CN209519581U - Denitration reaction of low temperature plasma device - Google Patents
Denitration reaction of low temperature plasma device Download PDFInfo
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- CN209519581U CN209519581U CN201822083558.7U CN201822083558U CN209519581U CN 209519581 U CN209519581 U CN 209519581U CN 201822083558 U CN201822083558 U CN 201822083558U CN 209519581 U CN209519581 U CN 209519581U
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- low temperature
- temperature plasma
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Abstract
The utility model discloses a kind of denitration reaction of low temperature plasma device, the device be placed in deduster after, before desulfurization in flue.The a large amount of active particles being rich in low-temperature plasma body such as ion, electronics, the atom of excitation state and molecule and free radical etc., so that aoxidizing CO, NO, VOCs etc. for plasma technique provides condition.Low temperature plasma utilizes the effects of CO, NO, VOCs in these high energy electrons, free radical isoreactivity particle and flue gas, and the nitrogen in NO molecule is made to be oxidized to high-valence state nitrogen oxides (such as N2O3、N2O5), it cooperates with desulfurizer by chemical absorbing and removes to realize.
Description
Technical field
The utility model relates to a kind of denitration dielectric impedance reaction of low temperature plasma device device, specially denitration is with low
Isothermal plasma reactor.
Background technique
Either selective catalytic reduction (Selective Catalytic Reduction, SCR) is still non-selection at present
Property catalysis reduction (Selective Non-catalytic Reduction, SNCR) all there is denitration efficiency under wide load condition
Decline and the escaping of ammonia problem, in order to improve denitration efficiency and collaboration electric precipitation in the case where not increasing SCR catalyst
(Electrostatic Precipitator, ESP) and ammonia process (Flue Gas Desulfurization, FGD) realize combustion
Coal burning boiler minimum discharge, the application is by the way that flue installs what bi-polar AC pulsed high voltage generator was powered additional after former dedusting, before desulfurization
Dielectric impedance reaction of low temperature plasma device forms plasma, the nitrogen in NO molecule is made to be oxidized to high-valence state nitrogen oxides
(such as N2O3、N2O5), it cooperates with desulfurizer by chemical absorbing and removes to realize.Use the dielectric impedance low-temperature plasma
Reactor according device can be with the removal NO of stability and high efficiency.
Summary of the invention
In view of the above-mentioned problems, the denitration low temperature etc. that the purpose of this utility model is to provide a kind of for denitrating flue gas
Plasma reactor removes NO in flue gas.
The utility model adopts the following technical scheme that realization: denitration reaction of low temperature plasma device, including exhausted
Edge ceramic tube is provided with interior electrode in ceramics pipe outer, and external electrode is provided with outside ceramics pipe outer, and interior electrode connects plasma electricity
Source, external electrode ground connection, interior electrode are the cage-like electrode for prolonging ceramic inside pipe wall arrangement made of anti-corrosion material, and dispatch from foreign news agency is extremely wound in
The screw type electrode of ceramic pipe outer wall, internal and external electrode are arranged vertically, which is dielectric impedance low temperature plasma
Reactor, ceramic tube is as block media.Electric discharge generates plasma, screw type electrode after cage-like electrode connects plasma electrical source
Induction discharge generates plasma, cage-like electrode and screw type electrode and generates plasma inside and outside ceramic tube by electric discharge, etc.
The a large amount of active particles being rich in gas ions such as ion, electronics, the atom of excitation state and molecule and free radical etc., thus for it is equal from
The oxidation of daughter technology CO, NO, VOCs etc. provide condition, and when flue gas passes through plasma, the nitrogen in NO molecule is oxidized to height
Valence state nitrogen oxides is cooperateed with by chemical absorbing with desulfurizer and is removed to realize.
Above-mentioned denitration reaction of low temperature plasma device, cage-like electrode are connected to plasma by interior electrode connecting rod
Power supply.
Above-mentioned denitration reaction of low temperature plasma device, several plasma reactor assembled arrangements are arranged in reactor
In unit.
Above-mentioned denitration reaction of low temperature plasma device, reactor unit are a square frame, and the frame is from top to bottom
Several crossbeams are fixed with, plasma reactor is distributed on crossbeam.
Above-mentioned denitration reaction of low temperature plasma device, cage-like electrode are provided with radial conducting rod, interior electrode connection
Bar is arranged on the conducting rod.
Above-mentioned denitration reaction of low temperature plasma device, interior electrode connecting rod include insulating coating pipe and are located at outside insulation
Interior conducting rod in casing.
The dielectric impedance denitration, which is compared with the denitration of reaction of low temperature plasma device with traditional approach, has following spy
Point:
1) SCR catalyst, no SCR catalyst consumption are not necessarily to；
2) it is consumed without denitration materials such as ammonia, urea；
3) equipment is simple, arranges in electric precipitation rear pass, does not in addition occupy power plant's land used, old equipment is changed
It makes especially beneficial；
4) the equipment installation period is short, and unit influence on system operation is small；
5) operation is simple, is not necessarily to any chemical reagents or oxygen generation system；
6) operating cost is low, and low temperature plasma denitrating technique is not necessarily to purchase other medicaments in addition to power consumption, to reduce
Operating cost；
7) security performance is high, and no toxic, harmful, inflammable, explosive substance participates in reaction；
8) low-temperature plasma equipment operation is simple, zero load to boiler to require integrated SCR or SNCR that realize that full load is de-
Nitre (puts into operation) since igniting；
9) low-temperature plasma denitration can multilevel device arranged in series, increase denitration efficiency, improved again such as later period standard or
Front machine utilization need to be reduced, one group of low-temperature plasma equipment need to be only further added by；The straying quatity for reducing ammonia, avoids because adding
High SO caused by SCR catalyst3Secondary particulate tail cigarette trailing phenomenon caused by discharge and excessive spray ammonia.
Detailed description of the invention
Fig. 1 is the utility model reaction of low temperature plasma device front view.Wherein, 1: interior electrode connecting rod, 2: spiral
Electrode, 3: ceramic tube, 4: cage-like electrode.
Fig. 2 is the utility model reaction of low temperature plasma device side view.
Fig. 3 is the utility model reaction of low temperature plasma device sectional view.
Fig. 4 is the utility model reaction of low temperature plasma device unit figure.
Fig. 5 is the utility model reaction of low temperature plasma device unit mounting process figure.
Specific embodiment
As shown in Figure 1, reaction of low temperature plasma device is connected to plasma electrical source (bipolar friendship by interior electrode connecting rod
Flow pulsed high voltage generator), screw type electrode connects flue shell by reactor frame and is grounded, cage-like electrode and spiral electricity
Pole generates plasma by electric discharge inside and outside ceramic tube, and when flue gas passes through plasma, the nitrogen in NO molecule is oxidized to height
Valence state nitrogen oxides (such as N2O3、N2O5), it cooperates with desulfurizer by chemical absorbing and removes to realize.
The utility model is achieved by the steps of:
1) by flue cuts off one section after dedusting, before desulfurization；
2) reactor unit is installed；
3) reaction of low temperature plasma device power supply platform and power supply are installed；
4) reaction of low temperature plasma device is connected with power supply；
5) restore flue and heat preservation；
6) reactor unit can be used in series, to improve NO removal efficiency；
7) reactor unit can assist SCR/SNCR denitration to propose effect, can also individually make in the case where entrance NO content is not high
Use denitration.
Claims (6)
1. denitration reaction of low temperature plasma device, it is characterised in that including ceramics pipe outer (3), set in ceramics pipe outer (3)
It is equipped with interior electrode, external electrode is provided with outside ceramics pipe outer, interior electrode connects plasma electrical source, external electrode ground connection, and interior electrode is
Prolong the cage-like electrode (4) of ceramic inside pipe wall arrangement made of anti-corrosion material, dispatch from foreign news agency is extremely wound in the spiral of ceramic pipe outer wall
Electrode (2), internal and external electrode is arranged vertically, which is dielectric impedance reaction of low temperature plasma device, ceramic tube (3)
As block media.
2. denitration according to claim 1 reaction of low temperature plasma device, it is characterised in that cage-like electrode (4) passes through interior
Electrode connecting rod (1) is connected to plasma electrical source.
3. denitration according to claim 2 reaction of low temperature plasma device, it is characterised in that several ion precursor reactants
Device assembled arrangement is arranged in reactor unit.
4. denitration according to claim 3 reaction of low temperature plasma device, it is characterised in that reactor unit is a side
Shape frame, the frame are fixed with several crossbeams from top to bottom, and plasma reactor is distributed on crossbeam.
5. denitration according to claim 2 reaction of low temperature plasma device, it is characterised in that cage-like electrode is provided with diameter
To conducting rod, interior electrode connecting rod (1) is arranged on the conducting rod.
6. denitration according to claim 5 reaction of low temperature plasma device, it is characterised in that interior electrode connecting rod includes
Insulating coating pipe and the interior conducting rod in insulating coating pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822083558.7U CN209519581U (en) | 2018-12-12 | 2018-12-12 | Denitration reaction of low temperature plasma device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822083558.7U CN209519581U (en) | 2018-12-12 | 2018-12-12 | Denitration reaction of low temperature plasma device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209519581U true CN209519581U (en) | 2019-10-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201822083558.7U Active CN209519581U (en) | 2018-12-12 | 2018-12-12 | Denitration reaction of low temperature plasma device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109351151A (en) * | 2018-12-12 | 2019-02-19 | 山西晋浙环保科技有限公司 | Denitration reaction of low temperature plasma device |
| CN113171673A (en) * | 2021-05-27 | 2021-07-27 | 长江师范学院 | Ship tail gas treatment device based on plasma ionization |
-
2018
- 2018-12-12 CN CN201822083558.7U patent/CN209519581U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109351151A (en) * | 2018-12-12 | 2019-02-19 | 山西晋浙环保科技有限公司 | Denitration reaction of low temperature plasma device |
| CN113171673A (en) * | 2021-05-27 | 2021-07-27 | 长江师范学院 | Ship tail gas treatment device based on plasma ionization |
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