CN109742196A - A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell - Google Patents

A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell Download PDF

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Publication number
CN109742196A
CN109742196A CN201811575463.5A CN201811575463A CN109742196A CN 109742196 A CN109742196 A CN 109742196A CN 201811575463 A CN201811575463 A CN 201811575463A CN 109742196 A CN109742196 A CN 109742196A
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CN
China
Prior art keywords
cell piece
welding
low
solar cell
heterojunction solar
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CN201811575463.5A
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Chinese (zh)
Inventor
蒋江涛
庞伟
徐昕
彭德香
刘超
任栋梁
李媛媛
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China Wisdom (taixing) Power Technology Co Ltd
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China Wisdom (taixing) Power Technology Co Ltd
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Priority to CN201811575463.5A priority Critical patent/CN109742196A/en
Publication of CN109742196A publication Critical patent/CN109742196A/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention discloses a kind of low-temperature welding methods of monocrystalline silicon heterojunction solar cell, include the following steps;In the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 8-12nm thickness of Surface Texture of cell piece;In the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 18-22nm of backside deposition of c-Si piece;TCO conductive film is deposited on the two sides of cell piece using sputtering technology;Ag electrode is made on the two sides of cell piece using screen printing technique;The surface of cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;The cell piece in weldment is welded using welding;After weld seam is cooling, thermal insulation material is removed, surrounding between cell piece is uniformly smeared into marine glue and carries out frame encapsulation.The present invention provides a kind of low-temperature welding methods of monocrystalline silicon heterojunction solar cell, HIT battery silver paste in welding is greatly reduced to fall off, it greatly reduces HIT battery and burns TCO film in welding, greatly reduce HIT battery fragmentation in welding, increase production capacity.

Description

A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell
Technical field
The present invention relates to low-temperature bounding method field, specially a kind of low-temperature welding side of monocrystalline silicon heterojunction solar cell Method.
Background technique
The heterogeneous structure, assembly high conversion efficiency of monocrystalline silicon heterojunction solar cell is known as next-generation big rule by photovoltaic industry One of mould industrialization key technology, a big advantage of the heterogeneous structure, assembly of monocrystalline silicon heterojunction solar cell are its generating electricity on two sides spies Property it is very good, be a kind of ideal double-side solar cell component, in practical applications, solar cell when being made use low-temperature silver Slurry and low-temperature sintering jet deposition technique, cause its own to need to be attached with low-temperature welding mode, general in actual production Logical welding medium is that welding (Sn60%PB40%) welding temperature is high and HIT battery is ultra-thin silicon substrate fusion structure, in addition HIT battery Itself operational characteristic (low temperature) and silicon wafer (silicon substrate) sheet technology (reducing cost), be by conventional use of silicon wafer at this stage from 180 μm are thinned to 150 μm, realize that silicon wafer cost and battery cost will be greatly reduced in silicon wafer sheet, are advantageously implemented photovoltaic electric Pond component cheap internet access;
Pure tin will generate tin pest phenomenon in the case where being lower than minus 13 degree, and scolding tin becomes gray tin, and quality is as powder, once occur Tin pest can be infected quickly, so that the component desoldering being welded, can not restore, be occurred in the solar module of tangible early stage Cross this phenomenon, especially in extremely frigid zones, environment temperature is lower than minus 40 degree, extremely in the case where can reach minus 0 degree, it is general How much scolding tin gray tin phenomenon can all occurs, and the output power of component is caused to decline, and the decline of power caused by gray tin is irrecoverable 's;
Due to HIT low temperature manufacturing process itself and cell piece silicon substrate rationally be thinned etc. characteristics, this self character is in production process In can generate a large amount of fragmentation/crack/burning etc., process abnormality etc. is bad when in order to solve production, needs to pass through low-temperature welding Emphasis solves the problems, such as fragmentation of the Thin film cell in welding.
Summary of the invention
It is above-mentioned to solve the purpose of the present invention is to provide a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell The problem of being proposed in background technique.
To achieve the above object, the invention provides the following technical scheme: a kind of low temperature of monocrystalline silicon heterojunction solar cell Welding method includes the following steps;
Step 1: the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 8-12nm thickness of Surface Texture in cell piece;
Step 2: the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 18-22nm of backside deposition in c-Si piece;
Step 3: depositing TCO conductive film on the two sides of cell piece using sputtering technology;
Step 4: making Ag electrode on the two sides of cell piece using screen printing technique;
Step 5: the surface to cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;
Step 6: being welded using welding to the cell piece in weldment;
Step 7: wrapping up cell piece after the completion of welding using thermal insulation material, making weld seam Slow cooling;
Step 8: removing thermal insulation material after weld seam is cooling, surrounding between cell piece is uniformly smeared into marine glue and carries out frame envelope Dress.
Preferably, in step 6, welding is that two kinds of element compositions of addition bismuth metal, scolding tin content are 92-95% in scolding tin, Metal bi content is 5-8%.
Preferably, in step 6, welding be the unleaded quaternary scolding tin of tin silver copper bismuth, tin silver copper bismuth quaternary alloy Pb-free solder by Four kinds of element compositions of tin silver copper bismuth, bi content 1.5-4%, copper content 0.5-1%, silver content 2-4%, Theil indices 91-96%.
Preferably, for step 1 to step 8, whole techniques are accomplished below at 200 DEG C.
Preferably, in step 6, scaling powder auxiliary welding can be used and welded.
Compared with prior art, the beneficial effects of the present invention are: the present invention provides a kind of monocrystalline silicon heterojunction sun electricity The low-temperature welding method in pond,
1. present invention substantially reduces HIT batteries in welding, silver paste falls off (cross weld);
TCO film (burning) is burnt in welding 2. present invention substantially reduces HIT batteries;
3. present invention substantially reduces HIT battery welding when fragmentation;
4. reducing manufacturing cost invention increases production capacity.
Specific embodiment
Below in conjunction with the embodiment of the present invention, technical solution in the embodiment of the present invention is clearly and completely retouched It states, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based on the present invention In embodiment, every other implementation obtained by those of ordinary skill in the art without making creative efforts Example, shall fall within the protection scope of the present invention.
Embodiment 1:
The present invention provides a kind of technical solution: a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell, including following step Suddenly;
Step 1: the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 8nm thickness of Surface Texture in cell piece;
Step 2: the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 18nm of backside deposition in c-Si piece;
Step 3: depositing TCO conductive film on the two sides of cell piece using sputtering technology;
Step 4: making Ag electrode on the two sides of cell piece using screen printing technique;
Step 5: the surface to cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;
Step 6: being welded using welding to the cell piece in weldment, scaling powder auxiliary welding can be used and welded;
Welding is that two kinds of element compositions of addition bismuth metal, scolding tin content are 92% in scolding tin, and metal bi content is 8%, and bismuth metal is more Remaining electrons displacement in low temperature tin, to avoid the generation of tin pest;
Step 7: wrapping up cell piece after the completion of welding using thermal insulation material, making weld seam Slow cooling;
Step 8: removing thermal insulation material after weld seam is cooling, surrounding between cell piece is uniformly smeared into marine glue and carries out frame envelope Dress.
Embodiment 2:
A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell, includes the following steps;
Step 1: the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 9nm thickness of Surface Texture in cell piece;
Step 2: the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 19nm of backside deposition in c-Si piece;
Step 3: depositing TCO conductive film on the two sides of cell piece using sputtering technology;
Step 4: making Ag electrode on the two sides of cell piece using screen printing technique;
Step 5: the surface to cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;
Step 6: being welded using welding to the cell piece in weldment, scaling powder auxiliary welding can be used and welded;
Welding is that two kinds of element compositions of addition bismuth metal, scolding tin content are 95% in scolding tin, and metal bi content is 5%, and bismuth metal is more Remaining electrons displacement in low temperature tin, to avoid the generation of tin pest;
Step 7: wrapping up cell piece after the completion of welding using thermal insulation material, making weld seam Slow cooling;
Step 8: removing thermal insulation material after weld seam is cooling, surrounding between cell piece is uniformly smeared into marine glue and carries out frame envelope Dress.
Embodiment 3:
A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell, includes the following steps;
Step 1: the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 10nm thickness of Surface Texture in cell piece;
Step 2: the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 20nm of backside deposition in c-Si piece;
Step 3: depositing TCO conductive film on the two sides of cell piece using sputtering technology;
Step 4: making Ag electrode on the two sides of cell piece using screen printing technique;
Step 5: the surface to cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;
Step 6: being welded using welding to the cell piece in weldment, scaling powder auxiliary welding can be used and welded;
Welding is the unleaded quaternary scolding tin of tin silver copper bismuth, and tin silver copper bismuth quaternary alloy Pb-free solder is by four kinds of element groups of tin silver copper bismuth At, bi content 1.5%, copper content 0.5%, silver content 2%, Theil indices 96%, the unleaded quaternary scolding tin of tin silver copper bismuth considers weldering Fusing point is connect, low-temperature characteristics, the mobility of scolding tin, the factors such as the retrospective of scolding tin and fatigue life can be that photovoltaic module exist Use under rugged environment provides more perfect welding;
Step 7: wrapping up cell piece after the completion of welding using thermal insulation material, making weld seam Slow cooling;
Step 8: removing thermal insulation material after weld seam is cooling, surrounding between cell piece is uniformly smeared into marine glue and carries out frame envelope Dress.
Embodiment 4:
A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell, includes the following steps;
Step 1: the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 11nm thickness of Surface Texture in cell piece;
Step 2: the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 21nm of backside deposition in c-Si piece;
Step 3: depositing TCO conductive film on the two sides of cell piece using sputtering technology;
Step 4: making Ag electrode on the two sides of cell piece using screen printing technique;
Step 5: the surface to cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;
Step 6: being welded using welding to the cell piece in weldment, scaling powder auxiliary welding can be used and welded;
Welding is the unleaded quaternary scolding tin of tin silver copper bismuth, and tin silver copper bismuth quaternary alloy Pb-free solder is by four kinds of element groups of tin silver copper bismuth At bi content 4%, copper content 1%, silver content 3%, Theil indices 92%, it is molten that the unleaded quaternary scolding tin of tin silver copper bismuth considers welding Point, low-temperature characteristics, the mobility of scolding tin, the factors such as the retrospective of scolding tin and fatigue life can be photovoltaic module severe In the environment of use more perfect welding is provided;
Step 7: wrapping up cell piece after the completion of welding using thermal insulation material, making weld seam Slow cooling;
Step 8: removing thermal insulation material after weld seam is cooling, surrounding between cell piece is uniformly smeared into marine glue and carries out frame envelope Dress.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding And modification, the scope of the present invention is defined by the appended.

Claims (5)

1. a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell, which is characterized in that include the following steps;
Step 1: the intrinsic amorphous silicon layer and P-type non-crystalline silicon layer of one layer of 8-12nm thickness of Surface Texture in cell piece;
Step 2: the intrinsic amorphous silicon layer and N-shaped amorphous silicon layer of one layer of 18-22nm of backside deposition in c-Si piece;
Step 3: depositing TCO conductive film on the two sides of cell piece using sputtering technology;
Step 4: making Ag electrode on the two sides of cell piece using screen printing technique;
Step 5: the surface to cell piece is cleared up, cell piece is placed into weldment the head and the tail in a manner of imbrication and is overlapped;
Step 6: being welded using welding to the cell piece in weldment;
Step 7: wrapping up cell piece after the completion of welding using thermal insulation material, making weld seam Slow cooling;
Step 8: removing thermal insulation material after weld seam is cooling, surrounding between cell piece is uniformly smeared into marine glue and carries out frame envelope Dress.
2. a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell according to claim 1, it is characterised in that: step In rapid six, welding is two kinds of element compositions of addition bismuth metal in scolding tin, and scolding tin content is 92-95%, and metal bi content is 5-8%.
3. a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell according to claim 1, it is characterised in that: step In rapid six, welding is the unleaded quaternary scolding tin of tin silver copper bismuth, and tin silver copper bismuth quaternary alloy Pb-free solder is by four kinds of elements of tin silver copper bismuth Composition, bi content 1.5-4%, copper content 0.5-1%, silver content 2-4%, Theil indices 91-96%.
4. a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell according to claim 1, it is characterised in that: step Rapid one arrives step 8, and whole techniques are accomplished below at 200 DEG C.
5. a kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell according to claim 1, it is characterised in that: step In rapid six, scaling powder auxiliary welding can be used and welded.
CN201811575463.5A 2018-12-22 2018-12-22 A kind of low-temperature welding method of monocrystalline silicon heterojunction solar cell Pending CN109742196A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115255854A (en) * 2022-08-03 2022-11-01 宁波江丰电子材料股份有限公司 Desoldering method for target material assembly with welding defects

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CN1379122A (en) * 2002-01-23 2002-11-13 武汉大学 Brightening agent for electroplated Sn-Bi alloy and its preparing process
CN100340685C (en) * 2002-02-15 2007-10-03 国际商业机器公司 Lead-free tin-silver-copper alloy solder composition
CN102184976A (en) * 2011-06-10 2011-09-14 山东力诺太阳能电力股份有限公司 Back contact heterojunction solar battery
JP2014527466A (en) * 2011-08-02 2014-10-16 アルファ・メタルズ・インコーポレイテッドAlpha Metals,Inc. Solder composition
CN105696040A (en) * 2016-04-14 2016-06-22 中山品高电子材料有限公司 Tin-bismuth alloy plating technology
CN207282506U (en) * 2017-08-30 2018-04-27 福建钧石能源有限公司 A kind of efficiently heterogeneous structure, assembly
CN108649088A (en) * 2018-05-18 2018-10-12 东腾投资集团有限公司 A kind of connection method of HIT solar battery sheets and HIT photovoltaic modulies

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1379122A (en) * 2002-01-23 2002-11-13 武汉大学 Brightening agent for electroplated Sn-Bi alloy and its preparing process
CN100340685C (en) * 2002-02-15 2007-10-03 国际商业机器公司 Lead-free tin-silver-copper alloy solder composition
CN102184976A (en) * 2011-06-10 2011-09-14 山东力诺太阳能电力股份有限公司 Back contact heterojunction solar battery
JP2014527466A (en) * 2011-08-02 2014-10-16 アルファ・メタルズ・インコーポレイテッドAlpha Metals,Inc. Solder composition
CN105696040A (en) * 2016-04-14 2016-06-22 中山品高电子材料有限公司 Tin-bismuth alloy plating technology
CN207282506U (en) * 2017-08-30 2018-04-27 福建钧石能源有限公司 A kind of efficiently heterogeneous structure, assembly
CN108649088A (en) * 2018-05-18 2018-10-12 东腾投资集团有限公司 A kind of connection method of HIT solar battery sheets and HIT photovoltaic modulies

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115255854A (en) * 2022-08-03 2022-11-01 宁波江丰电子材料股份有限公司 Desoldering method for target material assembly with welding defects

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Application publication date: 20190510