CN109888130A - The preparation method and OLED display of OLED display - Google Patents
The preparation method and OLED display of OLED display Download PDFInfo
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- CN109888130A CN109888130A CN201910093716.3A CN201910093716A CN109888130A CN 109888130 A CN109888130 A CN 109888130A CN 201910093716 A CN201910093716 A CN 201910093716A CN 109888130 A CN109888130 A CN 109888130A
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Abstract
A kind of preparation method and OLED display of OLED display, which comprises prepare nano impression grinding tool using multi-layered anode alumina formwork；One tft array substrate is provided, sets gradually OLED luminescent layer, thin-film encapsulation layer and color membrane substrates from bottom to top on the tft array substrate surface, the color membrane substrates include color film layer and the first black matrix"；First black matrix" is imprinted using the nano impression grinding tool, forms the second black matrix", the surface of second black matrix" is the cellular nano structure of recess, and OLED display is made in cooling after coining.The utility model has the advantages that the preparation method and OLED display of OLED display provided by the present invention, set the black matrix" surface on color membrane substrates to the cellular nano structure of recess, reduce the reflectivity on black matrix" surface, black matrix" is further improved to the absorption efficiency of light, further enhances contrast of the OLED display outdoors under strong light.
Description
Technical field
The present invention relates to the displays of the preparation method and OLED of field of display technology more particularly to a kind of OLED display to fill
It sets.
Background technique
Polaroid (POL) can be effectively reduced the reflectivity of display panel under strong light at present, but have lost close to 58%
Go out light.This substantially increases its service life burden for OLED；On the other hand, polaroid thickness is larger, material is crisp,
It is unfavorable for the exploitation that dynamic bends product.Product is bent in order to develop the dynamic based on OLED reality technology, it is necessary to import green wood
Material, new technology and new process substitute polaroid.The prior art can be by the thickness of functional layer from 100 using color film substitution polaroid
Micron is dropped to less than 5 microns, and can improve light emission rate to 60% from 42%.However, the panel table based on color membrane technology
Face reflectivity is difficult to be made low (7.1%), is unfavorable for outdoor display.
In conclusion existing OLED display causes since the panel surface reflectivity based on color membrane technology is excessively high
Color membrane substrates are too low to efficiency of light absorption, further reduced contrast of the OLED display outdoors under strong light.
Summary of the invention
The present invention provides a kind of preparation method of OLED display, can reduce the reflectivity on color membrane substrates surface, with
Existing OLED display is solved, since the panel surface reflectivity based on color membrane technology is excessively high, causes color membrane substrates to light
Absorption efficiency is too low, further reduced OLED display outdoors contrast under strong light the technical issues of.
To solve the above problems, technical solution provided by the invention is as follows:
The present invention provides a kind of preparation method of OLED display, which comprises
S10 prepares nano impression grinding tool using multi-layered anode alumina formwork；
S20 provides a tft array substrate, sets gradually OLED from bottom to top on the tft array substrate surface and shines
Layer, thin-film encapsulation layer and color membrane substrates, the color membrane substrates include color film layer and the first black matrix"；
S30 imprints first black matrix" using the nano impression grinding tool, forms the second black matrix",
The surface of second black matrix" is the cellular nano structure of recess, and OLED display is made in cooling after coining.
According to one preferred embodiment of the present invention, in the S10, the nano impression grinding tool is cylindrical roller shape.
According to one preferred embodiment of the present invention, the nano impression grinding tool includes roll body, the table of the roll body
Face is provided with the elliposoidal polyimide film of protrusion, and the both ends of the roll body are respectively arranged with dimethyl silicone polymer.
According to one preferred embodiment of the present invention, in the S20, the coloured silk film layer includes circuit sequentially arrangement multiple and different
The color film layer of the son of color.
According to one preferred embodiment of the present invention, first black matrix" is set between the adjacent color film layer of the son
Interstitial area, and color film layer is non-overlapping is connected with the adjacent son.
According to one preferred embodiment of the present invention, in the S20, the OLED luminescent layer includes red sub- luminescent layer, blue
Sub- luminescent layer and the sub- luminescent layer of green.
According to one preferred embodiment of the present invention, in the S20, the thin-film encapsulation layer includes being stacked from bottom to top
First inorganic layer, organic layer and the second inorganic layer.
According to one preferred embodiment of the present invention, the material of first inorganic layer is silicon nitride, silica, three oxidations two
The one of the above such as aluminium, titanium dioxide and zirconium dioxide or the combination more than any two, the material of second inorganic layer with
The material of first inorganic layer is identical.
According to one preferred embodiment of the present invention, the material of the organic layer is acrylic, epoxy resin or organosilicon.
The present invention also provides a kind of OLED displays prepared using the method, comprising: tft array substrate, OLED
Luminescent layer, thin-film encapsulation layer and color membrane substrates；
Wherein, the color membrane substrates include color film layer and black matrix", and the surface of the black matrix" is the bee of recess
Nest shape nanostructure.
The invention has the benefit that the preparation method and OLED of OLED display provided by the present invention show dress
It sets, sets the black matrix" surface on color membrane substrates to the cellular nano structure of recess, reduce black matrix" surface
Reflectivity further improves black matrix" to the absorption efficiency of light, it is strong outdoors to further enhance OLED display
Contrast under light.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of embodiment or technical solution in the prior art
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only some of invention
Embodiment for those of ordinary skill in the art without creative efforts, can also be attached according to these
Figure obtains other attached drawings.
Fig. 1 is the preparation method flow chart of OLED display of the present invention.
Fig. 2 a- Fig. 2 c is the preparation method schematic diagram of OLED display of the present invention.
Fig. 3 is the structural schematic diagram of OLED display of the present invention.
Specific embodiment
The explanation of following embodiment is referred to the additional illustration, the particular implementation that can be used to implement to illustrate the present invention
Example.The direction term that the present invention is previously mentioned, such as [on], [under], [preceding], [rear], [left side], [right side], [interior], [outer], [side]
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the present invention, rather than to
The limitation present invention.The similar unit of structure is with being given the same reference numerals in the figure.
The present invention is led for existing OLED display since the panel surface reflectivity based on color membrane technology is excessively high
It causes color membrane substrates too low to efficiency of light absorption, further reduced the technology of contrast of the OLED display outdoors under strong light
Problem, the present embodiment are able to solve the defect.
As shown in Figure 1, being the preparation method process of OLED display of the present invention, which comprises
S10 prepares nano impression grinding tool using multi-layered anode alumina formwork.
Specifically, the S10 further include:
Firstly, providing a multi-layered anode alumina formwork and a umbilicate type honeycomb grinding tool, the umbilicate type honeycomb
Grinding tool is located at the surface of the multi-layered anode alumina formwork；The polyimide precursor of one molten condition is poured into the recess
Type honeycomb grinding tool, forms flat polyimides mold, and the lower surface of the polyimides mold is the honeycomb knot of protrusion
Structure；Later, the multi-layered anode alumina formwork is prepared into cylindrical roller shape；The polyimides mold is wrapped described more
The surface of layer anodic oxidation aluminium formwork, the both ends of the multi-layered anode alumina formwork and the both ends of the polyimides mold make
It is fixed with dimethyl silicone polymer；Finally, the nano impression grinding tool 10 is made.
Specifically, the nano impression grinding tool 10 is cylindrical roller shape；The nano impression grinding tool 10 includes roll body
11, the surface of the roll body 11 is provided with the elliposoidal polyimide film 12 of protrusion, the both ends point of the roll body 11
It is not provided with dimethyl silicone polymer 13, as shown in Figure 2 a.
S20 provides a tft array substrate, sets gradually OLED from bottom to top on the tft array substrate surface and shines
Layer, thin-film encapsulation layer and color membrane substrates, the color membrane substrates include color film layer and the first black matrix".
Specifically, the S20 further include:
One tft array substrate 21 is provided, sets gradually OLED luminescent layer from bottom to top on 21 surface of tft array substrate
22, thin-film encapsulation layer 23 and color membrane substrates 24, the color membrane substrates 24 include color film layer 241 and the first black matrix" 242.
Specifically, the color film layer 241 includes the color film layer 2411 of son for the multiple and different colors for circuiting sequentially arrangement.
Specifically, first black matrix" 242 is set to the interstitial area between the adjacent color film layer 2411 of the son, and
Color film layer 2411 is non-overlapping is connected with the adjacent son.
Specifically, the OLED luminescent layer 22 includes red sub- luminescent layer 221, the sub- luminescent layer 222 of blue and green
Luminescent layer 223.
Specifically, in the S20, the thin-film encapsulation layer 23 include be stacked from bottom to top the first inorganic layer 231,
Organic layer 232 and the second inorganic layer 233；The material of first inorganic layer 231 is silicon nitride, silica, three oxidations two
The one of the above such as aluminium, titanium dioxide and zirconium dioxide or the combination more than any two, the material of second inorganic layer 233
It is identical as the material of first inorganic layer；The material of the organic layer 232 is acrylic, epoxy resin or organosilicon, is such as schemed
Shown in 2b.
S30 imprints first black matrix" using the nano impression grinding tool, forms the second black matrix",
The surface of second black matrix" is the cellular nano structure of recess, and OLED display is made in cooling after coining.
Specifically, the S30 further include:
Firstly, the OLED display 20 is placed in a heating plate, the OLED display 20 includes described
Tft array substrate 21, the OLED luminescent layer 22, the thin-film encapsulation layer 23 and the color membrane substrates 24, the coloured silk film base
Plate 24 includes the color film layer 241 and first black matrix" 242；The bottom surface of the tft array substrate 21 is that polyamides is sub-
Amine film, the material of part more than 21 surface of tft array substrate are polymethyl methacrylate (organic glass).It
Afterwards, the heating plate is heated, first black matrix" 242 is imprinted using the nano impression grinding tool 10, and uses
Temperature T of the air-cooler to the organic glass for imprinting unformed partempGreater than the glass transition temperature of the organic glass
Tg, the temperature T of the organic glass of imprinting moulding partempLess than the glass transition temperature T of the organic glassg.Coining
After the completion, first black matrix" 242 becomes the second black matrix" of the cellular nano structure that surface is recess, finally makes
At the OLED display of honeycomb structure array, as shown in Figure 2 c.
As shown in figure 3, the present invention also provides a kind of OLED displays 30 prepared using the method, comprising: TFT gusts
Column substrate 31, OLED luminescent layer 32, thin-film encapsulation layer 33 and color membrane substrates 34；
Wherein, the color membrane substrates 34 include color film layer 341 and black matrix" 342, the surface of the black matrix" 342
For the cellular nano structure of recess.
Specifically, the color film layer 341 includes the color film layer 3411 of son for the multiple and different colors for circuiting sequentially arrangement.
Specifically, the black matrix" 342 is set to the interstitial area between the adjacent color film layer 3411 of the son, and with phase
The adjacent color film layer 3411 of the son is non-overlapping to be connected.
Specifically, the OLED luminescent layer 32 includes red sub- luminescent layer 321, the sub- luminescent layer 322 of blue and green
Luminescent layer 323.
Specifically, the thin-film encapsulation layer 33 includes the first inorganic layer 331, the organic layer 332 being stacked from bottom to top
And second inorganic layer 333；The material of first inorganic layer 331 is silicon nitride, silica, aluminum oxide, titanium dioxide
The one of the above such as titanium and zirconium dioxide or the combination more than any two, the material of second inorganic layer 333 and described the
The material of one inorganic layer is identical；The material of the organic layer 332 is acrylic, epoxy resin or organosilicon.
Since the reflectivity of material is not only related with the characteristic of material itself (such as refractive index, molar extinction coefficient),
There is this close to contact with the surface topography of material.Therefore honey-comb shape array structure can effectively reduce the reactivity of polymer.
The invention has the benefit that the preparation method and OLED of OLED display provided by the present invention show dress
It sets, sets the black matrix" surface on color membrane substrates to the cellular nano structure of recess, reduce black matrix" surface
Reflectivity further improves black matrix" to the absorption efficiency of light, it is strong outdoors to further enhance OLED display
Contrast under light.
In conclusion although the present invention has been disclosed above in the preferred embodiment, but above preferred embodiment is not to limit
The system present invention, those skilled in the art can make various changes and profit without departing from the spirit and scope of the present invention
Decorations, therefore protection scope of the present invention subjects to the scope of the claims.
Claims (10)
1. a kind of preparation method of OLED display, which is characterized in that the described method includes:
S10 prepares nano impression grinding tool using multi-layered anode alumina formwork；
S20 provides a tft array substrate, sets gradually OLED luminescent layer, thin from bottom to top on the tft array substrate surface
Film encapsulated layer and color membrane substrates, the color membrane substrates include color film layer and the first black matrix"；
S30 imprints first black matrix" using the nano impression grinding tool, forms the second black matrix", described
The surface of second black matrix" is the cellular nano structure of recess, and OLED display is made in cooling after coining.
2. the preparation method of OLED display according to claim 1, which is characterized in that in the S10, the nanometer
Coining grinding tool is cylindrical roller shape.
3. the preparation method of OLED display according to claim 2, which is characterized in that the nano impression grinding tool packet
Roll body is included, the surface of the roll body is provided with the elliposoidal polyimide film of protrusion, the both ends of the roll body
It is respectively arranged with dimethyl silicone polymer.
4. the preparation method of OLED display according to claim 1, which is characterized in that in the S20, the coloured silk film
Layer includes the color film layer of son for the multiple and different colors for circuiting sequentially arrangement.
5. the preparation method of OLED display according to claim 4, which is characterized in that first black matrix" is set
The interstitial area being placed between the adjacent color film layer of the son, and color film layer is non-overlapping is connected with the adjacent son.
6. the preparation method of OLED display according to claim 1, which is characterized in that in the S20, the OLED
Luminescent layer includes red sub- luminescent layer, the sub- luminescent layer of blue and the sub- luminescent layer of green.
7. the preparation method of OLED display according to claim 1, which is characterized in that in the S20, the film
Encapsulated layer includes the first inorganic layer, organic layer and the second inorganic layer being stacked from bottom to top.
8. the preparation method of OLED display according to claim 7, which is characterized in that the material of first inorganic layer
Expect to be more than the one of the above such as silicon nitride, silica, aluminum oxide, titanium dioxide and zirconium dioxide or any two
Combination, the material of second inorganic layer are identical as the material of first inorganic layer.
9. the preparation method of OLED display according to claim 7, which is characterized in that the material of the organic layer is
Acrylic, epoxy resin or organosilicon.
10. a kind of OLED display using the described in any item preparation method preparations of claim 1-9, which is characterized in that
It include: tft array substrate, OLED luminescent layer, thin-film encapsulation layer and color membrane substrates；
Wherein, the color membrane substrates include color film layer and black matrix", and the surface of the black matrix" is the honeycomb of recess
Nanostructure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910093716.3A CN109888130A (en) | 2019-01-30 | 2019-01-30 | The preparation method and OLED display of OLED display |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910093716.3A CN109888130A (en) | 2019-01-30 | 2019-01-30 | The preparation method and OLED display of OLED display |
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| CN109888130A true CN109888130A (en) | 2019-06-14 |
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ID=66927636
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| CN201910093716.3A Pending CN109888130A (en) | 2019-01-30 | 2019-01-30 | The preparation method and OLED display of OLED display |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113013360A (en) * | 2021-02-25 | 2021-06-22 | 武汉华星光电半导体显示技术有限公司 | Display panel and display device |
| CN113594388A (en) * | 2021-07-29 | 2021-11-02 | 京东方科技集团股份有限公司 | Display substrate, manufacturing method thereof and display device |
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| US20150187852A1 (en) * | 2012-08-01 | 2015-07-02 | Semiconductor Energy Laboratory Co., Ltd. | Display Device |
| CN105511154A (en) * | 2016-02-19 | 2016-04-20 | 京东方科技集团股份有限公司 | Display substrate and manufacturing method thereof |
| CN109065754A (en) * | 2018-08-03 | 2018-12-21 | 武汉华星光电半导体显示技术有限公司 | A kind of OLED display panel and preparation method thereof |
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| CN102218833A (en) * | 2010-01-07 | 2011-10-19 | 上海交通大学 | Preparation method of soft template in lattice structure for ultraviolet nano imprinting |
| US20150187852A1 (en) * | 2012-08-01 | 2015-07-02 | Semiconductor Energy Laboratory Co., Ltd. | Display Device |
| CN104749816A (en) * | 2015-04-14 | 2015-07-01 | 京东方科技集团股份有限公司 | Manufacturing method of display substrate, display substrate and display device |
| CN105511154A (en) * | 2016-02-19 | 2016-04-20 | 京东方科技集团股份有限公司 | Display substrate and manufacturing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113013360A (en) * | 2021-02-25 | 2021-06-22 | 武汉华星光电半导体显示技术有限公司 | Display panel and display device |
| CN113594388A (en) * | 2021-07-29 | 2021-11-02 | 京东方科技集团股份有限公司 | Display substrate, manufacturing method thereof and display device |
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Application publication date: 20190614 |
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