CN109321920A - A kind of strip method aoxidizing plate - Google Patents
A kind of strip method aoxidizing plate Download PDFInfo
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- CN109321920A CN109321920A CN201811424792.XA CN201811424792A CN109321920A CN 109321920 A CN109321920 A CN 109321920A CN 201811424792 A CN201811424792 A CN 201811424792A CN 109321920 A CN109321920 A CN 109321920A
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- oxidation plate
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- 238000000034 method Methods 0.000 title claims abstract description 39
- 230000003647 oxidation Effects 0.000 claims abstract description 162
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 162
- 238000005530 etching Methods 0.000 claims abstract description 92
- 238000012360 testing method Methods 0.000 claims abstract description 29
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 21
- 238000004140 cleaning Methods 0.000 claims abstract description 17
- 238000005516 engineering process Methods 0.000 claims abstract description 16
- 238000006386 neutralization reaction Methods 0.000 claims abstract description 11
- 238000012545 processing Methods 0.000 claims abstract description 10
- 238000005488 sandblasting Methods 0.000 claims abstract description 7
- 239000007921 spray Substances 0.000 claims description 48
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 35
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 239000004411 aluminium Substances 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 6
- 238000005422 blasting Methods 0.000 claims description 4
- 238000011010 flushing procedure Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 abstract description 8
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000007747 plating Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The present invention relates to semiconductor processing technology fields.A kind of strip method aoxidizing plate, includes the following steps, step 1, carries out sandblasting striping to the plated film on oxidation plate；Step 2, at least three oxidation plates are chosen as test piece, it is tested: aoxidizing plate thickness using miking, then start first time alkaline etching, oxidation plate is put into level-one buck slot and takes out after 3-5 minutes, observes the plated film etching situation of test piece, it is put into after cleaning in nitric acid and 2-3 minutes, after neutralization, it is put into second level buck slot, alkaline etching observation plated film situation obtains the alkaline etching time again；Step 3 carries out the strip that plated film is realized in alkaline etching processing to oxidation plate.Using the above method, strip effect reaches and chromic acid peer-level.
Description
Technical field
The present invention relates to semiconductor processing technology fields, and in particular to strip method
Background technique
Usually need to strip plated film in the following two cases: (1) after being used for a long time, the coating of workpiece is
It is damaged or serious aging, needs to remove coating, again plating；(2) in production, the coating of institute's plating does not meet quality
It is required that save the cost needs to return coating to reduce loss, workpiece is allowed to do over again plated film again.
Decoating liquid poor, the serious object of pollution that contains the oxidisability strong security such as chromic acid, nitric acid in traditional withdrawal plating
Matter.At present because the original chromic acid strip of environmental requirement must stop, it being badly in need of a kind of strip side of substitution chromic acid progress strip at present
Method.
Summary of the invention
In view of the problems of the existing technology, the present invention provide it is a kind of aoxidize plate strip method, with solve it is above-mentioned at least
One technical problem.
The technical scheme is that a kind of strip method for aoxidizing plate, which is characterized in that include the following steps,
Step 1 carries out sandblasting striping to the plated film on oxidation plate；
Step 2 is chosen at least three without the oxidation plate used as test piece, is tested: using miking
Plate thickness is aoxidized, first time alkaline etching is then started, oxidation plate is put into level-one buck slot and takes out after 3-5 minutes, observes the plating of test piece
Film etches situation, is put into nitric acid after cleaning and 2-3 minute, after neutralization, is put into second level buck slot, again alkaline etching observation plated film feelings
Condition obtains the alkaline etching time；
Step 3 carries out the strip that plated film is realized in alkaline etching processing to oxidation plate；
Oxidation plate is the oxidation plate of true qualities oxidation technology or the preparation of hardening oxidation technique；
It is directed to the oxidation plate of true qualities oxidation technology preparation, hardness 280-320HV, steps are as follows for alkaline etching:
1) oxidation plate feeding is hung tight；
2) carry out first time alkaline etching, the alkaline etching time of time reference test piece, sling oxidation plate after be put into water flushed channel into
Row, which rinses, removes buck, rinses 3-5 seconds；
3) it is placed in rinsing bowl to clean and oxidation plate is being carried out by spray is cleaned with water spray when slinging within 3-5 seconds oxidation plate；
4) be put into nitric acid and neutralize, neutralize the neutralization time of time reference test piece, after be put into clean 3-5 seconds in rinsing bowl and hang
Oxidation plate is being carried out by spray is being cleaned with water spray when playing oxidation plate；
5) alkaline etching again again the time of the time reference test piece of alkaline etching alkaline etching again, observes oxidation plate alkaline etching feelings
Condition, it is ensured that after plated film removes, be put into water flushed channel and be rinsed and remove buck flushing 3-5 seconds；
6) it is placed on to clean 3-5 seconds in rinsing bowl again and oxidation plate is being carried out by spray is cleaned with water spray when slinging plate；
7) be put into nitric acid and neutralize 2-3 minutes, after be put into rinsing bowl and clean when slinging within 3-5 seconds oxidation plate with water spray
Spray cleaning is carried out to oxidation plate；
8) oxidation plate is dried；
It is directed to the oxidation plate of hardening oxidation technique preparation, hardness 480-520HV, steps are as follows for alkaline etching:
1) oxidation plate feeding is hung tight,
2) carry out first time alkaline etching, the alkaline etching time of time reference test piece, sling oxidation plate after be put into water flushed channel into
Row, which rinses, removes buck, rinses 3-5 seconds；
3) it is placed in rinsing bowl to clean and oxidation plate is being carried out by spray is cleaned with water spray when slinging within 3-5 seconds oxidation plate；
4) it is put into nitric acid and neutralizes after five minutes, be put into rinsing bowl and clean when slinging within 3-5 seconds oxidation plate with water spray pair
Oxidation plate carries out spray cleaning；
5) alkaline etching again again the time of the time reference test piece of alkaline etching alkaline etching again, observes oxidation plate alkaline etching feelings
Condition, it is ensured that plated film takes out after removing；
6) it is placed on to clean 3-5 seconds in rinsing bowl again and oxidation plate is being carried out by spray is cleaned with water spray when slinging plate；
7) it is put into nitric acid and neutralizes after five minutes, be put into rinsing bowl and clean when slinging within 3-5 seconds oxidation plate with water spray pair
Oxidation plate carries out spray cleaning；
8) oxidation plate is dried.
True qualities oxidation technology be made the plated film of oxidation plate with a thickness of 0.045-0.050mm, being handled by alkaline etching will oxidation
The thickness reduction of plate is controlled in 0.09mm-0.100mm；
Hardening oxidation technique be made the plated film of oxidation plate with a thickness of 0.050-0.060mm, being handled by alkaline etching will oxidation
The thickness reduction of plate is controlled in 0.1mm-0.120mm.
In step 3, the test piece of the time reference of the first time alkaline etching of oxidation plate is made as true qualities oxidation in true qualities oxidation technology
Oxidation plate is made in technique, and the test piece of the time reference of alkaline etching is that oxidation plate is made in true qualities oxidation technology again.
In step 3, the test piece that the time reference of the first time alkaline etching of oxidation plate is made in hardening oxidation technique is hardening oxidation
Oxidation plate is made in technique, and the test piece of the time reference of alkaline etching is that oxidation plate is made in hardening oxidation technique again.
In step 3, alkaline etching controls the thickness reduction for aoxidizing plate in setting range again；
The reduction setting range that the thickness of oxidation plate is made in true qualities oxidation technology is 0.09mm-0.100mm；
The reduction setting range that the thickness of oxidation plate is made in hardening oxidation technique is 0.1mm-0.120mm.
Using the above method, strip effect reaches and chromic acid peer-level.Using chromic acid to the substrate of oxidation plate before improving
Average loss with a thickness of 0.03mm, after improvement using alkaline etching to oxidation plate substrate average loss with a thickness of 0.007mm, it is whole
4.3 times of the body range of decrease.
Aoxidizing plate is the oxidation plate after aluminum substrate anodic oxidation.
The solution of the level-one alkaline bath is the sodium hydroxide solution of 20-30% concentration, and solution temperature is 50-60 DEG C.
The solution of the second level alkaline bath is the sodium hydroxide solution of 30-40% concentration, and solution temperature is 50-70 DEG C.
The concentration of the nitric acid of neutralization is 10-15%, and solution temperature is 20-30 DEG C.
The drying mode of oxidation plate is to air-dry or dry.
After step 3, several blocks of oxidation plates with a collection of alkaline etching processing are extracted, 2-4 point is chosen on each oxidation plate and carries out
Thickness measure, and in the alkaline etching database being stored into computer；
Alkaline etching database is also stored with the time of the time of first time alkaline etching, alkaline etching again.
Convenient for recording according to database to different alkaline etching time and effect, it is convenient for later period adjusting parameter.
In step 1, first to oxidation plate surface acetone wiped clean, the sandblasting of G220 essence, blasting pressure are then used
4.5-5 kilograms of pressure.
In step 3, when oxidation plate feeding hangs tight,
If hung using aluminium wire, aluminium wire secondary cannot be used；
If hanging oxidation plate using screw, it is necessary to ensure that medical fluid can penetrate into there are gap to screw hole and be corroded.
All treatment troughs that plate successively approach is aoxidized in step 3 include a groove body, are equipped in the groove body by groove body point
It is divided into cleaning chamber and repairs the partition of chamber；
The maintenance is intracavitary to be equipped with a motor, and the power output shaft of the motor protrudes into that cleaning is intracavitary, and the power is defeated
Shaft is connected with the partition by a sealing bearing.
This patent in treatment trough by being equipped with power output shaft, convenient for realizing fluid in groove body by power output shaft
Flowing, and then improve treatment effect, and due to using blade-free stir, effectively avoid the flow-disturbing of water body is excessive from asking
Topic.
Specific embodiment
The present invention is described further below.
The strip method for being directed to the oxidation plate (hardness 280-320HV) of true qualities oxidation technology is as follows:
A kind of strip method aoxidizing plate, includes the following steps,
Then step 1 is sprayed first to the oxidation plate surface acetone wiped clean of true qualities oxidation technology using G220 essence
Sand carries out sandblasting striping, 4.5-5 kilograms of pressure of blasting pressure to the plated film on oxidation plate.
Step 2 is chosen at least three without the oxidation plate used as test piece, is tested: using miking
Plate thickness is aoxidized, first time alkaline etching is then started, oxidation plate is put into level-one buck slot and takes out after 3-5 minutes, observes the plating of test piece
Film etches situation, is put into nitric acid after cleaning and 2-3 minute, after neutralization, is put into second level buck slot, again alkaline etching observation plated film feelings
Condition show the alkaline etching time that the reduction setting range that the thickness of oxidation plate is made in true qualities oxidation technology is 0.09mm-0.100mm；
Step 3 carries out the strip that plated film is realized in alkaline etching processing, and steps are as follows for alkaline etching:
1) oxidation plate feeding is hung tight；
If hung using aluminium wire, aluminium wire secondary cannot be used；If use screw hang oxidation plate, it is necessary to screw hole there are
Gap ensures that medical fluid can penetrate into and is corroded.
2) carry out first time alkaline etching, the alkaline etching time of time reference test piece, sling oxidation plate after be put into water flushed channel into
Row, which rinses, removes buck, rinses 3-5 seconds；
3) it is placed in rinsing bowl to clean and oxidation plate is being carried out by spray is cleaned with water spray when slinging within 3-5 seconds oxidation plate；
4) be put into nitric acid and neutralize, neutralize the neutralization time of time reference test piece, after be put into clean 3-5 seconds in rinsing bowl and hang
Oxidation plate is being carried out by spray is being cleaned with water spray when playing oxidation plate；
5) alkaline etching again again the time of the time reference test piece of alkaline etching alkaline etching again, observes oxidation plate alkaline etching feelings
Condition, it is ensured that after plated film removes, be put into water flushed channel and be rinsed and remove buck flushing 3-5 seconds；
6) it is placed on to clean 3-5 seconds in rinsing bowl again and oxidation plate is being carried out by spray is cleaned with water spray when slinging plate；
7) be put into nitric acid and neutralize 2-3 minutes, after be put into rinsing bowl and clean when slinging within 3-5 seconds oxidation plate with water spray
Spray cleaning is carried out to oxidation plate；
8) oxidation plate is air-dried or is dried and be dried.
True qualities oxidation technology be made the plated film of oxidation plate with a thickness of 0.045-0.050mm, being handled by alkaline etching will oxidation
The thickness reduction of plate is controlled in 0.09mm-0.100mm.
The strip method for being directed to the oxidation plate (hardness 480-520HV) of hardening oxidation technique is as follows:
A kind of strip method aoxidizing plate, includes the following steps,
Then step 1 is sprayed first to the oxidation plate surface acetone wiped clean of hardening oxidation technique using G220 essence
Sand carries out sandblasting striping, 4.5-5 kilograms of pressure of blasting pressure to the plated film on oxidation plate.
Step 2 is chosen at least three without the oxidation plate used as test piece, is tested: using miking
Plate thickness is aoxidized, first time alkaline etching is then started, oxidation plate is put into level-one buck slot and takes out after 3-5 minutes, observes the plating of test piece
Film etches situation, is put into nitric acid after cleaning and 2-3 minute, after neutralization, is put into second level buck slot, again alkaline etching observation plated film feelings
Condition show the alkaline etching time that the reduction setting range that the thickness of oxidation plate is made in hardening oxidation technique is 0.1mm-0.120mm；
Step 3 carries out the strip that plated film is realized in alkaline etching processing, and steps are as follows for alkaline etching:
1) oxidation plate feeding is hung tight,
If hung using aluminium wire, aluminium wire secondary cannot be used；If use screw hang oxidation plate, it is necessary to screw hole there are
Gap ensures that medical fluid can penetrate into and is corroded.
2) carry out first time alkaline etching, the alkaline etching time of time reference test piece, sling oxidation plate after be put into water flushed channel into
Row, which rinses, removes buck, rinses 3-5 seconds；
3) it is placed in rinsing bowl to clean and oxidation plate is being carried out by spray is cleaned with water spray when slinging within 3-5 seconds oxidation plate；
4) it is put into nitric acid and neutralizes after five minutes, be put into rinsing bowl and clean when slinging within 3-5 seconds oxidation plate with water spray pair
Oxidation plate carries out spray cleaning；
5) alkaline etching again again the time of the time reference test piece of alkaline etching alkaline etching again, observes oxidation plate alkaline etching feelings
Condition, it is ensured that plated film takes out after removing；
6) it is placed on to clean 3-5 seconds in rinsing bowl again and oxidation plate is being carried out by spray is cleaned with water spray when slinging plate；
7) it is put into nitric acid and neutralizes after five minutes, be put into rinsing bowl and clean when slinging within 3-5 seconds oxidation plate with water spray pair
Oxidation plate carries out spray cleaning；
8) oxidation plate is air-dried or is dried and be dried.
Hardening oxidation technique be made the plated film of oxidation plate with a thickness of 0.050-0.060mm, being handled by alkaline etching will oxidation
The thickness reduction of plate is controlled in 0.1mm-0.120mm.
Using the above method, strip effect reaches and chromic acid peer-level.Using chromic acid to the substrate of oxidation plate before improving
Average loss with a thickness of 0.03mm, after improvement using alkaline etching to oxidation plate substrate average loss with a thickness of 0.007mm, it is whole
4.3 times of the body range of decrease.
After step 3, several blocks of oxidation plates with a collection of alkaline etching processing are extracted, 2-4 point is chosen on each oxidation plate and carries out
Thickness measure, and in the alkaline etching database being stored into computer；
Alkaline etching database is also stored with the time of the time of first time alkaline etching, alkaline etching again.
Convenient for recording according to database to different alkaline etching time and effect, it is convenient for later period adjusting parameter.
The solution of level-one alkaline bath is the sodium hydroxide solution of 20-30% concentration, and solution temperature is 50-60 DEG C.
The solution of second level alkaline bath is the sodium hydroxide solution of 30-40% concentration, and solution temperature is 50-70 DEG C.
The concentration of the nitric acid of neutralization is 10-15%, and solution temperature is 20-30 DEG C.
All treatment troughs that plate successively approach is aoxidized in step 3 include a groove body, are equipped in the groove body by groove body point
It is divided into cleaning chamber and repairs the partition of chamber；The maintenance is intracavitary to be equipped with a motor, and the power output shaft of the motor protrudes into
Clean intracavitary, the power output shaft and the partition are connected by a sealing bearing.This patent in treatment trough by installing
Dynamic output shaft convenient for realizing the flowing of fluid in groove body by power output shaft, and then improves treatment effect, and due to adopting
It is stirred with blade-free, the problem for effectively avoiding the flow-disturbing of water body excessive.
The above is only the preferred embodiment of the present invention, it is noted that those skilled in the art are come
It says, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should be regarded as
Protection scope of the present invention.
Claims (9)
1. a kind of strip method for aoxidizing plate, which is characterized in that include the following steps,
Step 1 carries out sandblasting striping to the plated film on oxidation plate；
Step 2 is chosen at least three without the oxidation plate used as test piece, is tested: being aoxidized using miking
Then plate thickness starts first time alkaline etching, oxidation plate is put into level-one buck slot and takes out after 3-5 minutes, and the plated film for observing test piece is carved
Situation is lost, is put into after cleaning in nitric acid and 2-3 minute, after neutralization, is put into second level buck slot, alkaline etching is observed plated film situation and obtained again
The alkaline etching time out；
Step 3 carries out the strip that plated film is realized in alkaline etching processing to oxidation plate；
Oxidation plate is the oxidation plate of true qualities oxidation technology or the preparation of hardening oxidation technique；
It is directed to the oxidation plate of true qualities oxidation technology preparation, hardness 280-320HV, steps are as follows for alkaline etching:
1) oxidation plate feeding is hung tight；
2) carry out first time alkaline etching, the alkaline etching time of time reference test piece slings and water flushed channel is put into and rushed after oxidation plate
Buck is washed away, is rinsed 3-5 seconds；
3) it is placed in rinsing bowl to clean and oxidation plate is being carried out by spray is cleaned with water spray when slinging within 3-5 seconds oxidation plate；
4) be put into nitric acid and neutralize, neutralize the neutralization time of time reference test piece, after be put into clean 3-5 seconds in rinsing bowl and sling oxygen
Oxidation plate is being carried out by spray is being cleaned with water spray when changing plate；
5) alkaline etching again again the time of the time reference test piece of alkaline etching alkaline etching again, observes oxidation plate alkaline etching situation, really
After protecting plated film removal, it is put into water flushed channel and is rinsed and remove buck flushing 3-5 seconds；
6) it is placed on to clean 3-5 seconds in rinsing bowl again and oxidation plate is being carried out by spray is cleaned with water spray when slinging plate；
7) be put into nitric acid and neutralize 2-3 minutes, after be put into rinsing bowl clean sling within 3-5 seconds oxidation plate when with water spray to oxygen
Change plate and carries out spray cleaning；
8) oxidation plate is dried；
It is directed to the oxidation plate of hardening oxidation technique preparation, hardness 480-520HV, steps are as follows for alkaline etching:
1) oxidation plate feeding is hung tight,
2) carry out first time alkaline etching, the alkaline etching time of time reference test piece slings and water flushed channel is put into and rushed after oxidation plate
Buck is washed away, is rinsed 3-5 seconds；
3) it is placed in rinsing bowl to clean and oxidation plate is being carried out by spray is cleaned with water spray when slinging within 3-5 seconds oxidation plate；
4) be put into nitric acid and neutralize after five minutes, be put into rinsing bowl clean sling within 3-5 seconds oxidation plate when with water spray to oxidation
Plate carries out spray cleaning；
5) alkaline etching again again the time of the time reference test piece of alkaline etching alkaline etching again, observes oxidation plate alkaline etching situation, really
It is taken out after protecting plated film removal；
6) it is placed on to clean 3-5 seconds in rinsing bowl again and oxidation plate is being carried out by spray is cleaned with water spray when slinging plate；
7) be put into nitric acid and neutralize after five minutes, be put into rinsing bowl clean sling within 3-5 seconds oxidation plate when with water spray to oxidation
Plate carries out spray cleaning；
8) oxidation plate is dried.
2. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: the solution of the level-one alkaline bath
For the sodium hydroxide solution of 20-30% concentration, solution temperature is 50-60 DEG C.
3. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: the solution of the second level alkaline bath
For the sodium hydroxide solution of 30-40% concentration, solution temperature is 50-70 DEG C.
4. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: the concentration of the nitric acid of neutralization is
10-15%, solution temperature are 20-30 DEG C.
5. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: the drying mode for aoxidizing plate is wind
It does or dries.
6. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: oxidation is made in true qualities oxidation technology
The plated film of plate with a thickness of 0.045-0.050mm, the thickness reduction of plate will be aoxidized by, which being handled by alkaline etching, controls in 0.09mm-
0.100mm；
Hardening oxidation technique be made the plated film of oxidation plate with a thickness of 0.050-0.060mm, plate will be aoxidized by being handled by alkaline etching
Thickness reduction is controlled in 0.1mm-0.120mm.
7. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: after step 3, extract several pieces
With the oxidation plate of a batch alkaline etching processing, 2-4 point is chosen on each oxidation plate and carries out thickness measure, and is stored into the alkali in computer
It loses in database；
Alkaline etching database is also stored with the time of the time of first time alkaline etching, alkaline etching again.
8. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: in step 1, first to oxidation
Then plate surface acetone wiped clean uses the sandblasting of G220 essence, 4.5-5 kilograms of pressure of blasting pressure.
9. a kind of strip method for aoxidizing plate according to claim 1, it is characterised in that: in step 3, aoxidize plate feeding
When hanging tight,
If hung using aluminium wire, aluminium wire secondary cannot be used；
If hanging oxidation plate using screw, it is necessary to ensure that medical fluid can penetrate into there are gap to screw hole and be corroded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811424792.XA CN109321920A (en) | 2018-11-27 | 2018-11-27 | A kind of strip method aoxidizing plate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811424792.XA CN109321920A (en) | 2018-11-27 | 2018-11-27 | A kind of strip method aoxidizing plate |
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| CN109321920A true CN109321920A (en) | 2019-02-12 |
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| CN106757269A (en) * | 2016-11-17 | 2017-05-31 | 广东坚美铝型材厂（集团）有限公司 | Aluminium section bar oxide-film method for demoulding and aluminium section bar oxide-film film plating process |
-
2018
- 2018-11-27 CN CN201811424792.XA patent/CN109321920A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB834707A (en) * | 1957-09-02 | 1960-05-11 | Rolls Royce | Removing resin from aluminium and aluminium alloy surfaces |
| CN104562136A (en) * | 2013-10-21 | 2015-04-29 | 广东澳美铝业有限公司 | Frosting process for aluminum profile |
| CN105274602A (en) * | 2014-07-09 | 2016-01-27 | 黄燕滨 | Anti-corrosion surface treatment method based on rare-earth modified phosphoric and sulfuric acid anodizing |
| CN106757269A (en) * | 2016-11-17 | 2017-05-31 | 广东坚美铝型材厂（集团）有限公司 | Aluminium section bar oxide-film method for demoulding and aluminium section bar oxide-film film plating process |
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