CN104575656A - Multi-inclination-angle composite multi-film Laue lens and design method thereof - Google Patents
Multi-inclination-angle composite multi-film Laue lens and design method thereof Download PDFInfo
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- CN104575656A CN104575656A CN201510021478.7A CN201510021478A CN104575656A CN 104575656 A CN104575656 A CN 104575656A CN 201510021478 A CN201510021478 A CN 201510021478A CN 104575656 A CN104575656 A CN 104575656A
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/065—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using refraction, e.g. Tomie lenses
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Abstract
The invention discloses a multi-inclination-angle composite multi-film Laue lens. The lens comprises m inclined multi-film Laue lens bodies arranged in the direction perpendicular to incident light. The included angles between all film layers in each inclined multi-film Laue lens body and the incident light are equal. The multi-inclination-angle composite multi-film Laue lens can achieve diffraction limit focusing. M is larger than two. The thickness of the film layers of the inclined multi-film Laue lens body close to the central area is large, and the included angle between the film layers of the inclined multi-film Laue lens body and the incident light is small. The thickness of the film layers of the inclined multi-film Laue lens body close to the outer area is small, and the included angle between the film layers of the inclined multi-film Laue lens body and the incident light is large. The multi-inclination-angle composite multi-film Laue lens has the focusing performance close to that of Wedge MLL, and processing and implementation are easy.
Description
Technical field
The present invention relates to a kind of hard X ray nano-focusing optical element and method for designing thereof, particularly relate to multilayer film Laue lens, belong to synchrotron radiation light beam line engineering, synchrotron radiation optics field
Background technology
The peculiar property that the characteristics such as the high brightness that third generation synchrotron radiation has, high collimation and hard X ray have, such as strong penetration capacity, to structural information and semiochemical susceptibility, insensitivity etc. to electromagnetic field, hard X ray microscope is had at numerous areas such as materialogy, medical science, biology and environmental sciences and uses widely.The performance of X-ray microscope depends on light intensity and the size of focal beam spot.Up to now, various magnitude utilizing reflection, refraction and the focusing optic of diffraction hard X ray can have been focused on tens nanosizeds.In these focusing optics, diffraction type concentrating element---multilayer film Laue lens (MLL) are hopeful the focusing (list of references: H.Yan et al. of the nanometer scale (1nm) realized truly most, Multilayer Laue Lens:A Path Toward One Nanometer X-Ray Focusing, X-ray Opt.Instrum.2010,401845 (2010)).Current MLL realizes to hard X ray the one-dimensional focusing that highest resolution is about 11nm experimentally, efficiency about 15%; The two-dimension focusing of 25 × 27nm, efficiency about 2%.
Because MLL has great depth-to-width ratio (along the degree of depth in incident light direction and the ratio of outermost layer thicknesses of layers), X ray propagation wherein must adopt Diffraction Dynamics to describe, and now can whether every skim layer meet Bragg condition MLL and obtain the high-resolution key of high-level efficiency.The degree of Bragg condition is met according to rete, multilayer film Laue lens can be divided into Four types: horizontal type (Flat), apsacline (Tilted), Wedge (wedge shape) and flexure type (Curved) (list of references: H.Yanet al., Takagi-Taupin description ofx-ray dynamical diffraction from diffractive optics with largenumerical aperture, Phys.Rev.B 76,115438 (2007)).In this Four types, Flat with Tilted MLL is the same on structural nature, angle unlike its all rete of Flat MLL and incident light is all 0, all retes do not meet Bragg condition, and its all rete of Tilted MLL and incident light have identical angle, only some rete meets Bragg condition.Therefore for Tilted MLL, realize diffraction limit to focus on, the degree of depth must be reduced, reduce the impact of Diffraction Dynamics effect as far as possible, this will inevitably cause it to only have lower efficiency (list of references: Hanfei Yan et al., Optimization ofmultilayer Laue lenses for a scanning X-ray microscope, J.Synchrotron Rad.20,89 (2013)).Its each rete of WedgeMLL has different pitch angle, and all retes are all similar to and meet Bragg condition, and the calculated results shows it can realize the focusing of high efficiency diffraction limit.Tilted MLL process for plating is relatively simple, and the MLL experimentally reported at present belongs to this type substantially, and Wedge MLL is due to the complicacy of its structure, causes its process for plating more difficult, yet there are no report experimentally.
Summary of the invention
The object of the invention is to propose a kind of new MLL structure---many pitch angle compound MLL, to solve the problem that Tilted MLL realizes efficiency low and Wedge MLL process for plating difficulty when diffraction limit focuses on.
The present invention can be achieved through the following technical solutions:
A kind of many pitch angle compound MLL, is characterized in that: this many pitch angle compound MLL is formed along arranging perpendicular to incident light direction by a series of Tilted MLL; For wherein single Tilted MLL, its all rete has identical angle with incident light; Near the Tilted MLL that central area thicknesses of layers is larger, its rete and incident light have less angle; Near the Tilted MLL that outer region thicknesses of layers is less, its rete and incident light have larger angle; This many pitch angle compound MLL can realize diffraction limit and focus on, and has the focusing performance be close with Wedge MLL.
Described each Tilted MLL has equal or approximately equalised rete quantity.
In described single Tilted MLL, the angle theta of its rete and incident light makes rete in this Tilted MLL be numbered middle adjacent two retes to meet Bragg condition.
Described many pitch angle compound MLL, its plane of incidence and exit facet are parallel to each other, and perpendicular to incident light.
Described many pitch angle compound MLL, its concrete structure parameter can be realized by following step:
(1) first select suitable focal distance f according to the energy (wavelength X) of incident X-rays, the ability (rete gross thickness L) of plated film and focus resolution r, f can be obtained by Rayleigh criterion formula, r=0.5 λ/NA ≈ λ f/L; Operating distance w as requested again
dand the scheme that the accuracy selection one of actual plated film is compromise, determine the numbering n of the thickness of outermost layer thicknesses of layers in Flat MLL, innermost layer rete, total rete number N and every skim layer, specifically namely first by operating distance formula w
d=f ε tries to achieve ε, ε here=(x
o-L)/x
o, x
orefer to the position of outermost layer rete, now can obtain the numbering n of outermost layer thicknesses of layers, innermost layer thicknesses of layers, total rete number N and every skim layer according to zone plate formula.It needs to be noted here in the technical program, in Flat MLL, the numbering n of every skim layer is fixing, and it is determined x (n) by zone plate formula
2=n λ f, x (n) refers to the position of the rete being numbered n; And the numbering of every skim layer is identical with Flat MLL in the compound MLL of many pitch angle, namely in the compound MLL of many pitch angle, the i-th tunic layer is the same with the numbering of the i-th tunic layer in Flat MLL, and their total rete number N are also the same.
(2) according to described wavelength, focal length, outermost layer and innermost layer thicknesses of layers, the wavefront that utilization Diffraction Dynamics theory T akagi-Taupin description of dynamical diffraction theory (TTD) or Coupled wave theory (CWT) calculate under Wedge MLL different depth distributes and diffraction efficiency (list of references: H.Yan et al., Takagi-Taupindescription of x-ray dynamical diffraction from diffractive optics with large numerical aperture, Phys.Rev.B 76, 115438 (2007), J.Maser et al., Coupled wave description ofthe diffraction byzone plates with high aspect ratios, Opt.Commun.89,355 (1992)) optimum depth (degree of depth corresponding to diffraction efficiency maximal value), is obtained, simultaneously according to the wavefront distribution on optimum depth place exit facet, then use Fresnel-Kirchhoff diffraction integral to calculate the light distribution of near focal point, obtain the strongest of near focal point.
(3) according to the thickness of skim layer every in zone plate formulae discovery Flat MLL, d (n)=x (n)-x (n-1), in formula, d (n) refers to the thickness of the rete being numbered n.
(4) suppose that many pitch angle compound MLL is combined by m Tilted MLL, the rete number of each Tilted MLL is N/m.If N/m is not integer, then to its round Int (N/m+0.5), the number of plies had more or minus is calculated on the Tilted MLL of outermost region, its rete number is N-(m-1) × Int (N/m+0.5), and the rete number of other Tilted MLL is Int (N/m+0.5).
(5) for i-th Tilted MLL, the angle theta of its rete and incident light
imake rete in this Tilted MLL be numbered middle adjacent two retes and meet Bragg condition.Angle theta
ican be obtained by Bragg formula, 2 [2d (i
m)] sin θ
i=λ, i in formula
mfor the numbering of middle film layer most in this Tilted MLL, i
m=(i
f+ i
l)/2, i
fand i
lthe numbering of this Tilted MLL ground floor and last one deck respectively, d (i
m) for being numbered i
mthe thickness of rete, its value is given by step (3).
(6) for the 1st Tilted MLL (the Tilted MLL in innermost layer region) in the compound MLL of many pitch angle, its ground floor rete (supposes that the position that rete is numbered k) on exit facet is given by zone plate formula, x
re(k)=(k λ f)
1/2, the position x on the plane of incidence
in(k)=x
re(k)+w × tan (θ
1), in formula, w is the optimum depth calculated according to Wedge MLL, θ
1it is the angle of rete and incident light in the 1st Tilted MLL.The position of second layer rete on exit facet is x
re(k+1)=x
re(k)+d (k+1)/cos (θ
1), the position on the plane of incidence is x
in(k+1)=x
in(k)+d (k+1)/cos (θ
1), the position of subsequent film is by that analogy.
(7) for the 2nd Tilted MLL in the compound MLL of many pitch angle, its ground floor rete (supposes that rete is numbered position p) on exit facet, x
re(p)=x
re(p-1)+d (p)/cos (θ
1), the position x on the plane of incidence
in(p)=x
re(p)+w × tan (θ
2).The position of second layer rete on exit facet is x
re(p+1)=x
re(p)+d (p+1)/cos (θ
2), the position on the plane of incidence is x
in(p+1)=x
in(p)+d (p+1)/cos (θ
2), the position of subsequent film is by that analogy.
(8) for the 2nd later Tilted MLL in the compound MLL of many pitch angle, the derivation of its rete position is identical with the 2nd Tilted MLL.
(9) according to the principle of dichotomy, many pitch angle compound MLL is first calculated by 2 (2
1) Tilted MLL form time situation.Specifically namely first by m=2
1substitute into the concrete structure parameter obtaining many pitch angle compound MLL in step (4), (5), (6), (7) and (8), the wavefront using TTD or CWT to calculate at optimum depth place again distributes, and then uses Fresnel-Kirchhoff diffraction integral to calculate the light distribution of near focal point and the strongest of near focal point; Judge whether the surface of intensity distribution of near focal point has obvious interference fringe, judge whether Strehl Ratio is greater than 0.8, Strehl Ratio refers to the strongest of many pitch angle compound MLL and the ratio of Wedge MLL strongest (being calculated by step (2)) here.If near focal point has obvious interference fringe and Strehl Ratio<0.8, then calculate many pitch angle compound MLL successively by 2
2, 2
3, 2
4..., 2
j... situation when individual Tilted MLL is formed.If when many pitch angle compound MLL is by 2
jwhen individual TiltedMLL is formed, near focal point does not have obvious interference fringe and Strehl Ratio>0.8, then stop calculating.Now many pitch angle compound MLL is by 2
jindividual Tilted MLL is formed, and its every skim layer can be obtained by aforesaid step at the location parameter of the plane of incidence and exit facet.It is to be noted here and be generally equal to 2 according to the principle m of dichotomy
l(l=1,2,3 ...), but this is not absolute, it can get any positive integer value, requires as long as meet the middle of this step, and namely whether the surface of intensity distribution of near focal point has obvious interference fringe, and whether Strehl Ratio is greater than 0.8.
(10) according to the result of calculation of step (9), CWT or TTD is used to calculate by 2
jthe diffraction efficiency of many pitch angle compound MLL under different depth that individual Tilted MLL is formed, obtains new optimum depth value.Calculate the wavefront distribution when optimum depth on exit facet, use Fresnel-Kirchhoff diffraction integral to calculate the light distribution of near focal point and the strongest of near focal point, obtain the efficiency corresponding to the compound MLL of this many pitch angle, focus resolution and Strehl Ratio.
Compared with prior art, the present invention has following advantage:
1, when physics bore is identical, compared with single Tilted MLL, many pitch angle compound MLL has higher efficiency when realizing diffraction limit focusing.
2, compared with Wedge MLL, because many pitch angle compound MLL only has which floor little rete to have different pitch angle, therefore can reduce technology difficulty greatly, there is again the efficiency similar to Wedge MLL simultaneously.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is single Tilted MLL, Wedge MLL and the diffraction efficiency distribution figure of many pitch angle compound MLL when realizing diffraction limit and focusing on exit facet.
Fig. 3 is the intensity distribution of different MLL near focal point when realizing diffraction limit and focusing on, and z is along incident light direction, and x is perpendicular to incident light direction; Wherein scheme (a) for single Wedge MLL, figure (c) of single Tilted MLL, figure (b) be many pitch angle compound MLL.
Fig. 4 is single Tilted MLL, Wedge MLL and the curve of light distribution of many pitch angle compound MLL when realizing diffraction limit and focusing on best focal plane, and x is perpendicular to incident light direction.
Fig. 5 is that different MLL forms the intensity distribution of many pitch angle compound MLL near focal point, and z is along incident light direction, and x is perpendicular to incident light direction; Wherein, scheme that (a) is made up of 2 Tilted MLL, (b) be made up of 4 Tilted MLL, scheme (c) is made up of 8 Tilted MLL.
Wherein, 1,2 and 3 the 1st, the 2nd and the 3rd Tilted MLL in the compound MLL of many pitch angle is respectively; 4 and 5 are respectively the position of ground floor rete on the plane of incidence and exit facet in the 1st Tilted MLL; 6 and 7 are respectively the position of ground floor rete on the plane of incidence and exit facet in the 2nd Tilted MLL; 8 is incident X-rays.
Embodiment
Below in conjunction with drawings and Examples, the present invention is described in detail.
Embodiment:
1, assuming that incident X-ray energy is 12.0keV, the diffraction limit focus resolution of requirement is 10nm, and according to the ability of plated film, selected focal distance f is 4mm, now rete gross thickness about 41.3 microns; According to precision and the operating distance of plated film, selected outermost layer thicknesses of layers is 4nm, and its rete is numbered 6458, and innermost layer thicknesses of layers is 20nm, and rete is numbered 258, and total rete number N is 6200 layers.
2, use TTD to calculate the diffraction efficiency of Wedge MLL under different depth, obtain optimum depth value about 12 microns.Its diffraction efficiency distribution as shown in Figure 2, total efficiency about 47.06%, near focal point intensity distributions as shown in Figure 3, the curve of light distribution on best focal plane as shown in Figure 4, strongest about 1944.
3, according to the thickness of each rete in zone plate formulae discovery Flat MLL.
4, first suppose that many pitch angle compound MLL is made up of 2 Tilted MLL, the rete number of each Tilted MLL is 3100 layers.In 1st Tilted MLL, the angle of rete and incident X-rays is 3.42mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 10.36699,10.38698 microns, and the position on exit facet is respectively 10.32599,10.34599 microns; In 2nd Tilted MLL, the angle of rete and incident light is 5.63mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 37.32636,37.33191 microns, and the position on exit facet is respectively 37.25881,37.26435 microns.CWT is used to calculate the wavefront distribution on optimum depth 12 microns place exit facet, the light distribution of near focal point and the strongest of near focal point is calculated in utilization Fresnel-Kirchhoff diffraction integral, near focal point light distribution as shown in Figure 5, strongest about 422.5, there is obvious interference fringe near focal point as can be seen from Figure 5, and Strehl Ratio is about 0.217.Therefore many pitch angle compound MLL of 2 Tilted MLL formations does not meet the demands.
5, continue to calculate situation when many pitch angle compound MLL is made up of 4 Tilted MLL, the rete number of each Tilted MLL is 1550 layers.In 1st Tilted MLL, the angle of rete and incident X-rays is 2.58mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 10.35698,10.37697 microns, and the position on exit facet is respectively 10.32599,10.34599 microns; In 2nd Tilted MLL, the angle of rete and incident light is 4.08mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 27.39176,27.39932 microns, and the position on exit facet is respectively 27.34276,27.35031 microns; In 3rd Tilted MLL, the angle of rete and incident light is 5.17mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 37.32078,37.32633 microns, and the position on exit facet is respectively 37.25879,37.26434 microns; In 4th Tilted MLL, the angle of rete and incident light is 6.06mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 45.11504,45.11963 microns, and the position on exit facet is respectively 45.04235,45.04693 microns.As shown in Figure 5, strongest about 848.7, there is obvious interference fringe near focal point as can be seen from Figure 5, and Strehl Ratio is about 0.437 in its near focal point light distribution.Therefore many pitch angle compound MLL of 4 Tilted MLL formations does not meet the demands.
6, continue to calculate situation when many pitch angle compound MLL is made up of 8 Tilted MLL, the rete number of front 7 Tilted MLL is 776 layers, and the rete number of last Tilted MLL is 768 layers.In 1st Tilted MLL, the angle of rete and incident X-rays is 2.04mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 10.35049,10.37049 microns, and the position on exit facet is respectively 10.32599,10.34599 microns; In 8th Tilted MLL, the angle of rete and incident X-rays is 6.23mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 48.57265,48.57691 microns, and the position on exit facet is respectively 48.49747,48.50173 microns.As shown in Figure 5, strongest about 1328, near focal point deposits certain interference fringe as can be seen from Figure 5, and Strehl Ratio is about 0.683 in its near focal point light distribution.Therefore many pitch angle compound MLL of 8 Tilted MLL formations meets the demands very much.
7, continue to calculate situation when many pitch angle compound MLL is made up of 16 Tilted MLL, the rete number of front 15 Tilted MLL is 388 layers, and the rete number of last Tilted MLL is 380 layers.In 1st Tilted MLL, the angle of rete and incident X-rays is 1.71mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 10.34648,10.36648 microns, and the position on exit facet is respectively 10.32599,10.34599 microns; In 16th Tilted MLL, the angle of rete and incident X-rays is 6.36mrad, and its 1st, 2 tunic layer position on the plane of incidence is respectively 50.19983,50.20395 microns, and the position on exit facet is respectively 50.12346,50.12758 microns.As shown in Figure 3, strongest about 1746, substantially there is not interference fringe near focal point as can be seen from Figure 3, and Strehl Ratio is about 0.898 in its near focal point light distribution.Therefore the many pitch angle compound MLL be made up of 16 Tilted MLL meets the demands.
8, recalculate the optimum depth of the many pitch angle compound MLL be made up of 16 Tilted MLL, remain 12 microns.
9, light distribution on the intensity distributions of single Tilted MLL, Wedge MLL and many pitch angle compound MLL of being made up of 16 Tilted MLL diffraction efficiency distribution when realizing diffraction limit and focusing on exit facet, near focal point and best focal plane is respectively as shown in Fig. 2,3 and 4, single Tilted MLL is when the diffraction limit realizing having maximal efficiency focuses on here, the degree of depth is 5 microns, and pitch angle is 4.85mrad.As can be seen from the figure, when realizing diffraction limit and focusing on, many pitch angle compound MLL has diffraction efficiency far above single Tilted MLL and focal beam spot peak strength, and its focusing performance is close to Wedge MLL, there is again simpler structure simultaneously, technology difficulty can be reduced greatly.
The application is not limited to the embodiment that the present invention records in detail; those skilled in the art can make various amendment to this; such as change focal length, focus resolution etc., but as long as these amendments do not deviate from spirit of the present invention and intention, still in protection scope of the present invention.
Claims (10)
1. the composite multilayer membrane Laue lens of pitch angle more than, is characterized in that, comprise m along the apsacline multilayer film Laue lens perpendicular to the arrangement of incident light direction; Wherein, all retes in apsacline multilayer film Laue lens described in each have identical angle with incident light; These many pitch angle composite multilayer membrane Laue lens can realize diffraction limit and focus on; M is greater than 2.
2. many pitch angle as claimed in claim 1 composite multilayer membrane Laue lens, it is characterized in that, centrally region is to fringe region direction, and thicknesses of layers diminishes successively, the angle of rete and incident light becomes large successively.
3. many pitch angle as claimed in claim 1 or 2 composite multilayer membrane Laue lens, is characterized in that, the rete numbering after each described apsacline multilayer film Laue lens arrangement and thicknesses of layers are determined according to zone plate formula; Be positioned at central area first described in first rete of apsacline multilayer film Laue lens, it is numbered k, and the position on the plane of incidence is by formula x
in(k)=x
re(k)+w × tan (θ
1) determine, w is the optimum depth calculated according to wedge shape multilayer film Laue Lens Design, θ
1the rete of apsacline multilayer film Laue lens described in first and the angle of incident light, x
in(k) for rete k is in the position of the plane of incidence, x
re(k) for rete k is in the position of exit facet, x
re(k)=(k λ f)
1/2, λ is lambda1-wavelength, and f is selected focal length, second rete exit facet position x
re(k+1)=x
re(k)+d (k+1)/cos (θ
1), the position on the plane of incidence is x
in(k+1)=x
in(k)+d (k+1)/cos (θ
1), d (k+1) is the thickness of second rete, and the position of subsequent film is by that analogy; The ground floor rete of i-th described apsacline multilayer film Laue lens, it is numbered p, the position x on exit facet
re(p)=x
re(p-1)+d (p)/cos (θ
i-1), the position x on the plane of incidence
in(p)=x
re(p)+w × tan (θ
i), the position of second layer rete on exit facet is x
re(p+1)=x
re(p)+d (p+1)/cos (θ
i), the position on the plane of incidence is x
in(p+1)=x
in(p)+d (p+1)/cos (θ
i), d (p+1) is the thickness of the second rete, and the position of subsequent film is by that analogy; θ
ibe i-th described rete of apsacline multilayer film Laue lens and the angle of incident light, i value is 2 ~ m.
4. many pitch angle as claimed in claim 3 composite multilayer membrane Laue lens, is characterized in that, in apsacline multilayer film Laue lens described in each, middle adjacent two retes meet Bragg condition: 2 [2d (i
m)] sin θ
i=λ, i
m=(i
f+ i
l)/2, i
fand i
lthe rete numbering of described apsacline multilayer film Laue lens ground floor and last one deck respectively, d (i
m) for being numbered i
mthe thickness of rete.
5. many pitch angle as claimed in claim 4 composite multilayer membrane Laue lens, is characterized in that, have the equal number of plies or rete quantity differs the minimum number of plies between each described apsacline multilayer film Laue lens.
6. many pitch angle as claimed in claim 4 composite multilayer membrane Laue lens, is characterized in that, the plane of incidence and the exit facet of each described apsacline multilayer film Laue lens are parallel to each other, and perpendicular to incident light.
7. the composite multilayer membrane Laue lens design method of pitch angle more than, the steps include:
1) according to zone plate formula x (n)
2=n λ f determines rete numbering and the thicknesses of layers of all retes in the composite multilayer membrane Laue lens of many pitch angle, and the initial position of each rete; Wherein, x (n) refers to the initial position of rete numbering n, and λ is lambda1-wavelength and f is selected focal length;
2) according to 1) given wavelength, focal length and rete numbering, calculate the wavefront distribution of wedge shape multilayer film Laue lens under different depth and diffraction efficiency, the optimum depth obtained; The strongest I of near focal point is calculated again according to the wavefront distribution on optimum depth place exit facet
1;
3) angle of rete and incident light is adjusted, all retes are divided into m along the apsacline multilayer film Laue lens perpendicular to the arrangement of incident light direction, wherein, all retes in apsacline multilayer film Laue lens described in each have identical angle with incident light, and m is greater than 2;
4) 3 are calculated) gained apsacline multilayer film Laue lens are at the strongest I of near focal point
2; Judge ratio I
2/ I
1whether be greater than setting threshold value; If not, then change m value, repetition step 3), 4), until ratio I
2/ I
1be greater than setting threshold value.
8. method as claimed in claim 7, it is characterized in that, all retes are divided into m along the apsacline multilayer film Laue lens perpendicular to the arrangement of incident light direction, the method calculating rete position and angle in described apsacline multilayer film Laue lens for: be set in central area first described in first rete of apsacline multilayer film Laue lens be numbered k, its position on the plane of incidence is by formula x
in(k)=x
re(k)+w × tan (θ
1) determine, w is the optimum depth calculated according to wedge shape multilayer film Laue Lens Design, θ
1the rete of apsacline multilayer film Laue lens described in first and the angle of incident light, x
in(k) for rete k is in the position of the plane of incidence, x
re(k) for rete k is in the position of exit facet, x
re(k)=(k λ f)
1/2, λ is lambda1-wavelength, and f is selected focal length, second rete exit facet position x
re(k+1)=x
re(k)+d (k+1)/cos (θ
1), the position on the plane of incidence is x
in(k+1)=x
in(k)+d (k+1)/cos (θ
1), d (k+1) is the thickness of second rete, and the position of subsequent film is by that analogy; The ground floor rete of i-th described apsacline multilayer film Laue lens, it is numbered p, the position x on exit facet
re(p)=x
re(p-1)+d (p)/cos (θ
i-1), the position x on the plane of incidence
in(p)=x
re(p)+w × tan (θ
i), the position of second layer rete on exit facet is x
re(p+1)=x
re(p)+d (p+1)/cos (θ
i), the position on the plane of incidence is x
in(p+1)=x
in(p)+d (p+1)/cos (θ
i), d (p+1) is the thickness of the second rete, and the position of subsequent film is by that analogy; θ
ibe i-th described rete of apsacline multilayer film Laue lens and the angle of incident light, i value is 2 ~ m.
9. as claimed in claim 7 or 8 method, is characterized in that, has the equal number of plies or rete quantity differs the minimum number of plies between each described apsacline multilayer film Laue lens; In apsacline multilayer film Laue lens described in each, middle adjacent two retes meet Bragg condition: 2 [2d (i
m)] sin θ
i=λ, i
m=(i
f+ i
l)/2, i
fand i
lthe rete numbering of described apsacline multilayer film Laue lens ground floor and last one deck respectively, d (i
m) for being numbered i
mthe thickness of rete.
10. method as claimed in claim 7, it is characterized in that, described employing dichotomy changes described m value.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113903488A (en) * | 2021-09-30 | 2022-01-07 | 中国科学院高能物理研究所 | Single-order diffraction Laue lens and manufacturing method thereof |
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| US4709384A (en) * | 1985-02-12 | 1987-11-24 | U.S. Philips Corporation | Laue camera |
| CN103021496A (en) * | 2011-09-24 | 2013-04-03 | 同济大学 | Advanced multilayered Laue lens for hard X-ray focusing |
| CN103151089A (en) * | 2011-12-06 | 2013-06-12 | 同济大学 | Hard X-ray micro-focus multi-thickness-ratio composite multi-layer film Laue lens |
| DE102013005845B3 (en) * | 2013-04-02 | 2014-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Wedge-shaped multilayer laue lens for e.g. nano-focus at synchrotron radiation source, has layers altered along radiography direction on basis of X-ray radiation that impinges up to changed surface from emerged X-ray radiation |
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2015
- 2015-01-15 CN CN201510021478.7A patent/CN104575656B/en not_active Expired - Fee Related
Patent Citations (4)
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| US4709384A (en) * | 1985-02-12 | 1987-11-24 | U.S. Philips Corporation | Laue camera |
| CN103021496A (en) * | 2011-09-24 | 2013-04-03 | 同济大学 | Advanced multilayered Laue lens for hard X-ray focusing |
| CN103151089A (en) * | 2011-12-06 | 2013-06-12 | 同济大学 | Hard X-ray micro-focus multi-thickness-ratio composite multi-layer film Laue lens |
| DE102013005845B3 (en) * | 2013-04-02 | 2014-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Wedge-shaped multilayer laue lens for e.g. nano-focus at synchrotron radiation source, has layers altered along radiography direction on basis of X-ray radiation that impinges up to changed surface from emerged X-ray radiation |
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| HANFEI YAN ET AL.: "Multilayer Laue Lens: A Path Toward One Nanometer X-Ray Focusing", 《X-RAY OPTICS AND INSTRUMENTATION》 * |
| HANFEI YAN ET AL.: "Takagi-Taupin description of x-ray dynamical diffraction from diffractive optics with large numerical aperture", 《PHYSICAL REVIEW B》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113903488A (en) * | 2021-09-30 | 2022-01-07 | 中国科学院高能物理研究所 | Single-order diffraction Laue lens and manufacturing method thereof |
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