CN109461678A - Wafer speed detector in megasonic cleaning - Google Patents
Wafer speed detector in megasonic cleaning Download PDFInfo
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- CN109461678A CN109461678A CN201811227971.4A CN201811227971A CN109461678A CN 109461678 A CN109461678 A CN 109461678A CN 201811227971 A CN201811227971 A CN 201811227971A CN 109461678 A CN109461678 A CN 109461678A
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- machine shell
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P3/00—Measuring linear or angular speed; Measuring differences of linear or angular speeds
- G01P3/64—Devices characterised by the determination of the time taken to traverse a fixed distance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses wafer speed detectors in megasonic cleaning, its structure includes water inlet end, hermatic door, wafer speed detector, detection machine shell, latch fitting, support moist-proof board, wafer speed detector is mounted on detection machine interior of shell by way of insertion, latch fitting back passes through hinge and detection machine shell front end face middle position, hermatic door front end face top is mounted on inside latch fitting by way of insertion, hermatic door front end face bottom end is movably connected by upper position among hinge and detection machine shell front end face, water inlet end is mobile to be mounted on middle position on the right side of detection machine shell front end face by way of insertion, the present invention mainly utilizes ray identification mechanism and tach signal trigger mechanism to cooperate, judge whether wafer is in rotation status by the time difference of identification signal transmitting terminal twice, and it is able to detect device revolving speed , to realize the rotation status of detection megasonic cleaning process wafer.
Description
Technical field
The present invention relates to wafer cleaning fields, particularly with regard to wafer speed detector in a kind of megasonic cleaning.
Background technique
With the continuous development of ic manufacturing technology, chip feature sizes are smaller and smaller, and the interconnection number of plies is more and more,
Diameter wafer also constantly increases, and Yao Shixian multilayer wiring, crystal column surface must have high flatness, smoothness and cleaning
Degree, and chemically-mechanicapolish polishing is current most effective wafer planarization technology, with photoetching, etching, ion implanting, film deposition one
It rises and is referred to as five most crucial big key technologies of IC manufacturing process, the prior art is determined due to megasonic cleaning process to wafer table
Face implement cleaning groove body must be it is closed, do not reveal, while wafer be in by chemical liquids soaking state, can not directly distinguish
The rotation status of other wafer, therefore whether more difficult detection megasonic cleaning process wafer is in rotation status.
Summary of the invention
In view of the deficiencies of the prior art, the present invention is to realize by the following technical solutions: wafer turns in megasonic cleaning
Speed detector, structure include water inlet end, hermatic door, wafer speed detector, detection machine shell, latch fitting, support it is moisture-proof
Plate, the wafer speed detector are mounted on detection machine interior of shell by way of insertion, and the latch fitting back passes through conjunction
Page and detection machine shell front end face middle position, are mounted on hermatic door front end face top inside the latch fitting by way of insertion
End, hermatic door front end face bottom end are movably connected by upper position among hinge and detection machine shell front end face,
The water inlet end is mobile to be mounted on middle position on the right side of detection machine shell front end face, the support moist-proof board by way of insertion
Top is fixedly connected on detection machine shell bottom end by the way of electric welding.
The wafer speed detector includes power supply Jiao Kong mechanism, ray identification mechanism, tach signal trigger mechanism, shake
Frequency gate mechanism, million sound pitch frequency output mechanisms, linkage mechanism, it is double connect arrestment mechanism, display screen, the detection machine interior of shell is just
Top is equipped with display screen, is equipped with power supply Jiao Kong mechanism immediately below the display screen and is fixed together with display screen,
It is equipped with linkage mechanism on the right side of power supply Jiao Kong mechanism, double connects arrestment mechanism and power supply Jiao Kong mechanism one end and power supply Jiao Kong mechanism
It is mechanically coupled together far from double arrestment mechanism one end that connect, tach signal transmitter is installed inside the ray identification mechanism
Structure, shake frequency gate mechanism and bottom end are fixed together with million sound pitch frequency output mechanism tops, the tach signal transmitter
Structure top and tach signal trigger mechanism one end are mechanically coupled together, the shake frequency gate mechanism bottom end and ray identification mechanism
Inner bottom is fixed together.
As advanced optimizing for the technical program, power supply Jiao Kong mechanism includes fixing sleeve, the first power supply line, cross
Power connection, electric wire locating rack, second source line, the first driving belt, the first power supply line head end is by the way of electric welding
Display screen bottom is fixedly connected on far from second source line one end, first power supply line end is mounted on by way of insertion
Inside fixing sleeve, the second source line head end is fixedly connected on display screen bottom far from the first power supply line by the way of electric welding
One end, the cross power connection inner ring are movably connected by the first driving belt with linkage mechanism, second electricity
Source line bottom end is fixedly connected on million sound pitch frequency output mechanism sides by the way of electric welding.
As advanced optimizing for the technical program, the ray identification mechanism includes cleaning pipe, water level position-limiting tube, processing
Liquid holding tank, transmitting identifier, position-limited rack, processing board, shaft, runner, support base, the cleaning are managed far from treatment fluid holding tank
One end is mounted on detection machine shell close to the following position directly of water level position-limiting tube by way of insertion, and the water level position-limiting tube is remote
Detection machine shell is mounted on by way of insertion close to the position directly above of cleaning pipe, the axis from treatment fluid holding tank one end
Bar top is mounted on runner bottom end shaft core position by way of insertion, the shaft bottom end through position-limited rack by pin with
Tach signal trigger mechanism top is movably connected, it is described transmitting identifier set altogether there are two and its bottom end using electric welding
Mode is respectively fixedly connected in processing board bottom left and right ends, and the support base bottom end is fixedly connected on inspection by the way of electric welding
Survey machine interior of shell bottom end, the support base top are fixedly connected on treatment fluid holding tank bottom end interposition by the way of electric welding
It sets.
As advanced optimizing for the technical program, the tach signal trigger mechanism includes signal transmitting terminal, arc folder
Plate, limit folder, wafer, tension spring, the signal transmitting terminal set that there are two and using fixed companies respectively by the way of electric welding altogether
Curved splint left and right ends are connected to, the tension spring both ends are fixedly connected on curved splint, inside two by the way of electric welding
End, the limit folder set altogether there are two and using be welded by the way of be respectively fixedly connected in curved splint bottom both ends, it is described
Wafer is mounted on inside limit folder by way of insertion, and the curved splint bottom end is connected by pin and the activity of shaft top
It is connected together.
As advanced optimizing for the technical program, the shake frequency gate mechanism includes water flowing shell, water blocking arc plate, spacing drawing
Line, shake chamber imbalance wheel, vibration spring, jolting plate, the water flowing shell take turns one end by the way of electric welding far from shake chamber imbalance
It is fixedly connected on treatment fluid holding tank bottom end, the water blocking arc plate sets there are two altogether and is separately mounted to water flowing shell by pin and leans on
Nearly spacing bracing wire one end, the water blocking arc plate are fixed together by spacing bracing wire and shake chamber imbalance wheel, the vibration
Plate takes turns one end through being mounted among vibration spring and by way of insertion shake chamber imbalance wheel and lean on by near earthquake chamber imbalance
Spring one end is moved near earthquake.
As advanced optimizing for the technical program, the million sound pitch frequency output mechanism includes million sound pitch frequency shake bar, sealing
Set, connecting rod, host side, the million sound pitch frequency shake bar, sealing shroud, connecting rod are respectively provided with five and are fixed by connecting rod bottom end
It is connected to host side top, the million sound pitch frequency shake bar bottom end is through sealing shroud bosom position and by way of insertion
It is mounted on connecting rod top, the host side bottom end is fixedly connected on detection machine interior of shell interposition by the way of electric welding
It sets, the host side side is fixedly connected on second source line bottom end by the way of electric welding.
As advanced optimizing for the technical program, the linkage mechanism includes small strut, triangle fixed pulley, the limit of T word
Bar, poke rod, the second fixed pulley, the second driving belt, bearing square wheel, long fulcrum bar, the triangle fixed pulley pass through the first transmission
Belt is movably connected with cross power connection inner ring, and the triangle fixed pulley shaft core position is remote with small strut by pin
Mechanically coupled together from poke rod one end, the small strut is far from triangle fixed pulley one end by pin and poke rod close to three
Angle fixed pulley one end is mechanically coupled together, and the second fixed pulley outer ring surface passes through the second driving belt and bearing square wheel inner ring
Face is movably connected, the bearing square wheel by long fulcrum bar with pair to connect arrestment mechanism mechanically coupled together.
As advanced optimizing for the technical program, it includes third driving belt, driven wheel, friendship that described pair, which connects arrestment mechanism,
It changes wave gear, support rod, collaborate transmission wheel, hydrodynamic(al) driving wheel, the support rod is far from driven wheel one end by the way of electric welding
It is fixedly connected on detection machine interior of shell and connects arrestment mechanism one end side close to double, the driven wheel outer ring surface is driven by third
Belt is movably connected with hydrodynamic(al) driving wheel inner shaft lever, and the exchange wave gear takes turns one end and driven wheel far from transmission is collaborated
It is meshed close to transmission wheel one end is collaborated, the exchange wave gear is taken turns with transmission is collaborated close to driven wheel one far from driven wheel one end
End is meshed.
Beneficial effect
Wafer speed detector in megasonic cleaning of the present invention by treatment fluid by connecting water inlet end, and controls its input,
When in treatment fluid injection detection machine shell, by it, gradually small outlet increases processing flow velocity, when it impacts hydrodynamic(al) driving wheel
When, hydrodynamic(al) driving wheel is rotated by itself gas pressure relief slot slot removal water flow using its impact force, to generate power and lead to
Third driving belt passing movement is crossed, when poke rod pulls small strut to slide triangle surely by the braking of the second fixed pulley
Wheel carries out small angle rotation, makes cross power connection by each autoregistration conducting wire of four end conductive interfaces, power supply is divided to transmitting
To ray identification mechanism and ray identification mechanism, and ray identification mechanism is as transmission maincenter connection ray identification mechanism and association
Dynamic transmission wheel drives shake chamber imbalance wheel to carry out uniform rotation, in the underface of wafer million in its exchange movement by shaft
Sound pitch frequency shake bar, which is powered on and done work by host side, exports high-frequency mega sonic wave, enables treatment fluid form impact force and washes away crystalline substance
Circular surfaces, when wafer when rotated, signal transmitting terminal, which is connected through, connects curved splint and wafer synchronous rotary, and to upper end send out
Identification signal is penetrated, transmitting identifier is activated by the energization of processing board, to issue ray identification lower signal transmitting terminal, is passed through
The time difference of identification signal transmitting terminal twice judges its revolving speed, and sends data in display screen and be shown on panel.
For the prior art, the present invention mainly utilizes ray identification mechanism and tach signal trigger mechanism phase interworking
It closes, judges whether wafer is in rotation status by the time difference of identification signal transmitting terminal twice, and be able to detect device revolving speed, from
And realize the rotation status of detection megasonic cleaning process wafer.
Detailed description of the invention
Upon reading the detailed description of non-limiting embodiments with reference to the following drawings, other feature of the invention,
Objects and advantages will become more apparent upon:
Fig. 1 is the structural schematic diagram of wafer speed detector in megasonic cleaning of the present invention.
Fig. 2 is the schematic diagram of internal structure of wafer speed detector in megasonic cleaning of the present invention.
Fig. 3 is the inside detailed construction schematic diagram of wafer speed detector in megasonic cleaning of the present invention.
Fig. 4 is the motion state inside detailed construction schematic diagram of wafer speed detector in megasonic cleaning of the present invention.
Fig. 5 is the partial enlargement diagram of Fig. 4.
In figure: water inlet end -1, hermatic door -2, wafer speed detector -3, detection machine shell -4, latch fitting -5, support are anti-
Damp plate -6, power supply Jiao Kong mechanism -31, ray identification mechanism -32, tach signal trigger mechanism -33, shake frequency gate mechanism -34, million
Sound pitch frequency output mechanism -35, double connects arrestment mechanism -37, display screen -38, fixing sleeve -311, the first power supply at linkage mechanism -36
Line -312, cross power connection -313, electric wire locating rack -314, second source line -315, the first driving belt -316, cleaning
Pipe -321, water level position-limiting tube -322, treatment fluid holding tank -323, transmitting identifier -324, position-limited rack -325, processing board -326,
Shaft -327, runner -328, support base -329, signal transmitting terminal -331, curved splint -332, limit folder -333, wafer -
334, tension spring -335, water flowing shell -341, water blocking arc plate -342, spacing bracing wire -343, shake chamber imbalance wheel -344, vibration bullet
Spring -345, jolting plate -346, million sound pitch frequency shake bar -351, sealing shroud -352, connecting rod -353, host side -354, small strut -
361, triangle fixed pulley -362, T word gag lever post -363, poke rod -364, the second fixed pulley -365, the second driving belt -366,
Bearing square wheel -367, long fulcrum bar -368, third driving belt -371, driven wheel -372, exchange wave gear -373, support rod -
374, transmission wheel -375, hydrodynamic(al) driving wheel -376 are collaborated.
Specific embodiment
To be easy to understand the technical means, the creative features, the aims and the efficiencies achieved by the present invention, below with reference to
Specific embodiment and Detailed description of the invention, the preferred embodiment that the present invention is further explained.
Embodiment
Please refer to Fig. 1-Fig. 5, the present invention provides wafer speed detector in megasonic cleaning, structure include water inlet end 1,
Hermatic door 2, wafer speed detector 3, detection machine shell 4, latch fitting 5, support moist-proof board 6, the wafer speed detector 3
It is mounted on by way of insertion inside detection machine shell 4,5 back of latch fitting passes through hinge and 4 front end face of detection machine shell
Middle position is mounted on 2 front end face top of hermatic door, 2 front end face of hermatic door inside the latch fitting 5 by way of insertion
Bottom end is movably connected by upper position among 4 front end face of hinge and detection machine shell, and the movement of water inlet end 1 passes through
The mode of insertion is mounted on middle position on the right side of 4 front end face of detection machine shell, and support 6 top of moist-proof board is using the side being welded
Formula is fixedly connected on 4 bottom end of detection machine shell.
The wafer speed detector 3 includes power supply Jiao Kong mechanism 31, ray identification mechanism 32, tach signal transmitter
Structure 33, million sound pitch frequency output mechanisms 35, linkage mechanism 36, double meets arrestment mechanism 37, display screen 38, institute at shake frequency gate mechanism 34
It states and display screen 38 is installed right above 4 inside of detection machine shell, power supply Jiao Kong mechanism 31 is installed immediately below the display screen 38
And be fixed together with display screen 38, it is equipped with linkage mechanism 36 on the right side of power supply Jiao Kong mechanism 31, double connects arrestment mechanism
37 and power supply Jiao Kong mechanism, 31 one end and separate double 37 one end of arrestment mechanism that connect of power supply Jiao Kong mechanism 31 are mechanically coupled together, institute
It states and tach signal trigger mechanism 33 is installed inside ray identification mechanism 32, shake frequency gate mechanism 34 and bottom end and million sound pitch frequency are defeated
35 top of mechanism is fixed together out, 33 top of tach signal trigger mechanism and 33 one end of tach signal trigger mechanism
Mechanically coupled together, 34 bottom end of shake frequency gate mechanism is fixed together with 32 inner bottom of ray identification mechanism.
Power supply Jiao Kong mechanism 31 is fixed including fixing sleeve 311, the first power supply line 312, cross power connection 313, electric wire
Position frame 314, second source line 315, the first driving belt 316,312 head end of the first power supply line are fixed by the way of electric welding
38 bottom of display screen is connected to far from 315 one end of second source line, 312 end of the first power supply line is pacified by way of insertion
Inside fixing sleeve 311, it is remote that 315 head end of second source line is fixedly connected on 38 bottom of display screen by the way of electric welding
From 312 one end of the first power supply line, 313 inner ring of cross power connection is living by the first driving belt 316 and linkage mechanism 36
Dynamic to link together, 315 bottom end of second source line is fixedly connected on million sound pitch frequency output mechanisms 35 by the way of electric welding
Side.
The ray identification mechanism 32 includes cleaning pipe 321, water level position-limiting tube 322, treatment fluid holding tank 323, transmitting knowledge
Other device 324, position-limited rack 325, processing board 326, shaft 327, runner 328, support base 329, the cleaning pipe 321 is far from treatment fluid
323 one end of holding tank is mounted on detection machine shell 4 close to the following position directly of water level position-limiting tube 322, institute by way of insertion
It states water level position-limiting tube 322 and is mounted on detection machine shell 4 by way of insertion close to cleaning far from 323 one end for the treatment of fluid holding tank
The position directly above of pipe 321,327 top of shaft is mounted on 328 bottom end shaft core position of runner by way of insertion, described
327 bottom end of shaft is movably connected through position-limited rack 325 by pin and 33 top of tach signal trigger mechanism, described
There are two transmitting identifier 324 is set altogether and its bottom end is respectively fixedly connected with by the way of electric welding in 326 bottom of processing board or so
Both ends, 329 bottom end of support base are fixedly connected on 4 inner bottom of detection machine shell, the support base by the way of electric welding
329 tops are fixedly connected on 323 bottom end middle position for the treatment of fluid holding tank by the way of electric welding.
The tach signal trigger mechanism 33 includes signal transmitting terminal 331, curved splint 332, limit folder 333, wafer
334, tension spring 335, the signal transmitting terminal 331 set altogether there are two and using be welded by the way of be respectively fixedly connected in arc
332 left and right ends of clamping plate, 335 both ends of tension spring are fixedly connected on curved splint 332, inside two by the way of electric welding
End, the limit folder 333 set altogether there are two and using be welded by the way of be respectively fixedly connected in 332 bottom two of curved splint
End, the wafer 334 are mounted on inside limit folder 333 by way of insertion, and 332 bottom end of curved splint passes through pin
It is movably connected with 327 top of shaft.
The shake frequency gate mechanism 34 includes water flowing shell 341, water blocking arc plate 342, spacing bracing wire 343, shake chamber imbalance wheel
344, spring 345, jolting plate 346 are shaken, the water flowing shell 341 is far from shake 344 one end of chamber imbalance wheel by the way of electric welding
It is fixedly connected on 323 bottom end for the treatment of fluid holding tank, the water blocking arc plate 342 sets there are two altogether and is separately mounted to lead to by pin
For water hull 341 close to 343 one end of spacing bracing wire, the water blocking arc plate 342 is solid by spacing bracing wire 343 and shake chamber imbalance wheel 344
Surely it links together, the jolting plate 346 through 345 centre of vibration spring and passes through by 344 one end of near earthquake chamber imbalance wheel
The mode of insertion is mounted on shake chamber imbalance wheel 344 close to vibration 345 one end of spring.
The million sound pitch frequency output mechanism 35 includes million sound pitch frequency shake bar 351, sealing shroud 352, connecting rod 353, host side
354, the million sound pitch frequency shake bar 351, sealing shroud 352, connecting rod 353 are respectively provided with five and are fixed by 353 bottom end of connecting rod
It is connected to 354 top of host side, million sound pitch frequency shake, 351 bottom end of bar through 352 bosom position of sealing shroud and passes through
The mode of insertion is mounted on 353 top of connecting rod, and 354 bottom end of host side is fixedly connected on detection machine by the way of electric welding
4 bosom position of shell, 354 side of host side are fixedly connected on 315 bottom end of second source line by the way of electric welding.
The linkage mechanism 36 includes small strut 361, triangle fixed pulley 362, T word gag lever post 363, poke rod 364, second
Fixed pulley 365, the second driving belt 366, bearing square wheel 367, long fulcrum bar 368, the triangle fixed pulley 362 pass through the first transmission
Belt 316 is movably connected with 313 inner ring of cross power connection, and 362 shaft core position of triangle fixed pulley passes through pin
Mechanically coupled together far from 364 one end of poke rod with small strut 361, the small strut 361 is far from 362 one end of triangle fixed pulley
, second fixed pulley 365 outer ring mechanically coupled together close to 362 one end of triangle fixed pulley with poke rod 364 by pin
Face is movably connected by the second driving belt 366 and 367 inner ring surface of bearing square wheel, and the bearing square wheel 367 passes through length
Strut 368 with double to connect arrestment mechanism 37 mechanically coupled together.
Double arrestment mechanisms 37 that connect include third driving belt 371, driven wheel 372, exchange wave gear 373, support rod
374, transmission wheel 375, hydrodynamic(al) driving wheel 376 are collaborated, the support rod 374 is far from 372 one end of driven wheel by the way of electric welding
It is fixedly connected on the inside of detection machine shell 4 and connects 37 one end side of arrestment mechanism close to double, 372 outer ring surface of driven wheel passes through the
Three driving belts 371 are movably connected with 376 inner shaft lever of hydrodynamic(al) driving wheel, and the exchange wave gear 373 is separate to collaborate biography
375 one end of defeated wheel are meshed with driven wheel 372 close to 375 one end of transmission wheel are collaborated, and the exchange wave gear 373 is far from driven wheel
372 one end are meshed with transmission wheel 375 is collaborated close to 372 one end of driven wheel.
The principle of the present invention: by treatment fluid by connecting water inlet end 1, and controlling its input, when treatment fluid injects detection machine
When in shell 4, by it, gradually small outlet increases processing flow velocity, when it impacts hydrodynamic(al) driving wheel 376, hydrodynamic(al) driving wheel
376 by itself gas pressure relief slot slot removal water flow, and is rotated using its impact force, to generate power and be driven by third
371 passing movement of belt, when poke rod 364 pulls small strut 361 to make triangle fixed by the braking of the second fixed pulley 365
Pulley 362 carries out small angle rotation, makes cross power connection 313 by each autoregistration conducting wire of four end conductive interfaces, by power supply
Point to being transferred at ray identification mechanism 32 and ray identification mechanism 35, and ray identification mechanism 373 is connected as transmission maincenter
Ray identification mechanism 372 takes turns 375 with transmission is collaborated, and in its exchange movement, passes through the drive shake chamber imbalance wheel 344 of shaft 327
Uniform rotation is carried out, million sound pitch frequency shake bar 351 is powered on and output of doing work by host side 354 in the underface of wafer 334
High-frequency mega sonic wave, enable treatment fluid formed impact force wash away 334 surface of wafer, when wafer 334 when rotated, signal transmitting terminal
331 are connected through and connect curved splint 332 and 334 synchronous rotary of wafer, and emit identification signal to upper end, emit identifier
324 are activated by the energization of processing board 326, to issue ray identification lower signal transmitting terminal 331, are emitted by identification signal
The time difference of end 331 twice judges its revolving speed, and sends data in display screen 38 and be shown on panel.
Wafer 334 of the present invention refers to silicon wafer used in silicon semiconductor production of integrated circuits, since its shape is
Circle, therefore referred to as wafer；Can be processed on silicon and be fabricated to various circuit component structures, and become have specific electrical functionality it
IC product, the original material of wafer is silicon, and there is nexhaustible silica on earth's crust surface, and silica ore is via electric arc
Furnace refines, chlorination of hydrochloric acid, and after distilling, and has been made the polysilicon of high-purity, and purity is up to 99.999999999%, described
Display 38 is also generally referred to as monitor, and display is the I/O equipment for belonging to computer, i.e. input-output equipment, it is a kind of
Certain electronic document is shown to the show tools that human eye is re-reflected on screen by specific transmission device.
Problems solved by the invention is to determine that the groove body for implementing cleaning to crystal column surface is necessary due to megasonic cleaning process
Be it is closed, do not reveal, while wafer be in by chemical liquids soaking state, can not directly distinguish the rotation status of wafer, because
Whether this more difficult detection megasonic cleaning process wafer is in rotation status, and the present invention is combined with each other by above-mentioned component, this hair
It is bright main using ray identification mechanism and the mutual cooperation of tach signal trigger mechanism, pass through the time of identification signal transmitting terminal twice
Difference judges whether wafer is in rotation status, and is able to detect device revolving speed, to realize the rotation of detection megasonic cleaning process wafer
Turn state.
The basic principles, main features and advantages of the present invention have been shown and described above, the technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the above embodiments and description only describe this
The principle of invention can not only be realized in other specific forms under the premise of not departing from spirit of that invention or essential characteristic
The present invention will also have various changes and improvements, these changes and improvements both fall within scope of the claimed invention, therefore this hair
Bright claimed range is defined by appended claims and its equivalent, rather than above description limits.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiments being understood that.
Claims (8)
1. wafer speed detector in megasonic cleaning, it is characterised in that: its structure includes water inlet end (1), hermatic door (2), crystalline substance
Circle speed detector (3), detection machine shell (4), latch fitting (5), support moist-proof board (6), the wafer speed detector (3)
It is internal that detection machine shell (4) is mounted on by way of insertion, latch fitting (5) back passes through hinge and detection machine shell (4)
Front end face middle position, the latch fitting (5) is internal to be mounted on hermatic door (2) front end face top by way of insertion, described close
Closure door (2) front end face bottom end is movably connected by upper position among hinge and detection machine shell (4) front end face, described
Water inlet end (1) is mobile to be mounted on middle position on the right side of detection machine shell (4) front end face by way of insertion, and the support is moisture-proof
Plate (6) top is fixedly connected on detection machine shell (4) bottom end by the way of electric welding.
The wafer speed detector (3) includes power supply Jiao Kong mechanism (31), ray identification mechanism (32), tach signal transmitting
Mechanism (33), shake frequency gate mechanism (34), million sound pitch frequency output mechanisms (35), linkage mechanism (36), it is double connect arrestment mechanism (37),
Display screen (38), the internal surface of the detection machine shell (4) are equipped with display screen (38), peace immediately below the display screen (38)
It is fixed together equipped with power supply Jiao Kong mechanism (31) and with display screen (38), is equipped on the right side of power supply Jiao Kong mechanism (31)
Linkage mechanism (36) double connects arrestment mechanism (37) and power supply Jiao Kong mechanism (31) one end and power supply Jiao Kong mechanism (31) connect far from double
Arrestment mechanism (37) one end is mechanically coupled together, is equipped with tach signal trigger mechanism inside the ray identification mechanism (32)
(33), it shakes frequency gate mechanism (34) and bottom end is fixed together with million sound pitch frequency output mechanism (35) tops, the revolving speed
Signal transmitter structure (33) top and tach signal trigger mechanism (33) one end are mechanically coupled together, the shake frequency gate mechanism
(34) bottom end is fixed together with ray identification mechanism (32) inner bottom.
2. wafer speed detector in megasonic cleaning according to claim 1, it is characterised in that: the power supply hands over control machine
Structure (31) includes fixing sleeve (311), the first power supply line (312), cross power connection (313), electric wire locating rack (314), second
Power supply line (315), the first driving belt (316), the first power supply line (312) head end are fixedly connected on by the way of electric welding
Pacified by way of insertion far from second source line (315) one end, the first power supply line (312) end display screen (38) bottom
Internal mounted in fixing sleeve (311), second source line (315) head end is fixedly connected on display screen (38) by the way of electric welding
Bottom far from the first power supply line (312) one end, cross power connection (313) inner ring by the first driving belt (316) with
Linkage mechanism (36) is movably connected, and second source line (315) bottom end is fixedly connected on million by the way of electric welding
Sound pitch frequency output mechanism (35) side.
3. wafer speed detector in megasonic cleaning according to claim 1, it is characterised in that: the ray cognitron
Structure (32) includes cleaning pipe (321), water level position-limiting tube (322), treatment fluid holding tank (323), transmitting identifier (324), limit
Frame (325), processing board (326), shaft (327), runner (328), support base (329), the cleaning pipe (321) is far from treatment fluid
Holding tank (323) one end is mounted on the underface position of detection machine shell (4) close to water level position-limiting tube (322) by way of insertion
It sets, the water level position-limiting tube (322) is mounted on detection machine shell far from treatment fluid holding tank (323) one end by way of insertion
(4) close to the position directly above of cleaning pipe (321), shaft (327) top is mounted on runner (328) by way of insertion
Bottom end shaft core position, shaft (327) bottom end pass through pin and tach signal trigger mechanism (33) through position-limited rack (325)
Top is movably connected, the transmitting identifier (324) set altogether there are two and its bottom end using electric welding by the way of respectively consolidate
Surely processing board (326) bottom left and right ends are connected to, support base (329) bottom end is fixedly connected on inspection by the way of electric welding
Survey machine shell (4) inner bottom, support base (329) top are fixedly connected on treatment fluid holding tank by the way of electric welding
(323) bottom end middle position.
4. wafer speed detector in megasonic cleaning according to claim 1 or 3, it is characterised in that: the revolving speed letter
Number trigger mechanism (33) includes signal transmitting terminal (331), curved splint (332), limit folder (333), wafer (334), pulling force
Spring (335), the signal transmitting terminal (331) set altogether there are two and using be welded by the way of be respectively fixedly connected in curved splint
(332) left and right ends, tension spring (335) both ends are fixedly connected on curved splint (332), inside by the way of electric welding
Both ends, the limit folder (333) set altogether there are two and using be welded by the way of be respectively fixedly connected in curved splint (332) bottom
Portion both ends, the wafer (334) are mounted on limit folder (333) inside, curved splint (332) bottom by way of insertion
End is movably connected by pin and shaft (327) top.
5. wafer speed detector in megasonic cleaning according to claim 1, it is characterised in that: the shake frequency gate machine
Structure (34) includes water flowing shell (341), water blocking arc plate (342), spacing bracing wire (343), shake chamber imbalance wheel (344), vibration spring
(345), jolting plate (346), the water flowing shell (341) are fixed by the way of electric welding far from shake chamber imbalance wheel (344) one end
It is connected to treatment fluid holding tank (323) bottom end, the water blocking arc plate (342) sets there are two altogether and is separately mounted to lead to by pin
For water hull (341) close to spacing bracing wire (343) one end, the water blocking arc plate (342) is uneven by spacing bracing wire (343) and shake chamber
Wheel (344) is fixed together, and the jolting plate (346) leans near earthquake chamber imbalance wheel (344) one end through vibration spring
(345) shake chamber imbalance wheel (344) is mounted among and by way of insertion close to vibration spring (345) one end.
6. wafer speed detector in megasonic cleaning according to claim 1 or 2, it is characterised in that: million sound pitch
Frequency output mechanism (35) includes million sound pitch frequency shake bar (351), sealing shroud (352), connecting rod (353), host side (354), described
Million sound pitch frequency shake bar (351), sealing shroud (352), connecting rod (353) are respectively provided with five and are fixed by connecting rod (353) bottom end
It is connected to host side (354) top, the million sound pitch frequency shakes bar (351) bottom end through sealing shroud (352) bosom position
And connecting rod (353) top is mounted on by way of insertion, host side (354) bottom end is fixed by the way of electric welding to be connected
It is connected to detection machine shell (4) bosom position, host side (354) side is fixedly connected on second by the way of electric welding
Power supply line (315) bottom end.
7. wafer speed detector in megasonic cleaning according to claim 1 or 2, it is characterised in that: the gear
Structure (36) includes small strut (361), triangle fixed pulley (362), T word gag lever post (363), poke rod (364), the second fixed pulley
(365), the second driving belt (366), bearing square wheel (367), long fulcrum bar (368), the triangle fixed pulley (362) pass through first
Driving belt (316) is movably connected with cross power connection (313) inner ring, triangle fixed pulley (362) the axle center position
Set mechanically coupled together far from poke rod (364) one end by pin and small strut (361), the small strut (361) is separate
Triangle fixed pulley (362) one end is mechanically connected to one close to triangle fixed pulley (362) one end by pin and poke rod (364)
It rises, the second fixed pulley (365) outer ring surface is connected by the second driving belt (366) and bearing square wheel (367) inner ring surface activity
Be connected together, the bearing square wheel (367) by long fulcrum bar (368) with pair to connect arrestment mechanism (37) mechanically coupled together.
8. wafer speed detector in megasonic cleaning according to claim 1, it is characterised in that: described pair connects brake
Structure (37) includes third driving belt (371), driven wheel (372), exchange wave gear (373), support rod (374), collaborates transmission
(375), hydrodynamic(al) driving wheel (376) are taken turns, the support rod (374) is fixed by the way of electric welding far from driven wheel (372) one end
It is connected to internal close pair, detection machine shell (4) and connects arrestment mechanism (37) one end side, driven wheel (372) outer ring surface passes through
Third driving belt (371) is movably connected with hydrodynamic(al) driving wheel (376) inner shaft lever, and the exchange wave gear (373) is remote
It is meshed with driven wheel (372) close to transmission wheel (375) one end is collaborated from transmission wheel (375) one end is collaborated, the exchange wave tooth
Wheel (373) is meshed far from driven wheel (372) one end with close driven wheel (372) one end of transmission wheel (375) is collaborated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811227971.4A CN109461678B (en) | 2018-10-22 | 2018-10-22 | Wafer rotating speed detection device in megasonic cleaning |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811227971.4A CN109461678B (en) | 2018-10-22 | 2018-10-22 | Wafer rotating speed detection device in megasonic cleaning |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109461678A true CN109461678A (en) | 2019-03-12 |
| CN109461678B CN109461678B (en) | 2020-06-16 |
Family
ID=65607999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811227971.4A Expired - Fee Related CN109461678B (en) | 2018-10-22 | 2018-10-22 | Wafer rotating speed detection device in megasonic cleaning |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109461678B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202290654U (en) * | 2011-10-10 | 2012-07-04 | 北京七星华创电子股份有限公司 | Mega sonic cleaning head and mega sonic cleaning system comprising same |
| CN104733349A (en) * | 2013-12-24 | 2015-06-24 | 株式会社迪思科 | Rotating device |
| CN106684021A (en) * | 2016-12-23 | 2017-05-17 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer rotational speed detection device in megasonic cleaning, cleaning system and working process of cleaning system |
-
2018
- 2018-10-22 CN CN201811227971.4A patent/CN109461678B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202290654U (en) * | 2011-10-10 | 2012-07-04 | 北京七星华创电子股份有限公司 | Mega sonic cleaning head and mega sonic cleaning system comprising same |
| CN104733349A (en) * | 2013-12-24 | 2015-06-24 | 株式会社迪思科 | Rotating device |
| CN106684021A (en) * | 2016-12-23 | 2017-05-17 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer rotational speed detection device in megasonic cleaning, cleaning system and working process of cleaning system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109461678B (en) | 2020-06-16 |
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Effective date of registration: 20200527 Address after: 210000 Kechuang building, Futian Road, Zhetang street, Lishui Economic Development Zone, Nanjing City, Jiangsu Province Applicant after: Nanjing Lishui hi tech Venture Capital Management Co.,Ltd. Address before: 518031 Sangda Building 810, 46 Huafa North Road, Futian District, Shenzhen City, Guangdong Province Applicant before: SHENZHEN XIN AN MAN FINANCIAL SERVICES Co.,Ltd. |
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