CN109587961A - A kind of method that copper is thinned in outer layer - Google Patents

A kind of method that copper is thinned in outer layer Download PDF

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Publication number
CN109587961A
CN109587961A CN201811460809.7A CN201811460809A CN109587961A CN 109587961 A CN109587961 A CN 109587961A CN 201811460809 A CN201811460809 A CN 201811460809A CN 109587961 A CN109587961 A CN 109587961A
Authority
CN
China
Prior art keywords
copper
hole
thinned
thickness
masking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811460809.7A
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Chinese (zh)
Inventor
黄明安
胡小义
何小国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sihui Fu Shi Electronic Polytron Technologies Inc
Original Assignee
Sihui Fu Shi Electronic Polytron Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sihui Fu Shi Electronic Polytron Technologies Inc filed Critical Sihui Fu Shi Electronic Polytron Technologies Inc
Priority to CN201811460809.7A priority Critical patent/CN109587961A/en
Publication of CN109587961A publication Critical patent/CN109587961A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Abstract

The object of the present invention is to provide a kind of method that copper is thinned in outer layer, method of the invention realizes that process is: plate electricity → masking hole → half erosion → grinding → outer-layer circuit using half erosion and belt-sanding technique.

Description

A kind of method that copper is thinned in outer layer
Technical field
The invention belongs to printed wiring board manufacture technology fields, and in particular to be hole is contained to outer layer wiring board be thinned A kind of method of copper.
Background technique
In the manufacturing process of assist side, the bottom copper of 18um, 35um are generallyd use at present, in order to guarantee hole copper thickness foot Enough, electroplating surface copper thickness is in 30um or more, and outer layer copper thickness is generally in 48um or more.
When using subtractive process production outer-layer circuit, etching solution plays the role of lateral erosion, is merely able to using common method Make line width/spacing of 75um/75um or more.
In order to produce thinner route and spacing, surface copper thickness needs to be thinned to 35um or less.
Conventional thinned copper is internal layer copper to be thinned using half etching technique, but if directly subtract to outer layer now Copper, subtracts copper etching solution also and can etch away the copper in hole, and hole copper is also thinned.
There are also a kind of methods using mechanical lapping outer layer copper is thinned, and this method needs to grind many times, and cost is very The problems such as height, every grinding can only once eliminate the copper of 1-3um, also will cause sheet deformation, uneven thickness.
If made of graphic plating or semi-additive process, due to current distribution is uneven, and thickness can be generated Degree is uneven, folder film, the problem of burning is electroplated.
Being carried out using filling holes with resin and half etching technique also subtracts copper, this method needs special filling holes with resin machine and again Type ceramic grinder grind resin, cost are very high.
Summary of the invention
Method of the invention realizes that steps are as follows using half erosion and belt-sanding technique.
Step 1: plate electricity;The substrate for preparing copper to be thinned comes into effect this after reaching hole copper thickness requirement from whole plate plating Method.
Step 2: masking hole;Dry film masking hole method is used after whole plate plating, using the conventional manufacturing method system of exposure, development The protection figure for making masking hole protects plated through-hole copper and orifice ring with dry film.
Step 3: half loses;Using half etching technique or normal etch, it is thick to etch away the copper for needing to eliminate.
Step 4: grinding;Copper outstanding on orifice ring is eliminated using amary tape grinding machine.
Step 5: outer-layer circuit;Carry out the conventional process such as outer-layer circuit production.
Detailed description of the invention
Fig. 1 is section flow chart of the invention.
101- substrate copper foil, 102- electroplating surface copper, 201- orifice ring copper outstanding, the hole 301- copper, 302- partly lose rear surface Copper.
Specific embodiment
To illustrate specific implementation method of the invention, present invention will be described in further detail below with reference to the accompanying drawings.
Process of the invention is: plate electricity → masking hole → half erosion → grinding → outer-layer circuit.
Plate electricity: being exactly whole plate plating, whole plate thickness 1.6mm, 101 thickness 18um of substrate copper foil, 301 electroplating thickness of hole copper 30um, 102 thickness 35um of electroplating surface copper.
Masking hole: pad pasting is carried out using the dry film of common 40um thickness;Only plated through-hole and its orifice ring are exposed, with dry Film protects plated through-hole;Developed using the parameter normally produced.
Half loses: only with the first segment in five sections of etching machine, etching speed 5m/min, other parameters use normal condition, The copper thickness requirement etched away is 18 ± 2um, through half erosion 302 average out to 35um of rear surface copper thickness of detection.
Grinding: orifice ring copper 201 outstanding, the parameter of grinding are as follows: sand grains mesh number 600 are ground away using two-sided amary tape grinding machine Mesh, grinding rate: 2 m/min, grinding pressure: 0.3kg/cm2.
Outer-layer circuit;After processing above, hole copper thickness is 25um or more, surface copper thickness average out to 35um, can be with For making line width/spacing plate of 50um/50um.
By the processing of the method for the present invention, the thickness of hole copper can be accomplished very big and surface copper thickness accomplishes very little.
Manufacturing process of the invention is simple, directlys adopt equipment possessed by general circuit board plant.
Method of the invention can also be used to be used in blind hole electroplate, on filling perforation electroplate, carry out to outer layer copper thickness It is thinned.
The present invention is outer layer to be thinned the description of copper method, and the present invention can also be used in laminated plates, blind hole inner cord On.
Assist side manufacturing field, the present invention will change in specific embodiment and application range, so The contents of this specification are not to be construed as limiting the invention.

Claims (7)

1. a kind of method that copper is thinned in outer layer, it is characterised in that realized using following steps:
Step 1: plate electricity;
Step 2: masking hole;
Step 3: half loses;
Step 4: grinding;
Step 5: outer-layer circuit.
2. method according to claim 11 step 1, it is characterised in that the substrate for preparing copper to be thinned is reached from whole plate plating This method is come into effect after requiring to hole copper thickness.
3. method according to claim 11 step 2, it is characterised in that use dry film masking hole method after whole plate plating, use The protection figure of masking hole is produced in exposure, the conventional manufacturing method to develop, protects plated through-hole copper and orifice ring with dry film.
4. method according to claim 11 step 3, it is characterised in that use half etching technique or normal etch, etch away The copper for needing to eliminate is thick.
5. method according to claim 11 step 4, it is characterised in that eliminated using amary tape grinding machine outstanding on orifice ring Copper.
6. method according to claim 11 step 5, it is characterised in that carry out the conventional process such as outer-layer circuit production.
7. according to the method described in claim 1, it is characterized in that laminated plates can also be used in, on blind hole inner cord.
CN201811460809.7A 2018-12-01 2018-12-01 A kind of method that copper is thinned in outer layer Pending CN109587961A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811460809.7A CN109587961A (en) 2018-12-01 2018-12-01 A kind of method that copper is thinned in outer layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811460809.7A CN109587961A (en) 2018-12-01 2018-12-01 A kind of method that copper is thinned in outer layer

Publications (1)

Publication Number Publication Date
CN109587961A true CN109587961A (en) 2019-04-05

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811460809.7A Pending CN109587961A (en) 2018-12-01 2018-12-01 A kind of method that copper is thinned in outer layer

Country Status (1)

Country Link
CN (1) CN109587961A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113163605A (en) * 2021-04-21 2021-07-23 深圳市祺利电子有限公司 Manufacturing method of high-heat-dissipation aluminum-based circuit board and high-heat-dissipation aluminum-based circuit board

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102510668A (en) * 2011-11-08 2012-06-20 景旺电子(深圳)有限公司 Super thick copper PCB plate production method and its circuit board
CN106211568A (en) * 2016-09-20 2016-12-07 四会富士电子科技有限公司 A kind of extra thin copper foil material
CN108260303A (en) * 2017-12-05 2018-07-06 深圳崇达多层线路板有限公司 The production method that laser drill and back drill hole are filled out in a kind of while plating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102510668A (en) * 2011-11-08 2012-06-20 景旺电子(深圳)有限公司 Super thick copper PCB plate production method and its circuit board
CN106211568A (en) * 2016-09-20 2016-12-07 四会富士电子科技有限公司 A kind of extra thin copper foil material
CN108260303A (en) * 2017-12-05 2018-07-06 深圳崇达多层线路板有限公司 The production method that laser drill and back drill hole are filled out in a kind of while plating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113163605A (en) * 2021-04-21 2021-07-23 深圳市祺利电子有限公司 Manufacturing method of high-heat-dissipation aluminum-based circuit board and high-heat-dissipation aluminum-based circuit board

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