm范围内光谱透过率≤ 0.1%;线膨胀系数:(65~85)×10-7/℃;玻璃转变温度:480-520℃;玻璃软化温度:550-600℃;玻璃软化点(粘度为107.6Pa·s时对应的温度):680-750℃;抗析晶性能:在马弗炉中800-850℃保温2-3小时不产生析晶;耐潮湿稳定性:1类;成分稳定性:与ZK9玻璃贴合,700℃下保温1小时,成分无扩散。
本发明还提供一种上述紫外、可见及近红外光吸收玻璃的制备方法,包括以下步骤:
1)按照配方量称取上述原料,混合均匀得到配合料;
2)在1400-1480℃下将配合料按一次或多次加入坩埚中,每次加料间隔时间10分钟-1小时;
3)加料完成后升温至1450-1500℃进行澄清5-10小时;
4)澄清结束后降温至1250-1350℃保温5-10小时进行均化;
5)均化结束后将玻璃液在模具中浇注成型为玻璃棒料;
6)成型的玻璃棒料在550-600℃下保温2-3小时,然后断电退火至室温出炉。
进一步地,其中步骤1)中,所述配合料中,硅元素以石英砂或水晶粉形式引入,硼元素以硼酸形式引入,磷元素以五氧化二磷形式引入,铝元素以三氧化二铝形式引入,碱金属元素以其碳酸盐或硝酸盐形式引入,碱土金属元素以其碳酸盐或硝酸盐形式引入,铁、钒、镍、钴、铜、锑、钼元素以其氧化物形式引入,卤族元素以其卤化物形式引入。
进一步地,其中步骤2)中,所述坩埚可为黏土坩埚、氧化铝坩埚、氧化镁坩埚或者石英坩埚。
进一步地,其中所述熔制的过程(将原料加入坩埚中,便已开始熔制过程,从加料、澄清、均化到出料,这段时间均属于熔制过程)中坩埚内保持弱还原气氛,弱还原气氛指的是CO、NO的气体分压之和大于氧气的分压,所述弱还原气氛中CO和NO的气体分压之和大于1kpa。
本发明还提供了一种光学纤维面板,所述光学纤维面板包含上述的紫外、可见及近红外光吸收玻璃。
本发明还提供了一种光纤微透镜阵列,所述光纤微透镜阵列包含上述的紫外、可见及近红外光吸收玻璃。
本发明的有益效果是:本发明所述的方法制备的紫外、可见及近红外光吸收玻璃,在200-2500nm范围内具有较高的光吸收效果,且该紫外、可见及近红外光吸收玻璃在0.20mm厚度下,透过率≤0.1%。同时该紫外、可见及近红外光吸收玻璃熔制成型容易,无气泡、结石、条纹等内部缺陷,玻璃抗析晶性能、耐潮稳定性、成分稳定性好,热学性能满足光纤成像元件制备工艺要求。
具体实施方式
为了进一步理解本发明,下面结合实施例对本发明优选实施方案进行描述,但是应当理解,这些描述只是为进一步说明本发明的特征和优点,而不是对本发明权利要求的限制。
下述实施例中所用的材料、试剂等,均可从商业途径得到。
本发明实施例1-8的紫外、可见及近红外光吸收玻璃的配方组成及物理化学性能见表1。
其中,折射率按照GB/T 7962.1-2010测试;膨胀系数、转变温度、软化温度、软化点按照GB/T 7962.16-2010测试;透过率按照GB/T 7962.12-2010测试;耐潮稳定性按照GB/T7962.15-2010测试;耐酸稳定性按照GB/T 7962.14-2010测试;抗析晶性能测试方法为将玻璃样品加入马弗炉中,升温至820℃,保温3小时,随后自然降温,用6-10倍显微镜观察玻璃中是否发生析晶或分相;成分稳定性测试方法为,将玻璃样品与ZK9 玻璃紧密贴合,平放至马弗炉中,加热至700℃,保温1小时,用EDS(光电子能谱仪)检测界面处碱金属离子的含量变化。
从表1的数据可以看出,按照本发明方法制备的紫外、可见及近红外光吸收玻璃具有优异的光吸收效果,厚度0.20mm的玻璃片,在200-2500nm 范围内光谱透过率≤0.1%;厚度0.30mm的玻璃片,在200-2500nm范围内光谱透过率≤0.01%;厚度0.40mm的玻璃片,在200-2500nm范围内光谱透过率≤0.005%。通常,光谱透过率测试仪器误差为0.1%,因此可以认为该玻璃在0.2mm以上时,其光谱透过率为0%,即吸收率为100%。该玻璃材料线膨胀系数:(65~85)×10-7/℃;玻璃转变温度:480-520℃;玻璃软化温度:550-600℃;玻璃软化点(粘度为107.6Pa·s时对应的温度):680-750℃;抗析晶性能:在马弗炉中800-850℃保温2-3小时不产生析晶;上述热学性能与常规光纤传像元件制备中使用的纤芯或皮料玻璃相当或相近,差值≤10%,因此,能够满足光纤拉制及后续热处理工艺的需要。玻璃的耐潮湿稳定性:1类;成分稳定性:与ZK9玻璃贴合,700℃下保温1小时,成分无扩散。可以保证在拉丝、熔压、扭转等热处理过程中,光吸收材料中的锰元素、铬元素、钴元素、钒元素等不会向光纤中的皮层玻璃中扩散,否则会影响光纤传像的透过率。
本发明中,铁元素、钒元素、钴元素均为过渡金属元素,其原子层结构中具有较多的价电子,因此当光线入射时,这些价电子能够吸收光子能量而发生跃迁,从而显著降低玻璃材料的光谱透过率。镍元素、铜元素和钼元素也能起到相似的作用,但其对光谱的吸收效果不如铁、钴、钒元素,添加量超过5%,容易引起玻璃材料析晶。总体来看,铁元素含量高时,其它吸光元素的含量可以低一些,但总体上铁元素、钴元素、钒元素的摩尔百分比之和≥8%时,才能达到所需的光吸收效果。
硅元素、磷元素、硼元素、铝元素分别与氧元素共同使用时,可通过共价键形式相互结合,构成玻璃网络骨架,主要起到降低玻璃的线膨胀系数,提高玻璃转变温度、软化温度、提高抗析晶性能、化学稳定性的作用。
碱金属元素及碱土金属元素分别与氧元素共同使用时,通常以离子键形式相结合,作为网络外体填充在玻璃网络骨架之间的空隙内,可降低玻璃高温粘度,改善玻璃熔制特性,但会提高线膨胀系数、降低软化温度和成分稳定性。
为了降低玻璃中的气泡、结石等缺陷,通常玻璃熔制过程中会加入澄清剂,一般为含有砷元素、锑元素、氟元素的化合物。此外,玻璃熔制时所加入的化工原料无法做到100%纯度,因此还会引入极少量的硫元素、铅元素和碳元素。
以上所述仅为本发明的较佳实施例,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。
Claims (7)
1.一种紫外、可见及近红外光吸收玻璃,其特征在于,按摩尔百分比计含有以下元素:铁元素4-10%;钒元素0.5-5%;镍元素0.5-5%;钴元素0.5-5%;铜元素0.5-3%;钼元素0.1-0.5%,其中铁元素、钒元素、钴元素的摩尔百分比之和大于8%;所述紫外、可见及近红外光吸收玻璃包含玻璃基底,所述铁、钒、镍、钴、铜、钼元素以其离子或氧化物形式存在于玻璃基底中;所述玻璃基底选自硅酸盐玻璃或硼酸盐玻璃,所述紫外、可见及近红外光吸收玻璃中,除铁、钒、镍、钴、铜、钼元素之外,按摩尔百分比还含有以下元素:硅元素15-25%;硼元素0-10%;铝元素0-5%;碱金属元素:5-10%;碱土金属元素0-10%;氧元素50-60%;其它元素0-0.5%;
所述紫外、可见及近红外光吸收玻璃具有以下性能,光谱透过率:厚度0.20mm的玻璃片,在200-2500nm范围内光谱透过率≤0.1%;线膨胀系数:(65~85)×10-7/℃;玻璃转变温度:480-520℃;玻璃软化温度:550-600℃;玻璃软化点:680-750℃;抗析晶性能:在马弗炉中800-850℃保温2-3小时不产生析晶;耐潮湿稳定性:1类;成分稳定性:与ZK9玻璃贴合,700℃下保温1小时,成分无扩散。
2.一种紫外、可见及近红外光吸收玻璃,其特征在于,按摩尔百分比计含有以下元素:铁元素4-10%;钒元素1.5-5%;镍元素3-5%;钴元素2.5-5%;铜元素0-3%;钼元素0-0.5%,其中铁元素、钒元素、钴元素的摩尔百分比之和大于8%;所述紫外、可见及近红外光吸收玻璃包含玻璃基底,所述铁、钒、镍、钴、铜、钼元素以其离子或氧化物形式存在于玻璃基底中;所述玻璃基底选自磷酸盐玻璃,所述紫外、可见及近红外光吸收玻璃中,除铁、钒、镍、钴、铜、钼元素之外,按摩尔百分比还含有以下元素:磷元素15-25%;硼元素5-15%;铝元素0-5%;碱金属元素5-15%;碱土金属元素0-10%;氧元素40-50%;其它元素0-0.5%;
所述紫外、可见及近红外光吸收玻璃具有以下性能,光谱透过率:厚度0.20mm的玻璃片,在200-2500nm范围内光谱透过率≤0.1%;线膨胀系数:(65~85)×10-7/℃;玻璃转变温度:480-520℃;玻璃软化温度:550-600℃;玻璃软化点:680-750℃;抗析晶性能:在马弗炉中800-850℃保温2-3小时不产生析晶;耐潮湿稳定性:1类;成分稳定性:与ZK9玻璃贴合,700℃下保温1小时,成分无扩散。
3.如权利要求1或2所述的紫外、可见及近红外光吸收玻璃,其特征在于,所述其它元素包括硫元素、砷元素、锑元素、铅元素、氟元素或碳元素中的至少一种,其摩尔百分比含量小于0.5%;所述碱金属元素选自锂、钠、钾、铷或铯中的至少一种;所述碱土金属元素选自镁、钙、锶或钡中的至少一种。
4.一种权利要求1-3任一项所述的紫外、可见及近红外光吸收玻璃的制备方法,其特征在于,包括以下步骤:
1)按照配方量称取上述原料,混合均匀得到配合料;
2)在1400-1480℃下将配合料按一次或多次加入坩埚中,每次加料间隔时间10分钟-1小时;
3)加料完成后升温至1450-1500℃进行澄清5-10小时;
4)澄清结束后降温至1250-1350℃保温5-10小时进行均化;
5)均化结束后将玻璃液在模具中浇注成型为玻璃棒料;
6)成型的玻璃棒料在550-600℃下保温2-3小时,然后断电退火至室温出炉。
5.如权利要求4所述的制备方法,其特征在于,步骤1)中,所述配合料中,硅元素以石英砂或水晶粉形式引入,硼元素以硼酸形式引入,磷元素以五氧化二磷形式引入,铝元素以三氧化二铝形式引入,碱金属元素以其碳酸盐或硝酸盐形式引入,碱土金属元素以其碳酸盐或硝酸盐形式引入,铁、钒、镍、钴、铜、锑、钼元素以其氧化物形式引入,卤族元素以其卤化物形式引入;步骤2)中,所述坩埚可为黏土坩埚、氧化铝坩埚、氧化镁坩埚或者石英坩埚;所述熔制的过程中坩埚内保持弱还原气氛;所述弱还原气氛中CO和NO的气体分压之和大于1kPa。
6.一种光学纤维面板,其特征在于,所述光学纤维面板包含权利要求1-3任一项所述的紫外、可见及近红外光吸收玻璃。
7.一种光纤微透镜阵列,其特征在于,所述光纤微透镜阵列包含权利要求1-3任一项所述的紫外、可见及近红外光吸收玻璃。
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