CN110057438A - Embedded double-layer sensitive film and preparation method for FP chamber optical fiber acoustic sensor - Google Patents

Embedded double-layer sensitive film and preparation method for FP chamber optical fiber acoustic sensor Download PDF

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CN110057438A
CN110057438A CN201910305527.8A CN201910305527A CN110057438A CN 110057438 A CN110057438 A CN 110057438A CN 201910305527 A CN201910305527 A CN 201910305527A CN 110057438 A CN110057438 A CN 110057438A
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optical fiber
layer
dura mater
mantle
sensitive film
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CN110057438B (en
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江致兴
刘滕
周俐娜
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China University of Geosciences
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01HMEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H9/00Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means
    • G01H9/004Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means using fibre optic sensors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

The present invention relates to a kind of embedded double-layer sensitive films and preparation method for FP chamber optical fiber acoustic sensor, belong to acoustic sensor technical field.FP chamber optical fiber acoustic sensor of the invention includes glass capillary, single mode optical fiber and sensitive membrane, it is wherein connected as the cross section of an annular end face of the glass capillary of FP cavity and single mode optical fiber, another annular end face of glass capillary is connected with the embedded double-layer sensitive film covered;Embedded double-layer sensitive film includes mantle and the metal dura mater for being embedded in mantle inner surface, the fiber core cross section of metal dura mater and single mode optical fiber is oppositely arranged, the diameter of metal dura mater is equal with the diameter of single mode optical fiber fiber core cross section, and the diameter of mantle is equal with the outer diameter of glass capillary annular end face.The metal dura mater that elasticity modulus is larger and reflectivity is big is embedded in the small mantle of elasticity modulus by the present invention, forms an insert structure, the sensitive membrane produced while having good deformability and reflectivity.

Description

Embedded double-layer sensitive film and preparation method for FP chamber optical fiber acoustic sensor
Technical field
The present invention relates to acoustic sensor technical field more particularly to a kind of embedding for FP chamber optical fiber acoustic sensor Formula double-layer sensitive film and preparation method.
Background technique
In recent years, with the development of optical fiber sensing technology, fiber optic sensor technology also obtains significant progress, is formed more Kind fibre optical sensor, such as optical fibre vibration sensor, optical fiber acoustic sensor, fibre optic compression sensor, fibre optic temperature sensor; Since fibre optical sensor uses optical fiber sensing technology, thus have many advantages, such as high sensitivity, electromagnetism interference, is suitable for complicated electricity The case where magnetic environment and small-signal.These fibre optical sensors use principle also there are many, such as reflected intensity formula, fiber grating Formula, Mickelson interferometer type, MZ interferometer type, Signac interferometer type and FP chamber fibre optical sensor.
In the optical fiber acoustic sensor of various principles, FP chamber optical fiber acoustic sensor because its structure is simple, high sensitivity, Demodulation method is simple and is widely studied, and forms the FP chamber optical fiber acoustic sensor of various structures.FP chamber optical fiber acoustic sensing Device is compared as a kind of novel sensor with conventional voltage capacitance sensor, have structure it is simple, it is small in size, light-weight, not by The characteristics of electromagnetic interference and being easily integrated, has micromation, integrated development trend.
The sensitive membrane of FP chamber optical fiber acoustic sensor is its key component, and the sensitivity of different structure is made based on different materials The FP chamber optical fiber acoustic sensor of film is repeatedly reported: for example, (1) Dai et al. uses single-layer graphene film as quick Feel film, combined cover the single mode optical fiber of capillary constitute FP chamber, and then FP chamber optical fiber acoustic sensor is made;Wherein use single layer Sensitive membrane elasticity modulus made of graphene film is low, but refractive index is low, higher cost and is easily damaged.(2) Majun et al. Use multi-layer graphene as sensitive membrane, the sensitive membrane made of multi-layer graphene has a high response between 0.2-22Khz, while with Graphene thickness increase, the refractive index of sensitive membrane improves but its elasticity modulus increases.(3) made using photon crystal reflecting mirror For sensitive membrane, there is high response between 10-50Khz, sensitive membrane made of photon crystal reflecting mirror has high reflectance and high resiliency The characteristics of modulus.
Existing sensitive membrane only has the characteristics that single in high reflectance or low elastic modulus, is not able to satisfy practical FP chamber light The requirement of fine acoustic sensor.
Summary of the invention
In view of this, the present invention provides a kind of embedded double-layer sensitive films and system for FP chamber optical fiber acoustic sensor Preparation Method, sensitive membrane are the metal dura mater that one layer of high reflectance is embedded on the small mantle inner surface of elasticity modulus, are had simultaneously The characteristics of springform is small and high reflectance.
The present invention provides a kind of embedded double-layer sensitive film for FP chamber optical fiber acoustic sensor, the FP chamber optical fiber sound It learns sensor to be made of glass capillary, single mode optical fiber and sensitive membrane, wherein a ring of the glass capillary as FP cavity Shape end face and the cross section of single mode optical fiber connect, and the outer diameter of annular end face and the diameter of single mode optical fiber are equal, the glass capillary Another annular end face be connected with the sensitive membrane covered;The cross-section center of single mode optical fiber and the center of sensitive membrane exist On the axis of glass capillary, two hysteroscopes of the fiber core cross section and sensitive membrane of single mode optical fiber as FP cavity, with capillary glass The axial direction of glass pipe is in 90 °, forms FP chamber interference structure.
Embedded double-layer sensitive film in the present invention includes mantle and the metal dura mater for being embedded in mantle surface, metal dura mater It being oppositely arranged with the fiber core cross section of single mode optical fiber, the diameter of metal dura mater is equal with the diameter of single mode optical fiber fiber core cross section, The diameter of mantle is equal with the outer diameter of glass capillary annular end face.
Further, the mantle is the bright and clean rubber pattern or pellosil of surfacing, and mantle is preferably made of PDMS.
Further, metal dura mater is made of gold or silver.
Further, the embedded double-layer sensitive film with a thickness of 0.5-10 μm, metal dura mater with a thickness of 10- 1000nm。
The present invention also provides a kind of preparation methods of above-mentioned embedded double-layer sensitive film, comprising the following steps:
S1, deposit layer of oxide layer is as sacrificial layer in substrate, one layer photoresist of spin coating, high-energy radiation in oxide layer Photoresist is exposed through the special pattern opened up on a mask plate, the photoetching to be changed with property after developer solution removal exposure Glue obtains the empty slot of graphics shape corresponding with mask plate, and then remaining photoresist is as exposure mask, using ICP to whole table Face performs etching, and obtains the label of corresponding figure, in oxide layer convenient for the positioning of subsequent alignment step;
S2, photoresist is coated again, offer same tag figure with mask plate same position in step S1 using another The mask plate of shape is positioned, and mask plate is also provided with circular pattern in step S2;By exposure identical with step 1, dissolution Step, forms a cylindrical body empty slot in the photoresist, is settled out one layer of metallic hard in oxide layer by electron beam evaporation technique Film;
S3, photoresist is coated around metal dura mater again, is opened using another with mask plate same position in step S1 Mask plate equipped with same tag figure is positioned, and mask plate is also provided with circular pattern, the center of circle and step in step S3 The center of circle for the circular pattern that mask plate opens up in S2 is overlapped;By exposure identical with step 1, dissolving step, in the photoresist A cylinder shape groove is formed, cylindrical body bottom portion of groove is metal dura mater;Mantle solution is filled in cylinder shape groove, in formation The mantle of engaged column dura mater;
S4, removal photoresist and substrate, are made embedded double-layer sensitive film.
Further, in step s 2, the metal dura mater by gold or silver be made, metal dura mater with a thickness of 10- 1000nm。
Further, in step s3, the mantle is made of PDMS, mantle with a thickness of 0.5-10 μm, surfacing It is bright and clean.
Compared with prior art, technical solution of the present invention has the advantage that as follows: embedded bilayer of the invention The metal dura mater that elasticity modulus is larger and reflectivity is high is embedded in the small mantle inner surface of elasticity modulus by sensitive membrane, is constituted embedded Formula laminated film, using the film as a hysteroscope of optical fiber FP cavity, when being pressurized, deformation occurs mainly in the mantle of periphery On layer, the metal hard membrane layer deformation quantity within the scope of fibre-optic mode field diameter is small, and reflectivity is high, will effectively increase light beam intracavitary Round-trip number, improve FP cavity Q value and reflectance spectrum acutance, to improve the sensitivity of sensor.
Detailed description of the invention
Attached drawing is only used for showing the purpose of specific embodiment, and is not to be construed as limiting the invention, in entire attached drawing In, identical reference symbol indicates identical component.
Fig. 1 is the perspective cross section of the FP chamber optical fiber acoustic sensor based on embedded double-layer sensitive film in the embodiment of the present invention Simplified schematic diagram;
Fig. 2 is the structural schematic diagram of embedded double-layer sensitive film in Fig. 1;
Fig. 3 (a)-Fig. 3 (k) is the production process schematic diagram that embedded double-layer sensitive film is prepared in the embodiment of the present invention.
Appended drawing reference:
1- glass capillary;2- single mode optical fiber;3- sensitive membrane;31- mantle;32- metal dura mater;4- silicon bottom;5- titanium dioxide Silicon layer;6- photoresist.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to embodiment party of the present invention Formula is further described.
The present invention provides a kind of embedded double-layer sensitive films for FP chamber optical fiber acoustic sensor, it should be noted that The FP chamber optical fiber acoustic sensor is made of glass capillary 1, single mode optical fiber 2 and sensitive membrane 3, as shown in Figure 1.Wherein it is used as FP One annular end face of the glass capillary 1 of cavity is connect with the cross section of single mode optical fiber 2, the outer diameter and single-mode optics of annular end face The diameter of fibre 2 is equal, another annular end face of the glass capillary 1 is connected with the round sensitive membrane 3 covered;Single-mode optics Fibre 2 cross-section center and sensitive membrane 3 center on the axis of glass capillary 2, the fiber core cross section of single mode optical fiber 2 and Two hysteroscopes of the sensitive membrane 3 as FP cavity, it is in 90 ° with the axial direction of glass capillary 1, form FP chamber interference structure.
Sensitive membrane 3 in the embodiment of the present invention is embedded double-layer sensitive film, including mantle 31 and is embedded in soft mode 31 The metal dura mater 32 on surface, metal dura mater 32 and the fiber core cross section of single mode optical fiber 2 are oppositely arranged, the diameter of metal dura mater 32 with The diameter of 2 fiber core cross section of single mode optical fiber is equal, and the diameter of mantle 31 is equal with the outer diameter of 1 annular end face of glass capillary.
As shown in Fig. 2, in one embodiment, the mantle 31 in the embedded double-layer sensitive film is made of PDMS, Metal dura mater 32 is made from silver, and 31 surfacing of PDMS mantle is bright and clean;The embedded double-layer sensitive film 3 being finally made with a thickness of 2.5 μm, silver metal dura mater 32 with a thickness of 400nm;The outer diameter phase of 31 diameter of PDMS mantle and 1 annular end face of glass capillary Deng, be 250 μm;The diameter of silver metal dura mater 32 is equal with the diameter of 2 fiber core cross section of single mode optical fiber, is 10 μm.
As shown in Fig. 3 (a)-Fig. 3 (k), in the embodiment of the present invention embedded double-layer sensitive film the preparation method is as follows:
(1) silicon dioxide layer 5 of one layer of 1-3um thickness is plated on silicon bottom 4 as sacrificial layer, then in silicon dioxide layer 5 Spin coating a thin layer photoresist, a mask plate is covered on thin layer photoresist, and the edge of mask plate has the label of triangle Figure;Photoresist is exposed using the triangle mark figure on UV light permeability mask plate, is melted using developer solution and is exposed Photoresist after light;Mask plate is removed, directly surface is performed etching using ICP technology, thin layer photoresist is then removed, two Triangle mark (not shown) is obtained on silicon oxide layer 5, positioning, alignment convenient for subsequent process steps, such as Fig. 3 (a) institute Show.
(2) in the triangle mark of silicon dioxide layer 5 with exterior domain, the spin coating one in silicon dioxide layer 5 using sol evenning machine The photoresist 6 of layer 1-3 μ m-thick, as shown in Fig. 3 (b).
(3) another mask plate is covered on photoresist 6, in step (3) mask plate in step (1) mask plate it is identical Position offers the marker graphic of triangle, the marker graphic of the triangle of mask plate and the three of silicon dioxide layer 5 in step (3) Corner mark alignment.
The circular hole that diameter is 10 μm is also provided in step (3) on mask plate, uses the circle on UV light permeability mask plate Hole is exposed photoresist 6, melts the photoresist 6 of intermediate exposures part using developer solution, diameter 10 is obtained in photoresist 6 μm Column groove, as shown in Fig. 3 (c).
(4) electron beam evaporation technique is utilized, in 10 μm of Column grooves of diameter, in silicon dioxide layer 5 and 10 μm of circles of diameter Outside cylinder slot, one layer of silver metal is plated on photoresist 6, silver metal layer is as metal dura mater 32, with a thickness of 400nm, such as Fig. 3 (d) institute Show.
(5) using the silver metal layer on acetone soln removal photoresist 6 and photoresist 6, it is left in silicon dioxide layer 5 Silver metal layer, as shown in Fig. 3 (e).
(6) one layer photoresist 6 of sol evenning machine spin coating, light are reused in the silicon dioxide layer 5 of step (5) and silver metal layer Photoresist 6 with a thickness of 2.5 μm, as shown in Fig. 3 (f).
(7) another mask plate is covered on photoresist 6, in step (7) mask plate in step (1) mask plate it is identical Position offers the marker graphic of triangle, the marker graphic of the triangle of mask plate and the three of silicon dioxide layer 5 in step (7) Corner mark is aligned, and is also provided with the circular hole that diameter is 250 μm, through-hole and step (3) in step (7) in step (7) on mask plate The center of circle of middle circular hole is overlapped.
Photoresist 6 is exposed using the circular hole on UV light permeability mask plate, melts intermediate exposures using developer solution Partial photoresist 6 obtains 250 μm of cylindrical body grooves of diameter in photoresist 6, and cylindrical body bottom portion of groove is silver metal layer, such as Shown in Fig. 3 (g).
(8) PDMS solution has been configured according to a certain percentage, vacuumize process is carried out to it, removes the gas in PDMS solution Bubble;Then it is spin-coated in photoresist 6, silver metal layer and silicon dioxide layer 5 using sol evenning machine, PDMS solution is made to fill cylinder In body groove, as shown in Fig. 3 (h).
(9) PDMS substrate surface was laterally scraped with flat and smooth elastomer blade, until the top table of blade and photoresist 6 Face is in contact, and extra PDMS solution is removed, and only retains the PDMS solution in photoresist 6 in cylindrical body groove, then plus Heat, PDMS solution form colloid, the mantle 31 of embedded silver metal layer are made, as shown in Fig. 3 (i).
(10) whole device is inverted and is impregnated in developer solution, extra photoresist 6 is removed, as shown in Fig. 3 (j).
(11) hydrofluoric acid dissolution silicon dioxide layer 5 is used, embedded double-layer sensitive film 3 is made, as shown in Fig. 3 (k).
In conclusion the present invention provides a kind of embedded double-layer sensitive films and system for FP chamber optical fiber acoustic sensor The metal dura mater that elasticity modulus is larger and reflectivity is high is embedded in small soft of elasticity modulus by Preparation Method, embedded double-layer sensitive film Film inner surface constitutes embedded laminated film, using the film as a hysteroscope of optical fiber FP cavity, when being pressurized, deformation master Occur on the mantle layer of periphery, the metal hard membrane layer deformation quantity within the scope of fibre-optic mode field diameter is small, and reflectivity is high, will Light beam is effectively increased in intracavitary round-trip number, the Q value and reflectance spectrum acutance of FP cavity are improved, to improve the spirit of sensor Sensitivity.
In the absence of conflict, the feature in embodiment and embodiment herein-above set forth can be combined with each other.
The foregoing is merely presently preferred embodiments of the present invention, is not intended to limit the invention, it is all in spirit of the invention and Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.

Claims (8)

1. a kind of embedded double-layer sensitive film for FP chamber optical fiber acoustic sensor, which includes hair Thin glass tube, single mode optical fiber and sensitive membrane, wherein the annular end face and single mode optical fiber of the glass capillary as FP cavity Cross section connection, the outer diameter of annular end face and the diameter of single mode optical fiber are equal, another annular end face of the glass capillary It is connected with the sensitive membrane covered;The cross-section center of single mode optical fiber and the center of sensitive membrane are in the axis of glass capillary On, two hysteroscopes of the fiber core cross section and sensitive membrane of single mode optical fiber as FP cavity are in 90 ° with the axial direction of glass capillary, Form FP chamber interference structure;It is characterized in that, the embedded double-layer sensitive film includes mantle and the gold for being embedded in mantle inner surface The fiber core cross section of category dura mater, metal dura mater and single mode optical fiber is oppositely arranged, and the diameter and single mode optical fiber fibre core of metal dura mater are horizontal The diameter in section is equal, and the diameter of mantle is equal with the outer diameter of glass capillary annular end face.
2. a kind of embedded double-layer sensitive film for FP chamber optical fiber acoustic sensor, feature exist according to claim 1 In the mantle is the bright and clean rubber pattern or pellosil of surfacing.
3. a kind of embedded double-layer sensitive film for FP chamber optical fiber acoustic sensor, feature exist according to claim 2 In the mantle is made of PDMS.
4. a kind of embedded double-layer sensitive film for FP chamber optical fiber acoustic sensor, feature exist according to claim 1 In the metal dura mater is made of gold or silver.
5. a kind of embedded double-layer sensitive film for FP chamber optical fiber acoustic sensor, feature exist according to claim 1 In, the embedded double-layer sensitive film with a thickness of 0.5-10 μm, metal dura mater with a thickness of 10-1000nm.
6. a kind of method for preparing embedded double-layer sensitive film, which comprises the following steps:
S1, layer of oxide layer is deposited in substrate as sacrificial layer, one layer photoresist of spin coating in oxide layer, high-energy radiation penetrates Special pattern exposes photoresist on one mask plate, with the photoresist that changes of property after developer solution removal exposure, obtain with The empty slot of the corresponding graphics shape of mask plate, then remaining photoresist carves whole surface using ICP as exposure mask Erosion obtains the label of corresponding figure, in oxide layer convenient for the positioning of subsequent alignment step;
S2, photoresist is coated again, offer same tag figure with mask plate same position in step S1 using another Mask plate is positioned, and mask plate is also provided with circular pattern in step S2;By exposure identical with step 1, dissolving step, A cylindrical body empty slot is formed in the photoresist, is settled out one layer of metal dura mater in oxide layer by electron beam evaporation technique;
S3, photoresist is coated around metal dura mater again, is offered using another with mask plate same position in step S1 The mask plate of same tag figure is positioned, and mask plate is also provided with circular pattern in step S3, in the center of circle and step S2 The center of circle for the circular pattern that mask plate opens up is overlapped;By exposure identical with step 1, dissolving step, formed in the photoresist One cylinder shape groove, cylindrical body bottom portion of groove are metal dura mater;Mantle solution is filled in cylinder shape groove, embedded gold is formed Belong to the mantle of dura mater;
S4, removal photoresist and substrate, are made embedded double-layer sensitive film.
7. a kind of method for preparing embedded double-layer sensitive film according to claim 6, which is characterized in that in step S2 In, the metal dura mater by gold or silver be made, metal dura mater with a thickness of 10-1000nm.
8. a kind of method for preparing embedded double-layer sensitive film according to claim 6, which is characterized in that in step S3 In, the mantle is made of PDMS, mantle with a thickness of 0.5-10 μm, surfacing is bright and clean.
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CN114659684A (en) * 2022-02-28 2022-06-24 北京航空航天大学 Low-temperature sensitive FP pressure sensor based on double-layer capillary
WO2022199637A1 (en) * 2021-03-23 2022-09-29 广东海洋大学 Optical fiber temperature sensor and sensing head structure

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