CN110093589A - A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter - Google Patents
A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter Download PDFInfo
- Publication number
- CN110093589A CN110093589A CN201810094965.XA CN201810094965A CN110093589A CN 110093589 A CN110093589 A CN 110093589A CN 201810094965 A CN201810094965 A CN 201810094965A CN 110093589 A CN110093589 A CN 110093589A
- Authority
- CN
- China
- Prior art keywords
- water inlet
- cathode
- water outlet
- flange
- cathode block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of vacuum magnetron sputtering coating film devices for preparing gradual change neutral-density filter, comprising: vacuum cavity, unplated piece support device, circular baffle plate mechanism, rotation cathode mechanism, water inlet rotational sealing structure, water outlet rotational sealing structure and driving device；The unplated piece support device is located in the vacuum cavity, and the circular baffle plate mechanism is located at below the unplated piece support device；The circular baffle plate mechanism is fixedly connected with the rotation cathode mechanism, and is rotated synchronously under driving device driving；The water inlet rotational sealing structure and the water outlet rotational sealing structure are arranged at the cathod rotary actuator base；The present invention can prepare large-sized round gradual change neutral-density filter, and the circle graded density filter transmission can change in 0-270 ° of fan-shaped regions along polar angle dimension linear.
Description
Technical field
The present invention relates to technical field of vacuum plating, more particularly to a kind of to prepare gradual change neutral-density filter
Vacuum magnetron sputtering coating film device.
Background technique
Gradual change neutral-density filter can realize luminous energy in linear direction by rotating filtering piece come linear attenuation light intensity
Accurate adjustment realizes the adjustable, controllable of luminous energy, such optical filter can be applied under the premise of keeping neutral spectrum photic-energy transfer
In the fields such as natural light and laser.Two panels optical filter is applied in combination, by counter-rotating, can be obtained in biggish finite region
Obtain constant density attenuating.
Currently, the theoretical design method of linear variable filter is more mature, domestic and foreign scholars also distinguish in terms of production
Propose distinct methods, such as ion beam etching, electron beam evaporation, magnetron sputtering technique etc., but grinding about preparation facilities
Study carefully actually rare, wherein neutral in the round radial gradual of the patent of invention (CN201610007844.8) of 2016.01.07 application
Density filters and preparation method thereof and device use substrate (plating piece) and rotate, and shutter is fixed, and using electron beam heat
The method of evaporation, if but on the one hand the vapour density near evaporation source is high, phase can occur between electronic beam current and steam particle
The flux of interaction, electronics will scatter and disappear and track deviates, while causing the excitation and ionization of steam and residual gas, will affect mould
On the other hand layer quality cannot prepare large-sized product.
And in the prior art, vacuum magnetron sputtering coating film is also more mature, but it is close to be applied to preparation gradual change neutrality
The coating apparatus for spending optical filter is actually rare, and wherein the principle of vacuum magnetron sputtering coating film is: electronics adds under the action of electric field
Speed collides during flying to substrate with ar atmo, ionizes out a large amount of argon ion and electronics, and electronics flies to substrate.Argon from
Son accelerates to bombard target under the action of electric field, sputters a large amount of target atom, target atom (or molecule) deposition being in neutrality
It forms a film on substrate.Influence of secondary electron during accelerating to fly to substrate by magnetic field Loulun magnetism, is bound in and leans on
In the heating region near target face, plasma density is very high in the region, and secondary electron surrounds target under the influence of a magnetic field
Face circles, and the motion path of the electronics is very long, and constantly colliding during the motion with ar atmo, it is big to ionize out
The argon ion bombardment target of amount, the energy of electronics gradually decreases after multiple impacts, gets rid of the constraint of the magnetic line of force, far from target
Material is eventually deposited on substrate.
Therefore, it is based on vacuum magnetic-control sputtering principle, how a kind of plating preparing round gradual change neutral-density filter is provided
The problem of film device is current those skilled in the art's urgent need to resolve.
Summary of the invention
In view of this, the cathode magnetic control that the present invention provides a kind of suitable for preparing round gradual change neutral-density filter splashes
Coating apparatus is penetrated, large-sized round gradual change neutral-density filter can be prepared, and the circle graded density optical filter is saturating
The rate of penetrating can change in 0-270 ° of fan-shaped regions along polar angle dimension linear.
To achieve the goals above, the present invention adopts the following technical scheme:
A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter, comprising: vacuum cavity, unplated piece
Support device, circular baffle plate mechanism, rotation cathode mechanism, water inlet rotational sealing structure, water outlet rotational sealing structure and driving dress
It sets；The unplated piece support device is located in the vacuum cavity, and the circular baffle plate mechanism is located at the unplated piece branch
Below support arrangement；The circular baffle plate mechanism is fixedly connected with the rotation cathode mechanism, and under driving device driving
It rotates synchronously；The water inlet rotational sealing structure and the water outlet rotational sealing structure are arranged at cathod rotary mechanism bottom
Portion；
The circular baffle plate mechanism includes: circular baffle plate, insulating support and bracket；Wherein the circular baffle plate is by center edge
Radial direction offers trapezoidal hole；The insulating support and three brackets are in 90 ° of arranged for interval, and support the circular baffle plate；
The rotation cathode mechanism includes: cathode, cathode support wheel, equalizer bar and cathode insulation part；The wherein cathode
By the pole magnet S, the pole magnet N, cathode block and sputtering target material composition；The pole the magnet S and the pole magnet N are close by the sputtering target material
It is enclosed in the cavity of the cathode block, and the cathode block is provided with cathode block water inlet and cathode block water outlet, and described
Cathode block water outlet is connected with overflow outlet pipe；Described cathode one end connects the insulating support of the circular baffle plate mechanism, another
Three equalizer bars of end connection, and the cathode and three equalizer bars are in 90 ° of arranged for interval, three equalizer bars
It is connect respectively with three brackets of the circular baffle plate mechanism；It is respectively provided between the cathode block and three equalizer bars
Have a cathode insulation part, be provided with below the insulating support and each bracket for the circular baffle plate mechanism and
The cathode support wheel of the rotation cathode mechanism rotation；
The water inlet rotational sealing structure include: flange, outer tube, water inlet bearing gland, water inlet rolling bearing, water inlet move it is close
Seal, insulating part, water inlet rotational support housing, dynamic sealing shaft and water inlet；The flange and the outer tube, the dynamic sealing
Shaft is welded and fixed, and the flange is fixedly connected with the cathode block, and the water inlet is connected to the cathode block inner cavity；
The outer tube is set in dynamic sealing shaft periphery, and is arranged and rotates synchronously on the water inlet rolling bearing, by described
Dynamic seal ring of intaking carries out rotary seal；Be set on the vacuum cavity bottom plate outside the water inlet rotational support, it is described into
Water rolling bearing is fixed on outside the water inlet rotational support by the water inlet bearing gland and is put on, and water inlet rotation branch
Insulating part is provided between support housing and the vacuum cavity；The water inlet is arranged in the water inlet rotational support housing one
Side, and inlet opening corresponding with the water inlet, the inlet opening and water inlet are circumferentially offered on the outer tube wall
Connection；The gap of the outer tube and the dynamic sealing shaft forms cavity and constitutes water inlet flow channel；It is annularly distributed on the flange
There is flange inlet opening, the flange inlet opening is correspondingly arranged with the cathode block water inlet, and the water inlet flow channel passes through the method
Blue inlet opening, the cathode block water inlet are connected to the cathode block cavity；
The water outlet rotational sealing structure includes: fixed bracket, water outlet rotational support housing, water outlet bearing gland, water outlet
Mouth, water outlet rolling bearing, water outlet dynamic seal ring and extraction electrode；Water outlet rotational support housing side is provided with water outlet,
And the water outlet rotational support housing is fixedly connected by the fixed bracket with the water inlet rotational support housing；It is described go out
The water outlet rolling bearing is fixed on outside the water outlet rotational support and puts on by water rolling bearing gland；The dynamic sealing shaft is set
It sets on the water outlet rolling bearing, and rotary seal is carried out by the water outlet dynamic seal ring；Edge in the dynamic sealing shaft
Outlet passage axially is offered, and dynamic sealing shaft side circumferentially offers water outlet corresponding with the water outlet
Hole, the flange center offer flange apopore, and the water outlet passes through the apopore, the outlet passage, the method
Blue apopore, the cathode block water outlet, the overflow outlet pipe are connected to the cathode block inner cavity；
The driving device includes: synchronous belt, dynamic sealing shaft synchronizing wheel, motor drum in-phase, stepper motor and stepping electricity
Machine support；Wherein the stepper motor is fixed on the vacuum cavity bottom by stepping motor bracket；The dynamic sealing shaft
Synchronizing wheel is connect with the dynamic sealing rotating shaft transmission；The stepper motor and the motor drum in-phase are sequentially connected, and described
Motor drum in-phase is sequentially connected by the synchronous belt and the dynamic sealing shaft synchronizing wheel.
The present invention drives the rotation of dynamic sealing shaft by driving motor, to drive cathode block and circular baffle plate mechanism true
360 degree rotation in cavity body, realization prepares large-sized round gradual change neutral-density filter, and the circle graded density is filtered
Mating plate transmissivity can change in 0-270 ° of fan-shaped regions along polar angle dimension linear；Pass through rotary seal knot of intaking
Structure and water outlet rotational sealing structure can not only guarantee to deliver power to cathode block by dynamic sealing shaft, additionally it is possible to which formation follows
Ring cooling water channel, cools down cathode；The cathode support wheel of setting, integrally rotates smoothly, and subtract convenient for cathode block and bracket
The active force that few dynamic sealing shaft is born；By the design of equalizer bar, it ensure that cathode block and bracket in rotary course
Stability of equilibrium.
Preferably, described in a kind of above-mentioned vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter
Unplated piece support device includes: unplated piece support frame and unplated piece support plate；Wherein the unplated piece support plate is mounted on described
At the top of unplated piece support frame, unplated piece is placed in unplated piece support plate and is fixed.
Preferably, described in a kind of above-mentioned vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter
Cathode block is the cuboid slot with chamber, and the pole the magnet S and the pole the magnet N are respectively positioned in cuboid slot, and the magnet S is extremely
Bar shaped, the magnet N is extremely annular, and the magnet N polar ring is around the pole the magnet S, and there are certain intervals.
Preferably, described in a kind of above-mentioned vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter
Vacuum orifice is arranged in vacuum cavity bottom, vacuumizes work for carrying out to vacuum cavity, vacuum cavity is made to be in vacuum state.
Preferably, described in a kind of above-mentioned vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter
Between sputtering target material and the cathode block, between the insulating part and the vacuum cavity, the insulating part and it is described water inlet turn
Between dynamic support housing, between flange inlet opening outer rim and the cathode block, the flange apopore outer rim and the yin
Sealing ring is provided between electrode seat；The sealing ring being arranged between the sputtering target material and the cathode block can prevent cooling water
Leakage is flow in vacuum cavity；Between the insulating part and the vacuum cavity, the insulating part and the water inlet rotational support
It is provided with sealing ring between housing, prevents vacuum cavity poorly sealed, vacuum environment can not be formed；Outside the flange inlet opening
Sealing ring between edge and the cathode block prevents from leaking into water from the flange periphery；The flange apopore outer rim and institute
The sealing ring being arranged between cathode block is stated, prevents inflow and outflow from mixing, reduces cooling effect.
Preferably, it in a kind of above-mentioned vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter, also wraps
Shielding power supply is included, the shielding power supply cathode and the cathode are electrically connected, the shielding power supply anode and the vacuum cavity
It is electrically connected.
Preferably, described in a kind of above-mentioned vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter
Water inlet and the inlet opening, the water inlet flow channel, the flange inlet opening, the cathode block water inlet, the overflow are discharged
Pipe, the cathode block water outlet, the flange apopore, the outlet passage, the apopore, the water outlet constitute circulation
Cooling water channel, realization are fully cooled the cathode block, the pole the magnet S, the pole the magnet N, the sputtering target material.
It can be seen via above technical scheme that compared with prior art, being prepared in gradual change the present disclosure provides a kind of
Property density filters vacuum magnetron sputtering coating film device, the present invention by driving motor drive dynamic sealing shaft rotate, thus
Cathode block and circular baffle plate the mechanism 360 degree rotation in vacuum cavity are driven, it is close that realization prepares large-sized round gradual change neutrality
Optical filter is spent, and the circle graded density filter transmission can be in 0-270 ° of fan-shaped regions along polar angle side
To linear change；Can not only be guaranteed by water inlet rotational sealing structure and water outlet rotational sealing structure will by dynamic sealing shaft
Power transmission is to cathode block, additionally it is possible to form circulating cooling water route, cool down to cathode；The cathode support wheel of setting, is convenient for
Cathode block and bracket integrally rotate smoothly, and reduce the active force that dynamic sealing shaft is born；By the design of equalizer bar, guarantee
The stability of equilibrium of cathode block and bracket in rotary course；
Wherein the unplated piece support plate is mounted at the top of the unplated piece support frame, and unplated piece is placed on unplated piece support
It is fixed on plate；Vacuum orifice is arranged in the vacuum cavity bottom, vacuumizes work for carrying out to vacuum cavity, makes vacuum
Cavity is in vacuum state；The sealing ring being arranged between the sputtering target material and the cathode block can prevent cooling water leakage stream
To vacuum cavity；Between the insulating part and the vacuum cavity, the insulating part and the water inlet rotational support housing it
Between be provided with sealing ring, prevent vacuum cavity poorly sealed, vacuum environment can not be formed；Flange inlet opening outer rim and institute
The sealing ring between cathode block is stated, prevents from leaking into water from the flange periphery；The flange apopore outer rim and the cathode
The sealing ring being arranged between seat, prevents inflow and outflow from mixing, and reduces cooling effect.The water inlet and the inlet opening, institute
State water inlet flow channel, the flange inlet opening, the cathode block water inlet, the overflow outlet pipe, the cathode block water outlet, institute
It states flange apopore, the outlet passage, the apopore, the water outlet and constitutes circulating cooling water route, realize to the yin
Electrode seat, the pole the magnet S, magnet N pole, the sputtering target material are fully cooled；
The cathode magnetron sputtering plating dress that the present invention provides a kind of suitable for preparing round gradual change neutral-density filter
It sets, can prepare large-sized round gradual change neutral-density filter, and the circle graded density filter transmission can be with
Change in 0-270 ° of fan-shaped regions along polar angle dimension linear.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The embodiment of invention for those of ordinary skill in the art without creative efforts, can also basis
The attached drawing of offer obtains other attached drawings.
Fig. 1 is a kind of overall structure for the vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter of the present invention
Schematic diagram；
Fig. 2 is the enlarged drawing of A in Fig. 1；
Fig. 3 is the structural schematic diagram of circular baffle plate of the present invention；
Fig. 4 is the attachment structure schematic diagram of outer tube of the present invention, flange and dynamic sealing shaft.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
The cathode magnetron sputtering that the embodiment of the invention discloses a kind of suitable for preparing round gradual change neutral-density filter
Coating apparatus can prepare large-sized round gradual change neutral-density filter, and the circle graded density filter transmission
Rate can change in 0-270 ° of fan-shaped regions along polar angle dimension linear.
A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter, comprising: vacuum cavity 1, to be plated
Part support device, circular baffle plate mechanism, rotation cathode mechanism, water inlet rotational sealing structure, water outlet rotational sealing structure and driving
Device 2；Unplated piece support device is located in vacuum cavity 1, and circular baffle plate mechanism is located at below unplated piece support device；Circle
Shape baffle mechanism is fixedly connected with rotation cathode mechanism, and is rotated synchronously under the driving of driving device 2；The water inlet rotary seal
Structure and the water outlet rotational sealing structure are arranged at the cathod rotary actuator base；
Circular baffle plate mechanism includes: circular baffle plate 3, insulating support 4 and bracket 5；Wherein circular baffle plate 3 is by center along radius
Direction offers trapezoidal hole；Insulating support 4 and three brackets 5 are in 90 ° of arranged for interval, and support circular baffle plate 3；
Rotating cathode mechanism includes: cathode, cathode support wheel 6, equalizer bar 7 and cathode insulation part 8；Wherein cathode is by magnet
The pole S 9, the pole magnet N 10, cathode block 11 and sputtering target material 12 form；The pole magnet S 9 and the pole magnet N 10 are close by sputtering target material 12
It is enclosed in the cavity of cathode block 11, and cathode block 11 is provided with cathode block water inlet 13 and cathode block water outlet 14, and cathode
Seat water outlet 14 is connected with overflow outlet pipe 47；Cathode one end connects the insulating support 4 of circular baffle plate mechanism, other end connection three
A equalizer bar 7, cathode and three equalizer bars 7 are in 90 ° of arranged for interval, and three equalizer bars 7 respectively with circular baffle plate mechanism
Three brackets 5 are connected, and are provided with cathode insulation part 8 between cathode block 11 and three equalizer bars 7, insulating support 4 and each
The cathode support wheel 6 for circular baffle plate mechanism and the rotation cathode mechanism rotation is provided with below frame 5；
Water inlet rotational sealing structure includes: flange 15, outer tube 16, water inlet bearing gland 17, water inlet rolling bearing 18, water inlet
Dynamic seal ring 19, insulating part 20, water inlet rotational support housing 22, dynamic sealing shaft 23 and water inlet 24；Flange 15 and outer tube 16,
Dynamic sealing shaft 23 is welded and fixed, and flange 15 is fixedly connected with cathode block 11, and water inlet 24 is connected to 11 inner cavity of cathode block；
Outer tube 16 is set in 23 periphery of dynamic sealing shaft, and is arranged and rotates synchronously on water inlet rolling bearing 18, passes through dynamic sealing of intaking
Circle 19 carries out rotary seal；Intake rotational support housing 22 be arranged on 1 bottom plate of vacuum cavity, water inlet rolling bearing 18 by into
Submerged bearing gland 17 is fixed on water rotational support housing 22, and is intake between rotational support housing 22 and vacuum cavity 1
It is provided with insulating part 20；The setting of water inlet 24 is circumferentially opened on 16 tube wall of outer tube in water inlet 22 side of rotational support housing
Equipped with inlet opening 25 corresponding with water inlet 24, inlet opening 25 is connected to water inlet 24；Between outer tube 16 and dynamic sealing shaft 23
Gap forms cavity and constitutes water inlet flow channel 26；Flange inlet opening 27, flange inlet opening 27 and cathode are annularly distributed on flange 15
Seat water inlet 13 is correspondingly arranged；Water inlet flow channel 26 is connected by flange inlet opening 27, cathode block water inlet 13 and 11 cavity of cathode block
It is logical；
Water outlet rotational sealing structure includes: fixed bracket 28, water outlet rotational support housing 29, water outlet bearing gland 30, goes out
The mouth of a river 31, water outlet rolling bearing 32, water outlet dynamic seal ring 33 and extraction electrode 34；Water outlet 29 side of rotational support housing is provided with
Water outlet 31, and be discharged rotational support housing 29 and be fixedly connected by fixed bracket 28 with water inlet rotational support housing 22；Out
Water rolling bearing gland 30 will be discharged rolling bearing 32 and be fixed on water outlet rotational support housing 29；Dynamic sealing shaft 23 is arranged
Rotary seal is carried out on water outlet rolling bearing 32, and through water outlet dynamic seal ring 33；It is opened up in dynamic sealing shaft 23 along axial direction
There is outlet passage 36, and 23 side of dynamic sealing shaft circumferentially offers apopore 37 corresponding with water outlet 31, flange
15 centers offer flange apopore 21, and water outlet 31 passes through apopore 37, outlet passage 36, flange apopore 21, cathode block
Water outlet 14, overflow outlet pipe 47 are connected to 11 inner cavity of cathode block；
Driving device 2 includes: synchronous belt 38, dynamic sealing shaft synchronizing wheel 39, motor drum in-phase 40, stepper motor 41 and step
Into electric machine support 42；Wherein stepper motor 41 is fixed on 1 bottom of vacuum cavity by stepping motor bracket 42；Dynamic sealing shaft is same
Step wheel 39 is sequentially connected with dynamic sealing shaft 23；Stepper motor 41 and motor drum in-phase 40 are sequentially connected, and motor drum in-phase
40 are sequentially connected by synchronous belt 38 and dynamic sealing shaft synchronizing wheel 39.
In order to further optimize the above technical scheme, unplated piece support device includes: unplated piece support frame 43 and unplated piece
Support plate 44；Wherein unplated piece support plate 44 is mounted on 43 top of unplated piece support frame.
In order to further optimize the above technical scheme, cathode block 11 is the cuboid slot with chamber, the pole magnet S 9 and magnet N
Pole 10 is respectively positioned in cuboid slot, and the pole magnet S 9 is bar shaped, and the pole magnet N 10 is annular, and the pole magnet N 10 surround the pole magnet S 9, and
And gap is provided between the pole magnet N 10 and the pole magnet S 9.
In order to further optimize the above technical scheme, vacuum orifice 45 is arranged in 1 bottom of vacuum cavity.
In order to further optimize the above technical scheme, between sputtering target material 12 and cathode block 11, insulating part 20 and vacuum chamber
Between body 1, between insulating part 20 and water inlet rotational support housing 22, between 25 outer rim of flange inlet opening and the cathode block 11,
Sealing ring 46 is provided between 21 outer rim of flange apopore and the cathode block 11.
It in order to further optimize the above technical scheme, further include shielding power supply, shielding power supply cathode and cathode are electrically connected,
Shielding power supply anode and vacuum cavity 1 are electrically connected.
In order to further optimize the above technical scheme, water inlet 24 and inlet opening 25, water inlet flow channel 26, flange inlet opening
27, cathode block water inlet 13, overflow outlet pipe 47, cathode block water outlet 14, flange apopore 21, outlet passage 36, apopore
37, water outlet 31 constitutes circulating cooling water route.
Each embodiment in this specification is described in a progressive manner, the highlights of each of the examples are with other
The difference of embodiment, the same or similar parts in each embodiment may refer to each other.For device disclosed in embodiment
For, since it is corresponded to the methods disclosed in the examples, so being described relatively simple, related place is said referring to method part
It is bright.
The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention.
Various modifications to these embodiments will be readily apparent to those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, of the invention
It is not intended to be limited to the embodiments shown herein, and is to fit to and the principles and novel features disclosed herein phase one
The widest scope of cause.
Claims (7)
1. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter characterized by comprising vacuum chamber
Body, unplated piece support device, circular baffle plate mechanism, rotation cathode mechanism, water inlet rotational sealing structure, water outlet rotational sealing structure
And driving device；The unplated piece support device is located in the vacuum cavity, and the circular baffle plate mechanism is positioned at described
Below unplated piece support device；The circular baffle plate mechanism is fixedly connected with the rotation cathode mechanism, and is filled in the driving
Set the lower synchronous rotation of driving；The water inlet rotational sealing structure and the water outlet rotational sealing structure are arranged at the cathode and turn
Dynamic actuator base；
The circular baffle plate mechanism includes: circular baffle plate, insulating support and bracket；Wherein the circular baffle plate is by center along radius
Direction offers trapezoidal hole；The insulating support and three brackets are in 90 ° of arranged for interval, and support the circular baffle plate；
The rotation cathode mechanism includes: cathode, cathode support wheel, equalizer bar and cathode insulation part；Wherein the cathode is by magnetic
The pole iron S, the pole magnet N, cathode block and sputtering target material composition；The pole the magnet S and the pole magnet N are sealed in by the sputtering target material
In the cavity of the cathode block, and the cathode block is provided with cathode block water inlet and cathode block water outlet, and the cathode
Seat water outlet is connected with overflow outlet pipe；Described cathode one end connects the insulating support of the circular baffle plate mechanism, and the other end connects
Three equalizer bars are connect, and the cathode and three equalizer bars are in 90 ° of arranged for interval；Three equalizer bars divide again
It is not connect with three brackets of the circular baffle plate mechanism；It is provided between the cathode block and three equalizer bars
It is provided with below the cathode insulation part, the insulating support and each bracket for the circular baffle plate mechanism and institute
State the cathode support wheel of rotation cathode mechanism rotation；
The water inlet rotational sealing structure includes: flange, outer tube, water inlet bearing gland, water inlet rolling bearing, water inlet dynamic sealing
Circle, insulating part, water inlet rotational support housing, dynamic sealing shaft and water inlet；The flange and the outer tube, the dynamic sealing turn
Axis is welded and fixed, and the flange is fixedly connected with the cathode block, and the water inlet is connected to the cathode block inner cavity；Institute
State outer tube and be set in dynamic sealing shaft periphery, and be arranged and rotated synchronously on the water inlet rolling bearing, by it is described into
Hydrodynamic(al) sealing ring carries out rotary seal；It is set on the vacuum cavity bottom plate outside the water inlet rotational support, the water inlet
Rolling bearing is fixed on outside the water inlet rotational support by the water inlet bearing gland and is put on, and the water inlet rotational support
Insulating part is provided between housing and the vacuum cavity；The water inlet is arranged in water inlet rotational support housing side,
And inlet opening corresponding with the water inlet is circumferentially offered on the outer tube wall, the inlet opening and water inlet connect
It is logical；The gap of the outer tube and the dynamic sealing shaft forms cavity and constitutes water inlet flow channel；It is annularly distributed on the flange
Flange inlet opening, the flange inlet opening are correspondingly arranged with the cathode block water inlet, the water inlet by the inlet opening,
The water inlet flow channel, the flange inlet opening, the cathode block water inlet are connected to the cathode block cavity；
The water outlet rotational sealing structure includes: fixed bracket, water outlet rotational support housing, water outlet bearing gland, water outlet, goes out
Water rolling bearing, water outlet dynamic seal ring and extraction electrode；Water outlet rotational support housing side is provided with water outlet, and institute
Water outlet rotational support housing is stated to be fixedly connected by the fixed bracket with the water inlet rotational support housing；The water outlet rotation
The water outlet rolling bearing is fixed on outside the water outlet rotational support and puts on by bearing gland；The dynamic sealing shaft is arranged in institute
It states on water outlet rolling bearing, and rotary seal is carried out by the water outlet dynamic seal ring；It is opened in the dynamic sealing shaft along axial direction
Equipped with outlet passage, and dynamic sealing shaft side circumferentially offers apopore corresponding with the water outlet, described
Flange center offers flange apopore, and the water outlet passes through the apopore, the outlet passage, flange water outlet
Hole, the cathode block water outlet, the overflow outlet pipe are connected to the cathode block inner cavity；
The driving device includes: synchronous belt, dynamic sealing shaft synchronizing wheel, motor drum in-phase, stepper motor and stepper motor branch
Frame；Wherein the stepper motor is fixed on the vacuum cavity bottom by stepping motor bracket；The dynamic sealing shaft is synchronous
Wheel is connect with the dynamic sealing rotating shaft transmission；The stepper motor and the motor drum in-phase are sequentially connected, and the motor
Synchronizing wheel is sequentially connected by the synchronous belt and the dynamic sealing shaft synchronizing wheel.
2. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter according to claim 1,
It is characterized in that, the unplated piece support device includes: unplated piece support frame and unplated piece support plate；The wherein unplated piece support
Plate is mounted at the top of the unplated piece support frame.
3. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter according to claim 2,
It being characterized in that, the cathode block is the cuboid slot with chamber, and the pole the magnet S and the pole the magnet N are respectively positioned in cuboid slot,
The magnet S extremely bar shaped, the magnet N is extremely annular, and the magnet N polar ring is around the pole the magnet S, and the magnet N
Gap is provided between pole and the pole the magnet S.
4. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter according to claim 3,
It is characterized in that, vacuum orifice is arranged in the vacuum cavity bottom.
5. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter according to claim 4,
Be characterized in that, between the sputtering target material and the cathode block, between the insulating part and the vacuum cavity, the insulating part
Between the water inlet rotational support housing, between flange inlet opening outer rim and the cathode block, the flange apopore
Sealing ring is provided between outer rim and the cathode block.
6. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter according to claim 1,
Be characterized in that, further include shielding power supply, the shielding power supply cathode and the cathode are electrically connected, the shielding power supply anode with
The vacuum cavity is electrically connected.
7. a kind of vacuum magnetron sputtering coating film device for preparing gradual change neutral-density filter according to claim 6,
Be characterized in that, the water inlet and the inlet opening, the water inlet flow channel, the flange inlet opening, the cathode block water inlet,
The overflow outlet pipe, the cathode block water outlet, the flange apopore, the outlet passage, the apopore, it is described go out
The mouth of a river constitutes circulating cooling water route.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810094965.XA CN110093589B (en) | 2018-01-31 | 2018-01-31 | Vacuum magnetron sputtering coating device for preparing graded neutral density filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810094965.XA CN110093589B (en) | 2018-01-31 | 2018-01-31 | Vacuum magnetron sputtering coating device for preparing graded neutral density filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110093589A true CN110093589A (en) | 2019-08-06 |
| CN110093589B CN110093589B (en) | 2023-10-20 |
Family
ID=67442040
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810094965.XA Active CN110093589B (en) | 2018-01-31 | 2018-01-31 | Vacuum magnetron sputtering coating device for preparing graded neutral density filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110093589B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113249699A (en) * | 2021-05-13 | 2021-08-13 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030026014A1 (en) * | 2001-07-27 | 2003-02-06 | Nidec Copal Corporation | ND filter having composite PVD film of metal and its oxide |
| JP2009001889A (en) * | 2007-06-25 | 2009-01-08 | Nisca Corp | Film deposition method for neutral density filter, neutral density filter using the same, and image pick-up light quantity diaphragm device |
| US20100259824A1 (en) * | 2009-04-14 | 2010-10-14 | Mitsuhashi Seiji | Nd filter and television camera, and manufacturing method of nd filter |
| CN104049291A (en) * | 2014-06-23 | 2014-09-17 | 孙义昌 | Neutral grey level ND filter of multiple film layers and manufacturing method thereof |
| CN105607173A (en) * | 2016-01-07 | 2016-05-25 | 西安工业大学 | Circular radial-gradient neutral density filter and preparation method and apparatus for the same |
| CN207904357U (en) * | 2018-01-31 | 2018-09-25 | 吉林大学 | A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter |
-
2018
- 2018-01-31 CN CN201810094965.XA patent/CN110093589B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030026014A1 (en) * | 2001-07-27 | 2003-02-06 | Nidec Copal Corporation | ND filter having composite PVD film of metal and its oxide |
| JP2009001889A (en) * | 2007-06-25 | 2009-01-08 | Nisca Corp | Film deposition method for neutral density filter, neutral density filter using the same, and image pick-up light quantity diaphragm device |
| US20100259824A1 (en) * | 2009-04-14 | 2010-10-14 | Mitsuhashi Seiji | Nd filter and television camera, and manufacturing method of nd filter |
| CN104049291A (en) * | 2014-06-23 | 2014-09-17 | 孙义昌 | Neutral grey level ND filter of multiple film layers and manufacturing method thereof |
| CN106168692A (en) * | 2014-06-23 | 2016-11-30 | 孙义昌 | The neutral gray scale dim light filter of a kind of stratified film and manufacture method thereof |
| CN105607173A (en) * | 2016-01-07 | 2016-05-25 | 西安工业大学 | Circular radial-gradient neutral density filter and preparation method and apparatus for the same |
| CN207904357U (en) * | 2018-01-31 | 2018-09-25 | 吉林大学 | A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113249699A (en) * | 2021-05-13 | 2021-08-13 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
| CN113249699B (en) * | 2021-05-13 | 2022-11-04 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110093589B (en) | 2023-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102578666B1 (en) | Deposition system with shield mount | |
| JPH06264234A (en) | Magnetron sputtering device and method for providing magnetic flux | |
| KR100450380B1 (en) | Thin-film formation system and thin-film formation process | |
| TWI376423B (en) | Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source | |
| JP3397799B2 (en) | Stationary magnetron sputtering cathodes used in vacuum coating equipment | |
| KR100212087B1 (en) | Sputtering apparatus | |
| TWI496927B (en) | Physical vapor deposition system, magnetron for a physical vapor deposition system, and method for operating a magnetron to provide an adjustable symmetric magnetic track | |
| CN207904357U (en) | A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter | |
| JP3515587B2 (en) | Cathode sputtering equipment | |
| CN110093589A (en) | A kind of vacuum magnetron sputtering coating film device preparing gradual change neutral-density filter | |
| WO2010037288A1 (en) | Magnetic path mechanism, magnetron sputtering cathode comprising the mechanism, and manufacturing method of the same | |
| JP2004346406A (en) | Sputtering apparatus | |
| JP2005187830A (en) | Sputtering apparatus | |
| JP2912864B2 (en) | Magnetron unit for sputtering equipment | |
| JP2000073167A (en) | Device for coating substrate in vacuum chamber | |
| JPH0925573A (en) | Sputtering apparatus | |
| JPS6247478A (en) | Planer magnetron sputtering apparatus wherein circular motion and radial motion of magnetic field are combined | |
| JP2005336520A (en) | Magnetron sputtering device | |
| JPS58133376A (en) | Magnetron bias sputtering method and device | |
| JP3054441B2 (en) | Apparatus with magnetron sputter coating method and rotating magnet cathode | |
| JP4219566B2 (en) | Sputtering equipment | |
| JP6005536B2 (en) | Plasma CVD apparatus with arc evaporation source | |
| JP3056222B2 (en) | Sputtering apparatus and sputtering method | |
| KR200493355Y1 (en) | Control System of Dispersion and Direction of Arc Ion Beam Using Magnetic Field and Plasma Surface Treatment System | |
| JP4005687B2 (en) | Magnetron apparatus and sputtering apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |