CN109449301A - Evaporation coating method, OLED display device and the evaporated device of OLED display device - Google Patents
Evaporation coating method, OLED display device and the evaporated device of OLED display device Download PDFInfo
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- CN109449301A CN109449301A CN201811095904.1A CN201811095904A CN109449301A CN 109449301 A CN109449301 A CN 109449301A CN 201811095904 A CN201811095904 A CN 201811095904A CN 109449301 A CN109449301 A CN 109449301A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
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Abstract
The invention discloses a kind of evaporation coating methods of OLED display device, OLED display device and evaporated device, by by hole transmission layer, luminescent layer and electron transfer layer merging are deposited in a deposited chamber, or hole transmission layer, electron transfer layer is split, again by partial holes transport layer, electron transfer layer merges vapor deposition with part electron transfer layer, reduce the corresponding waiting time between the different function layer being deposited in same deposited chamber, it enhances and is injected between carrier, the ability of transmission and compound efficiency, and then enhance the performance of device, increase the yield of product, simultaneously, only part of functional layer is merged, influence to productive temp is smaller, it can guarantee higher production capacity simultaneously.
Description
Technical field
The present invention relates to OLED display device preparation fields, and in particular to a kind of evaporation coating method of OLED display device,
OLED display device and evaporated device.
Background technique
The OLED display technology display technology emerging as one is paid close attention to by market, but since it is good in volume production
Rate is lower, and the cost of OLED display device is caused to be higher than other display devices.
For OLED display device in volume production processing procedure, the common scheme of section is deposited as core process section in evaporated segment at present
As shown in Figure 1, an one functional layer is only deposited in each deposited chamber, productive temp (i.e. T1~T6) can in this way reduced, from
And increase overall production capacity.
Summary of the invention
In view of this, the present invention provides a kind of evaporation coating methods of OLED display device to promote the yield that OLED is shown.
Technical solution proposed by the present invention is as follows:
First aspect present invention proposes a kind of evaporation coating method of OLED display device, includes the following steps:
At least successively be deposited on the first electrode the first carrier blocking layers, luminescent layer, the second carrier blocking layers and
Second electrode；Wherein, first carrier blocking layers include hole transmission layer, and second carrier blocking layers include electronics
Transport layer, and the hole transmission layer, the luminescent layer, the electron transfer layer are deposited in same deposited chamber.
Optionally, the hole transmission layer, the luminescent layer, the electron transfer layer are successively connected in same deposited chamber
It is continuous to be deposited
Optionally, second carrier blocking layers further include electron injecting layer, and by the electron injecting layer, described
Second electrode is deposited in same deposited chamber, preferably by the electron injecting layer, the second electrode in same deposited chamber into
Capable successively continuous evaporating-plating；It is preferred that the second electrode and the luminescent layer are not deposited in same deposited chamber.
Optionally, first carrier blocking layers further include hole injection layer, wherein the hole injection layer with it is described
Luminescent layer is not deposited in same deposited chamber.
According to second aspect, the invention proposes a kind of evaporation coating methods of OLED display device, comprising:
At least successively be deposited on the first electrode the first carrier blocking layers, luminescent layer, the second carrier blocking layers and
Second electrode；Wherein, first carrier blocking layers include hole transmission layer, and second carrier blocking layers include electronics
Transport layer；
The hole transmission layer includes the first hole transmission layer far from the luminescent layer and close to the of the luminescent layer
Two hole transmission layers, the electron transfer layer include close to the first electron transfer layer of the luminescent layer and far from the luminescent layer
The second electron transfer layer, wherein by second hole transmission layer, the luminescent layer, first electron transfer layer same
It is deposited in deposited chamber；
Preferably, by second hole transmission layer, the luminescent layer, first electron transfer layer in same deposited chamber
Inside successively it is carried out continuously vapor deposition.
Preferably, first hole transmission layer and second electron transfer layer and the luminescent layer be not in same vapor deposition
Indoor vapor deposition.
Optionally, first carrier blocking layers further include hole injection layer, and the hole injection layer shines with described
Layer is not deposited in same deposited chamber.
According to the third aspect, the embodiment of the invention provides a kind of OLED display devices, comprising:
Substrate；Encapsulated layer, and the functional layer being arranged between the substrate and the encapsulated layer；
The functional layer is made using any one of the above OLED display device evaporation coating method.
According to fourth aspect, the embodiment of the invention provides a kind of evaporated devices, comprising:
The evaporated device includes multiple deposited chambers, is provided in wherein at least one deposited chamber and passes corresponding to hole simultaneously
The vapor deposition spray head of the raw material of defeated layer, luminescent layer and electron transfer layer.
Technical solution of the present invention has the advantages that
OLED display device evaporation coating method, OLED display device and electronic equipment provided by the invention, by passing hole
Defeated layer, luminescent layer and electron transfer layer merging are deposited in a deposited chamber, it is possible to reduce corresponding to steam in same deposited chamber
Waiting time between the different function layer of plating；And by will be deposited in these three layer of the structure again same deposited chamber, it is deposited
There is a small amount of mutual doping in material, not only will not influence the performance of OLED display device, and also help enhancing carrier
The ability and compound efficiency of injection, transmission, and then enhance the performance of device；Meanwhile only by part of functional layer
It merges, the influence to productive temp is smaller, can guarantee higher production capacity simultaneously.
Detailed description of the invention
It, below will be to specific in order to illustrate more clearly of the specific embodiment of the invention or technical solution in the prior art
Embodiment or attached drawing needed to be used in the description of the prior art be briefly described, it should be apparent that, it is described below
Attached drawing is some embodiments of the present invention, for those of ordinary skill in the art, before not making the creative labor
It puts, is also possible to obtain other drawings based on these drawings.
Fig. 1 is the flow chart of a specific example of the evaporation coating method of OLED display device in the prior art；
The evaporation coating method device architecture schematic diagram of OLED display device in Fig. 2 embodiment of the present invention；
The flow chart of a specific example of the evaporation coating method of OLED display device in Fig. 3 embodiment of the present invention；
The flow chart of another specific example of the evaporation coating method of OLED display device in Fig. 4 embodiment of the present invention.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with attached drawing to the present invention
Technical solution be clearly and completely described, it is clear that described embodiments are some of the embodiments of the present invention, rather than
Whole embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art are not making creative work premise
Under every other embodiment obtained, shall fall within the protection scope of the present invention.
As described in the background art, the functional layer of OLED display device is only deposited in each deposited chamber in vapor deposition
One one functional layer can reduce productive temp in this way, i.e., reduces the time for preparing each OLED display device in producing line, from
And increase the production capacity of OLED display device volume production.But this vapor deposition process can make each function interlayer exist wait when
Between, if each function interlayer will affect the injection of carrier, transmission there are the waiting time when each functional layer is deposited
Ability and compound efficiency, and then the voltage to OLED device, efficiency and service life have a adverse impact.But if by institute
Active ergosphere is both placed in same deposited chamber and is deposited, although substrate position aligning time and substrate passing time can be saved
Etc. intermediate links, can reduce the waiting time between each functional layer, improve voltage, efficiency and the service life of OLED device, but
It is the productive temp that will increase entire production line, can seriously reduces production capacity.OLED display device provided in this embodiment
Evaporation coating method, main purpose are balanced production beat and OLED mass, are minimized while promoting the yield of OLED device
Influence to the productive temp of product.
The embodiment of the present invention mentions can be using first electrode, the first carrier injection layer, the first load including stacking gradually
Flow the OLED display device knot of sub- transport layer, luminescent layer, the second carrier blocking layers, the second carrier injection layer and second electrode
Structure.
As shown in Fig. 2, being below hole injection layer (hole by anode, the first carrier injection layer of first electrode
Injection layer, HIL), the first carrier blocking layers be hole transmission layer (hole transport layer, HTL),
Luminescent layer (emitting material Layer, EML), the second carrier blocking layers are electron transfer layer (electron
Transport layer, ETL), the second carrier injection layer be electron injecting layer (electron injection layer,
EIL), second electrode be cathode (Cathode) for be illustrated；To achieve the above object, inventor to each functional layer it
Between waiting time comparative test has been carried out to the influence degree of the yield of device, in an experiment, pass through five groups of (Device B
It include the device comparative experiments of above-mentioned seven layer material to obtaining the waiting time (Q1- between five groups of functional layers to Device F)
Q5) to the influence of OLED device performance, as shown in Fig. 2, eliminate or reducing institute in dotted line frame respectively in five groups of comparative experimentss
The waiting time for including two layers of dotted line frame two sides is deposited in same deposited chamber, can be true by test result analysis
The fixed waiting time for influencing maximum three key function layers to device performance is Q2, Q3 and Q5 shown in Fig. 1.Wherein, Q2
And Q3 respectively represents the waiting time between HTL and EML and ETL and EML, since HTL and ETL is between EML, three
Waiting time will affect the recombination region in electronics and hole, so be affected to efficiency, so the two waitings of Q2 and Q3
Influence of the time to device is more obvious, and Q5 represents the waiting time between EIL and Cathode, and EIL is adjacent with cathode,
Waiting time between the two will affect the injection of electronics, larger to the voltage influence of OLED display device.
Based on above-mentioned test, the embodiment of the present invention, which proposes to merge, influences more apparent functional layer to device performance
The evaporation coating method of OLED display device, as shown in figure 3, merging tri- functional layers of HTL, EML, ETL in the same deposited chamber
Vapor deposition, EIL is merged with Cathode and is deposited in the same deposited chamber, i.e., on the substrate in the first deposited chamber 1 comprising anode
Be deposited HIL, in the second deposited chamber 2 then successively be deposited HTL, EML and ETL, finally in third deposited chamber 3 be deposited EIL with
Cathode。
The evaporation coating method reduction of the OLED display device for the pooling function layer that the embodiment of the present invention proposes even is eliminated
Waiting time between HTL, EML and ETL improves carrier in HTL, EML and ETL ability transmitted and compound effect
Rate, and the waiting time between EIL and Cathode is reduced, the ability of the electron injection EIL in Cathode is enhanced, into
And improve the performance of the OLED display device of preparation, improve the yield of device, meanwhile, only by part of functional layer into
(HTL, EML and ETL merging are deposited in a deposited chamber, and EIL merges with Cathode to be steamed in a deposited chamber for row merging
Plating), the influence to productive temp is smaller, can guarantee higher production capacity simultaneously.
In order to further decrease productive temp while reducing influence of the waiting time to OLED display device performance,
Keep the production capacity of production efficiency and the prior art close as far as possible, the OLED that the embodiment of the present invention proposes a kind of fractionation functional layer is shown
HTL is split as two parts, first part HTL1, second part HTL2 by the evaporation coating method of device；ETL is split as two
Part, first part is ETL1 and second part is ETL2；EIL is split as two parts, and first part is EIL1 and second part
For EIL2.Specifically, the evaporation coating method can be as shown in figure 4, be deposited HIL in the first deposited chamber 1, in the second steaming on anode
It plates and HTL1 is deposited in room 2, HTL2, EML and ETL2 is successively deposited in third deposited chamber 3, is deposited in the 4th deposited chamber 4
EIL1 is deposited in the 5th deposited chamber 5 in ETL1, and EIL2 and Cathode is successively deposited in the 6th deposited chamber 6.
Wherein, waiting time of the Q2 ' shown in Fig. 4 between HTL1 and HTL2；Q3 ' between ETL1 and ETL2 etc.
To the time；Waiting time of the Q5 ' between EIL1 and EIL2.The present embodiment be by between different function layer i.e. different materials etc.
It is converted into waiting time Q2 ', Q3 ' and Q5 ' between functional layer of the same race i.e. same material to time Q2, Q3 and Q5, due to of the same race
Energy level is consistent between material, so the waiting time between same material, the influence to device was well below not same material
Between influence of the waiting time to device, both can reduce the waiting time between different function layer in this way, while relatively existing
There is technology not and will increase productive temp when OLED display device preparation.
When based on the above embodiment, can also be by the preparation of some optional embodiments solution OLED display device etc.
To the time to the bad of device performance, while guaranteeing higher production efficiency, will illustratively enumerate several embodiments below:
It can be by least two layers of the arbitrary neighborhood in HIL, HTL, EML, ETL, ELI, Cathode in same deposited chamber
It is deposited, the vapor deposition mode of other function layer is same as the prior art.
It in order to reach to the preferable control effect of yield, and can guarantee higher production capacity, be based on above-mentioned test,
More crucial functional layer is influenced on yield and merges vapor deposition, specifically, can be by any the two in HTL, EML and ETL
It is deposited in same deposited chamber, the vapor deposition mode of other function layer is same as the prior art.Can also only by EIL and
Cathode is deposited in same deposited chamber, and the vapor deposition mode of other function layer is same as the prior art.It should be noted that this hair
Vapor deposition mode in bright embodiment is not limited to vapor deposition mode provided above, in practical applications, can also be including other not
What is illustrated can reach to the preferable control effect of yield, and can guarantee that the vapor deposition mode of higher production capacity also belongs to this hair
The protection scope of bright embodiment.
It as optional embodiment, can be deposited in a manner of other vapor depositions by fractionation functional layer, for example, can incite somebody to action
The part HTL or part ETL and EML is deposited in same deposited chamber, rest part HTL or rest part ETL and other
It is same as the prior art that mode is deposited in functional layer.Can also by part EIL and whole Cathode interior vapor deposition in same vapor deposition,
Other function layer can be deposited according to the prior art, can also according to by part HTL or part ETL and the EML in same steaming
It plates indoor vapor deposition, rest part HTL or rest part ETL and mode mode same as the prior art is deposited in other function layer
It is deposited.It should be noted that the vapor deposition mode in the embodiment of the present invention is not limited to vapor deposition mode provided above, in reality
Border application in, can also include other it is unaccounted can be carried out in a manner of fractionation be deposited and can reach preferable to yield
Control effect, and can guarantee that the vapor deposition mode of higher production capacity also belongs to the protection scope of the embodiment of the present invention.
As another the embodiment of the present invention, which can also only be included in stacks gradually on anode
The device of HTL, EML, ETL and Cathode structure, for the device of above structure, evaporation coating method provided in this embodiment can be with
It include: that at least the two in HTL, EML, ETL is deposited in same deposited chamber, Cathode steams in another deposited chamber
Plating；ETL and Cathode can also be deposited in same deposited chamber, HTL and EML can be according to existing vapor deposition modes
It is deposited, the two can also be placed in same deposited chamber and be deposited.
It as optional embodiment, can be deposited in a manner of other vapor depositions by fractionation functional layer, for example, can incite somebody to action
The part HTL or part ETL and EML is deposited in same deposited chamber, and rest part ETL can be with Cathode in same steaming
Plating interior is deposited, and remaining part divides ETL that can also be deposited in independent deposited chamber respectively with Cathode.
OLED display device in the embodiment of the present invention can be displayer part, appointing in PMOLED display device
It anticipates one kind.
The present invention applies example and also provides a kind of OLED display device, comprising: substrate；Encapsulated layer, and be arranged in substrate and envelope
Fill the functional layer between layer；Functional layer is using any one in OLED display device evaporation coating method described in above-described embodiment
It is made.
OLED display device in the embodiment of the present invention can be mobile phone screen, computer screen, show window screen, Vehicular screen
At least one of, in practical applications, it is not limited thereto.
The present invention applies example and provides a kind of evaporated device comprising the first deposited chamber, the second deposited chamber and third deposited chamber, respectively
It is provided with vapor deposition spray head in a deposited chamber, wherein forming hole injection layer in the first deposited chamber, is formed in the second deposited chamber
Hole transmission layer, luminescent layer and electron transfer layer form electron injecting layer and cathode in third deposited chamber.
Obviously, the above embodiments are merely examples for clarifying the description, and does not limit the embodiments.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of variation or
It changes.There is no necessity and possibility to exhaust all the enbodiments.And it is extended from this it is obvious variation or
It changes still within the protection scope of the invention.
Claims (10)
1. a kind of evaporation coating method of OLED display device characterized by comprising first is at least successively deposited on the first electrode
Carrier blocking layers, luminescent layer, the second carrier blocking layers and second electrode；Wherein, the first carrier blocking layers packet
Include hole transmission layer, second carrier blocking layers include electron transfer layer, and by the hole transmission layer, it is described shine
Layer, the electron transfer layer are deposited in same deposited chamber.
2. evaporation coating method according to claim 1, which is characterized in that by the hole transmission layer, luminescent layer, described
Electron transfer layer is successively carried out continuously vapor deposition in same deposited chamber.
3. evaporation coating method according to claim 1, which is characterized in that second carrier blocking layers further include electronics note
Enter layer, and the electron injecting layer, the second electrode are deposited in same deposited chamber；It is preferred that by the electron injection
Layer, the second electrode carry out successively continuous evaporating-plating in same deposited chamber；It is preferred that the second electrode and the luminescent layer are not
It is deposited in same deposited chamber.
4. evaporation coating method according to claim 1, which is characterized in that first carrier blocking layers further include hole note
Enter layer, wherein the hole injection layer is not deposited with the luminescent layer in same deposited chamber.
5. a kind of evaporation coating method of OLED display device characterized by comprising
The first carrier blocking layers, luminescent layer, the second carrier blocking layers and second are at least successively deposited on the first electrode
Electrode；Wherein, first carrier blocking layers include hole transmission layer, and second carrier blocking layers include electron-transport
Layer；
The hole transmission layer includes the first hole transmission layer far from the luminescent layer and the second sky close to the luminescent layer
Cave transport layer, the electron transfer layer include the first electron transfer layer close to the luminescent layer and the far from the luminescent layer
Two electron transfer layers, wherein by second hole transmission layer, the luminescent layer, first electron transfer layer in same vapor deposition
Interior is deposited；
Preferably, by second hole transmission layer, the luminescent layer, first electron transfer layer in same deposited chamber according to
It is secondary to be carried out continuously vapor deposition.
Preferably, first hole transmission layer and second electron transfer layer and the luminescent layer be not in same deposited chamber
Vapor deposition.
6. evaporation coating method according to claim 4 or 5, which is characterized in that second carrier blocking layers further include electricity
Sub- implanted layer, the electron injecting layer include the first electron injecting layer and close described second far from second electrode setting
Second electron injecting layer of electrode setting, and second electron injecting layer is merged in same deposited chamber with second electrode
It is deposited；
Preferably, second electron injecting layer is merged with second electrode and is successively carried out continuously vapor deposition in same deposited chamber；
Preferably, first electron injecting layer does not carry out in same deposited chamber with the luminescent layer and the second electrode lay
Vapor deposition.
7. according to evaporation coating method described in claim 4-6 any one, which is characterized in that first carrier blocking layers are also
Including hole injection layer, the hole injection layer is not deposited with the luminescent layer in same deposited chamber.
8. a kind of OLED display device characterized by comprising
Substrate；
Encapsulated layer, and
Functional layer between the substrate and the encapsulated layer is set；
The functional layer is made using the OLED display device evaporation coating method as described in claim 1-7.
9. a kind of evaporated device of OLED display device, which is characterized in that the evaporated device includes multiple deposited chambers, wherein extremely
The vapor deposition spray corresponding to the raw material of hole transmission layer, luminescent layer and electron transfer layer is provided in a few deposited chamber simultaneously
Head.
10. evaporated device according to claim 9, which is characterized in that be provided with simultaneously in wherein at least one deposited chamber
Spray head is deposited corresponding to the raw material of electron injecting layer and cathode.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811095904.1A CN109449301B (en) | 2018-09-19 | 2018-09-19 | Evaporation method of OLED display device, OLED display device and evaporation equipment |
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| CN201811095904.1A CN109449301B (en) | 2018-09-19 | 2018-09-19 | Evaporation method of OLED display device, OLED display device and evaporation equipment |
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| CN109449301B (en) | 2021-11-09 |
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