CN109521644A - One kind being based on the fixed ultraviolet exposure machine of Micro-LED maskless - Google Patents
One kind being based on the fixed ultraviolet exposure machine of Micro-LED maskless Download PDFInfo
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- CN109521644A CN109521644A CN201710845328.7A CN201710845328A CN109521644A CN 109521644 A CN109521644 A CN 109521644A CN 201710845328 A CN201710845328 A CN 201710845328A CN 109521644 A CN109521644 A CN 109521644A
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- Prior art keywords
- led
- micro
- maskless
- exposure machine
- exposed
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- 238000000034 method Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses one kind to be based on the fixed ultraviolet exposure machine of Micro-LED maskless, including Micro-LED, computer and Graph Control software, workpiece surface to be exposed and workbench.The light that Micro-LED is issued acts directly on exposure working face, shows exposure figure with computer and Graph Control software control Micro-LED.It is of the invention a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, since the Micro-LED light issued acts directly on workpiece surface to be exposed, it is lost without complicated ray machine, a series of revolutionary technological progresses such as higher energy utilization efficiency, higher exposure intensity, faster process velocity may be implemented.And compact structure is easy to combine access automatic assembly line with robot.
Description
Technical field
The present invention relates to a kind of ultraviolet exposure machines, more particularly to one kind to be based on the fixed ultraviolet exposure of Micro-LED maskless
Ray machine.
Background technique
In the micro Process such as microelectronics, optics, wiring board field, ultraviolet exposure machine has very important application.Tradition is covered
Exposure mode machine uses large scale parallel ultraviolet source to add the exposure form of mask.And existing maskless exposure machine is adopted at present
It is the labyrinth of light source, light source colimated light system, dmd chip and projection lens, causes energy of light source to working surface
Energy loss is excessively high, simultaneously because light source power and dmd chip maximum bear power limited, it is strong to be unable to reach enough exposures
Degree.
Summary of the invention
The problems such as existing traditional masks formula exposure machine and maskless ultraviolet exposure machine, system effectiveness is low, and exposure intensity is insufficient.
And the present invention is based on the fixed ultraviolet exposure machine of Micro-LED maskless using a kind of, Micro-LED is in chip
Integrated high density microsize LED array, and guarantee each LED pixel can addressing, and be operated alone and light.Bottom CMOS
Driving circuit is made in integrated circuit technology.CMOS integrated circuit technology mainly includes silicon base CMOS circuit technology and glass base CMOS
Circuit technology.The light that Micro-LED is issued is applied directly to workpiece surface to be exposed, does not pass through collimation, projection, chip etc. one
The loss of series of optical system, so not by optics system capacity efficiency of transmission, chip maximum power ability to bear and light source
The limitation of power.Therefore higher energy utilization efficiency, higher exposure intensity, faster may be implemented in exposure machine of the present invention
A series of revolutionary technological progresses such as process velocity.
The present invention provides one kind based on the fixed ultraviolet exposure machine of Micro-LED maskless, which includes Micro-
LED, computer and Graph Control software, workpiece surface to be exposed and workbench.
The Micro-LED is and to guarantee that each LED pixel can in integrated chip high density microsize LED array
Addressing, and a kind of miniature display chip and its various encapsulating products lighted is operated alone.
The Micro-LED is as light source and graphic projection, a length of 190~420nm of light wave, each LED pixel size
Are as follows: it is >=2 μm long, it is wide >=2 μm.Line number M >=2 of LED array, columns N >=2.
The computer and Graph Control software refer to that figure is cut, and instantaneous graph data is transmitted to Micro-LED.
The workpiece surface to be exposed is parallel with Micro-LED, and Micro-LED and workpiece surface to be exposed are without opposite fortune
It is dynamic.
The Micro-LED and workpiece surface to be exposed are very close to each other or have small gap, guarantee single Micro- in this way
LED pixel transmitting light arrival workpiece surface light path to be exposed is smaller and then forms lesser hot spot, guarantees exposure image precision.
The workbench is for placing workpiece surface to be exposed.
A kind of major advantage based on the fixed ultraviolet exposure machine of Micro-LED maskless provided by the present invention and actively effect
Fruit is as follows: since the Micro-LED light issued acts directly on workpiece surface to be exposed, the ray machine of no complexity is lost, can be with
Realize a series of revolutionary technological progresses such as higher energy utilization efficiency, higher exposure intensity, faster process velocity.
And compact structure is easy to combine access automatic assembly line with robot.
Detailed description of the invention
To further illustrate technology contents of the invention, with reference to embodiments and attached drawing detailed description is as follows, in which:
Fig. 1 is the structural diagram of the present invention.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with specific embodiment, and reference
Attached drawing, the present invention is described in more detail.
Refering to Figure 1, the present invention provides one kind based on the fixed ultraviolet exposure machine of Micro-LED maskless, comprising:
One Micro-LED 1 is and to guarantee that each LED pixel can in integrated chip high density microsize LED array
Addressing, and a kind of miniature display chip and its various encapsulating products lighted is operated alone；
- Micro-LED 1 is as light source and graphic projection, a length of 190~420nm of light wave, each LED pixel size
Are as follows: it is >=2 μm long, it is wide >=2 μm.Line number M >=2 of LED array, columns N >=2；
Computer and Graph Control software 2 refer to that figure is cut, and instantaneous graph data is transmitted to Micro-LED；
Workpiece surface 3 to be exposed is parallel with Micro-LED 1, and Micro-LED 1 and workpiece surface to be exposed 3 do not have phase
To movement；
- Micro-LED 1 and workpiece surface 3 to be exposed are very close to each other or have small gap, guarantee single Micro- in this way
1 pixel emission light of LED arrival, 3 light path of workpiece surface to be exposed is smaller and then forms lesser hot spot, guarantees exposure image essence
Degree；
Workbench 4 is for placing workpiece surface 3 to be exposed；
Particular embodiments described above has carried out further the purpose of the present invention, technical scheme and beneficial effects
It is described in detail, it should be understood that the above is only a specific embodiment of the present invention, it is not limited to the present invention, it is all
Within the spirit and principles in the present invention, any modification, equivalent substitution, improvement and etc. done should be included in guarantor of the invention
Within the scope of shield.
Claims (7)
1. one kind is based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that including Micro-LED, computer
And Graph Control software, workpiece surface to be exposed and workbench.
2. as described in claim 1 a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that institute
State Micro-LED be in integrated chip high density microsize LED array, and guarantee each LED pixel can addressing, and individually
Drive a kind of miniature display chip and its various encapsulating products lighted.
3. as described in claim 1 a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that institute
Stating Micro-LED is as light source and graphic projection, a length of 190~420nm of light wave, each LED pixel size are as follows: it is >=2 μm long,
It is wide >=2 μm.Line number M >=2 of LED array, columns N >=2.
4. as described in claim 1 a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that institute
It states computer and Graph Control software refers to that figure is cut, instantaneous graph data is transmitted to Micro-LED.
5. as described in claim 1 a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that institute
It is parallel with Micro-LED to state workpiece surface to be exposed, Micro-LED and workpiece surface to be exposed do not have relative motion.
6. as described in claim 1 a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that institute
It states Micro-LED and workpiece surface to be exposed is very close to each other or have small gap, guarantee single Micro-LED pixel emission in this way
Light arrival workpiece surface light path to be exposed is smaller and then forms lesser hot spot, guarantees exposure image precision.
7. as described in claim 1 a kind of based on the fixed ultraviolet exposure machine of Micro-LED maskless, which is characterized in that institute
Workbench is stated for placing workpiece surface to be exposed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710845328.7A CN109521644A (en) | 2017-09-18 | 2017-09-18 | One kind being based on the fixed ultraviolet exposure machine of Micro-LED maskless |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710845328.7A CN109521644A (en) | 2017-09-18 | 2017-09-18 | One kind being based on the fixed ultraviolet exposure machine of Micro-LED maskless |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109521644A true CN109521644A (en) | 2019-03-26 |
Family
ID=65769418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710845328.7A Pending CN109521644A (en) | 2017-09-18 | 2017-09-18 | One kind being based on the fixed ultraviolet exposure machine of Micro-LED maskless |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109521644A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113156759A (en) * | 2021-05-24 | 2021-07-23 | 美可隆半导体(苏州)有限公司 | Patterned direct-display light-distribution photoetching mask plate, preparation method and imaging device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013175232A2 (en) * | 2012-05-24 | 2013-11-28 | Lumejet Holdings Limited | Media exposure device |
| CN103707510A (en) * | 2013-12-29 | 2014-04-09 | 北京工业大学 | Large-breadth LED (light-emitting diode) lattice screen exposure rapid-forming method |
| CN207301623U (en) * | 2017-09-18 | 2018-05-01 | 北京德瑞工贸有限公司 | One kind is based on the fixed ultraviolet exposure machine of Micro-LED masklesses |
-
2017
- 2017-09-18 CN CN201710845328.7A patent/CN109521644A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013175232A2 (en) * | 2012-05-24 | 2013-11-28 | Lumejet Holdings Limited | Media exposure device |
| CN103707510A (en) * | 2013-12-29 | 2014-04-09 | 北京工业大学 | Large-breadth LED (light-emitting diode) lattice screen exposure rapid-forming method |
| CN207301623U (en) * | 2017-09-18 | 2018-05-01 | 北京德瑞工贸有限公司 | One kind is based on the fixed ultraviolet exposure machine of Micro-LED masklesses |
Non-Patent Citations (1)
| Title |
|---|
| D.ELFSTROM 等: "mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes", OPTICS EXPRESS, vol. 17, no. 26, 8 December 2009 (2009-12-08), pages 23522 - 23529, XP055454310, DOI: 10.1364/OE.17.023522 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113156759A (en) * | 2021-05-24 | 2021-07-23 | 美可隆半导体(苏州)有限公司 | Patterned direct-display light-distribution photoetching mask plate, preparation method and imaging device |
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| SE01 | Entry into force of request for substantive examination | ||
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| TA01 | Transfer of patent application right |
Effective date of registration: 20210727 Address after: 100000 No. a2079, floor 2, building 2, No. 14, Zhonghe street, Beijing Economic and Technological Development Zone (centralized office area) Applicant after: Beijing digital optical core technology Co.,Ltd. Address before: 100083 block a, building 5, Jiulong garden, Shuangjing, Chaoyang District, Beijing Applicant before: BEIJING DERUI INDUSTRY AND TRADE Co.,Ltd. |