CN110077090A - A kind of production method for rub resistance anti-fingerprint overlay film - Google Patents
A kind of production method for rub resistance anti-fingerprint overlay film Download PDFInfo
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- CN110077090A CN110077090A CN201910408755.8A CN201910408755A CN110077090A CN 110077090 A CN110077090 A CN 110077090A CN 201910408755 A CN201910408755 A CN 201910408755A CN 110077090 A CN110077090 A CN 110077090A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/0007—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding involving treatment or provisions in order to avoid deformation or air inclusion, e.g. to improve surface quality
- B32B37/003—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding involving treatment or provisions in order to avoid deformation or air inclusion, e.g. to improve surface quality to avoid air inclusion
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/20—Inorganic coating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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Abstract
The invention discloses a kind of production methods for rub resistance anti-fingerprint overlay film, the following steps are included: selecting large area size substrate, for the substrate of selection need to carry out illumination and laser acquisition without damaged crack, substrate is cut, the two sides of substrate is cleaned repeatedly, substrate two sides after cleaning is without flash, it is dustless and without the grains of sand, substrate is dried, in the single side face spraying binder of substrate, adhesive transition layer, carry out the compacting and drying between transition zone and substrate, the cutting of transition handover layer, edging and cleaning, carry out magnetron sputtering and the vacuum evaporation of transition handover layer outer surface, nanometer film coating is coated under glow discharge and the effect of the principle of cathodic sputtering.This is used for the production method of rub resistance anti-fingerprint overlay film, the glassware upper outer surface is coated with one layer of nanochemistry material, product surface tension is minimized, dust and product surface contact area reduce 90%, make it have stronger hydrophobic, oil rub resistance, anti-fingerprint ability.
Description
Technical field
The present invention relates to overlay film production technical field, specially a kind of production method for rub resistance anti-fingerprint overlay film.
Background technique
Overlay film is a kind of production technology of modernization, by plating one layer of metal on the surface of glassware and plastic products
Film, so that glass and plastic products are more wear-resisting when in use, the perception for improving its service life and using, so that glass
It is gradually increased with the service performance of plastic products, so that perception degree in outer surface enhances when in use for glass and plastic products, glass
Product and the existing most common overlay film of plastic products are the metal film coated technology of czochralski method overlay film and clad type, are drawn using the external world
Power formed in glass on plastic products together with film layer structure.
However the production method of existing overlay film, it is easy to appear bubble between overlay film and glass and plastic products and corrugation is existing
As, overlay film falls off being easy to happen connection when used for a long time, production efficiency is low, while product quality is insecure, and metal covers
Membrane technology not anti-fingerprint, or not 3C client consumer group increasingly refines appearance requirement to consumption body-sensing, existing metal film coated skill
Art is no longer satisfied market to the various more and more harsh performance requirements of metal product appearance.
In view of the above-mentioned problems, being badly in need of carrying out innovative design on the basis of the production method of original overlay film.
Summary of the invention
The purpose of the present invention is to provide a kind of production methods for rub resistance anti-fingerprint overlay film, to solve above-mentioned background
Technology proposes the production method of existing overlay film, and bubble and wrinkling are easy to appear between overlay film and glass and plastic products,
Overlay film falls off being easy to happen connection when used for a long time, and production efficiency is low, while product quality is insecure, and metal film coated skill
Art not anti-fingerprint, or not 3C client consumer group increasingly refines appearance requirement to consumption body-sensing, and existing metal film coated technology is
Not the problem of not being able to satisfy various more and more harsh performance requirements of the market to metal product appearance.
To achieve the above object, the invention provides the following technical scheme: a kind of production for rub resistance anti-fingerprint overlay film
Method, comprising the following steps: substrate selection → substrate cutting, edging and cleaning → substrate drying → spraying binder was bonded
Cross layer → transition handover layer cutting, edging and cleaning → magnetron sputtering, vacuum evaporation；
Step 1: selecting large area size substrate, and the material of substrate is glass or resin and plastic, and the substrate of selection is needed
Carry out illumination and laser acquisition without damaged crack；
Step 2: cutting substrate, sanding and polishing is carried out in the cutting edge of substrate, so that corner is arc-shaped
It is smooth, the two sides of substrate is cleaned repeatedly, cleaning solution converts mixing using the detergent of 1L distilled water and 8-10ml altogether
It forms, for the substrate two sides after cleaning without flash, dustless and without the grains of sand, smoothness and cleanliness are good；
Step 3: drying substrate, and substrate is placed in dryer and is dried, without bright at substrate drying position
The drying temperature of aobvious airflow, substrate maintains between 40-50 DEG C, keeps substrate drying efficiency, while avoiding the drying of substrate
Heat waste；
Step 4: it is wider than substrate in the length of single side face spraying binder, the adhesive transition layer of substrate, transition handover layer
0.5-1cm carries out compacting and drying between transition zone and substrate to the transition zone and substrate after bonding；
Step 5: carrying out cutting, edging and the cleaning of transition handover layer, so that transition handover layer shape is identical, size phase
Deng, and the thickness of transition handover layer and substrate is equal, and the material of transition handover layer is set as tempered glass；
Step 6: joining layer for the transition after cleaning and substrate be placed in vacuum equipment, carries out transition and joins layer
The magnetron sputtering of outer surface and vacuum evaporation coat nanometer film coating, nanometer under glow discharge and the effect of the principle of cathodic sputtering
The thickness view transition handover thickness degree of overlay film determines.
Preferably, the compacting between the transition zone and substrate using rubber rollers carry out mutual extrusion so that transition zone and
Bubble and gap are not present between substrate, environment temperature selects 60-80 DEG C, while transition zone when transition zone and substrate compacting operation
Adhesive humidity between substrate between 90-95%, determine according to the thickness of transition zone and substrate by the regulation of temperature and humidity
Fixed, temperature is excessively high to will cause transition zone and substrate bending deformation and chap, and temperature is too low, so that transition zone and substrate bonding are not
Jail, junction can generate gap and bubble, influence the bonding of transition zone and substrate.
Preferably, the cleaning of the transition handover layer, remaining cleaning solution when using substrate individually cleaning, transition handover
The outer of layer avoids cleaning repeatedly, and viewing cannot have flash and dust and crack under illumination condition, while transition joins layer
Cleaning duration no more than 10min, the cleaning of transition handover layer needs to clean using discontinuity, avoids transition handover layer and base
Plate connection loosens.
Preferably, the outer surface overlay film of the transition handover layer need to pass through enough hydrogen in advance, be discharged in vacuum equipment
Air reduces the additional air content in vacuum equipment, is recycled, can also lead to the prior hydrogen imported in equipment
Cross the foreign gas improved in background vacuum removing equipment.
Preferably, the overlay film raw material that the magnetron sputtering uses is magnetic film system SiO2+ AF material, using glow discharge,
Gas discharge is generated when adding voltage in the low density gas that vacuum degree is about one, between two motors, the high energy generated from electric discharge
Particle hits magnetic film system SiO2+ AF material fixation surface, i.e. target plate carry out magnetic so that target plate atom or molecule are projected from surface
Membrane system SiO2The work overlay film of+AF material.
Preferably, the magnetic film system SiO2The molecule and atom of the generation of+AF material deposit in vacuum equipment, point
The deposition and ion stream and sputtering raste of son and atom are proportional, and ion stream is controlled by gas pressure intensity, it is possible to pass through gas
Pressure value controls sputtering raste, improves the overlay film efficiency of transition handover layer.
Preferably, the magnetic film system SiO2+ AF material target plate hits the atom generation deposition generated and collects in transition handover
On the outer surface of layer, incident atoms are randomly dispersed on transition handover layer and form nucleus, as the gradually distribution of incident atoms increases
More, the nucleus merging that gradually contacts with each other forms a kind of retinitis structure, finally forms membrane structure in transition handover layer surface.
Compared with prior art, the beneficial effects of the present invention are: the production method for being used for rub resistance anti-fingerprint overlay film, etc.
With the dirty principle of the without water stained on its surface of lotus leaf, by the operation of magnetron sputtering plus vacuum evaporatation, according to magnetron sputtering
It is SiO2+AF material that middle glow discharge, cathodic sputtering principle, which have coated one layer of nanochemistry magnetic film system in glass outer surface, by glass
Glass surface tension minimizes, dust and glass surface interfaces product reduce 90%, make it have stronger hydrophobic, oil rub resistance,
Anti-fingerprint ability makes screen glass panel for a long time and remains bright and clean beautiful effect, at the same on glass outer surface after overlay film not
The transparency that will affect glass itself promotes the functionality and practicability of glassware.
Detailed description of the invention
Fig. 1 is production method flow diagram of the present invention；
Fig. 2 is sputtering raste of the present invention and the strong relation schematic diagram of air pressure；
Specific embodiment
It is clearly and completely described below in conjunction with the technical solution in the embodiment of the present invention, it is clear that described reality
Applying example is only a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, this field is general
Logical technical staff every other embodiment obtained without making creative work belongs to what the present invention protected
Range.
The technical scheme in the embodiments of the invention will be clearly and completely described below, it is clear that described implementation
Example is only a part of the embodiment of the present invention, instead of all the embodiments.
Embodiment one
A kind of production method for rub resistance anti-fingerprint overlay film, comprising the following steps:
Step 1: selecting large area size substrate, and the material of substrate is glass or resin and plastic, and the substrate of selection is needed
Carry out illumination and laser acquisition without damaged crack；
Step 2: cutting substrate, sanding and polishing is carried out in the cutting edge of substrate, so that corner is arc-shaped
It is smooth, the two sides of substrate is cleaned repeatedly, cleaning solution mixing converted using the detergent of 1L distilled water and 8ml altogether and
At, substrate two sides after cleaning without flash, dustless and without the grains of sand, smoothness and cleanliness are good；
Step 3: drying substrate, and substrate is placed in dryer and is dried, without bright at substrate drying position
The drying temperature of aobvious airflow, substrate maintains between 40 DEG C, keeps substrate drying efficiency, while avoiding the drying heat of substrate
Damage；
Step 4: it is wider than substrate in the length of single side face spraying binder, the adhesive transition layer of substrate, transition handover layer
0.5cm carries out compacting and drying between transition zone and substrate to the transition zone and substrate after bonding；Transition zone and substrate it
Between compacting using rubber rollers carry out mutual extrusion so that between transition zone and substrate be not present bubble and gap, transition zone and
Environment temperature selects 60 DEG C when substrate compacting operation, while the adhesive humidity between transition zone and substrate is temperature between 90%
The regulation of degree and humidity determines according to the thickness of transition zone and substrate, temperature is excessively high will cause transition zone and substrate bending deformation and
Chap, temperature is too low, so that transition zone and substrate bonding are loosely, junction can generate gap and bubble, influence transition zone and
The bonding of substrate；
Step 5: carrying out cutting, edging and the cleaning of transition handover layer, so that transition handover layer shape is identical, size phase
Deng, and the thickness of transition handover layer and substrate is equal, and the material of transition handover layer is set as tempered glass；Transition joins layer
Cleaning, remaining cleaning solution when using substrate individually cleaning, transition handover the outer of layer avoid cleaning repeatedly, in illumination item
Viewing cannot have flash and dust and crack under part, while the cleaning duration of transition handover layer, no more than 10min, transition is handed over
The cleaning for connecing layer needs to clean using discontinuity, avoids transition handover layer from connecting with substrate and loosens；
Step 6: joining layer for the transition after cleaning and substrate be placed in vacuum equipment, carries out transition and joins layer
The magnetron sputtering of outer surface and vacuum evaporation coat nanometer film coating, nanometer under glow discharge and the effect of the principle of cathodic sputtering
The thickness view transition handover thickness degree of overlay film determines；The overlay film raw material that magnetron sputtering uses is magnetic film system SiO2+ AF material uses
Glow discharge generates gas discharge when adding voltage in the low density gas that vacuum degree is about one, between two motors, from electric discharge
The energetic particle hits magnetic film system SiO of generation2+ AF material fixation surface, i.e. target plate, so that target plate atom or molecule are penetrated from surface
Out, magnetic film system SiO is carried out2The work overlay film of+AF material；Magnetic film system SiO2The molecule and atom of the generation of+AF material are set in vacuum
It being deposited for interior, the deposition and ion stream and sputtering raste of molecule and atom are proportional, and ion stream is controlled by gas pressure intensity,
So sputtering raste can be controlled by atmospheric pressure value, the overlay film efficiency of transition handover layer is improved；Magnetic film system SiO2+ AF material target plate is hit
The atom for hitting generation occurs deposition and collects on the outer surface of transition handover layer, and incident atoms are randomly dispersed on transition handover layer
Nucleus is formed, as the gradually distribution of incident atoms increases, the nucleus merging that gradually contacts with each other forms a kind of retinitis structure, most
Membrane structure is formed in transition handover layer surface eventually.
Embodiment two
A kind of production method for rub resistance anti-fingerprint overlay film, comprising the following steps:
Step 1: selecting large area size substrate, and the material of substrate is glass or resin and plastic, and the substrate of selection is needed
Carry out illumination and laser acquisition without damaged crack；
Step 2: cutting substrate, sanding and polishing is carried out in the cutting edge of substrate, so that corner is arc-shaped
It is smooth, the two sides of substrate is cleaned repeatedly, cleaning solution mixing converted using the detergent of 1L distilled water and 10ml altogether and
At, substrate two sides after cleaning without flash, dustless and without the grains of sand, smoothness and cleanliness are good；
Step 3: drying substrate, and substrate is placed in dryer and is dried, without bright at substrate drying position
The drying temperature of aobvious airflow, substrate maintains between 50 DEG C, keeps substrate drying efficiency, while avoiding the drying heat of substrate
Damage；
Step 4: it is wider than substrate in the length of single side face spraying binder, the adhesive transition layer of substrate, transition handover layer
1cm carries out compacting and drying between transition zone and substrate to the transition zone and substrate after bonding；Between transition zone and substrate
Compacting carry out mutual extrusion using rubber rollers so that bubble and gap, transition zone and base are not present between transition zone and substrate
Environment temperature selects 80 DEG C when plate compacting operation, while the adhesive humidity between transition zone and substrate is temperature between 95%
Regulation with humidity determines that temperature is excessively high to will cause transition zone and substrate bending deformation and chap according to the thickness of transition zone and substrate
It splits, temperature is too low, so that transition zone and substrate bonding are loosely, junction can generate gap and bubble, influences transition zone and base
The bonding of plate；
Step 5: carrying out cutting, edging and the cleaning of transition handover layer, so that transition handover layer shape is identical, size phase
Deng, and the thickness of transition handover layer and substrate is equal, and the material of transition handover layer is set as tempered glass；Transition joins layer
Cleaning, remaining cleaning solution when using substrate individually cleaning, transition handover the outer of layer avoid cleaning repeatedly, in illumination item
Viewing cannot have flash and dust and crack under part, while the cleaning duration of transition handover layer, no more than 10min, transition is handed over
The cleaning for connecing layer needs to clean using discontinuity, avoids transition handover layer from connecting with substrate and loosens；
Step 6: joining layer for the transition after cleaning and substrate be placed in vacuum equipment, carries out transition and joins layer
The magnetron sputtering of outer surface and vacuum evaporation coat nanometer film coating, nanometer under glow discharge and the effect of the principle of cathodic sputtering
The thickness view transition handover thickness degree of overlay film determines；The overlay film raw material that magnetron sputtering uses is magnetic film system SiO2+ AF material uses
Glow discharge generates gas discharge when adding voltage in the low density gas that vacuum degree is about one, between two motors, from electric discharge
The energetic particle hits magnetic film system SiO of generation2+ AF material fixation surface, i.e. target plate, so that target plate atom or molecule are penetrated from surface
Out, magnetic film system SiO is carried out2The work overlay film of+AF material；Magnetic film system SiO2The molecule and atom of the generation of+AF material are set in vacuum
It being deposited for interior, the deposition and ion stream and sputtering raste of molecule and atom are proportional, and ion stream is controlled by gas pressure intensity,
So sputtering raste can be controlled by atmospheric pressure value, the overlay film efficiency of transition handover layer is improved；Magnetic film system SiO2+ AF material target plate is hit
The atom for hitting generation occurs deposition and collects on the outer surface of transition handover layer, and incident atoms are randomly dispersed on transition handover layer
Nucleus is formed, as the gradually distribution of incident atoms increases, the nucleus merging that gradually contacts with each other forms a kind of retinitis structure, most
Membrane structure is formed in transition handover layer surface eventually.
Embodiment three
A kind of production method for rub resistance anti-fingerprint overlay film, comprising the following steps:
Step 1: selecting large area size substrate, and the material of substrate is glass or resin and plastic, and the substrate of selection is needed
Carry out illumination and laser acquisition without damaged crack；
Step 2: cutting substrate, sanding and polishing is carried out in the cutting edge of substrate, so that corner is arc-shaped
It is smooth, the two sides of substrate is cleaned repeatedly, cleaning solution mixing converted using the detergent of 1L distilled water and 8ml altogether and
At, substrate two sides after cleaning without flash, dustless and without the grains of sand, smoothness and cleanliness are good；
Step 3: drying substrate, and substrate is placed in dryer and is dried, without bright at substrate drying position
The drying temperature of aobvious airflow, substrate maintains between 50 DEG C, keeps substrate drying efficiency, while avoiding the drying heat of substrate
Damage；
Step 4: it is wider than substrate in the length of single side face spraying binder, the adhesive transition layer of substrate, transition handover layer
0.5cm carries out compacting and drying between transition zone and substrate to the transition zone and substrate after bonding；Transition zone and substrate it
Between compacting using rubber rollers carry out mutual extrusion so that between transition zone and substrate be not present bubble and gap, transition zone and
Environment temperature selects 80 DEG C when substrate compacting operation, while the adhesive humidity between transition zone and substrate is temperature between 90%
The regulation of degree and humidity determines according to the thickness of transition zone and substrate, temperature is excessively high will cause transition zone and substrate bending deformation and
Chap, temperature is too low, so that transition zone and substrate bonding are loosely, junction can generate gap and bubble, influence transition zone and
The bonding of substrate；
Step 5: carrying out cutting, edging and the cleaning of transition handover layer, so that transition handover layer shape is identical, size phase
Deng, and the thickness of transition handover layer and substrate is equal, and the material of transition handover layer is set as tempered glass；Transition joins layer
Cleaning, remaining cleaning solution when using substrate individually cleaning, transition handover the outer of layer avoid cleaning repeatedly, in illumination item
Viewing cannot have flash and dust and crack under part, while the cleaning duration of transition handover layer, no more than 10min, transition is handed over
The cleaning for connecing layer needs to clean using discontinuity, avoids transition handover layer from connecting with substrate and loosens；
Step 6: joining layer for the transition after cleaning and substrate be placed in vacuum equipment, carries out transition and joins layer
The magnetron sputtering of outer surface and vacuum evaporation coat nanometer film coating, nanometer under glow discharge and the effect of the principle of cathodic sputtering
The thickness view transition handover thickness degree of overlay film determines；The overlay film raw material that magnetron sputtering uses is magnetic film system SiO2+ AF material uses
Glow discharge generates gas discharge when adding voltage in the low density gas that vacuum degree is about one, between two motors, from electric discharge
The energetic particle hits magnetic film system SiO of generation2+ AF material fixation surface, i.e. target plate, so that target plate atom or molecule are penetrated from surface
Out, magnetic film system SiO is carried out2The work overlay film of+AF material；Magnetic film system SiO2The molecule and atom of the generation of+AF material are set in vacuum
It being deposited for interior, the deposition and ion stream and sputtering raste of molecule and atom are proportional, and ion stream is controlled by gas pressure intensity,
So sputtering raste can be controlled by atmospheric pressure value, the overlay film efficiency of transition handover layer is improved；Magnetic film system SiO2+ AF material target plate is hit
The atom for hitting generation occurs deposition and collects on the outer surface of transition handover layer, and incident atoms are randomly dispersed on transition handover layer
Nucleus is formed, as the gradually distribution of incident atoms increases, the nucleus merging that gradually contacts with each other forms a kind of retinitis structure, most
Membrane structure is formed in transition handover layer surface eventually.
Although the present invention is described in detail referring to the foregoing embodiments, for those skilled in the art,
It is still possible to modify the technical solutions described in the foregoing embodiments, or part of technical characteristic is carried out etc.
With replacement, all within the spirits and principles of the present invention, any modification, equivalent replacement, improvement and so on should be included in this
Within the protection scope of invention.
Claims (7)
1. a kind of production method for rub resistance anti-fingerprint overlay film, it is characterised in that: the following steps are included: substrate selection → base
Plate is cut, edging and cleaning → substrate drying → spraying binder, adhesive transition layer → transition join layer cutting, edging and cleaning
→ magnetron sputtering, vacuum evaporation；
Step 1: selecting large area size substrate, and the material of substrate is glass or resin and plastic, for the substrate of selection need into
Row illumination and laser acquisition without damaged crack；
Step 2: cutting substrate, sanding and polishing is carried out in the cutting edge of substrate, so that the arc-shaped light of corner
It is sliding, the two sides of substrate is cleaned repeatedly, cleaning solution converted altogether using the detergent of 1L distilled water and 8-10ml mix and
At, substrate two sides after cleaning without flash, dustless and without the grains of sand, smoothness and cleanliness are good；
Step 3: drying substrate, and substrate is placed in dryer and is dried, without obvious gas at substrate drying position
The drying temperature of stream circulation, substrate maintains between 40-50 DEG C, keeps substrate drying efficiency, while avoiding the drying heat waste of substrate；
Step 4: it is wider than the 0.5- of substrate in the length of single side face spraying binder, the adhesive transition layer of substrate, transition handover layer
1cm carries out compacting and drying between transition zone and substrate to the transition zone and substrate after bonding；
Step 5: carrying out cutting, edging and the cleaning of transition handover layer, so that transition handover layer shape is identical, equal in magnitude, and
Transition joins layer and the thickness of substrate is equal, and the material of transition handover layer is set as tempered glass；
Step 6: joining layer for the transition after cleaning and substrate be placed in vacuum equipment, carries out transition and joins layer appearance
The magnetron sputtering in face and vacuum evaporation coat nanometer film coating, nanometer film coating under glow discharge and the effect of the principle of cathodic sputtering
Thickness view transition handover thickness degree determine.
2. a kind of production method for rub resistance anti-fingerprint overlay film according to claim 1, it is characterised in that: the mistake
The compacting crossed between layer and substrate carries out mutual extrusion using rubber rollers, so that bubble and seam are not present between transition zone and substrate
Environment temperature selects 60-80 DEG C, while the adhesive humidity between transition zone and substrate when gap, transition zone and substrate compacting operation
Between 90-95%, the regulation of temperature and humidity determines that temperature is excessively high to will cause transition zone according to the thickness of transition zone and substrate
With substrate bending deformation and chap, temperature is too low, so that transition zone and substrate bonding are loosely, it is gentle that junction can generate gap
Bubble, influences the bonding of transition zone and substrate.
3. a kind of production method for rub resistance anti-fingerprint overlay film according to claim 1, it is characterised in that: the mistake
The cleaning of handover layer, remaining cleaning solution when using substrate individually cleaning are crossed, transition handover the outer of layer avoids cleaning repeatedly,
Viewing cannot have flash and dust and crack under illumination condition, while the cleaning duration of transition handover layer is no more than
The cleaning of 10min, transition handover layer need to clean using discontinuity, avoid transition handover layer from connecting with substrate and loosen.
4. a kind of production method for rub resistance anti-fingerprint overlay film according to claim 1, it is characterised in that: the mistake
The outer surface overlay film for crossing handover layer need to pass through enough hydrogen in advance, and the air in vacuum equipment is discharged, and reduce in vacuum equipment
Additional air content is recycled the prior hydrogen imported in equipment, can also be removed by improving background vacuum
Foreign gas in equipment.
5. a kind of production method for rub resistance anti-fingerprint overlay film according to claim 1, it is characterised in that: the magnetic
The overlay film raw material that control sputtering uses is magnetic film system SiO2+ AF material, using glow discharge, the low density gas for being about one in vacuum degree
In, gas discharge is generated when adding voltage between two motors, the energetic particle hits magnetic film system SiO generated from electric discharge2+ AF material
Expect fixation surface, i.e. target plate, so that target plate atom or molecule are projected from surface, carries out magnetic film system SiO2The work of+AF material is covered
Film.
6. a kind of production method for rub resistance anti-fingerprint overlay film according to claim 1, it is characterised in that: the magnetic
Membrane system SiO2The molecule and atom of the generation of+AF material deposit in vacuum equipment, the deposition of molecule and atom with from
Subflow and sputtering raste are proportional, and ion stream is controlled by gas pressure intensity, it is possible to control sputtering raste by atmospheric pressure value, improve
Cross the overlay film efficiency of handover layer.
7. a kind of production method for rub resistance anti-fingerprint overlay film according to claim 1, it is characterised in that: the magnetic
Membrane system SiO2+ AF material target plate hits the atom generation deposition generated and collects on the outer surface of transition handover layer, incident atoms
It is randomly dispersed on transition handover layer and forms nucleus, as the gradually distribution of incident atoms increases, nucleus gradually contacts with each other conjunction
And a kind of retinitis structure is formed, finally membrane structure is formed in transition handover layer surface.
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