CN109564955A - 成膜设备及成膜方法 - Google Patents
成膜设备及成膜方法 Download PDFInfo
- Publication number
- CN109564955A CN109564955A CN201780047282.2A CN201780047282A CN109564955A CN 109564955 A CN109564955 A CN 109564955A CN 201780047282 A CN201780047282 A CN 201780047282A CN 109564955 A CN109564955 A CN 109564955A
- Authority
- CN
- China
- Prior art keywords
- film
- substrate
- material source
- film forming
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000000463 material Substances 0.000 claims abstract description 159
- 239000000758 substrate Substances 0.000 claims abstract description 110
- 238000001704 evaporation Methods 0.000 claims description 18
- 230000008020 evaporation Effects 0.000 claims description 18
- 230000004308 accommodation Effects 0.000 claims description 8
- 239000007888 film coating Substances 0.000 claims description 3
- 238000009501 film coating Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 24
- 238000000576 coating method Methods 0.000 description 10
- 238000007747 plating Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000002346 layers by function Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000012864 cross contamination Methods 0.000 description 2
- 230000035800 maturation Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
一种成膜设备(10)，包括成膜室(11,21)，成膜室(11,21)内设有至少两个材料源(121,122)，至少两个材料源(121,122)用于依次在基板(100)上镀膜；其中，每两个相邻的材料源(121,122)之间具有安全工作距离(D)，且当前一个材料源(121)在基板(100)上镀膜后，后一个材料源(122)在前一个材料源(121)所形成的膜层之上再次镀膜。一种成膜方法，用于在基板(100)上形成膜层。成膜设备及成膜方法能够缩短成膜工艺线，提升生产效率，并降低设备成本。
Description
PCT国内申请，说明书已公开。
Claims (10)
- PCT国内申请，权利要求书已公开。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2017/095699 WO2019024021A1 (zh) | 2017-08-02 | 2017-08-02 | 成膜设备及成膜方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109564955A true CN109564955A (zh) | 2019-04-02 |
Family
ID=65233228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780047282.2A Pending CN109564955A (zh) | 2017-08-02 | 2017-08-02 | 成膜设备及成膜方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN109564955A (zh) |
| WO (1) | WO2019024021A1 (zh) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105695939A (zh) * | 2016-04-26 | 2016-06-22 | 京东方科技集团股份有限公司 | 线性蒸发源、蒸镀装置及方法 |
| CN105793463A (zh) * | 2013-12-24 | 2016-07-20 | Posco公司 | 镁铝涂层钢板及其制造方法 |
| US20160365542A1 (en) * | 2015-02-04 | 2016-12-15 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Integration equipment for replacing an evaporation material and use method for the same |
| CN106319451A (zh) * | 2015-06-19 | 2017-01-11 | 上海和辉光电有限公司 | 一种蒸镀设备以及蒸镀方法 |
| CN106340570A (zh) * | 2016-10-27 | 2017-01-18 | 中国科学院上海微系统与信息技术研究所 | 一种用于制作透明导电氧化物薄膜的镀膜设备及镀膜方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2592311B2 (ja) * | 1988-10-19 | 1997-03-19 | 富士写真フイルム株式会社 | 光磁気記録媒体の製造方法及び製造装置 |
| CN204570028U (zh) * | 2015-03-12 | 2015-08-19 | 广欣电能有限公司 | 真空镀膜设备 |
-
2017
- 2017-08-02 CN CN201780047282.2A patent/CN109564955A/zh active Pending
- 2017-08-02 WO PCT/CN2017/095699 patent/WO2019024021A1/zh active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105793463A (zh) * | 2013-12-24 | 2016-07-20 | Posco公司 | 镁铝涂层钢板及其制造方法 |
| US20160365542A1 (en) * | 2015-02-04 | 2016-12-15 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Integration equipment for replacing an evaporation material and use method for the same |
| CN106319451A (zh) * | 2015-06-19 | 2017-01-11 | 上海和辉光电有限公司 | 一种蒸镀设备以及蒸镀方法 |
| CN105695939A (zh) * | 2016-04-26 | 2016-06-22 | 京东方科技集团股份有限公司 | 线性蒸发源、蒸镀装置及方法 |
| CN106340570A (zh) * | 2016-10-27 | 2017-01-18 | 中国科学院上海微系统与信息技术研究所 | 一种用于制作透明导电氧化物薄膜的镀膜设备及镀膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019024021A1 (zh) | 2019-02-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190402 |