CN109351151A - Denitration reaction of low temperature plasma device - Google Patents
Denitration reaction of low temperature plasma device Download PDFInfo
- Publication number
- CN109351151A CN109351151A CN201811520616.6A CN201811520616A CN109351151A CN 109351151 A CN109351151 A CN 109351151A CN 201811520616 A CN201811520616 A CN 201811520616A CN 109351151 A CN109351151 A CN 109351151A
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- Prior art keywords
- low temperature
- temperature plasma
- reaction
- electrode
- plasma device
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
Abstract
The invention discloses a kind of denitration dielectric impedance reaction of low temperature plasma device device, the device be placed in deduster after, before desulfurization in flue.The a large amount of active particles being rich in low-temperature plasma body such as ion, electronics, the atom of excitation state and molecule and free radical etc., so that aoxidizing CO, NO, VOCs etc. for plasma technique provides condition.Low temperature plasma utilizes the effects of CO, NO, VOCs in these high energy electrons, free radical isoreactivity particle and flue gas, and the nitrogen in NO molecule is made to be oxidized to high-valence state nitrogen oxides (such as N2O3、N2O5), it cooperates with desulfurizer by chemical absorbing and removes to realize.
Description
Technical field
The present invention relates to a kind of denitration dielectric impedance reaction of low temperature plasma device devices, specially denitration low temperature etc.
Plasma reactor.
Background technique
Either selective catalytic reduction (Selective Catalytic Reduction, SCR) is still non-selection at present
Property catalysis reduction (Selective Non-catalytic Reduction, SNCR) all there is denitration efficiency under wide load condition
Decline and the escaping of ammonia problem, in order to improve denitration efficiency and collaboration electric precipitation in the case where not increasing SCR catalyst
(Electrostatic Precipitator, ESP) and ammonia process (Flue Gas Desulfurization, FGD) realize combustion
Coal burning boiler minimum discharge, the application is by the way that flue installs what bi-polar AC pulsed high voltage generator was powered additional after former dedusting, before desulfurization
Dielectric impedance reaction of low temperature plasma device forms plasma, the nitrogen in NO molecule is made to be oxidized to high-valence state nitrogen oxides
(such as N2O3、N2O5), it cooperates with desulfurizer by chemical absorbing and removes to realize.Use the dielectric impedance low-temperature plasma
Reactor according device can be with the removal NO of stability and high efficiency.
Summary of the invention
In view of the above-mentioned problems, the object of the present invention is to provide a kind of denitration low-temperature plasmas for denitrating flue gas
Reactor according removes NO in flue gas.
The present invention adopts the following technical scheme that realization: denitration reaction of low temperature plasma device, including insulation pottery
Porcelain tube is provided with interior electrode in ceramics pipe outer, is provided with external electrode outside ceramics pipe outer, and interior electrode connects plasma electrical source,
External electrode ground connection, interior electrode are the cage-like electrode for prolonging ceramic inside pipe wall arrangement made of anti-corrosion material, and dispatch from foreign news agency is extremely wound in pottery
The screw type electrode of porcelain tube outer wall, internal and external electrode are arranged vertically, which is that dielectric impedance low temperature plasma is anti-
Device is answered, ceramic tube is as block media.Electric discharge generates plasma, screw type electrode sense after cage-like electrode connects plasma electrical source
Should discharge and generate plasma, cage-like electrode and screw type electrode generate plasma by electric discharge inside and outside ceramic tube, wait from
The a large amount of active particles being rich in daughter such as ion, electronics, the atom of excitation state and molecule and free radical etc., to be plasma
Body technique oxidation CO, NO, VOCs etc. provide condition, and when flue gas passes through plasma, the nitrogen in NO molecule is oxidized to high price
State nitrogen oxides is cooperateed with by chemical absorbing with desulfurizer and is removed to realize.
Above-mentioned denitration reaction of low temperature plasma device, cage-like electrode are connected to plasma by interior electrode connecting rod
Power supply.
Above-mentioned denitration reaction of low temperature plasma device, several plasma reactor assembled arrangements are arranged in reactor
In unit.
Above-mentioned denitration reaction of low temperature plasma device, reactor unit are a square frame, and the frame is from top to bottom
Several crossbeams are fixed with, plasma reactor is distributed on crossbeam.
Above-mentioned denitration reaction of low temperature plasma device, cage-like electrode are provided with radial conducting rod, interior electrode connection
Bar is arranged on the conducting rod.
Above-mentioned denitration reaction of low temperature plasma device, interior electrode connecting rod include insulating coating pipe and are located at outside insulation
Interior conducting rod in casing.
The dielectric impedance denitration, which is compared with the denitration of reaction of low temperature plasma device with traditional approach, has following spy
Point:
1) SCR catalyst, no SCR catalyst consumption are not necessarily to;
2) it is consumed without denitration materials such as ammonia, urea;
3) equipment is simple, arranges in electric precipitation rear pass, does not in addition occupy power plant's land used, outstanding for old scrap build
It is advantageous;
4) the equipment installation period is short, and unit influence on system operation is small;
5) operation is simple, is not necessarily to any chemical reagents or oxygen generation system;
6) operating cost is low, and low temperature plasma denitrating technique is not necessarily to purchase other medicaments in addition to power consumption, to reduce operation
Cost;
7) security performance is high, and no toxic, harmful, inflammable, explosive substance participates in reaction;
8) low-temperature plasma equipment operation is simple, it is zero load to boiler require integrated SCR or SNCR can realize full load denitration (from
Igniting starts to put into operation);
9) low-temperature plasma denitration can multilevel device arranged in series, increase denitration efficiency, as later period standard improves or need again to drop
Low front machine utilization need to only be further added by one group of low-temperature plasma equipment;The straying quatity for reducing ammonia, avoids because adding SCR
High SO caused by catalyst3Secondary particulate tail cigarette trailing phenomenon caused by discharge and excessive spray ammonia.
Detailed description of the invention
Fig. 1 is reaction of low temperature plasma device front view of the present invention.Wherein, 1: interior electrode connecting rod, 2: screw type electrode,
3: ceramic tube, 4: cage-like electrode.
Fig. 2 is reaction of low temperature plasma device side view of the present invention.
Fig. 3 is reaction of low temperature plasma device sectional view of the present invention.
Fig. 4 is reaction of low temperature plasma device unit figure of the present invention.
Fig. 5 is reaction of low temperature plasma device unit mounting process figure of the present invention.
Specific embodiment
As shown in Figure 1, reaction of low temperature plasma device is connected to plasma electrical source (bipolar friendship by interior electrode connecting rod
Flow pulsed high voltage generator), screw type electrode connects flue shell by reactor frame and is grounded, cage-like electrode and spiral electricity
Pole generates plasma by electric discharge inside and outside ceramic tube, and when flue gas passes through plasma, the nitrogen in NO molecule is oxidized to height
Valence state nitrogen oxides (such as N2O3、N2O5), it cooperates with desulfurizer by chemical absorbing and removes to realize.
The present invention is achieved by the steps of:
1) by flue cuts off one section after dedusting, before desulfurization;
2) reactor unit is installed;
3) reaction of low temperature plasma device power supply platform and power supply are installed;
4) reaction of low temperature plasma device is connected with power supply;
5) restore flue and heat preservation;
6) reactor unit can be used in series, to improve NO removal efficiency;
7) reactor unit can assist SCR/SNCR denitration to propose effect, can also be used alone in the case where entrance NO content is not high de-
Nitre.
Claims (6)
1. denitration reaction of low temperature plasma device, it is characterised in that including ceramics pipe outer (3), set in ceramics pipe outer (3)
It is equipped with interior electrode, external electrode is provided with outside ceramics pipe outer, interior electrode connects plasma electrical source, external electrode ground connection, and interior electrode is
Prolong the cage-like electrode (4) of ceramic inside pipe wall arrangement made of anti-corrosion material, dispatch from foreign news agency is extremely wound in the spiral of ceramic pipe outer wall
Electrode (2), internal and external electrode is arranged vertically, which is dielectric impedance reaction of low temperature plasma device, ceramic tube (3)
As block media.
2. denitration according to claim 1 reaction of low temperature plasma device, it is characterised in that cage-like electrode (4) passes through interior
Electrode connecting rod (1) is connected to plasma electrical source.
3. denitration according to claim 2 reaction of low temperature plasma device, it is characterised in that several ion precursor reactants
Device assembled arrangement is arranged in reactor unit.
4. denitration according to claim 3 reaction of low temperature plasma device, it is characterised in that reactor unit is a side
Shape frame, the frame are fixed with several crossbeams from top to bottom, and plasma reactor is distributed on crossbeam.
5. denitration according to claim 2 reaction of low temperature plasma device, it is characterised in that cage-like electrode is provided with diameter
To conducting rod, interior electrode connecting rod (1) is arranged on the conducting rod.
6. denitration according to claim 5 reaction of low temperature plasma device, it is characterised in that interior electrode connecting rod includes
Insulating coating pipe and the interior conducting rod in insulating coating pipe.
Priority Applications (1)
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CN201811520616.6A CN109351151A (en) | 2018-12-12 | 2018-12-12 | Denitration reaction of low temperature plasma device |
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CN201811520616.6A CN109351151A (en) | 2018-12-12 | 2018-12-12 | Denitration reaction of low temperature plasma device |
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Publication Number | Publication Date |
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CN109351151A true CN109351151A (en) | 2019-02-19 |
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CN201811520616.6A Pending CN109351151A (en) | 2018-12-12 | 2018-12-12 | Denitration reaction of low temperature plasma device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116157197A (en) * | 2020-08-03 | 2023-05-23 | 韩国核融合能源研究院 | Method and device for controlling nitrogen oxides and method for producing water containing nitrogen oxides |
Citations (5)
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CN101506480A (en) * | 2005-06-17 | 2009-08-12 | 通用汽车环球科技运作公司 | Continuous reforming of diesel fuel for NOx reduction |
CN104043322A (en) * | 2014-06-24 | 2014-09-17 | 浙江工商大学 | Method for denitrifying coal-fired flue gas through synergy of plasma and complex catalysis |
CN205435413U (en) * | 2015-12-23 | 2016-08-10 | 天津荣鑫新材料科技有限公司 | Two dielectric barrier discharge devices of multipolar post of low temperature plasma |
KR20180035955A (en) * | 2016-09-29 | 2018-04-09 | 광운대학교 산학협력단 | Reactive species generator with non-thermal atmospheric pressure plasma |
CN209519581U (en) * | 2018-12-12 | 2019-10-22 | 山西晋浙环保科技有限公司 | Denitration reaction of low temperature plasma device |
-
2018
- 2018-12-12 CN CN201811520616.6A patent/CN109351151A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101506480A (en) * | 2005-06-17 | 2009-08-12 | 通用汽车环球科技运作公司 | Continuous reforming of diesel fuel for NOx reduction |
CN104043322A (en) * | 2014-06-24 | 2014-09-17 | 浙江工商大学 | Method for denitrifying coal-fired flue gas through synergy of plasma and complex catalysis |
CN205435413U (en) * | 2015-12-23 | 2016-08-10 | 天津荣鑫新材料科技有限公司 | Two dielectric barrier discharge devices of multipolar post of low temperature plasma |
KR20180035955A (en) * | 2016-09-29 | 2018-04-09 | 광운대학교 산학협력단 | Reactive species generator with non-thermal atmospheric pressure plasma |
CN209519581U (en) * | 2018-12-12 | 2019-10-22 | 山西晋浙环保科技有限公司 | Denitration reaction of low temperature plasma device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116157197A (en) * | 2020-08-03 | 2023-05-23 | 韩国核融合能源研究院 | Method and device for controlling nitrogen oxides and method for producing water containing nitrogen oxides |
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