CN110016378A - 一种新型离子液体润滑膜的制备方法 - Google Patents

一种新型离子液体润滑膜的制备方法 Download PDF

Info

Publication number
CN110016378A
CN110016378A CN201910320087.3A CN201910320087A CN110016378A CN 110016378 A CN110016378 A CN 110016378A CN 201910320087 A CN201910320087 A CN 201910320087A CN 110016378 A CN110016378 A CN 110016378A
Authority
CN
China
Prior art keywords
methyl
film
lubricating film
ion liquid
villaumite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910320087.3A
Other languages
English (en)
Other versions
CN110016378B (zh
Inventor
朱立业
刘汉臣
杨鑫
向硕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chengdu Quality Supervision Station Of Quartermaster Energy Quality Supervision Station Of Pla Joint Logistics Support Force
Army Service Academy of PLA
Original Assignee
Chinese People's Liberation Army Chengdu Military Command Oil Supervision Department
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chinese People's Liberation Army Chengdu Military Command Oil Supervision Department filed Critical Chinese People's Liberation Army Chengdu Military Command Oil Supervision Department
Priority to CN201910320087.3A priority Critical patent/CN110016378B/zh
Publication of CN110016378A publication Critical patent/CN110016378A/zh
Application granted granted Critical
Publication of CN110016378B publication Critical patent/CN110016378B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/002Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005Spin coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0493Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C303/00Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
    • C07C303/32Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01Sulfonic acids
    • C07C309/02Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/06Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D233/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/56Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
    • C07D233/58Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M133/00Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
    • C10M133/02Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
    • C10M133/38Heterocyclic nitrogen compounds
    • C10M133/44Five-membered ring containing nitrogen and carbon only
    • C10M133/46Imidazoles
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M135/00Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing sulfur, selenium or tellurium
    • C10M135/08Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing sulfur, selenium or tellurium containing a sulfur-to-oxygen bond
    • C10M135/10Sulfonic acids or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M141/00Lubricating compositions characterised by the additive being a mixture of two or more compounds covered by more than one of the main groups C10M125/00 - C10M139/00, each of these compounds being essential
    • C10M141/08Lubricating compositions characterised by the additive being a mixture of two or more compounds covered by more than one of the main groups C10M125/00 - C10M139/00, each of these compounds being essential at least one of them being an organic sulfur-, selenium- or tellurium-containing compound
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
    • C10M2215/22Heterocyclic nitrogen compounds
    • C10M2215/223Five-membered rings containing nitrogen and carbon only
    • C10M2215/224Imidazoles
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2219/00Organic non-macromolecular compounds containing sulfur, selenium or tellurium as ingredients in lubricant compositions
    • C10M2219/04Organic non-macromolecular compounds containing sulfur, selenium or tellurium as ingredients in lubricant compositions containing sulfur-to-oxygen bonds, i.e. sulfones, sulfoxides
    • C10M2219/044Sulfonic acids, Derivatives thereof, e.g. neutral salts
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/06Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/56Boundary lubrication or thin film lubrication

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Lubricants (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

本发明公开了一种新型离子液体润滑膜的制备方法,包含如下步骤:A.以单晶硅片抛光、清洗后作为基底材料;B.离子液体合成;C.滑膜成型处理。使用本方法合成的离子液体润滑膜,能够表现出较好的抗磨减摩性能和较长的耐磨寿命。

Description

一种新型离子液体润滑膜的制备方法
技术领域
本发明涉及一种新型离子液体润滑膜的制备方法。
背景技术
微机电系(Micro-electro-mechanical Systems,简称MEMS)是微/纳米技术研究的一个重要方向,在MEMS应用中存在严重的粘着、磨损和摩擦失效等摩擦学问题,因此最大限度地降低磨损减小摩擦,是保证微/纳米装置及MEMS功能和寿命的关键。
超薄膜润滑是指通过一定的实验技术,在MEMS材料表面制备出单或多分子层的超薄膜(厚度为纳米级),可以在不降低其承载能力的情况下,显著降低表面的摩擦系数,甚至出现超滑状态,被认为MEMS中最理想的润滑手段之一。根据成膜机理的不同,已研制出以下几种类型的分子膜:自组装膜(Self-assembled monolayer)、LB膜(Langmuir-Blodgett)、分子沉积膜(Molecular deposition film)等。由于离子液体具有非常优异的摩擦学性能、良好的导电性和分子中较强的静电力,使其在润滑薄膜方面显示出了潜在的应用价值,目前离子液体作为润滑材料在宏观摩擦学范畴已广泛应用,使利用离子液体超薄膜来改善微/纳米装置及MEMS中的摩擦和粘着问题成为可能。
发明内容
本发明的目的在于提供了一种新型离子液体润滑膜的制备方法。
本发明的目的主要通过以下技术方案实现:
提供一种新型离子液体润滑膜的制备方法,其特征在于,包含如下步骤:
A.基底材料的选择
单晶硅片抛光、清洗后作为基底材料;
B.离子液体合成
b1. 加入0.1mol N-甲基咪唑,在N2气保护加入0.1mol氯代正烷烃,得到中间体1-甲基-3-烷基咪唑氯盐;
b2. 将0.1mol1-甲基-3-烷基咪唑氯盐、0.12mol九氟丁磺酸钾和200ml去离子,在40°温度下水搅拌反应24h,静置冷却后加入200ml二氯甲烷;
b3. 抽滤步骤b2的反应溶液中,静置分层,取二氯甲烷层;
b4. 使用30ml去离子水多次洗涤b3的产物,旋蒸除去二氯甲烷,置于真空干燥箱中70温度真空干燥24h,得到1-甲基-3-烷基咪唑九氟丁磺酸盐;
C.滑膜成型处理
c1. 将离子液体溶于丙酮中,配制成质量百分浓度0.25wt%的溶液;
c2. 利用匀胶机在3000rpm的转速下旋涂于处理好的单晶硅片上;
c3. 在100℃下真空干燥箱中热处理2h。
进一步的,所述1-甲基-3-烷基咪唑九氟丁磺酸盐由通式I表示:
进一步的,所述通式I中R为C4H9、C6H3和C8H17中的一种。
进一步的,所述1-甲基-3-烷基咪唑氯盐为:1-甲基-3-丁基咪唑氯盐、1-甲基-3-已基咪唑氯盐和1-辛基-3-丁基咪唑氯盐中的一种。
综上所述,本发明具有以下有益效果:使用本方法合成的离子液体与硅基底表面的结合力较弱,因此具有合适的流动性,能够表现出最好的抗磨减摩性能和最长的耐磨寿命。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚明白,下面结合实施例,对本发明作进一步的详细说明,本发明的示意性实施方式及其说明仅用于解释本发明,并不作为对本发明的限定。
实施例1:
A基底材料的处理:
对单晶硅片进行单面抛光,平整度TIR<0.5nm,厚度约为0.7mm。将单晶硅片切割成1cm×1cm的小片,分别在丙酮、无水乙醇中超声清洗10min,用二次蒸馏水将单晶硅片冼净后用氮气吹干。置入体积比为7:3的浓硫酸和30%过氧化氢的Piranha溶液中,90℃保温50min。用二次蒸馏水反复冲洗后用干燥氮气快速吹干,得到清洁的表面羟基化的单晶硅片待用。
B离子液体合成
试剂预处理:氯代烷烃,用前用浓硫酸洗涤,直至硫酸层无色,再用5% NaHCO3溶液洗三次,最后用蒸馏水洗至中性,用无水硫酸镁干燥过夜后,减压蒸馏备用;N-甲基咪唑,加入无水氯化钙干燥后减压蒸馏,密封保存备用;在避光的条件下,称量1.75g的AgNO3,用去离子水溶解,然后在容量瓶中稀释至100ml,得摩尔浓度为0.1mol/L的硝酸银溶液,于棕色瓶中保存备用。
b1. 加入0.1mol N-甲基咪唑,在N2气保护加入0.1mol氯代正烷烃,滴加完毕将烧瓶置于恒温水浴中升温至80℃,搅拌反应24h,室温静置冷却,将反应液倒入烧杯放入冰箱中冷冻2-3h,真空抽滤,将固体用乙酸乙酯清洗2-3次,置于真空干燥箱中,70℃真空干燥24h,得到中间体:1-甲基-3-丁基咪唑氯盐;
b2. 将0.1mol1-甲基-3-丁基咪唑氯盐、0.12mol九氟丁磺酸钾和200ml去离子,在40°温度下水搅拌反应24h,静置冷却后加入200ml二氯甲烷;
b3. 抽滤步骤b2的反应溶液中,静置分层,取二氯甲烷层;
b4. 使用30ml去离子水多次洗涤b3的产物,旋蒸除去二氯甲烷,置于真空干燥箱中70度真空干燥24h,得到1-甲基-3-丁基九氟丁磺酸盐。
C.滑膜成型处理
c1. 将离子液体溶于丙酮中,配制成质量百分浓度0.25wt%的溶液;
c2. 利用匀胶机在3000rpm的转速下旋涂于处理好的单晶硅片上;
c3. 在100℃下真空干燥箱中热处理2h。
1-甲基-3-丁基咪唑九氟丁磺酸盐,简写:PBS104,由下式表示:
实施例2:
A基底材料的处理:
对单晶硅片进行单面抛光,平整度TIR<0.5nm,厚度约为0.7mm。将单晶硅片切割成1cm×1cm的小片,分别在丙酮、无水乙醇中超声清洗10min,用二次蒸馏水将单晶硅片冼净后用氮气吹干。置入体积比为7:3的浓硫酸和30%过氧化氢的Piranha溶液中,90℃保温50min。用二次蒸馏水反复冲洗后用干燥氮气快速吹干,得到清洁的表面羟基化的单晶硅片待用。
B离子液体合成
试剂预处理:氯代烷烃,用前用浓硫酸洗涤,直至硫酸层无色,再用5% NaHCO3溶液洗三次,最后用蒸馏水洗至中性,用无水硫酸镁干燥过夜后,减压蒸馏备用;N-甲基咪唑,加入无水氯化钙干燥后减压蒸馏,密封保存备用;在避光的条件下,称量1.75g的AgNO3,用去离子水溶解,然后在容量瓶中稀释至100ml,得摩尔浓度为0.1mol/L的硝酸银溶液,于棕色瓶中保存备用。
b1. 加入0.1mol N-甲基咪唑,在N2气保护加入0.1mol氯代正烷烃,滴加完毕将烧瓶置于恒温水浴中升温至80℃,搅拌反应24h,室温静置冷却,将反应液倒入烧杯放入冰箱中冷冻2-3h,真空抽滤,将固体用乙酸乙酯清洗2-3次,置于真空干燥箱中,70℃真空干燥24h,得到中间体: 1-甲基-3-已基咪唑氯盐;
b2. 将0.1mol 1-甲基-3-已基咪唑氯盐、0.12mol九氟丁磺酸钾和200ml去离子,在40°温度下水搅拌反应24h,静置冷却后加入200ml二氯甲烷;
b3. 抽滤步骤b2的反应溶液中,静置分层,取二氯甲烷层;
b4. 使用30ml去离子水多次洗涤b3的产物,旋蒸除去二氯甲烷,置于真空干燥箱中70度真空干燥24h,得到1-甲基-3-已基咪唑九氟丁磺酸盐。
C.滑膜成型处理
c1. 将离子液体溶于丙酮中,配制成质量百分浓度0.25wt%的溶液;
c2. 利用匀胶机在3000rpm的转速下旋涂于处理好的单晶硅片上;
c3. 在100℃下真空干燥箱中热处理2h。
1-甲基-3-已基咪唑九氟丁磺酸盐,简写:PBS106,由下式表示:
实施例3:
A基底材料的处理:
对单晶硅片进行单面抛光,平整度TIR<0.5nm,厚度约为0.7mm。将单晶硅片切割成1cm×1cm的小片,分别在丙酮、无水乙醇中超声清洗10min,用二次蒸馏水将单晶硅片冼净后用氮气吹干。置入体积比为7:3的浓硫酸和30%过氧化氢的Piranha溶液中,90℃保温50min。用二次蒸馏水反复冲洗后用干燥氮气快速吹干,得到清洁的表面羟基化的单晶硅片待用。
B离子液体合成
b1. 加入0.1mol N-甲基咪唑,在N2气保护加入0.1mol氯代正烷烃,滴加完毕将烧瓶置于恒温水浴中升温至80℃,搅拌反应24h,室温静置冷却,将反应液倒入烧杯放入冰箱中冷冻2-3h,真空抽滤,将固体用乙酸乙酯清洗2-3次,置于真空干燥箱中,70℃真空干燥24h,得到中间体:1-辛基-3-丁基咪唑氯盐;
b2. 将0.1mol1-辛基-3-丁基咪唑氯盐、0.12mol九氟丁磺酸钾和200ml去离子,在40°温度下水搅拌反应24h,静置冷却后加入200ml二氯甲烷;
b3. 抽滤步骤b2的反应溶液中,静置分层,取二氯甲烷层;
b4. 使用30ml去离子水多次洗涤b3的产物,旋蒸除去二氯甲烷,置于真空干燥箱中70度真空干燥24h,得到1-甲基-3-辛基九氟丁磺酸盐。
C.滑膜成型处理
c1. 将离子液体溶于丙酮中,配制成质量百分浓度0.25wt%的溶液;
c2. 利用匀胶机在3000rpm的转速下旋涂于处理好的单晶硅片上;
c3. 在100℃下真空干燥箱中热处理2h。
1-甲基-3-辛基咪唑九氟丁磺酸盐,简写:PBS108,由下式表示:
对照例1:
再本对照例中离子液体采用:四氟硼酸盐,简写:LB104。
对照例2:
再本对照例中离子液体采用:双三氟甲磺酰亚胺盐离子液体,简写: LF104。
实验例1:
离子液体薄膜摩擦学性能测定在UMT-2MT摩擦试验机(CETR公司,USA)上进行。采用往复运动模式,接触形式为球-盘接触,往复行程为5mm,法向负荷80~1000mN,频率为1~3Hz。当摩擦系数升至0.50(基底的摩擦系数)时认为薄膜已被磨穿,以薄膜所经历的时间表示薄膜的耐磨寿命。上试球选用直径为3mm的GCr15(SAE 52100)钢球,试验前在丙酮中超声清洗10min。所有的测试均在室温20~25℃,相对湿度30~40%中进行。
由表可见,在200mN载荷下,各薄膜的耐磨寿命都达到3600s以上,说明经过1小时的摩擦后薄膜仍没有被磨破,但随着载荷的增加,各薄膜的耐磨寿命出现不同的变化:对于含有不同阴离子的离子液体薄膜,LB104的耐磨寿命迅速缩短,在300mN载荷下就只持续了228s,再增大载荷寿命都低于20s;LF104的耐磨寿命也明显缩短,在400mN载荷下持续了338s,再增大载荷薄膜迅速失效;PBS类离子液体薄膜表现出最长的耐磨寿命,特别是PBS104,在600mN载荷下耐磨寿命仍能达到3600s以上。对于含有不同链长的PBS类离子液体薄膜,随着链长的增加,离子液体薄膜的耐磨寿命呈现明显的降低,如在600mN下的耐磨寿命,PBS104为大于3600s,而PBS108只有806s。
实验例2:
本实验例中滑动频率为4Hz。
由表可见,随着载荷的增加,各薄膜的耐磨寿命出现不同的变化:对于含有不同阴离子的离子液体薄膜,当滑动速度增大后,LB104薄膜变得非常脆弱,耐磨寿命急剧减小,LB104薄膜在200mN载荷下只持续了470s,再增大载荷薄膜几乎在摩擦的初始阶段就被破坏;LF104薄膜的耐磨寿命也明显缩短,在300mN载荷下只能持续343s,再增大载荷薄膜迅速失效;PBS104和PBS106薄膜的耐磨寿命受滑动速度的影响相对较小,仍能表现出较长的耐磨寿命,特别是PBS104薄膜在400mN载荷下耐磨寿命仍能达到3600s以上;而PBS108薄膜的耐磨寿命受滑动速度的影响较大,其在高频高载荷下的耐磨寿命降低明显,如在载荷为600mN时,薄膜只持续了277s就被磨破,其耐磨寿命仅为低频时的1/3。
从实验例1和2的试验结果可见,PBS类离子液体与硅基底表面的结合,表现出最好的抗磨减摩性能和最长的耐磨寿命。
同时,也发现随着链长的增加PBS类离子液体薄膜的润滑效果和耐磨寿命都呈现降低的趋势,这主要是因为链长的增加,一方面使离子液体与表面的结合力进一步减弱,从而导致其很容易被完全挤出,另一方面使离子液体的粘度增大,从而导致其流动性变差,特别是当滑动速度加大时,所以PBS108薄膜的减摩抗磨效果较PBS104薄膜明显降低。
实验例3
本实验例中滑动频率为1Hz。
由表可见,LB104薄膜在80mN和100mN下的平均摩擦系数相近约为0.15,当载荷增加到200mN时,平均摩擦系数降低到0.12,并在测试时间内保持稳定。载荷继续增加到300mN时,在经历了228s后薄膜的摩擦系数突增到0.5以上,表明薄膜已经失效,再增加载荷到400mN时,薄膜在20s内迅速失效。
LF104薄膜在80mN下的平均摩擦系数为0.072,并在测定时间内保持稳定,当载荷增加到100mN和200mN时,平均摩擦系数减小到约0.051,并在测定时间内保持稳定,当载荷增加到300mN时,摩擦系数稳定保持1130s后突增到0.5以上,表明薄膜已经磨破,当载荷增加到400mN时,薄膜的耐磨寿命进一步降低到338s,再增加载荷到500mN时,薄膜在10s内立即失效。
PBS104薄膜在200mN下的平均摩擦系数为0.071,并在测定时间内保持稳定,当载荷增加到400mN和600mN时,平均摩擦系数降低到0.064和0.047,并在测定时间内保持稳定,当载荷继续增加到800mN时,平均摩擦系数增加到0.055,仍在测定时间内保持稳定,直到载荷增大到900mN时,摩擦系数稳定保持1154s后发生突变,再增加载荷到9001N时,薄膜对硅片的润滑防护作用仍然持续了854s才失效。
PBS106薄膜在200mN下的平均摩擦系数为0.084,并在测定时间内保持稳定,当载荷增加到400mN和600mN时,平均摩擦系数降低到约0.077,并在测定时间内保持稳定,当载荷继续增加到800mN时,摩擦系数稍有增加且持续1705s后发生突增,表明薄膜未能坚持到测定时间完就已经磨破了,再增加载荷到800mN时,薄膜的减摩抗磨作用仅仅持续了351s就失效。
PBS108薄膜在100mN下的平均摩擦系数为0.089,并在测定时间内保持稳定,当载荷增加到200mN和400mN时,平均摩擦系数降低到0.086和0.078,并在测定时间内保持稳定,当载荷继续增加到600mN时,摩擦系数变化不大但在经历了806秒后突增到0.5以上,表明薄膜已经磨破,再增加载荷到700mN时,薄膜在130s后迅速失效。
LB104薄膜在300mN以下具有一定的减摩作用,但摩擦系数较高,同时薄膜的承载能力较差,与LB104薄膜相比,LF104薄膜的减摩效果较好,摩擦系数较低,但承载能力依然较差。PBS104薄膜的减摩效果与LF104薄膜相当,摩擦系数稍低,但承载能力较LF104薄膜有了大幅提高,与PBS104薄膜相比,PBS106薄膜的减摩效果和承载能力都有所下降,与PBS104薄膜相比,PBS108薄膜的减摩效果和承载能力都明显下降。所以,PBS类离子液体薄膜有较好的承载能力和抗磨效果。

Claims (4)

1.一种新型离子液体润滑膜的制备方法,其特征在于,包含如下步骤:
A.基底材料的选择
单晶硅片抛光、清洗后作为基底材料;
B.离子液体合成
b1. 加入0.1mol N-甲基咪唑,在N2气保护加入0.1mol氯代正烷烃,得到中间体1-甲基-3-烷基咪唑氯盐;
b2. 将0.1mol1-甲基-3-烷基咪唑氯盐、0.12mol九氟丁磺酸钾和200ml去离子,在40度温度下水搅拌反应24h,静置冷却后加入200ml二氯甲烷;
b3. 抽滤步骤b2的反应溶液中,静置分层,取二氯甲烷层;
b4. 使用30ml去离子水多次洗涤b3的产物,旋蒸除去二氯甲烷,置于真空干燥箱中70度温度真空干燥24h,得到1-甲基-3-烷基咪唑九氟丁磺酸盐;
C.滑膜成型处理
c1. 将离子液体溶于丙酮中,配制成质量百分浓度0.25wt%的溶液;
c2. 利用匀胶机在3000rpm的转速下旋涂于处理好的单晶硅片上;
c3. 在100℃下真空干燥箱中热处理2h。
2.根据权利要求1所述的一种新型离子液体润滑膜的制备方法,其特征在于,所述1-甲基-3-烷基咪唑九氟丁磺酸盐由通式(I)表示:
3.根据权利要求2所述的一种新型离子液体润滑膜的制备方法,其特征在于,所述通式(I)中R为C4H9、C6H3和C8H17中的一种。
4.根据权利要求1所述的一种新型离子液体润滑膜的制备方法,其特征在于,所述1-甲基-3-烷基咪唑氯盐为:1-甲基-3-丁基咪唑氯盐、1-甲基-3-已基咪唑氯盐和1-辛基-3-丁基咪唑氯盐中的一种。
CN201910320087.3A 2019-04-19 2019-04-19 一种新型离子液体润滑膜的制备方法 Expired - Fee Related CN110016378B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910320087.3A CN110016378B (zh) 2019-04-19 2019-04-19 一种新型离子液体润滑膜的制备方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910320087.3A CN110016378B (zh) 2019-04-19 2019-04-19 一种新型离子液体润滑膜的制备方法

Publications (2)

Publication Number Publication Date
CN110016378A true CN110016378A (zh) 2019-07-16
CN110016378B CN110016378B (zh) 2022-03-29

Family

ID=67192002

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910320087.3A Expired - Fee Related CN110016378B (zh) 2019-04-19 2019-04-19 一种新型离子液体润滑膜的制备方法

Country Status (1)

Country Link
CN (1) CN110016378B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110172031A (zh) * 2019-05-23 2019-08-27 北京师范大学 一种阴离子型n-取代苯胺离子液体及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1778878A (zh) * 2004-11-19 2006-05-31 中国科学院兰州化学物理研究所 离子液体润滑薄膜的制备方法
CN1978600A (zh) * 2005-11-30 2007-06-13 中国科学院兰州化学物理研究所 具有纳米厚度的润滑薄膜的制备方法
US20090163394A1 (en) * 2005-12-02 2009-06-25 Kanto Denka Kogyo Co., Ltd. Ionic liquid containing phosphonium cation having p-n bond and method for producing same
WO2014067603A1 (de) * 2012-10-31 2014-05-08 Merck Patent Gmbh Salze mit trihydroperfluoralkoxybutansulfonat- oder trihydroperfluoralkoxypropansulfonat-anion
CN106543084A (zh) * 2016-09-28 2017-03-29 山东源根石油化工有限公司 一种1‑己基‑3‑甲基咪唑六氟磷酸盐离子液体的制备及含有该离子液体的难燃液压油

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1778878A (zh) * 2004-11-19 2006-05-31 中国科学院兰州化学物理研究所 离子液体润滑薄膜的制备方法
CN1978600A (zh) * 2005-11-30 2007-06-13 中国科学院兰州化学物理研究所 具有纳米厚度的润滑薄膜的制备方法
US20090163394A1 (en) * 2005-12-02 2009-06-25 Kanto Denka Kogyo Co., Ltd. Ionic liquid containing phosphonium cation having p-n bond and method for producing same
WO2014067603A1 (de) * 2012-10-31 2014-05-08 Merck Patent Gmbh Salze mit trihydroperfluoralkoxybutansulfonat- oder trihydroperfluoralkoxypropansulfonat-anion
US20150291515A1 (en) * 2012-10-31 2015-10-15 Merck Patent Gmbh Salts containing trihydroperfluoroalkoxybutanesulfonate or trihydroperfluoroalkoxypropanesulfonate anion
CN106543084A (zh) * 2016-09-28 2017-03-29 山东源根石油化工有限公司 一种1‑己基‑3‑甲基咪唑六氟磷酸盐离子液体的制备及含有该离子液体的难燃液压油

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
丁玲等: ""离子液体作为新型润滑材料的研究进展"", 《化学进展》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110172031A (zh) * 2019-05-23 2019-08-27 北京师范大学 一种阴离子型n-取代苯胺离子液体及其制备方法

Also Published As

Publication number Publication date
CN110016378B (zh) 2022-03-29

Similar Documents

Publication Publication Date Title
US11230681B2 (en) Superlubricating graphene and graphene oxide films
Zhou et al. Ionic liquid lubricants: designed chemistry for engineering applications
US7891077B2 (en) Method of preparing a polymer actuator
Phillips et al. Ionic liquid lubrication effects on ceramics in a water environment
Wang et al. Humidity dependence of tribochemical wear of monocrystalline silicon
EP3109228B1 (en) Fullerene derivative, fluororesin composition, and lubricant
US20220340834A1 (en) Super-lubricity water lubricating additive, super-lubricity water lubricant, preparation method and application
CN110016378A (zh) 一种新型离子液体润滑膜的制备方法
CN108707496A (zh) 一种高承载二维二硫化钼-二元离子液体复合润滑薄膜及制备方法
Farahati et al. Sulfonated aromatic polyamide as water-soluble polymeric corrosion inhibitor of copper in HCl
WO2005068534A1 (ja) 含フッ素ポリエーテル化合物
KR20130086248A (ko) 냉동 공조용 압축기 및 냉동 공조 장치
FR2936806A1 (fr) Fluide refrigerant
Schubert Current and future ionic liquid markets
Liu et al. 5-Methyl-1H-benzotriazole as an effective corrosion inhibitor for ultra-precision chemical mechanical polishing of bearing steel
JP2009298927A (ja) 冷凍機油、圧縮機及び冷凍サイクル装置
Fan et al. An investigation on the friction and wear properties of perfluorooctane sulfonate ionic liquids
EP4251705A2 (en) Fluorine-based solvent composition
JP2016539203A (ja) 基材にコーティングが施された物品、コーティング組成物、コーティング方法
JP5795457B2 (ja) エーテル化合物、潤滑剤、溶媒組成物および磁気ディスクの製造方法
CN1978600A (zh) 具有纳米厚度的润滑薄膜的制备方法
CN100343372C (zh) 离子液体润滑薄膜的制备方法
WO2017141775A1 (ja) イオン液体、潤滑剤及び磁気記録媒体
CN108129390A (zh) 一种咪唑类离子液体作为润滑剂的应用
JPH11131083A (ja) ポリエーテル化合物及び磁気記録媒体

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: Qingyang District of Chengdu City, Sichuan Province, 610000 West Jiaochang Hui Tong

Applicant after: Chengdu Quality Supervision Station of Quartermaster energy quality supervision station of PLA joint logistics support force

Address before: Qingyang District of Chengdu City, Sichuan Province, 610000 West Jiaochang Hui Tong

Applicant before: OIL PLANTS SUPERVISION DIVISION OF LOGISTICS DEPARTMENT, CHENGDU MILITARY REGION OF PLA

CB02 Change of applicant information
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20221111

Address after: No. 16, Ximianqiao Street, Wuhou District, Chengdu, Sichuan 610000

Patentee after: Chengdu Quality Supervision Station of Quartermaster energy quality supervision station of PLA joint logistics support force

Patentee after: PLA Army Service College

Address before: 610000 tonghuimen xijiaochang, Qingyang District, Chengdu, Sichuan

Patentee before: Chengdu Quality Supervision Station of Quartermaster energy quality supervision station of PLA joint logistics support force

TR01 Transfer of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20220329

CF01 Termination of patent right due to non-payment of annual fee