CN109326737A - Display base plate and preparation method thereof and display device - Google Patents
Display base plate and preparation method thereof and display device Download PDFInfo
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- CN109326737A CN109326737A CN201811099852.5A CN201811099852A CN109326737A CN 109326737 A CN109326737 A CN 109326737A CN 201811099852 A CN201811099852 A CN 201811099852A CN 109326737 A CN109326737 A CN 109326737A
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- base plate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
- H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Engineering & Computer Science (AREA)
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- Electroluminescent Light Sources (AREA)
Abstract
The present invention provides a kind of display base plate and preparation method thereof and display device, wherein the display base plate is equipped at least one accommodation space, is provided with hygroscopic material in the accommodation space including the buffer layer being located on underlay substrate in the buffer layer.Display base plate provided by the invention and preparation method thereof and display device are able to extend the service life of display device.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of display base plate and preparation method thereof and display devices.
Background technique
With the development of display technology, as important display technology a kind of in display field, Organic Light Emitting Diode
(Organic Light-Emitting Diode, OLED) technology is also being grown rapidly.Also, OLED has high comparison with it
Degree, big colour gamut and the features such as flexible foldable, can better meet the individual demand of consumer, in Consumer groups by
To widely applying.
In the prior art, OLED device is more sensitive to water oxygen, if water oxygen invades OLED device, will lead to OLED device
The lost of life.
Summary of the invention
The embodiment of the present invention provides a kind of display base plate and preparation method thereof and display device, to solve water oxygen intrusion
OLED device, the problem of leading to the lost of life of OLED device
It is as follows that in order to solve the above technical problem, the present invention provides technical solutions:
In a first aspect, the embodiment of the present invention provides a kind of display base plate, it is described including the buffer layer being located on underlay substrate
It is equipped at least one accommodation space in buffer layer, is provided with hygroscopic material in the accommodation space.
Further, the buffer layer includes the organic layer and at least one water blocking layer being stacked, the water blocking layer packet
The first inorganic layer of organic layer described in covering part is included, the surface of first inorganic layer offers at least one holding tank, institute
It states and is equipped with hygroscopic material in holding tank, the water blocking layer further includes the second inorganic layer, and second inorganic layer covers the moisture absorption
Material, first inorganic layer and the remaining organic layer.
Further, the buffer layer includes at least two water blocking layers, and the hygroscopic material of adjacent water blocking layer is in the substrate
Orthographic projection on substrate is not overlapped.
Further, the underlay substrate is flexible substrate substrate.
Further, one third of the thickness of the hygroscopic material no more than the thickness of first inorganic layer.
Further, the quantity of the holding tank is multiple, and multiple holding tanks are intervally arranged.
Further, organic layer is equipped between adjacent water blocking layer.
Second aspect, the embodiment of the present invention also provide a kind of display device, including display base plate as described above.
The third aspect, the embodiment of the present invention also provide a kind of production method of display base plate, comprising:
Underlay substrate is provided；
Buffer layer is formed on underlay substrate, is equipped at least one accommodation space, the accommodation space in the buffer layer
Inside it is provided with hygroscopic material.
It is further, described the step of forming buffer layer on underlay substrate, comprising:
Organic layer is formed on the underlay substrate, and forms the first inorganic layer on the organic layer of part；
At least one holding tank is formed on the surface of first inorganic layer by etching technics, and in the holding tank
Hygroscopic material is added；
The second inorganic layer is formed on first inorganic layer and the organic layer, second inorganic layer covers the suction
Wet stock, first inorganic layer and the remaining organic layer.
In technical solution provided by the invention, buffer layer is set between underlay substrate and OLED device, by buffering
Hygroscopic material is added in layer, water oxygen is stopped by buffer layer, and aqueous vapor is further absorbed by hygroscopic material, buffer layer can be enhanced
To the barrier property of water oxygen, prevent water oxygen from invading OLED device, to extend the service life of OLED device.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, needed in being described below to the embodiment of the present invention
Attached drawing to be used is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention,
For those of ordinary skill in the art, without any creative labor, it can also obtain according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the schematic diagram for the display base plate that water oxygen enters the prior art；
Fig. 2 is the current diagram after the OLED device of the display base plate of the prior art is invaded by water oxygen；
Fig. 3 is the schematic diagram of the buffer layer for the display base plate that one embodiment of the invention provides；
Fig. 4 be another embodiment of the present invention provides one of the schematic diagram of buffer layer of display base plate；
Fig. 5 be another embodiment of the present invention provides display base plate buffer layer schematic diagram two.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are some of the embodiments of the present invention, instead of all the embodiments.Based on this hair
Embodiment in bright, every other implementation obtained by those of ordinary skill in the art without making creative efforts
Example, shall fall within the protection scope of the present invention.
In the prior art, water oxygen enters display base plate 100, once as shown in Figure 1, water oxygen penetrates underlay substrate and buffer layer
OLED device is invaded, will cause the OLED device lost of life, thus the problem of display device reduced service life.
The embodiment of the present invention is in view of the above-mentioned problems, provide a kind of display base plate and preparation method thereof and display device, energy
Enough barrier water oxygens invade OLED device, to extend the service life of OLED device and display device.
The embodiment of the present invention provides a kind of display base plate, including the buffer layer being located on underlay substrate, in the buffer layer
Equipped at least one accommodation space, hygroscopic material is provided in the accommodation space.
In the present embodiment, buffer layer is set between underlay substrate and OLED device, by adding moisture absorption in buffer layer
Material stops water oxygen by buffer layer, and further absorbs aqueous vapor by hygroscopic material, can enhance barrier of the buffer layer to water oxygen
Performance prevents water oxygen from invading OLED device, to extend the service life of OLED device.
Above-mentioned display base plate can be flexible display substrates, be also possible to rigid display base plate.It is flexibility in display base plate
When display base plate, underlay substrate uses flexible substrate substrate, such as Kapton；It is rigid display base plate in display base plate
When, underlay substrate uses rigid substrate substrate, such as quartz base plate or glass substrate.
The forming method of above-mentioned buffer layer include but is not limited to chemical vapor deposition (such as: PECVD) or physical vapor
Deposition, and thickness for buffer layer and the number of plies embodiment of the present invention are without limitation.
Above-mentioned hygroscopic material can be solid-state form, such as: solid powdery, can select at this time silica gel, titanium dioxide,
The materials such as aluminium oxide and calcium oxide.
In addition, display base plate is including underlay substrate and except the buffer layer on the underlay substrate, underlay substrate
On also may include or do not include at least one layer in barrier layer, gate insulating layer and interlayer insulating film.
Optionally, as shown in figure 3, the buffer layer 300 includes the organic layer 310 and at least one water blocking layer being stacked
320, the water blocking layer 320 includes the first inorganic layer 321 of organic layer 310 described in covering part, first inorganic layer 321
Surface offers at least one holding tank, is equipped with hygroscopic material 322 in the holding tank, the water blocking layer 320 further includes second
Inorganic layer 323, second inorganic layer 323 cover the hygroscopic material 322, first inorganic layer 321 and remaining described
Organic layer 310.
Wherein, organic layer 310 can be formed on underlay substrate by way of coating, and organic layer 310 has certain journey
The water preventing ability of degree, the material of organic layer 310 include but is not limited to polyimides, polyacrylate or polyethylene.
First inorganic layer 321 can pass through vapour deposition process (the Plasma Enhanced of plasma enhanced chemical
Chemical Vapor Deposition, abbreviation PECVD) it is formed on the organic layer 310 of part, the first inorganic layer 321 tool
Play the role of stopping oxygen infiltration.The material of first inorganic layer 321 includes but is not limited to silica and silica.Forming the
After one inorganic layer 321, at least one holding tank is formed on the surface of the first inorganic layer 321 by etching technics, then by hygroscopic material
Material 322 is added in holding tank, wherein the mode in specific addition hygroscopic material 322 to holding tank can be a variety of, example
Such as: can be added in holding tank by the method for physical deposition in the case where hygroscopic material 322 is solid situation.
The mode of etching can use dry carving technology, can also use wet-etching technique, due to dry carving technology accuracy and
Isotropic etching effect is better than wet-etching technique, is performed etching using dry carving technology to the first inorganic layer 321 in the present embodiment, shape
At at least one holding tank.
Hygroscopic material 322 can absorb a certain range of aqueous vapor in holding tank, set on the surface of the first inorganic layer 321
The holding tank set is more, and the water preventing ability of water blocking layer 320 is better.
Second inorganic layer 323 again may be by PECVD in the first inorganic layer 321, hygroscopic material 322 and remaining organic
It is formed on layer 310, the second inorganic layer 323 improves blocking water for buffer layer 300 to covering around the first inorganic layer 321
Property, while the second inorganic layer 323 itself also has the function of stopping oxygen infiltration.The material of second inorganic layer 323 includes but not
It is limited to silicon nitride and silicon oxynitride.
In addition, the second inorganic layer 323 can also keep the flat of water blocking layer 320, as described in Figure 3, the second inorganic layer 323 covers
The part not covered by the first inorganic layer 321 on the first inorganic layer of lid 321, hygroscopic material 322 and organic layer 310, thus with
First inorganic layer 321, hygroscopic material 322 and the second inorganic layer 323 collectively form the water blocking layer 320 of thickness equalization, it is ensured that display
The planarization of the layer structure of substrate.
In the present embodiment, by opening up at least one holding tank on the first inorganic layer 321, adds and inhale into the holding tank
After wet stock 322, then by the second inorganic layer 323 covering holding tank, accommodation space is opened up in buffer layer 300 simultaneously to realize
Hygroscopic material 322 is set into the accommodation space.The structure of buffer layer 300 is simple, and water oxygen can be stopped through buffer layer 300
OLED device is invaded, therefore, the buffer layer 300 in the present embodiment is able to extend the service life of OLED device.
Further, the buffer layer 300 includes at least two water blocking layers 320, the hygroscopic material of adjacent water blocking layer 320
322 orthographic projection on the underlay substrate is not overlapped.
Buffer layer 300 may include two water blocking layers 320, as shown in figure 4, the structure of each water blocking layer 320 and upper one is in fact
The structure for applying water blocking layer in example is identical, and beneficial effect having the same, repeats no more again.And the suction of two water blocking layers 320
Orthographic projection of the wet stock 322 on underlay substrate is not overlapped, i.e., the hygroscopic material 322 in the water blocking layer 320 on upper layer can
It absorbs from the aqueous vapor penetrated in gap between two hygroscopic materials 322 in the water blocking layer 320 of lower layer, to further enhance slow
The block-water performance for rushing layer 300 extends the service life of OLED device.
Buffer layer 300 also may include three water blocking layers 320, as shown in figure 5, the structure of each water blocking layer 320 and upper one
The structure of water blocking layer is identical in embodiment, and beneficial effect having the same, repeats no more again.And two neighboring water blocking layer
Orthographic projection of 320 hygroscopic material 322 on underlay substrate is not overlapped, i.e., in a water blocking layer 320 in adjacent water blocking layer
Hygroscopic material 322 can absorb the aqueous vapor penetrated in gap between two hygroscopic materials 322 from another water blocking layer 320,
To further enhance the block-water performance of buffer layer 300, extend the service life of OLED device.
Wherein, in the hygroscopic material 322 of adjacent water blocking layer 320 in the case where the orthographic projection on underlay substrate is not overlapped,
Orthographic projection of the hygroscopic material 322 of adjacent water blocking layer 320 on underlay substrate can also cover underlay substrate, can prevent in this way
Permeable access is formed in two neighboring water blocking layer 320, is enhanced the block-water performance of buffer layer 300, is extended the use of OLED device
Service life.
In the present embodiment, water oxygen is stopped to invade OLED device by multiple water blocking layers 320, wherein in adjacent water blocking layer
Hygroscopic material 322 in one water blocking layer 320 can absorb between two hygroscopic materials 322 from another water blocking layer 320
The aqueous vapor penetrated in gap extends the service life of OLED device to further enhance the block-water performance of buffer layer 300.
Optionally, in the case where underlay substrate is flexible substrate substrate, the thickness of the hygroscopic material 322 is not more than institute
State the one third of the thickness of the first inorganic layer 321.
The thickness of hygroscopic material 322 is bigger, and the water preventing ability of buffer layer 300 is better, but since flexible substrate substrate makes
With that may bend in the process, hygroscopic material 322 can crack in the process of bending at this time, and aqueous vapor can be invaded through crackle
OLED device.Therefore, by by the thickness design of hygroscopic material 322 be no more than first inorganic layer 321 thickness three
/ mono-, it can be ensured that hygroscopic material 322 will not crack display base plate in the process of bending, and water vapo r transmission crackle is avoided to invade
Enter OLED device, so that it is guaranteed that the block-water performance of buffer layer 300.
Optionally, in the case where underlay substrate is flexible substrate substrate, the quantity of the holding tank is multiple, Duo Gerong
Slot of receiving is intervally arranged.
Since flexible substrate substrate may be bent in use, hygroscopic material 322 is in the process of bending at this time
Can crack, by by the quantitative design of holding tank be it is multiple, multiple holding tanks are intervally arranged, thus by main bending part
Switch to the part between multiple holding tanks, reduces the bending degree of hygroscopic material 322 in holding tank, thereby reduce hygroscopic material
The probability of slight crack is generated when 322 bending of material.Multiple holding tanks can increase the water suction range of hygroscopic material 322 simultaneously, to increase
The block-water performance of strong buffer layer 300, extends the service life of OLED device.
Optionally, in the case where underlay substrate is flexible substrate substrate, organic layer is equipped between adjacent water blocking layer 320
310。
Since flexible substrate substrate may be bent in use, and it is curved as the water blocking layer of inorganic 320
Folding endurance is lower, therefore by adding the higher organic layer 310 of bending between adjacent water blocking layer, can enhance buffer layer
300 bending performance avoids causing slight crack in bending process on water blocking layer 320 and water vapo r transmission crackle being made to invade OLED device
Part, it is ensured that the block-water performance of buffer layer 300 extends the service life of OLED device.
The embodiment of the invention also provides a kind of display devices, including display base plate as described above.The display device
It can be with are as follows: any product having a display function such as TV, display, Digital Frame, mobile phone, tablet computer, navigator or portion
Part, wherein the display device further includes flexible circuit board, printed circuit board and backboard.
The present invention also provides a kind of production methods of display base plate, comprising:
Underlay substrate is provided；
Buffer layer is formed on underlay substrate, is equipped at least one accommodation space, the accommodation space in the buffer layer
Inside it is provided with hygroscopic material.
In the present embodiment, buffer layer is set between underlay substrate and OLED device, by adding moisture absorption in buffer layer
Material stops water oxygen by buffer layer, and further absorbs aqueous vapor by hygroscopic material, can enhance barrier of the buffer layer to water oxygen
Performance prevents water oxygen from invading OLED device, to extend the service life of OLED device.
Above-mentioned display base plate can be flexible display substrates, be also possible to rigid display base plate.It is flexibility in display base plate
When display base plate, underlay substrate uses flexible substrate substrate, such as Kapton；It is rigid display base plate in display base plate
When, underlay substrate uses rigid substrate substrate, such as quartz base plate or glass substrate.
The forming method of above-mentioned buffer layer include but is not limited to chemical vapor deposition (such as: PECVD) or physical vapor
Deposition, and thickness for buffer layer and the number of plies embodiment of the present invention are without limitation.
Above-mentioned hygroscopic material can be solid-state form, such as: solid powdery can select silica gel and calcium chloride etc. at this time
Material.
In addition, display base plate is including underlay substrate and except the buffer layer on the underlay substrate, underlay substrate
On also may include or do not include at least one layer in barrier layer, gate insulating layer and interlayer insulating film.
It is described the step of forming buffer layer on underlay substrate in an optional embodiment, comprising:
Organic layer is formed on the underlay substrate, and forms the first inorganic layer on the organic layer of part；
At least one holding tank is formed on the surface of first inorganic layer by etching technics, and in the holding tank
Hygroscopic material is added；
The second inorganic layer is formed on first inorganic layer and the organic layer, second inorganic layer covers the suction
Wet stock, first inorganic layer and the remaining organic layer.
Wherein, organic layer can be formed on underlay substrate by way of coating, and organic layer has a degree of resistance
Aqueous, the material of organic layer includes but is not limited to polyimides, polyacrylate or polyethylene.
First inorganic layer can be formed on the organic layer of part by PECVD, and the first inorganic layer 321, which has, stops oxygen
The effect of impervious.The material of first inorganic layer includes but is not limited to silica and silica.After forming the first inorganic layer,
At least one holding tank is formed on the surface of the first inorganic layer by etching technics, then hygroscopic material is added in holding tank,
Wherein, the mode specifically in addition hygroscopic material to holding tank can be a variety of, such as: the case where hygroscopic material is solid-state
It can be added in holding tank by the method for physical deposition down.
Above-mentioned etching technics can use dry carving technology, can also use wet-etching technique, accurate due to dry carving technology
Property and isotropic etching effect be better than wet-etching technique, the first inorganic layer is performed etching using dry carving technology in the present embodiment,
Form at least one holding tank.
Hygroscopic material can absorb a certain range of aqueous vapor in holding tank, in the appearance that the surface of the first inorganic layer is arranged
Slot of receiving is more, and the water preventing ability of water blocking layer is better.
Second inorganic layer again may be by PECVD and be formed on the first inorganic layer, hygroscopic material and remaining organic layer,
Second inorganic layer improves the water preventing ability of buffer layer, while second inorganic layer itself to covering around the first inorganic layer
Also have the function of stopping oxygen infiltration.The material of second inorganic layer includes but is not limited to silicon nitride and silicon oxynitride.
In addition, the second inorganic layer can also keep the flat of water blocking layer, as described in Figure 3, the second inorganic layer covers the first nothing
On machine layer, hygroscopic material and organic layer not by the first inorganic layer cover part, thus with the first inorganic layer, hygroscopic material and
Second inorganic layer collectively forms the water blocking layer of thickness equalization, it is ensured that the planarization of the layer structure of display base plate.
In the present embodiment, by opening up at least one holding tank on the first inorganic layer, moisture absorption is added into the holding tank
After material, then the holding tank covered by the second inorganic layer, opens up accommodation space in buffer layer and to receiving sky to realize
Interior setting hygroscopic material, the production process of buffer layer is simple, and water oxygen can be stopped to invade OLED device through buffer layer, because
This, the buffer layer in the present embodiment is able to extend the service life of OLED device.
Unless otherwise defined, the technical term or scientific term that the disclosure uses should be tool in fields of the present invention
The ordinary meaning for thering is the personage of general technical ability to be understood." first ", " second " used in the disclosure and similar word are simultaneously
Any sequence, quantity or importance are not indicated, and are used only to distinguish different component parts." comprising " or "comprising" etc.
Similar word means that the element or object before the word occur covers the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or mechanical connection, but may include electrical connection, it is either direct or indirectly."upper", "lower",
"left", "right" etc. is only used for indicating relative positional relationship, and after the absolute position for being described object changes, then the relative position is closed
System may also correspondingly change.
It is appreciated that ought such as layer, film, region or substrate etc element be referred to as be located at another element "above" or "below"
When, which " direct " can be located at "above" or "below" another element, or may exist intermediary element.
The embodiment of the present invention is described with above attached drawing, but the invention is not limited to above-mentioned specific
Embodiment, the above mentioned embodiment is only schematical, rather than restrictive, those skilled in the art
Under the inspiration of the present invention, without breaking away from the scope protected by the purposes and claims of the present invention, it can also make very much
Form belongs within protection of the invention.
Claims (10)
1. a kind of display base plate, which is characterized in that including the buffer layer being located on underlay substrate, be equipped at least in the buffer layer
One accommodation space is provided with hygroscopic material in the accommodation space.
2. display base plate according to claim 1, which is characterized in that the buffer layer include the organic layer that is stacked and
At least one water blocking layer, the water blocking layer include the first inorganic layer of organic layer described in covering part, first inorganic layer
Surface offers at least one holding tank, is equipped with hygroscopic material in the holding tank, and the water blocking layer further includes the second inorganic layer,
Second inorganic layer covers the hygroscopic material, first inorganic layer and the remaining organic layer.
3. display base plate according to claim 2, which is characterized in that the buffer layer includes at least two water blocking layers, phase
Orthographic projection of the hygroscopic material of adjacent water blocking layer on the underlay substrate is not overlapped.
4. display base plate according to claim 3, which is characterized in that the underlay substrate is flexible substrate substrate.
5. display base plate according to claim 4, which is characterized in that the thickness of the hygroscopic material is not more than described first
The one third of the thickness of inorganic layer.
6. display base plate according to claim 4, which is characterized in that the quantity of the holding tank is multiple, multiple receivings
Slot is intervally arranged.
7. display base plate according to claim 4, which is characterized in that be equipped with organic layer between adjacent water blocking layer.
8. a kind of display device, which is characterized in that including display base plate such as of any of claims 1-7.
9. a kind of production method of display base plate characterized by comprising
Underlay substrate is provided；
Buffer layer is formed on underlay substrate, at least one accommodation space is equipped in the buffer layer, is set in the accommodation space
It is equipped with hygroscopic material.
10. the production method of display base plate according to claim 9, which is characterized in that described to be formed on underlay substrate
The step of buffer layer, comprising:
Organic layer is formed on the underlay substrate, and forms the first inorganic layer on the organic layer of part；
At least one holding tank is formed on the surface of first inorganic layer by etching technics, and is added in the holding tank
Hygroscopic material；
The second inorganic layer is formed on first inorganic layer and the organic layer, second inorganic layer covers the hygroscopic material
Material, first inorganic layer and the remaining organic layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201811099852.5A CN109326737A (en) | 2018-09-20 | 2018-09-20 | Display base plate and preparation method thereof and display device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811099852.5A CN109326737A (en) | 2018-09-20 | 2018-09-20 | Display base plate and preparation method thereof and display device |
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| CN109326737A true CN109326737A (en) | 2019-02-12 |
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| CN201811099852.5A Pending CN109326737A (en) | 2018-09-20 | 2018-09-20 | Display base plate and preparation method thereof and display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110112312A (en) * | 2019-05-17 | 2019-08-09 | 武汉华星光电半导体显示技术有限公司 | Display panel and production method |
| CN111584745A (en) * | 2020-05-13 | 2020-08-25 | 深圳市华星光电半导体显示技术有限公司 | Display panel and method for manufacturing the same |
| CN111864118A (en) * | 2020-07-31 | 2020-10-30 | 京东方科技集团股份有限公司 | Display device, display panel and manufacturing method thereof |
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| CN111864118B (en) * | 2020-07-31 | 2024-04-05 | 京东方科技集团股份有限公司 | Display device, display panel and manufacturing method thereof |
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