CN109884085B - 设备检测装置及其工作方法、半导体设备 - Google Patents
设备检测装置及其工作方法、半导体设备 Download PDFInfo
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- 238000001514 detection method Methods 0.000 title claims abstract description 48
- 239000004065 semiconductor Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 38
- 230000002238 attenuated effect Effects 0.000 claims abstract description 10
- 230000000149 penetrating effect Effects 0.000 claims abstract description 6
- 230000001681 protective effect Effects 0.000 claims description 21
- 238000007689 inspection Methods 0.000 claims description 7
- 239000013307 optical fiber Substances 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000004575 stone Substances 0.000 claims description 4
- AEEAZFQPYUMBPY-UHFFFAOYSA-N [I].[W] Chemical compound [I].[W] AEEAZFQPYUMBPY-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000012360 testing method Methods 0.000 claims 3
- 238000011017 operating method Methods 0.000 claims 2
- 238000000137 annealing Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000007547 defect Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102384908A (zh) * | 2010-09-01 | 2012-03-21 | 台达电子工业股份有限公司 | 基板内部缺陷检查装置及方法 |
CN108364879A (zh) * | 2017-01-26 | 2018-08-03 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的缺陷扫描方法及扫描装置 |
CN108519385A (zh) * | 2018-04-20 | 2018-09-11 | 全球能源互联网研究院有限公司 | 一种纤维在线监测装置及方法 |
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JPH05218163A (ja) * | 1991-12-11 | 1993-08-27 | Hitachi Ltd | 異物検査方法及びその装置 |
JP2002310932A (ja) * | 1991-12-11 | 2002-10-23 | Hitachi Ltd | 半導体デバイス処理装置の監視方法およびそのシステム |
TWI512865B (zh) * | 2008-09-08 | 2015-12-11 | Rudolph Technologies Inc | 晶圓邊緣檢查技術 |
US9279774B2 (en) * | 2011-07-12 | 2016-03-08 | Kla-Tencor Corp. | Wafer inspection |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102384908A (zh) * | 2010-09-01 | 2012-03-21 | 台达电子工业股份有限公司 | 基板内部缺陷检查装置及方法 |
CN108364879A (zh) * | 2017-01-26 | 2018-08-03 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的缺陷扫描方法及扫描装置 |
CN108519385A (zh) * | 2018-04-20 | 2018-09-11 | 全球能源互联网研究院有限公司 | 一种纤维在线监测装置及方法 |
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Effective date of registration: 20230719 Address after: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee after: Huaian Xide Industrial Design Co.,Ltd. Address before: No. 599, East Changjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: HUAIAN IMAGING DEVICE MANUFACTURER Corp. |
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Effective date of registration: 20240604 Address after: Room 3012, Building C, Lanzhou Science and Technology Innovation Park, No. 53 Donggang East Road, Chengguan District, Lanzhou City, Gansu Province, 730000 Patentee after: Great Wall Purple Crystal Technology (Gansu) Co.,Ltd. Country or region after: China Address before: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: Huaian Xide Industrial Design Co.,Ltd. Country or region before: China |