CN110044803A - A method of the measurement glass etching performance of resistance to HF - Google Patents
A method of the measurement glass etching performance of resistance to HF Download PDFInfo
- Publication number
- CN110044803A CN110044803A CN201910328279.9A CN201910328279A CN110044803A CN 110044803 A CN110044803 A CN 110044803A CN 201910328279 A CN201910328279 A CN 201910328279A CN 110044803 A CN110044803 A CN 110044803A
- Authority
- CN
- China
- Prior art keywords
- glass
- etching
- resistance
- film
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N17/00—Investigating resistance of materials to the weather, to corrosion, or to light
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Environmental Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Ecology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Biodiversity & Conservation Biology (AREA)
- Environmental & Geological Engineering (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention discloses a kind of method for measuring the glass etching performance of resistance to HF, glass surface is coated in or is sticked to using a kind of etch resistant film, protection is not etched liquid etching by the glass surface that film covers, glass is integrally put into etching solution, the glass surface for being not covered with etch resistant film is etched liquid etching, it is etched by the glass surface that etch resistant film covers since the protection of film is not etched liquid, glass taking-up is cleaned up after the completion of etching, etch resistant film is removed, use step instrument scanning glass surface, measurement has anti-corrosion engraved film to protect and protect without anti-corrosion engraved film the difference in height of glass surface, it can be concluded that the resistance to HF acid etching data in glass tin face.Solve the problems, such as that etching data in the past cannot be distinguished glass tin face and air surface.
Description
Technical field
The present invention relates to glass art, specifically a kind of method for measuring the glass etching performance of resistance to HF.
Background technique
Glass weight W of the acid of the resistance to HF performance test of glass usually using weight-loss method, before weighing etching0, glass is put into
It is etched in etching solution, takes out cleaning glass drying, weigh weight W after etching1；Weight W before etching weight W=etching0Weight after etching
Measure W1；Etched thickness H=etching weight W/ glass surface area S glass surface area S=long Lx glass of the wide Wx2+ glass of the long Lx glass of glass
The wide high Hx2 of Wx glass of the high Hx2+ glass of glass.
This weight-loss method has the disadvantage in that
1, weight-loss method etch thicknesses are shown that precision depends on the precision and linear measure longimetry of weight by weight divided by surface area reckoning
Precision；
2, float glass tin surface and the face Fei Xi chemical component have slight difference, and the resistance to HF acid etching of glass is caused also to be had any different, weightless
This difference cannot be distinguished in method.
Summary of the invention
In order to overcome existing weight-loss method measurement there are the shortcomings that, the purpose of the present invention is to provide a kind of resistance to HF etchings of glass
The measurement method of performance,.
For achieving the above object, the present invention provides a kind of method for measuring the glass etching performance of resistance to HF, including following
Step:
(1) glass sample is cut perpendicular to the different parts in float glass process direction on the glass substrate；
(2) using pure water rinsing is used after washes of absolute alcohol glass sample, the spot on glass sample surface is removed, spot shadow is prevented
Ring test result；
(3) glass short side direction is parallel to along glass middle line by half in glass tin face paste using anti-corrosion engraved film；
(4) glass short side direction is parallel to using anti-corrosion engraved film all to stick in glass air face along glass middle line；
(5) 85 DEG C of drying glass samples are cooled to 40 DEG C, are kept for 5 minutes；
(6) etching liquid volume ratio is HF:H2O=2:8 is placed on water-bath in polytetrafluoroethylene material or the container of lead matter
Interior, water bath temperature is maintained at 38 ± 2 DEG C；
(7) it will be cooled to 40 DEG C of glass sample to be put into HF etching liquid, it is ensured that glass, which all submerges in etching liquid, to be etched
10min；
(8) glass sample is taken out, after rinsing using clear water, throws off anti-corrosion engraved film；
(9) washes of absolute alcohol glass sample is used, and is dried up after being rinsed with clear water；
(10) step instrument scanning glass sample surfaces are used, measurement has anti-corrosion engraved film to protect and protects glass table without anti-corrosion engraved film
The difference in height in face obtains the resistance to HF acid etching data in glass tin face；
(11) measure the resistance to HF acid etching data in glass air face, including above-mentioned ten steps, wherein the step (3) be changed to using
Anti-corrosion engraved film is parallel to glass short side direction along glass middle line for half in glass air face paste, the step (4) be changed to using
Anti-corrosion engraved film is parallel to glass short side direction and all sticks in glass tin face along glass middle line, remaining step is same as described above, i.e.,
It can obtain the resistance to HF acid etching data in glass air face.
Further, the anti-corrosion engraved film is acid and alkali-resistance etching protective film.
Further, the anti-corrosion engraved film is the exfoliated adhesive tape of UV.
The present invention is coated in or is sticked to glass surface using a kind of film of anti-corrosion etching solution, protects the glass covered by film
Surface is not etched liquid etching, glass is integrally put into etching solution, the glass surface for being not covered with etch resistant film is etched
Liquid etching is etched by the glass surface that etch resistant film covers since the protection of film is not etched liquid, by glass after the completion of etching
Glass taking-up cleans up, and etch resistant film is removed, and using step instrument scanning glass surface, is not etched the glass of liquid etching
Apparent height is H0,The glass surface height of the liquid that is etched etching is H1。
Etch amount H=do not have etching surface height H0Etching surface height H1
Etching speed S=etch amount H/ etch period t
Compared with prior art, the present invention having the advantage that
(1) using the present invention measurement glass etching performance of resistance to HF, the etching of float glass tin surface and air surface can be detected respectively
Data solve the problems, such as that etching data in the past cannot be distinguished glass tin face and air surface；
(2) accurate tin face can be provided to client and air surface etches data, can provide accurately for TFT panel reduction process
Etching numerical value, detection data has directive significance to the reduction process of TFT panel；
(3) glass tin face and air surface after being etched by probe scanning, the glass surface curve after observation etching can analyze
The inhomogeneities of glass composition；
(4) tin is seeped to glass acid-proof alkaline by the further research for etching difference between data to glass tin face and air surface
Influence；
(5) variation of glass raw material composition can be monitored by the variation to glass etching data.
Specific embodiment
The present invention provides a kind of method for measuring the glass etching performance of resistance to HF, comprising the following steps:
(1) glass sample of 50mmx100mm specification is cut perpendicular to the different parts in float glass process direction on the glass substrate；
(2) using pure water rinsing glass is used after washes of absolute alcohol glass sample, the spot of glass surface is removed, spot shadow is prevented
Ring test result；
(3) glass short side direction half in tin face paste of the glass middle line by glass is parallel to using anti-corrosion engraved film；
(4) glass short side direction is parallel to using anti-corrosion engraved film all to stick in glass air face along glass middle line；
(5) 85 DEG C of drying glass are cooled to 40 DEG C, are kept for 5 minutes；
(6) etching liquid volume ratio: HF:H2O=2:8 is placed on water-bath in polytetrafluoroethylene material (or lead matter) container
Interior, water bath temperature is maintained at 38 ± 2 DEG C；
(7) it will be cooled to 40 DEG C of mother glass to be put into HF etching liquid, it is ensured that glass, which all submerges in etching liquid, to be etched
10min；
(8) glass takes out, and after rinsing using clear water, throws off anti-corrosion engraved film；
(9) washes of absolute alcohol glass is used, is rinsed using a large amount of clear water, is dried up；
(10) step instrument scanning glass surface is used, measurement has anti-corrosion engraved film to protect and without anti-corrosion engraved film protection glass surface
Difference in height, it can be deduced that the resistance to HF acid etching data in glass tin face；
(11) the above 1-10 step is repeated, is changed to sticking air surface into half in (3) step, be changed in (4) step by tin
It all sticks in face, it can the detection resistance to HF acid etching data in glass air face.
Wherein the etch resistant film is acid and alkali-resistance etching protective film, especially with the protective film of resistance to hydrogen-oxygen acid etching, originally
What is selected in experiment is the exfoliated adhesive tape of UV.
Claims (3)
1. a kind of method for measuring the glass etching performance of resistance to HF, comprising the following steps:
(1) glass sample is cut perpendicular to the different parts in float glass process direction on the glass substrate；
(2) using pure water rinsing is used after washes of absolute alcohol glass sample, the spot on glass sample surface is removed, spot shadow is prevented
Ring test result；
(3) glass short side direction is parallel to along glass middle line by half in glass tin face paste using anti-corrosion engraved film；
(4) glass short side direction is parallel to using anti-corrosion engraved film all to stick in glass air face along glass middle line；
(5) 85 DEG C of drying glass samples are cooled to 40 DEG C, are kept for 5 minutes；
(6) etching liquid volume ratio is HF:H2O=2:8 is placed on water-bath in polytetrafluoroethylene material or the container of lead matter
Interior, water bath temperature is maintained at 38 ± 2 DEG C；
(7) it will be cooled to 40 DEG C of glass sample to be put into HF etching liquid, it is ensured that glass, which all submerges in etching liquid, to be etched
10min；
(8) glass sample is taken out, after rinsing using clear water, throws off anti-corrosion engraved film；
(9) washes of absolute alcohol glass sample is used, and is dried up after being rinsed with clear water；
(10) step instrument scanning glass sample surfaces are used, measurement has anti-corrosion engraved film to protect and protects glass table without anti-corrosion engraved film
The difference in height in face obtains the resistance to HF acid etching data in glass tin face；
(11) measure the resistance to HF acid etching data in glass air face, including above-mentioned ten steps, wherein the step (3) be changed to using
Anti-corrosion engraved film is parallel to glass short side direction along glass middle line for half in glass air face paste, the step (4) be changed to using
Anti-corrosion engraved film is parallel to glass short side direction and all sticks in glass tin face along glass middle line, remaining step is same as described above, i.e.,
It can obtain the resistance to HF acid etching data in glass air face.
2. a kind of method for measuring the glass etching performance of resistance to HF according to claim 1, it is characterised in that；The etch resistant
Film is acid and alkali-resistance etching protective film.
3. a kind of method for measuring the glass etching performance of resistance to HF according to claim 1, it is characterised in that；The etch resistant
Film is the exfoliated adhesive tape of UV.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910328279.9A CN110044803A (en) | 2019-04-23 | 2019-04-23 | A method of the measurement glass etching performance of resistance to HF |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910328279.9A CN110044803A (en) | 2019-04-23 | 2019-04-23 | A method of the measurement glass etching performance of resistance to HF |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110044803A true CN110044803A (en) | 2019-07-23 |
Family
ID=67278677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910328279.9A Pending CN110044803A (en) | 2019-04-23 | 2019-04-23 | A method of the measurement glass etching performance of resistance to HF |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110044803A (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1614371A (en) * | 2004-10-11 | 2005-05-11 | 南京师范大学 | Pressure sensor of optical fiber micro-electromechanic system |
| CN1888859A (en) * | 2005-06-30 | 2007-01-03 | 中国科学院高能物理研究所 | Alph recoil track dating method |
| CN101548367A (en) * | 2006-12-05 | 2009-09-30 | 佳能株式会社 | Etching method for amorphous semiconductor oxide using alkaline etching solution |
| CN102015577A (en) * | 2008-04-28 | 2011-04-13 | 飞罗得陶瓷股份有限公司 | Yttria sinter and member for plasma processor |
| CN102592983A (en) * | 2012-02-07 | 2012-07-18 | 中国科学院上海技术物理研究所 | Wet etching method of Mn-Co-Ni-O thermosensitive thin film |
| CN202434478U (en) * | 2011-12-28 | 2012-09-12 | 华南理工大学 | Tray for improving uniformity of film prepared by dry etching |
| CN107907086A (en) * | 2017-11-15 | 2018-04-13 | 西安交通大学 | Chemical etching measuring method, auxiliary experiment device and the test method of optical element sub-surface damage |
| CN108802283A (en) * | 2018-06-07 | 2018-11-13 | 四川旭虹光电科技有限公司 | A kind of test method of glass baseplate surface defect direction and height |
-
2019
- 2019-04-23 CN CN201910328279.9A patent/CN110044803A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1614371A (en) * | 2004-10-11 | 2005-05-11 | 南京师范大学 | Pressure sensor of optical fiber micro-electromechanic system |
| CN1888859A (en) * | 2005-06-30 | 2007-01-03 | 中国科学院高能物理研究所 | Alph recoil track dating method |
| CN101548367A (en) * | 2006-12-05 | 2009-09-30 | 佳能株式会社 | Etching method for amorphous semiconductor oxide using alkaline etching solution |
| CN102015577A (en) * | 2008-04-28 | 2011-04-13 | 飞罗得陶瓷股份有限公司 | Yttria sinter and member for plasma processor |
| CN202434478U (en) * | 2011-12-28 | 2012-09-12 | 华南理工大学 | Tray for improving uniformity of film prepared by dry etching |
| CN102592983A (en) * | 2012-02-07 | 2012-07-18 | 中国科学院上海技术物理研究所 | Wet etching method of Mn-Co-Ni-O thermosensitive thin film |
| CN107907086A (en) * | 2017-11-15 | 2018-04-13 | 西安交通大学 | Chemical etching measuring method, auxiliary experiment device and the test method of optical element sub-surface damage |
| CN108802283A (en) * | 2018-06-07 | 2018-11-13 | 四川旭虹光电科技有限公司 | A kind of test method of glass baseplate surface defect direction and height |
Non-Patent Citations (5)
| Title |
|---|
| 刘志明: "《材料化学专业实验教程》", 30 June 2007, 东北林业大学出版社 * |
| 李文虎、艾桃桃: "《材料科学与工程专业实验教程》", 30 November 2015, 北京邮电大学出版社 * |
| 李景镇: "《光学手册（下卷）》", 31 July 2010, 陕西出版集团 陕西科学技术出版社 * |
| 王卓: ""光学材料加工亚表面损伤检测及控制关键技术研究"", 《中国优秀博硕士学位论文全文数据库(博士) 工程科技Ⅰ辑》 * |
| 肖子凡: ""高强钠钙铝硅系浮法玻璃组成、结构及性能的研究"", 《中国博士学位论文全文数据库 工程科技Ⅰ辑》 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103017713B (en) | Measuring method for damage layer thickness of optical material subsurface | |
| Pashley et al. | Surface forces in adsorbed multilayers of water on quartz | |
| CN106017385B (en) | preparation method of step height standard sample block with nominal height of 10-100 mu m | |
| Thomas et al. | Wettability of polished silicon oxide surfaces | |
| Lord et al. | Coulometric determination of submicrogram amounts of silver | |
| CN108398320A (en) | A kind of measurement method of wrought aluminium alloy tensile stress etching | |
| CN111781120B (en) | Testing method for thin film package | |
| CN105277479A (en) | Corrosion simulation method and corrosion resistance evaluation method of galvanized steel coating in sea atmospheric environment | |
| CN104062322A (en) | Humidity sensor and preparation method thereof | |
| Shewchun et al. | Ellipsometric technique for obtaining substrate optical constants | |
| CN105277478A (en) | Corrosion simulation method and corrosion resistance evaluation method of galvanized steel coating in industrial atmosphere environment | |
| CN110044803A (en) | A method of the measurement glass etching performance of resistance to HF | |
| Xia et al. | The corrosion behavior of lacquered tinplate in functional beverage | |
| RU2687312C1 (en) | Method for gravimetric determination of thickness of a superconducting layer of second-generation wire | |
| Iannuzzi | Bias Humidity Performance and Failure Mechanisms of Nonhermetic Aluminum SIC's in an Enviornment Contaminated with Cl 2 | |
| EP0990267B1 (en) | Etching method | |
| CN113484403B (en) | Method for testing trace element pollution on surface of gas dispersion component for semiconductor manufacturing | |
| Olthuis et al. | Simplified design of the coulometric sensor—actuator system by the application of a time-dependent actuator current | |
| CN103363930A (en) | Method for measuring thickness of galvanized layer on steel plate | |
| CN106370536A (en) | Measuring method of Vickers hardness of TFT liquid crystal glass substrate | |
| JP3629694B2 (en) | Silicon wafer evaluation method | |
| US4018638A (en) | Method of reducing the thickness of a wafer of fragile material | |
| CN206740608U (en) | A kind of positioning and clamping device for the detection of optical material sub-surface damage | |
| CN110763749B (en) | Method for detecting fluorine ions in acid-containing etching solution | |
| Bowman et al. | An improved high-precision calibration procedure for reference standard hydrometers |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190723 |
|
| RJ01 | Rejection of invention patent application after publication |