CN110931144A - Super-reflector - Google Patents
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- CN110931144A CN110931144A CN201911373681.5A CN201911373681A CN110931144A CN 110931144 A CN110931144 A CN 110931144A CN 201911373681 A CN201911373681 A CN 201911373681A CN 110931144 A CN110931144 A CN 110931144A
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- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
Abstract
The invention provides a super-reflector, which comprises a substrate, wherein the substrate is fused quartz, tungsten films and silicon films are alternately superposed on the substrate, the film close to the bottom side of the substrate is the silicon film, the outermost film is the tungsten film, and a structure in which the tungsten films and the silicon films are alternately arranged forms a plurality of groups of periodic multilayer films. Compared with the prior art, the invention has the beneficial effects that: the super-reflector provided by the invention has higher reflectivity in a wave band of 0.2-10 keV. The working angle is relatively large, and the grazing incidence angles can be 1.0 degree, 1.4 degrees and 1.7 degrees. The super-mirror is a multi-layered film structure including several periodic films having different thicknesses, which does not require fine deposition rate control in manufacturing, and thus is easily manufactured.
Description
Technical Field
The invention relates to the technical field of optical films, in particular to a super-reflector.
Background
In the X-ray band, the refractive index of the material is close to 1 and the absorption is very small. When X-rays pass through the material, the refraction angle is very small, the transmittance is close to 100 percent, and the reflectivity is very small and is in the magnitude of 10E-4. Thus, X-ray optical systems typically employ grazing incidence angle configurations, using the total reflection angle of the material to achieve higher reflectivity. When the total reflection angle of the material is exceeded, the reflectivity is sharply reduced; as the energy increases, the reflectivity also decreases rapidly. One typically uses multilayer film technology to increase the grazing incidence angle. The principle of the multilayer film technology is that thin films are alternately deposited to form an artificial crystal, and the Bragg diffraction principle is utilized to realize the high reflectivity of the waveband. Increasing the grazing incidence angle means that the focal length can be reduced, the weight and the cost are reduced, and a larger light collecting area is obtained.
Mirrors with high reflectivity at wide angles or wide energies in the X-ray band are commonly referred to as super mirrors. The super-reflector is widely applied to the fields of biological imaging, plasma diagnosis, space detection and the like. There are three main methods for designing a super mirror, which are the Mezei method, the Kozhevnikov method, and the Block method, respectively. The film system obtained by the Block method has a few periodic structures, does not need precise deposition rate control, and is easier to prepare. The disadvantage is that the designed film system has more oscillation in the reflectivity curve.
Disclosure of Invention
In view of the above, the present invention is directed to solve the problem that the reflectance curve of the film system obtained by the Block method in the prior art has more oscillation. The invention provides a super-reflector, which comprises a substrate, wherein the substrate is fused quartz, tungsten films and silicon films are alternately superposed on the substrate, the film close to the bottom side of the substrate is the silicon film, the outermost film is the tungsten film, and a structure in which the tungsten films and the silicon films are alternately arranged forms a plurality of groups of periodic multilayer films.
Preferably, the determination formula of the periodic thickness of the periodic multilayer film is as follows:
where m is the diffraction order, λ is the wavelength, d is the period thickness, Γ is the proportion of the high density material in the period thickness, θ is the grazing incidence angle, δ is the ratio of the high density material in the period thicknesshIs the refractive index reduction, delta, of the high density materiallIs the refractive index reduction of the low density material.
Preferably, the substrate has a roughness of less than 0.25 nm.
Preferably, the super-reflector at a grazing incidence angle of 1.0 ° has 6 groups of periodic multilayer films, and 6 groups of the periodic multilayer films correspond to electromagnetic waves with energy of 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively.
Preferably, the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 5keV is 9.73nm, wherein the period number is 1; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 6keV is 7.20nm, wherein the period number is 2; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 7keV is 5.81nm, wherein the period number is 3; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 8keV is 4.90nm, wherein the period number is 4; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 9keV is 4.26nm, wherein the period number is 6; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 10keV is 3.76nm, and the period number is 9.
Preferably, the super-reflector at a grazing incidence angle of 1.4 ° has 7 groups of periodic multilayer films, and the 7 groups of periodic multilayer films correspond to electromagnetic waves with energy of 4keV, 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively.
Preferably, the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with energy of 4keV is 7.99nm, wherein the period number is 1; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 5keV is 5.82nm, wherein the period number is 2; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 6keV is 4.63nm, wherein the period number is 3; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 7keV is 3.87nm, wherein the period number is 5; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 8keV is 3.33nm, wherein the period number is 7; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 9keV is 2.93nm, wherein the period number is 10; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 10keV is 2.61nm, and the period number is 15.
Preferably, the super-reflector at a grazing incidence angle of 1.7 ° has 7 groups of periodic multilayer films, and the 7 groups of periodic multilayer films correspond to electromagnetic waves with energy of 4keV, 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively.
Preferably, the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with energy of 4keV is 6.04nm, wherein the period number is 1; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 5keV is 4.57nm, wherein the period number is 2; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 6keV is 3.70nm, wherein the period number is 4; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 7keV is 3.12nm, wherein the period number is 6; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 8keV is 2.70nm, wherein the period number is 9; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 9keV is 2.38nm, wherein the period number is 14; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 10keV is 2.13nm, and the period number is 22.
Compared with the prior art, the invention has the beneficial effects that:
the invention provides a super-reflector which has higher reflectivity in a wave band of 0.2-10 keV. The working angle is relatively large, and the grazing incidence angles can be 1.0 degree, 1.4 degrees and 1.7 degrees. The super-mirror is a multi-layered film structure including several periodic films having different thicknesses, which does not require fine deposition rate control in manufacturing, and thus is easily manufactured.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is a schematic diagram of the Block method of the present invention;
FIG. 2 is a graph of periodic multilayer film reflectivity as a function of period number for different energy conditions at a grazing incidence angle of 1 °;
FIG. 3 is a graph of cycle number versus energy for a grazing incidence angle of 1.0;
FIG. 4 is a graph of super-mirror reflectivity as a function of energy for a first condition;
FIG. 5 is a graph of super-mirror reflectivity versus energy for a second condition;
FIG. 6 is a graph of super-mirror reflectivity as a function of energy under a third condition;
FIG. 7 shows a reflectance curve of a film system with a grazing incidence angle of 1.0 degree optimized by a Binda genetic algorithm;
FIG. 8 shows a reflectance curve of a film system with a grazing incidence angle of 1.4 degrees optimized by a Binda genetic algorithm;
FIG. 9 shows the reflectance versus grazing incidence angle for a film system with a grazing incidence angle of 1.0 at 6 keV.
Detailed Description
The above and further features and advantages of the present invention are described in more detail below with reference to the accompanying drawings.
In the description of the present invention, it is to be understood that the terms "first", "second" and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two unless specifically defined otherwise.
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system structures, techniques, etc. in order to provide a thorough understanding of the embodiments of the invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.
In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
In order to explain the technical means of the present invention, the following description will be given by way of specific examples.
The invention provides a super-reflector, which comprises a substrate, wherein the substrate is fused quartz, tungsten films and silicon films are alternately superposed on the substrate, the film close to the bottom side of the substrate is the silicon film, the outermost film is the tungsten film, and a structure in which the tungsten films and the silicon films are alternately arranged forms a plurality of groups of periodic multilayer films.
The super-reflector provided by the invention adopts a W/Si multilayer film structure, and the design method of the super-reflector belongs to a Block method. The angle of incidence of the super-mirror is 1.0 °, 1.4 ° and 1.7 °, respectively. The super-reflector has higher reflectivity at a wave band of 0.2-10keV under the condition of grazing incidence angles of 1.0 degree, 1.4 degrees and 1.7 degrees.
In the X-ray band, the complex refractive index of the material is expressed by the following formula:
n＝1-δ-iβ
where n is the complex index of refraction, δ is the refractive index reduction, which is very small, β is the extinction coefficient multilayer films are typically composed of alternating high and low density materials that produce high reflectivity at a particular wavelength through the bragg diffraction principle.
The following formula is a modified bragg diffraction formula:
where m is the diffraction order, λ is the wavelength, d is the periodic thickness, Γ is the proportion of the high density material in the periodic thickness, and θ is the grazing incidence angle.
As shown in fig. 1, the super mirror includes several sets of periodic multilayer films, each set of periodic multilayer films being called a Block. I.e. the super mirror comprises a plurality of blocks. Each Block has a specific period thickness, which is determined by the modified bragg diffraction formula. The number of cycles of the film in each Block is N. When N is 1, it means that a tungsten film and a silicon film are present in the Block. Namely, N tungsten films and N silicon films are arranged on top of each other in each Block.
Since high energy light is able to penetrate the material and is less absorbed. Thus, a set of periodic multilayer films that reflect high energy waves are placed near the substrate side. That is, to reduce absorption, λ is set4＞λ3＞λ2λ1And d and4＞d3＞d2＞d1。d4、d3、d2and d1The thicknesses of the fourth, third, second, and first periodic multilayer films are represented, respectively. Γ is set to 0.5 and the film interface roughness/diffusion is set to 0.45 nm.
The super-reflector provided by the invention comprises a super-smooth fused quartz substrate and a multilayer film formed by alternating tungsten and silicon; a multilayer film of alternating tungsten and silicon is deposited on a fused silica substrate. The roughness of the fused quartz substrate is less than 0.25 nm. The target reflectance was determined by the Kozhevnikov method. The energy resolution was set to 0.02 keV.
As shown in fig. 2, the periodic multilayer film reflectivity is plotted as a function of the period number at a grazing incidence angle of 1 ° under different energy conditions. As the energy E increases, the more cycles are required to reach the saturated reflectivity. With a grazing incidence angle of 1 ° set, the target reflectance is 10% of the saturated reflectance. The Blcok period thicknesses corresponding to different energies are determined by a corrected Bragg diffraction formula, and specific parameters are shown in a table I.
| E(keV) | 4 | 5 | 6 | 7 | 8 | 9 | 10 |
| d(nm) | --- | 9.73 | 7.20 | 5.81 | 4.90 | 4.26 | 3.76 |
| N | --- | 1 | 2 | 3 | 4 | 6 | 9 |
Table I is a partial parameter relation table of the super-reflector at a grazing incidence angle of 1.0 DEG
In the super-reflector film system set at 1 degree, there are 6 groups of periodic multi-layer films corresponding to electromagnetic waves with energy of 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively. The period thickness is in the range of 3.76-9.73 nm. The period thickness of the Block for 5keV was 9.73nm, where the period number was 1. The period thickness of Block for 10keV is 3.76nm, where the period number N is 9. By analogy, the structure of the super-reflector can be determined by the data in the first table.
The variation of the number of cycles with energy is shown in fig. 3, and it can be seen that there is an approximately linear relationship between the number of cycles and the energy. To reduce the oscillations present in the reflectivity curve, a reasonable choice of energy spacing is required. The energy interval should be chosen to be just enough to connect the reflection bands formed by the different blocks. Fig. 4 shows the reflectivity curves of the super-mirror with energy intervals of 0.5keV, 1.0keV, 2.0keV and 3.0keV, respectively. As can be seen from the figure, the super mirror reflectivity curve is best for an energy interval of 1.0 keV. At the 5-10keV band, the average reflectivity is 17.5%.
Further, in a super mirror design with a grazing incidence angle of 1.4 °, the target reflectivity is set to 15% of the saturated reflectivity. Table two gives the corresponding periodic multilayer film (Block) structure. There are 7 groups of periodic multi-layer films corresponding to electromagnetic waves with energy of 4keV, 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively. The period thickness ranges from 2.61nm to 7.99 nm. The period thickness of the Block for 4keV is 7.99nm, where the period number is 1. The period thickness of Block for 10keV is 2.61nm, where the period number N is 15. By analogy, the structure of the super-reflector can be determined by the data in the second table.
| E(keV) | 4 | 5 | 6 | 7 | 8 | 9 | 10 |
| d(nm) | 7.99 | 5.82 | 4.63 | 3.87 | 3.33 | 2.93 | 2.61 |
| N | 1 | 2 | 3 | 5 | 7 | 10 | 15 |
The second table is a partial parameter relation table of the super-reflector when the grazing incidence angle is 1.4 degrees
Fig. 5 shows the reflectance versus energy curve of the present invention when the energy interval is 1.0keV for a grazing incidence angle of 1.4 °. At 5-10keV, the average reflectivity of the super-mirror in the present invention is 6.0%. For comparison, FIG. 5 also shows the reflectance curves for two films (6nm Si/10nm W) with an average reflectance of 0.3% at 5-10 keV. The reflectivity of the super-mirror in the present invention is 20 times the reflectivity of the two-layer film.
In the 1.7 ° super mirror design, the target reflectance is set to 30% of the saturated reflectance. The third table shows the corresponding periodic multi-layer film (Block) structure, which has 7 groups of periodic multi-layer films corresponding to the electromagnetic waves with energy of 4keV, 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively. The period thickness is in the range of 2.13-6.04 nm. The period thickness of the Block for 4keV was 6.04nm, where the period number was 1. The period thickness of Block for 10keV is 2.13nm, where the period number N is 22. By analogy, the structure of the super-reflector can be determined by the data in the third table.
| E(keV) | 4 | 5 | 6 | 7 | 8 | 9 | 10 |
| d(nm) | 6.04 | 4.57 | 3.70 | 3.12 | 2.70 | 2.38 | 2.13 |
| N | 1 | 2 | 4 | 6 | 9 | 14 | 22 |
Table III is a partial parameter relation table of the super-reflector at a grazing incidence angle of 1.7 DEG
FIG. 6 shows the reflectance versus energy curve of the present invention for energy intervals of 1.0keV at 4-7keV, for energy intervals of 0.5keV at 8-10keV, and for grazing incidence angles of 1.7 deg. At 5-10keV, the average reflectivity of the super-mirror in the present invention is 3.8%. While the average reflectivity of the two films used as a comparison is 0.1% at 5-10 keV. The reflectivity of the super-mirror in the present invention is 38 times the reflectivity of the two-layer film.
The film system designed by the Block method provides a high-quality initial film system for subsequent local and global optimization. FIG. 7 shows the reflectance curve of the film system designed by the Block method and having a grazing incidence angle of 1.0 degree, which is further optimized by the Binda genetic algorithm. At 5-10keV, the average reflectance is 3.8%. While the reflectance of the two films was 2.1%. At this time, the reflectance of the super mirror in the present invention is 9 times that of the two-layer film.
FIG. 8 shows the reflectance curve of a film system designed by the Block method and having a grazing incidence angle of 1.4 degrees, which is further optimized by the Binda genetic algorithm. At 5-10keV, the average reflectivity of the super-mirror in the present invention is 7.0%.
FIG. 9 shows the reflectance versus grazing incidence angle for a film system with a grazing incidence angle of 1.0 at 6 keV. It can be seen that at 0-1.65 deg., the film system has better reflectivity and the film system has better angle tolerance. This provides convenience for subsequent installation and adjustment.
The invention provides a super-reflector. The super-reflector has higher reflectivity in a wave band of 0.2-10 keV. The working angle is relatively large, and the grazing incidence angles are respectively 1.0 degree, 1.4 degrees and 1.7 degrees. The film system structure is a multi-layer film structure, the film system structure comprises a plurality of periodic films with different thicknesses, and the multi-layer film structure does not need fine deposition rate control during preparation, so that the multi-layer film structure is easy to prepare.
The super-reflector has better angle tolerance and provides convenience for subsequent installation and adjustment. Compared with a single-layer film and two-layer films, the designed super-reflector can obtain higher reflectivity in a wave band of 5-10 keV.
The super-reflector can provide a high-quality initial film system for other local and global optimization algorithms.
The above-mentioned embodiments are only used for illustrating the technical solutions of the present invention, and not for limiting the same; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not substantially depart from the spirit and scope of the embodiments of the present invention, and are intended to be included within the scope of the present invention.
Claims (9)
1. The super-reflector is characterized by comprising a substrate, wherein the substrate is fused quartz, tungsten films and silicon films are alternately superposed on the substrate, the film close to the bottom side of the substrate is the silicon film, the outermost film is the tungsten film, and a structure in which the tungsten films and the silicon films are alternately arranged forms a plurality of groups of periodic multilayer films.
2. The super mirror as claimed in claim 1, wherein the periodic thickness of the periodic multilayer film is determined by the formula:
where m is the diffraction order, λ is the wavelength, d is the period thickness, Γ is the proportion of the high density material in the period thickness, θ is the grazing incidence angle, δ is the ratio of the high density material in the period thicknesshIs the refractive index reduction, delta, of the high density materiallIs the refractive index reduction of the low density material.
3. The super mirror as in claim 1, wherein said substrate has a roughness of less than 0.25 nm.
4. The super-mirror according to claim 1, wherein the super-mirror has 6 sets of periodic multilayer films at a grazing incidence angle of 1.0 °, the 6 sets of periodic multilayer films corresponding to electromagnetic waves having energies of 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively.
5. The super mirror as claimed in claim 4, wherein a period thickness of the periodic multilayer film corresponding to an electromagnetic wave having an energy of 5keV is 9.73nm, wherein the number of periods is 1;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 6keV is 7.20nm, wherein the period number is 2;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 7keV is 5.81nm, wherein the period number is 3;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 8keV is 4.90nm, wherein the period number is 4;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 9keV is 4.26nm, wherein the period number is 6;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 10keV is 3.76nm, and the period number is 9.
6. The super-mirror according to claim 1, wherein the super-mirror has 7 groups of periodic multilayer films at a grazing incidence angle of 1.4 °, and the 7 groups of periodic multilayer films correspond to electromagnetic waves having energies of 4keV, 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively.
7. The super mirror as claimed in claim 6, wherein a period thickness of the periodic multilayer film corresponding to an electromagnetic wave having an energy of 4keV is 7.99nm, wherein the number of periods is 1;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 5keV is 5.82nm, wherein the period number is 2;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 6keV is 4.63nm, wherein the period number is 3;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 7keV is 3.87nm, wherein the period number is 5;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 8keV is 3.33nm, wherein the period number is 7;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 9keV is 2.93nm, wherein the period number is 10;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 10keV is 2.61nm, and the period number is 15.
8. The super-mirror according to claim 1, wherein the super-mirror has 7 groups of periodic multilayer films at a grazing incidence angle of 1.7 °, and the 7 groups of periodic multilayer films correspond to electromagnetic waves having energies of 4keV, 5keV, 6keV, 7keV, 8keV, 9keV and 10keV, respectively.
9. The super mirror as claimed in claim 6, wherein a period thickness of the periodic multilayer film corresponding to an electromagnetic wave having an energy of 4keV is 6.04nm, wherein the number of periods is 1; the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 5keV is 4.57nm, wherein the period number is 2;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 6keV is 3.70nm, wherein the period number is 4;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 7keV is 3.12nm, wherein the period number is 6;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 8keV is 2.70nm, wherein the period number is 9;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 9keV is 2.38nm, wherein the period number is 14;
the periodic thickness of the periodic multilayer film corresponding to the electromagnetic wave with the energy of 10keV is 2.13nm, and the period number is 22.
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Application publication date: 20200327 |