CN110129872B - Polishing solution for cobalt-chromium metal electrolyte plasma polishing - Google Patents
Polishing solution for cobalt-chromium metal electrolyte plasma polishing Download PDFInfo
- Publication number
- CN110129872B CN110129872B CN201910435789.6A CN201910435789A CN110129872B CN 110129872 B CN110129872 B CN 110129872B CN 201910435789 A CN201910435789 A CN 201910435789A CN 110129872 B CN110129872 B CN 110129872B
- Authority
- CN
- China
- Prior art keywords
- polishing
- cobalt
- sulfate
- chromium metal
- polishing solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which comprises the following raw materials in parts by weight: 5-15 parts of sulfate, 0.1-2 parts of organic acid and 150-300 parts of water; the polishing solution for cobalt-chromium metal electrolyte plasma polishing provided by the invention is specially developed for cobalt-chromium metal workpieces, the application performance of metal accessories needing polishing in a specific field cannot be influenced by processing operation, the workpieces after polishing are bright and glossy, the surfaces of the workpieces are smooth and have no sand spots, the processing efficiency is improved, and the workpieces cannot be damaged, such as blacking, gaps and the like.
Description
Technical Field
The invention relates to the field of metal processing, in particular to a polishing solution for cobalt-chromium metal electrolyte plasma polishing.
Background
The electrolyte plasma polishing technology is a special processing method for 'green' high-quality high-efficiency metal polishing work, is generally used for polishing in the aspect of industrial manufacturing, and is mainly used for polishing stainless steel, wherein a polishing solution is a low-concentration salt solution, and the most common material is ammonium sulfate (NH)4)2SO4The solution of ammonium sulfate is weakly acidic, is easily soluble in water, has good conductivity, is a main component of the fertilizer, and the polishing solution taking the ammonium sulfate as a main component cannot cause the problems of environmental pollution and the like.
With the diversification of processed products, the existing polishing solution can not adapt to all processed products, such as cobalt chromium metal. Cobalt chromium metal is a hard alloy with wear resistance, corrosion resistance and high temperature oxidation resistance, and is widely used in biomedical, especially oral medicine, and other industrial fields. For a cobalt-chromium metal processed product, a salt solution composed of ammonium sulfate is used, the processed product has poor surface brightness and non-smoothness, and after the polishing effect is improved by prolonging the processing time, the result is still not ideal, and even the workpiece is damaged, such as blacking and notch phenomena.
Disclosure of Invention
In order to solve the above problems, a first aspect of the present invention provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 5-15 parts of sulfate, 0.1-2 parts of organic acid and 150-300 parts of water.
As a preferred technical scheme, the sulfate is selected from one or more of potassium sulfate, ammonium sulfate, calcium sulfate, magnesium sulfate, barium sulfate and sodium sulfate.
As a preferred technical scheme, the sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of potassium sulfate to ammonium sulfate is 1: (2-3).
As a preferred technical scheme, the organic acid is selected from one or more of citric acid, malic acid, tartaric acid, ascorbic acid, formic acid, acetic acid, oxalic acid and succinic acid.
As a preferable technical scheme, the citric acid is anhydrous citric acid and/or citric acid monohydrate.
As a preferable technical scheme, the citric acid is citric acid monohydrate.
As a preferred technical scheme, the weight ratio of the sulfate to the organic acid is (6-9): 1.
as a preferred technical solution, the weight ratio of the sulfate to the water is 1: (25-35).
The second aspect of the present invention provides a method for preparing the above polishing solution for cobalt chromium metal electrolyte plasma polishing, comprising the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The third aspect of the invention provides a method for using the polishing solution for cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 93-98 ℃, then putting the cobalt-chromium metal workpiece connected with a direct-current power supply into the polishing solution, polishing at 330-380V for 500-700 seconds, taking out the cobalt-chromium metal workpiece, and finishing polishing.
Has the advantages that: the polishing solution for cobalt-chromium metal electrolyte plasma polishing provided by the invention is specially developed for cobalt-chromium metal workpieces, the application performance of metal accessories needing polishing in a specific field cannot be influenced by processing operation, the polished workpieces are bright and glossy, the surface of the workpieces is smooth and has no sand spots, the processing efficiency is improved, and the workpieces cannot be damaged, such as blacking, gaps and the like.
Drawings
To further illustrate the beneficial effects of the polishing solution for cobalt chromium metal electrolyte plasma polishing provided in the present invention, the accompanying drawings are provided, and it should be noted that the drawings provided in the present invention are only selected examples from all drawings and are not intended to limit the claims, and all other corresponding figures obtained through the drawings provided in the present application should be considered as being within the protection scope of the present application.
Fig. 1 shows the effect of using example 1 of the present application for polishing a cobalt chromium metal workpiece, which is a polished cobalt chromium metal workpiece and a partially enlarged view.
Fig. 2 shows the effect of using example 2 of the present application for polishing a cobalt chromium metal workpiece, wherein the left side is the cobalt chromium metal workpiece before polishing, and the right side is the cobalt chromium metal workpiece after polishing.
FIG. 3 shows the effect of example 3 of the present application on polishing a cobalt chromium metal workpiece, marked by the phenomenon of blackening after polishing the workpiece.
Fig. 4 shows the effect of using example 4 of the present application to polish a cobalt chrome metal workpiece, where the upper left is the back of the cobalt chrome metal workpiece before polishing, the upper right is the back of the cobalt chrome metal workpiece after polishing and a partial enlarged view, the lower left is the front of the cobalt chrome metal workpiece before polishing, and the upper right is the front of the cobalt chrome metal workpiece after polishing.
Fig. 5 shows the effect of using example 5 of the present application to polish a cobalt chrome metal workpiece, where the upper left is the back of the cobalt chrome metal workpiece before polishing, the upper right is the back of the cobalt chrome metal workpiece after polishing, the lower left is the front of the cobalt chrome metal workpiece before polishing, and the upper right is the front of the cobalt chrome metal workpiece after polishing.
Fig. 6 shows the effect of using example 6 of the present application for polishing a cobalt chrome metal workpiece, where the upper left is the back of the cobalt chrome metal workpiece before polishing, the upper right is the back of the cobalt chrome metal workpiece after polishing, the lower left is the front of the cobalt chrome metal workpiece before polishing, and the upper right is the front of the cobalt chrome metal workpiece after polishing.
FIG. 7 shows the effect of heating the polishing solution to 96 ℃ by adding example 7 of the present application to the polishing bath of an electrolyte plasma polisher, and a large amount of bubbles were generated in the polishing solution.
Fig. 8 shows the effect of using example 8 of the present application for polishing a cobalt chromium metal workpiece, the cobalt chromium metal workpiece before polishing on the left side and the cobalt chromium metal workpiece after polishing on the right side.
Detailed Description
The invention will be further understood by reference to the following detailed description of preferred embodiments of the invention and the examples included therein. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. To the extent that a definition of a particular term disclosed in the prior art is inconsistent with any definitions provided herein, the definition of the term provided herein controls. As used herein, a feature that does not define a singular or plural form is also intended to include a plural form of the feature unless the context clearly indicates otherwise. It will be further understood that the term "prepared from …," as used herein, is synonymous with "comprising," including, "comprising," "having," "including," and/or "containing," when used in this specification means that the recited composition, step, method, article, or device is present, but does not preclude the presence or addition of one or more other compositions, steps, methods, articles, or devices. Furthermore, the use of "preferred," "preferably," "more preferred," etc., when describing embodiments of the present application, is meant to refer to embodiments of the invention that may provide certain benefits, under certain circumstances. However, other embodiments may be preferred, under the same or other circumstances. In addition, the recitation of one or more preferred embodiments does not imply that other embodiments are not useful, nor is it intended to exclude other embodiments from the scope of the invention.
In order to solve the above problems, a first aspect of the present invention provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 5-15 parts of sulfate, 0.1-2 parts of organic acid and 150-300 parts of water.
In some preferred embodiments, the preparation raw materials comprise, in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
Sulfates of sulfuric acid
Sulfates, being derived from sulfate ions (SO)4 2-) The compound composed of other metal ions or ammonium ions is mostly dissolved in water and is electrolyte, so that the compound can be used for the polishing solution for electrolyte plasma polishing.
Experiments show that when the polishing metal is cobalt chromium metal, when sulfate is used as an electrolyte material in the electrolyte plasma polishing process, the glossiness and the flatness of the cobalt chromium metal surface can be effectively improved. Firstly, a workpiece is immersed in polishing liquid, the polishing liquid enters an electrolytic state under the combined action of sulfate and organic acid, meanwhile, the polishing liquid is in direct contact with the workpiece in the whole system, a short circuit occurs instantaneously, a large amount of heat is released, the polishing liquid on the working surface is instantaneously vaporized, a relatively stable gas layer can be formed between the workpiece and the polishing liquid, local high voltage is formed, the gas layer is subjected to ionization breakdown discharge, a discharge channel is locally formed, plasma is generated, and therefore strong and complex plasma physical and chemical actions are generated between the metal surface and the gas layer, and chemical reaction products are generated on the surface of the metal workpiece to be processed and are simultaneously removed by discharge.
When the sulfate is replaced by the chloride or nitrate, a polishing experiment shows that the surface of the obtained workpiece is dull and lusterless, and has sand spots and roughness, which may be caused by the fact that the chloride or nitrate is easier to cause ionization of water and organic acid than the sulfate, and corrodes the surface of the workpiece through the action of the channel and the workpiece, so that oxidation is easier to occur, new substances are promoted to be generated on the surface of the workpiece, and the speed of generating the new substances is increased, so that the sand spots are formed on the surface of the workpiece, and the generation of the new substances at other non-corroded positions and the removal reaction in the discharging process are also hindered due to the steric hindrance and the high potential, so that the surface of the workpiece is dull and lusterless.
In some preferred embodiments, the sulfate is selected from the group consisting of potassium sulfate, ammonium sulfate, calcium sulfate, magnesium sulfate, and mixtures of one or more of sodium sulfate.
In some preferred embodiments, the sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of potassium sulfate to ammonium sulfate is 1: (2-3); further preferably, the weight ratio of potassium sulfate to ammonium sulfate is 1: 2.5.
potassium sulfate herein (CAS number: 7778-80-5, chemical formula: K)2SO4) Ammonium sulfate (CAS No.: 7783-20-2, formula: (NH)4)2SO4) All purchased from tiger and ao chemical company, ltd, guangzhou.
In the experimental process, the applicant finds that when the polishing metal is cobalt chromium metal, and potassium sulfate and ammonium sulfate are used as electrolyte materials in the electrolyte plasma polishing process, the glossiness and the flatness of the cobalt chromium metal surface can be effectively improved, the processing efficiency is improved, and the polishing time is shortened. When only ammonium sulfate is used as an electrolyte material, the surface of the obtained polished cobalt-chromium metal workpiece is very poor, dull and rough, and when only ammonium sulfate is used as an electrolyte material and the workpiece is stainless steel, the surface of the obtained polished workpiece is glossy and smooth; this is probably because the cobalt-chromium alloy has higher density and dense crystal arrangement compared with stainless steel, and when ammonium sulfate is used as electrolyte in plasma polishing in the polishing treatment process, the decomposition and oxidation capability of ammonium sulfate is lower, and the action force of cobalt-chromium metal on the surface of the mixed gas layer and the workpiece is lower than that of cobalt-chromium metal on the surface of the stainless steel, so that when only ammonium sulfate is used as electrolyte, the surface state of the polished workpiece is not good; when the long-time treatment is adopted, the workpiece is damaged under the condition that the workpiece is not polished in time due to long-time current and breakdown action; when the ammonium sulfate and the potassium sulfate are used as the electrolyte, the electrolytic capacity of the potassium sulfate is high, the action force of the mixed gas layer and cobalt-chromium metal on the surface of a workpiece is high, the molecular structure can be changed, the mixed gas layer is oxidized to form a new substance, the new substance is removed through discharge, the polishing purpose is achieved, and the potassium sulfate is insoluble in a saturated solution of the ammonium sulfate, so that the concentration and the action force of the potassium sulfate cannot be influenced by the ammonium sulfate.
In the experimental process, the ratio of ammonium sulfate to potassium sulfate is also unexpectedly found to be regulated, so that polished workpieces with different surface states can be obtained, and when the weight ratio of the potassium sulfate to the ammonium sulfate is 1: (2-3), the surface of the obtained workpiece is glossy and smooth, when the content of potassium sulfate is high or only potassium sulfate is contained, partial parts of the workpiece are easily damaged or sand spots are generated, the workpiece is likely to generate the phenomena of generation of chemical reactants and discharge removal due to high electrolytic capacity and oxidation capacity of potassium sulfate, and the polishing speed of the workpiece is increased, but the workpiece is often not uniform in all directions, namely, different degrees of differences of thickness, roughness and the like exist, so that partial parts of the workpiece are broken down, the workpiece is damaged, and black or a gap appears; when the forming speed of the new substance is too high and is higher than the discharge removal speed, the new substance is accumulated on the surface of the workpiece to form sand spots, so that the surface is rough.
Organic acids
The organic acid refers to an organic compound having acidity, which can be derived from carboxyl group, sulfonic group, sulfinic group, thiocarboxyl group, etc., and can ionize hydrogen ions in water, and is used in an electrolyte plasma polishing solution to contribute to improvement of polishing efficiency.
In some preferred embodiments, the organic acid is selected from a mixture of one or more of citric acid, malic acid, tartaric acid, ascorbic acid, formic acid, acetic acid, oxalic acid, succinic acid.
In some preferred embodiments, the organic acid is citric acid; further preferably, the citric acid is anhydrous citric acid and/or citric acid monohydrate; further, the citric acid is citric acid monohydrate.
Citric acid monohydrate (CAS number: 5949-29-1) is available from Tiaoh chemical Co., Ltd., Guangzhou, Inc.
According to debugging, the citric acid monohydrate is used as an electrolyte material, so that the sand spots on the surface of the cobalt-chromium metal after being polished can be effectively reduced, the polishing efficiency is improved, a gas layer is formed and the decomposition of the citric acid monohydrate is promoted probably because a large amount of heat is generated when the polishing solution is in contact with a workpiece, the gas layer is further enlarged, and generated plasmas are increased, so that the discharge removal speed is increased, the accumulation of new organisms on the surface of the workpiece is reduced, the smoothness of the surface of the cobalt-chromium metal is improved, and the sand spots are reduced; when citric acid is used as electrolyte, experiments show that the damage of partial parts of the obtained polished workpiece presents black or gaps, and the citric acid is likely to lack the protection of crystal water at high temperature, so that the decomposition is severe, and a large amount of energy is generated while a gas layer is generated, so that irreversible damage is generated on a processed part.
In some preferred embodiments, the weight ratio of sulfate to organic acid is (6-9): 1; further preferably, the weight ratio of the sulfate to the organic acid is 7: 1.
in some preferred embodiments, the weight ratio of sulfate to water is 1: (25-35); further preferably, the weight ratio of the sulfate to the water is 1: 30.
in the experimental process, when the weight ratio of the sulfate to the organic acid is (6-9): 1, the resulting cobalt chromium polishing metal is preferable, and may cause a risk of splashing of the polishing liquid due to a large amount of energy generated while decomposing the organic acid to generate a gas layer when the content of the organic acid is high.
In addition, in the experimental process, it is found that the glossiness and the flatness of the polished workpiece can be effectively improved by controlling the concentration of different components in the polishing solution, probably because the mass ratio of sulfate to water is 1: (25-35), the dissolution of the substances in water reaches balance, the concentrations of the substances cannot be influenced, when the water content is too high, the dissolution balance of the substances is broken, ions are exchanged with each other, the oxidation capability and ionization capability of sulfate and the capability of generating an air layer by organic acid are influenced, and therefore the glossiness and the flatness of the polished workpiece are reduced.
The second aspect of the present invention provides a method for preparing the above polishing solution for cobalt chromium metal electrolyte plasma polishing, comprising the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The third aspect of the invention provides a method for using the polishing solution for cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 93-98 ℃, then putting the cobalt-chromium metal connected with a direct-current power supply into the polishing solution, polishing at 330-380V for 500-700 seconds, taking out the cobalt-chromium metal, and finishing polishing.
In some preferred embodiments, the method for using the polishing solution for cobalt chromium metal electrolyte plasma polishing comprises the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting cobalt chromium metal connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the cobalt chromium metal, and finishing polishing.
Experiments show that when the temperature of the polishing solution is controlled to be 93-98 ℃, the obtained cobalt-chromium metal surface has glossiness and is good for experimental equipment, when the temperature is too low, the acting force of the electrolyte material and the cobalt-chromium metal surface is weakened, the activity of plasma in a channel is reduced, the discharge removal efficiency is reduced, in order to achieve the same effect, the current needs to be increased, and an auxiliary machine is easy to give an alarm; in addition, in the experimental process, the polishing time is controlled to be 500-700 s, so that the damage and the efficiency of the workpiece can be effectively avoided, when the polishing time is increased, the action time of the electrolyte material and the cobalt-chromium metal surface and the action time of discharging removal are prolonged, and the workpiece is often not all-directional uniform, namely, different degrees of differences of thickness, roughness and the like exist, so that the breakdown of partial parts is caused, the workpiece is damaged, and black or gaps are formed.
Examples
The technical solution of the present invention is described in detail by the following examples, but the scope of the present invention is not limited to the examples. The starting materials used in this application are commercially available unless otherwise specified.
Example 1
Embodiment 1 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
The resulting workpiece was polished as shown in FIG. 1.
Example 2
Embodiment 2 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is ammonium sulfate.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The cobalt chromium metal workpiece was made of cobalt chromium alloy with a designation GH159, and was shown in fig. 2 before and after polishing.
Example 3
The sulfate is potassium sulfate.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The cobalt chromium metal workpiece was made of cobalt chromium alloy with a designation GH159 and was polished as shown in fig. 3.
Example 4
Embodiment 4 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 2 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The preparation raw material also comprises 5 parts of ammonium chloride.
Ammonium chloride in the present application (CAS number: 12125-02-9, chemical formula: NH)4Cl) was purchased from saao chemical ltd, guangzhou.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The cobalt chromium metal workpiece was made of cobalt chromium alloy with a designation GH159, and was polished before and after polishing as shown in fig. 4.
Example 5
Embodiment 5 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 5 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is ammonium sulfate.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The preparation raw material also comprises 2 parts of potassium chloride.
Potassium chloride (CAS number: 7447-40-7, chemical formula: KCl) in this application was purchased from Huao chemical Co., Ltd., Guangzhou city.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The cobalt chromium metal workpiece was made of cobalt chromium alloy with a designation GH159, and was polished before and after polishing as shown in fig. 5.
Example 6
Embodiment 6 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of chloride salt, 1 part of organic acid and 210 parts of water.
The chloride salt is potassium chloride and ammonium chloride, and the weight ratio of the potassium chloride to the ammonium chloride is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The cobalt chromium metal workpiece was made of cobalt chromium alloy with a designation GH159, and was polished before and after polishing as shown in fig. 6.
Example 7
Embodiment 7 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is magnesium sulfate and calcium sulfate, and the weight ratio of the magnesium sulfate to the calcium sulfate is 1: 2.5.
magnesium sulfate in the present application (CAS number 7487-88-9, chemical formula: MgSO)4) From tiger and ao chemical ltd, guangzhou, calcium sulfate (CAS No.: 7778-18-9, formula: CaSO4) Purchased from chemical reagents ltd, wuweng, guangdong.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, wherein the polishing voltage is 340V, the polishing time is 600 seconds, taking out the workpiece, finishing polishing, and generating a large amount of bubbles in the polishing solution in the processing process, as shown in fig. 7.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 8
Embodiment 8 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is (4): 3.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The cobalt chromium metal workpiece was made of cobalt chromium alloy with a designation GH159, and was polished before and after polishing as shown in fig. 8.
Example 9
Embodiment 9 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 6.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 10
Embodiment 10 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1.2 parts of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 11
Embodiment 11 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 0.5 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 12
Embodiment 12 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 90 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 13
Embodiment 13 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 400 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 14
Example 14 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 800 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 15
Embodiment 15 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 140 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 16
Embodiment 16 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 310 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 17
Embodiment 17 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate and ammonium sulfate, and the weight ratio of the potassium sulfate to the ammonium sulfate is 1: 2.5.
the organic acid is citric acid; the citric acid is anhydrous citric acid.
The anhydrous citric acid (CAS number: 77-92-9) is available from Tiaoh chemical Co., Ltd, Guangzhou.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 18
Embodiment 18 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 7 parts of nitrate, 1 part of organic acid and 210 parts of water.
The nitrate is potassium nitrate and ammonium nitrate, and the weight ratio of potassium nitrate to ammonium nitrate is 1: 2.5.
potassium nitrate in this application (CAS number: 7757-79-1, chemical formula: KNO)3) And ammonium nitrate (CAS No.: 6484-52-2, formula: NH (NH)4NO3) All purchased from golden brocade (Hunan) chemical Co.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 19
Embodiment 19 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 5 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is ammonium sulfate.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The preparation raw materials also comprise 2 parts of potassium nitrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Example 20
Embodiment 20 provides a polishing solution for cobalt-chromium metal electrolyte plasma polishing, which is prepared from the following raw materials in parts by weight: 2 parts of sulfate, 1 part of organic acid and 210 parts of water.
The sulfate is potassium sulfate.
The organic acid is citric acid; the citric acid is citric acid monohydrate.
The preparation raw material also comprises 5 parts of ammonium nitrate.
The embodiment also provides a preparation method of the polishing solution for the cobalt-chromium metal electrolyte plasma polishing, which comprises the following steps: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
The embodiment also provides a use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing, which is characterized by comprising the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 96 ℃, then putting the cobalt-chromium metal workpiece connected with a direct current power supply into the polishing solution, polishing at 340V for 600 seconds, taking out the workpiece, and finishing polishing.
The grade of the cobalt-chromium alloy used for the cobalt-chromium metal workpiece is GH 159.
Evaluation of Performance
The cobalt chromium metal surfaces treated with the polishing solutions for electrolyte plasma polishing obtained in examples 1 to 20 were subjected to performance tests, the test contents include the glossiness, the roughness, and the damage degree, and the results are shown in table 1 by visual observation.
TABLE 1
As can be seen from comparison of examples 1 to 20, the polishing solution for cobalt chromium metal electrolyte plasma polishing provided in the present invention can effectively improve the surface gloss of cobalt chromium metal, reduce sand spots and attachments on the metal surface, and increase the processing efficiency by adjusting the types and amounts of sulfate and organic acid, and polishing conditions, so that the workpiece can be effectively protected from damage during the processing.
Finally, it should be understood that the above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (2)
1. The polishing solution for cobalt-chromium metal electrolyte plasma polishing is characterized by comprising the following preparation raw materials in parts by weight: 5-15 parts of sulfate, 0.1-2 parts of organic acid and 150-300 parts of water; the organic acid is citric acid monohydrate; the sulfate is potassium sulfate and ammonium sulfate;
the weight ratio of the potassium sulfate to the ammonium sulfate is 1: (2-3);
the weight ratio of the sulfate to the organic acid is (6-9): 1;
the weight ratio of the sulfate to the water is 1: (25-35);
the use method of the polishing solution for cobalt chromium metal electrolyte plasma polishing comprises the following steps: adding the polishing solution into a polishing tank of an electrolyte plasma polishing machine, heating to 93-98 ℃, then putting the cobalt-chromium metal workpiece connected with a direct-current power supply into the polishing solution, polishing at 330-380V for 500-700 seconds, taking out the cobalt-chromium metal workpiece, and finishing polishing.
2. The method for preparing the polishing solution for cobalt-chromium metal electrolyte plasma polishing according to claim 1, comprising the steps of: and mechanically blending the sulfate and the organic acid uniformly at room temperature, and then placing the mixture into water to be stirred and dissolved to obtain the polishing solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910435789.6A CN110129872B (en) | 2019-05-23 | 2019-05-23 | Polishing solution for cobalt-chromium metal electrolyte plasma polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910435789.6A CN110129872B (en) | 2019-05-23 | 2019-05-23 | Polishing solution for cobalt-chromium metal electrolyte plasma polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110129872A CN110129872A (en) | 2019-08-16 |
| CN110129872B true CN110129872B (en) | 2020-08-21 |
Family
ID=67572846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910435789.6A Active CN110129872B (en) | 2019-05-23 | 2019-05-23 | Polishing solution for cobalt-chromium metal electrolyte plasma polishing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110129872B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110885638A (en) * | 2019-11-26 | 2020-03-17 | 东莞市八溢自动化设备有限公司 | Plasma polishing agent and polishing method |
| CN111037016A (en) * | 2019-12-06 | 2020-04-21 | 西安铂力特增材技术股份有限公司 | Electrolyte for electrolytic machining of nickel-based high-temperature alloy component and preparation method thereof |
| CN112500802A (en) * | 2020-12-24 | 2021-03-16 | 黄楚燊 | Plasma polishing agent and preparation method and application thereof |
| CN113089071B (en) * | 2021-04-01 | 2022-04-22 | 哈尔滨医科大学 | Electrochemical polishing solution, preparation method thereof and polishing method of cobalt-chromium alloy intravascular stent |
| CN113481583B (en) * | 2021-07-30 | 2022-07-12 | 南京铖联激光科技有限公司 | Electrolyte solution and electrolysis method for cobalt-chromium alloy electrolytic corrosion for 3D printing |
| CN113737267B (en) * | 2021-08-17 | 2023-03-24 | 南京航空航天大学 | Electrolyte plasma polishing electrolyte of nickel-based superalloy and polishing method thereof |
| TWI790834B (en) * | 2021-11-26 | 2023-01-21 | 財團法人金屬工業研究發展中心 | Method of Plasma Electrolytic Polishing |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56152999A (en) * | 1980-04-25 | 1981-11-26 | Kinki Yakuhin Kogyo Kk | Electrolytic polishing liqid of co-cr-type alloy |
| JPH07113200A (en) * | 1993-08-26 | 1995-05-02 | Sumitomo Metal Mining Co Ltd | Electrolytic polishing device and electrolyte thereof and electrolytic polishing method |
| US7357854B1 (en) * | 2002-08-19 | 2008-04-15 | Advanced Cardiovascular Systems, Inc. | Process for electropolishing a device made from cobalt-chromium |
| CN101591798A (en) * | 2008-06-01 | 2009-12-02 | 比亚迪股份有限公司 | A kind of metalwork and surface treatment method thereof |
| CN102310357A (en) * | 2011-10-20 | 2012-01-11 | 无锡源清高新技术研究所有限公司 | Liquid-phase plasma polishing liquid and polishing process of aluminum product |
| CN102632757A (en) * | 2011-02-14 | 2012-08-15 | 深圳富泰宏精密工业有限公司 | Stainless steel manufactured product and manufacturing method thereof |
| CN102953062A (en) * | 2012-11-02 | 2013-03-06 | 东莞市天昊金属表面处理设备有限公司 | Environment protection type plasma polishing liquid, preparation process and polishing process thereof |
| RU2556251C1 (en) * | 2014-05-15 | 2015-07-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный авиационный технический университет" | Method for electrolyte-plasma removal of polymer coatings from surface of laminated torsion bar of helicopter main rotor |
| CN105220218A (en) * | 2015-09-17 | 2016-01-06 | 北京实验工厂 | A kind of stainless material fine structure part ionogen-plasma polishing process method |
| CN105887178A (en) * | 2016-06-25 | 2016-08-24 | 张孝春 | Plasma aluminum alloy polishing salt preparation and polishing method |
| CN108046611A (en) * | 2017-12-29 | 2018-05-18 | 安徽凤阳亚欧玻璃工艺品有限公司 | A kind of glass etching liquid |
| CN109735895A (en) * | 2018-12-07 | 2019-05-10 | 南京工程学院 | A kind of the electrolyte plasma polishing fluid and polishing process of aluminium alloy |
-
2019
- 2019-05-23 CN CN201910435789.6A patent/CN110129872B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56152999A (en) * | 1980-04-25 | 1981-11-26 | Kinki Yakuhin Kogyo Kk | Electrolytic polishing liqid of co-cr-type alloy |
| JPH07113200A (en) * | 1993-08-26 | 1995-05-02 | Sumitomo Metal Mining Co Ltd | Electrolytic polishing device and electrolyte thereof and electrolytic polishing method |
| US7357854B1 (en) * | 2002-08-19 | 2008-04-15 | Advanced Cardiovascular Systems, Inc. | Process for electropolishing a device made from cobalt-chromium |
| CN101591798A (en) * | 2008-06-01 | 2009-12-02 | 比亚迪股份有限公司 | A kind of metalwork and surface treatment method thereof |
| CN102632757A (en) * | 2011-02-14 | 2012-08-15 | 深圳富泰宏精密工业有限公司 | Stainless steel manufactured product and manufacturing method thereof |
| CN102310357A (en) * | 2011-10-20 | 2012-01-11 | 无锡源清高新技术研究所有限公司 | Liquid-phase plasma polishing liquid and polishing process of aluminum product |
| CN102953062A (en) * | 2012-11-02 | 2013-03-06 | 东莞市天昊金属表面处理设备有限公司 | Environment protection type plasma polishing liquid, preparation process and polishing process thereof |
| RU2556251C1 (en) * | 2014-05-15 | 2015-07-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный авиационный технический университет" | Method for electrolyte-plasma removal of polymer coatings from surface of laminated torsion bar of helicopter main rotor |
| CN105220218A (en) * | 2015-09-17 | 2016-01-06 | 北京实验工厂 | A kind of stainless material fine structure part ionogen-plasma polishing process method |
| CN105887178A (en) * | 2016-06-25 | 2016-08-24 | 张孝春 | Plasma aluminum alloy polishing salt preparation and polishing method |
| CN108046611A (en) * | 2017-12-29 | 2018-05-18 | 安徽凤阳亚欧玻璃工艺品有限公司 | A kind of glass etching liquid |
| CN109735895A (en) * | 2018-12-07 | 2019-05-10 | 南京工程学院 | A kind of the electrolyte plasma polishing fluid and polishing process of aluminium alloy |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110129872A (en) | 2019-08-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110129872B (en) | Polishing solution for cobalt-chromium metal electrolyte plasma polishing | |
| US10260153B2 (en) | Methods and compositions for acid treatment of a metal surface | |
| JP2819378B2 (en) | Pickling method for stainless steel | |
| US4422906A (en) | Process for direct gold plating of stainless steel | |
| CN103160844A (en) | Method of removing oxide film on surface of copper or copper-base alloy and copper or copper-base alloy recovered using the method | |
| CN110629224B (en) | Environment-friendly nickel removing agent and preparation method and use method thereof | |
| EP3339483B1 (en) | Process for the electrolytic polishing of a metallic substrate | |
| CN1451058A (en) | Continuous electrolytic pickling method for metallic products using alternate current suplied cells | |
| CN102260899B (en) | Method for removing scale on surface of titanium/titanium alloy strip | |
| US4264420A (en) | Electrolytic stripping bath and process | |
| CA1046387A (en) | Method and composition for cleaning the surface of ferrous metal | |
| CN103849876B (en) | A kind of chemically polishing method | |
| US3429792A (en) | Method of electrolytically descaling and pickling steel | |
| US2311139A (en) | Process for the electrolytic cleaning of metals | |
| CN107513758A (en) | Liquid phase plasma nanometer burnishing liquid, its preparation method and the application of one Albatra metal | |
| US20090200178A1 (en) | Electropolishing method | |
| GB2062007A (en) | Electrolytic stripping bath and process | |
| EP1421164B1 (en) | Surface treatment composition and method for removing si component and reduced metal salt produced on the aluminum dicast material in etching process | |
| JP3687314B2 (en) | Pickling solution for stainless steel | |
| JP2577619B2 (en) | Method and apparatus for descaling alloy steel strip | |
| JP2517353B2 (en) | Descaling method for stainless steel strip | |
| JP3195144B2 (en) | Highly efficient pickling method for Cr-containing steel | |
| JP2000045086A (en) | Pickling method of stainless steel and pickling liquor | |
| Awad | Investigation of Interface Composition After Electropolishing of AISI 304 and Assessment of Surface Characteristics | |
| TW201416499A (en) | Alkaline electrolysis rust removal method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |