CN109551304A - A kind of ultra-thin ceramic fingerprint slice lapping technique - Google Patents

A kind of ultra-thin ceramic fingerprint slice lapping technique Download PDF

Info

Publication number
CN109551304A
CN109551304A CN201811278012.5A CN201811278012A CN109551304A CN 109551304 A CN109551304 A CN 109551304A CN 201811278012 A CN201811278012 A CN 201811278012A CN 109551304 A CN109551304 A CN 109551304A
Authority
CN
China
Prior art keywords
disk
polishing disk
upper polishing
product
suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811278012.5A
Other languages
Chinese (zh)
Inventor
周小辉
赵乾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Janus Intelligent Group Corp Ltd
Original Assignee
Guangdong Janus Intelligent Group Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Janus Intelligent Group Corp Ltd filed Critical Guangdong Janus Intelligent Group Corp Ltd
Priority to CN201811278012.5A priority Critical patent/CN109551304A/en
Publication of CN109551304A publication Critical patent/CN109551304A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B24B37/105Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
    • B24B37/107Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/12Lapping plates for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/30Work carriers for single side lapping of plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/10Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
    • B24B47/12Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The present invention relates to a kind of ultra-thin ceramic fingerprint slice lapping techniques, the grinding technics is completed by ultra-thin ceramic fingerprint slice lapping equipment, the equipment includes rack and rack-mounted upper polishing disk, lower fixed disk, elevating mechanism, medium spraying mechanism, rotating mechanism and control cabinet, the upper polishing disk is driven by being located at upper rack elevating mechanism, lower fixed disk is located at the lower part of upper polishing disk, and corresponding with upper polishing disk;Several suction disks with suction hole are provided between the upper polishing disk and lower fixed disk, the lower part of each suction disk is mounted on lower fixed disk by what shaft rotated, and the outer wall of the suction disk is driven by rotating mechanism.The invention has the advantages that efficiently, stablize and can process ultra-thin (0.04mm≤thickness < 0.08mm) ceramics fingerprint piece, realize batch production.

Description

A kind of ultra-thin ceramic fingerprint slice lapping technique
Technical field
The present invention relates to a kind of ultra-thin ceramic fingerprint slice lapping equipment and its grinding technics, are applicable in 0.04-0.3mm superthin section The hard brittle materials grinding and polishing such as glass, ceramics, silicon wafer, sapphire field.
Background technique
With 2013, apple iPhone 5S was introduced after fingerprint technique, and the booting of mobile phone is arranged also from initial number Password, figure unlock develop and have arrived present fingerprint recognition, our mobile phone also becomes increasingly safer.Short two or three time Scape, thousand yuan of machines, even hundred yuan of machines have also had a large amount of types to be equipped with fingerprint identification technology, it may be said that fingerprint recognition is almost Become the necessary functions of mobile phone.Also from single unlock before, unlock till now pays and opens the function of fingerprint recognition Move various applications etc. function, the routine use having great convenience for the user while protecting user information safety.It 2016, takes The market scale for carrying fingerprint identification device is at least up to 500,000,000, and such bio-identification can be also applied to other than mobile phone using future Field, estimate 2018, this scale also will increase the level to 1,700,000,000.
Fingerprint recognition market potential is huge, but is not so readily in technical application.In view of fingerprint recognition mould Group area is small, and application environment is complicated, but requires identification sensitivity and speed high, this is just to fingerprint recognition chip and surface Protection materials also proposed very high requirement, and the scheme of comparative maturity has sapphire, coating type (coating), ceramics at present Four kinds of schemes of cover board and glass.Sapphire hardness is high, corrosion-resistant, but there are higher cost, the indifferent costs of drop resistant And aspect of performance, Sapphire advantage hardness is high, corrosion-resistant, and disadvantage is at high cost, drop resistant is indifferent, poor toughness can not accomplish Thinner (most thin 0.175mm at present);Coating type scheme advantage is at low cost, and disadvantage coating hardness is low, is prone to wear and by sweat corruption Erosion, appearance are poor;Glass proposals advantage is at low cost, and disadvantage hardness is lower, dielectric constant is low, bending strength is poor can not accomplish more Thin (most thin 0.175mm at present);Zirconia ceramics scheme advantage hardness is higher, corrosion-resistant, dielectric constant is high, the good energy of bending strength Enough accomplish thinner thickness (most thin 0.08mm at present, by process equipment and cost impact), can be realized faster higher more sensitive Recognition effect, disadvantage cost are lower than sapphire but more at high cost than other schemes.It is reported that zirconia ceramics cover board is at present more It is applied in family's famous brand name mobile phone, future has an opportunity gradually to popularize in more smart mobile phone application.
Comprehensive substitution of limitation zirconia ceramics fingerprint cover board uses maximum obstacle or cost and processing technology at present Aspect;Influence cost main point is that post-processing, refer to current conventional machining process (most thin at present in terms of processing technology Can accomplish 0.08mm) the thin slice ceramics of thinner (thickness < 0.08mm) cannot be processed, because relative to the toughness of ceramics and strong Degree, can accomplish it is thinner for identification reaction speed faster, user experience is stronger;To reduce traditional zirconia ceramics fingerprint It identifies the cost of cover board post-processing and processes thinner thin slice ceramics, essentially consist in more advanced, the higher yield of exploitation, higher efficiency Processes and apparatus.The technique of grinding and polishing zirconia ceramics fingerprint piece at present are as follows: 1. corase grinding: ground using minor diameter (9B) is two-sided Raw material are once thinned in grinding machine cast iron plate+blue steel dental lamina+SiC (green silicon carbide) (thickness is generally 0.25-0.35mm) To 0.1-0.15mm;It grinds in 2.: first time being thinned using minor diameter (9B) twin grinder copper dish+blue steel piece+Liquid diamond Material progress is secondary to be thinned to 0.08-0.09mm and reduces surface roughness;3. essence is thrown: using twin grinder polished leather+blue steel Piece+silica solution carries out essence and throws finished product.Disadvantage: 1. since product thickness is thin, and the planetary plate (blue steel piece) used can only compare product It is thinner, in order to which proof strength can only use minor diameter planetary gear to limit the use of major diameter planetary gear, add every time Chemical product negligible amounts influence processing efficiency;It can only influence to process using the machined parameters of low speed, low pressure in process Efficiency;It is easy that stir-fry machine (planetary plate deformed damaged, product are broken) phenomenon, complex process, process occur in process De-stabilising effect yield, efficiency.2. since zirconia ceramics fingerprint piece is very high to surface roughness, flatness requirement, processing Planetary gear revolution and rotation only have several fixed speed ratios in the process, cannot preferably realize that product is miscellaneous in the process footprint of movement It is random, irregular, so that the uneven roughness in surface is big, it is bad to be easy to appear ripple.3. temperature increases during essence is thrown, lead Product surface is caused to generate orange peel bad, and causing silica solution to condense too fast formation hard particulate causes product surface scuffing bad. 4. cannot achieve the processing of more thin product (thickness < 0.08mm).
Summary of the invention
To overcome the shortcomings of existing technologies, the present invention provides efficient one kind, stabilization and can process ultra-thin (0.04mm≤thickness Spend < 0.08mm) technique of ceramic fingerprint slice lapping polishing, and can be realized volume production.The technical scheme is that
A kind of grinding technics of ultra-thin ceramic fingerprint piece, the grinding technics are complete by ultra-thin ceramic fingerprint slice lapping equipment At, comprising the following steps:
S1, it selects cast iron plate as upper polishing disk, is made into suspension according to the grounds travel and water of mass ratio 1:5~30, it will The suspension mixed pours into dress liquid device and selects starting blender;
S2, setting machined parameters: upper polishing disk rotating speed is arranged in 10~40rpm, and air-breathing disk rotating speed is equipped in 5~50rpm, Same time is arranged in positive and negative rotation, and unit pressure is 0.2~0.7kg/cm2, rate-of flow 4L/min;
S3, it drives upper polishing disk to rise to safe altitude by cylinder, then product alignment suction hole is well placed, then open Dynamic air-breathing switchs and checks whether product sucks admittedly, presses on product upper polishing disk after determining absorption securely and starts processing Program;
S4, after the one side of product has been roughly ground, polishing disk and suction disk operation, and upper polishing disk are moved up in stopping, will Product moves down upper polishing disk after changing face, and is again started up air-breathing switch, after determining absorption securely, then according in step S2 Processing program carries out being again started up processing, completes the corase grinding of product another side;
S5, replacement cast iron plate select polished leather as upper polishing disk, form according to the silica solution and water of mass ratio 1:2~6 Polishing medium;The polishing medium mixed is poured into dress liquid device and starting blender and temperature-controlling system, control temperature is selected to set It is set to 25-40 DEG C.
S6, setting machined parameters: in 10~40rpm, air-breathing disk rotating speed is controlled in 5~40rpm for upper polishing disk rotating speed control, Same time is arranged in positive and negative rotation, and unit pressure is 0.2~0.8kg/cm2, rate-of flow 5L/min;
S7, it drives upper polishing disk to rise to safe altitude by cylinder, then product alignment suction hole is well placed, then open Air-breathing on dynamic control cabinet switchs and checks whether product sucks admittedly, presses to upper polishing disk on product after determining absorption securely And start processing program;
S8, after the one side of product has been refined, polishing disk and suction disk operation, and upper polishing disk are moved up in stopping, will Product moves down upper polishing disk after changing face, and is again started up air-breathing switch, after determining absorption securely, then according in step S6 Processing program carries out being again started up processing, completes the fine grinding of product another side;
S9, after the two sides of product is all polished, by product taking-up be put into cleaned up in clean water after take out.
Grounds travel in the step S1 is B4C with same particle sizes and polycrystalline diamond micro mist is according to mass ratio 10:1 It mixes, wherein B4C and polycrystalline diamond powder size are one of W3~W9.
The partial size of silica solution in the step S5 is 30~120nm.
The ultra-thin ceramic fingerprint slice lapping equipment includes rack and rack-mounted upper polishing disk, lower fixation Disk, elevating mechanism, medium spraying mechanism, rotating mechanism and control cabinet, the upper polishing disk are gone up and down by being located at upper rack Mechanism driving, lower fixed disk are located at the lower part of upper polishing disk, and corresponding with upper polishing disk;The upper polishing disk with it is lower solid It is provided with several suction disks with suction hole between price fixing, fixation under being mounted on that the lower part of each suction disk is rotated by shaft On disk, the outer wall of the suction disk is driven by rotating mechanism;One end of air intake duct is connected to the suction hole of each suction disk, another End is connected to vacuum pump, and the vacuum pump, elevating mechanism, medium spraying mechanism and rotating mechanism access control cabinet.
The elevating mechanism includes cylinder, pressure sensor, connecting rod and bulb bearing, and the cylinder is mounted on machine On frame, it is arranged along the vertical direction;One end of the connecting rod is linked together by the piston rod of pressure sensor and cylinder, another End is linked together by bulb bearing and the upper polishing disk.
The rotating mechanism includes the inner shaft set gradually from the inside to the outside, axis and outer shaft, the inner shaft, axis and Outer shaft coaxial arrangement forms inner shaft gear ring in the upper end of the inner shaft, is provided on the upper polishing disk sliding with inner shaft gear ring Inner shaft lower gear is installed in the polishing disk gear ring of dynamic cooperation, the lower end of inner shaft, the inner shaft lower gear and is mounted on the first variable-frequency motor On first gear engagement;Sun gear gear ring is arranged in the upper end of the axis, is provided on each suction disk and the sun The suction disk gear ring of gear ring engagement is taken turns, the lower end of the axis is equipped with axis lower gear, the axis lower gear and is mounted on the Second gear engagement on two variable-frequency motors, the upper end of the outer shaft form arc-shaped bracket, all suction disks are surrounded, should Outer shaft ring gear is provided on the inside of arc-shaped bracket, the lower end of the outer shaft is equipped with outer shaft lower gear, the outer shaft lower gear It is engaged with the third gear being mounted on third variable-frequency motor.
The medium spraying mechanism includes water pump and liquid pushing tube, the liquid outlet of the water pump and rack-mounted liquor charging One end of pipe is connected to, and the other end of the liquid pushing tube is corresponding with the inlet on upper polishing disk, sets on the upper polishing disk It is equipped with the feed pathway being connected to the inlet of upper polishing disk, the liquid outlet of the feed pathway is located at the lower end surface of upper polishing disk.
Sealing ring is embedded on the suction disk.
The invention has the advantages that
1. sealing air-breathing single-sided process technique using suction disk: consolidating by the way of sealing air-breathing with major diameter disk to product Fixed (traditional is fixed using blue steel piece) is carried out single-sided process to product, is inhaled using sealing using Twp-sided polishing machine process principle The fixed form of gas is fitted in product completely in fixed disk, and very securely, improves the stability of processing; And the pressure and revolving speed of processing can be improved, to improve efficiency;It is not influenced by tradition polishing blue steel piece thickness, therefore The product of thinner (0.04mm≤thickness < 0.08mm) out can be added
2. using gradual change parameter process: being carried out respectively using the realization of multiple variable-frequency motors to upper polishing disk, polishing disk gear ring Individually (traditional cannot individually control, and can only realize several fixed speed ratios, and can only select in process of production wherein for control It is a kind of), making it during operation may be implemented that different parameters (such as revolving speed and rotation direction) is separately provided, and adopt in process Make the motion profile of product in process more random, mixed and disorderly, random with multiple groups different parameters (gradual change parameter process) Rule, thus guarantee product surface more evenly, roughness is lower and prevents the generation of ripple.3. using constant temperature technique: refining Process be easy to generate heat, there is orange peel bad phenomenon so as to cause product surface and silica solution rapid evaporation caused to crystallize into firmly Little particle causes product surface to scratch;Thermostatic control is carried out using the polishing medium silica solution that temperature-controlling system throws section to essence, is guaranteed Within the scope of a fixed temperature, to avoid orange peel bad and scratch to generate;Use blender always in process of production Stirring guarantees that medium does not precipitate, and mixed liquor is uniformly to guarantee processing efficiency.
4. using coarse-fine two procedures technique: tradition needs point three process that could complete to process, by changing fixation side (air-breathing is fixed to can be used high revolving speed high pressure to formula, and uses lesser, same particle size B4C (boron carbide) and polycrystalline diamond Micro powder granule mixture improves grinding efficiency as abrasive media), (gradual change parameter process can make slightly optimization machined parameters The surface of mill is uniform, roughness is low), it is possible to reduce roughly grinding operation only needs two procedures that can complete to process, promotion yield, Efficiency saves human cost.
5. using two-sided while repairing disk technology: traditional single-side machine can not be two-sided while repairing disk, cannot guarantee well on The relative flatness of lower wall, thus it cannot be guaranteed that in all disks product thickness consistency, this technique use single side grinding Polishing machine have effects that Double-plate machine it is the same repair disk.
Detailed description of the invention
Fig. 1 is agent structure schematic diagram of the invention.
Fig. 2 is enlarged drawing at the A of Fig. 1.
Fig. 3 is the installation relation schematic diagram of outer shaft ring gear and suction disk in Fig. 1.
Fig. 4 is the connection relationship diagram of suction disk and sealing ring in Fig. 1.
Specific embodiment
The invention will now be further described with reference to specific embodiments, the advantages and features of the present invention will be with description and It is apparent.But examples are merely exemplary for these, and it is not intended to limit the scope of the present invention in any way.Those skilled in the art Member it should be understood that without departing from the spirit and scope of the invention can details to technical solution of the present invention and form into Row modifications or substitutions, but these modifications and replacement are fallen within the protection scope of the present invention.
Referring to Fig. 1 to Fig. 4, the invention further relates to a kind of grinding technics of ultra-thin ceramic fingerprint piece, which passes through Ultra-thin ceramic fingerprint slice lapping equipment is completed, comprising the following steps:
S1, it selects cast iron plate as upper polishing disk (corase grinding), is made into suspension according to the grounds travel and water of mass ratio 1:5~30 The suspension mixed is poured into dress liquid device and selects starting blender by liquid;
S2, setting machined parameters: upper polishing disk rotating speed is arranged in 10~40rpm, and air-breathing disk rotating speed is equipped in 5~50rpm, Same time is arranged in positive and negative rotation, and unit pressure is 0.2~0.7kg/cm2, rate-of flow 4L/min;
S3, it drives upper polishing disk to rise to safe altitude by cylinder, then product alignment suction hole is well placed, then open Dynamic air-breathing switchs and checks whether product sucks admittedly, presses on product upper polishing disk after determining absorption securely and starts processing Program;
S4, after the one side of product has been roughly ground, polishing disk and suction disk operation, and upper polishing disk are moved up in stopping, will Product moves down upper polishing disk after changing face, and is again started up air-breathing switch, after determining absorption securely, then according in step S2 Processing program carries out being again started up processing, completes the corase grinding of product another side;
S5, replacement cast iron plate, select polished leather as upper polishing disk (fine grinding), according to mass ratio 1:2~6 silica solution with Water forms polishing medium;The polishing medium mixed is poured into dress liquid device and selects starting blender and temperature-controlling system, temperature control Temperature setting is 25-40 DEG C.
S6, setting machined parameters: in 10~40rpm, air-breathing disk rotating speed is controlled in 5~40rpm for upper polishing disk rotating speed control, Positive and negative rotation setting same time (refers to that the time for rotating forward processing in process is grown as the time setting of reversion processing, example It is 30S+300S+300S=630S, the time of reversion as roughly ground the time that upper polishing disk and suction tray rotate forward in parameter in example 1 For 30S+300S+300S=630S, refer to that the two times are identical), unit pressure is 0.2~0.8kg/cm2, rate-of flow is 5L/min;
S7, it drives upper polishing disk to rise to safe altitude by cylinder, then product alignment suction hole is well placed, then open Air-breathing on dynamic control cabinet switchs and checks whether product sucks admittedly, presses to upper polishing disk on product after determining absorption securely And start processing program;
S8, after the one side of product has been refined, polishing disk and suction disk operation, and upper polishing disk are moved up in stopping, will Product moves down upper polishing disk after changing face, and is again started up air-breathing switch, after determining absorption securely, then according in step S6 Processing program carries out being again started up processing, completes the fine grinding of product another side;
S9, after the two sides of product is all polished, by product taking-up be put into cleaned up in clean water after take out.
Grounds travel in the step S1 is B4C with same particle sizes and polycrystalline diamond micro mist is according to mass ratio 10:1 It mixes, wherein B4C and polycrystalline diamond powder size are one of W3~W9.
The partial size of silica solution in the step S5 is 30~120nm.
A kind of ultra-thin ceramic fingerprint slice lapping equipment include rack and rack-mounted upper polishing disk 6, Lower fixed disk 14, elevating mechanism, medium spraying mechanism, rotating mechanism and control cabinet 20, the upper polishing disk 6 is by being located at machine The driving of frame top elevating mechanism, lower fixed disk 14 are located at the lower part of upper polishing disk, and corresponding with upper polishing disk 6;Described Several suction disks 4 with suction hole 2 are provided between upper polishing disk 6 and lower fixed disk 14, the lower part of each suction disk 4 is by turning What axis 13 rotated is mounted on lower fixed disk 14, and the outer wall of the suction disk 4 is driven by rotating mechanism;One end of air intake duct 3 with The suction hole 2 of each suction disk 4 is connected to, and the other end is connected to vacuum pump (not shown), the vacuum pump, elevating mechanism, Jie Matter spraying mechanism and rotating mechanism access control cabinet 20.
The elevating mechanism includes cylinder 11, pressure sensor 9, connecting rod 8 and bulb bearing 7, the cylinder 11 It is mounted on the rack, is arranged along the vertical direction;One end of the connecting rod 8 is connected by the piston rod 10 of pressure sensor 9 and cylinder It is connected together, the other end is linked together by bulb bearing 7 with the upper polishing disk 6.
The rotating mechanism includes the inner shaft 12 set gradually from the inside to the outside, axis 16 and outer shaft 18, the inner shaft 12, axis 16 and outer shaft 18 are coaxially disposed, and are formed inner shaft gear ring in the upper end of the inner shaft 12, are set on the upper polishing disk 6 It is equipped with the polishing disk gear ring being slidably matched with inner shaft gear ring, inner shaft lower gear, the inner shaft lower gear and peace are installed in the lower end of inner shaft First gear engagement on the first variable-frequency motor 19-1;Sun gear gear ring 15, Mei Yisuo is arranged in the upper end of the axis 16 The suction disk gear ring engaged with sun gear gear ring 15 is provided on the suction disk 4 stated, the lower end of the axis 16 is equipped with axis Lower gear, the axis lower gear are engaged with the second gear being mounted on the second variable-frequency motor 19-3, the outer shaft 18 it is upper End forms arc-shaped bracket, and all suction disks 4 are surrounded, outer shaft ring gear 17 is provided on the inside of the arc-shaped bracket, the outer shaft 18 lower end is equipped with outer shaft lower gear, the outer shaft lower gear and the third gear being mounted on third variable-frequency motor 19-2 Engagement.
The medium spraying mechanism includes water pump and liquid pushing tube 21, and the liquid outlet of the water pump is sent with rack-mounted Liquid pipe 21 one end connection (inlet of water pump and the reservoir for holding abrasive media solution, the solution of abrasive media according to Difference that corase grinding, precision grinding process require and it is different), the other end of the liquid pushing tube 21 is with setting in the enterprising liquid channel phase of upper polishing disk Corresponding, the liquid outlet of the feed pathway is located at the lower end surface of upper polishing disk, and abrasive media solution passes through the feed liquor on upper polishing disk Channel is fallen on product to be ground.
Sealing ring 5 is embedded on the suction disk 4.
The working principle of the invention is: drive upper polishing disk 6 to do rotation movement by inner shaft 12 respectively when converted products 1, in Axis 16 drives suction disk 4 to do rotation movement, and suction disk 4 does the planetary motion of rotation and revolution relative to upper polishing disk 6.Due to all It is individually to control and may be implemented stepless time adjustment, so setting different phase different parameters by control cabinet 20 in process Realize that irregular machining locus, 6 suction disks 4 are all by the driving of the same sun gear gear ring 15, therefore motion profile complete one It causes;Keep the product surface quality on each suction disk 4 more preferable, thickness is more evenly.In converted products, outer shaft 18 is motionless, only Plate wheel will be repaired when repairing disk to be placed on above suction disk 4 and be meshed with outer shaft ring gear 17, sun gear gear ring 15 respectively;Pass through Axis 16 and 18 different rotating speeds of outer shaft are set, do planetary motion relative to upper polishing disk 6 and suction disk 4 to realize and repair plate wheel, It realizes that two disks are modified simultaneously up and down, while polishing disk 6 is smooth in guarantee, guarantees that 64 disks of suction disk are smooth consistent Property.Grinding and polishing medium connect by liquid pushing tube 21 with water pump, then by 20 property of can choose of control cabinet unlatching temperature-controlling system with Blender (carries out control gentle agitation to the container for holding abrasive media solution), realizes constant temperature processing.
Since using air-breathing single-sided process is sealed, product is securely close to disk, therefore can process thinner thin slice Ceramics, the most thin thin slice ceramics for being capable of processing out 0.04mm.
Embodiment 1:
Be 50mm by 180 diameters, with a thickness of 0.3mm mobile fingerprint cover board blank be processed into a thickness of 0.05mm at Product.Roughly grind B4C and polycrystalline diamond micro mist mixture and 30kg water mixed solution that medium is 1kg partial size W9;Fine grinding medium is 4kg The silica solution and 24kg water mixed solution of partial size 120nm.
Machined parameters:
It is 98.3% according to the product first-time qualification rate that the present embodiment technique obtains, surface roughness 2.9nm.
Embodiment 2: by 180 diameters be 50mm, with a thickness of 0.3mm mobile fingerprint cover board blank be processed into a thickness of The finished product of 0.05mm.Roughly grind B4C and polycrystalline diamond microparticle mixture and 30kg water mixed solution that medium is 2kg partial size W5; Refine the silica solution and 20kg water mixed solution that medium is 5kg partial size 50nm.
Machined parameters:
It is 99.4% according to the product first-time qualification rate that the present embodiment technique obtains, surface roughness 2.1nm.
Embodiment 3: by 180 diameters be 50mm, with a thickness of 0.3mm mobile fingerprint cover board blank be processed into a thickness of The finished product of 0.05mm.The B4C that grinding (corase grinding) medium is 3kg partial size W7 is mixed with polycrystalline diamond microparticle mixture and 15kg water Solution;Polish the silica solution and 21kg water mixed solution that (fine grinding) medium is 7kg partial size 80nm.
Machined parameters:
It is 98.8% according to the product first-time qualification rate that the present embodiment technique obtains, surface roughness 2.4nm.

Claims (8)

1. a kind of grinding technics of ultra-thin ceramic fingerprint piece, which is completed by ultra-thin ceramic fingerprint slice lapping equipment, Characterized by comprising the following steps:
S1, it selects cast iron plate as upper polishing disk, is made into suspension according to the grounds travel and water of mass ratio 1:5~30, will mix Good suspension pours into dress liquid device and selects starting blender;
S2, setting machined parameters: upper polishing disk rotating speed is arranged in 10~40rpm, and air-breathing disk rotating speed is equipped in 5~50rpm, positive and negative Turn setting same time, unit pressure is 0.2~0.7kg/cm2, rate-of flow 4L/min;
S3, it drives upper polishing disk to rise to safe altitude by cylinder, then product alignment suction hole is well placed, then starting is inhaled Air cock simultaneously checks whether product sucks admittedly, presses on product upper polishing disk after determining absorption securely and starts processing journey Sequence;
S4, after the one side of product has been roughly ground, polishing disk and suction disk operation, and upper polishing disk are moved up, by product in stopping Upper polishing disk is moved down after changing face, and is again started up air-breathing switch, after determining absorption securely, then according to the processing in step S2 Program carries out being again started up processing, completes the corase grinding of product another side;
S5, replacement cast iron plate, select polished leather as upper polishing disk, form polishing according to the silica solution and water of mass ratio 1:2~6 Medium;The polishing medium mixed is poured into dress liquid device and starting blender and temperature-controlling system, control temperature is selected to be set as 25-40℃。
S6, setting machined parameters: in 10~40rpm, the control of air-breathing disk rotating speed is positive and negative in 5~40rpm for upper polishing disk rotating speed control Turn setting same time, unit pressure is 0.2~0.8kg/cm2, rate-of flow 5L/min;
S7, it drives upper polishing disk to rise to safe altitude by cylinder, then product alignment suction hole is well placed, then starting control Air-breathing on case processed switchs and checks whether product sucks admittedly, and upper polishing disk is pressed on product and opened after determining absorption securely Dynamic processing program;
S8, after the one side of product has been refined, polishing disk and suction disk operation, and upper polishing disk are moved up, by product in stopping Upper polishing disk is moved down after changing face, and is again started up air-breathing switch, after determining absorption securely, then according to the processing in step S6 Program carries out being again started up processing, completes the fine grinding of product another side;
S9, after the two sides of product is all polished, by product taking-up be put into cleaned up in clean water after take out.
2. a kind of grinding technics of ultra-thin ceramic fingerprint piece according to claim 1, which is characterized in that the step S1 In grounds travel be that B4C with same particle sizes and polycrystalline diamond micro mist are mixed according to mass ratio 10:1, wherein B4C and more Brilliant diamond powder size is one of W3~W9.
3. a kind of grinding technics of ultra-thin ceramic fingerprint piece according to claim 1, which is characterized in that the step S5 In silica solution partial size be 30~120nm.
4. according to claim 1 to a kind of grinding technics of ultra-thin ceramic fingerprint piece described in 3 any one, which is characterized in that The ultra-thin ceramic fingerprint slice lapping equipment includes rack and rack-mounted upper polishing disk, lower fixed disk, lifting Mechanism, medium spraying mechanism, rotating mechanism and control cabinet, the upper polishing disk are driven by being located at upper rack elevating mechanism Dynamic, lower fixed disk is located at the lower part of upper polishing disk, and corresponding with upper polishing disk;The upper polishing disk and lower fixed disk it Between be provided with several suction disks with suction hole, the lower part of each suction disk is mounted on lower fixed disk by what shaft rotated, The outer wall of the suction disk is driven by rotating mechanism;One end of air intake duct is connected to the suction hole of each suction disk, the other end with Vacuum pump connection, the vacuum pump, elevating mechanism, medium spraying mechanism and rotating mechanism access control cabinet.
5. a kind of grinding technics of ultra-thin ceramic fingerprint piece according to claim 4, which is characterized in that the elevator Structure includes cylinder, pressure sensor, connecting rod and bulb bearing, and the cylinder is mounted on the rack, is arranged along the vertical direction; One end of the connecting rod is linked together by the piston rod of pressure sensor and cylinder, the other end by bulb bearing with it is described Upper polishing disk link together.
6. a kind of grinding technics of ultra-thin ceramic fingerprint piece according to claim 5, which is characterized in that the whirler Structure includes the inner shaft set gradually from the inside to the outside, axis and outer shaft, the inner shaft, axis and outer shaft coaxial arrangement, described The upper end of inner shaft forms inner shaft gear ring, is provided with the polishing disk gear ring being slidably matched with inner shaft gear ring on the upper polishing disk, Inner shaft lower gear is installed in the lower end of inner shaft, which engages with the first gear being mounted on the first variable-frequency motor;Institute The upper end setting sun gear gear ring of axis is stated, is provided with the suction disk tooth engaged with sun gear gear ring on each suction disk Circle, the lower end of the axis are equipped with axis lower gear, the axis lower gear and the second tooth being mounted on the second variable-frequency motor The upper end of wheel engagement, the outer shaft forms arc-shaped bracket, and all suction disks are surrounded, are provided on the inside of the arc-shaped bracket Outer shaft ring gear, the lower end of the outer shaft are equipped with outer shaft lower gear, the outer shaft lower gear and are mounted on third variable-frequency motor On third gear engagement.
7. a kind of grinding technics of ultra-thin ceramic fingerprint piece according to claim 1, which is characterized in that the medium spray Spilling mechanism includes water pump and liquid pushing tube, and the liquid outlet of the water pump is connected to one end of rack-mounted liquid pushing tube, the liquor charging The other end of pipe is corresponding with the inlet on upper polishing disk, and the feed liquor with upper polishing disk is provided on the upper polishing disk The feed pathway of mouth connection, the liquid outlet of the feed pathway are located at the lower end surface of upper polishing disk.
8. a kind of grinding technics of ultra-thin ceramic fingerprint piece according to claim 4, which is characterized in that the suction disk On be embedded with sealing ring.
CN201811278012.5A 2018-10-30 2018-10-30 A kind of ultra-thin ceramic fingerprint slice lapping technique Pending CN109551304A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811278012.5A CN109551304A (en) 2018-10-30 2018-10-30 A kind of ultra-thin ceramic fingerprint slice lapping technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811278012.5A CN109551304A (en) 2018-10-30 2018-10-30 A kind of ultra-thin ceramic fingerprint slice lapping technique

Publications (1)

Publication Number Publication Date
CN109551304A true CN109551304A (en) 2019-04-02

Family

ID=65865527

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811278012.5A Pending CN109551304A (en) 2018-10-30 2018-10-30 A kind of ultra-thin ceramic fingerprint slice lapping technique

Country Status (1)

Country Link
CN (1) CN109551304A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111958482A (en) * 2020-09-16 2020-11-20 大连达利凯普科技股份公司 Vacuum suction tool for ultrathin single-layer ceramic capacitor substrate and manufacturing process
WO2021008129A1 (en) * 2019-07-18 2021-01-21 浙江科惠医疗器械股份有限公司 Magneto-rheological polishing machine for ceramic lining in metal acetabulum
CN112476067A (en) * 2020-11-23 2021-03-12 中国电子科技集团公司第十八研究所 Method for thinning inorganic electrolyte ceramic wafer for lithium ion battery
CN114309920A (en) * 2021-12-23 2022-04-12 潮州三环(集团)股份有限公司 Ceramic cleaver and preparation method thereof
CN115847278A (en) * 2023-01-09 2023-03-28 江苏纳沛斯半导体有限公司 Wafer back grinding device and grinding process

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227361A (en) * 1983-06-07 1984-12-20 Supiide Fuamu Kk Surface grinder
JP2539753B2 (en) * 1993-09-21 1996-10-02 住友シチックス株式会社 Mirror polishing machine for semiconductor substrates
CN2461702Y (en) * 2001-01-15 2001-11-28 朱正元 Ceramic measuring block grinding disk
CN1496581A (en) * 2002-01-11 2004-05-12 株式会社迪思科 Semiconductor wafer protective member and semiconductor wafer grinding method
CN102643613A (en) * 2012-03-31 2012-08-22 江苏鑫和泰光电科技有限公司 Grinding liquid for sapphire substrate and preparation method of grinding liquid
CN104015122A (en) * 2014-06-18 2014-09-03 蓝思科技股份有限公司 Double-sided copper disc grinding process for sapphire panel
CN108002831A (en) * 2017-12-21 2018-05-08 湖南正阳精密陶瓷有限公司 A kind of method that zirconia ceramics fingerprint piece is made using injection moulding

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227361A (en) * 1983-06-07 1984-12-20 Supiide Fuamu Kk Surface grinder
JP2539753B2 (en) * 1993-09-21 1996-10-02 住友シチックス株式会社 Mirror polishing machine for semiconductor substrates
CN2461702Y (en) * 2001-01-15 2001-11-28 朱正元 Ceramic measuring block grinding disk
CN1496581A (en) * 2002-01-11 2004-05-12 株式会社迪思科 Semiconductor wafer protective member and semiconductor wafer grinding method
CN102643613A (en) * 2012-03-31 2012-08-22 江苏鑫和泰光电科技有限公司 Grinding liquid for sapphire substrate and preparation method of grinding liquid
CN104015122A (en) * 2014-06-18 2014-09-03 蓝思科技股份有限公司 Double-sided copper disc grinding process for sapphire panel
CN108002831A (en) * 2017-12-21 2018-05-08 湖南正阳精密陶瓷有限公司 A kind of method that zirconia ceramics fingerprint piece is made using injection moulding

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021008129A1 (en) * 2019-07-18 2021-01-21 浙江科惠医疗器械股份有限公司 Magneto-rheological polishing machine for ceramic lining in metal acetabulum
CN111958482A (en) * 2020-09-16 2020-11-20 大连达利凯普科技股份公司 Vacuum suction tool for ultrathin single-layer ceramic capacitor substrate and manufacturing process
CN112476067A (en) * 2020-11-23 2021-03-12 中国电子科技集团公司第十八研究所 Method for thinning inorganic electrolyte ceramic wafer for lithium ion battery
CN114309920A (en) * 2021-12-23 2022-04-12 潮州三环(集团)股份有限公司 Ceramic cleaver and preparation method thereof
CN115847278A (en) * 2023-01-09 2023-03-28 江苏纳沛斯半导体有限公司 Wafer back grinding device and grinding process

Similar Documents

Publication Publication Date Title
CN109551304A (en) A kind of ultra-thin ceramic fingerprint slice lapping technique
CN104999365B (en) Sapphire wafer abrasive polishing method
CN105563355A (en) Grinding wheel for rapidly polishing surface of workpiece and preparation method of grinding wheel
CN112158867A (en) Alumina slurry and preparation method and application thereof
CN109824071A (en) A kind of calciner plant of brown corundum abrasive
CN204974057U (en) Powder grinding device
CN116021359B (en) Silicon wafer fine grinding device capable of automatically adjusting polished workpiece
CN104589172B (en) A kind of polishing method of chalcogenide glass
CN204523268U (en) The batch mixing tower of diadust particle multistage grader
CN104689925A (en) Multistage classifier and classification method of superfine diamond micro-powder particles
CN204768951U (en) Powder grinding device
JP6678850B2 (en) Pottery ultra-fine powder preparation technology equipment
CN110885637A (en) Preparation method of rare earth fluoride polishing powder and rare earth fluoride polishing solution
CN114590814B (en) Abrasive preparation device, polishing system and working method
CN1563244A (en) Grinding fluid in use for superhard abrasive grinding wheel of metal binding agent electrolyzable online, and preparation method
CN110315425A (en) Sapphire wafer free abrasive milling apparatus
CN205797300U (en) A kind of hard alloy produces uses metal dust lapping device
CN206614423U (en) A kind of preparation facilities of the polishing disk with gradient function
CN108581857A (en) A kind of gallium arsenide wafer polishing ultra-fine buffing wheel and preparation method thereof
CN110041733B (en) Nanoscale black pigment for high-temperature sintering of zirconia ceramic and preparation method thereof
CN208289705U (en) Device is used in a kind of polishing of silicon chip back side
CN110194903A (en) Chemical reaction kettle and the processing method for using the chemical reaction kettle
CN107053026A (en) A kind of method and its preparation facilities for preparing gradient function polishing disk
CN102173758B (en) Composite ceramic polishing chip and preparation method thereof
CN204523267U (en) The device of transferring shares of ultra-fine diamond micro powder granule multi-stage classifier

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
AD01 Patent right deemed abandoned

Effective date of abandoning: 20200522

AD01 Patent right deemed abandoned