CN109052979A - Etching solution and the processing technology that low haze glare proof glass is realized using the etching solution - Google Patents
Etching solution and the processing technology that low haze glare proof glass is realized using the etching solution Download PDFInfo
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- CN109052979A CN109052979A CN201811215036.6A CN201811215036A CN109052979A CN 109052979 A CN109052979 A CN 109052979A CN 201811215036 A CN201811215036 A CN 201811215036A CN 109052979 A CN109052979 A CN 109052979A
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- Prior art keywords
- etching
- glass
- etching solution
- glare proof
- proof glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The processing technology of low haze glare proof glass is realized the present invention relates to a kind of etching solution and using the etching solution, the low haze glare proof glass etching solution includes the surfactant of the perflexane of weight ratio 20~30%, 1-3%, the fluoride salt of 5-10%, 10~15% inorganic acid and 45~70% pure water.Glass after cleaning is put into above-mentioned etching solution, the temperature for keeping glass etching liquid can directly obtain the glare proof glass of low haze after being 60 DEG C, 20-50 minutes.It is compared to three-step approach glare proof glass processing method, the micro- fluorine etching technique of one-step method saves raw material, shortens processing step, substantially reduce cost, the glare proof glass for etching formation is widely used in mobile phone screen, computer screen, LCD TV etc..
Description
Technical field
The processing technology that low haze glare proof glass is realized the present invention relates to a kind of etching solution and using the etching solution, is belonged to
Glass surface anti-dazzle etching and processing technical field.
Background technique
AG glare proof glass production principle be special processing is carried out on bare glass surface, and this processing mode
Have and be divided into physics and chemical two methods, glass processing can be single side or two-sided, and the glass feature after processing is to make bare glass
Reflecting surface becomes compared with weak reflection surface (it is uneven that glass surface generates fine irregularities).With lower anti-compared with bare glass
Ratio is penetrated, can be decreased obviously in light reflectivity and then display is allowed to show to be more clear transparent visual effect, in AG anti-dazzle
In glass processing industry, traditional hydrofluoric acid etch method handles the surface of glass, and there is only environmental issues, and exists
Safety problem.The present invention is directed to this problem, and hydrofluoric acid etch technology is substituted using micro- fluorine etching technique, realizes anti-dazzle table
Facet etch processing realizes that anti-glare surface, micro- fluorine etching technique realize one-step method and reach compared to hydrofluoric acid etch three-step approach
The anti-glare surface of low haze is compared to three-step approach, and the micro- fluorine etching technique of one-step method saves raw material, shortens processing step,
Cost is substantially reduced, the glare proof glass for etching formation is widely used in mobile phone screen, computer screen, LCD TV etc..
Summary of the invention
It is an object of the invention to: it is in view of the drawbacks of the prior art and insufficient, a kind of etching solution is provided and utilizes the etching
Liquid realizes the processing technology of low haze glare proof glass, can a method directly form the glare proof glass surface of low haze, together
When be formed by that low haze glare proof glass surface is uniform, and flash-point is low, transmitance is high, and has good surface abrasion resistance
Energy.
A kind of etching solution, by the ingredient of following weight: the surface of 20~30% perflexane, 1-3%
Activating agent, the fluoride salt of 5-10%, 10~15% inorganic acid and 45~70% pure water.The inorganic acid be hydrochloric acid, sulfuric acid,
One or more mixing of phosphoric acid or nitric acid；The surfactant is ethoxylated dodecyl alcohol, octanol polyoxyethylene ether
With the one or more mixing of fatty acid methyl ester APEO.
A kind of processing technology for being realized low haze glare proof glass using etching solution, is included the following steps, uses antiacid film
Or position of the antiacid peelable glue protection glass without etching, glass etching liquid is injected in etching groove, then by glass to be etched
It puts into etching groove and etches after glass cleaning；In etching process, keeping the temperature of glass etching liquid is 60 DEG C, the temperature difference in etching groove
Control after 20-50 minutes, can directly obtain the glare proof glass of low haze within 2%.
Through the above technical solutions, the invention has the benefit that using etching solution and processing technology of the invention, it can
One-step method directly forms low haze glare proof glass, is compared to the low haze glare proof glass that spraying is formed, and this method is formed
Low haze glare proof glass abrasion resistance properties it is good, can be used for a long time and not fall off；Its etching solution price is lower, etching process
It is easier to control, production yield is high, and stable product quality and three-step approach compare, and the production of waste liquid is greatly reduced in production process
Raw, the feature of environmental protection is good, can replace the three-step approach etching production technology of high pollution.
Specific embodiment
Embodiment 1
A kind of etching solution, comprising: following component is uniformly mixed, the perflexane of weight ratio 24%, 1% surfactant it is pungent
Alcohol polyoxyethylene ether, 5% potassium fluoride, 13% sulfuric acid and 57% pure water.
It is a kind of using etching solution realize low haze glare proof glass processing technology, comprising: using antiacid film or it is antiacid can
Position of the glue protection glass without etching is shelled, glass etching liquid is injected in etching groove, it then will be after glass cleaning to be etched
It is etched in investment etching groove.In etching process, keeping the temperature of glass etching liquid is 60 DEG C, and temperature difference control exists in etching groove
Within 2%, after 30 minutes, glass taking-up is cleaned up, the glare proof glass of low haze can be directly obtained.Rub resistance test
Add 500 grams of pressure to rub back and forth 2000 times for 20.0mm0000# steel wool by diameter not falling off, 40 beats/min of frequency
Clock.Its optical characteristics is transmittance haze 3.5%, and glossiness (when incident angle is 60 degree) is 108, and the fresh degree of reflecting of image (DOI) is
96, MIcrosope image is shown, glass surface generates up-and-down surface, and feature sizes are 6 microns, and surface arithmetic is flat
Mean value roughness (Ra) is 0.05 micron.
Embodiment 2
A kind of etching solution, comprising: following component is uniformly mixed, the perflexane of weight ratio 20%, 2% the surfactant moon
Cinnamic alcohol polyoxyethylene ether, 8% ammonium fluoride, 14% hydrochloric acid and 58% pure water.
It is a kind of using etching solution realize low haze glare proof glass processing technology, comprising: using antiacid film or it is antiacid can
Position of the glue protection glass without etching is shelled, glass etching liquid is injected in etching groove, it then will be after glass cleaning to be etched
It is etched in investment etching groove.In etching process, keeping the temperature of glass etching liquid is 60 DEG C, and temperature difference control is 2% in etching groove
Within, after 25 minutes, glass taking-up is cleaned up, the glare proof glass of low haze can be directly obtained.Rub resistance test is passed through
Diameter is that 20.0mm0000# steel wool adds 500 grams of pressure to rub back and forth 2000 times not fall off, 40 beats/min of frequency.Its
Optical characteristics is transmittance haze 2.8%, and glossiness (when incident angle is 60 degree) is 113, and the fresh degree of reflecting of image (DOI) is 97,
Its MIcrosope image shows that glass surface generates up-and-down surface, and feature sizes are 4 microns, surface arithmetic mean of instantaneous value
Roughness (Ra) is 0.04 micron.
Finally, it should be noted that the foregoing is only a preferred embodiment of the present invention, it is not intended to restrict the invention,
Although the present invention is described in detail referring to the foregoing embodiments, for those skilled in the art, still may be used
To modify the technical solutions described in the foregoing embodiments or equivalent replacement of some of the technical features,
All within the spirits and principles of the present invention, any modification, equivalent replacement, improvement and so on should be included in of the invention
Within protection scope.
Claims (5)
1. a kind of etching solution, it is characterised in that: by the ingredient of following weight, 20~30% perflexane, 1-
3% surfactant, the fluoride salt of 5-10%, 10~15% inorganic acid and 45~70% pure water.
2. etching solution according to claim 1, it is characterised in that: the inorganic acid is hydrochloric acid, sulfuric acid, phosphoric acid or nitric acid
One or more mixing.
3. etching solution according to claim 1, it is characterised in that: the surfactant be ethoxylated dodecyl alcohol,
Octanol polyoxyethylene ether and the one or more mixing of fatty acid methyl ester APEO.
4. etching solution according to claim 1, it is characterised in that: the fluoride salt is ammonium fluoride, ammonium acid fluoride, sodium fluoride
With one or more mixing of potassium fluoride.
5. a kind of processing technology for realizing low haze glare proof glass using etching solution, characterized by the following steps: make
Position with antiacid film or antiacid peelable glue protection glass without etching, glass etching liquid is injected in etching groove, then will be to
It puts into etching groove and etches after the glass cleaning of etching；In etching process, keeping the temperature of glass etching liquid is 60 DEG C, etching
Temperature difference control after 20-50 minutes, can directly obtain the glare proof glass of low haze within 2% in slot.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811215036.6A CN109052979A (en) | 2018-10-18 | 2018-10-18 | Etching solution and the processing technology that low haze glare proof glass is realized using the etching solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811215036.6A CN109052979A (en) | 2018-10-18 | 2018-10-18 | Etching solution and the processing technology that low haze glare proof glass is realized using the etching solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109052979A true CN109052979A (en) | 2018-12-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811215036.6A Pending CN109052979A (en) | 2018-10-18 | 2018-10-18 | Etching solution and the processing technology that low haze glare proof glass is realized using the etching solution |
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| Country | Link |
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| CN (1) | CN109052979A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113620611A (en) * | 2021-08-30 | 2021-11-09 | 安徽晶驰光电科技有限公司 | Preparation method of high borosilicate glass anti-glare |
| CN116354609A (en) * | 2023-03-08 | 2023-06-30 | 东莞市吉田光学玻璃有限公司 | Anti-dizziness treatment process for face recognition glass panel |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101560058A (en) * | 2008-04-15 | 2009-10-21 | 株式会社东进世美肯 | Cleaning and etching composition for glass substrate for liquid crystal display device and method for etching glass substrate using the same |
| CN104230175A (en) * | 2014-09-05 | 2014-12-24 | 长沙市宇顺显示技术有限公司 | Glass etching liquid and glass etching method |
-
2018
- 2018-10-18 CN CN201811215036.6A patent/CN109052979A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101560058A (en) * | 2008-04-15 | 2009-10-21 | 株式会社东进世美肯 | Cleaning and etching composition for glass substrate for liquid crystal display device and method for etching glass substrate using the same |
| CN104230175A (en) * | 2014-09-05 | 2014-12-24 | 长沙市宇顺显示技术有限公司 | Glass etching liquid and glass etching method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113620611A (en) * | 2021-08-30 | 2021-11-09 | 安徽晶驰光电科技有限公司 | Preparation method of high borosilicate glass anti-glare |
| CN116354609A (en) * | 2023-03-08 | 2023-06-30 | 东莞市吉田光学玻璃有限公司 | Anti-dizziness treatment process for face recognition glass panel |
| CN116354609B (en) * | 2023-03-08 | 2023-09-22 | 东莞市吉田光学玻璃有限公司 | Anti-dizziness treatment process for face recognition glass panel |
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20181221 |
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