CN109585275A - 一种保证多晶硅片或类单晶硅片质量稳定性的方法 - Google Patents

一种保证多晶硅片或类单晶硅片质量稳定性的方法 Download PDF

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CN109585275A
CN109585275A CN201811463937.7A CN201811463937A CN109585275A CN 109585275 A CN109585275 A CN 109585275A CN 201811463937 A CN201811463937 A CN 201811463937A CN 109585275 A CN109585275 A CN 109585275A
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刘世龙
张泽兴
路景刚
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Baotou Meike Silicon Energy Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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Abstract

本发明公开一种保证多晶硅片或类单晶硅片质量稳定性的方法,其特征在于包括如下步骤:步骤一:测试晶砖一侧面少子寿命情况;步骤二:根据所述侧面少子寿命情况,将晶砖截断得到尾料、可切片晶砖、头料、杂质层;步骤三:测试头料下截断面的少子寿命情况;步骤四:根据头料下截断面少子寿命情况,把可切片晶砖划分为不同等级进行返截。本发明成本低,实施简便,能有效保证硅片的质量,提高生产效率。

Description

一种保证多晶硅片或类单晶硅片质量稳定性的方法
技术领域
本发明涉及一种保证多晶硅片或类单晶硅片质量稳定性的方法,属于多晶硅铸锭或类单晶铸锭技术领域。
背景技术
晶体硅在当前的太阳能材料市场占据着绝对优势,从其晶体形态上来讲,可以划分为非晶硅、单晶硅、多晶硅三大类。非晶硅电池成本低,但转换效率也较低,且由于非晶硅的光致衰减效应,致使其性能稳定性较差;多晶硅电池生产成本较低,但其内部存在大量的晶界、高密度的位错和杂质,这些缺陷降低了硅片少数载流子寿命,导致其转换效率比单晶电池低;单晶硅电池中杂质与缺陷的含量低,转换效率高,但制备工艺复杂,对原料的纯度要求高,所以生产成本较高。
但是近两年以来,尤其是金刚线切片大规模应用以后,单晶硅电池成本大幅下降,电池端新兴的PERC、HIT、双面等技术在单晶电池上增益更大,多晶电池与单晶电池的效率差距逐渐拉大,多晶电池原有的成本优势被蚕食殆尽。
在多晶电池面临较大困难的前提下,如何保持多晶硅硅片质量的稳定性显得至关重要,目前,多晶硅铸锭企业只测晶砖侧面少子寿命情况,不能百分之百的保证晶砖截断面的少子寿命较好。因此多晶硅片厂经常收到电池片厂效率偏低或效率分布较宽等投诉。
类单晶是与单晶竞争的有力产品,但是类单晶电池效率分布比较宽,质量稳定性不好,对电池端造成较大压力。
发明内容
本发明的目的就在于克服现有技术的缺点,提出了一种保障多晶硅片或类单晶硅片质量稳定的办法,提高多晶硅片或类单晶硅片的产品竞争力。
本发明解决以上技术问题的技术方案是:
一种保证多晶硅片或类单晶硅片质量稳定性的方法,其特征在于包括如下步骤:
步骤一:测试晶砖一侧面少子寿命情况;
步骤二:根据所述侧面少子寿命情况,将晶砖截断得到尾料、可切片晶砖、头料、杂质层;
步骤三:测试头料下截断面的少子寿命情况;
步骤四:根据头料下截断面少子寿命情况,把可切片晶砖划分为不同等级:
1)截断面少子寿命较好,则可切片晶砖不需要返截,直接流转到下一个工序;
2)截断面少子寿命一般,则可切片晶砖返截10-20mm后再流转到下一工序;
3)截断面少子寿命较差,则可切片晶砖返截20-60mm后再流转到下一工序。
本发明的有益效果:
1、目前生产线上就是把晶砖截断成尾料、可切片晶砖、头料、杂质层四部分,本发明只需测头料下截断面少子图谱即可,没有增加截断成本。
2、晶砖杂质一般集中在晶砖的上部,其晶体缺陷较多,少子寿命较低,因此只需要测试可切片晶砖上截断面的少子寿命情况即可,但是可切片晶砖的长度太长,现有少子寿命测试仪(例如Semilab少子寿命测试仪)无法测试(只能在157mm左右高度进行少子寿命测试),头料下截断面与可切片晶砖上截断面是同一面,头料长度一般在20-80mm之间,因此本发明通过测试头料下截断面少子寿命,根据其少子图谱情况,返截掉可切片晶砖中质量较差部分,保证了多晶硅片质量的稳定性,可以减少电池片厂效率偏低或效率分布较宽等投诉。本发明不需要增加新的设备,只需要在现有少子寿命测试仪上增加一个简单的晶砖升降平台,把头料下截断面调整至测试仪的测试高度进行少子寿命测试,成本很低,实施简便。
3、类单晶头部晶体缺陷较多,产品质量不稳定,效率分布较宽,为了保证质量,类单晶铸锭厂家往往每个晶砖四个侧面都需要测试少子寿命,生产效率较低。本发明只需要对晶砖一个侧面进行少子寿命测试,通过这个侧面的少子寿命情况确认尾料、有效晶砖、头料、杂质层,然后对头料下截断面进行少子寿命测试,根据其情况确认返截长度,提升生产效率的同时也保证了类单晶质量的稳定性,减少了电池片厂效率偏低或效率分布较宽等投诉。
附图说明
图1多晶硅晶砖侧面少子图谱;
图2多晶头料下截断面少子图谱;
图3是返截后多晶头料下截断面少子图谱;
图4类单晶晶砖侧面少子图谱;
图5类单晶头料下截断面少子图谱。
具体实施方式
本发明保证多晶硅片或类单晶硅片质量稳定性的方法包括如下步骤:
首先,对多晶硅或类单晶硅晶砖一个侧面少子寿命情况进行测试。侧面的选择根据经验,并综合考虑生产效率。一般情况下,对同一铸锭切出来的晶砖进行测试时,要保证每个晶砖的每个侧面至少测一次,且测试的次数越少越好。晶砖侧面少子测试完之后,按照产线现有标准划线,截断得到尾料、可切片晶砖、头料、杂质层。
由于可切片晶砖的长度太长,现有少子寿命测试仪无法测试,而头料下截断面与可切片晶砖上截断面是同一面,所以只需测试头料下截断面。头料长度一般在20-80mm之间,通过一个升降平台,即可把头料下截断面调整至测试仪的测试高度进行少子寿命测试。测试时将升降平台放置在少子寿命测试仪工作台上,测试完截断面以后可以把升降平台拿掉。升降平台市面上很常见,可以实现晶砖升降即可。
最后,根据头料下截断面少子寿命情况,把可切片晶砖划分为不同等级:1)截断面少子寿命较好,则可切片晶砖不需要返截,可以直接流转到下一个工序;2)截断面少子寿命一般,则可切片晶砖返截10-20mm后再流转到下一工序;3)截断面少子寿命较差,则可切片晶砖返截20-60mm后再流转到下一工序。可切片晶砖的返截长度可以根据经验来确定,不做严格要求。
实施例1
现有技术中,产线上为了提高生产效率,一般只对多晶硅晶砖一个侧面进行少子寿命测试,其余三个侧面不测试,不能保证四个侧面少子寿命都比较高,硅片质量难以保证。
本实施例采用本发明方法,如下图1所示,选择多晶硅晶砖的一个侧面进行少子寿命测试,发现可切片晶砖在有效长度范围内少子寿命偏低的黄色区域(附图中显示为浅色,颜色越浅,少子寿命越低)较少,通过这个侧面的少子寿命情况确认尾料、可切片晶砖、头料、杂质层。对头料下截断面进行少子寿命测试时,如图2所示,发现少子寿命偏低的黄色区域较多,若切片后流转到电池片厂可能受到低效投诉,所以应当对可切片晶砖进行返截,返截高度50mm。如图3所示,返截后头料下截断面少子寿命偏低的黄色区域减少,可以流转到下一工序,从而保证了多晶硅片质量的稳定性。
实施例2
目前类单晶正处于小批量推广阶段,但是类单晶头部晶体缺陷较多,产品质量不稳定,效率分布较宽,为了保证质量,类单晶铸锭厂家往往每个晶砖四个侧面都需要测试少子寿命,生产效率较低。
为了提高生产效率,本实施例只对类单晶晶砖一个侧面进行少子寿命测试,如下图4所示,发现可切片晶砖在有效长度范围内少子寿命偏低的黄色区域几乎没有,通过这个侧面的少子寿命情况确认尾料、可切片晶砖、头料、杂质层。对头料下截断面进行少子寿命测试时,如下图5所示,发现少子寿命偏低的黄色区域几乎没有,可以直接流转到下一个工序,从而保证了类单晶硅片质量的稳定性。

Claims (2)

1.一种保证多晶硅片或类单晶硅片质量稳定性的方法,其特征在于包括如下步骤:
步骤一:测试晶砖一侧面少子寿命情况;
步骤二:根据所述侧面少子寿命情况,将晶砖截断得到尾料、可切片晶砖、头料、杂质层;
步骤三:测试头料下截断面的少子寿命情况;
步骤四:根据头料下截断面少子寿命情况,把可切片晶砖划分为不同等级:
1)截断面少子寿命较好,则可切片晶砖不需要返截,直接流转到下一个工序;
2)截断面少子寿命一般,则可切片晶砖返截10-20mm后再流转到下一工序;
3)截断面少子寿命较差,则可切片晶砖返截20-60mm后再流转到下一工序。
2.如权利要求1所述的保证多晶硅片或类单晶硅片质量稳定性的方法,其特征在于通过一个升降平台把头料下截断面调整至测试仪的测试高度进行少子寿命测试。
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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