CN109994532B - Pixel defining layer, preparation method thereof, display substrate comprising pixel defining layer and display device comprising pixel defining layer - Google Patents
Pixel defining layer, preparation method thereof, display substrate comprising pixel defining layer and display device comprising pixel defining layer Download PDFInfo
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- CN109994532B CN109994532B CN201910275204.9A CN201910275204A CN109994532B CN 109994532 B CN109994532 B CN 109994532B CN 201910275204 A CN201910275204 A CN 201910275204A CN 109994532 B CN109994532 B CN 109994532B
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
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Abstract
A pixel defining layer, a method of preparing the same, and a display substrate and a display device including the same. The invention provides a pixel defining layer, comprising a dyke part for defining a plurality of pixel regions, wherein the dyke part comprises a lower part of the dyke part adjacent to a substrate and an upper part of the dyke part thereon, and a first inorganic material pattern layer and a lyophobic pattern layer formed by self-assembling a monomolecular layer on the first inorganic material pattern layer are sequentially laminated on the upper part of the dyke part; and/or a second inorganic material pattern layer and a lyophilic pattern layer formed by self-assembling a monomolecular layer on the second inorganic material pattern layer are sequentially laminated on the lower portion of the bank portion. According to the method, the inorganic material can only form a thin layer by coating and depositing a layer of inorganic material on the surface of the traditional PDL, so that the problem that the thickness of the inorganic material is too thick when different traditional materials are alternately formed into a film is solved, and the utilization rate and the capacity of equipment are improved. Meanwhile, the surface modification of the pixel defining layer is carried out through self-assembly single molecules, so that the purpose of improving the lyophilic/lyophobic performance of the surface is achieved.
Description
Technical Field
The invention relates to the technical field of display, in particular to a pixel defining layer, a preparation method thereof, a display substrate comprising the pixel defining layer and a display device comprising the pixel defining layer.
Background
In the printing process, in order to achieve the purpose of lyophilic and lyophobic on the substrate and the Pixel Definition Layer (PDL) or the purpose of lyophilic and lyophobic on the sidewall of the film forming region and the non-film forming region, the material is usually subjected to severe requirements, but in the current material, after cleaning, the contact angle is generally below 90 °, and generally can only reach 50 °.
U.S. Pat. No. 4, 6476988, 1 proposes that PDL is constructed by sequentially stacking a plurality of materials with different properties, but the process is too complex, and a photolithography step is required for preparing each layer; and requires the incorporation of a fluorine-containing plasma. The structure of different material lamination, especially the inorganic layer structure, needs to be deposited by PECVD equipment, etc., while PDL thickness is thick, and deposition needs to consume a lot of time, which affects productivity.
The most common liquid repellent treatment of surfaces today is the treatment of PDL surfaces with a fluorine-containing plasma to increase the liquid repellency of the surface. However, due to the nature of the plasma, the performance is maintained for too short a time, which may cause failure problems when exposed to longer processing or higher temperature annealing processes.
Disclosure of Invention
In order to overcome the above-mentioned disadvantages, the present invention provides a pixel defining layer, a method of preparing the same, and a display substrate including the same.
The invention provides a pixel defining layer, comprising a dyke part for defining a plurality of pixel regions, wherein the dyke part comprises a lower part of the dyke part adjacent to a substrate and an upper part of the dyke part thereon, and a first inorganic material pattern layer and a lyophobic pattern layer formed by self-assembling a monomolecular layer on the first inorganic material pattern layer are sequentially laminated on the upper part of the dyke part; and/or a second inorganic material pattern layer and a lyophilic pattern layer formed by self-assembling a monomolecular layer on the second inorganic material pattern layer are sequentially laminated on the lower portion of the bank portion.
According to an embodiment of the present invention, the first inorganic material pattern layer and the second inorganic material pattern layer are made of SiO2、SiNxAnd SiON.
According to another embodiment of the present invention, the lyophobic pattern layer is formed by self-assembly of perfluorooctyl trichlorosilane.
According to another embodiment of the present invention, the lyophilic pattern layer is formed of octadecyltrichlorosilane by a self-assembly method.
The present invention also provides a method of preparing a pixel definition layer comprising a bank defining a plurality of pixel regions, the bank comprising a lower portion of the bank immediately adjacent to a substrate and an upper portion of the bank thereon, the method comprising: forming a first inorganic material pattern layer on the upper portion of the bank; forming a lyophobic pattern layer on the first inorganic material pattern layer by self-assembling a monomolecular layer; and/or forming a second inorganic material pattern layer at a lower portion of the bank; self-assembling a monolayer on the second inorganic material pattern layer to form a lyophilic pattern layer.
According to an embodiment of the present invention, the forming the first inorganic material pattern layer includes: forming a photosensitive resin layer on a substrate; patterning the photosensitive resin layer to expose an upper portion of the bank; forming a first inorganic material pattern layer on the upper portion of the bank; and continuously patterning the photosensitive resin layer to form the lower part of the pixel defining layer bank part.
According to another embodiment of the present invention, the forming the first inorganic material pattern layer includes: forming a bank of the pixel defining layer on a substrate; coating a photoresist layer, wherein the lower part of the dyke part is embedded in the photoresist layer, and the upper part of the dyke part is exposed; forming a first inorganic material pattern layer on the upper portion of the bank; and removing the photoresist layer.
According to another embodiment of the present invention, the forming the second inorganic material pattern layer includes: forming a bank of the pixel defining layer on a substrate; forming an inorganic material layer on the surfaces of the dykes and the substrate; removing the inorganic material layer part formed on the surface of the substrate; coating a photoresist layer covering the lower portion of the bank and the second inorganic material pattern layer, exposing the upper portion of the bank and the first inorganic material pattern layer; removing the first inorganic material pattern layer; and removing the photoresist layer.
According to another embodiment of the present invention, when the lyophobic pattern layer and the lyophilic pattern layer exist at the same time, the method includes: forming a bank of the pixel defining layer on a substrate; forming an inorganic material layer on the surfaces of the dykes and the substrate; removing the inorganic material layer part formed on the surface of the substrate; coating a photoresist layer covering the lower portion of the bank and the second inorganic material pattern layer, exposing the upper portion of the bank and the first inorganic material pattern layer; forming a lyophobic pattern layer on the first inorganic material pattern layer by self-assembling a monomolecular layer; removing the photoresist layer; self-assembling a monolayer on the second inorganic material pattern layer to form a lyophilic pattern layer.
The invention also provides a display substrate and a display device comprising the pixel definition layer.
According to the method, the inorganic material can only form a thin layer by coating and depositing a layer of inorganic material on the surface of the traditional PDL, so that the problem that the thickness of the inorganic material is too thick when different traditional materials are alternately formed into a film is solved, and the utilization rate and the capacity of equipment are improved. Meanwhile, the surface modification of the pixel defining layer is carried out through self-assembly single molecules, so that the lyophilic/lyophobic performance of the surface is improved. The pixel defining layer of the invention can reach a lyophobic contact angle of 110 degrees or even more than 120 degrees after lyophobic treatment, and can reduce a lyophilic contact angle to below 30 degrees after lyophilic treatment. The self-assembled monolayer is connected based on covalent bonds, and the general cleaning step and long-time placement do not cause obvious damage to the monolayer and do not influence the lyophilic/lyophobic performance of the monolayer, so that the lyophilic/lyophobic performance of the surface treatment layer formed by the method can be maintained for a long time. Furthermore, the method of the invention adopts a photoresist protection mode in the process of constructing the monolayer structure, does not generate any damage to the surrounding circuit and other areas, and can accurately control the formation height of the monolayer. With the improvement of the resolution of the printing substrate, the super-lyophobic property of the surface layer of the non-film forming area of the pixel defining layer can enable ink drops to be accurately dripped into the pixel area.
Drawings
The above and other features and advantages of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings.
Fig. 1A to fig. 1G are schematic views illustrating a process for preparing a pixel defining layer according to an embodiment of the invention.
Fig. 2A to 2C are schematic views illustrating a process for preparing a pixel defining layer according to another embodiment of the invention.
Fig. 3A to 3G are schematic views illustrating a process for preparing a pixel defining layer according to another embodiment of the invention.
Fig. 4A to 4G are schematic views illustrating a process for preparing a pixel defining layer according to another embodiment of the invention.
Wherein the reference numerals are as follows:
11: substrate
12: embankment part
12 a: upper part of the dike
12 b: lower part of the dike
12 c: photosensitive resin layer
13: layer of inorganic material
13 a: a first inorganic material pattern layer
13 b: a second patterned layer of inorganic material
14. 14a, 14 b: photoresist layer
15: lyophobic pattern layer
16: lyophilic pattern layer
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. In the drawings, the thickness of regions and layers are exaggerated for clarity. The same reference numerals denote the same or similar structures in the drawings, and thus detailed descriptions thereof will be omitted.
It should be noted that the terms "upper" and "lower" in the present invention are only relative concepts or reference to the normal use status of the product, and should not be considered as limiting. For the same reason, the terms first, second, etc. are used for distinguishing between descriptions and not necessarily for indicating or implying relative importance.
Embodiments of a pixel defining layer, a method for manufacturing the pixel defining layer, a display substrate, and a display device according to embodiments of the present invention are described in detail below with reference to the accompanying drawings.
The thicknesses and shapes of the various layers in the drawings are not intended to reflect the true scale of the pixel-defining layers, and are merely illustrative of the present invention.
The invention modifies the surface of the pixel defining layer dyke part by self-assembly single molecules, thereby realizing lyophilic/lyophobic property of the dyke part. Specifically, fig. 1G shows an example in which the lyophobic pattern layer 15 is formed by self-assembling a monomolecular layer on the upper portion 12a of the bank. As shown in fig. 1G, the pixel defining layer includes a bank 12 defining a plurality of pixel regions, the bank 12 including a lower portion 12b of the bank adjacent to the substrate 11 and an upper portion 12a of the bank thereon, wherein the upper portion 12a of the bank is sequentially stacked with a first inorganic material pattern layer 13a and a lyophobic pattern layer 15 formed of a self-assembled monolayer on the first inorganic material pattern layer 13 a. Fig. 3G shows an example in which the lyophilic pattern layer 16 is formed by self-assembling a single-molecule layer on the lower portions 12b of the banks. As shown in fig. 3G, the lower portion 12b of the pixel defining layer bank has a second inorganic material pattern layer 13b and a lyophilic pattern layer 16 formed by self-assembling a monomolecular layer on the second inorganic material pattern layer 13b, which are sequentially stacked. Fig. 4G shows an example in which the lyophobic pattern layer 15 is formed by self-assembling the monomolecular layer on the upper portion 12a of the bank and the lyophilic pattern layer 16 is formed by self-assembling the monomolecular layer on the lower portion 12b of the bank. As shown in fig. 4G, the upper portion 12a of the bank of the pixel defining layer is sequentially stacked with a first inorganic material pattern layer 13a and a lyophobic pattern layer 15 formed by self-assembling a monomolecular layer on the first inorganic material pattern layer 13a, and the lower portion 12b of the bank is sequentially stacked with a second inorganic material pattern layer 13b and a lyophilic pattern layer 16 formed by self-assembling a monomolecular layer on the second inorganic material pattern layer 13 b.
Note that, herein, the pixel defining layer "upper portion of the bank" refers to a portion of the pixel defining layer away from the base, "the lower portion of the bank" refers to a portion of the pixel defining layer close to the substrate, and "the upper portion of the bank" and the lower portion of the bank "constitute the bank of the pixel defining layer. The upper and lower portions are not specifically limited, but are rather relative concepts that are merely used for convenience of description.
The lyophobic pattern layer 15 and the lyophilic pattern layer 16 are assembled to the corresponding positions of the surface of the bank portion through the first inorganic material pattern layer 13a and the second inorganic material pattern layer 13b, respectively. Hydroxyl (-OH) groups on the surfaces of the first and second inorganic material pattern layers 13a and 13b form covalent bonds with functional groups in the lyophobic or lyophilic organic compound to achieve self-assembly of the monolayer. Alternatively, the first inorganic material pattern layer 13a and the second inorganic material pattern layer 13b are made of SiO2、SiNxAnd SiON. The organic compound forming the lyophobic pattern layer 15 may be, but not limited to, per-fluoro octyl trichlorosilane self-assembly formation. After the surface treatment, the lyophobic contact angle of the lyophobic pattern layer 15 can reach 110 degrees or even more than 120 degrees. The organic compound forming the lyophilic pattern layer 16 may be, but is not limited to, octadecyltrichlorosilane. After the surface treatment, the lyophilic contact angle of the lyophilic pattern layer 16 can be reduced to 3Below 0 deg.
The lyophobic pattern layer is formed in the non-film forming area, and the lyophilic pattern layer is formed in the film forming area, so that the height of the lyophobic pattern layer can be flexibly adjusted according to the thickness of a target device. Fig. 1A to 1G show a flow chart of a process for preparing a pixel defining layer according to an embodiment, that is, a flow chart of a process for preparing a pixel defining layer in which a lyophobic pattern layer 15 is formed on an upper portion 12a of a bank. First, a photosensitive resin layer is formed on the substrate 11, and the photosensitive resin layer is patterned to expose the upper portions 12a of the banks of the pixel defining layer and the remaining photosensitive resin layer 12c, as shown in fig. 1A. The photosensitive resin may be any photosensitive resin suitable for forming a pixel defining layer. The photosensitive resin layer is patterned by exposure, development, and the like.
A layer 13 of inorganic material, typically an oxide or nitride of Si, such as SiO, is then deposited on the surface of the structure shown in FIG. 1A2、SiNxSiON, etc. The deposition may be by PECVD. The inorganic material layer 13 functions to provide a group that forms a covalent bond with the self-assembled organic compound. Therefore, the thickness of the inorganic material layer 13 is sufficient for the above purpose. Generally, the thickness of the film is only a thin layer, for example, about 30nm, so that good film formation can be achieved, and the thickness can be adjusted appropriately according to different processes. The structure of the deposited inorganic material layer 13 is shown in fig. 1B.
Alternatively, the structure shown in fig. 1B may also be formed in the manner shown in fig. 2A to 2C. As shown in fig. 2A, first, a bank 12 of a pixel defining layer is formed on a substrate 11. Thereafter, as shown in fig. 2B, a photoresist layer 14 is formed by spin coating a layer of photoresist in which the lower portions 12B of the banks are buried in the photoresist layer 14, exposing the upper portions 12a of the banks. Thereafter, as shown in FIG. 2C, an inorganic material layer 13 is deposited on the surface of the structure shown in FIG. 2B, thereby forming the same structure as shown in FIG. 1B.
Thereafter, the structure shown in fig. 1B or fig. 2C is processed to leave the inorganic material layer 13a formed on the surface of the bank 12a, and the inorganic material layer 13 on the surface of the photosensitive resin layer 12C or the photoresist layer 14 is removed. A specific manner may be as illustrated in fig. 1C to 1F. As shown in fig. 1C, the photoresist layer 14a is formed by spin-coating a photoresist on the photosensitive resin layer 12C or the photoresist layer 14. Thereafter, as shown in fig. 1D, the photoresist layer 14a is patterned to remove the photoresist formed on the photosensitive resin layer 12c or the inorganic material layer 13 on the surface of the photoresist layer 14, leaving the photoresist layer 14b covering the inorganic material layer 13a formed on the surface of the bank 12 a. Thereafter, the exposed inorganic material layer 13 is etched and removed to form a structure shown in fig. 1E. Finally, the photoresist layer 14b and the photosensitive resin layer 12c or the photoresist layer 14 are removed by exposure, development, or the like, to expose the lower portion 12b of the bank and the first inorganic material pattern layer 13a covering the upper portion 12a of the bank, and the resulting structure is shown in fig. 1F.
Finally, as shown in fig. 1G, a lyophobic pattern layer 15 made of a monolayer is formed by self-assembly on the first inorganic material pattern layer 13 a.
Fig. 3A to 3G are schematic views showing a flow of manufacturing a pixel defining layer according to another embodiment, that is, a flow of manufacturing a pixel defining layer in which the lyophilic pattern layer 16 is formed on the lower portion 12b of the bank. First, as shown in fig. 3A, a bank 12 of a pixel defining layer is formed on a substrate 11. Then, an inorganic material layer 13 is formed on the surface of this structure, and as shown in fig. 3B, the inorganic material layer 13 covers the surfaces of the banks 12 and the substrate 11. Thereafter, the inorganic material layer 13 formed on the surface of the substrate 11 is removed, leaving the inorganic material layer 13 formed on the surface of the bank 12. The removal method may be similar to that shown in fig. 1C to 1E, i.e., the portions to be remained (i.e., the inorganic material layer 13 formed on the surface of the bank 12) are protected by a photoresist layer, the portions to be removed (i.e., the inorganic material layer 13 formed on the surface of the substrate 11) are exposed, and then the exposed portions are removed, and the detailed steps are not described herein. The inorganic material layer 13 on the surface of the substrate 11 is removed to form the structure shown in fig. 3C.
Thereafter, the first inorganic material pattern layer 13a on the surface of the upper portion 12a of the bank portion is removed, as shown in fig. 3D to 3F. As shown in fig. 3D, the photoresist layer 14 is formed by spin-coating a layer of photoresist, wherein the lower portions 12b of the banks are buried in the photoresist layer 14, exposing the upper portions 12a of the banks. Thereafter, the first inorganic material pattern layer 13a on the surface of the upper portion 12a of the exposed bank portion is etched and removed, thereby forming the structure shown in fig. 3E. Finally, the photoresist layer 14 is removed by exposure, development, or the like, to expose the lower portion 12b of the bank portion and the second inorganic material pattern layer 13b covering thereon, resulting in a structure as shown in fig. 3F.
Finally, as shown in fig. 3G, a lyophilic pattern layer 16 composed of a monolayer is formed on the second inorganic material pattern layer 13b by self-assembly.
The lyophilic pattern layer 16 forms the lower portions 12b of the banks in this embodiment. In the process of printing the device, the surface of the lower part of the dykes for limiting the liquid film-forming area is expected to be lyophilic, and the surface of the upper part of the dykes for limiting the non-film-forming area is expected to be lyophobic, so in the process of modifying the dykes, materials with better lyophobic performance can be selected to form the dykes, and the partition of the lyophilic/lyophobic function area can be better realized through the construction mode of the pixel defining layer of the embodiment.
Fig. 4A to 4G show a flow chart of a process for preparing a pixel defining layer according to yet another embodiment, that is, a flow chart of a process for preparing a pixel defining layer in which the upper portion 12a of the bank forms the lyophobic pattern layer 15 and the lower portion 12b of the bank forms the lyophilic pattern layer 16. First, as shown in fig. 4A, a bank 12 of a pixel defining layer is formed on a substrate 11. Then, an inorganic material layer 13 is formed on the surface of this structure, and as shown in fig. 4B, the inorganic material layer 13 covers the surfaces of the banks 12 and the substrate 11. Thereafter, the inorganic material layer 13 formed on the surface of the substrate 11 is removed, leaving the inorganic material layer 13 formed on the surface of the bank 12. The removal method may be similar to that shown in fig. 1C to 1E, i.e., the portions to be remained (i.e., the inorganic material layer 13 formed on the surface of the bank 12) are protected by a photoresist layer, the portions to be removed (i.e., the inorganic material layer 13 formed on the surface of the substrate 11) are exposed, and then the exposed portions are removed, and the detailed steps are not described herein. The inorganic material layer 13 on the surface of the substrate 11 is removed to form the structure shown in fig. 4C.
Thereafter, a lyophobic pattern layer 13a formed by self-assembling a monomolecular layer on the first inorganic material pattern layer 13a on the surface of the upper portion 12a of the bank is specifically processed as shown in fig. 4D to 4E. As shown in fig. 4D, the photoresist layer 14 is formed by spin-coating a layer of photoresist, wherein the lower portions 12b of the banks are buried in the photoresist layer 14, exposing the upper portions 12a of the banks. Thereafter, the first inorganic material pattern layer 13a on the surface of the exposed upper portion 12a of the bank portion is self-assembled to form a lyophobic pattern layer 15 made of a monolayer, and the structure is as shown in fig. 4E.
Subsequently, a lyophilic pattern layer 13b formed by self-assembling a monomolecular layer on the second inorganic material pattern layer 13b on the surface of the lower portion 12b of the bank portion is specifically processed as shown in fig. 4F and 4G. First, as shown in fig. 4F, the photoresist layer 14 is removed by a process of exposure, development, or the like, exposing the lower portion 12b of the bank portion and the second inorganic material pattern layer 13b covering thereon. Thereafter, as shown in fig. 4G, a lyophilic pattern layer 16 composed of a monolayer is formed on the second inorganic material pattern layer 13b by self-assembly. In the process of self-assembling the lyophilic pattern layer, since the lyophobic pattern layer 15 has been already self-assembled on the surface of the upper portion 12a of the bank, the lyophilic monolayer is positioned and assembled on the lower region 12b of the bank and is not self-assembled on other regions.
According to the method, the inorganic material can only form a thin layer by coating and depositing a layer of inorganic material on the surface of the traditional PDL, so that the problem that the thickness of the inorganic material is too thick when different traditional materials are alternately formed into a film is solved, and the utilization rate and the capacity of equipment are improved. Meanwhile, the surface modification of the pixel defining layer is carried out through self-assembly single molecules, so that the lyophilic/lyophobic performance of the surface is improved. The pixel defining layer of the invention can reach a lyophobic contact angle of 110 degrees or even more than 120 degrees after lyophobic treatment, and can reduce a lyophilic contact angle to below 30 degrees after lyophilic treatment. The self-assembled monolayer is connected based on covalent bonds, and the general cleaning step and long-time placement do not cause obvious damage to the monolayer and do not influence the lyophilic/lyophobic performance of the monolayer, so that the lyophilic/lyophobic performance of the surface treatment layer formed by the method can be maintained for a long time. Furthermore, the method of the invention adopts a photoresist protection mode in the process of constructing the monolayer structure, does not generate any damage to the surrounding circuit and other areas, and can accurately control the formation height of the monolayer. With the improvement of the resolution of the printing substrate, the super-lyophobic property of the surface layer of the non-film forming area of the pixel defining layer can enable ink drops to be accurately dripped into the pixel area.
Optionally, an embodiment of the present invention further provides a display substrate, including the pixel defining layer. An embodiment of the present invention further provides a display device, which may include the display substrate described above, where the display device may be: any product or component with a display function, such as electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like.
The preferred embodiments of the invention disclosed above are intended to be illustrative only. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise forms disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best utilize the invention. The invention is limited only by the claims and their full scope and equivalents.
Claims (8)
1. A method of preparing a pixel definition layer comprising a bank defining a plurality of pixel regions, the bank comprising a lower portion of the bank immediately adjacent a substrate and an upper portion of the bank thereon, the method comprising:
forming a first inorganic material pattern layer on the upper portion of the bank;
forming a lyophobic pattern layer on the first inorganic material pattern layer by self-assembling a monomolecular layer; wherein the forming the first inorganic material pattern layer includes:
forming a photosensitive resin layer on a substrate;
patterning the photosensitive resin layer to expose an upper portion of the bank;
forming a first inorganic material pattern layer on the upper portion of the bank;
and continuously patterning the photosensitive resin layer to form the lower part of the pixel defining layer bank part.
2. A method of preparing a pixel definition layer comprising a bank defining a plurality of pixel regions, the bank comprising a lower portion of the bank immediately adjacent a substrate and an upper portion of the bank thereon, the method comprising:
forming a first inorganic material pattern layer on the upper portion of the bank;
forming a lyophobic pattern layer on the first inorganic material pattern layer by self-assembling a monomolecular layer;
wherein the forming the first inorganic material pattern layer includes:
forming a bank of the pixel defining layer on a substrate;
coating a photoresist layer, wherein the lower part of the dyke part is embedded in the photoresist layer, and the upper part of the dyke part is exposed;
forming a first inorganic material pattern layer on the upper portion of the bank;
and removing the photoresist layer.
3. A method of preparing a pixel definition layer comprising a bank defining a plurality of pixel regions, the bank comprising a lower portion of the bank immediately adjacent a substrate and an upper portion of the bank thereon, the method comprising:
forming a second inorganic material pattern layer on a lower portion of the bank;
self-assembling a monolayer on the second inorganic material pattern layer to form a lyophilic pattern layer;
wherein the forming of the second inorganic material pattern layer includes:
forming a bank of the pixel defining layer on a substrate;
forming an inorganic material layer on the surfaces of the dykes and the substrate;
removing the inorganic material layer part formed on the surface of the substrate;
coating a photoresist layer covering the lower portion of the bank portion and the second inorganic material pattern layer, exposing the upper portion of the bank portion and the first inorganic material pattern layer;
removing the first inorganic material pattern layer;
and removing the photoresist layer.
4. A method of preparing a pixel defining layer, the pixel defining layer comprising a bank defining a plurality of pixel regions, the bank comprising a lower portion of the bank adjacent to a substrate and an upper portion of the bank thereon, the upper portion of the bank being sequentially stacked with a first inorganic material pattern layer and a lyophobic pattern layer formed of a self-assembled monomolecular layer on the first inorganic material pattern layer; and a second inorganic material pattern layer and a lyophilic pattern layer formed by self-assembling a monomolecular layer on the second inorganic material pattern layer are sequentially stacked on the lower portion of the bank, the preparation method comprising:
forming a bank of the pixel defining layer on a substrate;
forming an inorganic material layer on the surfaces of the dykes and the substrate;
removing the inorganic material layer part formed on the surface of the substrate;
coating a photoresist layer covering the lower portion of the bank and the second inorganic material pattern layer, exposing the upper portion of the bank and the first inorganic material pattern layer;
forming a lyophobic pattern layer on the first inorganic material pattern layer by self-assembling a monomolecular layer;
removing the photoresist layer;
self-assembling a monolayer on the second inorganic material pattern layer to form a lyophilic pattern layer.
5. The method for producing a pixel defining layer according to claim 3 or 4, wherein the first inorganic material pattern layer and the second inorganic material pattern layer are made of SiO2、SiNxAnd SiON.
6. The method for producing a pixel defining layer according to claim 3 or 4, wherein the second inorganic material pattern layer is made of SiO2、SiNxAnd SiON.
7. The method of claim 1,2 or 4, wherein the lyophobic pattern layer is formed by self-assembly of perfluorooctyl trichlorosilane.
8. The method according to claim 3 or 4, wherein the lyophilic pattern layer is formed by self-assembly of octadecyltrichlorosilane.
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| JP2007508674A (en) * | 2003-10-13 | 2007-04-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Electroluminescent display panel |
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| WO2016063943A1 (en) * | 2014-10-24 | 2016-04-28 | 旭硝子株式会社 | Curable composition for partition walls, partition walls, method for producing partition walls, method for restoring partition walls, restored partition walls, and optical element |
| CN104659287A (en) * | 2015-03-12 | 2015-05-27 | 京东方科技集团股份有限公司 | Pixel defining layer and preparation method, display substrate and preparation method and display device |
| CN107123752A (en) * | 2017-05-11 | 2017-09-01 | 京东方科技集团股份有限公司 | Pixel defining layer and its manufacture method, display base plate, display device |
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