CN109694203A - A kind of glass thin chemical industry skill pretreatment fluid - Google Patents
A kind of glass thin chemical industry skill pretreatment fluid Download PDFInfo
- Publication number
- CN109694203A CN109694203A CN201711000285.9A CN201711000285A CN109694203A CN 109694203 A CN109694203 A CN 109694203A CN 201711000285 A CN201711000285 A CN 201711000285A CN 109694203 A CN109694203 A CN 109694203A
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- CN
- China
- Prior art keywords
- pretreatment fluid
- chemical industry
- sulfate
- nitrate
- industry skill
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The present invention provides a kind of glass thin chemical industry skill pretreatment fluids, the pretreatment fluid is by including that the raw material of following weight percent is prepared: HF:5-10%, HCl:15-25%, sulfate: 1-8%, nitrate: 1-8%, propylene glycol: 5%-10%, fatty glyceride: 1-5%, the water of sldium lauryl sulfate 1-5% and surplus.Glass thin chemical industry skill pretreatment fluid passes through optimization of C/C composites, sulfate and nitrate is added in formula, in H+In the presence of, SO4 ‑And NO3 ‑Also the performance that sulfuric acid and nitric acid can be embodied is avoided using pollution brought by the concentrated sulfuric acid and is accidentally injured, operates safer.
Description
Technical field
The present invention relates to thinning glass substrate production technical fields, pre-process more particularly, to a kind of glass thin chemical industry skill
Liquid.
Background technique
Currently, one is physics polishing grinding, another kind is chemical etching there are two types of the method for thinning glass substrate is usual
It is thinned, wherein it is most widely used that chemical etching, which is thinned,.Subtract if being directly etched using etching solution to glass substrate
Thin, substrate surface has the defects of scuffing or concave point, chemically reacts basic principle according to hydrofluoric acid and silica, in a timing
Between act under, will lead to scuffing or depressed section further by hydrofluoric acid corrode and expands, and the time it is longer corrode it is deeper, thus
Affect the yields of glass substrate.Existing pretreating process be added based on the concentrated sulfuric acid a small amount of hydrofluoric acid be configured to it is pre-
Treatment fluid, since the corrosivity of the concentrated sulfuric acid is very strong, careless manipulation easily causes accidental injury, and generates after pretreatment process useless
Liquid is difficult to be handled.
Summary of the invention
In view of this, the present invention is directed to propose a kind of glass thin chemical industry skill pretreatment fluid is avoided by optimization of C/C composites
The above problem.
In order to achieve the above objectives, the technical scheme of the present invention is realized as follows:
A kind of glass thin chemical industry skill pretreatment fluid, the pretreatment fluid is by including that the raw material of following weight percent is prepared into
It arrives: HF:5-10%, HCl:15-25%, sulfate: 1-8%, nitrate: 1-8%, propylene glycol: 5%-10%, fatty acid glycerine
Ester: 1-5%, the water of sldium lauryl sulfate 1-5% and surplus.
Wherein, the mass concentration of HF is 40%-45%, and the mass concentration of HCl is 30%-37%.
HF is the main component SiO with glass2The main component to react, reaction equation are as follows:
4HF+SiO2→SiH4+2H2O,
SiH4+2HF→H2SiF6。
Further, the pretreatment fluid is by including that the raw material of following weight percent is prepared: HF:8-10%, HCl:20-
25%, sulfate: 5-8%, nitrate: 5-8%, propylene glycol: 5%-10%, fatty glyceride: 3-5%, laruyl alcohol sulfuric acid
The water of sodium 3-5% and surplus.
Further, the sulfate is sodium sulphate, and nitrate is sodium nitrate.
Sodium sulphate and sodium nitrate can ionize out sodium ion in water, sodium ion can and H2SiF6Reaction generates sediment
Na2SiF6, to remove H2SiF6, reaction equation is as follows:
H2SiF6+2Na+→Na2SiF6↓+2H+。
Further, which is prepared by the preparation method included the following steps:
(1) sulfate, nitrate are added to the water, stirring makes it completely dissolved；
(2) it is added in the aqueous solution that step (1) obtains and dilutes after mixing HF and HCl；
(3) then successively propylene glycol, sldium lauryl sulfate, fatty glyceride are added in the solution that step (2) obtain,
It stirs evenly.
Contain sulfate, nitrate, HCl in the formula, HCl ionizes out H in water+, sulfate ionizes out in water
SO4 -, nitrate ionizes out NO in water3 -, in H+In the presence of under the action of, SO4 -And NO3 -Also the performance of sulfuric acid and nitric acid can be embodied,
Hydrochloric acid and nitric acid can melt glass powder, and sulfuric acid can improve depression problem, prevent plowing from.
Compared with the existing technology, glass thin chemical industry skill of the present invention is had the advantage that with pretreatment fluid
Glass thin chemical industry skill of the present invention optimizes formula with pretreatment fluid, is added to sulfate and nitric acid in formula
Salt, in H+In the presence of, SO4 -And NO3 -Also the performance that sulfuric acid and nitric acid can be embodied, avoids using brought by the concentrated sulfuric acid
Pollution and accidental injury, operation is safer, and it is heavy that HCl can be dissolved in the insoluble glass powder such as silicate generated in etching glass substrate
Shallow lake or impurity, prevent it to be attached to glass baseplate surface, influence to glass substrate etching uniformity.The treatment fluid treated glass
The pit of substrate surface can be significantly reduced in glass substrate, saves the time of subsequent thinning process.
Specific embodiment
It should be noted that in the absence of conflict, the feature in embodiment and embodiment in the present invention can phase
Mutually combination.
Below in conjunction with embodiment, the present invention will be described in detail.
A kind of glass thin chemical industry skill pretreatment fluid, the pretreatment fluid is by the original including weight percent as shown in Table 1
Material is prepared:
The formula of 1 embodiment 1-4 of table
Glass thin chemical industry skill described in embodiment 1-4 is prepared into pretreatment fluid by the preparation method included the following steps
It arrives:
(1) by Na2SO4、NaNO3It is added to the water, stirring makes it completely dissolved；
(2) it is added in the aqueous solution that step (1) obtains and dilutes after mixing HF and HCl；
(3) then successively propylene glycol, sldium lauryl sulfate, fatty glyceride are added in the solution that step (2) obtain,
It stirs evenly.
HF is the main component SiO with glass2The main component to react, reaction equation are as follows:
4HF+SiO2→SiH4+2H2O,
SiH4+2HF→H2SiF6,
Because containing Na in formula2SO4、NaNO3, the Na of ionization+Can and H2SiF6Reaction generates sediment Na2SiF6,
To remove H2SiF6, promote reaction to carry out, reaction equation is as follows:
H2SiF6+2Na+→Na2SiF6↓+2H+。
Pretreatment fluid provided by the invention is avoided and is asked using concentrated sulfuric acid bring by addition sulfate and nitrate
Topic, while introducing sodium ion and solving product H2SiF6The problem of being dissolved in reducer, the thinned effect of glass made to be deteriorated.
Chemicals price in formula is also cheaper, at low cost.
Preprocess method:
1) according to (the hereinafter referred to as pre- place each 1000L of recipe configuration glass substrate thinning technique pretreatment fluid of embodiment 1-4
Manage liquid), and enchashment has pretreatment fluid 1000L；
2) glass substrate of the identical producer's same batch of 15 pieces of plate nitre AN100 is used, with a thickness of 1.000mm, having a size of
730mm × 920mm, is randomly divided into 5 groups, every group 3 pieces, is put into respectively according to the pretreatment fluid of embodiment 1-4 configuration and existing pre-
In treatment fluid, impregnate 20 minutes at room temperature；
3) glass surface is cleaned with clear water；
4) roughness, percent ripple and the warp value for measuring glass substrate, are measured using extra large Cohan profession liquid crystal glass base
8 Series machine of instrument-Accura measures monitoring to the above parameter.
Roughness, percent ripple and the warp value of the glass substrate of 2 embodiment 1 of table
| Number | I | II | III |
| Roughness | 27nm | 27nm | 26nm |
| Percent ripple average value | 0.174μm | 0.176μm | 0.175μm |
| Angularity average value | 1.71mm | 1.72mm | 1.71mm |
Roughness, percent ripple and the warp value of the glass substrate of 3 embodiment 2 of table
| Number | I | II | III |
| Roughness | 24nm | 25nm | 24nm |
| Percent ripple average value | 0.170μm | 0.172μm | 0.170μm |
| Angularity average value | 1.68mm | 1.70mm | 1.67mm |
Roughness, percent ripple and the warp value of the glass substrate of 4 embodiment 3 of table
| Number | I | II | III |
| Roughness | 25nm | 26nm | 26nm |
| Percent ripple average value | 0.158μm | 0.159μm | 0.159μm |
| Angularity average value | 1.65mm | 1.66mm | 1.67mm |
Roughness, percent ripple and the warp value of the glass substrate of 5 embodiment 4 of table
| Number | I | II | III |
| Roughness | 24nm | 25nm | 25nm |
| Percent ripple average value | 0.169μm | 0.170μm | 0.171μm |
| Angularity average value | 1.57mm | 1.59mm | 1.59mm |
Roughness, percent ripple and the warp value of the glass substrate of 6 comparative example of table
| Number | I | II | III |
| Roughness | 34nm | 34nm | 33nm |
| Percent ripple average value | 0.219μm | 0.220μm | 0.218μm |
| Angularity average value | 2.02mm | 2.01mm | 1.98mm |
From table 2 into table 6 we can see that through the pretreatment fluid treated glass substrate obviously than it is existing it is pre- from
The glass substrate effect for managing liquid processing is good.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (4)
1. a kind of glass thin chemical industry skill pretreatment fluid, it is characterised in that: the pretreatment fluid is by including following weight percent
Raw material is prepared: HF:5-10%, HCl:15-25%, sulfate: 1-8%, nitrate: 1-8%, propylene glycol: 5%-10%,
Fatty glyceride: 1-5%, the water of sldium lauryl sulfate 1-5% and surplus.
2. glass thin chemical industry skill pretreatment fluid according to claim 1, it is characterised in that: the pretreatment fluid is by including such as
The raw material of lower weight percent is prepared: HF:8-10%, HCl:20-25%, sulfate: 5-8%, nitrate: 5-8%, and third
Glycol: 5%-10%, fatty glyceride: 3-5%, the water of sldium lauryl sulfate 3-5% and surplus.
3. glass thin chemical industry skill pretreatment fluid according to claim 1 or 2, it is characterised in that: the sulfate is sulphur
Sour sodium, nitrate are sodium nitrate.
4. glass thin chemical industry skill pretreatment fluid according to claim 1 or 2, it is characterised in that: the pretreatment fluid is by wrapping
The preparation method for including following steps is prepared:
(1) sulfate, nitrate are added to the water, stirring makes it completely dissolved；
(2) it is added in the aqueous solution that step (1) obtains and dilutes after mixing HF and HCl；
(3) then successively propylene glycol, sldium lauryl sulfate, fatty glyceride are added in the solution that step (2) obtain, stirring
Uniformly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711000285.9A CN109694203A (en) | 2017-10-24 | 2017-10-24 | A kind of glass thin chemical industry skill pretreatment fluid |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711000285.9A CN109694203A (en) | 2017-10-24 | 2017-10-24 | A kind of glass thin chemical industry skill pretreatment fluid |
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| CN109694203A true CN109694203A (en) | 2019-04-30 |
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| CN201711000285.9A Pending CN109694203A (en) | 2017-10-24 | 2017-10-24 | A kind of glass thin chemical industry skill pretreatment fluid |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112551909A (en) * | 2020-12-10 | 2021-03-26 | 凯盛科技股份有限公司蚌埠华益分公司 | Method for etching and manufacturing ultra-thin glass |
| CN113480184A (en) * | 2021-08-10 | 2021-10-08 | 芜湖长信科技股份有限公司 | Liquid medicine capable of improving strength of ultrathin glass surface and preparation method and application thereof |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103508676A (en) * | 2013-07-24 | 2014-01-15 | 芜湖长信科技股份有限公司 | Method for avoiding defect in LCD glass substrate thinning process and acid solution configuration method |
| CN103782373A (en) * | 2011-08-31 | 2014-05-07 | 林纯药工业株式会社 | Etching liquid composition and etching method |
| CN105036561A (en) * | 2015-05-13 | 2015-11-11 | 湖北鸿创科技有限公司 | Frosting liquid used in production line of frosted glass |
| CN105198228A (en) * | 2015-08-14 | 2015-12-30 | 芜湖真空科技有限公司 | Etching liquid for LOW-E glass and preparation method and application of etching liquid |
| CN105228965A (en) * | 2013-05-10 | 2016-01-06 | 松下电器产业株式会社 | The renovation process of glass grinding liquid and glass grinding device |
| CN106430993A (en) * | 2016-08-30 | 2017-02-22 | 江西沃格光电股份有限公司 | Acid pickling method for glasses and acid pickling device |
| CN106587647A (en) * | 2016-12-31 | 2017-04-26 | 庞绮琪 | TFT glass surface pretreatment liquid |
| CN106630659A (en) * | 2017-01-09 | 2017-05-10 | 天津美泰真空技术有限公司 | Pretreatment fluid for TFT glass substrate thinning process |
| CN107151103A (en) * | 2017-06-12 | 2017-09-12 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD glass substrates thinning post-processing approach |
-
2017
- 2017-10-24 CN CN201711000285.9A patent/CN109694203A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103782373A (en) * | 2011-08-31 | 2014-05-07 | 林纯药工业株式会社 | Etching liquid composition and etching method |
| CN105228965A (en) * | 2013-05-10 | 2016-01-06 | 松下电器产业株式会社 | The renovation process of glass grinding liquid and glass grinding device |
| CN103508676A (en) * | 2013-07-24 | 2014-01-15 | 芜湖长信科技股份有限公司 | Method for avoiding defect in LCD glass substrate thinning process and acid solution configuration method |
| CN105036561A (en) * | 2015-05-13 | 2015-11-11 | 湖北鸿创科技有限公司 | Frosting liquid used in production line of frosted glass |
| CN105198228A (en) * | 2015-08-14 | 2015-12-30 | 芜湖真空科技有限公司 | Etching liquid for LOW-E glass and preparation method and application of etching liquid |
| CN106430993A (en) * | 2016-08-30 | 2017-02-22 | 江西沃格光电股份有限公司 | Acid pickling method for glasses and acid pickling device |
| CN106587647A (en) * | 2016-12-31 | 2017-04-26 | 庞绮琪 | TFT glass surface pretreatment liquid |
| CN106630659A (en) * | 2017-01-09 | 2017-05-10 | 天津美泰真空技术有限公司 | Pretreatment fluid for TFT glass substrate thinning process |
| CN107151103A (en) * | 2017-06-12 | 2017-09-12 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD glass substrates thinning post-processing approach |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112551909A (en) * | 2020-12-10 | 2021-03-26 | 凯盛科技股份有限公司蚌埠华益分公司 | Method for etching and manufacturing ultra-thin glass |
| CN113480184A (en) * | 2021-08-10 | 2021-10-08 | 芜湖长信科技股份有限公司 | Liquid medicine capable of improving strength of ultrathin glass surface and preparation method and application thereof |
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Application publication date: 20190430 |
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