CN109521650B - A kind of mass balance method and device for high-speed exposure - Google Patents
A kind of mass balance method and device for high-speed exposure Download PDFInfo
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- CN109521650B CN109521650B CN201811349972.6A CN201811349972A CN109521650B CN 109521650 B CN109521650 B CN 109521650B CN 201811349972 A CN201811349972 A CN 201811349972A CN 109521650 B CN109521650 B CN 109521650B
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- exposure
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- mass balance
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Abstract
The present invention discloses a kind of mass balance method and device for high-speed exposure；It crosses spring and damping system in parallel and carries out vibration damping, and then being balanced property of quality momentum caused by high-velocity scanning is eliminated, and equilibrium displacement caused by spring and damping system can be obtained by detection, and it finally feeds back to driving unit and reposition until meeting the requirements, and then improve the speed of service and precision of exposure system.The present invention can establish a kind of high speed, high frequency, high-precision exposure mass balance mechanism.
Description
Technical field
The invention belongs to Precision Instrument and Machinery technical field, in particular to a kind of mass balance side for high-speed exposure
Method and device.
Background technique
In recent years, as advanced manufacture of microchips is increasingly towards, function is integrated and volume microminiaturization develops, gas-static
The benchmark that moves along a straight line becomes one of the critical component in the litho machine of tip with the remarkable advantages such as its high speed and high-precision；Photoetching
The high speed of diaphragm piece, high acceleration and high kinematic accuracy demand in machine exposure system, in gas-static linear motion benchmark
Pneumato-static slideway proposes the requirement of high bearing capacity, high rotational stiffness；To avoid straight-line motion mechanism from blocking optical path or touching
Optical device is touched, diaphragm piece is mounted on the cantilever end of linear motion benchmark, it is therefore desirable to which the rotation for improving pneumato-static slideway is rigid
Degree, to resist the rotating torque generated when diaphragm piece high acceleration moving；And exposure system of photo-etching machine is complicated and accurate, gas is quiet
Straightening line movement mechanism needs to minimize, therefore improves the rotational stiffness on unit area, becomes restriction pneumato-static slideway and exists
The main difficult technical applied in exposure system of photo-etching machine.
2008,38nm chip may be implemented in the Twinscan XT 1950i type litho machine that Dutch ASML company is researched and developed
Laser ablation.Linear motion benchmark in its exposure system uses mechanical guide structure, and has reached 40m/s2Acceleration fortune
Dynamic (Y.B.Patrick Kwan, Erik L.Loopstra.Nullifying Acceleration Forces in Nano-
Positioning Stages for Sub-0.1mm Lithography Tool for 300mm Wafers[J]
.proceeding of SPIC:Optical Microlithography, 2010,4346:544-557)；But with chip system
The development of industry is made, traditional slides/rolls guide rail is difficult to meet the requirement of High acceleration motion and service temperature stability.
Patent CN201310436356 " experimental provision is unfolded in air bearing suspension type three-dimensional " proposes a kind of positioning accuracy height response
Fireballing three-dimensional motion device mainly includes the spatially corresponding distribution of more than ten of air bearing movement mechanism, and by pulley, hang
The mechanisms such as rope, counterweight are mounted on inside scaffold；But although the device can satisfy certain kinematic accuracy, but due to
It is more to move link, under high frequency motion state, can not ensure quick and accurate dynamic respond in output end, and structure is not
It is enough compact.
Patent CN201410839808 " a kind of double air-float guide rail formula grating ruling knife rest driving devices " proposes a kind of small-sized
Motion in one dimension device, main include the two groups of air-float guide rails installed in parallel, and is improved by way of being connected air bearing sliding sleeve
Delineate the kinetic stability of knife rest；High speed, high frequency motion may be implemented in the device, but exports compared to the displacement with the device
End, such as knife rest pinboard and portrays knife rest, and air-float guide rail is excessively huge, therefore the rotational stiffness on unit area is poor, and
Knife rest clump weight is needed to keep balancing.
Patent CN201310364613 " mass balance mechanism and the slicer using the device ", is set using combined effect part
Meter guarantees that objective table can accept balance when accelerating or replacing prepared product by a series of lever, pulley, cam mechanism；
But the device link is more, and is driven by torque, the unsuitable linear motion occasion applied to high-speed, high precision, and for
For exposure system of photo-etching machine, volume is excessively huge.
Being common that for foregoing invention cannot be by the mutual restriction of the effective film speed for solving litho machine and precision
The problem of, interior high-speed high frequency exposure moves generated quality momentum in a limited space, will certainly draw if do not can be effectively controlled
Hair vibration, and seriously affect exposure accuracy；Therefore, by spring and damping system in parallel, above-mentioned quality momentum is carried out flat
Weighing apparatus property is eliminated, and equilibrium displacement caused by system can be obtained by detection, and is finally fed back to driving unit and carried out again
Positioning not only ensure that exposure efficiency in this way but also had certain stability, and then improved the operation of exposure system up to meeting the requirements
Speed and precision.
Summary of the invention
The purpose of the present invention is to above-mentioned prior art there are the problem of, a kind of mass balance for high-speed exposure
Method and apparatus carry out vibration damping by parallel spring and damping system, to quality momentum caused by above-mentioned high-velocity scanning into
Row balance is eliminated, and equilibrium displacement caused by spring and damping system can be obtained by detection, and finally feed back to drive
Moving cell reposition up to meeting the requirements, and not only ensure that exposure efficiency in this way but also had had certain stability, and then has improved
The speed of service and precision of exposure system.
Above-mentioned purpose is realized by the following technical solution:
A kind of mass balance method for high-speed exposure, this method can in the same direction and be moved toward one another by parallelly distribute on
Exposure module forms exposure area, and the change width of exposure area is realized by the movement of exposure module, exposure module it is opposite
Movement is driven by power unit, and the relative displacement of power unit and exposure module is measured by level encoder device；Damping
Unit and spring unit parallel configuration are between power unit and absolute standard, caused by the acceleration movement for eliminating exposure module
Quality momentum, the equilibrium displacement that power unit generates during momentum is eliminated are measured by second level encoder, relative displacement
Vector sum with equilibrium displacement is the actual displacement of exposure module；Using the actual displacement obtained in real time as foundation, power can be passed through
Unit carries out exposure module to drive the final positioning until exposure area again.
A kind of mass balance mechanism for high-speed exposure, the device include longitudinal scanning system and transversal scanning system,
Longitudinal scanning system and transversal scanning system are connected and orthogonal configuration, the composition phase with longitudinal scanning system of transversal scanning system
Together；The longitudinal scanning system includes vibration isolation shell, scanning executing agency, damping mechanism and spring mechanism, damping mechanism and bullet
Spring mechanism is mounted in parallel between vibration isolation shell and scanning executing agency, and vibration isolation shell is equipped with high-resolution reader, and scanning is held
Precision linear encoder is installed, the installation site of high-resolution reader is corresponding with precision linear encoder in row mechanism；The scanning executes
Mechanism includes pedestal, sweep unit and upper cover；The pedestal includes pot shell, the gentle floating workbench of serial coil, is processed on pot shell
There is card slot, serial coil is mounted in card slot, and air-flotation workbench is mounted on pot shell, and is parallel to serial coil；The scanning
Component includes scanning board, L-type gantry and array magnet steel module, and scanning board and array magnet steel module are connected on L-type gantry, battle array
Column magnet steel module is equipped with grating scale and anticollision damping, is equipped with air bearing slide plate on L-type gantry；Reading is installed on the upper lid
The installation site of head, reading head is corresponding with grating scale.
The sweep unit is movably assemblied on pedestal, and wherein it is gentle floating to be assemblied in serial coil for array magnet steel module
Between workbench, L-type gantry is assemblied in above air-flotation workbench.
The serial fitting coils array magnet steel module drive sweep unit carries out linear reciprocating motion, and air-flotation workbench is matched
It closes air bearing slide plate and bearing guiding is carried out to sweep unit, reading head cooperates grating scale to carry out relative position measurement to sweep unit；
Damping mechanism and spring mechanism cooperation, the momentum variation that executing agency is scanned when in high-speed exposure carry out mass balance；High score
Distinguish that reader cooperation precision linear encoder measures the vibration displacement of scanning executing agency；The actual displacement of scanning board is reading
The sum of head and the measurement result of high-resolution reader.
The rigidity of damping unit is much larger than spring unit, eliminates equilibrium displacement caused by quality momentum and is no more than 0.5mm
Magnitude is measured using the displacement of second level coder balances, and the precision of second level encoder is much larger than level encoder device.
Array magnet steel module is installed on sweep unit and forms electromagnetic drive, air bearing slide plate is installed on sweep unit and is formed
Gas suspension guiding, is not connected to any cable structure.
The invention has the characteristics that and the utility model has the advantages that
1, the method for the present invention and device are eliminated high-velocity scanning and are produced by spring and damping system progress vibration damping in parallel
Raw quality momentum, has the function of mass balance, realizes the high-speed high frequency scanning motion of middle-size and small-size straight-line motion mechanism.
2, the method for the present invention and device have used 2 grades of displacement measurement method and apparatus, have both included the high-velocity scanning position of macroscopic view
It moves, and is displaced including high-frequency vibration, 2 grades of displacement measurement adductions as actual displacement and are fed back into driving unit progress essence
Close control and reposition are finally reached the purpose that high speed, high frequency, high-precision scan.
Apparatus of the present invention are widely used, be particularly suitable for the middle-size and small-size straight-line motion mechanism of exposure system of photo-etching machine high speed,
High frequency, high-precision scanning motion occasion.
Detailed description of the invention
Fig. 1 is a kind of mass balance method schematic diagram for high-speed exposure.
Fig. 2 is a kind of mass balance mechanism schematic diagram for high-speed exposure.
Fig. 3 is longitudinal scanning system schematic.
Fig. 4 is scanning executing agency's schematic diagram.
Fig. 5 is base schematic diagram.
Fig. 6 is sweep unit schematic diagram.
In figure: a, exposure module；B, exposure area；C, power unit；D, level encoder device；E, spring unit；F, it damps
Unit；G, second level encoder；H, absolute standard；P, relative displacement；Q, equilibrium displacement；R, quality momentum；S, actual displacement；1, it indulges
To scanning system；2, transversal scanning system；3, vibration isolation shell；4, executing agency is scanned；5, damping mechanism；6, spring mechanism；7,
High-resolution reader；8, precision linear encoder；9, pedestal；10, sweep unit；11, upper cover；12, reading head；13, pot shell；14, it goes here and there
Line circle；15, air-flotation workbench；16, card slot；17, scanning board；18, L-type gantry；19, grating scale；20, array magnet steel module；
21, air bearing slide plate；22, anticollision damps.
Specific embodiment
It elaborates with reference to the accompanying drawing to the embodiment of the present invention.
With reference to Fig. 1, a kind of mass balance method for high-speed exposure, this method can in the same direction and phase by parallelly distribute on
Exposure area b is formed to the exposure module a of movement, the change width of exposure area b is realized by the movement of exposure module a, is exposed
The relative motion of optical module a is driven by power unit c, and the relative displacement p of power unit c and exposure module a are compiled by level-one
Code device d is measured；Damping unit f and spring unit e parallel configuration eliminate exposure between power unit c and absolute standard h
Quality momentum r caused by the acceleration movement of module a, the equilibrium displacement q that power unit c is generated during momentum is eliminated pass through two
Grade encoder g is measured, and the vector sum of relative displacement p and equilibrium displacement q are the actual displacement s of exposure module a；To obtain in real time
The actual displacement s taken is foundation, to exposure module a can driven again until exposure area b's is final by power unit c
Positioning.
The rigidity of damping unit f is much larger than spring unit e, eliminates equilibrium displacement q caused by quality momentum r and is no more than
0.5mm magnitude is measured using second level encoder g equilibrium displacement q, and the precision of second level encoder g is much larger than level encoder device
d。
With reference to Fig. 2, a kind of mass balance mechanism for high-speed exposure, the device includes longitudinal scanning system 1 and transverse direction
Scanning system 2, longitudinal scanning system 1 and transversal scanning system 2 are connected and orthogonal configuration, and transversal scanning system 2 is swept with longitudinal
The composition for retouching system 1 is identical.
With reference to Fig. 3, the longitudinal scanning system 1 includes vibration isolation shell 3, scanning executing agency 4, damping mechanism 5 and spring
Mechanism 6, damping mechanism 5 and spring mechanism 6 are mounted in parallel between vibration isolation shell 3 and scanning executing agency 4, and vibration isolation shell 3 is pacified
Equipped with high-resolution reader 7, scan and precision linear encoder 8 be installed in executing agency 4, the installation site of high-resolution reader 7 with
Precision linear encoder 8 is corresponding.
With reference to Fig. 4, the scanning executing agency 4 includes pedestal 9, sweep unit 10 and upper cover 11.
With reference to Fig. 5, the pedestal 9 includes pot shell 13, serial coil 14 and air-flotation workbench 15, is machined with card on pot shell 13
Slot 16, serial coil 14 are mounted in card slot 16, and air-flotation workbench 15 is mounted on pot shell 13, and are parallel to serial coil 14.
With reference to Fig. 6, the sweep unit 10 includes scanning board 17, L-type gantry 18 and array magnet steel module 20, scanning board 17
It being connected on L-type gantry 18 with array magnet steel module 20, array magnet steel module 20 is equipped with grating scale 19 and anticollision damping 22,
Air bearing slide plate 21 is installed on L-type gantry 17；Reading head 12, the installation site and light of reading head 12 are installed in the upper cover 11
Grid ruler 19 is corresponding.
With reference to Fig. 3-6, the sweep unit 10 is movably assemblied on pedestal 9, and wherein array magnet steel module 20 is assembled
Between serial coil 14 and air-flotation workbench 15, L-type gantry 17 is assemblied in 15 top of air-flotation workbench.The serial coil 14
Cooperate array magnet steel module 20 that sweep unit 10 is driven to carry out linear reciprocating motion, air-flotation workbench 15 cooperates air bearing slide plate 21 right
Sweep unit 10 carries out bearing guiding, and reading head 12 cooperates grating scale 19 to carry out relative position measurement to sweep unit 10；Damping
Mechanism 5 and spring mechanism 6 cooperate, and the momentum variation that executing agency 4 is scanned when in high-speed exposure carries out mass balance；High-resolution
Reader 7 cooperates the vibration displacement of 8 pairs of precision linear encoder scanning executing agencies 4 to measure；The actual displacement of scanning board 17 is
The sum of the measurement result of reading head 12 and high-resolution reader 7.
Array magnet steel module 20 is installed on sweep unit 10 and forms electromagnetic drive, air bearing is installed sliding on sweep unit 10
Plate 21 forms gas suspension guiding, is not connected to any cable structure.
Claims (4)
1. a kind of mass balance method for high-speed exposure, this method can in the same direction and the exposure that moves toward one another by parallelly distribute on
Optical module (a) forms exposure area (b), and the change width of exposure area (b) is realized by the movement of exposure module (a), exposure
The relative motion of module (a) is driven by power unit (c), and the relative displacement (p) of power unit (c) and exposure module (a) is logical
Level encoder device (d) is crossed to measure；It is characterized by: damping unit (f) and spring unit (e) parallel configuration are in power unit
(c) between absolute standard (h), quality momentum (r) caused by the acceleration movement of exposure module (a) is eliminated, momentum was eliminated
The equilibrium displacement (q) that power unit (c) generates in journey is measured by second level encoder (g), relative displacement (p) and balance position
The vector sum for moving (q) is the actual displacement (s) of exposure module (a)；Actual displacement (s) to obtain in real time can pass through for foundation
Power unit (c) carries out exposure module (a) to drive the final positioning until exposure area (b) again.
2. a kind of mass balance method for high-speed exposure according to claim 1, it is characterised in that: damping unit
(f) rigidity is much larger than spring unit (e), eliminates equilibrium displacement (q) caused by quality momentum (r) and is no more than 0.5mm magnitude,
It is measured using second level encoder (g) equilibrium displacement (q), the precision of second level encoder (g) is much larger than level encoder device (d).
3. a kind of mass balance mechanism for high-speed exposure, which includes longitudinal scanning system (1) and transversal scanning system
(2), longitudinal scanning system (1) and transversal scanning system (2) are connected and orthogonal configuration, transversal scanning system (2) are swept with longitudinal
The composition for retouching system (1) is identical, it is characterised in that: the longitudinal scanning system (1) includes vibration isolation shell (3), scanning execution machine
Structure (4), damping mechanism (5) and spring mechanism (6), damping mechanism (5) and spring mechanism (6) are mounted in parallel in vibration isolation shell (3)
Between scanning executing agency (4), vibration isolation shell (3) is equipped with high-resolution reader (7), is installed in scanning executing agency (4)
Have precision linear encoder (8), the installation site of high-resolution reader (7) is corresponding with precision linear encoder (8)；The scanning executing agency
It (4) include pedestal (9), sweep unit (10) and upper cover (11)；The pedestal (9) include pot shell (13), serial coil (14) and
Air-flotation workbench (15) is machined with card slot (16) on pot shell (13), and serial coil (14) is mounted in card slot (16), air bearing work
Platform (15) is mounted on pot shell (13), and is parallel to serial coil (14)；The sweep unit (10) includes scanning board (17), L
Type gantry (18) and array magnet steel module (20), scanning board (17) and array magnet steel module (20) are connected in L-type gantry (18)
On, array magnet steel module (20) is equipped with grating scale (19) and anticollision damping (22), and L-type gantry is equipped with air bearing slide plate on (17)
(21)；It is equipped with reading head (12) on the upper cover (11), the installation site of reading head (12) is corresponding with grating scale (19)；
The sweep unit (10) is movably assemblied on pedestal (9), and wherein array magnet steel module (20) is assemblied in string line
It encloses between (14) and air-flotation workbench (15), L-type gantry (17) is assemblied in above air-flotation workbench (15)；The serial coil
(14) cooperation array magnet steel module (20) driving sweep unit (10) carries out linear reciprocating motion, and air-flotation workbench (15) cooperates gas
Slick and frivolous plate (21) carries out bearing guiding to sweep unit (10), reading head (12) cooperate grating scale (19) to sweep unit (10) into
Row relative position measurement；Damping mechanism (5) and spring mechanism (6) cooperation scan executing agency (4) and rush when in high-speed exposure
Amount variation carries out mass balance；High-resolution reader (7) cooperates precision linear encoder (8) to the vibration position of scanning executing agency (4)
Shifting measures；The actual displacement of scanning board (17) is the sum of the measurement result of reading head (12) and high-resolution reader (7).
4. a kind of mass balance mechanism for high-speed exposure according to claim 3, it is characterised in that: sweep unit
(10) array magnet steel module (20) is installed on and forms electromagnetic drive, air bearing slide plate (21) formation is installed on sweep unit (10)
Gas suspension guiding, is not connected to any cable structure.
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| CN201811349972.6A CN109521650B (en) | 2018-11-14 | 2018-11-14 | A kind of mass balance method and device for high-speed exposure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811349972.6A CN109521650B (en) | 2018-11-14 | 2018-11-14 | A kind of mass balance method and device for high-speed exposure |
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| Publication Number | Publication Date |
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| CN109521650A CN109521650A (en) | 2019-03-26 |
| CN109521650B true CN109521650B (en) | 2019-07-16 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108121166A (en) * | 2016-11-30 | 2018-06-05 | 上海微电子装备（集团）股份有限公司 | A kind of active vibration absorber and micropositioner |
| CN108663911A (en) * | 2018-05-09 | 2018-10-16 | 哈尔滨工业大学 | A kind of window scanning type exposure device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001297960A (en) * | 2000-04-11 | 2001-10-26 | Nikon Corp | Stage device and projection aligner |
| US20040057817A1 (en) * | 2002-09-24 | 2004-03-25 | Hazelton Andrew J. | Switchable damping mechanism for use in a stage apparatus |
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2018
- 2018-11-14 CN CN201811349972.6A patent/CN109521650B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108121166A (en) * | 2016-11-30 | 2018-06-05 | 上海微电子装备（集团）股份有限公司 | A kind of active vibration absorber and micropositioner |
| CN108663911A (en) * | 2018-05-09 | 2018-10-16 | 哈尔滨工业大学 | A kind of window scanning type exposure device |
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| CN109521650A (en) | 2019-03-26 |
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