CN110132322A - A kind of ultraviolet irradiation enhanced fiber sensor and preparation method thereof - Google Patents
A kind of ultraviolet irradiation enhanced fiber sensor and preparation method thereof Download PDFInfo
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- CN110132322A CN110132322A CN201910274594.8A CN201910274594A CN110132322A CN 110132322 A CN110132322 A CN 110132322A CN 201910274594 A CN201910274594 A CN 201910274594A CN 110132322 A CN110132322 A CN 110132322A
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- 239000000835 fiber Substances 0.000 title claims abstract description 53
- 238000002360 preparation method Methods 0.000 title claims abstract description 10
- 239000013307 optical fiber Substances 0.000 claims abstract description 61
- 239000002923 metal particle Substances 0.000 claims abstract description 28
- 238000000151 deposition Methods 0.000 claims abstract description 26
- 230000003321 amplification Effects 0.000 claims abstract description 5
- 238000003199 nucleic acid amplification method Methods 0.000 claims abstract description 5
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- 150000004767 nitrides Chemical class 0.000 claims description 6
- 238000005240 physical vapour deposition Methods 0.000 claims description 6
- 239000011540 sensing material Substances 0.000 claims description 5
- 238000000825 ultraviolet detection Methods 0.000 claims description 5
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- 238000001514 detection method Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 11
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- 230000000694 effects Effects 0.000 description 4
- 230000002708 enhancing effect Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
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- 229910002601 GaN Inorganic materials 0.000 description 1
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
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- 229910002064 alloy oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
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- 230000004927 fusion Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
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- 238000001755 magnetron sputter deposition Methods 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
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- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/268—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light using optical fibres
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
- G01L1/242—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet the material being an optical fibre
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
- G01N2021/1725—Modulation of properties by light, e.g. photoreflectance
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
The invention discloses a kind of ultraviolet irradiation enhanced fiber sensors and preparation method thereof, the sensor includes: with the microstructured optical fibers and irradiation for exposing fibre core in the ultraviolet source (4) of the microstructured optical fibers exposed area, and microstructured optical fibers exposed area surface has been sequentially depositing metal particle layer (1), UV absorbing layer (2) and sensitive layer (3);The metal particle layer (1) is the evanescent wave that the electromagnetic wave propagated in optical fiber generates at the microstructured optical fibers for absorbing amplification evanescent wave, the evanescent wave;The sensitive layer (3) is for detecting measured signal.Sensor proposed by the present invention has the characteristics that susceptibility is high.
Description
Technical field
The present invention relates to technical field of optical fiber sensing, more particularly to a kind of ultraviolet irradiation enhanced fiber sensor and its
Preparation method.
Background technique
With the increasingly maturation of optical fiber processing technology, optical fiber is in sensory field using more and more extensive, surface locally throwing
Polish fine microstructured optical fibers or using draw taper at optical fiber structure, mentioned for the research and production of novel optical fiber senser element
New means and method are supplied.It is more next because it has the characteristics that unique optical characteristics, low cost and can be made into all-fiber devices
More by the concern of researchers, and function sensitive material and optical fiber are organically blended in physical layer, gives full play to light
Fiber sensor structure is integrated, material in terms of advantage, the fiber optic sensing device and system of Development of Novel will be expected to.
Traditional function of surface type optical fiber sensing technology, is usually directly produced on optical fiber surface for function sensitive material
On, realize response of the optical fiber to detection target, this simple structure tends to the interference effect by environmental factor, and
The problems such as weaker, sensitivity that there are response signals is difficult to improve.
Semiconductor material is often used as sensibility functional material, but semiconductor gas sensor is usually to pass through heating side
Formula overcomes high reaction activity, to realize highly sensitive and quick response recovery characteristics.Heating makes sensor higher
At a temperature of work, lead to the reduction of device service life, be also easy to ignite imflammable gas to be measured, cause security risk, simultaneously
Heater is configured in the sensor, both increases device power consumption, is also unfavorable for the integration and miniaturization of sensor.
Summary of the invention
Deficiency in view of the above technology, the object of the present invention is to provide a kind of ultraviolet irradiation enhanced fiber sensor and its
Preparation method, the sensor have the characteristics that susceptibility is high.
To achieve the above object, the present invention provides following schemes:
A kind of ultraviolet irradiation enhanced fiber sensor, comprising: there is microstructured optical fibers and the irradiation for exposing fibre core
Ultraviolet source in the microstructured optical fibers exposed area, microstructured optical fibers exposed area surface have been sequentially depositing metallic particles
Layer, UV absorbing layer and sensitive layer;
The metal particle layer for absorbing amplification evanescent wave, the evanescent wave be in optical fiber the electromagnetic wave propagated described
The evanescent wave generated at microstructured optical fibers;The sensitive layer is for detecting measured signal.
Optionally, the microstructured optical fibers are that clad locally strips the optical fiber for exposing fibre core.
Optionally, the sensitive layer material is gas sensitive, pressure sensitive, biological sensing material or ultraviolet detection material.
Optionally, the metallic particles layer material is at least one of Au, Pt, Ag, Cu.
Optionally, the UV absorption layer material is nitride, oxide or two-dimensional material.
Optionally, the deposition is using chemical vapor deposition, physical vapour deposition (PVD) or solwution method deposition.
A kind of ultraviolet irradiation enhanced fiber transducer production method, the preparation method include;
In microstructured optical fibers exposed area surface depositing metal particles layer, the metal particle layer is with a thickness of 10~100nm;
One layer of light-sensitive material is deposited in the metal particle layer, the UV absorbing layer is with a thickness of 10~300nm;
One layer of sensitive material is deposited on the light-sensitive material, the sensitive layer is with a thickness of 10~150nm, the sensitivity material
Material is for detecting measured signal.
Optionally, described in microstructured optical fibers exposed area surface depositing metal particles layer, the metal particle layer thickness
Before 10~100nm, further includes stripping the local clad of optical fiber using physically or chemically method to expose fibre core, had
There are the microstructured optical fibers for exposing fibre core.
Optionally, it is carried out after depositing the metal particle layer, the deposition light-sensitive material and the deposition sensitive material
Annealing.
Optionally, the annealing temperature is 150 DEG C~500 DEG C, and the annealing time is 1~120min.
The specific embodiment provided according to the present invention, the invention discloses following technical effects:
Fibre optical sensor proposed by the present invention irradiates microstructured optical fibers exposed area using ultraviolet source, in UV absorbing layer
Carrier concentration has significant change under ultraviolet light irradiation, and at the same time, the electromagnetic wave propagated in microstructured optical fibers is in metal
Particle and fibre core interface form surface plasmon resonance (SPR), the evanescent wave of optical fiber surface are improved, to improve optical fiber
The susceptibility that sensor responds to measured signal.
Detailed description of the invention
It in order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the invention
Example, for those of ordinary skill in the art, without any creative labor, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is a kind of structural schematic diagram of ultraviolet irradiation enhanced fiber sensor of the embodiment of the present invention;
Fig. 2 is a kind of flow chart of ultraviolet irradiation enhanced fiber transducer production method of the embodiment of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
The object of the present invention is to provide a kind of ultraviolet irradiation enhanced fiber sensor and preparation method thereof, the sensing utensils
Have the characteristics that susceptibility is high.
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing and specific real
Applying mode, the present invention is described in further detail.
Fig. 1 is a kind of structural schematic diagram of ultraviolet irradiation enhanced fiber sensor of the embodiment of the present invention, as shown in Figure 1,
A kind of ultraviolet irradiation enhanced fiber sensor, comprising: have the microstructured optical fibers for exposing fibre core and irradiation described micro-
The ultraviolet source 4 of structured optical fiber exposed area, microstructured optical fibers exposed area surface have been sequentially depositing metal particle layer 1, ultraviolet
Absorbed layer 2 and sensitive layer 3, the metal particle layer 1 are the electricity propagated in optical fiber for absorbing amplification evanescent wave, the evanescent wave
The evanescent wave that magnetic wave generates at the microstructured optical fibers, the sensitive layer 3 is for detecting measured signal.
Specifically, the optical fiber is single mode optical fiber or multimode fibre.
Preferably, the microstructured optical fibers are that 6 part of clad strips the optical fiber for exposing fibre core 5.Specifically, described micro-
The structure of structured optical fiber is the groove or cone point of the groove of D-shaped, U-shaped.
Preferably, 3 material of sensitive layer be gas sensitive, pressure sensitive, biological sensing material or ultraviolet detection material,
But these materials are not limited to, it is a variety of to be applied to bio-sensing, pressure sensing, ultraviolet detection, pollutant monitoring, microspur measurement etc.
Application.
If 3 material of sensitive layer is gas sensitive, gas can be detected;If 3 material of sensitive layer is pressure sensitive, can be right
Pressure is detected;If 3 material of sensitive layer is biological sensing material, biology can be detected;If 3 material of sensitive layer is ultraviolet
Material is detected, ultraviolet light can be detected.
Specifically, gas sensitive be metal oxide (such as tin oxide, zinc oxide, tungsten oxide, iron oxide, titanium oxide its
One of metal oxide or in which various metals alloy oxide), graphene and its derivative, two-dimensional material (such as antimony
Alkene, black phosphorus, molybdenum disulfide etc.).Pressure sensitive is silicon, germanium, metal oxide etc..Biological sensing material uses enzyme, microorganism, resists
Former or cell etc. has the material after connection substance modification with biology.Ultraviolet detection material is silicon carbide, nitride, oxide etc..
Pollutant monitoring material: toxic, pernicious gas in life can be used as target detection thing.Microspur measure material: iron content, cobalt,
The magnetic materials such as nickel.
Preferably, 1 material of metal particle layer is at least one of Au, Pt, Ag, Cu, the specific metallic particles
1 material of layer is Au, Pt, Ag, Cu one of which metal simple-substance or in which a variety of alloys.
Preferably, 2 material of UV absorbing layer is nitride, oxide or two-dimensional material.
Specifically, nitride uses gallium nitride, boron nitride or aluminium nitride, moreover it is possible to be adopted using multiple metal nitride oxide
With zinc oxide or silica, moreover it is possible to use multi-element metal oxide, two-dimensional material uses graphene, antimony alkene, black phosphorus or curing
Molybdenum can use above-mentioned material but not limited to this.
Preferably, the deposition is using chemical vapor deposition, physical vapour deposition (PVD) or solwution method deposition.
The present invention also provides a kind of ultraviolet irradiation enhanced fiber transducer production methods, as shown in Fig. 2, the preparation
Method includes;
Step S1: being stripped the local clad of optical fiber using physically or chemically method and expose fibre core, is obtained with exposed
The microstructured optical fibers of fibre core out.
Specifically, the physically or chemically method is one of mechanical polishing, ion etching, chemical attack or in which a variety of
The combination of method.
Step S2: in microstructured optical fibers exposed area surface depositing metal particles layer, the metal particle layer with a thickness of 10~
100nm。
Step S3: depositing one layer of light-sensitive material in the metal particle layer, the UV absorbing layer with a thickness of 10~
300nm.It is the variation being using its carrier concentration under the irradiation of ultraviolet source using light-sensitive material, to improve optical fiber biography
The sensitivity of sensor.
Step S4: one layer of sensitive material is deposited on the light-sensitive material, the sensitive layer is with a thickness of 10~150nm, institute
Sensitive material is stated for detecting measured signal.
Preferably, it is carried out after depositing the metal particle layer, the deposition light-sensitive material and the deposition sensitive material
Annealing.
Preferably, the annealing temperature is 150 DEG C~500 DEG C, and the annealing time is 1~120min
Working principle:
The measured signal is detected according to the variation of incident electromagnetic wave and outgoing electromagnetic intensity, electromagnetic wave is from light
Fine entrance 7 is injected, and is projected again from fiber outlet 8 by microstructured optical fibers, when electromagnetic wave passes through fiber core, in micro-structure light
Fine exposed area generates evanescent wave, and is absorbed and amplify by metal particle layer, and for UV absorbing layer under ultraviolet light irradiation, carrier is dense
Degree is significantly modulated, and when sensitive layer touches signal to be detected, surface carrier state after having adsorbed signal can be sent out
Changing, at this point, UV absorbing layer plays the role of increasing sensitive layer carrier concentration, to increase the sound of fiber spectrum signal
Amplitude of variation is answered, the susceptibility of fibre optical sensor is increased.
The embodiment of the present invention throws the U-shaped microstructured optical fibers that technology obtains, and deposits upper layer of Au using radio-frequency magnetron sputter method
Stratum granulosum, the SPR enhancing structure with Kreschmann structure feature, then using upper one layer of medium frequency magnetron sputtering method deposition
IGZO (In-Ga-Zn-O) multi-element metal oxide film layer (oxidation film herein be both able to achieve UV absorbing layer function and also can
Realize the function of sensitive layer, therefore only precipitated primary), under the ultraviolet lighting of 360nm, sensing spy is carried out to alcohols gas
It surveys, which has double enhancing structures to response signal, the Au stratum granulosum amplification made on microstructured optical fibers exposed area
The evanescent wave of electromagnetic wave, and UV absorbing layer, under different operating temperatures, hot carrier concentration can be adjusted significantly
System.And IGZO multi-element metal oxide film layer is when touching object to be measured gas, surface current-carrying after having adsorbed gas molecule
Sub- state can change.At this point, IGZO multi-element metal oxide film layer can play the carrier for increasing gas sensitive material layer
The effect of concentration improves the sensitivity for light concentration gas to increase the susceptibility of fibre optical sensor.The present invention is real
Applying example and combining to ultraviolet light has the light-sensitive material for enhancing response characteristic and there is the sensitive material of detecting function to prepare skill gas
Art realizes a kind of fiber optic sensing applications technology of novel high-performance, realizes fibre optical sensor material and structure on physical layer
Integrated and fusion.
Fibre optical sensor in the embodiment of the present invention has the structure to the double enhancings of response signal, wherein carries in light-sensitive layer
Flowing sub- concentration has significant change under ultraviolet light irradiation.At the same time, it by preferred metal particle layer, is passed in microstructured optical fibers
The electromagnetic wave broadcast forms surface plasmon resonance (SPR) in metallic particles and fibre core interface, greatlys improve optical fiber table
The evanescent wave in face, to improve the susceptibility that fibre optical sensor responds to measured signal.
Surface plasmon resonance (surface plasmon resonance, SPR) be metal medium interface by
The raw a kind of electromagnetic wave covibration of longitudinal charge density wave movable property in free electronic gas.The development of optical fiber sensing technology
Eighties of last century early stage is started from, compared with optical prism SPR system, other than the intrinsic feature of SPR technique, also there is small in size, valence
Lattice are low, high sensitivity, good in anti-interference performance, dimensioned flexibly, micro sensing system, to be able to carry out remote real time monitoring etc. excellent
Point.In recent years, with the progress of semiconductor technology, material science, photoelectron and sensor technology, SPR sensorgram technology constantly to
Highly sensitive, highly selective, miniaturization, intelligent direction development, in conjunction with current all kinds of micro-nano structures, nano material, micro Process
Etc. technologies research, based on different fiber optic materials or fibre-optical microstructure and with excellent sensing capabilities optical fiber SPR sensor not
It is disconnected to occur.
Used herein a specific example illustrates the principle and implementation of the invention, and above embodiments are said
It is bright to be merely used to help understand method and its core concept of the invention;At the same time, for those skilled in the art, foundation
Thought of the invention, there will be changes in the specific implementation manner and application range.In conclusion the content of the present specification is not
It is interpreted as limitation of the present invention.
Claims (10)
1. a kind of ultraviolet irradiation enhanced fiber sensor characterized by comprising have the microstructured optical fibers for exposing fibre core
And irradiation, in the ultraviolet source (4) of the microstructured optical fibers exposed area, microstructured optical fibers exposed area surface is sequentially depositing
There are metal particle layer (1), UV absorbing layer (2) and sensitive layer (3);
The metal particle layer (1) for absorbing amplification evanescent wave, the evanescent wave be in optical fiber the electromagnetic wave propagated described
The evanescent wave generated at microstructured optical fibers;The sensitive layer (3) is for detecting measured signal.
2. ultraviolet irradiation enhanced fiber sensor according to claim 1, which is characterized in that the microstructured optical fibers are
Clad locally strips the optical fiber for exposing fibre core.
3. ultraviolet irradiation enhanced fiber sensor according to claim 1, which is characterized in that sensitive layer (3) material
Material is gas sensitive, pressure sensitive, biological sensing material or ultraviolet detection material.
4. ultraviolet irradiation enhanced fiber sensor according to claim 1, which is characterized in that the metal particle layer
(1) material is at least one of Au, Pt, Ag, Cu.
5. ultraviolet irradiation enhanced fiber sensor according to claim 1, which is characterized in that the UV absorbing layer
(2) material is nitride, oxide or two-dimensional material.
6. ultraviolet irradiation enhanced fiber sensor according to claim 1, which is characterized in that the deposition is using chemistry
Vapor deposition, physical vapour deposition (PVD) or solwution method deposition.
7. a kind of ultraviolet irradiation enhanced fiber transducer production method, which is characterized in that the preparation method includes;
In microstructured optical fibers exposed area surface depositing metal particles layer, the metal particle layer is with a thickness of 10~100nm;
One layer of light-sensitive material is deposited in the metal particle layer, the UV absorbing layer is with a thickness of 10~300nm;
One layer of sensitive material is deposited on the light-sensitive material, the sensitive layer is used with a thickness of 10~150nm, the sensitive material
In detection measured signal.
8. ultraviolet irradiation enhanced fiber transducer production method according to claim 7, which is characterized in that it is described
Microstructured optical fibers exposed area surface depositing metal particles layer, further includes making before the metal particle layer is with a thickness of 10~100nm
The local clad of optical fiber is stripped with physically or chemically method and exposes fibre core, obtaining has the micro-structure light for exposing fibre core
It is fine.
9. ultraviolet irradiation enhanced fiber transducer production method according to claim 7, which is characterized in that described in deposition
It anneals after metal particle layer, the deposition light-sensitive material and the deposition sensitive material.
10. ultraviolet irradiation enhanced fiber transducer production method according to claim 9, which is characterized in that described to move back
Fiery temperature is 150 DEG C~500 DEG C, and the annealing time is 1~120min.
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