CN104575656B - Multi-inclination-angle composite multi-film Laue lens and design method thereof - Google Patents
Multi-inclination-angle composite multi-film Laue lens and design method thereof Download PDFInfo
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- CN104575656B CN104575656B CN201510021478.7A CN201510021478A CN104575656B CN 104575656 B CN104575656 B CN 104575656B CN 201510021478 A CN201510021478 A CN 201510021478A CN 104575656 B CN104575656 B CN 104575656B
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/065—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using refraction, e.g. Tomie lenses
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Abstract
The invention discloses a multi-inclination-angle composite multi-film Laue lens. The lens comprises m inclined multi-film Laue lens bodies arranged in the direction perpendicular to incident light. The included angles between all film layers in each inclined multi-film Laue lens body and the incident light are equal. The multi-inclination-angle composite multi-film Laue lens can achieve diffraction limit focusing. M is larger than two. The thickness of the film layers of the inclined multi-film Laue lens body close to the central area is large, and the included angle between the film layers of the inclined multi-film Laue lens body and the incident light is small. The thickness of the film layers of the inclined multi-film Laue lens body close to the outer area is small, and the included angle between the film layers of the inclined multi-film Laue lens body and the incident light is large. The multi-inclination-angle composite multi-film Laue lens has the focusing performance close to that of Wedge MLL, and processing and implementation are easy.
Description
Technical field
The present invention relates to a kind of hard X ray nano-focusing optical element and its method for designing, more particularly, to multilayer film Laue
Lens, belong to synchrotron radiation light beam line engineering, synchrotron radiation optics field
Background technology
The uniqueness that the characteristics such as high brightness that third generation synchrotron radiation has, high collimation and hard X ray have
Matter, for example strong penetration capacity, to structural information and semiochemical sensitivity, to insensitivity of electromagnetic field etc. so that hard X penetrates
Line microscope has extensive use in numerous areas such as materialogy, medical science, biology and environmental sciences.X-ray microscope
Performance depend on the light intensity of focal beam spot and size.So far, various focusing using reflection, refraction and diffraction
Optical element has been able to hard X ray focuses on the magnitude of tens nanosizeds.In these focusing optics, diffraction type
Concentrating element multilayer film Laue lens (MLL) is hopeful to realize the focusing (ginseng of nanometer scale (1nm) truly most
Examine document：H.Yan et al.,Multilayer Laue Lens:A Path Toward One Nanometer X-Ray
Focusing, X-ray Opt.Instrum.2010,401845 (2010)).MLL is experimentally real to hard X ray at present
The one-dimensional focusing of existing highest resolution about 11nm, efficiency about 15%；The two-dimension focusing of 25 × 27nm, efficiency about 2%.
Because MLL has great depth-to-width ratio (along the depth of incident light direction and the ratio of outermost layer thicknesses of layers), X
Ray propagation wherein must be described using Diffraction Dynamics, and now whether each tunic layer meets Bragg condition MLL energy
The no acquisition high-resolution key of high efficiency.Meet the degree of Bragg condition according to film layer, multilayer film Laue lens can be divided
For four types：Horizontal type (Flat), apsacline (Tilted), Wedge (wedge shape) and flexure type (Curved) are (with reference to literary composition
Offer：H.Yan et al.,Takagi-Taupin description ofx-ray dynamical diffraction from
Diffractive optics with large numerical aperture, Phys.Rev.B 76,115438 (2007)).
In these four types, Flat with Tilted MLL is the same on structural nature, except for the difference that its all film of Flat MLL
Layer is all 0 with the angle of incident illumination, and all film layers are all unsatisfactory for Bragg condition, and its all film layer of Tilted MLL and incidence
Light has identical angle, and only some film layer meets Bragg condition.Therefore for Tilted MLL, realize spreading out
Emitter-base bandgap grading limit focus on it is necessary to reduce depth, as far as possible reduce Diffraction Dynamics effect impact, this inevitably result in its only have relatively low
Efficiency (list of references：Hanfei Yan et al.,Optimization of multilayer Laue lenses for a
scanning X-ray microscope,J.Synchrotron Rad.20,89(2013)).Each of which film of Wedge MLL
Layer all has different inclinations angle, and all film layers all approximately meet Bragg condition, and the calculated results show that it can realize height
The diffraction limit of efficiency focuses on.Tilted MLL process for plating is relatively easy, and the MLL experimentally reporting at present is substantially all and belongs to
This type, and Wedge MLL, due to the complexity of its structure, leads to its process for plating relatively difficult, yet there are no experiment
On report.
Content of the invention
It is an object of the invention to proposing a kind of new many inclinations angle of MLL structure to be combined MLL, to solve Tilted
MLL realizes the problem that when diffraction limit focuses on, efficiency is low and Wedge MLL process for plating is difficult.
The present invention can be achieved through the following technical solutions：
A kind of many inclinations angle be combined MLL it is characterised in that：It is by a series of Tilted MLL that this many inclination angle is combined MLL
Form along perpendicular to the arrangement of incident light direction；For wherein single Tilted MLL, its all film layer has phase with incident illumination
Same angle；Near the Tilted MLL that central area thicknesses of layers is larger, its film layer and incident illumination have less angle；Lean on
The less Tilted MLL of nearly outer layer region thicknesses of layers, its film layer and incident illumination have larger angle；This many inclination angle is multiple
Close MLL and be capable of diffraction limit focusing, be there is the focusing performance being close with Wedge MLL.
Each described Tilted MLL has equal or approximately equalised film layer quantity.
In described single Tilted MLL, its film layer makes film layer in this Tilted MLL compile with the angle theta of incident illumination
Number meet Bragg condition for two neighboring film layer middle.
Described many inclinations angle are combined MLL, and its plane of incidence and exit facet are parallel to each other, and perpendicular to incident illumination.
Described many inclinations angle are combined MLL, and its concrete structure parameter can be realized by below step：
(1) energy first according to incident X-rays (wavelength X), the ability (film layer gross thickness L) of plated film and focus resolution
R selects suitable focal length f, f can be obtained by Rayleigh criterion formula, r=0.5 λ/NA ≈ λ f/L；Further according to the operating distance requiring
wdAnd one compromise scheme of accuracy selection of actual plated film, determine outermost layer thicknesses of layers in Flat MLL, innermost layer film
Numbering n of the thickness, total film layer number N and each tunic layer of layer, specifically first passes through operating distance formula wd=f ε
Try to achieve ε, here ε=(xo-L)/xo, xoRefer to the position of outermost layer film layer, now outermost be can get according to zone plate formula
Layer thicknesses of layers, numbering n of innermost layer thicknesses of layers, total film layer number N and each tunic layer.Need here to particularly point out
It is in the technical program, in Flat MLL, numbering n of each tunic layer is fixing, it is by the determined x (n) of zone plate formula2
=n λ f, x (n) refer to number the position of the film layer being n；And many inclinations angle be combined MLL in each tunic layer numbering and
Flat MLL is identical, and that is, many inclinations angle are combined the i-th tunic layer in MLL is the same with the numbering of the i-th tunic layer in Flat MLL,
Their total film layer number N are also the same.
(2) according to described wavelength, focal length, outermost layer and innermost layer thicknesses of layers, theoretical with Diffraction Dynamics
Takagi-Taupin description of dynamical diffraction theory (TTD) or Coupled
Wave theory (CWT) calculates wavefront distribution and diffraction efficiency (list of references under Wedge MLL different depth：H.Yan et
al.,Takagi-Taupin description of x-ray dynamical diffraction from diffractive
Optics with large numerical aperture, Phys.Rev.B 76,115438 (2007)；J.Maser et
Al., Coupled wave description ofthe diffraction by zone plates with high
Aspect ratios, Opt.Commun.89,355 (1992)), obtain the optimum depth (depth corresponding to diffraction efficiency maximum
Degree)；It is distributed according to the wavefront on exit facet at optimum depth simultaneously, then calculate with Fresnel-Kirchhoff diffraction integral burnt
Light distribution near point, obtains the strongest of near focal point.
(3) thickness of each tunic layer in Flat MLL, d (n)=x (n)-x (n-1), formula is calculated according to zone plate formula
Middle d (n) refers to number the thickness of the film layer being n.
(4) assume that many inclinations angle are combined MLL and are combined by m Tilted MLL, the film layer number of each Tilted MLL
For N/m.If N/m is not integer, to its round Int (N/m+0.5), the number of plies having more or minus is calculated
On the Tilted MLL in outer layer region, its film layer number is N- (m-1) × Int (N/m+0.5), and other Tilted MLL
Film layer number is Int (N/m+0.5).
(5) for i-th Tilted MLL, the angle theta of its film layer and incident illuminationiFilm layer in this Tilted MLL is compiled
Number meet Bragg condition for two neighboring film layer middle.Angle thetaiCan be obtained by Bragg formula, 2 [2d (im)]sinθi=
λ, i in formulamFor the numbering of middle film layer in this Tilted MLL, im=(if+il)/2,ifAnd ilIt is this Tilted MLL respectively
Ground floor and the numbering of last layer, d (im) it is i for numberingmFilm layer thickness, its value is given by step (3).
(6) the 1st Tilted MLL (the Tilted MLL in innermost layer region) in MLL is combined for many inclinations angle, it the
One tunic layer (assuming that film layer is numbered the is k) position on exit facet is given by zone plate formula, xre(k)=(k λ f)1/2, entering
Penetrate the position x on facein(k)=xre(k)+w×tan(θ1), in formula, w is according to the calculated optimum depth of Wedge MLL, θ1
It is the angle of film layer and incident illumination in the 1st Tilted MLL.Position on exit facet for the second layer film layer is xre(k+1)=
xre(k)+d(k+1)/cos(θ1), the position on the plane of incidence is xin(k+1)=xin(k)+d(k+1)/cos(θ1), subsequent film
Position by that analogy.
(7) the 2nd Tilted MLL in MLL, its ground floor film layer (assuming that film layer is numbered is p) are combined for many inclinations angle
Position on exit facet, xre(p)=xre(p-1)+d(p)/cos(θ1), the position x on the plane of incidencein(p)=xre(p)+w
×tan(θ2).Position on exit facet for the second layer film layer is xre(p+1)=xre(p)+d(p+1)/cos(θ2), in the plane of incidence
On position be xin(p+1)=xin(p)+d(p+1)/cos(θ2), the position of subsequent film is by that analogy.
(8) for many inclinations angle be combined MLL in the 2nd later Tilted MLL, the derivation of its film layer position with the 2nd
Tilted MLL is identical.
(9) principle according to two way classification, calculates many inclinations angle first and is combined MLL by 2 (21) Tilted MLL constitute when
Situation.Specifically i.e. first by m=21Substitute into and in step (4), (5), (6), (7) and (8), obtain the compound MLL's in many inclinations angle
Concrete structure parameter, then calculate the wavefront distribution at optimum depth with TTD or CWT, then use Fresnel-Kiel again
Hough diffraction integral calculates the light distribution of near focal point and the strongest of near focal point；Judge that the light intensity of near focal point is divided
Whether Butut has obvious interference fringe, judges that whether Strehl Ratio is more than 0.8, here Strehl Ratio refer to many
Inclination angle is combined the strongest of MLL and the ratio of Wedge MLL strongest (being calculated by step (2)).If focus
Nearby there is obvious interference fringe and Strehl Ratio<0.8, then calculate many inclinations angle successively and be combined MLL by 22、23、
24、……、2j... situation when individual Tilted MLL is constituted.If when many inclinations angle are combined MLL by 2jIndividual Tilted MLL
During composition, near focal point does not have obvious interference fringe and Strehl Ratio>0.8, then stop calculating.Now many inclinations angle are multiple
Close MLL by 2jIndividual Tilted MLL is constituted, and its each tunic layer can be by aforesaid in the location parameter of the plane of incidence and exit facet
Obtained by step.Here it is to be noted that being generally equal to 2 according to principle m of two way classificationl(l=1,2,3 ... ...), but this
It is not absolute, it can take any positive integer value, as long as meet the middle of this step requiring, i.e. the light intensity of near focal point
Whether scattergram has obvious interference fringe, and whether Strehl Ratio is more than 0.8.
(10) result of calculation according to step (9), calculates by 2 with CWT or TTDjIt is many that individual Tilted MLL is constituted
Inclination angle is combined diffraction efficiency under different depth for the MLL, obtains new optimum depth value.Calculate the exit facet in optimum depth
On wavefront distribution, calculate the light distribution of near focal point and near focal point with Fresnel-Kirchhoff diffraction integral
Strong peak value, obtains this many inclination angle and is combined efficiency corresponding to MLL, focus resolution and Strehl Ratio.
Compared with prior art, the present invention has the following advantages that：
1, in the case of physics bore identical, compared with single Tilted MLL, many inclinations angle are combined MLL and are realizing spreading out
Emitter-base bandgap grading limit has higher efficiency when focusing on.
2, compared with Wedge MLL, because many inclinations angle are combined which floor only little film layer of MLL, there are different inclinations
Angle, therefore can greatly reduce technology difficulty, have the efficiency similar to Wedge MLL simultaneously again.
Brief description
Fig. 1 is the structural representation of the present invention；
Fig. 2 is single Tilted MLL, Wedge MLL and many inclinations angle are combined MLL when realizing diffraction limit focusing
Diffraction efficiency distribution figure on exit facet.
Fig. 3 is different MLL in the intensity distribution realizing near focal point when diffraction limit focuses on, z along incident light direction,
X is perpendicular to incident light direction；Wherein figure (a) is single Tilted MLL, schemes (b) single Wedge MLL, schemes (c) to be many inclinations
Angle is combined MLL.
Fig. 4 is single Tilted MLL, Wedge MLL and many inclinations angle are combined MLL when realizing diffraction limit focusing
The curve of light distribution on optimal focal plane, x is perpendicular to incident light direction.
Fig. 5 is that different MLL constitute the intensity distribution near focal point for the compound MLL in many inclinations angle, and z is along incident illumination side
To x is perpendicular to incident light direction；Wherein, (a) is made up of figure 2 Tilted MLL, (b) is constituted, schemed by 4 Tilted MLL
C () is made up of 8 Tilted MLL.
Wherein, 1,2 and 3 it is respectively the 1st, the 2nd and the 3rd Tilted MLL in the compound MLL in many inclinations angle；4 and 5 points
Wei not position on the plane of incidence and exit facet for the ground floor film layer in the 1st Tilted MLL；6 and 7 are respectively the 2nd Tilted
Position on the plane of incidence and exit facet for the ground floor film layer in MLL；8 is incident X-rays.
Specific embodiment
The present invention is described in detail with reference to the accompanying drawings and examples.
Embodiment：
1 it is assumed that incident X-ray energy be 12.0keV it is desirable to diffraction limit focus resolution be 10nm, according to plated film
Ability, selected focal length f be 4mm, now about 41.3 microns of film layer gross thickness；Precision according to plated film and operating distance, choosing
Determining outermost layer thicknesses of layers is 4nm, and it is 6458 that its film layer is numbered, and innermost layer thicknesses of layers is 20nm, and it is 258 that film layer is numbered, always
Film layer number N be 6200 layers.
2, calculate diffraction efficiency under different depth for the Wedge MLL with TTD, obtain about 12 microns of optimum depth value.
As shown in Fig. 2 total efficiency about 47.06%, near focal point intensity distributions are as shown in figure 3, most preferably burnt flat for its diffraction efficiency distribution
The curve of light distribution on face is as shown in figure 4, strongest about 1944.
3, the thickness of each of Flat MLL film layer is calculated according to zone plate formula.
4, assume initially that many inclinations angle are combined MLL and are made up of 2 Tilted MLL, the film layer number of each Tilted MLL is
3100 layers.In 1st Tilted MLL, film layer and the angle of incident X-rays are 3.42mrad, and its 1st, 2 tunic layer is on the plane of incidence
Position be respectively 10.36699,10.38698 microns, the position on exit facet is respectively 10.32599,10.34599 micro-
Rice；In 2nd Tilted MLL, film layer and the angle of incident illumination are 5.63mrad, its 1st, 2 tunic layer position on the plane of incidence
Put respectively 37.32636,37.33191 microns, the position on exit facet is respectively 37.25881,37.26435 microns.Fortune
It is calculated the wavefront distribution on exit facet at 12 microns of optimum depth with CWT, amassing with Fresnel-Kirchhoff diffraction
Point calculate the light distribution of near focal point and the strongest of near focal point, near focal point light distribution is as shown in figure 5, highest peak
It is worth about 422.5, near focal point has obvious interference fringe as can be seen from Figure 5, and Strehl Ratio is about 0.217.Cause
Many inclinations angle that this 2 Tilted MLL are constituted are combined MLL and are unsatisfactory for requiring.
5, continue to calculate situation when the compound MLL in many inclinations angle is made up of 4 Tilted MLL, each Tilted MLL's
Film layer number is 1550 layers.In 1st Tilted MLL, film layer and the angle of incident X-rays are 2.58mrad, and its 1st, 2 tunic layer exists
Position on the plane of incidence is respectively 10.35698,10.37697 microns, the position on exit facet respectively 10.32599,
10.34599 microns；In 2nd Tilted MLL, film layer and the angle of incident illumination are 4.08mrad, and its 1st, 2 tunic layer is entering
The position penetrated on face is respectively 27.39176,27.39932 microns, the position on exit facet respectively 27.34276,
27.35031 microns；In 3rd Tilted MLL, film layer and the angle of incident illumination are 5.17mrad, and its 1st, 2 tunic layer is entering
The position penetrated on face is respectively 37.32078,37.32633 microns, the position on exit facet respectively 37.25879,
37.26434 microns；In 4th Tilted MLL, film layer and the angle of incident illumination are 6.06mrad, and its 1st, 2 tunic layer is entering
The position penetrated on face is respectively 45.11504,45.11963 microns, the position on exit facet respectively 45.04235,
45.04693 microns.As shown in figure 5, strongest about 848.7, focus is attached as can be seen from Figure 5 for its near focal point light distribution
Closely there is obvious interference fringe, and Strehl Ratio is about 0.437.Many inclinations angle that therefore 4 Tilted MLL are constituted
Compound MLL is unsatisfactory for requiring.
6, continue to calculate situation when the compound MLL in many inclinations angle is made up of, front 7 Tilted MLL 8 Tilted MLL
Film layer number be 776 layers, the film layer number of last Tilted MLL is 768 layers.Film layer and incidence in 1st Tilted MLL
The angle of X-ray is 2.04mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 10.35049,10.37049 microns,
Position on exit facet is respectively 10.32599,10.34599 microns；Film layer and incident X-rays in 8th Tilted MLL
Angle is 6.23mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 48.57265,48.57691 microns, is going out
The position penetrated on face is respectively 48.49747,48.50173 microns.Its near focal point light distribution is as shown in figure 5, strongest
About 1328, as can be seen from Figure 5 near focal point deposit certain interference fringe, and Strehl Ratio is about 0.683.Therefore 8
It is not to meet very much to require that many inclinations angle that individual Tilted MLL is constituted are combined MLL.
7, continue to calculate situation when the compound MLL in many inclinations angle is made up of, front 15 Tilted 16 Tilted MLL
The film layer number of MLL is 388 layers, and the film layer number of last Tilted MLL is 380 layers.In 1st Tilted MLL film layer with
The angle of incident X-rays is 1.71mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 10.34648,10.36648
Micron, the position on exit facet is respectively 10.32599,10.34599 microns；Film layer and incidence in 16th Tilted MLL
The angle of X-ray is 6.36mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 50.19983,50.20395 microns,
Position on exit facet is respectively 50.12346,50.12758 microns.Its near focal point light distribution is as shown in figure 3, the strongest
Peak value about 1746, as can be seen from Figure 3 near focal point be substantially not present interference fringe, and Strehl Ratio is about 0.898.Cause
Many inclinations angle that this is made up of 16 Tilted MLL are combined MLL and meet requirement.
8, recalculate the optimum depth that the many inclinations angle being made up of 16 Tilted MLL are combined MLL, remain 12 micro-
Rice.
9, single Tilted MLL, Wedge MLL and many inclinations angle of being made up of 16 Tilted MLL are combined MLL and exist
Realize diffraction efficiency distribution on exit facet when diffraction limit focuses on, on the intensity distributions of near focal point and optimal focal plane
Respectively as shown in Fig. 2,3 and 4, single Tilted MLL focuses in the diffraction limit realizing having maximal efficiency here for light distribution
When, depth is 5 microns, and inclination angle is 4.85mrad.It can be seen that when realizing diffraction limit focusing, many inclinations angle
Compound MLL has the diffraction efficiency and focal beam spot peak strength far above single Tilted MLL, its focusing performance close to
Wedge MLL, has simpler structure simultaneously again, can greatly reduce technology difficulty.
The application is not limited to the embodiment that the present invention records in detail, and those skilled in the art can make various to this
Modification, for example, change focal length, focus resolution etc., but as long as these change spirit and the intention without departing substantially from the present invention, still exist
In protection scope of the present invention.
Claims (8)
1. a kind of many inclinations angle composite multilayer membrane Laue lens are it is characterised in that include m along perpendicular to the arrangement of incident light direction
Apsacline multilayer film Laue lens, after each described apsacline multilayer film Laue lens arrangement film layer numbering and thicknesses of layers press
Determine according to zone plate formula；Positioned at first film layer of central area apsacline multilayer film Laue lens described in first, its volume
Number be k, the position on the plane of incidence is by formula xin(k)=xre(k)+w×tan(θ1) determine, w is according to wedge shape multilayer film Laue
The calculated optimum depth of lens design, θ1It is the folder of the film layer of apsacline multilayer film Laue lens described in first and incident illumination
Angle, xinK () is film layer k in the position of the plane of incidence, xreK () is film layer k in the position of exit facet, xre(k)=(k λ f)1/2, λ is
Lambda1-wavelength, f is selected focal length, second film layer exit facet position xre(k+1)=xre(k)+d(k+1)/cos(θ1),
Position on the plane of incidence is xin(k+1)=xin(k)+d(k+1)/cos(θ1), d (k+1) is the thickness of second film layer, subsequently
The position of film layer is by that analogy；The ground floor film layer of apsacline multilayer film Laue lens described in i-th, it is numbered is p, in outgoing
Position x on facere(p)=xre(p-1)+d(p)/cos(θi-1), the position x on the plane of incidencein(p)=xre(p)+w×tan
(θi), position on exit facet for the second layer film layer is xre(p+1)=xre(p)+d(p+1)/cos(θi), the position on the plane of incidence
It is set to xin(p+1)=xin(p)+d(p+1)/cos(θi), d (p+1) is the thickness of the second film layer, and the position of subsequent film is with such
Push away；θiIt is the angle of the film layer of apsacline multilayer film Laue lens described in i-th and incident illumination, i value is 2～m；Wherein, often
All film layers in apsacline multilayer film Laue lens described in and incident illumination have identical angle；This many inclination angle is combined many
Tunic Laue lens are capable of diffraction limit and focus on；M is more than 2.
2. as claimed in claim 1 many inclinations angle composite multilayer membrane Laue lens it is characterised in that each described apsacline is many
In tunic Laue lens, two neighboring film layer middle meets Bragg condition：2[2d(im)]sinθi=λ, im=(if+il)/
2,ifAnd ilIt is the film layer numbering of described apsacline multilayer film Laue lens ground floor and last layer respectively, d (im) for numbering be
imFilm layer thickness.
3. as claimed in claim 2 many inclinations angle composite multilayer membrane Laue lens it is characterised in that each described apsacline multilamellar
There is between film Laue lens the equal number of plies or the number of plies of film layer quantity difference minimum.
4. as claimed in claim 2 many inclinations angle composite multilayer membrane Laue lens it is characterised in that each described apsacline multilamellar
The plane of incidence of film Laue lens and exit facet are parallel to each other, and perpendicular to incident illumination.
5. a kind of many inclinations angle composite multilayer membrane Laue lens design method, its step is：
1) according to zone plate formula x (n)2=n λ f determines that the film layer of all film layers in the composite multilayer membrane Laue lens of many inclinations angle is compiled
Number and thicknesses of layers, and the initial position of each film layer；Wherein, x (n) refers to the initial position of film layer numbering n, λ be into
Penetrate optical wavelength, f is selected focal length；
2) according to 1) given wavelength, focal length and film layer numbering, calculate wedge shape multilayer film Laue lens under different depth
Wavefront distribution and diffraction efficiency, the optimum depth obtaining；Calculate burnt further according to the wavefront distribution on exit facet at optimum depth
Strongest I near point1；
3) adjustment film layer and the angle of incident illumination, all film layers are divided into m along the inclination perpendicular to the arrangement of incident light direction
Type multilayer film Laue lens, wherein, all film layers in each described apsacline multilayer film Laue lens have phase with incident illumination
Same angle, m is more than 2；
4) calculate 3) gained apsacline multilayer film Laue lens near focal point strongest I2；Judge ratio I2/I1Whether big
In given threshold；If it is not, then change m value, repeat step 3), 4), until ratio I2/I1More than given threshold.
6. method as claimed in claim 5 is it is characterised in that be divided into m along perpendicular to incident light direction by all film layers
The apsacline multilayer film Laue lens of arrangement, the method calculating film layer position and angle in described apsacline multilayer film Laue lens
For：Being set in first film layer of apsacline multilayer film Laue lens described in the first of central area, to number be k, and it is in the plane of incidence
On position by formula xin(k)=xre(k)+w×tan(θ1) determine, w is to be calculated according to wedge shape multilayer film Laue lens design
The optimum depth arriving, θ1It is the angle of the film layer of apsacline multilayer film Laue lens described in first and incident illumination, xinK () is film layer
K is in the position of the plane of incidence, xreK () is film layer k in the position of exit facet, xre(k)=(k λ f)1/2, λ is lambda1-wavelength, and f is
The focal length selected, second film layer exit facet position xre(k+1)=xre(k)+d(k+1)/cos(θ1), the position on the plane of incidence
It is set to xin(k+1)=xin(k)+d(k+1)/cos(θ1), d (k+1) is the thickness of second film layer, and the position of subsequent film is with this
Analogize；The ground floor film layer of apsacline multilayer film Laue lens described in i-th, it is numbered is p, the position x on exit facetre
(p)=xre(p-1)+d(p)/cos(θi-1), the position x on the plane of incidencein(p)=xre(p)+w×tan(θi), the second tunic
Position on exit facet for the layer is xre(p+1)=xre(p)+d(p+1)/cos(θi), the position on the plane of incidence is xin(p+1)
=xin(p)+d(p+1)/cos(θi), d (p+1) is the thickness of the second film layer, and the position of subsequent film is by that analogy；θiIt is i-th
The film layer of individual described apsacline multilayer film Laue lens and the angle of incident illumination, i value is 2～m.
7. the method as described in claim 5 or 6 is it is characterised in that have between each described apsacline multilayer film Laue lens
The equal number of plies or the number of plies of film layer quantity difference minimum；In each described apsacline multilayer film Laue lens, middle
Two neighboring film layer meets Bragg condition：2[2d(im)]sinθi=λ, im=(if+il)/2,ifAnd ilIt is described inclination respectively
The film layer numbering of type multilayer film Laue lens ground floor and last layer, d (im) it is i for numberingmFilm layer thickness.
8. method as claimed in claim 5 is it is characterised in that change described m value using two way classification.
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|---|---|---|---|---|
| US4709384A (en) * | 1985-02-12 | 1987-11-24 | U.S. Philips Corporation | Laue camera |
| CN103021496A (en) * | 2011-09-24 | 2013-04-03 | 同济大学 | Advanced multilayered Laue lens for hard X-ray focusing |
| CN103151089A (en) * | 2011-12-06 | 2013-06-12 | 同济大学 | Hard X-ray micro-focus multi-thickness-ratio composite multi-layer film Laue lens |
| DE102013005845B3 (en) * | 2013-04-02 | 2014-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Wedge-shaped multilayer laue lens for e.g. nano-focus at synchrotron radiation source, has layers altered along radiography direction on basis of X-ray radiation that impinges up to changed surface from emerged X-ray radiation |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4709384A (en) * | 1985-02-12 | 1987-11-24 | U.S. Philips Corporation | Laue camera |
| CN103021496A (en) * | 2011-09-24 | 2013-04-03 | 同济大学 | Advanced multilayered Laue lens for hard X-ray focusing |
| CN103151089A (en) * | 2011-12-06 | 2013-06-12 | 同济大学 | Hard X-ray micro-focus multi-thickness-ratio composite multi-layer film Laue lens |
| DE102013005845B3 (en) * | 2013-04-02 | 2014-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Wedge-shaped multilayer laue lens for e.g. nano-focus at synchrotron radiation source, has layers altered along radiography direction on basis of X-ray radiation that impinges up to changed surface from emerged X-ray radiation |
Non-Patent Citations (2)
| Title |
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| Multilayer Laue Lens: A Path Toward One Nanometer X-Ray Focusing;Hanfei Yan et al.;《X-Ray Optics and Instrumentation》;20101231;第2010卷;第1-10页 * |
| Takagi-Taupin description of x-ray dynamical diffraction from diffractive optics with large numerical aperture;Hanfei Yan et al.;《PHYSICAL REVIEW B》;20070927;第76卷;第115438页 * |
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