CN109887636A - A kind of Nb/Al multilayer film Laue lens applied to the micro- focusing of hard X ray - Google Patents
A kind of Nb/Al multilayer film Laue lens applied to the micro- focusing of hard X ray Download PDFInfo
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- CN109887636A CN109887636A CN201910322785.7A CN201910322785A CN109887636A CN 109887636 A CN109887636 A CN 109887636A CN 201910322785 A CN201910322785 A CN 201910322785A CN 109887636 A CN109887636 A CN 109887636A
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- multilayer film
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- 238000005162 X-ray Laue diffraction Methods 0.000 title claims abstract description 46
- 239000000463 material Substances 0.000 claims abstract description 17
- 238000002360 preparation method Methods 0.000 claims abstract description 7
- 238000003384 imaging method Methods 0.000 claims description 4
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000002474 experimental method Methods 0.000 claims description 3
- 230000010354 integration Effects 0.000 claims description 3
- 238000013461 design Methods 0.000 claims description 2
- 238000005498 polishing Methods 0.000 abstract description 2
- 229910008814 WSi2 Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/065—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using refraction, e.g. Tomie lenses
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- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The invention discloses a kind of novel Nb/Al multilayer film Laue lens focused applied to hard X ray wave band.It is characterized in that using Nb as the absorbed layer of Laue lens, Al is as wall.Compared with the Laue lens of traditional material, there is higher diffraction efficiency using the new material combination of Nb/Al, effectively increase the light intensity of focal beam spot, and the diffraction efficiency peak width that is calculated of the combination of materials is traditional material combines under the conditions of 3 to 4 times, precision required when slice polishing is greatly reduced, preparation process is simplified.The more traditional Si wall of the stress of Al is smaller simultaneously, can increase the bore of Laue lens to increase its light passing amount, further strengthen focal beam spot light intensity, optimize focusing performance.
Description
Technical field
The present invention relates to the researchs of the micro- concentrating element of high-resolution X-ray, belong to precison optical component research field, can answer
For developing the micro- focusing technology of nano-stage hard X-ray.
Background technique
X-ray microtechnic is because of the features such as its penetrability is strong, operating wave length, noninvasive measurement, high Element sensitivity, quilt
It is widely used in plasma diagnostics, the biomedical research fields such as micro-.The resolution ratio of X-ray micro imaging system is gathered by it
Focal spot size obtained by burnt element is determined.Since the refractive index n values of X-ray are close to 1, diffraction-type concentrating element is compared to anti-
Penetrate with refraction type element, realize X-ray focusing it is more convenient.Traditional diffraction-type concentrating element is fresnel's zone plate.According to
Rayleigh criterion, the resolution ratio of fresnel's zone plate depend on outermost layer bandwidth, and diffraction efficiency increase with incident X-ray energy and
Reduce.Therefore to obtain high efficiency and high-resolution focusing, need to increase as far as possible the depth-width ratio of zone plate.Use electron beam
The zone plate of preparation is etched, resolution ratio is up to 12nm, but depth-width ratio is suitable for Soft X-Ray Region within 30.It is cut using sputtering
The method of piece can get 1000 or more depth-width ratio, but resolution ratio is in 100nm magnitude.
For the nano-focusing for realizing hard X ray wave band, Argonne National Laboratory, the U.S. proposes multilayer film within 2004
Laue lens (MLL) are coated with the multilayer film of gradient-structure from outermost layer inverted order, then carry out slice throwing to it on a planar base
Light assembly, obtains one-dimensional focusing.Two panels MLL is orthogonally located, it can get two-dimension focusing.2011, the laboratory Argonne used
Two orthogonally located MLL obtain 25 × 27nm in 12keV wave band2Two-dimension focusing；2013, the laboratory Brookhaven
The one-dimensional focusing of 11nm is obtained in identical wave band.
It is micro- that MLL is applied to nano-focusing, X-ray more.According to the requirement of micro-imaging, need to enhance MLL as far as possible poly-
The intensity of burnt hot spot.And its diffraction efficiency can change with MLL change in depth, therefore the precision of slice and polishing process is wanted
Ask very high.Simultaneously because the cumulative stress during multilayer film is coated with will limit its clear aperture, further limit at focal spot
Light intensity.
Chinese patent CN103151089A discloses the micro- more thickness of focusing of hard X ray than composite multilayer membrane Laue lens, needle
To in lens arrangement, the local grating from center to outer layer different zones selects different thicknesses of layers ratio γ (with WSi2/Si material
For material combination, γ=dsi/ (dWSi2+dsi): lesser γ is selected to central area period biggish grating, reduces stress；
Relatively large γ is selected to outer layer region period lesser grating, guarantees diffraction efficiency.And obtaining γ by calculating is 0.5
WSi2/Si multilayer film Laue lens 93% diffraction efficiency.And the Nb/Al material that the present invention selects simplifies preparation process, together
When diffraction efficiency be greater than patent CN103151089A designed by the more thickness of WSi2/Si than composite multilayer membrane Laue lens, be more than
The WSi2/Si multilayer film Laue lens under the conditions of.
Summary of the invention
It is a kind of micro- poly- applied to hard X ray the purpose of the present invention is proposing on the basis of multilayer film Laue lens technologies
Burnt Nb/Al multilayer film Laue lens further increase diffraction efficiency, focusing performance and the simplified preparation difficulty of Laue lens.
Core of the invention is to use Nb as the absorbed layer of multilayer film Laue lens, and Al is as wall.Multilayer film Laue lens
Diffraction efficiency is to evaluate one of the important indicator of its focusing performance, and its diffraction efficiency can change with change in depth.Compared to
The multilayer film Laue lens of traditional material are higher in the diffraction efficiency of 14-18keV wave band, Nb/Al multilayer film Laue lens and spread out
It penetrates that peak is wider, precision required when slice polishing is greatly reduced, to simplify preparation process.While in order to reduce multilayer film
Stress it is cumulative, select Al as wall, further increase the bore and focusing performance of multilayer film Laue lens.It is high to realize
The micro- focusing of the high-resolution hard X ray of intensity provides new method.
The present invention can be realized by following steps:
(1) energy section, operating distance, focal imaging resolution ratio and the bore required when being applied according to high-throughput microscope experiment, selection
The operation wavelength of Nb/Al multilayer film Laue lensλ, focal lengthfWith the thickness of outermost layer bandwidthdr out ；
(2) at the plane of incidence (depth z=0), film layer position is determined multilayer film Laue lens by formula (1):
(1)
WhereinnFor the film layer number outside from center,r n It isnThe position radius of tunic layer.The annulus thickness of different radii position
It is determined by formula (2):
(2)
(3) using the one-dimensional coupled-mode theory in Diffraction Dynamics, minus 1 grade of diffraction efficiency is calculated with depthzThe curve of variationη -1 (z).Used here as the lens of incline structure, diffraction efficiency when outermost layer annulus meets Bragg condition is calculated；
(4) efficiency curve being calculated according to step (3)η -1 (z), choose the maximum optimum depth z of efficiencyopt；
(5) optimum depth z is thoroughly done away withopt, the field distribution of exit facet is calculated, using kirchhoff-fresnel diffraction integration, is obtained
Light distribution in image planes obtains the focus resolution of Nb/Al multilayer film Laue lens；
(6) the exit facet field distribution being calculated according to step (5) draws circle of equal altitudes, obtains the distribution of depth of focus in XZ plane,
Obtain Nb/Al multilayer film Laue lens depth of focus length.
Detailed description of the invention
Fig. 1 is novel Nb/Al multilayer film Laue lens design structural schematic diagram.Wherein 1 Nb film layer is represented, 2 represent Al film
Layer, z is thickness of multilayer film, and thickness of multilayer film is along the x-axis direction.
Fig. 2 is the curve of three kinds of different materials multilayer film diffraction efficiencies.Compare Nb and traditional material WSi2, between W
Optical property difference.
Fig. 3 is three kinds of different materials multilayer film focal point light distribution.
It remarks additionally below in conjunction with attached drawing to the present invention:
As shown in Figure 1, multilayer film Laue lens are the multilayer films of change of gradient, film thickness ecto-entad is incremented by successively, outermost tunic
Thickness determines the size of resolution ratio.Fig. 2 under the same conditions, respectively to Nb/Al, WSi2Tri- kinds of different materials combinations of/Al, W/Al
Multilayer film Laue Lenses Diffractive efficiency is compared.By comparing it can be found that Nb/Al not only diffraction efficiency reaches
41.34%, and the peak width of diffraction efficiency is 1.5-3 times of other materials combination, reduce when slice polishes the error that generates for
The influence of diffraction efficiency further simplifies preparation difficulty.Fig. 3 compares three kinds of combination of materials focal point light distribution
Compared with the focal spot size of Nb/Al is identical as other two kinds of materials, and focal spot center light intensity is stronger.
Embodiment
Using method of the invention, microscope experiment application is focused for high-throughput hard X ray, devises Nb/Al multilayer film
Laue lens, work existE=18keV(λ=0.0666nm),f=22.5mm, dr out =15nm, Rmax=50 μm of knots using tilting
Structure:
(1) according to lens arrangement formula (1,2) calculate multilayer film Laue lens initial configuration, and select lens inclination=
2.2mrad；
(2) one-dimensional coupled-mode theory is utilized, calculates minus 1 grade of diffraction efficiency with depthzThe curve of variationη -1 (z)；
(3) according to diffraction curveη -1 (z)Choose the maximum optimum depth z of efficiencyopt=14.60μm；
(4) according to optimum depth zopt, the field distribution of exit facet is calculated, using kirchhoff-fresnel diffraction integration, is obtained
Light distribution in image planes, the focus resolution for obtaining Nb/Al multilayer film Laue lens is 26.40nm；
(5) according to acquired results are calculated, with WSi2/ Al multilayer film is compared, and diffraction efficiency has been higher by 7.8%, resolution ratio phase
Together, it was demonstrated that this material has high feasibility and potential.
Claims (7)
1. a kind of Nb/Al multilayer film Laue lens applied to the micro- focusing of hard X ray, it is characterised in that: the multilayer film Laue
Lens arrangement is alternately coated with by two kinds of materials of Nb and Al and is formed.
2. the Nb/Al multilayer film Laue lens of the micro- focusing of hard X ray according to claim 1, which is characterized in that described
For multilayer film Laue lens within a film layer period, the ratio of Nb tunic thickness and total thicknesses of layers is 0.1 ~ 0.9.
3. lens according to claim 1, wherein the multilayer film Laue lens have section depthz,zRefer to vertical
Element duration in multilayer film sample preparation surface.
4. the Nb/Al multilayer film Laue lens of the micro- focusing of hard X ray according to claim 1, which is characterized in that described
Multilayer film Laue lens are tilted structure or dovetail structure.
5. the Nb/Al multilayer film Laue lens of the micro- focusing of hard X ray according to claim 4, which is characterized in that tilting
The multilayer film Laue lens of structure are to make a horizontal type Laue lens integral inclined fixed angle outermost layer period film to meet
The lens of Bragg condition.
6. the Nb/Al multilayer film Laue lens of the micro- focusing of hard X ray according to claim 4, which is characterized in that dovetail
The multilayer film Laue lens of structure are that the different cycles film from lens centre to outer layer tilts different angle respectively to meet Bragg
The lens of condition.
7. lens described in -6 according to claim 1 combine stress for the diffraction efficiency for improving multilayer film Laue lens
Can, design determine Nb/Al multilayer film Laue lens arrangement the following steps are included:
(1) energy section, operating distance, focal imaging resolution ratio and the bore required when being applied according to high-throughput microscope experiment, selection
The operation wavelength of Nb/Al multilayer film Laue lensλ, focal lengthfWith the thickness of outermost layer bandwidthdr out ；
(2) at the plane of incidence (depth z=0), film layer position is determined multilayer film Laue lens by formula (1):
(1)
WhereinnFor the film layer number outside from center,r n It isnThe position radius of tunic layer；
The annulus thickness of different radii position is determined by formula (2):
(2)
(3) using the one-dimensional coupled-mode theory in Diffraction Dynamics, minus 1 grade of diffraction efficiency is calculated with depthzThe curve of variationη -1 (z)；
Used here as the lens of incline structure, diffraction efficiency when outermost layer annulus meets Bragg condition is calculated；
(4) efficiency curve being calculated according to step (3)η -1 (z), choose the maximum optimum depth z of efficiencyopt；
(5) optimum depth z is thoroughly done away withopt, the field distribution of exit facet is calculated, using kirchhoff-fresnel diffraction integration, is obtained
Light distribution in image planes obtains the focus resolution of Nb/Al multilayer film Laue lens；
(6) the exit facet field distribution being calculated according to step (5) draws circle of equal altitudes, obtains the distribution of depth of focus in XZ plane,
Obtain Nb/Al multilayer film Laue lens depth of focus length.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311045688.0A CN117079856A (en) | 2019-04-22 | 2019-04-22 | Hard X-ray micro-focusing Nb/Al multilayer film Laue lens |
| CN201910322785.7A CN109887636A (en) | 2019-04-22 | 2019-04-22 | A kind of Nb/Al multilayer film Laue lens applied to the micro- focusing of hard X ray |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910322785.7A CN109887636A (en) | 2019-04-22 | 2019-04-22 | A kind of Nb/Al multilayer film Laue lens applied to the micro- focusing of hard X ray |
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| CN202311045688.0A Division CN117079856A (en) | 2019-04-22 | 2019-04-22 | Hard X-ray micro-focusing Nb/Al multilayer film Laue lens |
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| CN202311045688.0A Pending CN117079856A (en) | 2019-04-22 | 2019-04-22 | Hard X-ray micro-focusing Nb/Al multilayer film Laue lens |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110931144A (en) * | 2019-12-27 | 2020-03-27 | 中国科学院长春光学精密机械与物理研究所 | Super-reflector |
| CN113903488A (en) * | 2021-09-30 | 2022-01-07 | 中国科学院高能物理研究所 | Single-order diffraction Laue lens and manufacturing method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011127911A (en) * | 2009-12-15 | 2011-06-30 | Nippon Telegr & Teleph Corp <Ntt> | X-ray capacitor lens |
| CN106324711A (en) * | 2016-09-13 | 2017-01-11 | 同济大学 | WSi2/Al0.98Si0.02 multi-layer film Laue lens used for hard X-ray microfocusing |
-
2019
- 2019-04-22 CN CN201910322785.7A patent/CN109887636A/en active Pending
- 2019-04-22 CN CN202311045688.0A patent/CN117079856A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011127911A (en) * | 2009-12-15 | 2011-06-30 | Nippon Telegr & Teleph Corp <Ntt> | X-ray capacitor lens |
| CN106324711A (en) * | 2016-09-13 | 2017-01-11 | 同济大学 | WSi2/Al0.98Si0.02 multi-layer film Laue lens used for hard X-ray microfocusing |
Non-Patent Citations (1)
| Title |
|---|
| JIAYI ZHANG等: "Study of Nb-based material combination multilayer for X-ray applications" * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110931144A (en) * | 2019-12-27 | 2020-03-27 | 中国科学院长春光学精密机械与物理研究所 | Super-reflector |
| CN113903488A (en) * | 2021-09-30 | 2022-01-07 | 中国科学院高能物理研究所 | Single-order diffraction Laue lens and manufacturing method thereof |
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| CN117079856A (en) | 2023-11-17 |
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Application publication date: 20190614 |