CN109594046A - 一种镀膜用蒸发装置 - Google Patents

一种镀膜用蒸发装置 Download PDF

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CN109594046A
CN109594046A CN201910062315.1A CN201910062315A CN109594046A CN 109594046 A CN109594046 A CN 109594046A CN 201910062315 A CN201910062315 A CN 201910062315A CN 109594046 A CN109594046 A CN 109594046A
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蔡国
龚涛
杨佳葳
谢俊
龚平
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HUNAN YUJING MACHINE INDUSTRIAL CO LTD
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Hunan Yicheng Precision Technology Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
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  • Organic Chemistry (AREA)
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Abstract

一种镀膜用蒸发装置,包括2根横梁Ⅰ、2根横梁Ⅱ、2个压块Ⅰ、4个锁紧块、4个压块Ⅱ、2个电阻片、2个坩埚支撑组件、3根导电柱、3个密封装置和2个坩埚;所述横梁Ⅰ、横梁Ⅱ、导电柱内均设有冷却水通道,所述导电柱的进水冷却水通道与横梁Ⅰ或横梁Ⅱ的冷却水通道进水端相连通,所述横梁Ⅰ或横梁Ⅱ的冷却水通道出水端与导电柱的出水冷却水通道相连通。利用本发明,可以有效的实现导热零部件的冷却,可以实现多工均匀加热。

Description

一种镀膜用蒸发装置
技术领域
本发明涉及一种镀膜用蒸发装置。
背景技术
普通蒸发装置用于大功率蒸发需求设备时导热零部件发热严重,对设备密封件的使用寿命影响严重,同时对多工位坩埚同时加热时热量不均匀引起镀膜厚度的不均一。
发明内容
本发明所要解决的技术问题是,提供一种可以有效的实现导热零部件的冷却,可以实现多工均匀加热的镀膜用蒸发装置。
本发明解决其技术问题所采用的技术方案是:一种镀膜用蒸发装置,包括2根横梁Ⅰ、2根横梁Ⅱ、2个压块Ⅰ、4个锁紧块、4个压块Ⅱ、4个电阻片、2个坩埚支撑组件、3根导电柱、3个密封装置和2个坩埚;
所述横梁Ⅰ、横梁Ⅱ、导电柱内均设有冷却水通道,所述导电柱的进水冷却水通道与横梁Ⅰ或横梁Ⅱ的冷却水通道进水端相连通,所述横梁Ⅰ或横梁Ⅱ的冷却水通道出水端与导电柱的出水冷却水通道相连通;
1根横梁Ⅰ通过压块与1根导电柱相连,连接位置密封,1根横梁Ⅰ、1根横梁Ⅱ与1根导电柱相连,连接位置密封,1根横梁Ⅱ通过压块与1根导电柱相连,连接位置密封,依次排列布置;所述导电柱通过密封装置与镀膜机腔体连接,实现连接口的密封;
1组电阻片一端通过压块和锁紧块与横梁Ⅰ相连,另一端通过压块和锁紧块与横梁Ⅱ相连,连接时需要保证压紧,共两组;所述电阻片与坩埚支撑组件安装连接,所述坩埚与坩埚支撑组件安装连接,所述坩埚支撑组件与镀膜机腔体连接。
进一步,所述坩埚支撑组件包括支撑柱、螺钉、绝缘柱、螺柱;所述支撑柱上设有两个通气孔,避免工作过程中形成局部空腔影响镀膜腔内的真空度;所述支撑柱底部与绝缘柱采用螺钉连接;所述支撑柱底部设有长条形孔,可以保证支撑柱顶部的坩埚始终位于电阻片的中间位置保证加热均匀;所述支撑柱与镀膜机腔体的连接采用螺柱和绝缘柱固定连接。
进一步,1根横梁Ⅰ通过压块与1根导电柱相连,连接位置用密封圈密封。
进一步,1根横梁Ⅰ、1根横梁Ⅱ与1根导电柱相连,连接位置用密封圈密封。
进一步,1根横梁Ⅱ通过压块与1根导电柱相连,连接位置用密封圈密封。
进一步,所述横梁Ⅰ、横梁Ⅱ、导电柱均采用导电性能好的铜材质。
利用本发明,可以有效的实现导热零部件的冷却,可以实现多工均匀加热。
附图说明
图1 为本发明镀膜用蒸发装置实施例的结构示意图;
图2 为图1所示蒸发装置冷却水的流示意图;
图3 为图1所示坩埚支撑组件示意图;
图中:1.横梁Ⅰ,2.横梁Ⅱ,3.压块Ⅰ,4.锁紧块,5.压块Ⅱ,6.电阻片,7.坩埚支撑组件,8.导电柱,9.密封装置,10.坩埚,11.支撑柱,12.螺钉,13绝缘柱,14.螺柱,15.通气孔,16.堵头,17.冷却水入口,18.冷却水出口。
具体实施方式
以下结合附图及实施例对本发明作进一步说明。
实施例
参照图1-图3,一种镀膜用蒸发装置,包括2根横梁Ⅰ1、2根横梁Ⅱ2、2个压块Ⅰ3、4个锁紧块4、4个压块Ⅱ5、4个电阻片6、2个坩埚支撑组件7、3根导电柱8、3个密封装置9和2个坩埚10;
所述横梁Ⅰ1、横梁Ⅱ2、导电柱8内均设有冷却水通道,所述导电柱8的进水冷却水通道与横梁Ⅰ1或横梁Ⅱ2的冷却水通道进水端相连通,所述横梁Ⅰ1或横梁Ⅱ2的冷却水通道出水端与导电柱8的出水冷却水通道相连通;
1根横梁Ⅰ1通过压块3与1根导电柱8相连,连接位置用密封圈密封(其作用在于防止工作用冷却水外渗),1根横梁Ⅰ1、1根横梁Ⅱ2与1根导电柱8相连,连接位置用密封圈密封(其作用在于防止工作用冷却水外渗),1根横梁Ⅱ2通过压块3与1根导电柱8相连,连接位置用密封圈密封(其作用在于防止工作用冷却水外渗),依次排列布置;所述导电柱8通过密封装置9与镀膜机腔体连接,实现连接口的密封;
1组电阻片6一端通过压块5和锁紧块4(锁紧块上开有螺纹孔,压块与横梁Ⅰ上开有通孔,利用螺钉将电阻片压紧在横梁与压块之间)与横梁Ⅰ1相连,另一端通过压块5和锁紧块4(锁紧块上开有螺纹孔,压块与横梁Ⅰ上开有通孔,利用螺钉将电阻片压紧在横梁与压块之间)与横梁Ⅱ2相连,连接时需要保证压紧,共两组;所述电阻片6与坩埚支撑组件7安装连接,所述坩埚10与坩埚支撑组件7安装连接,所述坩埚支撑组件7与镀膜机腔体连接。
本实施例中,所述坩埚支撑组件7包括支撑柱11、螺钉12、绝缘柱13、螺柱14;所述支撑柱11上设有两个通气孔15,避免工作过程中形成局部空腔影响镀膜腔内的真空度;所述支撑柱11底部与绝缘柱13采用螺钉12连接;所述支撑柱11底部设有长条形孔,可以保证支撑柱11顶部的坩埚10始终位于电阻片6的中间位置保证加热均匀;所述支撑柱11与镀膜机腔体的连接采用螺柱14和绝缘柱13固定连接。
本实施例中,所述横梁Ⅰ1、横梁Ⅱ2、导电柱8均采用导电性能好的铜材质,使用过程中三种零件均通有冷却水。
工作时,电源接在三个导电柱8上,蒸发药丸放置在坩埚支撑组件7上的坩埚10内;
工作时,冷却水从导电柱8上的冷却水入口流入经横梁Ⅰ1(或横梁Ⅱ2)将工作过程中零件的热量带出防止变形和膨胀。

Claims (6)

1.一种镀膜用蒸发装置,其特征在于:包括2根横梁Ⅰ、2根横梁Ⅱ、2个压块Ⅰ、4个锁紧块、4个压块Ⅱ、4个电阻片、2个坩埚支撑组件、3根导电柱、3个密封装置和2个坩埚;
所述横梁Ⅰ、横梁Ⅱ、导电柱内均设有冷却水通道,所述导电柱的进水冷却水通道与横梁Ⅰ或横梁Ⅱ的冷却水通道进水端相连通,所述横梁Ⅰ或横梁Ⅱ的冷却水通道出水端与导电柱的出水冷却水通道相连通;
1根横梁Ⅰ通过压块与1根导电柱相连,连接位置密封,1根横梁Ⅰ、1根横梁Ⅱ与1根导电柱相连,连接位置密封,1根横梁Ⅱ通过压块与1根导电柱相连,连接位置密封,依次排列布置;所述导电柱通过密封装置与镀膜机腔体连接,实现连接口的密封;
1组电阻片一端通过压块和锁紧块与横梁Ⅰ相连,另一端通过压块和锁紧块与横梁Ⅱ相连,连接时需要保证压紧,共两组;所述电阻片与坩埚支撑组件安装连接,所述坩埚与坩埚支撑组件安装连接,所述坩埚支撑组件与镀膜机腔体连接。
2.根据权利要求1所述的镀膜用蒸发装置,其特征在于:所述坩埚支撑组件包括支撑柱、螺钉、绝缘柱、螺柱;所述支撑柱上设有两个通气孔;所述支撑柱底部与绝缘柱采用螺钉连接;所述支撑柱底部设有长条形孔;所述支撑柱与镀膜机腔体的连接采用螺柱和绝缘柱固定连接。
3.根据权利要求1或2所述的镀膜用蒸发装置,其特征在于:1根横梁Ⅰ通过压块与1根导电柱相连,连接位置用密封圈密封。
4.根据权利要求1或2所述的镀膜用蒸发装置,其特征在于:1根横梁Ⅰ、1根横梁Ⅱ与1根导电柱相连,连接位置用密封圈密封。
5.根据权利要求1或2所述的镀膜用蒸发装置,其特征在于:1根横梁Ⅱ通过压块与1根导电柱相连,连接位置用密封圈密封。
6.根据权利要求1或2所述的镀膜用蒸发装置,其特征在于:所述横梁Ⅰ、横梁Ⅱ、导电柱均采用导电性能好的铜材质。
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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1032901A (en) * 1964-01-07 1966-06-15 Commissariat Energie Atomique An electrically-heated evaporation source
US3504094A (en) * 1966-10-31 1970-03-31 Air Reduction Method and apparatus for feeding particulate material to a rotating vacuum vaporization crucible
US20070281081A1 (en) * 2004-01-22 2007-12-06 Hiroki Nakamura Vacuum Deposition Method and Sealed-Type Evaporation Source Apparatus for Vacuum Deposition
CN101451230A (zh) * 2007-11-28 2009-06-10 上海华虹Nec电子有限公司 金属蒸发设备
CN105648405A (zh) * 2016-03-29 2016-06-08 苏州方昇光电装备技术有限公司 一种有机材料蒸发装置
CN107217236A (zh) * 2017-05-17 2017-09-29 大连交通大学 一种低温真空蒸发源
CN107400860A (zh) * 2017-09-08 2017-11-28 霍尔果斯迅奇信息科技有限公司 高频感应加热蒸发装置
CN209873082U (zh) * 2019-01-23 2019-12-31 湖南宇诚精密科技有限公司 镀膜用蒸发装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1032901A (en) * 1964-01-07 1966-06-15 Commissariat Energie Atomique An electrically-heated evaporation source
US3504094A (en) * 1966-10-31 1970-03-31 Air Reduction Method and apparatus for feeding particulate material to a rotating vacuum vaporization crucible
US20070281081A1 (en) * 2004-01-22 2007-12-06 Hiroki Nakamura Vacuum Deposition Method and Sealed-Type Evaporation Source Apparatus for Vacuum Deposition
CN101451230A (zh) * 2007-11-28 2009-06-10 上海华虹Nec电子有限公司 金属蒸发设备
CN105648405A (zh) * 2016-03-29 2016-06-08 苏州方昇光电装备技术有限公司 一种有机材料蒸发装置
CN107217236A (zh) * 2017-05-17 2017-09-29 大连交通大学 一种低温真空蒸发源
CN107400860A (zh) * 2017-09-08 2017-11-28 霍尔果斯迅奇信息科技有限公司 高频感应加热蒸发装置
CN209873082U (zh) * 2019-01-23 2019-12-31 湖南宇诚精密科技有限公司 镀膜用蒸发装置

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Application publication date: 20190409

Assignee: Hunan Yiyuan New Material Technology Co.,Ltd.

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Denomination of invention: An evaporation device for coating

Granted publication date: 20230707

License type: Common License

Record date: 20231213

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