CN109231844A - Improve the TFT glass substrate thinning etching solution of anti-dazzle performance - Google Patents

Improve the TFT glass substrate thinning etching solution of anti-dazzle performance Download PDF

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Publication number
CN109231844A
CN109231844A CN201811297071.7A CN201811297071A CN109231844A CN 109231844 A CN109231844 A CN 109231844A CN 201811297071 A CN201811297071 A CN 201811297071A CN 109231844 A CN109231844 A CN 109231844A
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weight percent
etching solution
glass substrate
percent content
weight ratio
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CN201811297071.7A
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Inventor
佘雪梅
黄朝刚
高凤章
李宁
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Improve the TFT glass substrate thinning etching solution of anti-dazzle performance, it is characterized in that the etching solution is made of following components: the hydrochloric acid of weight percent 5~7% (in terms of HCl), the hydrofluoric acid (in terms of HF) of weight ratio 3~6%, the sulfuric acid of weight ratio 1%~2% is (with H2SO4 meter), the ammonium fluoride of weight percent content 1%~1.5%, the zinc chloride of weight percent content 0.1%~0.2%, the aluminium chloride of weight percent content 0.1%~0.2%, the glucolactone of weight ratio 2~5%, the glycerine of weight percent content 2~3% and the water of surplus.

Description

Improve the TFT glass substrate thinning etching solution of anti-dazzle performance
Technical field
The present invention relates to be used for glass substrate of liquid crystal display etch combination.
Background technique
In the prior art, ultra-thin TFT (ThinFilmTransistor, thin film transistor (TFT)) display screen is made to meet It is required that needing to carry out thinning processing to existing specification glass substrate.Conventional thinning method be use hydrofluoric acid be etched, but Show quality for guarantee thinning metacoxal plate, need be processed by shot blasting after the completion of thinning.But the glass substrate table after polishing Face glossiness is high, but is also easy to produce dazzle, needs to carry out additional non-glare treated.Generating mist degree appropriate in glass surface can make It can be anti-dazzle and higher light transmittance.Chinese patent literature CN2011102930815 discloses a kind of anti-dazzle glass The etching solution of glass, but find under study for action, the etching solution carry out surface to TFT substrate and handle being simply possible to use in, Wu Fazhi It connects and especially cannot achieve the surface quality for improving thinning metacoxal plate while thinning for thinning, and glass substrate can be made Surface generates mist degree appropriate to generate antiglare effect.Therefore the TFT glass substrate thinning erosion for improving anti-dazzle performance is provided Liquid is carved, surface can be made to generate suitable mist degree to realize antiglare effect while glass substrate carries out thinning, become existing There is urgent problem to be solved in technology.
Summary of the invention
To solve aforementioned technical problem, the present invention provides a kind of TFT glass substrate thinning erosions for improving anti-dazzle performance Carve liquid, under study for action it has been surprisingly found that by the prescription of preferred etching solution, can to LCD glass substrate into While row thinning, mist degree appropriate is formed in substrate surface, while keeping high light transmittance and can reduce surface Carry out the effect of anti-dazzle antireflective processing.To solve aforementioned technical problem the technical solution adopted by the present invention are as follows:
Provide the TFT glass substrate thinning etching solution for improving anti-dazzle performance, it is characterised in that the etching solution by with Lower component is constituted: the hydrochloric acid (in terms of HCl) of weight percent 5~7%, the hydrofluoric acid (in terms of HF) of weight ratio 3~6%, weight Sulfuric acid than 1%~2% is (with H2SO4 meter), the ammonium fluoride of weight percent content 1%~1.5%, weight percent content 0.1%~0.2% zinc chloride, the aluminium chloride of weight percent content 0.1%~0.2%, the glucose of weight ratio 2~5% Acid lactone, the glycerine of weight percent content 2~3% and the water of surplus.
The TFT glass substrate thinning etching solution of the described anti-dazzle performance of raising, it is characterised in that the etching solution by with Lower component is constituted: the hydrochloric acid (in terms of HCl) of weight percent 5~7%, the hydrofluoric acid (in terms of HF) of weight ratio 4~6%, weight Sulfuric acid than 1%~1.5% is (with H2SO4 meter), the ammonium fluoride of weight percent content 1%~1.5%, weight percent content 0.1%~0.2% zinc chloride, the aluminium chloride of weight percent content 0.1%~0.2%, the grape of weight ratio 2%~3% Saccharic acid lactone, the glycerine of weight percent content 2~3% and the water of surplus.
The TFT glass substrate thinning etching solution of the anti-dazzle performance of raising, it is characterised in that it prepares in the following manner,
1) recipe quantity hydrochloric acid, sulfuric acid and hydrofluoric acid are mixed, be added suitable quantity of water dilution after, be added recipe quantity ammonium fluoride, Zinc chloride and aluminium chloride dissolution,
2) suitable quantity of water dissolution is added in the glycerine of recipe quantity, glucolactone;
3) mixed liquor of step 2) is slowly added into the mixed liquor of step 1) under agitation and is uniformly mixed.
Under study for action we have found that the nitration mixture formed using the hydrochloric acid, sulfuric acid and hydrofluoric acid of proper proportion, and is added suitable When the ammonium fluoride, aluminium chloride and zinc chloride of ratio, suitable glycerine and glucolactone are added, obtained etching solution energy It is enough while carrying out thinning processing, in the suitable mist degree of glass substrate table surface production, to realize antiglare effect.Locating It was found that each ingredient in thinning etching process plays synergistic effect in above-mentioned prescription when side's screening, change prescription be will lead to It is unable to get the anti-dazzle glas of high-transmittance.
Specific embodiment
TFT glass substrate thinning etching solution provided by the invention, is prepared in the following manner,
1) recipe quantity hydrochloric acid, sulfuric acid and hydrofluoric acid are mixed, be added suitable quantity of water dilution after, be added recipe quantity ammonium fluoride, Zinc chloride and aluminium chloride dissolution,
2) suitable quantity of water dissolution is added in the glycerine of recipe quantity, glucolactone;
3) mixed liquor of step 2) is slowly added into the mixed liquor of step 1) under agitation and is uniformly mixed.
The formula of embodiment and comparative example see the table below
The method for carrying out thin processingization to the etching liquor that embodiment and comparative example obtain is as follows
Taking raw material is glass substrate of the identical producer of plate nitre NA35 with batch, with a thickness of 1.000mm, having a size of 100mm×100mm。
Etch process is
1) thinning of TFT glass substrate is prepared with etching solution 10L (hereinafter referred to as etching solution)
2) etching solution is squeezed into etching machine acid tank and controls pretreating agent temperature at 30 DEG C ± 2 DEG C, using as experimental group The glass substrate of sample is immersed in etching solution, and removal glass surface is thinned to 0.5mm;
3) glass surface is cleaned with clear water.
Detect embodiment
Glossiness, mist degree and the transmitance of TFT glass substrate sample by thinning processing are detected, wherein mist degree Using WGW photoelectricity mist degree instrument, transmitance using BTR-1 type visible light thoroughly/reflectance test instrument, glossiness detection uses glossiness It is tested under the conditions of instrument, with 60 °
Detection method should meet the GBT_36260_20189 electronical display regulation of anti-dazzle anti reflection glass
Inspection result is as follows
Comparative example 1~4 is added without zinc chloride and aluminium chloride, ammonium fluoride, grape on the basis of 2/3/6 prescription of embodiment respectively Saccharic acid lactone (suitably increase glycerine), glycerine (suitably increase glucolactone).
It should be less than 70 with the glossiness of anti-dazzle anti reflection glass according to regulation electronical display in GBT_36260_2018, mist degree Should be less than 4%, it is seen that luminous transmittance (being equivalent to glossiness) should be about 98%, the experimental results showed that, only mentioned when using the present invention The etching solution of confession carries out glass substrate when thinning processing to glass substrate, after the completion of thinning processing, can substantially conform to The regulation of GBT_36260_20189.While keeping high-permeability energy, ideal anti-dazzle effect is realized in glass surface Fruit.And the sample that embodiment 2/3/6/7 obtains, then better light transmittance is shown while realizing anti-dazzle.And comparative example Obtained glass is not able to satisfy above-mentioned standard then, illustrates that each component is produced when being etched in technical solution of the present invention prescription Synergistic effect also achieves antiglare effect to make the glass substrate after etching while meeting thinning requirement, substantially can be with Meet the regulation of GBT_36260_2018.

Claims (2)

1. improving the TFT glass substrate thinning etching solution of anti-dazzle performance, it is characterised in that the etching solution is by following components structure At: the hydrochloric acid (in terms of HCl) of weight percent 5~7%, the hydrofluoric acid (in terms of HF) of weight ratio 3~6%, weight ratio 1%~ 2% sulfuric acid is (with H2SO4 meter), the ammonium fluoride of weight percent content 1%~1.5%, weight percent content 0.1%~ 0.2% zinc chloride, the aluminium chloride of weight percent content 0.1%~0.2%, the glucolactone of weight ratio 2~5%, The glycerine of weight percent content 2~3% and the water of surplus.
2. improving the TFT glass substrate thinning etching solution of anti-dazzle performance as described in claim 1, it is characterised in that the erosion Carve liquid to be made of following components: the hydrochloric acid (in terms of HCl) of weight percent 5~7%, the hydrofluoric acid of weight ratio 4~6% is (with HF Meter), the sulfuric acid of weight ratio 1%~1.5% is (with H2SO4 meter), the ammonium fluoride of weight percent content 1%~1.5%, weight hundred Point than content 0.1%~0.2% zinc chloride, the aluminium chloride of weight percent content 0.1%~0.2%, weight ratio 2%~ 3% glucolactone, the glycerine of weight percent content 2~3% and the water of surplus.
CN201811297071.7A 2018-11-01 2018-11-01 Improve the TFT glass substrate thinning etching solution of anti-dazzle performance Withdrawn CN109231844A (en)

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CN201811297071.7A CN109231844A (en) 2018-11-01 2018-11-01 Improve the TFT glass substrate thinning etching solution of anti-dazzle performance

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CN201811297071.7A CN109231844A (en) 2018-11-01 2018-11-01 Improve the TFT glass substrate thinning etching solution of anti-dazzle performance

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109777670A (en) * 2019-03-14 2019-05-21 惠州市清洋实业有限公司 A kind of cleaning solution and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101131546A (en) * 2006-08-21 2008-02-27 第一毛织株式会社 Wet etching solution
CN102432185A (en) * 2011-09-30 2012-05-02 郑州恒昊玻璃技术有限公司 Etching liquid and etching process for anti-dazzle glass product
CN107076878A (en) * 2014-10-31 2017-08-18 康宁股份有限公司 Anti-glare base material and its manufacture method with homogeneous texture surface and low glittering

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101131546A (en) * 2006-08-21 2008-02-27 第一毛织株式会社 Wet etching solution
CN102432185A (en) * 2011-09-30 2012-05-02 郑州恒昊玻璃技术有限公司 Etching liquid and etching process for anti-dazzle glass product
CN107076878A (en) * 2014-10-31 2017-08-18 康宁股份有限公司 Anti-glare base material and its manufacture method with homogeneous texture surface and low glittering

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109777670A (en) * 2019-03-14 2019-05-21 惠州市清洋实业有限公司 A kind of cleaning solution and preparation method thereof

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