CN209103708U - One kind is non-to lead mirror surface display panel - Google Patents

One kind is non-to lead mirror surface display panel Download PDF

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Publication number
CN209103708U
CN209103708U CN201822033397.0U CN201822033397U CN209103708U CN 209103708 U CN209103708 U CN 209103708U CN 201822033397 U CN201822033397 U CN 201822033397U CN 209103708 U CN209103708 U CN 209103708U
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CN
China
Prior art keywords
layer
nb2o3
film layer
display panel
sio2
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Expired - Fee Related
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CN201822033397.0U
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Chinese (zh)
Inventor
樊斌杰
林百涛
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Henan Zhuojin Photoelectric Polytron Technologies Inc
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Henan Zhuojin Photoelectric Polytron Technologies Inc
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Priority to CN201822033397.0U priority Critical patent/CN209103708U/en
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Expired - Fee Related legal-status Critical Current
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Abstract

Non- mirror surface display panel is led the utility model discloses a kind of, including electronic glass substrate and in the functional film system of glass substrate surface setting, the functional film system is arranged as first layer Nb2O3 film layer, second layer Nb2O3 film layer according to glass tab surface, third layer SIO2 film layer, 4th layer of SIO2 film layer, layer 5 Nb2O3 film layer, layer 6 Nb2O3 film layer, layer 7 SIO2 film layer, 8th layer of SIO2 film layer, the 9th layer of Nb2O3 film layer, the tenth layer of Nb2O3 film layer.The utility model is superimposed the functional film system of composition using high refraction (Nb2O3) and low refraction (SIO2) nano-level thin-membrane, cancellation optical interference is completed by different thin thicknesses of layers media, to reach the high reflectance of display pannel, realizes the non-of electronic display panel and lead the effective fruit of mirror.

Description

One kind is non-to lead mirror surface display panel
Technical field
The utility model relates to electronic display panel technical field, more particularly to a kind of non-lead mirror surface display panel.
Background technique
With the rapid development of electronic science and technology, smart electronics display screen is also quickly come into people's lives and work Come, traditional electronic display panel has been difficult to meet current smart electronics display panel more due to the high thoroughly low optical characteristics such as anti- More practicabilities and higher technical requirements.Such as Intelligent bathroom mirror, smart pier glass, intelligent tutoring machine, intelligent TV set etc. It is non-conductive and to have compared with the effective fruit of the mirror of high reflectance that smart electronics display screen panel does not require nothing more than display screen panel.Cause This, the non-mirror surface display panel of leading of one kind comes into being.
Summary of the invention
Purpose of the utility model is to solve disadvantages existing in the prior art, and the non-mirror surface of leading of the one kind proposed is shown Show panel.
To achieve the goals above, the utility model adopts the technical scheme that
One kind is non-to lead mirror surface display panel, it is characterised in that: is arranged including electronic glass substrate and in glass substrate surface Functional film system, the functional film system is arranged as first layer Nb2O3 film layer, second layer Nb2O3 film according to glass substrate surface Layer, third layer SIO2 film layer, the 4th layer of SIO2 film layer, layer 5 Nb2O3 film layer, layer 6 Nb2O3 film layer, the 7th Layer SIO2 film layer, the 8th layer of SIO2 film layer, the 9th layer of Nb2O3 film layer, the tenth layer of Nb2O3 film layer.
Further, first and second layer of Nb2O3 film layer of the functional film system, sputter-deposited thin films thickness are 54 μm, sputtering Working gas Ar flow 100ml/min sputters 02 flow 150ml/min of reaction gas, background vacuum 3X10-3Pa.
Further, third and fourth layer of SIO2 film layer of the functional film system, sputter-deposited thin films thickness are 36 μm, sputtering Working gas Ar flow 150ml/min sputters 02 flow 200ml/min of reaction gas, background vacuum 3X10-3Pa.
Further, the five, the six layers of Nb2O3 film layer of the functional film system, sputter-deposited thin films thickness are 32 μm, sputtering Working gas Ar flow 100ml/min sputters 02 flow 150ml/min of reaction gas, background vacuum 3X10-3Pa.
Further, the seven, the eight layers of SIO2 film layer of the functional film system, sputter-deposited thin films thickness are 31 μm, sputtering Working gas Ar flow 150ml/min sputters 02 flow 200ml/min of reaction gas, background vacuum 2X10-3Pa.
Further, the nine, the ten layers of Nb2O3 film layer of the functional film system, sputter-deposited thin films thickness are 32 μm, sputtering Working gas Ar flow 100ml/min sputters 02 flow 150ml/min of reaction gas, background vacuum 3X10-3Pa.
Further, by the way that function series are arranged in electronic glass substrate surface, panel surface reflectivity reaches the utility model To 70% or more, it is seen that for light transmission rate less than 30%, optical characteristics is different from traditional display panel completely.
Further, the utility model realizes the mirror of display panel by the way that overlaying function membrane system is arranged in glass surface Effective fruit, by oxide membranous layer Nb2O3 and SIO2 that functional film system is deposited be it is non-lead material, also realize display simultaneously The non-property led of panel.
Compared with prior art, the utility model proposes it is a kind of it is non-lead mirror surface display panel, have the advantages that
The utility model is superimposed the functional membrane of composition using high refraction (Nb2O3) and low refraction (SIO2) nano-level thin-membrane System completes cancellation optical interference by different thin thicknesses of layers media, thus reach the high reflectance of display pannel, it is real Show the non-of electronic display panel and leads the effective fruit of mirror.
Detailed description of the invention
Fig. 1 be the utility model proposes the non-whole structural schematic diagram for leading mirror surface display panel of one kind.
In figure: 1 Nb2O3 film layer, 2 Nb2O3 film layers, 3 SIO2 film layers, 4 SIO2 film layers, 5 Nb2O3 are thin Film layer, 6 Nb2O3 film layers, 7 SIO2 film layers, 8 SIO2 film layers, 9 Nb2O3 film layers, 10 Nb2O3 film layers, 11 Electronic glass substrate.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work Every other embodiment obtained, fall within the protection scope of the utility model.
In the description of the present invention, it should be understood that term " on ", "lower", "front", "rear", "left", "right", The orientation or positional relationship of the instructions such as "top", "bottom", "inner", "outside" is to be based on the orientation or positional relationship shown in the drawings, and is only For ease of description the utility model and simplify description, rather than the device or element of indication or suggestion meaning must have it is specific Orientation, be constructed and operated in a specific orientation, therefore should not be understood as limiting the present invention.
Please refer to Fig. 1, it is a kind of non-to lead in mirror surface display panel, including electronic glass substrate attached drawing 11 and in glass substrate 11 The functional film system of surface setting, functional film system are arranged as first layer Nb2O3 film according to glass substrate surface according to 11 surface of glass substrate 1 in layer figure, 2 in second layer Nb2O3 film layer figure, 3 in third layer SIO2 film layer figure, 4 in the 4th layer of SIO2 film layer figure, layer 5 5 in Nb2O3 film layer figure, 6 in layer 6 Nb2O3 film layer figure, 7 in layer 7 SIO2 film layer figure, 8 in the 8th layer of SIO2 film layer figure, 9 in 9th layer of Nb2O3 film layer figure, 10 in the tenth layer of Nb2O3 film layer figure.
1,2 in first and second layer of Nb2O3 film layer figure of the functional film system, using MF reactive magnetron sputtering technology, work is sputtered Work is 28KW, and sputtering sedimentation thickness is 54 μm, sputters working gas Ar flow 100ml/min, and sputtering reaction gas 02 flows Measure 150ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
3,4 in third and fourth layer of SIO2 film layer figure of the functional film system, using MF reactive magnetron sputtering technology, work is sputtered Work is 22KW, and sputtering sedimentation thickness is 36 μm, sputters working gas Ar flow 150ml/min, and sputtering reaction gas 02 flows Measure 200ml/min, 220 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
5,6 in the five, the six layers of Nb2O3 film layer figure of the functional film system, using MF reactive magnetron sputtering technology, work is sputtered Work is 20KW, and sputtering sedimentation thickness is 32 μm, sputters working gas Ar flow 100ml/min, and sputtering reaction gas 02 flows Measure 150ml/min, 240 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
7,8 in the seven, the eight layers of SIO2 film layer figure of the functional film system, using MF reactive magnetron sputtering technology, work is sputtered Work is 18KW, and sputtering sedimentation thickness is 31 μm, sputters working gas Ar flow 150ml/min, and sputtering reaction gas 02 flows Measure 200ml/min, 220 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
9,10 in the nine, the ten layers of Nb2O3 film layer figure of the functional film system, using MF reactive magnetron sputtering technology, sputtering Work is 21KW, and sputtering sedimentation thickness is 32 μm, sputters working gas Ar flow 100ml/min, sputters reaction gas 02 Flow 150ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
In the utility model, in use, functional film system is arranged as first layer Nb2O3 film layer according to glass tab surface, the Two layers of Nb2O3 film layer, third layer SIO2 film layer, the 4th layer of SIO2 film layer, layer 5 Nb2O3 film layer, layer 6 Nb2O3 film layer, layer 7 SIO2 film layer, the 8th layer of SIO2 film layer, the 9th layer of Nb2O3 film layer, the tenth layer of Nb2O3 are thin Film layer.The utility model is led to using the functional film system of high refraction (Nb2O3) and low refraction (SIO2) nano-level thin-membrane superposition composition It crosses different thin thicknesses of layers media and completes cancellation optical interference, to reach the high reflectance of display pannel, realize The non-of electronic display panel leads the effective fruit of mirror.
While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art, It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.

Claims (6)

1. one kind is non-to lead mirror surface display panel, including electronic glass substrate (11) and in the functional membrane of glass substrate surface setting System, which is characterized in that it is thin that the functional film system according to electronic glass substrate surface is arranged successively first and second layer of Nb2O3 from inside to outside Film layer, third and fourth layer of SIO2 film layer, the five, the six layers of Nb2O3 film layer, the seven, the eight layers of sio2 film layer, the nine, the ten layers Nb2O3 film layer.
2. one kind according to claim 1 is non-to lead mirror surface display panel, which is characterized in that first and second layer of Nb2O3 film Layer, sputter-deposited thin films thickness is 54 μm.
3. one kind according to claim 1 is non-to lead mirror surface display panel, which is characterized in that 3. third and fourth layer of SIO2 Film layer, sputter-deposited thin films thickness are 36 μm.
4. one kind according to claim 1 is non-to lead mirror surface display panel, which is characterized in that the five, the six layers of Nb2O3 film Layer, sputter-deposited thin films thickness is 32 μm.
5. one kind according to claim 1 is non-to lead mirror surface display panel, which is characterized in that the seven, the eight layers of SIO2 film Layer, sputter-deposited thin films thickness is 31 μm.
6. one kind according to claim 1 is non-to lead mirror surface display panel, which is characterized in that the nine, the ten layers of Nb2O3 film Layer, sputter-deposited thin films thickness is 32 μm.
CN201822033397.0U 2018-12-05 2018-12-05 One kind is non-to lead mirror surface display panel Expired - Fee Related CN209103708U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201822033397.0U CN209103708U (en) 2018-12-05 2018-12-05 One kind is non-to lead mirror surface display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201822033397.0U CN209103708U (en) 2018-12-05 2018-12-05 One kind is non-to lead mirror surface display panel

Publications (1)

Publication Number Publication Date
CN209103708U true CN209103708U (en) 2019-07-12

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113655555A (en) * 2021-07-30 2021-11-16 河南卓金光电科技股份有限公司 Method for superposing functional film system of non-glare-free mirror display panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113655555A (en) * 2021-07-30 2021-11-16 河南卓金光电科技股份有限公司 Method for superposing functional film system of non-glare-free mirror display panel

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Granted publication date: 20190712

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