CN205761808U - Crystal silicon wafer cutting edge material flotation defoaming device - Google Patents

Crystal silicon wafer cutting edge material flotation defoaming device Download PDF

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Publication number
CN205761808U
CN205761808U CN201620663291.7U CN201620663291U CN205761808U CN 205761808 U CN205761808 U CN 205761808U CN 201620663291 U CN201620663291 U CN 201620663291U CN 205761808 U CN205761808 U CN 205761808U
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CN
China
Prior art keywords
flotation
carbon groove
collection carbon
floation tank
crystal silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201620663291.7U
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Chinese (zh)
Inventor
辛玲
王杰
孙毅
申君来
宋中学
任真
杨正宏
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Henan Yicheng New Energy Co ltd
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Henan Yicheng New Energy Co ltd
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Publication date
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Priority to CN201620663291.7U priority Critical patent/CN205761808U/en
Application granted granted Critical
Publication of CN205761808U publication Critical patent/CN205761808U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

This utility model discloses a kind of crystal silicon wafer cutting edge material flotation defoaming device, two material scraping plates parallel with floation tank dual-side it are provided with in floation tank, the scraper motor for driving material scraping plate to rotate it is provided with in material scraping plate one end, collection carbon groove it is respectively equipped with outside the dual-side of floation tank, collection carbon groove is arranged along the length direction of floation tank side, is provided with discharge gate in one end of collection carbon groove;Being arranged above shower at collection carbon groove, shower includes supervisor, and the arm being connected with supervisor, offers equally distributed micropore bottom arm.In this utility model, the internal water flowing of the shower arranged, can carry out the foam impurity scraped in collection carbon groove during flotation spraying froth breaking, and along with shower water is flowed away by discharge gate in time, thus avoid foam impurity bulk deposition and spilling in collection carbon groove, prevent foam impurity secondary pollution, eliminate safe hidden trouble.

Description

Crystal silicon wafer cutting edge material flotation defoaming device
Technical field
This utility model relates to the flotation production technical field of crystal silicon wafer cutting edge material, is specifically related to a kind of crystal silicon chip cutting Sword material flotation defoaming device.
Background technology
Crystal silicon wafer cutting edge material is that granularity is generally between 5 μm~the relatively fine carborundum solid micro-powder granule of 15 μm, matter Ground is hard and has sharp corner angle, is used as the sword material of cutting solar energy crystal silicon chip cell piece, monocrystal silicon and polysilicon is cut In flakes.Crystal silicon wafer cutting edge material needs to remove the impurity such as the carbon dust being mixed in silicon-carbide particle in process of production, and remove impurity is led to The most first the silicon-carbide particle being mixed with impurity is mixed and made into serosity with water, then uses the method for air-blowing FLOTATION SEPARATION to carry out, Xiang Fu Being mixed with in the silicon carbide slurry of the impurity such as carbon dust introducing air in screening device, the micro-bubble utilizing gas to produce in slip will Impurity band is to upper strata liquid level, then is scraped foam impurity to collection carbon groove by scraper plate so that it is mixing merga pass pressure filter again with water will The solid impurities such as carbon dust extrude.Prior art exists foam impurity when scraping into collection carbon groove, it may appear that in collection carbon groove, foam is big The phenomenon that amount is piled up and overflowed, flotation is produced again and forms secondary pollution, also brings peace simultaneously by the foam impurity piled up and overflow Entirely produce hidden danger.
Summary of the invention
This utility model provides a kind of crystal silicon wafer cutting edge material flotation defoaming device, and it can solve the problem that crystal silicon wafer cutting edge Material flotation froth impurity bulk deposition and spilling and problem of easily causing secondary pollution and potential safety hazard in collection carbon groove.
For solving above-mentioned technical problem, this utility model adopts the following technical scheme that
A kind of crystal silicon wafer cutting edge material flotation defoaming device of design, including floation tank and be arranged in described floation tank extremely Few one group of flotation column, the side on described flotation column top is provided with bleed hole, and described bleed hole is passed through trachea and is arranged at described floating Air compressor machine correspondence outside scavenger connects, and is provided with flotation motor at the top of described flotation column, sets in the bottom of described flotation column It is equipped with and is driven, by described flotation motor, the high speed rotor rotated;Two and described floation tank both sides it are provided with in described floation tank The material scraping plate that limit is parallel, is provided with the scraper motor for driving material scraping plate to rotate in described material scraping plate one end, in described flotation Being respectively equipped with collection carbon groove outside the dual-side in pond, described collection carbon groove is arranged, described along the length direction of described floation tank side One end of collection carbon groove is provided with discharge gate;
Being arranged above shower at described collection carbon groove, described shower includes supervisor, and is connected with described supervisor Logical arm, offers equally distributed micropore bottom described arm.
Preferably, described supervisor is arranged at the middle part of described collection carbon groove, and described arm uniformly divides in the both sides of described supervisor Cloth.
Preferably, the water inlet described supervisor is provided with filter.
Preferably, described micropore size is 1~5mm.
Preferably, the bottom surface of described collection carbon groove by described discharge gate one end to its other end be up-wards inclination install, its water Flat inclination angle is 10~20 °.
The beneficial effects of the utility model are:
1. in this utility model, the internal water flowing of the shower of setting, can be to the foam impurity scraped in collection carbon groove during flotation Carry out spraying froth breaking, and along with shower water is flowed away by discharge gate in time, thus avoid foam impurity bulk deposition in collection carbon groove And spilling, prevent foam impurity secondary pollution, eliminate safe hidden trouble.
2. this utility model is responsible for the filter that import department is arranged, the impurity blocking being mixed with in water can be effectively prevented micro- Hole, affects spraying effect.
Accompanying drawing explanation
Fig. 1 is the structural representation of this utility model crystal silicon wafer cutting edge material flotation defoaming device;
Fig. 2 is the top view of floation tank;
Fig. 3 is the structural representation of shower;
Fig. 4 is the structural representation of arm;
Wherein: 1 be floation tank, 2 for flotation column, 3 for flotation motor, 4 for bleed hole, 5 for high speed rotor, 6 for scraper electricity Machine, 7 be material scraping plate, 8 for integrate carbon groove, 9 for shower, 10 for micropore, 11 for be responsible for, 12 as arm, 13 as filter, 14 be arrange Material mouth.
Detailed description of the invention
With embodiment, detailed description of the invention of the present utility model is described in further detail below in conjunction with the accompanying drawings.
Embodiment 1: a kind of crystal silicon wafer cutting edge material flotation defoaming device, as Figure 1-Figure 4, including floation tank 1 with set The one group of flotation column 2 being placed in floation tank 1, side, flotation column 2 top is provided with bleed hole 4, and bleed hole 4 is passed through trachea and is arranged at Air compressor machine correspondence outside floation tank 1 connects, and is provided with flotation motor 3 at the top of flotation column 2, arranges in the bottom of flotation column 2 There is the high speed rotor 5 being driven rotation by flotation motor 3;Be provided with in floation tank 1 two with floation tank 1 parallel the scraping of dual-side Flitch 7, is provided with the scraper motor 6 for driving material scraping plate 7 to rotate in material scraping plate 7 one end, outside the dual-side of floation tank 1 Being respectively equipped with collection carbon groove 8, collection carbon groove 8 is arranged along the length direction of floation tank 1 side, is provided with discharge gate in one end of collection carbon groove 8 14, collection carbon groove 8 bottom surface by discharge gate 14 one end to its other end be up-wards inclination install, its level inclination is 10 °;At collection carbon Groove 8 is arranged above shower 9, and shower 9 includes being responsible for 11, and the arm 12 being connected with supervisor 11, arm 12 end Portion offers equally distributed micropore 10, and micropore 10 aperture is 3mm;Supervisor 11 is arranged at the middle part of collection carbon groove 8, and arm 12 is being led The both sides of pipe 11 are uniformly distributed;The water inlet of supervisor 11 is provided with filter 13.
In technique scheme, the bleed hole 4 that flotation column 2 is arranged, the pressure that flotation column 2 external air compressor can be produced Contracting air is incorporated in the slip in floation tank 1, and the air that the high speed rotor 5 bottom flotation column 2 is introduced into quickly mixes with slip Merging and form a large amount of bubbles, the impurity such as the carbon dust in floation tank 1 slip are constantly floatingly selected by the bubble continuously generated.Scraping of both sides The impurity such as the foam of generation and the carbon dust that carries thereof are scraped in collection carbon groove 8 by flitch 7, shower 9 ejection in collection carbon groove 8 Water, by the removal of foam in collection carbon groove 8, it is to avoid foam is piled up in collection carbon groove 8 and overflows.Collection carbon groove 8 inclined bottom surface is arranged, spray Drench the water that can the discharge gate 14 of automatic stream collection carbon groove 8, the impurity in collection carbon groove 8 is washed away and discharges from discharge gate 14.
Above in conjunction with drawings and Examples, embodiment of the present utility model is elaborated, but this utility model It is not limited to above-mentioned embodiment, in the ken that those of ordinary skill in the art are possessed, it is also possible to without departing from this Change on the premise of utility model objective or change.

Claims (5)

1. a crystal silicon wafer cutting edge material flotation defoaming device, including floation tank and be arranged at the least one set in described floation tank Flotation column, the side on described flotation column top is provided with bleed hole, and described bleed hole is passed through trachea and is arranged at outside described floation tank The air compressor machine correspondence in portion connects, and is provided with flotation motor at the top of described flotation column, be provided with in the bottom of described flotation column by Described flotation motor drives the high speed rotor rotated, and it is characterized by:
In described floation tank, it is provided with two material scraping plates parallel with described floation tank dual-side, sets in described material scraping plate one end It is equipped with the scraper motor for driving material scraping plate to rotate, outside the dual-side of described floation tank, is respectively equipped with collection carbon groove, described Collection carbon groove is arranged along the length direction of described floation tank side, is provided with discharge gate in one end of described collection carbon groove;
Being arranged above shower at described collection carbon groove, described shower includes being responsible for, and be connected with described supervisor Arm, offers equally distributed micropore bottom described arm.
Crystal silicon wafer cutting edge material flotation defoaming device the most according to claim 1, is characterized by: described supervisor is arranged at institute Stating the middle part of collection carbon groove, described arm is uniformly distributed in the both sides of described supervisor.
Crystal silicon wafer cutting edge material flotation defoaming device the most according to claim 1, is characterized by: in the water inlet of described supervisor Filter it is provided with at Kou.
4. the crystal silicon wafer cutting edge material flotation defoaming device stated according to claim 1, is characterized by: described micropore size be 1~ 5mm。
Crystal silicon wafer cutting edge material flotation defoaming device the most according to claim 1, is characterized by: the bottom surface of described collection carbon groove By described discharge gate one end to its other end be up-wards inclination install, its level inclination is 10~20 °.
CN201620663291.7U 2016-06-29 2016-06-29 Crystal silicon wafer cutting edge material flotation defoaming device Expired - Fee Related CN205761808U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620663291.7U CN205761808U (en) 2016-06-29 2016-06-29 Crystal silicon wafer cutting edge material flotation defoaming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620663291.7U CN205761808U (en) 2016-06-29 2016-06-29 Crystal silicon wafer cutting edge material flotation defoaming device

Publications (1)

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CN205761808U true CN205761808U (en) 2016-12-07

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109252332A (en) * 2018-11-15 2019-01-22 张利明 A kind of foam removal washing machine
CN110548602A (en) * 2019-09-05 2019-12-10 天蓝颜料(山东)有限公司 Flotation machine capable of scraping floaters and suspended matters simultaneously
CN113368802A (en) * 2021-08-12 2021-09-10 山东大明精细化工有限公司 Reation kettle with defoaming function

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109252332A (en) * 2018-11-15 2019-01-22 张利明 A kind of foam removal washing machine
CN110548602A (en) * 2019-09-05 2019-12-10 天蓝颜料(山东)有限公司 Flotation machine capable of scraping floaters and suspended matters simultaneously
CN113368802A (en) * 2021-08-12 2021-09-10 山东大明精细化工有限公司 Reation kettle with defoaming function
CN113368802B (en) * 2021-08-12 2021-10-29 山东大明精细化工有限公司 Reation kettle with defoaming function

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20161207

Termination date: 20190629

CF01 Termination of patent right due to non-payment of annual fee