CN110093589B - Vacuum magnetron sputtering coating device for preparing graded neutral density filter - Google Patents
Vacuum magnetron sputtering coating device for preparing graded neutral density filter Download PDFInfo
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- CN110093589B CN110093589B CN201810094965.XA CN201810094965A CN110093589B CN 110093589 B CN110093589 B CN 110093589B CN 201810094965 A CN201810094965 A CN 201810094965A CN 110093589 B CN110093589 B CN 110093589B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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Abstract
The invention discloses a vacuum magnetron sputtering coating device for preparing a graded neutral density filter, which comprises the following components: the vacuum plating device comprises a vacuum cavity, a piece supporting device to be plated, a circular baffle mechanism, a rotating cathode mechanism, a water inlet rotating sealing structure, a water outlet rotating sealing structure and a driving device; the to-be-plated piece supporting device is positioned in the vacuum cavity, and the circular baffle mechanism is positioned below the to-be-plated piece supporting device; the circular baffle mechanism is fixedly connected with the rotating cathode mechanism and synchronously rotates under the drive of the driving device; the water inlet rotary sealing structure and the water outlet rotary sealing structure are both arranged at the bottom of the cathode rotary mechanism; the invention can prepare a large-size circular gradient neutral density filter, and the transmissivity of the circular gradient neutral density filter can be linearly changed along the polar coordinate angle direction in a sector area of 0-270 degrees.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a vacuum magnetron sputtering coating device for preparing a graded neutral density filter.
Background
The gradual change neutral density filter can linearly attenuate light intensity by rotating the filter, realizes accurate adjustment of light energy in a linear direction, realizes adjustability and controllability of light energy on the premise of keeping the distribution of neutral spectrum light energy, and can be applied to the fields of natural light, laser and the like. The two optical filters are combined for use, and a fixed density attenuation effect can be obtained in a larger limited area through reverse rotation.
At present, theoretical design methods of the linear gradient filter are mature, and different methods, such as ion beam etching, electron beam thermal evaporation, magnetron sputtering technology and the like, are respectively proposed by students at home and abroad in terms of manufacturing, but research on a preparation device is not quite enough, wherein the invention patent (CN 201610007844.8) of the application 2016.01.07 is a circular radial gradient neutral density filter, a preparation method and a preparation device thereof, a substrate (a plated piece) is adopted for rotation, a shielding plate is fixed, and an electron beam thermal evaporation method is adopted, but on one hand, if the vapor density near the evaporation source is high, interaction occurs between electron beam and vapor particles, the flux of electrons is scattered and deviates along a track, meanwhile, excitation and ionization of vapor and residual gas are caused, the quality of a mold layer is influenced, and on the other hand, a large-size product cannot be prepared.
In the prior art, the vacuum magnetron sputtering coating is also mature, but the vacuum magnetron sputtering coating is applied to a coating device for preparing the graded neutral density filter, wherein the principle of the vacuum magnetron sputtering coating is as follows: electrons collide with argon atoms in the process of accelerating the electrons to fly to the substrate under the action of an electric field, a large amount of argon ions and electrons are ionized, and the electrons fly to the substrate. The argon ions are accelerated to bombard the target under the action of an electric field, a large number of target atoms are sputtered, and neutral target atoms (or molecules) are deposited on the substrate to form a film. The secondary electrons are influenced by the magnetic field Lorentz force in the process of accelerating the flying to the substrate, are restrained in a plasma area close to the target surface, the plasma density in the area is high, the secondary electrons do circular motion around the target surface under the action of the magnetic field, the motion path of the electrons is long, a large amount of argon ions are continuously collided and ionized with argon atoms in the motion process to bombard the target material, the energy of the electrons is gradually reduced after multiple collisions, the restraint of magnetic lines of force is eliminated, the secondary electrons are far away from the target material, and finally the secondary electrons are deposited on the substrate.
Therefore, how to provide a coating device for preparing a circular graded neutral density filter based on the vacuum magnetron sputtering principle is a problem to be solved by those skilled in the art.
Disclosure of Invention
In view of this, the present invention provides a cathode magnetron sputtering coating apparatus suitable for manufacturing a circular graded neutral density filter, which can manufacture a circular graded neutral density filter of a large size, and whose transmittance can be linearly varied in a 0-270 ° sector area in a polar coordinate angular direction.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
a vacuum magnetron sputtering coating device for preparing a graded neutral density filter comprises: the vacuum plating device comprises a vacuum cavity, a piece supporting device to be plated, a circular baffle mechanism, a rotating cathode mechanism, a water inlet rotating sealing structure, a water outlet rotating sealing structure and a driving device; the to-be-plated piece supporting device is positioned in the vacuum cavity, and the circular baffle mechanism is positioned below the to-be-plated piece supporting device; the circular baffle mechanism is fixedly connected with the rotating cathode mechanism and synchronously rotates under the drive of the driving device; the water inlet rotary sealing structure and the water outlet rotary sealing structure are both arranged at the bottom of the cathode rotary mechanism;
the circular baffle mechanism includes: a circular baffle, an insulating bracket and a bracket; wherein the circular baffle plate is provided with a trapezoid hole along the radial direction from the center; the insulating brackets and the three brackets are arranged at intervals of 90 degrees and support the circular baffle;
the rotating cathode mechanism includes: the cathode, the cathode support wheel, the balance beam and the cathode insulator; the cathode consists of a magnet S pole, a magnet N pole, a cathode seat and a sputtering target material; the magnet S pole and the magnet N pole are sealed in the cavity of the cathode seat through the sputtering target, the cathode seat is provided with a cathode seat water inlet and a cathode seat water outlet, and the cathode seat water outlet is connected with an overflow water outlet pipe; one end of the cathode is connected with an insulating bracket of the circular baffle mechanism, the other end of the cathode is connected with three balance beams, the cathode and the three balance beams are arranged at intervals of 90 degrees, and the three balance beams are respectively connected with the three brackets of the circular baffle mechanism; the cathode insulating pieces are arranged between the cathode seat and the three balance beams, and cathode supporting wheels used for rotating the circular baffle mechanism and the rotating cathode mechanism are arranged below the insulating brackets and each bracket;
the water inlet rotary sealing structure comprises: the device comprises a flange, an outer pipe, a water inlet bearing gland, a water inlet rotary bearing, a water inlet movable sealing ring, an insulating piece, a water inlet rotary supporting sleeve, a movable sealing rotating shaft and a water inlet; the flange is fixedly welded with the outer tube and the dynamic seal rotating shaft, the flange is fixedly connected with the cathode seat, and the water inlet is communicated with the inner cavity of the cathode seat; the outer tube is sleeved on the periphery of the dynamic seal rotating shaft, is arranged on the water inlet rotating bearing to synchronously rotate, and is rotationally sealed through the water inlet dynamic seal ring; the water inlet rotary support sleeve is arranged on the vacuum cavity bottom plate, the water inlet rotary bearing is fixed on the water inlet rotary support sleeve through the water inlet bearing gland, and an insulating piece is arranged between the water inlet rotary support sleeve and the vacuum cavity; the water inlet is arranged at one side of the water inlet rotary supporting sleeve, a water inlet hole corresponding to the water inlet is formed in the wall of the outer pipe along the circumferential direction, and the water inlet hole is communicated with the water inlet; the gap between the outer tube and the dynamic seal rotating shaft forms a cavity to form a water inlet flow passage; the flange is annularly provided with flange water inlets, the flange water inlets are correspondingly arranged with the cathode seat water inlets, and the water inlet flow passage is communicated with the cathode seat cavity through the flange water inlets and the cathode seat water inlets;
the water outlet rotary sealing structure comprises: the device comprises a fixed bracket, a water outlet rotary support sleeve, a water outlet bearing gland, a water outlet rotary bearing, a water outlet movable sealing ring and a leading-out electrode; the side surface of the water outlet rotating support sleeve is provided with a water outlet, and the water outlet rotating support sleeve is fixedly connected with the water inlet rotating support sleeve through the fixing bracket; the water outlet rotary bearing gland fixes the water outlet rotary bearing on the water outlet rotary supporting jacket; the dynamic seal rotating shaft is arranged on the water outlet rotating bearing and is rotationally sealed through the water outlet dynamic seal ring; a water outlet flow passage is formed in the dynamic seal rotating shaft along the axial direction, a water outlet hole corresponding to the water outlet is formed in the side surface of the dynamic seal rotating shaft along the circumferential direction, a flange water outlet hole is formed in the center of the flange, and the water outlet is communicated with the inner cavity of the cathode seat through the water outlet hole, the water outlet flow passage, the flange water outlet hole, the water outlet of the cathode seat and the overflow water outlet pipe;
the driving device includes: the synchronous belt, the dynamic seal rotating shaft synchronous wheel, the motor synchronous wheel, the stepping motor and the stepping motor bracket; wherein the step motor is fixed at the bottom of the vacuum cavity through a step motor bracket; the dynamic seal rotating shaft synchronous wheel is in transmission connection with the dynamic seal rotating shaft; the stepping motor is in transmission connection with the motor synchronous wheel, and the motor synchronous wheel is in transmission connection with the dynamic seal rotating shaft synchronous wheel through the synchronous belt.
According to the invention, the dynamic sealing rotating shaft is driven to rotate by the driving motor, so that the cathode seat and the circular baffle mechanism are driven to rotate in the vacuum cavity by 360 degrees, a large-size circular gradient neutral density filter is prepared, and the transmissivity of the circular gradient neutral density filter can be linearly changed in a sector area of 0-270 degrees along the polar coordinate angular direction; the power is transmitted to the cathode seat through the dynamic seal rotating shaft through the water inlet rotating seal structure and the water outlet rotating seal structure, and a circulating cooling water path can be formed to cool the cathode; the cathode supporting wheel is arranged, so that the cathode seat and the bracket integrally and stably rotate, and the acting force born by the dynamic seal rotating shaft is reduced; through the design of compensating beam, guaranteed the balanced stability of negative pole seat and support in rotatory in-process.
Preferably, in the vacuum magnetron sputtering coating device for preparing a graded neutral density filter, the workpiece supporting device comprises: a support frame for a part to be plated and a support plate for the part to be plated; wherein the support plate of the workpiece to be plated is arranged at the top of the support frame of the workpiece to be plated, and the workpiece to be plated is placed on the support plate of the workpiece to be plated for fixing.
Preferably, in the vacuum magnetron sputtering coating device for preparing the graded neutral density filter, the cathode seat is a cuboid groove with a cavity, the magnet S pole and the magnet N pole are both positioned in the cuboid groove, the magnet S is in a strip shape, the magnet N pole is in a ring shape, and the magnet N pole surrounds the magnet S pole and leaves a certain interval.
Preferably, in the vacuum magnetron sputtering coating device for preparing the graded neutral density filter, a vacuum pumping port is arranged at the bottom of the vacuum cavity, and is used for carrying out vacuum pumping operation on the vacuum cavity, so that the vacuum cavity is in a vacuum state.
Preferably, in the vacuum magnetron sputtering coating device for preparing the graded neutral density filter, sealing rings are arranged between the sputtering target and the cathode seat, between the insulating piece and the vacuum cavity, between the insulating piece and the water inlet rotary supporting jacket, between the outer edge of the flange water inlet hole and the cathode seat, and between the outer edge of the flange water outlet hole and the cathode seat; the sealing ring arranged between the sputtering target and the cathode seat can prevent cooling water from leaking and flowing into the vacuum cavity; sealing rings are arranged between the insulating piece and the vacuum cavity and between the insulating piece and the water inlet rotary supporting jacket, so that the vacuum environment cannot be formed due to the fact that the vacuum cavity is not tightly sealed; a sealing ring between the outer edge of the flange water inlet hole and the cathode seat prevents water from leaking from the flange edge; and a sealing ring is arranged between the outer edge of the flange water outlet hole and the cathode seat, so that water inlet and water outlet are prevented from being mixed, and the cooling effect is reduced.
Preferably, in the vacuum magnetron sputtering coating device for preparing the graded neutral density filter, the vacuum magnetron sputtering coating device further comprises a sputtering power supply, wherein the negative electrode of the sputtering power supply is electrically connected with the cathode, and the positive electrode of the sputtering power supply is electrically connected with the vacuum cavity.
Preferably, in the vacuum magnetron sputtering coating device for preparing the graded neutral density filter, the water inlet hole, the water inlet flow passage, the flange water inlet hole, the cathode seat water inlet, the overflow water outlet pipe, the cathode seat water outlet, the flange water outlet hole, the water outlet flow passage, the water outlet hole and the water outlet form a circulating cooling water passage, so that the cathode seat, the magnet S pole, the magnet N pole and the sputtering target are fully cooled.
Compared with the prior art, the invention discloses a vacuum magnetron sputtering coating device for preparing a graded neutral density filter, which drives a dynamic seal rotating shaft to rotate through a driving motor, so that a cathode seat and a circular baffle mechanism are driven to rotate in a vacuum cavity by 360 degrees, a large-size circular graded neutral density filter is prepared, and the transmissivity of the circular graded density filter can linearly change along the direction of a polar coordinate angle in a sector area of 0-270 degrees; the power is transmitted to the cathode seat through the dynamic seal rotating shaft through the water inlet rotating seal structure and the water outlet rotating seal structure, and a circulating cooling water path can be formed to cool the cathode; the cathode supporting wheel is arranged, so that the cathode seat and the bracket integrally and stably rotate, and the acting force born by the dynamic seal rotating shaft is reduced; through the design of the balance beam, the balance stability of the cathode seat and the bracket in the rotating process is ensured;
wherein the support plate of the workpiece to be plated is arranged at the top of the support frame of the workpiece to be plated, and the workpiece to be plated is placed on the support plate of the workpiece to be plated for fixing; the bottom of the vacuum cavity is provided with a vacuum pumping port for vacuumizing the vacuum cavity, so that the vacuum cavity is in a vacuum state; the sealing ring arranged between the sputtering target and the cathode seat can prevent cooling water from leaking and flowing into the vacuum cavity; sealing rings are arranged between the insulating piece and the vacuum cavity and between the insulating piece and the water inlet rotary supporting jacket, so that the vacuum environment cannot be formed due to the fact that the vacuum cavity is not tightly sealed; a sealing ring between the outer edge of the flange water inlet hole and the cathode seat prevents water from leaking from the flange edge; and a sealing ring is arranged between the outer edge of the flange water outlet hole and the cathode seat, so that water inlet and water outlet are prevented from being mixed, and the cooling effect is reduced. The water inlet, the water inlet hole, the water inlet flow passage, the flange water inlet hole, the cathode seat water inlet, the overflow water outlet pipe, the cathode seat water outlet, the flange water outlet hole, the water outlet flow passage, the water outlet hole and the water outlet form a circulating cooling water passage, so that the cathode seat, the magnet S pole, the magnet N pole and the sputtering target are fully cooled;
the invention provides a cathode magnetron sputtering coating device suitable for preparing a circular gradient neutral density filter, which can prepare a large-size circular gradient neutral density filter, and the transmissivity of the circular gradient neutral density filter can be linearly changed along the polar coordinate angle direction in a sector area of 0-270 degrees.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only embodiments of the present invention, and that other drawings can be obtained according to the provided drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of the overall structure of a vacuum magnetron sputtering coating device for preparing a graded neutral density filter according to the present invention;
FIG. 2 is an enlarged view of A in FIG. 1;
FIG. 3 is a schematic view of the circular baffle plate of the present invention;
FIG. 4 is a schematic view of the connection structure of the outer tube, flange and dynamic seal spindle of the present invention.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The embodiment of the invention discloses a cathode magnetron sputtering coating device suitable for preparing a circular gradient neutral density filter, which can prepare a large-size circular gradient neutral density filter, and the transmissivity of the circular gradient neutral density filter can be linearly changed along the polar coordinate angle direction in a sector area of 0-270 degrees.
A vacuum magnetron sputtering coating device for preparing a graded neutral density filter comprises: the vacuum chamber 1, a piece supporting device to be plated, a circular baffle mechanism, a rotating cathode mechanism, a water inlet rotating sealing structure, a water outlet rotating sealing structure and a driving device 2; the support device of the workpiece to be plated is positioned in the vacuum cavity 1, and the circular baffle mechanism is positioned below the support device of the workpiece to be plated; the circular baffle mechanism is fixedly connected with the rotating cathode mechanism and synchronously rotates under the drive of the driving device 2; the water inlet rotary sealing structure and the water outlet rotary sealing structure are both arranged at the bottom of the cathode rotary mechanism;
the circular baffle mechanism includes: a circular baffle 3, an insulating bracket 4 and a bracket 5; wherein the circular baffle 3 is provided with a trapezoid hole along the radial direction from the center; the insulating brackets 4 and the three brackets 5 are arranged at intervals of 90 degrees and support the circular baffle 3;
the rotating cathode mechanism includes: a cathode, a cathode support wheel 6, a balance beam 7 and a cathode insulator 8; the cathode consists of a magnet S pole, a magnet N pole, a cathode seat 11 and a sputtering target 12; the magnet S pole and the magnet N pole are sealed in the cavity of the cathode seat 11 through the sputtering target 12, the cathode seat 11 is provided with a cathode seat water inlet 13 and a cathode seat water outlet 14, and the cathode seat water outlet 14 is connected with an overflow water outlet pipe 47; one end of the cathode is connected with an insulating support 4 of the circular baffle mechanism, the other end of the cathode is connected with three balance beams 7, the cathode and the three balance beams 7 are arranged at intervals of 90 degrees, the three balance beams 7 are respectively connected with three supports 5 of the circular baffle mechanism, cathode insulators 8 are arranged between a cathode seat 11 and the three balance beams 7, and cathode support wheels 6 for rotating the circular baffle mechanism and the rotating cathode mechanism are arranged below the insulating support 4 and each support 5;
the rotary seal structure of intaking includes: the water inlet rotary sealing device comprises a flange 15, an outer pipe 16, a water inlet bearing gland 17, a water inlet rotary bearing 18, a water inlet movable sealing ring 19, an insulating piece 20, a water inlet rotary supporting sleeve 22, a movable sealing rotary shaft 23 and a water inlet 24; the flange 15 is fixedly welded with the outer tube 16 and the dynamic seal rotating shaft 23, the flange 15 is fixedly connected with the cathode seat 11, and the water inlet 24 is communicated with the inner cavity of the cathode seat 11; the outer tube 16 is sleeved on the periphery of the dynamic seal rotating shaft 23, is arranged on the water inlet rotating bearing 18 and synchronously rotates, and is rotationally sealed through the water inlet dynamic seal ring 19; the water inlet rotary support sleeve 22 is arranged on the bottom plate of the vacuum cavity 1, the water inlet rotary bearing 18 is fixed on the water inlet rotary support sleeve 22 through the water inlet bearing gland 17, and an insulating piece 20 is arranged between the water inlet rotary support sleeve 22 and the vacuum cavity 1; the water inlet 24 is arranged at one side of the water inlet rotary supporting sleeve 22, a water inlet hole 25 corresponding to the water inlet 24 is formed in the wall of the outer tube 16 along the circumferential direction, and the water inlet hole 25 is communicated with the water inlet 24; the gap between the outer tube 16 and the dynamic seal rotating shaft 23 forms a cavity to form a water inlet flow passage 26; the flange 15 is annularly provided with flange water inlets 27, and the flange water inlets 27 are correspondingly arranged with the cathode seat water inlets 13; the water inlet flow channel 26 is communicated with the cavity of the cathode seat 11 through a flange water inlet hole 27 and a cathode seat water inlet 13;
the water outlet rotary sealing structure comprises: the water outlet rotary support comprises a fixed bracket 28, a water outlet rotary support sleeve 29, a water outlet bearing gland 30, a water outlet 31, a water outlet rotary bearing 32, a water outlet movable sealing ring 33 and a lead-out electrode 34; the side surface of the water outlet rotary supporting sleeve 29 is provided with a water outlet 31, and the water outlet rotary supporting sleeve 29 is fixedly connected with the water inlet rotary supporting sleeve 22 through a fixed bracket 28; the water outlet rotary bearing cover 30 fixes the water outlet rotary bearing 32 on the water outlet rotary support sleeve 29; the dynamic seal rotating shaft 23 is arranged on the water outlet rotating bearing 32 and is rotationally sealed by a water outlet dynamic seal ring 33; a water outlet flow passage 36 is axially formed in the dynamic seal rotating shaft 23, a water outlet hole 37 corresponding to the water outlet 31 is formed in the side surface of the dynamic seal rotating shaft 23 along the circumferential direction, a flange water outlet hole 21 is formed in the center of the flange 15, and the water outlet 31 is communicated with the inner cavity of the cathode seat 11 through the water outlet hole 37, the water outlet flow passage 36, the flange water outlet hole 21, the cathode seat water outlet 14 and the overflow water outlet pipe 47;
the driving device 2 includes: a synchronous belt 38, a dynamic seal rotating shaft synchronous wheel 39, a motor synchronous wheel 40, a stepping motor 41 and a stepping motor bracket 42; wherein the stepper motor 41 is fixed at the bottom of the vacuum cavity 1 through a stepper motor bracket 42; the dynamic seal rotating shaft synchronizing wheel 39 is in transmission connection with the dynamic seal rotating shaft 23; the stepper motor 41 is in driving connection with the motor synchronizing wheel 40, and the motor synchronizing wheel 40 is in driving connection with the dynamic seal rotating shaft synchronizing wheel 39 through the synchronous belt 38.
In order to further optimize the above technical solution, the support device for the part to be plated comprises: a workpiece support frame 43 and a workpiece support plate 44; wherein the workpiece support plate 44 is mounted on top of the workpiece support frame 43.
In order to further optimize the above technical scheme, the cathode seat 11 is a rectangular groove with a cavity, the magnet S pole and the magnet N pole are both positioned in the rectangular groove, the magnet S is in a shape of a bar, the magnet N is in a shape of a ring, the magnet N pole surrounds the magnet S pole, and a gap is arranged between the magnet N pole and the magnet S pole.
In order to further optimize the technical scheme, the bottom of the vacuum cavity 1 is provided with a vacuum-pumping port 45.
In order to further optimize the technical scheme, sealing rings 46 are arranged between the sputtering target 12 and the cathode seat 11, between the insulating piece 20 and the vacuum cavity 1, between the insulating piece 20 and the water inlet rotary supporting sleeve 22, between the outer edge of the flange water inlet hole 25 and the cathode seat 11, and between the outer edge of the flange water outlet hole 21 and the cathode seat 11.
In order to further optimize the technical scheme, the vacuum chamber further comprises a sputtering power supply, wherein the negative electrode of the sputtering power supply is electrically connected with the cathode, and the positive electrode of the sputtering power supply is electrically connected with the vacuum chamber 1.
In order to further optimize the technical scheme, the water inlet 24, the water inlet hole 25, the water inlet flow passage 26, the flange water inlet hole 27, the cathode seat water inlet 13, the overflow water outlet pipe 47, the cathode seat water outlet 14, the flange water outlet hole 21, the water outlet flow passage 36, the water outlet hole 37 and the water outlet 31 form a circulating cooling water passage.
In the present specification, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different point from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant points refer to the description of the method section.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1. A vacuum magnetron sputtering coating device for preparing a graded neutral density filter is characterized by comprising the following components: the vacuum plating device comprises a vacuum cavity, a piece supporting device to be plated, a circular baffle mechanism, a rotating cathode mechanism, a water inlet rotating sealing structure, a water outlet rotating sealing structure and a driving device; the to-be-plated piece supporting device is positioned in the vacuum cavity, and the circular baffle mechanism is positioned below the to-be-plated piece supporting device; the circular baffle mechanism is fixedly connected with the rotating cathode mechanism and synchronously rotates under the drive of the driving device; the water inlet rotary sealing structure and the water outlet rotary sealing structure are both arranged at the bottom of the cathode rotary mechanism;
the circular baffle mechanism includes: a circular baffle, an insulating bracket and a bracket; wherein the circular baffle plate is provided with a trapezoid hole along the radial direction from the center; the insulating brackets and the three brackets are arranged at intervals of 90 degrees and support the circular baffle;
the rotating cathode mechanism includes: the cathode, the cathode support wheel, the balance beam and the cathode insulator; the cathode consists of a magnet S pole, a magnet N pole, a cathode seat and a sputtering target material; the magnet S pole and the magnet N pole are sealed in the cavity of the cathode seat through the sputtering target, the cathode seat is provided with a cathode seat water inlet and a cathode seat water outlet, and the cathode seat water outlet is connected with an overflow water outlet pipe; one end of the cathode is connected with an insulating bracket of the circular baffle mechanism, the other end of the cathode is connected with three balance beams, and the cathode and the three balance beams are arranged at intervals of 90 degrees; the three balance beams are respectively connected with the three brackets of the circular baffle mechanism; the cathode insulating pieces are arranged between the cathode seat and the three balance beams, and cathode supporting wheels used for rotating the circular baffle mechanism and the rotating cathode mechanism are arranged below the insulating brackets and each bracket;
the water inlet rotary sealing structure comprises: the device comprises a flange, an outer pipe, a water inlet bearing gland, a water inlet rotary bearing, a water inlet movable sealing ring, an insulating piece, a water inlet rotary supporting sleeve, a movable sealing rotating shaft and a water inlet; the flange is fixedly welded with the outer tube and the dynamic seal rotating shaft, the flange is fixedly connected with the cathode seat, and the water inlet is communicated with the inner cavity of the cathode seat; the outer tube is sleeved on the periphery of the dynamic seal rotating shaft, is arranged on the water inlet rotating bearing to synchronously rotate, and is rotationally sealed through the water inlet dynamic seal ring; the water inlet rotary support sleeve is arranged on the vacuum cavity bottom plate, the water inlet rotary bearing is fixed on the water inlet rotary support sleeve through the water inlet bearing gland, and an insulating piece is arranged between the water inlet rotary support sleeve and the vacuum cavity; the water inlet is arranged at one side of the water inlet rotary supporting sleeve, a water inlet hole corresponding to the water inlet is formed in the wall of the outer pipe along the circumferential direction, and the water inlet hole is communicated with the water inlet; the gap between the outer tube and the dynamic seal rotating shaft forms a cavity to form a water inlet flow passage; the flange is annularly provided with flange water inlet holes, the flange water inlet holes are correspondingly arranged with the cathode seat water inlet, and the water inlet is communicated with the cathode seat cavity through the water inlet holes, the water inlet flow channels, the flange water inlet holes and the cathode seat water inlet;
the water outlet rotary sealing structure comprises: the device comprises a fixed bracket, a water outlet rotary support sleeve, a water outlet bearing gland, a water outlet rotary bearing, a water outlet movable sealing ring and a leading-out electrode; the side surface of the water outlet rotating support sleeve is provided with a water outlet, and the water outlet rotating support sleeve is fixedly connected with the water inlet rotating support sleeve through the fixing bracket; the water outlet rotary bearing gland fixes the water outlet rotary bearing on the water outlet rotary supporting jacket; the dynamic seal rotating shaft is arranged on the water outlet rotating bearing and is rotationally sealed through the water outlet dynamic seal ring; a water outlet flow passage is formed in the dynamic seal rotating shaft along the axial direction, a water outlet hole corresponding to the water outlet is formed in the side surface of the dynamic seal rotating shaft along the circumferential direction, a flange water outlet hole is formed in the center of the flange, and the water outlet is communicated with the inner cavity of the cathode seat through the water outlet hole, the water outlet flow passage, the flange water outlet hole, the water outlet of the cathode seat and the overflow water outlet pipe;
the driving device includes: the synchronous belt, the dynamic seal rotating shaft synchronous wheel, the motor synchronous wheel, the stepping motor and the stepping motor bracket; wherein the step motor is fixed at the bottom of the vacuum cavity through a step motor bracket; the dynamic seal rotating shaft synchronous wheel is in transmission connection with the dynamic seal rotating shaft; the stepping motor is in transmission connection with the motor synchronous wheel, and the motor synchronous wheel is in transmission connection with the dynamic seal rotating shaft synchronous wheel through the synchronous belt.
2. The vacuum magnetron sputtering coating device for preparing a graded neutral density filter according to claim 1, wherein the member to be coated supporting device comprises: a support frame for a part to be plated and a support plate for the part to be plated; wherein the support plate of the workpiece to be plated is arranged at the top of the support frame of the workpiece to be plated.
3. The vacuum magnetron sputtering coating device for preparing the graded neutral density filter according to claim 2, wherein the cathode seat is a rectangular groove with a cavity, the magnet S pole and the magnet N pole are both positioned in the rectangular groove, the magnet S pole is bar-shaped, the magnet N pole is ring-shaped, the magnet N pole surrounds the magnet S pole, and a gap is arranged between the magnet N pole and the magnet S pole.
4. The vacuum magnetron sputtering coating device for preparing the graded neutral density filter according to claim 3, wherein the bottom of the vacuum cavity is provided with a vacuum pumping port.
5. The vacuum magnetron sputtering coating device for preparing the graded neutral density filter according to claim 4, wherein sealing rings are arranged between the sputtering target and the cathode seat, between the insulating piece and the vacuum cavity, between the insulating piece and the water inlet rotary supporting jacket, between the outer edge of the flange water inlet hole and the cathode seat, and between the outer edge of the flange water outlet hole and the cathode seat.
6. The vacuum magnetron sputtering coating device for preparing the graded neutral density filter according to claim 1, further comprising a sputtering power supply, wherein a cathode of the sputtering power supply is electrically connected with the cathode, and an anode of the sputtering power supply is electrically connected with the vacuum cavity.
7. The vacuum magnetron sputtering coating device for preparing the graded neutral density filter according to claim 6, wherein the water inlet, the water inlet hole, the water inlet runner, the flange water inlet hole, the cathode seat water inlet, the overflow water outlet pipe, the cathode seat water outlet, the flange water outlet hole, the water outlet runner, the water outlet hole and the water outlet form a circulating cooling water path.
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| JP2009001889A (en) * | 2007-06-25 | 2009-01-08 | Nisca Corp | Film deposition method for neutral density filter, neutral density filter using the same, and image pick-up light quantity diaphragm device |
| CN104049291A (en) * | 2014-06-23 | 2014-09-17 | 孙义昌 | Neutral grey level ND filter of multiple film layers and manufacturing method thereof |
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| JP4855602B2 (en) * | 2001-07-27 | 2012-01-18 | 日本電産コパル株式会社 | Thin film type ND filter and manufacturing method thereof |
| JP2011070150A (en) * | 2009-04-14 | 2011-04-07 | Nippon Hoso Kyokai <Nhk> | Nd filter, television camera, and method for manufacturing nd filter |
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| JP2009001889A (en) * | 2007-06-25 | 2009-01-08 | Nisca Corp | Film deposition method for neutral density filter, neutral density filter using the same, and image pick-up light quantity diaphragm device |
| CN104049291A (en) * | 2014-06-23 | 2014-09-17 | 孙义昌 | Neutral grey level ND filter of multiple film layers and manufacturing method thereof |
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