CN105879600B - Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device - Google Patents

Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device Download PDF

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CN105879600B
CN105879600B CN201510861067.9A CN201510861067A CN105879600B CN 105879600 B CN105879600 B CN 105879600B CN 201510861067 A CN201510861067 A CN 201510861067A CN 105879600 B CN105879600 B CN 105879600B
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plasma
nitrogen oxides
reduction device
emission reduction
energy
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CN105879600A (en
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尹钟珌
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Ecoenergen Co Ltd
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Ecoenergen Co Ltd
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/02—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust
    • F01N3/04—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust using liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/54—Nitrogen compounds
    • B01D53/56—Nitrogen oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/12—Washers with plural different washing sections
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/75—Multi-step processes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N13/00—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00
    • F01N13/009—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00 having two or more separate purifying devices arranged in series
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
    • F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2570/00—Exhaust treating apparatus eliminating, absorbing or adsorbing specific elements or compounds
    • F01N2570/14—Nitrogen oxides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/15—Ambient air; Ozonisers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E20/00—Combustion technologies with mitigation potential
    • Y02E20/12—Heat utilisation in combustion or incineration of waste
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00—Road transport of goods or passengers
    • Y02T10/10—Internal combustion engine [ICE] based vehicles
    • Y02T10/12—Improving ICE efficiencies

Abstract

The present invention provides the nitrogen oxides emission reduction device for utilizing dielectric barrier discharge plasma.Combustion section, wet processed portion and plasma oxidation portion are configured in shell by plasma oxynitride emission reduction device of the invention, thus, so that the nitrogen oxides form being discharged from the final outlet of plasma oxynitride emission reduction device is with NO2Ground discharge is limited, the nitrogen oxides of discharge is eventually processed in final exhaust end by the wet scrubber that reducing agent operates.

Description

Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device
Technical field
The present invention relates to exhaust-gas treatment fields, and being related to one kind in more detail can be effectively treated containing nitrogen oxides (NOx) And energy-saving dielectric barrier discharge (Dielectric Barrier Discharge) plasma of the exhaust gas of other pollutants Nitrogen oxides emission reduction device.
Background technique
With industrialized fast development, meet the industrial activity of human demand based on energy basic means.But With the increase of using energy source, the generation of environmental pollution is not only resulted in, also, pollution level is increasingly severe.Occupy energy money The fossil fuels such as the most petroleum in source, coal, natural gas in combustion, necessarily discharge Air Pollutants, therefore, are Sustainable development from now on, the mankind have to realize the coordination of economic growth and environmental protection.
Because using energy bring atmosphere pollution, local pollution and the world are roughly divided into according to involving range and corresponding to range Contact scar.Sulfur and nitrogen oxides etc. compare locality for acid rain, the damaging range of animals and plants, but, titanium dioxide Carbon, NOx isothermal chamber gas become the international dispute object in relation to global warming phenomenon.
The immoderate economical operation for the purpose of developing, has led to atmosphere pollution around domestic metropolis and industrial area Reached and jeopardize state, also, as economic development bring income improves, about preventing domestic atmosphere pollution, global concern Execute the proposition of the methodology of the global warming of various regulations and because referred to as important using the Air Pollutants prospect of the energy Project.
Currently, with the increase of the demand for semiconductor display screen, it is more and more extensive to use fluoride, here, for Because the total amount regulation correspondence problem largely discharged of 2 polluters (NOx) that occurs after handle semiconductor process gases with The technology of processing NOx at present mainly uses catalysis process, but the energy that overuses in operation, accordingly it is desirable to ensure to replace skill Art, it is therefore desirable to be able to solve the replacement technology of existing issue.
[advanced technical literature]
[patent document]
(patent document 1) Korean Patent Publication 10-2011-0065985
Summary of the invention
Problems to be solved by the invention
The technical problem to be solved in the present invention be provide it is a kind of suitable in the shell of plasma oxynitride emission reduction device Secondary configuration combustion section, wet processed portion and plasma oxidation portion, with NO in the form of by the nitrogen oxides of final outlet2Limit Surely it is discharged, thus, it is possible to effectively handle the nitrogen oxides emission reduction type plasma oxidation device of nitrogen oxides.
The technical solution solved the problems, such as
To solve the above-mentioned problems, the present invention provides a kind of energy-saving dielectric barrier discharge plasma nitrogen for handling exhaust gas Oxide emission reduction device, comprising: combustion section carries out burning processing for the exhaust gas；Wet processed portion connects from the combustion section The gas of burning processing is received, wet processed is carried out；Plasma oxidation portion, investment is for handling through the wet processed portion The plasma gas for the nitrogen oxides for including in gas.
The energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device may also include shell, also, described Combustion section, the wet processed portion and the plasma oxidation portion are configured in the shell.
The energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device may also include main discharge, be used for The nitrogen oxides handled by the plasma gas is discharged to the shell exterior, also, it is described etc. from Daughter oxidation section can connect installation with the interface channel for being connected to the main discharge in the shell.
The O that the plasma gas can generate for the plasma discharge by the plasma oxidation portion3Gas Body.
The nitrogen oxides can be with the O that generates from the plasma oxidation portion3Oxidation reaction is generated, NO is transformed to2。
The NO of the discharge2It can be processed by reduction reaction in the wet processed technique of subsequent treatment process.
The plasma oxidation portion, it may include: internal electrode is rod shape；Dielectric, around the internal electricity Pole；And external electrode, outside the dielectric with loop shape be inserted into install, also, to the internal electrode with it is described External electrode can be applied for generating the AC power source of plasma.
The external electrode surface can be coated by thermal spraying.
Identical height can be formed with outside the external electrode outside the dielectric.
The plasma oxidation portion can use dielectric barrier discharge (Dielectric Barrier Discharge, DBD) plasma and generate plasma.
The effect of invention
According to the present invention, plasma oxynitride emission reduction device will pass through combustion section and the gas in wet processed portion for processing The nitrogen oxides for including in body and the plasma oxidation portion for putting into plasma gas is configured at together in shell, thus, energy Enough final outlets in plasma oxide emission reduction device make nitrogen oxides form with NO2Limit discharge.Also, it is not necessarily to Other equipment is added, and discharges the dielectric barrier discharge plasma in the plasma oxidation portion formed by coil form electrode, it is right Nitrogen oxides is handled, thus, it is possible to save the energy supplied to equipment.
Such plasma oxidation portion, including internal electrode, around the dielectric of internal electrode and outside dielectric with The external electrode of loop shape insertion installation, external electrode surface are coated by thermal spraying, dielectric outside and external electrode The height of outside is identically formed, thus, it is possible to prevent dust adhesion between electrode, and is able to solve in dielectric and electrode Between gap there is the problem of generating heat or electric arc occurs.
Technical effect of the invention is not limited to above-mentioned content, and those skilled in the art passes through following the description It should be understood that unmentioned other technical effects.
Detailed description of the invention
Fig. 1 is the attached drawing for the gas purge system that schematic diagram is applicable in plasma oxidation portion of the invention.
Fig. 2 is the attached drawing for indicating to be applicable in the plasma oxynitride emission reduction device in plasma oxidation portion of the invention.
Fig. 3 is the cross-sectional view for illustrating plasma oxidation portion of the invention.
Fig. 4 is the sectional view for illustrating plasma oxidation portion of the invention.
Fig. 5 is the expanded view for illustrating plasma oxidation portion of the invention.
Description of symbols
300: plasma oxynitride emission reduction device
301: shell 310: combustion section
320: wet processed portion 330: plasma oxidation portion
331: internal electrode 332: dielectric
333: external electrode 334: outside dielectric
335: 336 outside external electrode: reaction gas intake
337: plasma gas outlet 340: AC power source supply department
Specific embodiment
The present invention can make various changes, and carry out various embodiments, in the accompanying drawings illustrations specific embodiments, and detailed It is described in detail in explanation.But, it should be understood that this is not intended to limit the invention to particular implementation form, but wraps Include all transformation, equipollent and the sub belonged in thought and technical scope of the invention.As in explaining the present invention, sentence Disconnected when can obscure the gist of the invention for the detailed description in relation to well-known technique, then description is omitted.
Hereinafter, be explained in detail with reference to the accompanying drawings according to an embodiment of the invention, also, when being described with reference to, it is identical or Corresponding constituent element assigns identical reference numeral, and omits to its repeated explanation.
In general, nitrogen oxides occurs because of the mobile occurring source of the fixed occurring source and automobile etc. such as thermal power plant, The nitrogen oxides occurred in semiconductor technology be before discharging various pernicious gases to atmosphere safely in the process of processing The washer combustion process of process, what high temperature nitrogen and oxygen when burning generated due to generating reaction.
NO is discharged to atmosphere, passes through the O in atmosphere3、O2, moisture etc. and be oxidized to NO2、NO3、N2O4Deng wherein most For NO2, it is fused into suspended particulates state in air, and become acid rain or photochemical fog is formed by sunray.Its Harm is very extensive, mainly causes respiratory disease to human body, stimulation eyes cause dysopia, or corrosion metal material, to plant Object growth also produces bigger effect.
The SiH used in semiconductor processing as processing4、NF3The technique of equal pernicious gases, using annealing device, this The type of class annealing device has fuel type, electric heater formula, plasma type.Such mode during processing, passes through O2、H2O Deng and N2Reaction, a large amount of nitrogen oxides (NO, NO occurs2) etc..In particular, in the case where fuel type and plasma type, because The high characteristic of operation temperature, the occurrence rate of NO is higher in nitrogen oxides.
As another occurring source, NH in gas used in semiconductor technology3And NF3, in decomposition or chemical reaction process In, from NH3And NF3The nitrogen factor (N+) of decomposition and the O in atmosphere2Or H2O reaction, and it is (most of largely to generate nitrogen oxides NO)。
Fig. 1 is the attached drawing for the gas purge system that schematic diagram is applicable in plasma oxidation portion of the invention；Fig. 2 is to indicate It is applicable in the attached drawing of the plasma oxynitride emission reduction device in plasma oxidation portion of the invention.
Referring to FIG. 1 and FIG. 2, it for handling the gas purge system of the exhaust gas containing nitrogen oxides, including processes as follows Journey: the exhaust gas used in main process task equipment 100 is passed through into vacuum pump 200 to the plasma for being applicable in plasma oxidation portion 330 Body nitrogen oxides emission reduction device 300 introduces, and the exhaust gas of introducing is handled by plasma oxynitride emission reduction device 300 Afterwards, it by subsequent technique, that is, wet scrubber 400, is discharged by fan 500 to atmosphere.
Here, it is applicable in the plasma oxynitride emission reduction device 300 in plasma oxidation portion 330 according to the present invention, It can be in order to handle exhaust gas and usually used annealing device i.e. point of use (POU, Point Of Use) washer.Previous It may include combustion section 310 and wet processed portion 320 in POU washer, but plasma oxynitride emission reduction according to the present invention Device 300 can configure plasma oxidation portion 330 in shell 301 other than combustion section 310 and wet processed portion 320, For launching the plasma gas for being used for handling the nitrogen oxides for including in the gas by wet processed portion 320.
As shown in Fig. 2, the combustion section 310 of plasma oxynitride emission reduction device 300 according to the present invention connects on top It is connected to and flows into pipe 311, exhaust gas used in semiconductors manufacture etc. is flowed by the inflow pipe 311 into shell 301.Opposite shell The exhaust gas flowed into 301 carries out burning processing by combustion section 310, and the exhaust gas by burning processing passes through under combustion section 310 The discharge pipe 312 that portion's sectional area is formed with becoming narrow gradually is discharged to wet processed portion 320.
Combustion section 310 using make the exhaust gas of harmful components by handling exhaust gas between flame by the way of, also, in order to mention High burning efficiency, O2And CH4Burning gases inlet 313 by being configured at 301 top of combustion section is injected.
But during processing, because of O2、H2O etc. and N2Reaction and generate a large amount of nitrogen oxides (NO, NO2) etc., especially It, in combustion, operation temperature high characteristic when because of burning, the ratio of NO increases in nitrogen oxides.
In the exhaust gas of the processing of combustion section 310, in order to handle dissolution and the high temperature of the depositions of 2 by-products, water-soluble gas Burning gases cooling, pass through wet processed portion 320.
Wet processed portion 320 is in order to receive the gas of burning processing from combustion section 310 and carry out wet processed, it may include the 1 nozzle 321, the 2nd nozzle 322, wet type sink 323, flow adjusting device 324, pump 325, water supply comb 326.
In wet processed portion 320, spraying by nozzle 321,322 generates in combustion section 310 to adsorb and be dissolved in Water-soluble exhaust gas and silica (SiO2) powder etc., it is stored using wet type sink 323 from combustion section 310 and nozzle 321,322 The treated substance of discharge and discharge.Preferably, the 1st nozzle 321 and the 2nd nozzle 322 are configured at 323 top of wet type sink.
1st nozzle 321 and the 2nd nozzle 322 can be connect with water supply comb 326, be supplied to receive from wet type sink 323 Water, also, pump 325 can be installed, between wet type sink 323 and water supply comb 326 to be configured in shell 301 Lower part wet type sink 323 water be supplied to top nozzle 321,322.Also, between wet type sink 323 and pump 325, It is configurable to the flow adjusting device 324 for the water that adjustment nozzle 321,322 sprays.
As above-mentioned, in wet processed portion 320, wet type sink 323, flow adjusting device 324, pump 325 and water supply comb 326, which pull together, cooperates, to play the function of water recursive device, so that the water of fixed temperature is continuously circulated in wet processed portion 320.
The rear end in wet processed portion 320 may also include main discharge 327, and the exhaust gas for that will handle is to outside shell 301 Discharge, so as to the device discharge for aftertreatment technology.
Main discharge 327 extends from 301 interior of shell and is formed, and is formed in shell 301 in main discharge 327 The main discharge 327 in portion can be connected by the interface channel 328 connecting with main discharge 327 with plasma oxidation portion 330 It connects.That is, plasma oxidation portion 330 according to the present invention, in the shell 301 of plasma oxynitride emission reduction device 300, It is configured together with combustion section 310 and wet processed portion 320, and forms the washer equipment of an entirety.
Also, it may also include in the lower part in plasma oxidation portion 330 to plasma oxidation portion 330 and apply AC power source AC power source supply department 340.
As described above, plasma oxidation portion 330 is configured at last in plasma oxynitride emission reduction device 300 End is main discharge 327, and can be made eventually by main discharge 327 to nitrogen oxides (NO) shape being discharged outside shell 301 State is with NO2Limit discharge.
That is, the O generated in plasma oxidation portion 330 by plasma discharge3When with burning in combustion The nitrogen oxides (NO) of generation occurs oxidation reaction and is transformed to NO2, the NO of variation2By main discharge to arranging outside shell 301 Out, to the NO being discharged outside shell 3012It, can be effectively by subsequent treatment process, that is, wet processed technique reduction reaction Handle nitrogen oxides.
Fig. 3 is the cross-sectional view for illustrating plasma oxidation portion of the invention；Fig. 4 be for illustrate it is of the invention it is equal from The sectional view of daughter oxidation section；Fig. 5 is the expanded view for illustrating plasma oxidation portion of the invention.
Referring to Fig. 3 to Fig. 5, plasma oxidation portion 330 of the invention may include internal electrode 331, dielectric 332, outer Portion's electrode 333.
Internal electrode 331 can have the rod shape of internal sky, also, be formed by electric conductor substance, so that electric current passes through.For The discharge gas of plasma discharge can be introduced by the reaction gas intake 336 of 331 lower part of internal electrode, pass through plasma The plasma gas that body discharges and generates can be discharged by the plasma gas outlet (337) on 331 top of internal electrode. Preferably, the discharge gas for being plasma discharge can be O2, can be by the plasma gas that plasma discharge generates O3。
Dielectric 332 around 331 one end of internal electrode both set a distances to the other end both set a distances, and have and inside The identical rod shape of electrode 331.Dielectric 332 is configured between internal electrode 331 and external electrode 333, is passed through for preventing The electric arc etc. for being applied to the high voltage of electrode and generating between the electrodes.
External electrode 333 can form the coil form electrode structure formed with loop shape, and be inserted into and be installed on dielectric 332 Outside.It can will be set to same intervals between coil and be inserted into, the section of coil, which is formed such that, is inserted in coil It can prevent from being formed in origination interval between the groove and coil of dielectric 332 when dielectric 332, also, in order to enable electricity is situated between 335 height configures in the same manner outside matter outside 334 and external electrode, and can have square shape.But to the shape of coil section State can make various changes according to user.
Internally electrode 331 and external electrode 333 are by being installed on the AC power source of the lower part in plasma oxidation portion 330 Supply department 340 applies AC power source.For example, internally voltage can be applied by electrode 331, external electrode 333 is grounded, or replacement The polarity of internal electrode 331 and external electrode 333, also, height can all be applied to two electrodes according to AC power source supply department 340 Voltage.That is, can apply high voltage (±) in internal electrode 331 and external electrode 333 to certain side, the other side is grounded, or In internal electrode 331 and external electrode 333 when certain side application+electrode ,-electrode can be applied to the other side.
Also, internal electrode 331 and external electrode 333 are to wrap metalliferous conductive material, can be stronger by corrosion resistance Aluminium (Al), stainless steel (STS), titanium (Ti), nickel (Ni), chromium (Cr), copper (Cu), tungsten (W), a certain material in platinum (Pt) or Its alloy and formed.Preferably, it can be applicable in processability and the preferable nickel of corrosion resistance Kazakhstan as main component (Hastelloy) alloy.
Ceramics, that is, MgO, Al of the higher oxide series of the applicable dielectric constant of dielectric 3322O3、TiO2、SiO2In A certain material.
The electrode surface of the external electrode 333 formed with loop shape can be coated by thermal spraying, to outside dielectric 332 Portion's insertion installation.Also, the external electrode outside 335 for being inserted in dielectric 332 is identical highly as 334 formation outside dielectric Configuration.
As above-mentioned, 333 surface of external electrode is coated by thermal spraying, and makes external electrode outside 335 and dielectric Outside 334 formed it is identical highly configure, so as to prevent between dust adhesion electrode, further, it is possible to solve in dielectric The problem of fever of gap generation between 332 and electrode or electric arc.
Plasma oxidation portion 330 can be embodied according to user with all size, preferred internal electricity according to the present invention The size of pole 331 is 1.5m from one end to the height of the other end, and the height of one end to the other end of dielectric 332 is 1.2m.And And one end since coil of the external electrode 333 of loop shape to coil end the other end height be 0.95m.Line The thickness of circle and dielectric 332, as shown in figure 4, respectively 2mm and 7mm.
Using such coil form electrode structure dielectric barrier discharge (Dielectric Barrier Discharge, DBD) plasma device is applying high-frequency, high voltage and the electric field (Electric field) occurred between electrodes, It is additionally formed the induction field by Faraday's law of induction (Faraday's Law of Induction), and makes electric field Intensity maximum significantly reduces power consumption as a result, and generates the plasma of good characteristic.
Such as above-mentioned, plasma oxidation portion 330 according to the present invention, using dielectric barrier discharge plasma occur etc. from Daughter is occurred by such plasma, by O2It is transformed to O3, O is discharged to main discharge 327 by interface channel 3283.As above The O being discharged to main discharge 327 with stating3The polluter existing for 327 inside of main discharge is carried out at oxidation and ionization Reason.For example, by NO and CO oxidation processes at NO2And CO2, THC is oxidized and ionizes, and HF or dust are by coarsening.
To by the plasma occurred from plasma oxidation portion 330 according to the present invention, in plasma nitrogen The nitrogen oxides occurred in 300 combustion process of oxide emission reduction device and the O occurred by plasma discharge3It is aoxidized Reaction treatment, as a result, be capable of the nitrogen oxides form of the final outlet of plasma oxynitride emission reduction device 300 with NO2Limit discharge.
Nitrogen oxides by above-mentioned plasma oxidation portion 330 is oxidized processing, and the reaction mechanism is as follows.
NO+O3=> NO2-+O2
It is oxidized processing by plasma oxidation portion 330, by main discharge 327 with NO2The nitrogen oxides of discharge, such as Shown in Fig. 1, it is eventually processed in the wet processed technique of subsequent treatment process, that is, wet scrubber 400 by reduction reaction. Also, wet scrubber 400 is in addition to nitric oxides, also handles the absorption in the ionized THC of pretreatment process, preceding place The remaining O of reason process3Reduction, HF etc..
The key reaction mechanism for carrying out reduction treatment by above-mentioned wet scrubber 400 is as follows.
NO2+(Na2S+ α)=N2+Na2SO4
As described above, pass through the reduction of oxidation process and wet scrubber 400 by means of plasma oxidation portion 330 Place is effectively performed in journey, the nitrogen oxides that can occur in the combustion process in plasma nitrogen oxides emission reduction device 300 Reason.
<experimental example 1>
In order to evaluate the nitrogen oxides treatment performance for the equipment for being equipped with plasma oxidation portion of the invention, nitrogen has been carried out Oxide is converted into NO by the plasma discharge in this plasma oxidation portion2Transfer efficiency test.
The testing data that Tables 1 and 2 carries out the equipment for being equipped with plasma oxidation portion of the invention.
According to the condition of this experimental example 1, by the plasma O of oxidation stage (Stage)3Concentration is set as 40ppm, by base Quasi- air quantity is set as 2CMM.Superficial linear velocity in a column 1m/s, when residence time 2sec condition, when plasma OFF and when plasma ON Nitrogen oxides NO2Transfer efficiency is as shown in table 1, as shown in table 2 according to the oxygenation efficiency experimental result of time change.
[table 1]
Plasma OFF (ppm) Plasma ON (ppm) Efficiency
NO 45 NO 7 84%
NO2 22 NO2 55
NOx 67 NOx 62
O3 40 O3 1.4
[table 2]
NO is effectively converted by applying the energy nitrogen oxides of plasma known to Tables 1 and 22.<experimental example 2>
In experimental example 2, in order to evaluate the nitrogen oxides treatment for the equipment for being equipped with plasma oxidation portion of the invention Can, it has carried out after continuous starting 80 minutes, nitrogen oxides is converted by the plasma discharge in this plasma oxidation portion For NO2Transfer efficiency test.
Table 3 to table 6 is that the test of the experimental example 2 carried out to the equipment for being equipped with plasma oxidation portion of the invention provides Material.
According to the condition of this experimental example 2, identically as the condition of experimental example 1 by the plasma O of oxidation stage3Concentration is set Be set to 40ppm, benchmark air quantity is set as 2CMM, also, superficial linear velocity in a column is set as 1m/s, change the residence time, with experimental example 1 Identical method is detected.
<table 3>
<table 4>
<table 5>
<table 6>
As shown in table 3 to table 6, the processing for having 95% or more can be confirmed from the measurement result of 0.5~2sec of residence time Efficiency.
As described above, plasma oxynitride emission reduction device 300, by be used to burn handle exhaust gas combustion section 310, from Combustion section 310 receives the gas of burning processing and carries out the wet processed portion 320 of wet processed and in order to handle by wet type The nitrogen oxides for including in the gas in reason portion 320 and the plasma oxidation portion 330 for putting into plasma gas is configured at together In shell 301, thus, it is possible to plasma oxynitride emission reduction device 300 final outlet make nitrogen oxides form with NO2Limit discharge.Also, without adding other equipment, discharge Jie in the plasma oxidation portion 330 formed by coil form electrode Matter barrier discharge plasma, handles nitrogen oxides, thus, it is possible to save the energy supplied to equipment.
Also, disclosed the embodiment of the present invention is intended merely to help to understand and prompt in the present description and drawings Particular case, and not limit the scope of the invention.Those skilled in the art of the invention should understand that in addition to providing herein Embodiment except, also implementable other variations based on the technical idea of the invention.

Claims (6)

1. a kind of energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device, the energy-saving medium as processing exhaust gas Barrier discharge plasma nitrogen oxides emission reduction device characterized by comprising
Shell；
Combustion section carries out burning processing for the exhaust gas；
Wet processed portion receives the gas of burning processing from the combustion section, carries out wet processed；
Plasma oxidation portion, investment for handle the grade of the nitrogen oxides for including in gas by the wet processed portion from Daughter gas,
Wherein the combustion section, the wet processed portion and the plasma oxidation portion are sequentially configured in the shell,
The wherein plasma oxidation portion, comprising:
Internal electrode is rod shape；
Dielectric surrounds the internal electrode；And
External electrode is inserted into loop shape outside the dielectric and is installed, and coil section has square shape,
Also, it is applied for generating the AC power source of plasma to the internal electrode and the external electrode,
Wherein the external electrode surface is coated by thermal spraying, and
Wherein identical height is formed with the external electrode outside outside the dielectric.
2. energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device according to claim 1, feature exist In,
It further include main discharge, being used for will be by the nitrogen oxides that the plasma gas is handled to described outer Discharge outside shell,
Also, the plasma oxidation portion connect peace with the interface channel for being connected to the main discharge in the shell Dress.
3. energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device according to claim 1, feature exist In,
The plasma gas is the O generated by the plasma discharge in the plasma oxidation portion3Gas.
4. energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device according to claim 3, feature exist In,
The nitrogen oxides and the O generated from the plasma oxidation portion3Oxidation reaction is generated, NO is transformed to2。
5. energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device according to claim 4, feature exist In,
The NO of the transformation2It is processed by reduction reaction in the wet processed technique of subsequent treatment process.
6. energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device according to claim 1, feature exist In,
The plasma oxidation portion generates plasma using dielectric barrier discharge plasma.
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