A kind of normal temperature flue-gas denitration process
Technical field
The present invention relates to a kind of method processing nitrogen oxide in boiler smoke, specifically a kind of normal temperature flue-gas denitration process.
Background technology
Denitrating technique main is at present SNCR(SNCR method), SCR(selective catalytic reduction) technology.By adding ammonia or ammoniacal liquor in flue gas, controlling its reaction condition, making nitrogen oxide and ammonia generation redox reaction generate nitrogen, reaching the object of denitration.
The weak point that above-mentioned denitrating technique exists is: SNCR method: in stove, spray ammonia removes nitrogen oxides treatment efficiency low (30%-50%), and the escaping of ammonia is serious, is difficult to mark discharge; Selective catalytic reduction uses catalyst, and efficiency relatively high energy reaches 80% efficiency, but invests high, and catalyst layer needs 2-3 to change once, and operating cost is high.Simultaneity factor participates in the ammonia of reaction, needs to be obtained by methods such as liquefied ammonia evaporation, ammoniacal liquor evaporation, urea pyrolysis, there is very large potential safety hazard.
Use plasma technique a lot of to the research of denitration, mostly concentrate on pulsed discharge plasma and corona plasma.
" low temperature plasma improvement gaseous contaminant " (Yan Xuefeng etc. " chemical research and application " volume the 2nd phase April the 16th in 2004) and " progress of low temperature plasma flue gas desulfurization and denitrification technology " (Wang Xiaochen etc. " environmental protection and recycling economy ") have studied the technical prospect of low temperature plasma on denitrating flue gas.In prior art, according to the knowledge of the applicant, also not having can industrially practical application technique and device.
Summary of the invention
The invention provides a kind of normal temperature flue-gas denitration process, it adopts the nitrogen oxide in bi-medium to block plasma generator and spray column group technology process boiler smoke, and denitration efficiency is high, simple to operate, and operating cost is low, and the scope of application is wide.
The concrete scheme that the present invention adopts is:
A kind of normal temperature flue-gas denitration process, is characterized in that, comprise the steps:
1) dedusting;
2) desulfurization;
3) plasma oxidation: the flue gas after process enters level of platoon leader formula double-dielectric barrier discharge plasma oxidation device and carries out oxidation processes;
4) flue gas after the oxidation of alkaline aqueous solution spray is adopted, the Strong oxdiative material in trapping flue gas.
Wherein, dust-removing process adopts cloth-sack-type dust removal and/or spiral-flow type dedusting; Described desulfurization process adopts the desulfurizing tower of prior art to carry out.
In plasma oxidation operation, due to the effect of high energy electron, formation charged particle or intermolecular chemical bond are interrupted produces free radical isoreactivity particle, water simultaneously in air and oxygen also can produce the oxidizing species such as OH free radical, active oxygen under high energy electron bombardment, and NO is oxidized to NO by these oxidizing species
xetc. high-valence state nitrogen.
Described level of platoon leader formula double-dielectric barrier discharge plasma oxidation device comprises casing, in casing, there is frame, frame is arranged monomer air duct, set gradually air inlet, spray equipment, plasma dish, monomer fuel tank and dish pressing device in monomer air duct from top to bottom, monomer air duct lower end connects air outlet.Wherein, monomer fuel tank provides high voltage source to plasma dish, and dish pressing device is used for fixing plasma dish.Heat abstractor and power supply is also provided with in casing.
Described plasma dish comprises plate rail, and the two ends of plate rail arrange insulation cover plate, is provided with many plasmatrons between insulation cover plate.Plate rail is also provided with insulation sleeve, and cable is connected with plasmatron by insulation sleeve.
In each plasmatron, be equipped with high-field electrode and earth electrode, adopt two dielectric impedances between high-field electrode and earth electrode, between two media, form discharging gap.
Level of platoon leader formula double-dielectric barrier discharge plasma oxidation device of the present invention can 0.1 ~ 10 × 10
5work under the air pressure of Pa, there is the feature of the large space Uniform Discharge of glow discharge and the hyperbar operation of corona discharge.Whole electric discharge be by many on room and time the micro discharge of random distribution form, the duration of these micro discharges is very short, generally in 10ns magnitude.Dielectric layer has two Main Functions to this type of electric discharge: one is the motion limiting charged particle in micro discharge, makes the pulse that micro discharge becomes very brief one by one; Two is allow micro discharge be distributed in uniformly and stably between whole plane-shape electrode, prevents spark discharge.Dielectric barrier discharge because electrode is not direct and discharge gas comes in contact, thus avoids the etching problem of electrode.
Compared with prior art, advantage of the present invention is:
1) the present invention can realize Wind Volume process, can process air quantity more than 100,000 grades, can extensive use and various model boiler;
2) denitration efficiency is high, controlling, can realize denitration efficiency more than 90% by controlling plasma level of platoon leader;
3) operating cost is low;
4) security is high, without ammonia preparation system, eliminates liquefied ammonia hidden peril of explosion.
Accompanying drawing explanation
Fig. 1 is level of platoon leader formula double-dielectric barrier discharge plasma oxidation device structural representation of the present invention;
Fig. 2 is plasma dish structural representation;
Fig. 3 is plasmatron structure principle chart.
In figure, 1-air inlet, 2-frame, 3-spray equipment, 4-plasma dish, 5-monomer fuel tank, 6-dish pressing device, 7-air outlet, 8-monomer air duct, 9-casing, 10-heat abstractor, 11-power supply, 12-high-field electrode, 13-medium, 14-earth electrode, 4-1 is cable, and 4-2 is insulation sleeve, 4-3 is plate rail, and 4-4 is plasmatron, and 4-5 is insulation cover plate.
Detailed description of the invention
A kind of normal temperature flue-gas denitration process, is characterized in that, comprise the steps:
1) dedusting;
2) desulfurization;
3) plasma oxidation;
4) flue gas after the oxidation of alkaline aqueous solution spray is adopted, the oxidized material in trapping flue gas.
Wherein, dust-removing process adopts cloth-sack-type dust removal, and desulfurization process adopts desulfurizing tower to carry out.
Described level of platoon leader formula double-dielectric barrier discharge plasma oxidation device comprises casing 9, there is in casing 9 frame 2, frame 2 is arranged monomer air duct 8, set gradually air inlet 1, spray equipment 3, plasma dish 4, monomer fuel tank 5 and dish pressing device 6 in monomer air duct 8 from top to bottom, monomer air duct 8 lower end connects air outlet 7.Heat abstractor 10 and power supply 11 is also provided with in casing 9.
Wherein, frame 2 is supportive body equipment, and monomer fuel tank 5 and power supply 11 provide high voltage source to plasma dish 4, dish pressing device 6 fix plasma dish 4, monomer air duct 8 for supporting plasma dish 4, and in monomer air duct 8 smoke treatment.
Described plasma dish comprises plate rail 4-3, and the two ends of plate rail 4-3 arrange insulation cover plate 4-5, is provided with many plasmatron 4-4 between insulation cover plate 4-5.Plate rail 4-3 is also provided with insulation sleeve 4-2, and cable 4-1 is connected with plasmatron 4-4 by insulation sleeve 4-2.
In each plasmatron 4-4, be equipped with high-field electrode 12 and earth electrode 14, adopt two media 13 to stop between high-field electrode 12 and earth electrode 14, between two media 13, form discharging gap.