CN109884085A - 设备检测装置及其工作方法、半导体设备 - Google Patents
设备检测装置及其工作方法、半导体设备 Download PDFInfo
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- CN109884085A CN109884085A CN201910114619.8A CN201910114619A CN109884085A CN 109884085 A CN109884085 A CN 109884085A CN 201910114619 A CN201910114619 A CN 201910114619A CN 109884085 A CN109884085 A CN 109884085A
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- 238000001514 detection method Methods 0.000 title claims abstract description 64
- 239000004065 semiconductor Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000010438 heat treatment Methods 0.000 claims abstract description 38
- 238000012360 testing method Methods 0.000 claims abstract description 17
- 238000012545 processing Methods 0.000 claims abstract description 15
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 8
- 208000037656 Respiratory Sounds Diseases 0.000 claims description 14
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
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- 229910052740 iodine Inorganic materials 0.000 claims description 3
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05218163A (ja) * | 1991-12-11 | 1993-08-27 | Hitachi Ltd | 異物検査方法及びその装置 |
JP2002310932A (ja) * | 1991-12-11 | 2002-10-23 | Hitachi Ltd | 半導体デバイス処理装置の監視方法およびそのシステム |
WO2010028353A1 (en) * | 2008-09-08 | 2010-03-11 | Rudolph Technologies, Inc. | Wafer edge inspection |
CN102384908A (zh) * | 2010-09-01 | 2012-03-21 | 台达电子工业股份有限公司 | 基板内部缺陷检查装置及方法 |
US20150369753A1 (en) * | 2011-07-12 | 2015-12-24 | Kla-Tencor Corporation | Wafer Inspection |
CN108364879A (zh) * | 2017-01-26 | 2018-08-03 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的缺陷扫描方法及扫描装置 |
CN108519385A (zh) * | 2018-04-20 | 2018-09-11 | 全球能源互联网研究院有限公司 | 一种纤维在线监测装置及方法 |
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2019
- 2019-02-14 CN CN201910114619.8A patent/CN109884085B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05218163A (ja) * | 1991-12-11 | 1993-08-27 | Hitachi Ltd | 異物検査方法及びその装置 |
JP2002310932A (ja) * | 1991-12-11 | 2002-10-23 | Hitachi Ltd | 半導体デバイス処理装置の監視方法およびそのシステム |
WO2010028353A1 (en) * | 2008-09-08 | 2010-03-11 | Rudolph Technologies, Inc. | Wafer edge inspection |
CN102384908A (zh) * | 2010-09-01 | 2012-03-21 | 台达电子工业股份有限公司 | 基板内部缺陷检查装置及方法 |
US20150369753A1 (en) * | 2011-07-12 | 2015-12-24 | Kla-Tencor Corporation | Wafer Inspection |
CN108364879A (zh) * | 2017-01-26 | 2018-08-03 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的缺陷扫描方法及扫描装置 |
CN108519385A (zh) * | 2018-04-20 | 2018-09-11 | 全球能源互联网研究院有限公司 | 一种纤维在线监测装置及方法 |
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Effective date of registration: 20230719 Address after: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee after: Huaian Xide Industrial Design Co.,Ltd. Address before: No. 599, East Changjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: HUAIAN IMAGING DEVICE MANUFACTURER Corp. |
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Effective date of registration: 20240604 Address after: Room 3012, Building C, Lanzhou Science and Technology Innovation Park, No. 53 Donggang East Road, Chengguan District, Lanzhou City, Gansu Province, 730000 Patentee after: Great Wall Purple Crystal Technology (Gansu) Co.,Ltd. Country or region after: China Address before: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: Huaian Xide Industrial Design Co.,Ltd. Country or region before: China |
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