CN109262869A - A kind of the fragment auxiliary liquid and sharding method of photovoltaic slice - Google Patents
A kind of the fragment auxiliary liquid and sharding method of photovoltaic slice Download PDFInfo
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- CN109262869A CN109262869A CN201811257415.1A CN201811257415A CN109262869A CN 109262869 A CN109262869 A CN 109262869A CN 201811257415 A CN201811257415 A CN 201811257415A CN 109262869 A CN109262869 A CN 109262869A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
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Abstract
This application discloses a kind of fragments of photovoltaic slice to assist liquid, the bubble formation substance for being 2% to 15% including the weight ratio being dissolved in the water, the surface lubrication substance that weight ratio is 0.1% to 2%, the bubble formation substance is used to be adsorbed in the surface of photovoltaic slice and decomposites bubble, the surface lubrication substance is used to anchor in the bubble that the bubble formation substance decomposition goes out the surface of the photovoltaic slice, forming the lubricating film containing gas can be improved the buoyancy of photovoltaic slice in water, improve the separable characteristic between photovoltaic slice, reduce bonding die and ratio in flakes, improve the operation fluency of plug-in sheet machine, reduce the probability of fragment and edge breakage, disclosed herein as well is a kind of sharding methods of photovoltaic slice, including the photovoltaic slice after degumming is impregnated preset time in above-mentioned fragment auxiliary liquid；Photovoltaic slice after immersion is placed in the sink of plug-in sheet machine and carries out fragment.
Description
Technical field
The invention belongs to photovoltaic slice technical fields, assist liquid and fragment side more particularly to a kind of fragment of photovoltaic slice
Method.
Background technique
At present in photovoltaic industry, diamond wire multi-wire saw mode, which has substituted abrasive wire sawing, becomes the mainstream of crystalline silicon slice
Mode, this is because diamond wire multi-wire saw mode is more efficient, silicon loss is less, and processing cost is lower.
After carrying out diamond wire multi-wire saw, silicon rod is cut into silicon wafer, is stained with cutting liquid on silicon wafer, silicon wafer and silicon wafer it
Between can generate adhesion because of the surface tension effects of water and cutting liquid, while the cutting thickness of silicon wafer is more and more thinner, in addition crystalline silicon
Itself has hard brittleness, and possible unbalance stress, is easy to produce and collapses scarce fragmentation during successive fragment.The existing automatic inserted sheet of silicon wafer
The working method of machine is first to place the silicon wafer stacked in the sink, and being acted on by water-jet reduces between silicon wafer and silicon wafer
Stiction force realizes the gradually separation between silicon wafer, and it is negative then to form part in adsorption plate bottom by the suction hose on adsorption plate
Pressure, is sent to conveyor belt for silicon wafer, completes the separation, transmission and inserted sheet of silicon wafer.A kind of specific embodiment is by complexity
The big silicon wafer of adhesive force is forcibly separating, still by the pass adjustment of circuit design and apopore using strength fluidics in water
Silicon wafer stress is larger in Slicing procedure, be easy to produce fragment and collapse it is scarce, another embodiment be by plug-in sheet machine sink mix
Entering high pressure gas, the bulk gas dispersed in water is injected between the silicon wafer stacked with water flow, the adhesion between silicon wafer is destroyed,
Relative to common strength water-jet technology, being mixed into for gas helps to reduce the friction between silicon wafer, but the gas in water flow
Poor in the adsorption capacity of silicon chip surface, stability is not strong.
In conclusion in the water used in the prior art strength mode of jet need accurate adjustment water (flow) direction, pressure and
Speed just can guarantee efficiently separating for adhesion silicon wafer, and in actual production process not due to cutting liquid performance inconsistency and residual quantity
, so that the stiction force size between silicon wafer has differences, while change of water quality caused by impurity makes water in plug-in sheet machine sink
Stream parameter constantly changes, and the friction aggravation between silicon wafer eventually leads to the decline of plug-in sheet machine work quality, the damage ratio of silicon chip edge
Example increases.
Summary of the invention
To solve the above problems, the present invention provides a kind of fragment of photovoltaic slice auxiliary liquid and sharding method, Neng Gouti
The buoyancy of high photovoltaic slice in water improves the separable characteristic between photovoltaic slice, reduces bonding die and ratio in flakes, raising
The operation fluency of plug-in sheet machine reduces the probability of fragment and edge breakage.
The fragment of photovoltaic slice provided by the invention a kind of assists liquid, the weight ratio including being dissolved in the water be 2% to
15% bubble formation substance, the surface lubrication substance that weight ratio is 0.1% to 2%, the bubble formation substance is for adsorbing
In photovoltaic slice surface and decomposite bubble, the surface lubrication substance be used for by the bubble formation substance decomposition go out gas
Bubble anchors at the surface of the photovoltaic slice, forms the lubricating film containing gas.
Preferably, in the fragment auxiliary liquid of above-mentioned photovoltaic slice, the weight ratio of the bubble formation substance is 8%,
10% or 12%.
Preferably, in the fragment auxiliary liquid of above-mentioned photovoltaic slice, the weight ratio of the surface lubrication substance is 0.2%,
0.3%, 0.4% or 0.5%.
It preferably, further include the pH value tune that weight ratio is 0.01% to 3% in the fragment auxiliary liquid of above-mentioned photovoltaic slice
Save substance.
Preferably, in the fragment auxiliary liquid of above-mentioned photovoltaic slice, the bubble formation substance is ammonium hydrogencarbonate and/or carbon
Sour ammonium and/or hypochlorous acid ammonium.
Preferably, in the fragment auxiliary liquid of above-mentioned photovoltaic slice, the surface lubrication substance is fatty alcohol polyoxy ether
Or tall oil acid.
Preferably, in the fragment auxiliary liquid of above-mentioned photovoltaic slice, the pH value Auto-regulator is citric acid, auxiliary for making
Help the control of liquid pH value between 2 to 7.5.
A kind of sharding method of photovoltaic slice provided by the invention, comprising:
Photovoltaic slice after degumming is impregnated into preset time in the fragment auxiliary liquid as described in any above；
Photovoltaic slice after immersion is placed in the sink of plug-in sheet machine and carries out fragment.
Preferably, in the sharding method of above-mentioned photovoltaic slice, the photovoltaic slice is silicon wafer.
Preferably, in the sharding method of above-mentioned photovoltaic slice, the preset time is not less than 3 minutes.
As can be seen from the above description, the fragment of photovoltaic slice provided by the invention assists liquid, due to including being dissolved in the water
Weight ratio be 2% to 15% bubble formation substance, the surface lubrication substance that weight ratio is 0.1% to 2%, the bubble is raw
It is used to be adsorbed in the surface of photovoltaic slice at substance and decomposites bubble, the surface lubrication substance is used for the bubble formation
The bubble that substance decomposition goes out anchors at the surface of the photovoltaic slice, forms the lubricating film containing gas, therefore the light of top layer
It lies prostrate slice surface and adsorbs a large amount of bubbles, density relative reduction can quickly float under flow action, cut with the photovoltaic of lower layer closely
Piece separation, simultaneously because the presence of the lubricating film containing gas, the friction that upper and lower two photovoltaic slices generate under flow action
It significantly reduces, the photovoltaic slice edge breakage rate decline that inserted sheet is formed, wafer separator operation is more stable, that is to say, that Neng Gouti
The buoyancy of high photovoltaic slice in water improves the separable characteristic between photovoltaic slice, reduces bonding die and ratio in flakes, raising
The operation fluency of plug-in sheet machine reduces the probability of fragment and edge breakage, in addition, the fragment side of photovoltaic slice provided by the invention
Method can be improved the buoyancy of photovoltaic slice in water, improve photovoltaic and cut due to being impregnated in advance using above-mentioned fragment auxiliary liquid
Separable characteristic between piece reduces bonding die and ratio in flakes, improves the operation fluency of plug-in sheet machine, reduction fragment and edge
Damaged probability.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The embodiment of invention for those of ordinary skill in the art without creative efforts, can also basis
The attached drawing of offer obtains other attached drawings.
Fig. 1 is a kind of schematic diagram of the embodiment of the sharding method of photovoltaic slice provided by the present application.
Specific embodiment
Core of the invention thought is that the fragment for providing a kind of photovoltaic slice assists liquid and sharding method, can be improved light
Volt slice buoyancy in water, improves the separable characteristic between photovoltaic slice, reduces bonding die and ratio in flakes, raising inserted sheet
The operation fluency of machine reduces the probability of fragment and edge breakage.
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
In a kind of embodiment of the fragment auxiliary liquid of photovoltaic slice provided by the present application, including the weight ratio being dissolved in the water
For 2% to 15% bubble formation substance, the surface lubrication substance that weight ratio is 0.1% to 2%, bubble formation substance is for inhaling
It invests the surface of photovoltaic slice and decomposites bubble, the bubble that surface lubrication substance is used to bubble formation substance decomposition is fixed
On the surface of photovoltaic slice, the lubricating film containing gas is formed.
It should be noted that photovoltaic slice mentioned here is for producing solar battery, material is unlimited, not
It is confined to silicon wafer, since this photovoltaic slice thickness is smaller, is easy to generate breakage because of fragment, therefore provided by the present application
Fragment assists liquid for this photovoltaic slice, and bubble formation substance adopted here, there are many kind, effect is preferable
One kind be it is easy decompose ammonium salt, further, it is also possible to using sodium carbonate, sodium bicarbonate or potassium carbonate, saleratus and vulcanization
Ammonium, hydrogen sulfide ammonia, ammonium chloride etc., these substances can also form bubble after photovoltaic slice surface is decomposed, but to pH value
It is required that relatively harsh, to the more demanding of execute-in-place, the ammonium carbonate salts that weak acid and weak base are formed are that effect is best, work as use
It when ammonium salt, is deposited to guarantee that ammonium salt is formed on photovoltaic slice surface, the amounts of ammonium salt in fragment auxiliary liquid must reach 2%
More than, on the other hand, the surface lubrication substance used here can be fatty alcohol polyoxyethylene ether, be also possible to polyethylene glycol,
The water-soluble preferable substance such as polyethers, does not limit herein, can be folded when bubble formation substance reaches certain proportion in solution
The photovoltaic slice surface forming core deposition put, is then slowly decomposed, the gas decomposited forms a large amount of fine gas bubbles, is coated on photovoltaic
Slice surface, and constantly accumulate, separate adjacent photovoltaic slice in the case where uniform stressed, while air bubble expansion,
Surface lubrication substance can constantly be permeated to gas-liquid interface, finally form composite lubricating film on photovoltaic slice surface.
As can be seen from the above description, the fragment of photovoltaic slice provided by the present application assists liquid, due to including being dissolved in the water
Weight ratio be 2% to 15% bubble formation substance, weight ratio be 0.1% to 2% surface lubrication substance, bubble formation object
Matter is used to be adsorbed in the surface of photovoltaic slice and decomposites bubble, what surface lubrication substance was used to bubble formation substance decomposition
Bubble anchors at the surface of photovoltaic slice, forms the lubricating film containing gas, therefore the photovoltaic slice adsorption of top layer is big
Bubble is measured, density relative reduction can quickly float under flow action, it is separated with the photovoltaic slice of lower layer closely, simultaneously because
The presence of lubricating film containing gas, the friction that upper and lower two photovoltaic slices generate under flow action significantly reduce, inserted sheet shape
At photovoltaic slice edge breakage rate decline, wafer separator operation it is more stable, that is to say, that can be improved photovoltaic slice in water
Buoyancy, improve the separable characteristic between photovoltaic slice, reduce bonding die and ratio in flakes, improve the operation smoothness of plug-in sheet machine
Property, reduce the probability of fragment and edge breakage.
On the basis of the fragment of above-mentioned photovoltaic slice assists liquid, there are one preferred embodiments, wherein bubble formation substance
Weight ratio is 8%, 10% or 12%, both can guarantee that air bubble content was enough in this way, to realize covering for photovoltaic slice surface comprehensively
Lid, and can be effectively controlled the dosage of bubble formation substance, it is excessively high to be unlikely to production cost.
Meanwhile the weight ratio of surface lubrication substance can be more preferably 0.2%, 0.3%, 0.4% or 0.5%, it is this
Weight ratio makes surface lubrication substance stronger in the adsorption capacity on photovoltaic slice surface, and has better greasy property, can
More small blister are anchored at into the surface of photovoltaic slice, the surface of photovoltaic slice is made to form the higher lubricating film of air content,
Conducive to the floating of photovoltaic slice, and frictional force can be reduced.
In a further embodiment, for example, when use the strong base-weak acid salt of sodium carbonate or potassium carbonate etc as bubble formation
When substance, it is necessary to acidic environment is used, the highly basic for not so decomposing generation may corrode photovoltaic slice, be unfavorable for being used for a long time,
In this case, so that it may the pH value Auto-regulator that weight ratio is 0.01% to 3% is added, citric acid can be used, and
The effect that pH value is adjusted can be realized, because it is one unlike inorganic acid using organic acids such as lactic acid, gluconic acids
Secondary complete ionization, so Step-ionization, sustained release hydrogen ion is conducive to more stable rise with the consumption of use process
Bubble, and the degree of ionization of different acid is different, when adding citric acid, is preferably in a proportion of 0.05% to 0.1%, and this is only it certainly
One of preferred embodiment, in some cases, such as when using hypochlorous acid ammonium or ammonium hydrogencarbonate as bubble formation substance,
Can natural decomposition generate bubble in this way can be advantageously it is not necessary that other pH value Auto-regulators are added.
In a specific embodiment, bubble formation substance is ammonium hydrogencarbonate and/or ammonium carbonate and/or hypochlorous acid ammonium,
These ammonium salts are unstable at normal temperature, and photovoltaic slice is realized on the easily decomposes surface for releasing gas and being adsorbed on photovoltaic slice
Separation, by taking ammonium hydrogencarbonate and ammonium carbonate as an example, reaction process is as follows:
NH4HCO3=NH3↑+H2O+CO2↑
(NH4)2CO3=2NH3↑+H2O+CO2↑
It, can be heavy in the photovoltaic slice surface forming core stacked when the content of inorganic ammonium salt such in solution reaches certain proportion
Product, the inorganic ammonium salt for being adsorbed on photovoltaic slice surface (control solution ph by citric acid) under weakly acidic condition and slowly decompose,
The gas of releasing forms a large amount of fine gas bubbles and is coated on photovoltaic slice surface, and constantly accumulates, and makes photovoltaic slice and photovoltaic slice
Fine-powder existing for the ammonia for separating in the case where uniform stressed, and releasing after ammonium salt decomposition and photovoltaic slice surface exists
Chemical reaction can be carried out in water again to continue to release gas, guarantees that photovoltaic slice adsorption tolerance is continuously increased, it is swollen in bubble
While swollen, in order to drop low-surface-energy, surface lubrication substance can constantly be permeated to gas-liquid interface, finally in photovoltaic slice surface shape
At composite lubricating film.
Further, surface lubrication substance used in above-mentioned fragment auxiliary liquid can be poly alkyl alcohol oxygen ether or appropriate
That oleic acid, and fatty alcohol polyoxyethylene ether is a major class, and comprising AEO-7, AEO-9 etc., this big substance can all make
With, and effect is more preferable, and tall oil acid then belongs to another major class, can also apply here.
Further, can preferably above-mentioned pH value Auto-regulator be citric acid, for make assist liquid pH value control 2 to
It is more sensitive to the pH value of solution including ammonium salt between 7.5, and photovoltaic slice is in acid condition (except hydrofluoric acid)
It is basicly stable, therefore in order to guarantee that fragment auxiliary liquid is permanently effective, it can be further by pH value control between 5 to 6.5
Faintly acid does not have any corrosion to photovoltaic slice, and bubble can keep the longer time.
As shown in FIG. 1, FIG. 1 is provided by the present application for a kind of embodiment of the sharding method of photovoltaic slice provided by the present application
A kind of schematic diagram of the embodiment of the sharding method of photovoltaic slice, this method comprises the following steps:
S1: the photovoltaic slice after degumming is such as being impregnated into preset time in any fragment auxiliary liquid above；
Photovoltaic slice mentioned here is for producing solar battery, and material is unlimited, it is not limited to silicon wafer, by
It is smaller in this photovoltaic slice thickness, therefore be easier to generate breakage because of fragment, above-mentioned fragment auxiliary liquid is for this
Photovoltaic slice, and bubble formation substance adopted here, there are many kind, the preferable one kind of effect is easy decomposition ammonium salt, this
Outside, can also using sodium carbonate, sodium bicarbonate or potassium carbonate, saleratus and ammonium sulfide, hydrogen sulfide ammonia, ammonium chloride etc.,
These substances can also form bubble after photovoltaic slice surface is decomposed, but the requirement to pH value is relatively harsh, grasps to scene
That makees is more demanding, and the ammonium carbonate salts that weak acid and weak base are formed are that effect is best, on the other hand, the surface lubrication used here
Substance can be fatty alcohol polyoxyethylene ether, be also possible to the water-soluble preferable substance such as polyethylene glycol, polyethers, herein and unlimited
It is fixed, when the content of bubble formation substance in solution reaches certain proportion, can be inhaled in the photovoltaic slice surface forming core deposition stacked
The bubble formation substance for being attached to photovoltaic slice surface slowly decomposes, and the gas of releasing, which forms a large amount of fine gas bubbles and is coated on photovoltaic, to be cut
Piece surface, and constantly accumulation increases and separates adjacent photovoltaic slice in the case where uniform stressed, while air bubble expansion
Surface lubrication substance can constantly be permeated to gas-liquid interface, finally form composite lubricating film on photovoltaic slice surface.Also need to illustrate
It is that microbubble allocation methods in the prior art are first decomposed the micro-bubble of gas in water, then by photovoltaic slice
It is put into the water containing such dissolved gas, goes to adsorb gas formation bubble therein by photovoltaic slice surface, absorption
Bubble ratio is low, binding force is not strong, and embodiment is first to allow photovoltaic slice adsorption that can decompose the chemistry examination for releasing gas
Agent, the gas volume released after such reagent dissociation is even hundreds times of its adsorbent solid decades of times, so photovoltaic slice surface
Air content be significantly increased, so separation photovoltaic slice effect it is fairly obvious.
S2: the photovoltaic slice after immersion is placed in the sink of plug-in sheet machine and carries out fragment.
Due to being impregnated in advance using above-mentioned fragment auxiliary liquid, it can be improved the buoyancy of photovoltaic slice in water, improve
Separable characteristic between photovoltaic slice reduces bonding die and ratio in flakes, improves the operation fluency of plug-in sheet machine, reduction fragment
With the probability of edge breakage.
Further, on the basis of above scheme, preferably the photovoltaic slice is silicon wafer.
In another embodiment, preset time used is impregnated not less than 3 minutes, it should be noted that less than 3 points
In the case where clock, bubble is decomposed and movement is abundant not enough, and fragment effect is not it is obvious that being therefore preferably not less than 3 here
Minute, but the time can not be too long, because overlong time will affect the production production capacity of screening, that is to say, that divide after 3 minutes
Piece difference on effect is with regard to little.
Above-described embodiment is illustrated with two specific examples below:
(1) 35 kilograms of tap water are added in the turnover box of silicon wafer stripping blanking, successively by good 3.5 kilograms of precise
Ammonium carbonate, 105 grams of AEO-9,75 grams of citric acids are added while agitating in the above tap water, completely molten without waiting for ammonium carbonate
Silicon wafer after degumming can be put into the above solution by solution, it is necessary to assure solution floods silicon wafer completely, and soaking time is many
Inserted sheet operation can be carried out in 3 minutes.
(2) 35 kilograms of tap water are added in the turnover box of silicon wafer stripping blanking, successively by good 4.5 kilograms of precise
Ammonium hydrogen carbonate, 200 grams of AEO-9,150 grams of citric acids are added while agitating in the above tap water, without waiting for ammonium hydrogen carbonate
Being completely dissolved can be put into the silicon wafer for needing after backwashing in the above solution, it is necessary to assure solution floods silicon wafer completely, when immersion
Between no less than can carry out inserted sheet operation within 3 minutes.
Using the above method, under the action of fine gas bubbles, the viscous force between silicon wafer can be eliminated, faint negative pressure is
Silicon wafer can be rapidly separated, while the lubricating film between silicon wafer reduces two silicon wafers up and down and produces because of bourn acting force imbalance
Raw friction is collided with, and the quick separating under flexible state is finally realized, and improves 5% or more inserted sheet production capacity, reduces cleaning chipping
0.2%, fragment 0.1% is reduced, there are be stacked on after certain proportion cleaning, drying especially in silicon wafer production process
Silicon wafer together, when needing again inserted sheet to clean due to sorting inspection, silicon chip surface has been completely dried, and is put it into
After in water, existing air can be caused to form negative pressure between silicon wafer by emptying rate of liquid instead between silicon wafer, and separation needs again
Impregnate 3 hours in the hot water or more, and by conventional sliced fashion, fragment rate, edge breakage ratio are high, by adding
Bonus point piece auxiliary agent, silicon chip surface in water again adsorbed gas and separate, silicon wafer soaking time is down to 3 minutes and fragment
Rate, 80% or more edge breakage ratio decline.
The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention.
Various modifications to these embodiments will be readily apparent to those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, of the invention
It is not intended to be limited to the embodiments shown herein, and is to fit to and the principles and novel features disclosed herein phase one
The widest scope of cause.
Claims (10)
1. a kind of fragment of photovoltaic slice assists liquid, which is characterized in that the weight ratio including being dissolved in the water is 2% to 15%
Bubble formation substance, the surface lubrication substance that weight ratio is 0.1% to 2%, the bubble formation substance is for being adsorbed in photovoltaic
The surface of slice simultaneously decomposites bubble, and the bubble that the surface lubrication substance is used to the bubble formation substance decomposition is fixed
On the surface of the photovoltaic slice, the lubricating film containing gas is formed.
2. the fragment of photovoltaic slice according to claim 1 assists liquid, which is characterized in that the weight of the bubble formation substance
Amount is than being 8%, 10% or 12%.
3. the fragment of photovoltaic slice according to claim 1 assists liquid, which is characterized in that the weight of the surface lubrication substance
Amount is than being 0.2%, 0.3%, 0.4% or 0.5%.
4. the fragment of photovoltaic slice according to claim 1-3 assists liquid, which is characterized in that further include weight ratio
For 0.01% to 3% pH value Auto-regulator.
5. the fragment of photovoltaic slice according to claim 1 assists liquid, which is characterized in that the bubble formation substance is carbon
Sour hydrogen ammonia and/or ammonium carbonate and/or hypochlorous acid ammonium.
6. the fragment of photovoltaic slice according to claim 1 assists liquid, which is characterized in that the surface lubrication substance is rouge
Fat alcohol polyoxy ether or tall oil acid.
7. the fragment of photovoltaic slice according to claim 4 assists liquid, which is characterized in that the pH value Auto-regulator is lemon
Lemon acid assists the control of liquid pH value between 2 to 7.5 for making.
8. a kind of sharding method of photovoltaic slice characterized by comprising
Photovoltaic slice after degumming is impregnated into preset time in the described in any item fragment auxiliary liquid of such as claim 1-7；
Photovoltaic slice after immersion is placed in the sink of plug-in sheet machine and carries out fragment.
9. the sharding method of photovoltaic slice according to claim 8, which is characterized in that the photovoltaic slice is silicon wafer.
10. the sharding method of photovoltaic slice according to claim 8, which is characterized in that the preset time is not less than 3 points
Clock.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811257415.1A CN109262869B (en) | 2018-10-26 | 2018-10-26 | Slicing auxiliary liquid and slicing method for photovoltaic slices |
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| CN201811257415.1A CN109262869B (en) | 2018-10-26 | 2018-10-26 | Slicing auxiliary liquid and slicing method for photovoltaic slices |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115881596B (en) * | 2023-03-08 | 2023-05-05 | 四川上特科技有限公司 | Wafer bearing frame and wafer slicing device |
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| EP2388809A1 (en) * | 2009-01-13 | 2011-11-23 | Exa Co., Ltd. | Wafer separating apparatus, wafer separating/transferring apparatus, wafer separating method, wafer separating/transferring method and solar cell wafer separating/transferring method |
| CN102719896A (en) * | 2011-03-30 | 2012-10-10 | 吉林庆达新能源电力股份有限公司 | Monocrystalline silicon wafer pre-cleaning method |
| CN103666784A (en) * | 2013-11-29 | 2014-03-26 | 孙爱玲 | Pre-cleaning agent for silicon wafer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11354478A (en) * | 1998-05-29 | 1999-12-24 | Lsi Logic Corp | Microbubble attachment prevention device |
| CN1618936A (en) * | 2004-09-30 | 2005-05-25 | 刘玉岭 | Wire cutting liquid of semiconductor material |
| EP2388809A1 (en) * | 2009-01-13 | 2011-11-23 | Exa Co., Ltd. | Wafer separating apparatus, wafer separating/transferring apparatus, wafer separating method, wafer separating/transferring method and solar cell wafer separating/transferring method |
| CN102719896A (en) * | 2011-03-30 | 2012-10-10 | 吉林庆达新能源电力股份有限公司 | Monocrystalline silicon wafer pre-cleaning method |
| CN103666784A (en) * | 2013-11-29 | 2014-03-26 | 孙爱玲 | Pre-cleaning agent for silicon wafer |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115881596B (en) * | 2023-03-08 | 2023-05-05 | 四川上特科技有限公司 | Wafer bearing frame and wafer slicing device |
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| CN109262869B (en) | 2020-11-03 |
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