CN105879600A - Energy-saving type dielectric barrier discharge plasma nox reduction device - Google Patents

Energy-saving type dielectric barrier discharge plasma nox reduction device Download PDF

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Publication number
CN105879600A
CN105879600A CN201510861067.9A CN201510861067A CN105879600A CN 105879600 A CN105879600 A CN 105879600A CN 201510861067 A CN201510861067 A CN 201510861067A CN 105879600 A CN105879600 A CN 105879600A
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plasma
nitrogen oxides
dielectric barrier
energy
barrier discharge
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CN105879600B (en
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尹钟珌
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Ecoenergen Co Ltd
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Ecoenergen Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/54—Nitrogen compounds
    • B01D53/56—Nitrogen oxides
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/02—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust
    • F01N3/04—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust using liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/12—Washers with plural different washing sections
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/75—Multi-step processes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N13/00—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00
    • F01N13/009—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00 having two or more separate purifying devices arranged in series
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
    • F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2570/00—Exhaust treating apparatus eliminating, absorbing or adsorbing specific elements or compounds
    • F01N2570/14—Nitrogen oxides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/15—Ambient air; Ozonisers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E20/00—Combustion technologies with mitigation potential
    • Y02E20/12—Heat utilisation in combustion or incineration of waste
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00—Road transport of goods or passengers
    • Y02T10/10—Internal combustion engine [ICE] based vehicles
    • Y02T10/12—Improving ICE efficiencies

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Combustion & Propulsion (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Treating Waste Gases (AREA)
  • Exhaust Gas After Treatment (AREA)

Abstract

Disclosed is a nitrogen oxide reduction device using dielectric barrier discharge plasma. The plasma nitrogen oxide reduction device may limitedly emit nitrogen oxide with a form of NO2 at a final outlet of the plasma nitrogen oxide reduction device by arranging a combustion unit, a wet treatment unit, and a plasma oxidizing unit in a housing. The emitted nitrogen oxide is finally treated in a wet scrubber operated as a reducer at a final exhaust end.

Description

Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device
Technical field
The present invention relates to exhaust-gas treatment field, relate to one in more detail and can effectively process containing nitrogen oxidation Energy-saving dielectric barrier discharge (the Dielectric Barrier of the waste gas of thing (NOx) and other pollutant Discharge) plasma oxynitride emission reduction device.
Background technology
Along with industrialized fast development, meet the industrial activity of human's demand using energy basic means as Basis.But, along with the increase of utilization of energy, do not only result in the generation of environmental pollution, and, pollute journey Spend increasingly severe.Occupy the Fossil fuels such as the most oil of energy resources, coal, natural gas in combustion During burning, necessarily discharging Air Pollutants, therefore, for sustainable development from now on, the mankind are necessary Economic growth to be realized and the coordination of environmental conservation.
Because of the atmospheric pollution using the energy to bring, it is roughly divided into local dirt according to involving scope with corresponding scope Dye and international pollution.Sulfur and nitrogen oxides etc. are for acid rain, vegeto-animal damaging range ratio Relatively locality, but, carbon dioxide, NOx isothermal chamber gas become the world about global warming phenomenon Dispute object.
Immoderate to develop into the economical operation of purpose, cause around domestic metropolis and industrial occupancy is big Gas pollutes and has reached to jeopardize state, and, the income brought along with economic development improves, about preventing Domestic atmospheric pollution, global concern perform the proposition of the methodology of the global warming of various regulations and because utilizing The Air Pollutants prospect of the energy is referred to as important topic.
At present, along with the increase of the demand for quasiconductor display screen, fluoride is increasingly widely used, Here, for because processing a large amount of of 2 polluters (NOx) occurring after semiconductor process gases The total amount of discharge specify the technology of correspondence problem and current process NOx, mainly uses catalysis process, but Overuse in operation the energy, accordingly it is desirable to guarantee replacement technology, it is therefore desirable to be able to solve existing The replacement technology of problem.
[look-ahead technique document]
[patent documentation]
(patent documentation 1) Korean Patent Publication 10-2011-0065985
Summary of the invention
The problem that invention is to be solved
The technical problem to be solved in the present invention is, it is provided that a kind of at plasma oxynitride emission reduction device Combustion section, wet processed portion and plasma oxidation portion is sequentially configured, with by final outlet in shell The form of nitrogen oxides is with NO2Limit ground to discharge, thus, it is possible to effectively process the nitrogen oxygen of nitrogen oxides Compound reduction of discharging type plasma oxygen gasifying device.
The technical scheme of solution problem
In order to solve the problems referred to above, the present invention provides a kind of energy-saving dielectric barrier discharge etc. processing waste gas Gas ions nitrogen oxides emission reduction device, including: combustion section, burn processing is carried out for described waste gas；Wet Formula process portion, receives the gas of burn processing, carries out wet processed from described combustion section；Plasma oxygen Change portion, puts into the plasma for processing the nitrogen oxides comprised in the gas by described wet processed portion Bromhidrosis body.
Described energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device may also include shell, and And, described combustion section, described wet processed portion and described plasma oxidation portion are configured in described shell In.
Described energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device may also include main discharge Pipe, its described nitrogen oxides being used for carry out processing by described plasma gas is outside described shell Portion discharge, and, described plasma oxidation portion can in described shell be connected to described main discharge Interface channel connect install.
Described plasma gas can be to be given birth to by the plasma discharge in described plasma oxidation portion The O become3Gas.
Described nitrogen oxides can be with the O generated from described plasma oxidation portion3Produce oxidation reaction, become It is changed to NO2。
The NO of described discharge2Reduction reaction can be passed through in the wet processed technique of subsequent treatment process Processed.
Described plasma oxidation portion, it may include: internal electrode, it is rod shape；Electrolyte, it encloses Around described internal electrode；And outer electrode, its outside described electrolyte with loop shape insert install, Further, can be applied for producing the alternating current of plasma to described internal electrode and described outer electrode Source.
Described external electrode surface can be applied by thermal spraying.
Identical height can be formed with outside described outer electrode outside described electrolyte.
Described plasma oxidation portion can utilize dielectric barrier discharge (Dielectric Barrier Discharge, DBD) plasma and produce plasma.
The effect of invention
According to the present invention, plasma oxynitride emission reduction device will be for processing at by combustion section and wet type The nitrogen oxides that comprises in the gas in reason portion and put into plasma gas plasma oxidation portion together It is configured in shell, thus, it is possible to the final outlet at plasma oxide emission reduction device makes nitrogen Oxide form is with NO2Limit and discharge.And, it is not necessary to add other equipment, and discharge by coil form electricity The dielectric barrier discharge plasma in the plasma oxidation portion that pole is formed, processes nitrogen oxides, Thus, it is possible to save the energy to supply of equipment.
This type of plasma oxidation portion, including internal electrode, around the electrolyte of internal electrode and is situated between at electricity Insert the outer electrode installed outside matter with loop shape, external electrode surface is applied by thermal spraying, Outside electrolyte with outer electrode outside height be identically formed, thus, it is possible to prevent dust adhesion in Between electrode, and can solve the problem that the gap between electrolyte and electrode heating occurs or asking of electric arc occurs Topic.
The technique effect of the present invention is not limited to above-mentioned content, and those skilled in the art passes through The description below is to be understood that other technique effect NM.
Accompanying drawing explanation
Fig. 1 is the accompanying drawing that schematic diagram is suitable for the gas purge system in the plasma oxidation portion of the present invention.
Fig. 2 is the plasma oxynitride emission reduction device representing the plasma oxidation portion being suitable for the present invention Accompanying drawing.
Fig. 3 is the sectional view in the plasma oxidation portion for the present invention is described.
Fig. 4 is the sectional view in the plasma oxidation portion for the present invention is described.
Fig. 5 is the expanded view in the plasma oxidation portion for the present invention is described.
Description of reference numerals
300: plasma oxynitride emission reduction device
301: shell 310: combustion section
320: wet processed portion 330: plasma oxidation portion
331: internal electrode 332: electrolyte
333: outer electrode 334: outside electrolyte
335: outside outer electrode 336: reacting gas intake
337: plasma gas outlet 340: alternating current power supply supply department
Detailed description of the invention
The present invention can carry out various change, and carries out various embodiment, in the accompanying drawings illustrations specific embodiments, And be described in detail in the detailed description.But, it will be appreciated that this is not intended to limit the present invention In particular implementation form, but all conversion in the thought including belonging to the present invention and technical scope, all Deng thing and sub.As when the present invention is described, it is judged that can for the detailed description about known technology When obscuring idea of the invention, then description is omitted.
Hereinafter, it is explained in detail with reference to the accompanying drawings according to embodiments of the invention, and, it is being described with reference to Time, identical or corresponding element gives identical reference numeral, and omits its repeat specification.
It is said that in general, nitrogen oxides is because of the mobile occurring source of fixing occurring source and the automobiles etc. such as thermal power plant Occurring, the nitrogen oxides occurred in semiconductor processing is safety before discharging various harmful gass to air Ground process during scrubber's combustion process of process, because high temperature nitrogen during burning and oxygen produce React and generate.
NO is to airborne release, by the O in air3、O2, moisture etc. and be oxidized to NO2、NO3、 N2O4Deng, wherein most is NO2, it is fused into suspended particulates state in atmosphere, and becomes acid rain Or form photochemical fog by sunray.Its harm is very extensive, and human body mainly causes respiratory tract disease Disease, stimulates eyes, causes visual disorder, or corrosion metal material, and plant growing also produces bigger shadow Ring.
The SiH used in semiconductor processing as process4、NF3Etc. the technique of harmful gas, use heat Processing means, the kind of this type of annealing device has fuel type, electric heater formula, plasma type.This type of Mode, in processing procedure, passes through O2、H2O etc. and N2Reaction, occur substantial amounts of nitrogen oxides (NO, NO2) etc..Especially, in the case of fuel type and plasma type, because of the characteristic that operation temperature is high, In nitrogen oxides, the occurrence rate of NO is higher.
As another occurring source, NH in the gas used in semiconductor technology3And NF3, decompose or In chemical reaction process, from NH3And NF3The nitrogen factor (N+) decomposed and the O in air2Or H2O is anti- Should, and produce nitrogen oxides (major part NO) in a large number.
Fig. 1 is the accompanying drawing that schematic diagram is suitable for the gas purge system in the plasma oxidation portion of the present invention； Fig. 2 is that expression is suitable for the attached of the plasma oxynitride emission reduction device in the plasma oxidation portion of the present invention Figure.
With reference to Fig. 1 and Fig. 2, for processing the gas purge system of the waste gas containing nitrogen oxides, including such as Lower processing procedure: the waste gas used in main processing equipment 100 is passed through vacuum pump 200 to applicable plasma The plasma oxynitride emission reduction device 300 of body oxidation section 330 introduces, and the waste gas of introducing passes through plasma After body nitrogen oxides emission reduction device 300 processes, through subsequent technique i.e. wet scrubber 400, pass through Fan 500 is to airborne release.
Here, the plasma oxynitride being suitable for the plasma oxidation portion 330 according to the present invention reduces discharging Device 300, can be in order to process waste gas and normally used annealing device i.e. uses point (POU, Point Of Use) scrubber.Combustion section 310 and wet processed portion 320 can be comprised in conventional POU scrubber, But the plasma oxynitride emission reduction device 300 according to the present invention, except combustion section in shell 301 310 and wet processed portion 320 outside, configurable plasma oxidation portion 330, it is used for processing for input The plasma gas of the nitrogen oxides comprised in the gas by wet processed portion 320.
As in figure 2 it is shown, the combustion section 310 of the plasma oxynitride emission reduction device 300 according to the present invention Connecting on top and have inflow pipe 311, the waste gas used in semiconductor manufacturing etc. is outside by this inflow pipe 311 Flow in shell 301.The waste gas flowed in shell 301 is carried out burn processing, warp by combustion section 310 Cross the waste gas of burn processing by amassing, in combustion section 310 lower section, the discharge pipe formed with becoming narrow gradually 312 discharge to wet processed portion 320.
Combustion section 310 use make the waste gas of harmful components by the way of processing waste gas between flame, and And, in order to improve efficiency of combustion, O2And CH4Inject by being configured at the burning gases on combustion section 301 top Mouth 313 is injected into.
But, in processing procedure, because of O2、H2O etc. and N2Reaction and produce substantial amounts of nitrogen oxides (NO、NO2) etc., especially, in combustion, because of the characteristic that operation temperature during burning is high, nitrogen oxygen In compound, the ratio of NO increases.
Combustion section 310 process waste gas, in order to process the deposition of 2 by-products, water-soluble gas molten The cooling of the burning gases of solution and high temperature, by wet processed portion 320.
Wet processed portion 320 in order to receive the gas of burn processing from combustion section 310 and carry out wet processed, Can include the 1st nozzle the 321, the 2nd nozzle 322, wet type tank 323, flow adjuster 324, pump 325, Water supply comb 326.
In wet processed portion 320, adsorbed by the spraying of nozzle 321,322 and be dissolved in combustion section 310 The water solublity waste gas of interior generation and silicon dioxide (SiO2) powder etc., utilize wet type tank 323 store from Treated substance that combustion section 310 and nozzle 321,322 are discharged also is discharged.Preferably, the 1st nozzle 321 He 2nd nozzle 322 is configured at wet type tank 323 top.
1st nozzle the 321 and the 2nd nozzle 322 can be connected with water supply comb 326, in order to from wet type tank 323 Receive the water of supply, and, pump 325 can be installed between wet type tank 323 and water supply comb 326, So that by the nozzle 321 of the water supply of the wet type tank 323 of bottom that is configured in shell 301 to top, 322.Further, between wet type tank 323 and pump 325, it is configurable to adjust nozzle 321,322 spray The flow adjuster 324 of the water yield penetrated.
As above-mentioned, in wet processed portion 320, wet type tank 323, flow adjuster 324, pump 325 And water supply comb 326 pull together cooperation, to play the function of water recursive device so that the water of fixed temperature exists Persistent loop in wet processed portion 320.
The rear end in wet processed portion 320 may also include main discharge 327, and the waste gas being used for processing is to shell 301 outside discharges so that discharge to the device for aftertreatment technology.
Main discharge 327 extends from shell 301 interior and is formed, and is formed in main discharge 327 Main discharge 327 within shell 301, can be with by the interface channel 328 that is connected with main discharge 327 Plasma oxidation portion 330 connects.That is, according to the plasma oxidation portion 330 of the present invention, at plasma In the shell 301 of body nitrogen oxides emission reduction device 300, together join with combustion section 310 and wet processed portion 320 Put, and form overall scrubber's equipment.
Further, the bottom in plasma oxidation portion 330 may also include and applies to plasma oxidation portion 330 The alternating current power supply supply department 340 of alternating current power supply.
As described above, plasma oxidation portion 330 is configured at plasma oxynitride emission reduction device 300 Interior rearmost end i.e. main discharge 327, and can make eventually through main discharge 327 outside to shell 301 Nitrogen oxides (NO) form discharged is with NO2Limit and discharge.
That is, the O generated by plasma discharge in plasma oxidation portion 3303With in combustion process The nitrogen oxides (NO) occurred during middle burning occurs oxidation reaction to be transformed to NO2, the NO of change2 By main discharge to the outside discharge of shell 301, to the outside NO discharged of shell 3012Pass through subsequent treatment The technique i.e. reduction reaction of wet processed technique, it is possible to effectively process nitrogen oxides.
Fig. 3 is the sectional view in the plasma oxidation portion for the present invention is described；Fig. 4 is for being used for this is described The sectional view in bright plasma oxidation portion；Fig. 5 is the plasma oxidation portion for the present invention is described Expanded view.
With reference to Fig. 3 to Fig. 5, the plasma oxidation portion 330 of the present invention can include that internal electrode 331, electricity are situated between Matter 332, outer electrode 333.
Internal electrode 331 can have internal empty rod shape, and, electric conductor material formed, in order to Electric current passes through.Discharge gas for plasma discharge can be by the reacting gas of internal electrode 331 bottom Intake 336 introduces, and the plasma gas generated by plasma discharge can pass through internal electrode Plasma gas outlet (337) discharge on 331 tops.Preferably, putting for plasma discharge Electrically body can be O2, the plasma gas generated by plasma discharge can be O3。
Electrolyte 332 is around both set a distances of internal electrode 331 one end to both set a distances of the other end, and has There is the rod shape identical with internal electrode 331.Electrolyte 332 is configured at internal electrode 331 and outer electrode Between 333, for preventing the electric arc etc. produced in-between the electrodes by putting on the high voltage of electrode.
Outer electrode 333 can form the coil form electrode structure formed with loop shape, and insertion is installed on Outside electrolyte 332.Can be by being set to same intervals and insert between coil, cutting of coil Face be prevented from when being formed such that and coil is inserted in electrolyte 332 being formed at the groove of electrolyte 332 with Origination interval between coil, and, so that outside electrolyte 334 and outer electrode outside 335 height Degree configures in the same manner, and can have square shape.But, the form of coil section can be entered according to user The various changes of row.
Internally electrode 331 and outer electrode 333 are by being installed on the bottom in plasma oxidation portion 330 Alternating current power supply supply department 340 applies alternating current power supply.For example, it is possible to internally electrode 331 applies voltage, outward Portion's electrode 333 is grounded, or changes internal electrode 331 and the polarity of outer electrode 333, and, according to Alternating current power supply supply department 340 can all apply high voltage to two electrodes.That is, internal electrode 331 and external electrical In pole 333, can apply to certain side high voltage (±), by opposite side ground connection, or internal electrode 331 With in outer electrode 333 during certain side applying+electrode ,-electrode can be applied to opposite side.
Further, internal electrode 331 and outer electrode 333 are the conductive material comprising metal, can be by anti-corrosion Aluminum (Al) that property is stronger, rustless steel (STS), titanium (Ti), nickel (Ni), chromium (Cr), copper (Cu), a certain material in tungsten (W), platinum (Pt) or its alloy and formed.Preferably, Kazakhstan (Hastelloy) alloy with the preferable nickel of processability and corrosion resistance as main component can be suitable for.
Pottery i.e. MgO, the Al of the oxide series that the applicable dielectric constant of electrolyte 332 is higher2O3、 TiO2、SiO2In a certain material.
Can be applied by thermal spraying, to electricity with the electrode surface of the outer electrode 333 of loop shape formation The outside insertion of medium 332 is installed.Further, it is inserted in outside the outer electrode of electrolyte 332 335 to be situated between with electricity Outside matter, 334 formation are identical highly configures.
As above-mentioned, outer electrode 333 surface is applied by thermal spraying, and makes outside outer electrode 335 Highly configure with outside electrolyte, 334 formation are identical such that it is able to prevent between dust adhesion electrode, Further, it is possible to the heating of the gap generation solved between electrolyte 332 and electrode or the problem of electric arc.
Plasma oxidation portion 330 can embody with all size according to user, preferred according to the present invention The size of internal electrode 331, be 1.5m from one end to the height of the other end, one end of electrolyte 332 is extremely The height of the other end is 1.2m.Further, one end started from coil of the outer electrode 333 of loop shape The height of the other end to coil end is 0.95m.Coil and the thickness of electrolyte 332, as shown in Figure 4, It is respectively 2mm and 7mm.
Utilize this type of coil form electrode structure dielectric barrier discharge (Dielectric Barrier Discharge, DBD) plasma device, the electric field occurred between electrodes at applying altofrequency, high voltage (Electric field), is additionally formed by Faraday's law of induction (Faraday's Law of Induction) Induction field, and make the intensity maximum of electric field, thus, significantly reduce power consumption, and produce The plasma of good characteristic.
As above-mentioned, according to the plasma oxidation portion 330 of the present invention, utilize dielectric barrier discharge plasma Body generation plasma, is occurred by this type of plasma, by O2It is transformed to O3, by interface channel 328 O is discharged to main discharge 3273.The O discharged to main discharge 327 as described above3To at main discharge 327 The internal polluter existed carries out aoxidizing and ionizing process.Such as, NO with CO oxidation processes is become NO2And CO2, THC is oxidized and ionizing, HF or dust are by coarsening.
Thus, by from according to the present invention plasma oxidation portion 330 occur plasma, to In plasma oxynitride emission reduction device 300 combustion process occur nitrogen oxides with pass through plasma The O that body electric discharge occurs3Carry out oxidation reaction process, thus, enabling plasma oxynitride reduces discharging The nitrogen oxides form of the final outlet of device 300 is with NO2Limit and discharge.
Nitrogen oxides is as follows by the reaction mechanism of the above-mentioned oxidized process in plasma oxidation portion 330.
NO+O3=> NO2-+O2
By the oxidized process in plasma oxidation portion 330, by main discharge 327 with NO2The nitrogen discharged Oxide, as it is shown in figure 1, logical in the subsequent treatment process i.e. wet processed technique of wet scrubber 400 Cross reduction reaction to be eventually processed.Further, wet scrubber 400 in addition to nitric oxides, also processes At the absorption of the ionized THC of pretreatment process, the remaining O of pretreatment process3Reduction, HF etc..
The dominant response mechanism being carried out reduction treatment by above-mentioned wet scrubber 400 is as follows.
NO2+(Na2S+ α)=N2+Na2SO4
As described above, by by means of the oxidizing process in plasma oxidation portion 330 and wet scrubber 400 Reduction process, it is possible in the combustion process in plasma nitrogen oxides emission reduction device 300 occur Nitrogen oxides processes effectively.
<experimental example 1>
In order to evaluate the nitrogen oxides treatment performance of the equipment in the plasma oxidation portion being provided with the present invention, Carry out nitrogen oxides and be converted into NO by the plasma discharge in this plasma oxidation portion2Conversion effect Rate is tested.
The testing data that the equipment in the Tables 1 and 2 plasma oxidation portion to being provided with the present invention is carried out.
According to the condition of this experimental example 1, by the plasma O of oxidation stage (Stage)3Concentration is set as 40ppm, is set as 2CMM by benchmark air quantity.Superficial linear velocity in a column 1m/s, during holdup time 2sec condition, The NO of nitrogen oxides during plasma OFF and during plasma ON2Conversion efficiency is as shown in table 1, root According to the time, the oxygenation efficiency experimental result of change is as shown in table 2.
[table 1]
Plasma OFF (ppm) Plasma ON (ppm) Efficiency
NO 45 NO 7 84%
NO2 22 NO2 55
NOx 67 NOx 62
O3 40 O3 1.4
[table 2]
Understood by Tables 1 and 2 and be effectively converted into NO by the energy nitrogen oxides of applying plasma2。 <experimental example 2>
At experimental example 2, aoxidize to evaluate the nitrogen of the equipment in the plasma oxidation portion being provided with the present invention Thing process performance, has carried out after starting 80 minutes continuously, and nitrogen oxides passes through this plasma oxidation portion Plasma discharge be converted into NO2Conversion efficiency test.
Table 3 to table 6 is the experimental example 2 that the equipment to the plasma oxidation portion being provided with the present invention is carried out Testing data.
According to the condition of this experimental example 2, identically with the condition of experimental example 1 by the plasma of oxidation stage O3Concentration is set as that 40ppm, benchmark air quantity are set as 2CMM, and, superficial linear velocity in a column is set as 1m/s, The change holdup time, detected with the method identical with experimental example 1.
<table 3>
<table 4>
<table 5>
<table 6>
As shown in table 3 to table 6, can confirm that all have more than 95% from the measurement result of holdup time 0.5～2sec Treatment effeciency.
As described above, plasma oxynitride emission reduction device 300, the combustion of burn processing waste gas will be used for Burning portion 310, receive the gas of burn processing from combustion section 310 and carry out the wet processed portion of wet processed 320 and put into plasma to process the nitrogen oxides comprised in the gas by wet processed portion 320 The plasma oxidation portion 330 of bromhidrosis body is together configured in shell 301, thus, it is possible at plasma The final outlet of nitrogen oxides emission reduction device 300 makes nitrogen oxides form with NO2Limit and discharge.Further, Without adding other equipment, the medium resistance in the plasma oxidation portion 330 that release is formed by coil form electrode Gear discharge plasma, processes nitrogen oxides, thus, it is possible to save the energy to supply of equipment.
Further, disclosed embodiments of the invention are intended merely to contribute to understanding in the present description and drawings And pointed out particular case, and and non-limiting the scope of the present invention.The those skilled in the art of the present invention It is to be understood that in addition to embodiment provided herein, also can implement its of technological thought based on the present invention His variation.

Claims (10)

1. an energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device, as processing waste gas Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device, it is characterised in that including:
Combustion section, carries out burn processing for described waste gas；
Wet processed portion, receives the gas of burn processing, carries out wet processed from described combustion section；
Plasma oxidation portion, puts into for processing the nitrogen comprised in the gas by described wet processed portion The plasma gas of oxide.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging dress Put, it is characterised in that
Also include shell,
Further, described combustion section, described wet processed portion and described plasma oxidation portion are configured at described In shell.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 2 reduces discharging dress Put, it is characterised in that
Also including main discharge, it is for the described nitrogen oxygen that will carry out processing by described plasma gas Compound is discharged to described housing exterior,
Further, described plasma oxidation portion in described shell be connected to the connection of described main discharge Passage connects to be installed.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging dress Put, it is characterised in that
Described plasma gas is to be generated by the plasma discharge in described plasma oxidation portion O3Gas.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 4 reduces discharging dress Put, it is characterised in that
Described nitrogen oxides and the O generated from described plasma oxidation portion3Produce oxidation reaction, be transformed to NO2。
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 5 reduces discharging dress Put, it is characterised in that
The NO of described conversion2The wet processed technique of subsequent treatment process is located by reduction reaction Reason.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging dress Put, it is characterised in that
Described plasma oxidation portion, including:
Internal electrode, it is rod shape；
Electrolyte, it is around described internal electrode；And
Outer electrode, its outside described electrolyte with loop shape insert install,
Further, it is applied for producing the alternating current of plasma to described internal electrode and described outer electrode Source.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 7 reduces discharging dress Put, it is characterised in that
Described external electrode surface is applied by thermal spraying.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 7 reduces discharging dress Put, it is characterised in that
Identical height is formed with outside described outer electrode outside described electrolyte.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging Device, it is characterised in that
Described plasma oxidation portion utilizes dielectric barrier discharge plasma to produce plasma.
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