CN211972140U - Wear-resistant AG + AR + AF glass - Google Patents

Abstract

The utility model discloses a wear-resisting AG + AR + AF glass, including the glass substrate, be equipped with anti-dazzle membrane, antireflection coating and prevent fingerprint membrane on it in proper order, antireflection coating includes SiO₂And Si₃N₄Layer of Si₃N₄Layer on SiO₂And an anti-fingerprint film. Said Si₃N₄The thickness of the layer is 5nm or more. The utility model discloses set up Si with antireflection coating AR's surface₃N₄Layer, making it contact with anti-fingerprint film AF, AF and Si₃N₄Is a chemical bond, Si₃N₄Has the advantages of high hardness and easy combination with AF, and greatly improves the wear resistance of AG + AR + AF glass.

Description

Wear-resistant AG + AR + AF glass

Technical Field

The utility model relates to a wear-resisting AG + AR + AF glass.

Background

Along with the development of outdoor and on-vehicle demonstration, possess simultaneously anti-glare, high printing opacity and prevent that AG + AR + AF apron of fingerprint is prepared by people's favor. But the characteristic of no wear resistance restricts the application range of AG + AR + AF.

In the existing AG + AR + AF film system structure, a new Cron RAS sputter coating machine is adopted to superpose multiple layers of Si on AG glass₃N₄And SiO₂The surface layer of the AR film system structure of (1)₂Then, as shown in FIG. 1, AF is vacuum evaporation-plated. But SiO₂The hardness of the film layer is not as good as that of glass, so that the abrasion resistance of AG + AR + AF is not as good as that of AG + AF. The core of the RAS coating technology is that the oxidation-reduction reaction in the coating process is controlled on the surface of a glass substrate, so that the adhesive force between a film layer and the substrate and the adhesive force between the film layer and the film layer can be greatly improved, the film layer can be in a micro-crystallization state, and the film layer has hardness which is incomparable with that of an evaporation coating film and a common magnetron sputtering coating film. The redox reaction is controlled on the substrate, and only the Batch type single-cavity discontinuous coating equipment can realize the redox reaction at present. Single chamber coater as shown in fig. 2, the glass substrate is rotated at high speed with the drum, and no more than one molecular layer of Si material is coated on the substrate per revolution, which can be completely nitrided/oxidized by N + or O + ions. In the continuous coating machine, glass is conveyed in a multi-cavity chamber, and each material coated by a cathode has a plurality of molecular layers (if the material is controlled within one molecular layer, the production efficiency is extremely low), so that the material cannot be completely oxidized by N + or O + ion nitrogen. Therefore, the RAS technology has low productivity and cannot be applied to high-efficiency continuous film coating lines.

In addition, there is another proposal that SiO is formed on the surface layer of AR₂The surface is added with diamond film DLC or graphite, the structure of the film system is shown in figure 3, and the purpose of ultrahard AR surface layer is realized. However, the diamond-like carbon film DLC and the graphite component are carbon, the carbon and AF cannot be combined by chemical bonds, the carbon and AF can only be physically adsorbed, and the AF is easy to fall off during friction test. The adhesion between AF and AR is poor, and the phenomena of AF shedding and AR layer damage are caused in the wear resistance test. Therefore, although AR is wear-resistant, the anti-fouling ability of the glass surface is reduced and the color is changed after AF falls off, so that the AR cannot be widely applied.

Disclosure of Invention

The utility model provides a wear-resistant AG +AR + AF glass, Si is added to the surface of AR₃N₄Film layer of Si₃N₄Has the advantages of high hardness and easy combination with AF, and greatly improves the wear resistance of AG + AR + AF glass.

The technical scheme of the utility model is, a wear-resisting AG + AR + AF glass, including the glass substrate, be equipped with anti-dazzle membrane, antireflection coating and prevent the fingerprint membrane on it in proper order, antireflection coating includes SiO₂And Si₃N₄Layer of Si₃N₄Layer on SiO₂And an anti-fingerprint film.

Further, said Si₃N₄The thickness of the layer is 5nm or more.

Further, the side of the anti-reflection film layer close to the anti-glare film is SiO₂Layer, side against anti-fingerprint film is Si₃N₄Sequentially superposing Si in the middle₃N₄Layer and SiO₂And (3) a layer.

Further, said Si except the contact with the anti-fingerprint film₃N₄Outside the layer, the rest of Si₃N₄Layer replacement by Nb₂O₅Layer, TiO₂Layer of Al₂O₃Layer or ZrO₂And (3) a layer.

In addition, said Si₃N₄The layer may be replaced with a SiC layer. Further providing stiffness. However, because of the large absorption rate of SiC and the opacity, the translucent product cannot be applied to the display area of the display screen. And SiC is not conductive, so that the coating is difficult and needs to be obtained by radio frequency sputtering.

Further, wherein SiO₂Layer replacement with MgF₂、CaF₂Or a material having a lower refractive index than the glass substrate.

The preparation method of the glass comprises the following steps:

1) arranging an anti-glare film on a glass substrate;

2) disposing an anti-reflection film on the anti-glare film, wherein Si in the anti-reflection film₃N₄Depositing the layer by adopting a reactive magnetron sputtering mode;

3) and arranging an anti-fingerprint film above the anti-reflection film to obtain the wear-resistant AG + AR + AF glass.

The utility model discloses following beneficial effect has:

1. the utility model discloses set up Si with antireflection coating AR's surface₃N₄Layer, making it contact with anti-fingerprint film AF, AF and Si₃N₄Is a chemical bond, Si₃N₄Has the advantages of high hardness and easy combination with AF, and greatly improves the wear resistance of AG + AR + AF glass.

2. The existing RAS coating technology is adopted to produce SiO on the AR surface layer₂When the layer of AG + AR + AF glass is coated, continuous coating can not be realized due to low capacity of single-cavity discontinuous coating equipment. The utility model adopts the reactive magnetron sputtering coating technology and can be used on the continuous coating equipment with high productivity. Specifically, during film coating, Ar gas is ionized into Ar + ions under the action of magnetron sputtering glow, and the Ar + ions accelerate to impact a target material with negative potential, such as a Si target; the Si target surface reacts with the introduced reaction gas (such as N) under the action of glow₂Gas) to generate Si by oxidation-reduction reaction₃N₄(ii) a Ar + ions impact Si on the surface of the Si target₃N₄Of Si₃N₄Escape the target surface and deposit onto the glass.

3. Under the same coating conditions, Si₃N₄Hardness is better than SiO₂，Si₃N₄The adhesive force is excellent under the chemical bond combination with AF; moreover, the technology provided by the utility model can be used for the continuous coating line with high productivity, and the advantages are obvious.

Drawings

FIG. 1 shows that the AR surface layer is SiO₂Structure of AG + AR + AF glass film system of layer

FIG. 2 is a schematic diagram of a single chamber coater according to the RAS coating technique mentioned in the background art.

FIG. 3 is a structural diagram of an AG + AR + AF glass film system with an ultra-hard layer added to the surface of AR.

FIG. 4 is a structural view of AG + AR + AF glass film system in example 1 of the present invention.

FIG. 5 shows AF and Si of the present invention₃N₄Schematic diagram of layer bonding.

Fig. 6 is a schematic view of a continuous coating line.

Detailed Description

The invention will be further elucidated with reference to the following examples.

Comparative example 1:

the surface layer of AR in the common AG + AR + AF glass film system structure is SiO₂And (3) a layer.

Taking 5-layer AR as an example, the concrete structure is a glass substrate, an AG film (with the glossiness of 110) and SiO₂Layer (56.07 nm), Nb₂O₅（13.31nm）、SiO₂Layer (32.8 nm), Nb₂O₅（110.97nm）SiO₂Layer (75.21 nm), AF film 10 nm.

The glass obtained had a reflection colour Y of 0.23, L of 2.12, a of-0.10 and b of-0.38.

Example 1:

in the AG + AR + AF glass film system, SiO is provided on the AR surface layer₂Layer and Si₃N₄Layer of Si₃N₄An AF layer is arranged outside the layer, and the structure is shown in figure 4.

If Si is added directly on the basis of comparative example 1₃N₄The color of the AG + AR + AF finished product is changed, so that the thickness of each layer in the film system needs to be recalculated, and the reflection color of the AG + AR + AF finished product is colorless.

The specific structure and the film layer are as follows: glass substrate, AG film (gloss 110), SiO₂Layer (23.72 nm), Nb₂O₅（14.22nm）、SiO₂Layer (31.57 nm), Nb₂O₅（111.18nm）SiO₂Layer (58.34 nm), Si₃N₄(7 nm) and an AF film of 10 nm.

The preparation method comprises the following steps:

1) arranging an anti-glare film on a glass substrate;

2) disposing an anti-reflection film on the anti-glare film, wherein Si in the anti-reflection film₃N₄Depositing the layer by adopting a reactive magnetron sputtering mode;

3) and arranging an anti-fingerprint film above the anti-reflection film to obtain the wear-resistant AG + AR + AF glass.

During preparation, a reactive magnetron sputtering coating technology is adopted, and a continuous magnetron sputtering coating line (shown in figure 6) is adopted to improve the production efficiency. The simple and cheap vacuum evaporation coating equipment and corresponding process can also be adopted, and Si3N4 particles are gasified under the action of high-heat electrons and are freely diffused and deposited on the glass.

The glass obtained had a reflection colour Y of 0.38, L of 3.42, a of-0.23 and b of-0.63.

The utility model is AF and Si₃N₄The principle diagram of layer bonding is shown in FIG. 5, in which a silicon-based material Si is used₃N₄Providing Si + bonds, AF molecules providing O-bonds, both forming stable chemical bonds.

The glasses in comparative example 1 and example 1 were subjected to a water drop angle test.

Comparative example 1 the initial angle was 114.7 °, and AF layer detachment occurred after 200 rubs; the initial angle of the glass in example 1 was 113.3 °, the water drop angle after 700 rubs was 100.7 °, the water drop angle after 800 rubs was 96.3 °, and the water drop angle after 900 rubs was 89.8 °. The wear resistance is greatly improved.

Example 2:

in AG + AR + AF glass film system, AR layer structure sets up as in proper order: nb₂O₅/SiO₂/Nb₂O₅/SiO₂/Si₃N₄(ii) a The obtained glass was subjected to a water drop angle test, the initial angle was 115 °, and the water drop angle was 93 ° after 800 rubs.

Example 3:

in AG + AR + AF glass film system, AR layer structure sets up as in proper order: nb₂O₅/SiO₂/ Si₃N₄/SiO₂/Si₃N₄(ii) a The resulting glass was subjected to a water drop angle test. The initial angle was 116 °, and the water drop angle was 99 ° after 800 rubs.

Example 4:

in AG + AR + AF glass film system, AR layer structure sets up as in proper order: si₃N₄/SiO₂/ Si₃N₄/SiO₂/Si₃N₄(ii) a The resulting glass was subjected to a water drop angle test.

In the water drop angle test, the grinding head is 2 x 2cm, the weight is 1000g, and the speed is 60 cycles/min. The initial angle was 115 °, and the water drop angle was 96 ° after 800 rubs.

Claims (5)

1. The wear-resistant AG + AR + AF glass is characterized by comprising a glass substrate, wherein an anti-glare film, an anti-reflection film and an anti-fingerprint film are sequentially arranged on the glass substrate, and the anti-reflection film comprises SiO₂And Si₃N₄Layer of Si₃N₄Layer on SiO₂And an anti-fingerprint film.

2. The glass according to claim 1, wherein: said Si₃N₄The thickness of the layer is 5nm or more.

3. The glass according to claim 1, wherein: the side of the anti-reflection film layer close to the anti-glare film is SiO₂Layer, side against anti-fingerprint film is Si₃N₄Sequentially superposing Si in the middle₃N₄Layer and SiO₂And (3) a layer.

4. The glass according to claim 3, wherein: the Si is not in contact with the anti-fingerprint film₃N₄Outside the layer, the rest of Si₃N₄Layer replacement by Nb₂O₅Layer, TiO₂Layer of Al₂O₃Layer or ZrO₂And (3) a layer.

5. The glass according to any one of claims 1 to 4, wherein: said Si₃N₄The layer is replaced with a SiC layer.

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